CA1037506A - Workpiece positioning apparatus - Google Patents
Workpiece positioning apparatusInfo
- Publication number
- CA1037506A CA1037506A CA255,238A CA255238A CA1037506A CA 1037506 A CA1037506 A CA 1037506A CA 255238 A CA255238 A CA 255238A CA 1037506 A CA1037506 A CA 1037506A
- Authority
- CA
- Canada
- Prior art keywords
- drive
- work station
- prime mover
- bearings
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/08—Protective coverings for parts of machine tools; Splash guards
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
Abstract
ABSTRACT
Disclosed is an X-Y table for positioning semicon-ductor workpieces in a vacuum environment with a high degree of speed and accuracy. The X and Y prime movers are mounted on adjacent external surfaces of the vacuum chamber. The first motor associated with the drive in the Y direction seals with an "O" ring onto the front surface of the chamber.
A second motor associated with the X drive is fixably mounted to one of the sides of the chamber. The lower stage pro-viding motion in the Y direction has a single degree of freedom relative to the vacuum chamber. The upper stage providing motion in the X direction is connected to the lower Y stage and has two degrees of freedom relative to the vacuum chamber. The entire X-Y table assembly is mounted on rails in parallel with the Y direction of motion such that by removing the front wall of the vacuum chamber, the entire assembly may be removed for repair and/or maintenance. By such modular replacement, the entire E-beam tool can resume operation.
Disclosed is an X-Y table for positioning semicon-ductor workpieces in a vacuum environment with a high degree of speed and accuracy. The X and Y prime movers are mounted on adjacent external surfaces of the vacuum chamber. The first motor associated with the drive in the Y direction seals with an "O" ring onto the front surface of the chamber.
A second motor associated with the X drive is fixably mounted to one of the sides of the chamber. The lower stage pro-viding motion in the Y direction has a single degree of freedom relative to the vacuum chamber. The upper stage providing motion in the X direction is connected to the lower Y stage and has two degrees of freedom relative to the vacuum chamber. The entire X-Y table assembly is mounted on rails in parallel with the Y direction of motion such that by removing the front wall of the vacuum chamber, the entire assembly may be removed for repair and/or maintenance. By such modular replacement, the entire E-beam tool can resume operation.
Description
375~i ~aclc~round of the Invention l. ~ielcl o~ the [nvention This invention relates -to an X-Y posi-tionable work station and more particularly to a very accurately and quickly positionable work s-ta-tion in a vacuum environment.
Description of the Prior Art Generally, in the known prior art, systems operating in vacuum environmen-ts are not required to simultaneously perform to stringent speci-fications. As such, relatively loose designs are possible which are inaccurate or slow and do not severely stress the components. In the writing of photolithographic patterns on semiconductor workpieces by an electron beam in a vacuum environment, a very accurately positionable X-Y table is required. The table also has to function within a high vacuum environment, presenting stringent lubrication requirements and special ma-terial and component limitations. Also, the elec-tron beam is greatly affected by moving magnetic material near the final lens, and by electro magnetic fields created in the vacinity of the lens. -These considerations require that the electric drive motor :~:
be located outside the vacuum chamber to eliminate the out-gassing friction of the brushes, and lubrication problems, -as well as to attenuate the electro magnetic field. By placing the motors outsdie the vacuum chamber, heat transfer . :: ::: .
from the motor is also facilitated.
At the same time, the requirements for very fast and accurate positioning demand that -the prime mover and associated linear actuators conform to prescribed requirements of good design of servo systems. Mandatory characteristics include items such as low friction, low compliance, high rigidity ~ ~'' ', ' ~ ,
Description of the Prior Art Generally, in the known prior art, systems operating in vacuum environmen-ts are not required to simultaneously perform to stringent speci-fications. As such, relatively loose designs are possible which are inaccurate or slow and do not severely stress the components. In the writing of photolithographic patterns on semiconductor workpieces by an electron beam in a vacuum environment, a very accurately positionable X-Y table is required. The table also has to function within a high vacuum environment, presenting stringent lubrication requirements and special ma-terial and component limitations. Also, the elec-tron beam is greatly affected by moving magnetic material near the final lens, and by electro magnetic fields created in the vacinity of the lens. -These considerations require that the electric drive motor :~:
be located outside the vacuum chamber to eliminate the out-gassing friction of the brushes, and lubrication problems, -as well as to attenuate the electro magnetic field. By placing the motors outsdie the vacuum chamber, heat transfer . :: ::: .
from the motor is also facilitated.
