CA1221335A - Rotatable sputtering apparatus - Google Patents
Rotatable sputtering apparatusInfo
- Publication number
- CA1221335A CA1221335A CA000460255A CA460255A CA1221335A CA 1221335 A CA1221335 A CA 1221335A CA 000460255 A CA000460255 A CA 000460255A CA 460255 A CA460255 A CA 460255A CA 1221335 A CA1221335 A CA 1221335A
- Authority
- CA
- Canada
- Prior art keywords
- tubular member
- cathode
- sputtering
- sputtering apparatus
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Abstract
ABSTRACT
A magnetron cathode 11 for sputter-coating non-planar substrates S, which includes a rotatable elongated tubular member 16 having a layer of the coating material 20 to be sputtered applied to the outer surface thereof, and magnetic menas 55 mounted in said tubular member, said tubular member being contoured longitudinally to provide a non-cylindrical sputtering surface 17, 18, 19.
A magnetron cathode 11 for sputter-coating non-planar substrates S, which includes a rotatable elongated tubular member 16 having a layer of the coating material 20 to be sputtered applied to the outer surface thereof, and magnetic menas 55 mounted in said tubular member, said tubular member being contoured longitudinally to provide a non-cylindrical sputtering surface 17, 18, 19.
Description
I
ROTATABLE SPUTTERING APPARATUS
Background of the Invention The present invention relates broadly to magnetron cathode sputtering apparatus and, in particular, to an improved rotatable cathode construction In U.S. Patent Jo. 4,356,073, issued October 26, 1982, which is assigned to the same assignee as the present application, there is disclosed a rotatable magnetron cathode operating in an evocable coating chamber