At the same time, the requirements for very fast and accurate positioning demand that -the prime mover and associated linear actuators conform to prescribed requirements of good design of servo systems. Mandatory characteristics include items such as low friction, low compliance, high rigidity ~ ~'' ', ' ~ ,
-2-~ ~,~', ~Y~
37~a6 high stiffness, and low mass, to achieve the maximum mechanical resonen-t frequency. This requires a minimal backlash linear actuator, and positive coupling between all the drive components, as well as posi-tive coupling to the X-Y stage. Consequently, such items as flexible shafts and couplings are not desirable.
A system having the foregoing characteristics has many interactive parts requiring maintenance, repair, replacement, and diagnosis. A severe problem with known prior art systems has been that the entire electron beam (E-beam) column which provides a control for the electron beam, must be lifted up with a crane to provide access to the workpiece positioning apparatus. The prior art teaches no quick and convenient way to remove the X-Y table, to perform necessary maintenance etc., and return the same into the vacuum chamber. Similarly, known techniques for conveniently accessing X-Y tables for maintenance and repair purposes would not be applicable to the highly fast and accurate X-Y positioning appara-tus required herein.
Summary of the Invention Accordingly, it is a primary object of this invention to provide a remotely controllable workpiece positioning means with a high degree of accuracy and speed in a vacuum environment.
It is another object of this invention to provide an -~ ~ ;
X-Y table for positioning semiconductor workpieces in a vacuum chamber for fabrication by an electron beam.
It is another object of this invention that the position-ing system be shielded from the semiconduc-tor workpieces so tha-t
37~a6 high stiffness, and low mass, to achieve the maximum mechanical resonen-t frequency. This requires a minimal backlash linear actuator, and positive coupling between all the drive components, as well as posi-tive coupling to the X-Y stage. Consequently, such items as flexible shafts and couplings are not desirable.
A system having the foregoing characteristics has many interactive parts requiring maintenance, repair, replacement, and diagnosis. A severe problem with known prior art systems has been that the entire electron beam (E-beam) column which provides a control for the electron beam, must be lifted up with a crane to provide access to the workpiece positioning apparatus. The prior art teaches no quick and convenient way to remove the X-Y table, to perform necessary maintenance etc., and return the same into the vacuum chamber. Similarly, known techniques for conveniently accessing X-Y tables for maintenance and repair purposes would not be applicable to the highly fast and accurate X-Y positioning appara-tus required herein.
Summary of the Invention Accordingly, it is a primary object of this invention to provide a remotely controllable workpiece positioning means with a high degree of accuracy and speed in a vacuum environment.
It is another object of this invention to provide an -~ ~ ;
X-Y table for positioning semiconductor workpieces in a vacuum chamber for fabrication by an electron beam.
It is another object of this invention that the position-ing system be shielded from the semiconduc-tor workpieces so tha-t
3~50~ `
the electron beam is not atfected.
I-t is still another object of this inven-tion that the X-Y positioning assembly be readily removable from the vacuum ~-chamber.
In accordance with the present invention, the x and y stages are connected to a y drive and flange assembly which seals with an "0" ring onto the front surface of the chamber.
The lower, or y stage is directly coupled by a drive bracket to the linear actuator. Both the drive assembly and the y stage have a single degree of freedom relative to fixed references; such as the vacuum chamber. As the upper stage provides an x motion and is mounted to the lower y stage it has two degrees of freedom relative to the chamber walls.
This is permitted by a drive arm coupling to a drive rail allowing independent motion of the bottom stage, and a fixed ~ounting of the x drive and flange assembly relative to the ~ -chamber. Essentially, this allows precise, quick positioning ;
of a workpiece within a vacuum in orthogonal directions relative to some Eixed point relative to the chamber. ;~
The table assembly is supported on stand off's and rails to allow clearance below for vacuum poppet valving, the y ; .. :
drive assembly, and position feedback components. The cross ;~
references to related applications and patents describe the ~;
control means whereby this X-Y table is positioned. Refer to these cross references for greater detail. The table assembly is repeatably guided into place and positioned, when removed and/or replaced guided into place and positioned, when removed and/or replaced, with the aid of guide bearings mounted onto the rails.
~ ' '
the electron beam is not atfected.
I-t is still another object of this inven-tion that the X-Y positioning assembly be readily removable from the vacuum ~-chamber.
In accordance with the present invention, the x and y stages are connected to a y drive and flange assembly which seals with an "0" ring onto the front surface of the chamber.
The lower, or y stage is directly coupled by a drive bracket to the linear actuator. Both the drive assembly and the y stage have a single degree of freedom relative to fixed references; such as the vacuum chamber. As the upper stage provides an x motion and is mounted to the lower y stage it has two degrees of freedom relative to the chamber walls.
This is permitted by a drive arm coupling to a drive rail allowing independent motion of the bottom stage, and a fixed ~ounting of the x drive and flange assembly relative to the ~ -chamber. Essentially, this allows precise, quick positioning ;
of a workpiece within a vacuum in orthogonal directions relative to some Eixed point relative to the chamber. ;~
The table assembly is supported on stand off's and rails to allow clearance below for vacuum poppet valving, the y ; .. :
drive assembly, and position feedback components. The cross ;~
references to related applications and patents describe the ~;
control means whereby this X-Y table is positioned. Refer to these cross references for greater detail. The table assembly is repeatably guided into place and positioned, when removed and/or replaced guided into place and positioned, when removed and/or replaced, with the aid of guide bearings mounted onto the rails.
~ ' '
-4-- ~o3~06 Ihe Eore~oing deslgrl is essenti~llly a moclular con-struct:ioll permitting the sliding out of` the y motor, -the fron-t wall or flange, ~nd the remainder of -the assembly as a single unit, for quick replacemen-t and/or servicing. A-t the same time, the stringent requirements for accurate positioning within a vacuum system are maintained.
The foregoing and other objects, features, and advan-tages of the invention will be more apparent from the following more particular description of a pre:ferred embodiment of the invention, as illustrated in the accompanying drawings.
Description of the Drawings Fig. 1 is a schematic perspective view, partly in section, of a vacuum chamber and column with which the workpiece positioning apparatus of the present invention is employed.
Fig. 2 is a schematic perspective view showing the assembly and y drive almost comple-tely removed from the .
vacuum chamber.
Fig. 3 is a sectional view illustrating the y drive in greater detail.
Fig. 4 is a schematic view showing the x drive assembly in greater detail.
Detailed Description Referring to the drawings and particularly Fig. 1, there is shown a vacuum chamber 10 with an,lE-beam column 20 mounted thereon. The vacuum chamber 10 is formed by a top wall 11, a sidewall 12, a front wall or flange 14, as ~ ~-well as another sidewall, a backwall, and a bo-ttom wall L03750~i (not shown). 'I'he Y motor 30 is ~`ixedly mounted to the fron-t wall or flange 14. Also, the front wall or flange 14 is attached with screws through screw holes 15 to the sidewalls, top wall, and bottom wall, also including a "0" ring (not shown) to form a vacuum seal. The entire Y drive assembly 16 is thus a single integral module with the front wall of the vacuum chamber. The f'ront wall 14 ~-also includes electrical feed through por-ts 17 which are sealed to hold the vacuum while containing the cables for carrying the necessary electrical signals. The Y drive and table assembly is supported on rail 18 and is movable in the Y direction on rollers 19. The X motor drive is mounted to sidewall 12 and imparts a linear motion in the Y direction to drive arm 41. The X table 42 is the upper table mounted on the Y table by means of linear slides 43.
Table 42 has mounted thereon, and integral therewith, drive ~ - ' rail 44 arranged near one edge in a direction parallel with ~;
Y motion. The underside of drive arm 41 includes a pair of rollers (that are shown later herein) disposed on either side 20 of drive rail 44. This permits drive rail 44 to be moved in ;
the Y direction and indeed provides for the sliding out ~ ~ ' of the entire Y assembly and its reinsertion into the vacuum chamber. At the same time, drive arm 41 can exert pressure in the X direction on drive rail 44 thus providing a second ;-degree of freedom to the resultant X-Y table. The workpiece support 45 including a schematically illustrated semiconductor wafer 46-are placed on the X-Y table as shown. It is here further pointed out that the rotary motion of X motor 40 is translated into the linear motion of arm 41 by a linear ;~
-6- ~i~
3~'~0~
ac-tuator located within hou~ing ~7. There is a similar linear actuator associated with Y motor 30.
Refer now to Fig. 2 illus-trating -the X-Y table assembly in greater detail. Corresponding elements have been numbered with corresponding reference numerals insofar as practical.
Note that the en-tire Y drive assembly, riding on tracks ~8 will rollers 19, has been wi-thdrawn from within the vacuum chamber. Note also indentations 49 in rails 48 in which rollers 19 become seated when the X-Y -table is seated within the chamber. Guide bearings 47 mounted on each rail assure the straight travel of the entire unit during withdrawal and reinsertion. Also note rollers 50 mounted on the underside of` drive arm 41 engaging drive rail 44 when the unit is inserted into the vacuum chamber.
The X motor 40 and the drive are subsequently removable by disengaging the fastening bolts. Also seen more clearly in Fig. 2 are supports 51 for rails 48. In practice, locating stops can be positioned in the brackets supporting guide bearings 47. These accurately locate the position of the X-Y table. Also, ~n practice encoders can be mounted between the table stages to accurately detect the X and Y position of the table and this information is passed through the cables -through electric feed through ports 17.
Refer now to Fig. 3 for a description of the Y drive in greater detail. Corresponding elements have again been labeled with corresponding reference numerals insofar as practical. Drive shaft 60 passes through a bearing 61 and a magnetic particle type environmental seal or feedthrough 62. One such feedthrough 62 is manufactured by the FERRD
FLUIDICS Corporation. This forms a vacuum seal. ~lso - ~CI13~)6 he:Lping to Ic~ep the vac~lum seal is "0" ring 63. The sha~t also passes through bushir-g block 64 and sleeve bearing 65.
'I`he shaft also passes through linear actuator 70. Those s~illed in the art will recognize that n~merous -types of linear actuators are available. ~ particularly advantageous linear actuator for use in -the present applica-tion is ' `
manufactured by the Rohlix Corporation and described in U.S.
Patent 3,272,021. The linear actuator is then fixedly -;
attached to a block 71 to which further is attached drive ;~
arm 41 as can be seen in greater detail by referring to the^~
description of the X-drive in Fig. 4.
Fig. 4 further illustrates in greater detail roll bearings 50 positioned on either side of drive rail 44 which is fixedly a-ttached to the upper stage of the X-Y table.
Fig. 4 has also been numbered with corresponding reference ~;
numerals insofar as practical and previously described eiements will not be discussed in detail. Note that shaft 60' passes through a magnetic particle type vacuum seal 62' and sealing ring plate 80. Shaft 60' also passes through linear actuator 70' and terminates in plate 81.
Llnear actuator 70' is fixedly attached to block 71 which is fixedly attached to drive arm 41. Drive arm 41 in turn engages drive rail 44 by means of roller bearings 50. Also ~ ,~
passing through block 71 are shaft 82 and shaft 83. These shafts are held in block 71 by bushings 84 and 85,`respectively.
Additionally, shaft 86 ex-tends from ring plate 80 to plate 81. Rods 87, 88, and 89 are used as stand off's to fasten the X motor 40 to the sealing rlng plate ôO. Note that the : ':: ~, ., , ~ ". . : .. ~ . ... " . : .. ~ .: . . . . :. , 3rJJ5al~6 screw holes in pLate 80 do not reach through to preserve the in-tended vacuum seal.
What has then been described is an improved positioning mechanism for electron beam fabrication of semiconductors.
A salient feature of this invention is the vastly improved maintenance capability by providing a structure that permits the removal of the entire assembly with the front panel 1~.
As was previously mentioned, without this feature, the .
entire aolumn 20 would have to be lif-ted with a crane in order to permit access into -the vacuum chamber housing the X-Y table.
While the invention has been particularly shown and described with reference to a preferred embodiment thereof, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing ~rom the spirit and scope o~ the invention.
The foregoing and other objects, features, and advan-tages of the invention will be more apparent from the following more particular description of a pre:ferred embodiment of the invention, as illustrated in the accompanying drawings.
Description of the Drawings Fig. 1 is a schematic perspective view, partly in section, of a vacuum chamber and column with which the workpiece positioning apparatus of the present invention is employed.
Fig. 2 is a schematic perspective view showing the assembly and y drive almost comple-tely removed from the .
vacuum chamber.
Fig. 3 is a sectional view illustrating the y drive in greater detail.
Fig. 4 is a schematic view showing the x drive assembly in greater detail.
Detailed Description Referring to the drawings and particularly Fig. 1, there is shown a vacuum chamber 10 with an,lE-beam column 20 mounted thereon. The vacuum chamber 10 is formed by a top wall 11, a sidewall 12, a front wall or flange 14, as ~ ~-well as another sidewall, a backwall, and a bo-ttom wall L03750~i (not shown). 'I'he Y motor 30 is ~`ixedly mounted to the fron-t wall or flange 14. Also, the front wall or flange 14 is attached with screws through screw holes 15 to the sidewalls, top wall, and bottom wall, also including a "0" ring (not shown) to form a vacuum seal. The entire Y drive assembly 16 is thus a single integral module with the front wall of the vacuum chamber. The f'ront wall 14 ~-also includes electrical feed through por-ts 17 which are sealed to hold the vacuum while containing the cables for carrying the necessary electrical signals. The Y drive and table assembly is supported on rail 18 and is movable in the Y direction on rollers 19. The X motor drive is mounted to sidewall 12 and imparts a linear motion in the Y direction to drive arm 41. The X table 42 is the upper table mounted on the Y table by means of linear slides 43.
Table 42 has mounted thereon, and integral therewith, drive ~ - ' rail 44 arranged near one edge in a direction parallel with ~;
Y motion. The underside of drive arm 41 includes a pair of rollers (that are shown later herein) disposed on either side 20 of drive rail 44. This permits drive rail 44 to be moved in ;
the Y direction and indeed provides for the sliding out ~ ~ ' of the entire Y assembly and its reinsertion into the vacuum chamber. At the same time, drive arm 41 can exert pressure in the X direction on drive rail 44 thus providing a second ;-degree of freedom to the resultant X-Y table. The workpiece support 45 including a schematically illustrated semiconductor wafer 46-are placed on the X-Y table as shown. It is here further pointed out that the rotary motion of X motor 40 is translated into the linear motion of arm 41 by a linear ;~
-6- ~i~
3~'~0~
ac-tuator located within hou~ing ~7. There is a similar linear actuator associated with Y motor 30.
Refer now to Fig. 2 illus-trating -the X-Y table assembly in greater detail. Corresponding elements have been numbered with corresponding reference numerals insofar as practical.
Note that the en-tire Y drive assembly, riding on tracks ~8 will rollers 19, has been wi-thdrawn from within the vacuum chamber. Note also indentations 49 in rails 48 in which rollers 19 become seated when the X-Y -table is seated within the chamber. Guide bearings 47 mounted on each rail assure the straight travel of the entire unit during withdrawal and reinsertion. Also note rollers 50 mounted on the underside of` drive arm 41 engaging drive rail 44 when the unit is inserted into the vacuum chamber.
The X motor 40 and the drive are subsequently removable by disengaging the fastening bolts. Also seen more clearly in Fig. 2 are supports 51 for rails 48. In practice, locating stops can be positioned in the brackets supporting guide bearings 47. These accurately locate the position of the X-Y table. Also, ~n practice encoders can be mounted between the table stages to accurately detect the X and Y position of the table and this information is passed through the cables -through electric feed through ports 17.
Refer now to Fig. 3 for a description of the Y drive in greater detail. Corresponding elements have again been labeled with corresponding reference numerals insofar as practical. Drive shaft 60 passes through a bearing 61 and a magnetic particle type environmental seal or feedthrough 62. One such feedthrough 62 is manufactured by the FERRD
FLUIDICS Corporation. This forms a vacuum seal. ~lso - ~CI13~)6 he:Lping to Ic~ep the vac~lum seal is "0" ring 63. The sha~t also passes through bushir-g block 64 and sleeve bearing 65.
'I`he shaft also passes through linear actuator 70. Those s~illed in the art will recognize that n~merous -types of linear actuators are available. ~ particularly advantageous linear actuator for use in -the present applica-tion is ' `
manufactured by the Rohlix Corporation and described in U.S.
Patent 3,272,021. The linear actuator is then fixedly -;
attached to a block 71 to which further is attached drive ;~
arm 41 as can be seen in greater detail by referring to the^~
description of the X-drive in Fig. 4.
Fig. 4 further illustrates in greater detail roll bearings 50 positioned on either side of drive rail 44 which is fixedly a-ttached to the upper stage of the X-Y table.
Fig. 4 has also been numbered with corresponding reference ~;
numerals insofar as practical and previously described eiements will not be discussed in detail. Note that shaft 60' passes through a magnetic particle type vacuum seal 62' and sealing ring plate 80. Shaft 60' also passes through linear actuator 70' and terminates in plate 81.
Llnear actuator 70' is fixedly attached to block 71 which is fixedly attached to drive arm 41. Drive arm 41 in turn engages drive rail 44 by means of roller bearings 50. Also ~ ,~
passing through block 71 are shaft 82 and shaft 83. These shafts are held in block 71 by bushings 84 and 85,`respectively.
Additionally, shaft 86 ex-tends from ring plate 80 to plate 81. Rods 87, 88, and 89 are used as stand off's to fasten the X motor 40 to the sealing rlng plate ôO. Note that the : ':: ~, ., , ~ ". . : .. ~ . ... " . : .. ~ .: . . . . :. , 3rJJ5al~6 screw holes in pLate 80 do not reach through to preserve the in-tended vacuum seal.
What has then been described is an improved positioning mechanism for electron beam fabrication of semiconductors.
A salient feature of this invention is the vastly improved maintenance capability by providing a structure that permits the removal of the entire assembly with the front panel 1~.
As was previously mentioned, without this feature, the .
entire aolumn 20 would have to be lif-ted with a crane in order to permit access into -the vacuum chamber housing the X-Y table.
While the invention has been particularly shown and described with reference to a preferred embodiment thereof, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing ~rom the spirit and scope o~ the invention.
Claims (5)
PROPERTY OR PRIVILEGE IS CLAIMED ARE DEFINED AS FOLLOWS:
1. A workpiece positioning apparatus comprising:
a remotely controllable workpiece positioning means adapted for linear motion in each of at least two orthog-onal directions contained in an enclosed chamber;
a pair of motors mounted on the walls externally of the enclosed chamber;
one of the walls of the chamber, having one of the motors fixedly attached thereto; and said one of the walls and motor being removable together with at least a portion of the workpiece position-ing means from the enclosed chamber.
a remotely controllable workpiece positioning means adapted for linear motion in each of at least two orthog-onal directions contained in an enclosed chamber;
a pair of motors mounted on the walls externally of the enclosed chamber;
one of the walls of the chamber, having one of the motors fixedly attached thereto; and said one of the walls and motor being removable together with at least a portion of the workpiece position-ing means from the enclosed chamber.
2. In manufacturing apparatus wherein a workpiece is mounted on an X-Y positionable work station adjacent a permanent tool for manufacturing in a critical environment, the improvement comprising:
an environmental housing having a plurality of vertical sides and having the manufacturing tool mounted adjacent thereto;
a work station adapted to linear motion in each of least two orthogonal directions;
a first prime mover mounted on a first one of said plurality of vertical sides;
a second prime mover mounted on a second one of said plurality of vertical sides;
each said prime movers having respective drive shafts passing through an environmental seal and a linear actuator;
said work station and said second prime mover being integrally connected to said second vertical side;
such that when said second vertical side is disengaged from said environmental housing, said work station and second prime mover are removable together with said second vertical side.
an environmental housing having a plurality of vertical sides and having the manufacturing tool mounted adjacent thereto;
a work station adapted to linear motion in each of least two orthogonal directions;
a first prime mover mounted on a first one of said plurality of vertical sides;
a second prime mover mounted on a second one of said plurality of vertical sides;
each said prime movers having respective drive shafts passing through an environmental seal and a linear actuator;
said work station and said second prime mover being integrally connected to said second vertical side;
such that when said second vertical side is disengaged from said environmental housing, said work station and second prime mover are removable together with said second vertical side.
3. Apparatus as in Claim 2 wherein said first drive means associated with a first linear actuator has a drive arm attached in fixed relation thereto and further comprises:
a pair of bearings mounted on said drive arm; and a drive rail fixedly mounted on a portion of said work station, said pair of bearings being disposed on either side of said drive rail;
such that said drive rail is adapted to slide out from between said bearings.
a pair of bearings mounted on said drive arm; and a drive rail fixedly mounted on a portion of said work station, said pair of bearings being disposed on either side of said drive rail;
such that said drive rail is adapted to slide out from between said bearings.
4. An apparatus for manufacturing comprising:
an electron beam column;
an environmental housing having a plurality of vertical sides, mounted beneath said electron beam column;
a work station adapted to linear motion in each of least two orthogonal directions;
a first prime mover mounted on a first one of said plurality of vertical sides;
a second prime mover mounted on a second one of said plurality of vertical sides;
each said prime movers having respective drive shafts passing through an environmental seal and a linear actuator;
said work station and said second prime mover being integrally connected to said second vertical side;
such that when said second vertical side is disengaged from said environmental housing, said work station and second prime mover are removable together with said second vertical side.
an electron beam column;
an environmental housing having a plurality of vertical sides, mounted beneath said electron beam column;
a work station adapted to linear motion in each of least two orthogonal directions;
a first prime mover mounted on a first one of said plurality of vertical sides;
a second prime mover mounted on a second one of said plurality of vertical sides;
each said prime movers having respective drive shafts passing through an environmental seal and a linear actuator;
said work station and said second prime mover being integrally connected to said second vertical side;
such that when said second vertical side is disengaged from said environmental housing, said work station and second prime mover are removable together with said second vertical side.
5. Apparatus as in Claim 4 wherein said first drive means associated with a first linear actuator has a drive arm attached in fixed relation thereto and further comprises:
a pair of bearings mounted on said drive arm; and a drive rail fixedly mounted on a portion of said work station, said pair of bearings being disposed on either side of said drive rail;
such that said drive rail is adapted to slide out from between said bearings.
a pair of bearings mounted on said drive arm; and a drive rail fixedly mounted on a portion of said work station, said pair of bearings being disposed on either side of said drive rail;
such that said drive rail is adapted to slide out from between said bearings.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/592,152 US4042119A (en) | 1975-06-30 | 1975-06-30 | Workpiece positioning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1037506A true CA1037506A (en) | 1978-08-29 |
Family
ID=24369520
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA255,238A Expired CA1037506A (en) | 1975-06-30 | 1976-06-18 | Workpiece positioning apparatus |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4042119A (en) |
| JP (1) | JPS526084A (en) |
| CA (1) | CA1037506A (en) |
| DE (1) | DE2628818C2 (en) |
| FR (1) | FR2316042A1 (en) |
| GB (1) | GB1506363A (en) |
| IT (1) | IT1063341B (en) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4141456A (en) * | 1976-08-30 | 1979-02-27 | Rca Corp. | Apparatus and method for aligning wafers |
| JPS583298Y2 (en) * | 1977-10-11 | 1983-01-20 | 富士通株式会社 | Substrate holder for electron beam exposure |
| JPS5844144U (en) * | 1981-09-16 | 1983-03-24 | 日本精工株式会社 | XY table connection mechanism |
| JPS59129633A (en) * | 1983-01-08 | 1984-07-26 | Canon Inc | X-y stage |
| JPS6035294U (en) * | 1983-08-18 | 1985-03-11 | セイコーインスツルメンツ株式会社 | XY sample stage device |
| JPS61188524U (en) * | 1985-05-17 | 1986-11-25 | ||
| US4818169A (en) * | 1985-05-17 | 1989-04-04 | Schram Richard R | Automated wafer inspection system |
| DE3620969A1 (en) * | 1985-06-24 | 1987-01-02 | Canon Kk | PRECISION FEED MECHANISM |
| JPH01169394A (en) * | 1987-12-25 | 1989-07-04 | Hitachi Ltd | Xy stage moving mechanism for vacuum container |
| JP2960423B2 (en) * | 1988-11-16 | 1999-10-06 | 株式会社日立製作所 | Sample moving device and semiconductor manufacturing device |
| US5345170A (en) | 1992-06-11 | 1994-09-06 | Cascade Microtech, Inc. | Wafer probe station having integrated guarding, Kelvin connection and shielding systems |
| US6313649B2 (en) | 1992-06-11 | 2001-11-06 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
| US6380751B2 (en) | 1992-06-11 | 2002-04-30 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
| US5561377A (en) | 1995-04-14 | 1996-10-01 | Cascade Microtech, Inc. | System for evaluating probing networks |
| US6002263A (en) | 1997-06-06 | 1999-12-14 | Cascade Microtech, Inc. | Probe station having inner and outer shielding |
| US6445202B1 (en) | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
| US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
| US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
| WO2003020467A1 (en) | 2001-08-31 | 2003-03-13 | Cascade Microtech, Inc. | Optical testing device |
| US6777964B2 (en) | 2002-01-25 | 2004-08-17 | Cascade Microtech, Inc. | Probe station |
| US6847219B1 (en) | 2002-11-08 | 2005-01-25 | Cascade Microtech, Inc. | Probe station with low noise characteristics |
| US7250779B2 (en) | 2002-11-25 | 2007-07-31 | Cascade Microtech, Inc. | Probe station with low inductance path |
| US6861856B2 (en) | 2002-12-13 | 2005-03-01 | Cascade Microtech, Inc. | Guarded tub enclosure |
| US7221172B2 (en) | 2003-05-06 | 2007-05-22 | Cascade Microtech, Inc. | Switched suspended conductor and connection |
| US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
| US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
| US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
| EP1754072A2 (en) | 2004-06-07 | 2007-02-21 | CASCADE MICROTECH, INC. (an Oregon corporation) | Thermal optical chuck |
| US7330041B2 (en) | 2004-06-14 | 2008-02-12 | Cascade Microtech, Inc. | Localizing a temperature of a device for testing |
| US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
| US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
| DE102005045680A1 (en) * | 2005-09-24 | 2007-04-05 | Edmund Uschkurat | Device for aligning an object along an X-, Y- or Z-axis used e.g. in the pharmaceutical industry comprises a base plate and tables adjustable along the X-axis, Y-axis and the Z-axis |
| US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
| US8235367B2 (en) * | 2009-06-10 | 2012-08-07 | Seagate Technology Llc | Selectively positioning a workpiece |
| JP6456768B2 (en) * | 2015-05-18 | 2019-01-23 | 株式会社ディスコ | Processing equipment |
| DE102017102653A1 (en) | 2017-02-10 | 2018-08-16 | Schunk Gmbh & Co. Kg Spann- Und Greiftechnik | parallel kinematic |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2756857A (en) * | 1951-05-16 | 1956-07-31 | Willard H Mccorkle | Positioning device |
| FR1187997A (en) * | 1959-01-20 | 1959-09-17 | Commissariat Energie Atomique | Magnetic transmission remote manipulator for manipulation inside sealed enclosures |
| US3517624A (en) * | 1968-04-29 | 1970-06-30 | Texas Instruments Inc | Movable table surface and means of positioning same |
| US3525140A (en) * | 1968-05-22 | 1970-08-25 | Ibm | Micro-motion device |
| US3733484A (en) * | 1969-10-29 | 1973-05-15 | Walter C Mc Crone Associates I | Control for electron microprobe |
| US3779400A (en) * | 1972-02-14 | 1973-12-18 | Univ Iowa State Res Found Inc | Micromanipulator system |
| FR2202759B1 (en) * | 1972-10-13 | 1980-02-15 | Thomson Csf | |
| FR2206542B1 (en) * | 1972-11-15 | 1976-10-29 | Thomson Csf | |
| DE2415186C3 (en) * | 1974-03-29 | 1979-04-12 | Deutsche Forschungs- Und Versuchsanstalt Fuer Luft- Und Raumfahrt E.V., 5300 Bonn | Cross table for manipulations |
-
1975
- 1975-06-30 US US05/592,152 patent/US4042119A/en not_active Expired - Lifetime
-
1976
- 1976-05-17 FR FR7615566A patent/FR2316042A1/en active Granted
- 1976-06-09 GB GB23766/76A patent/GB1506363A/en not_active Expired
- 1976-06-14 IT IT24249/76A patent/IT1063341B/en active
- 1976-06-18 JP JP51071275A patent/JPS526084A/en active Granted
- 1976-06-18 CA CA255,238A patent/CA1037506A/en not_active Expired
- 1976-06-26 DE DE2628818A patent/DE2628818C2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1063341B (en) | 1985-02-11 |
| DE2628818A1 (en) | 1977-01-27 |
| DE2628818C2 (en) | 1982-10-28 |
| FR2316042A1 (en) | 1977-01-28 |
| GB1506363A (en) | 1978-04-05 |
| JPS5739512B2 (en) | 1982-08-21 |
| FR2316042B1 (en) | 1978-08-25 |
| US4042119A (en) | 1977-08-16 |
| JPS526084A (en) | 1977-01-18 |
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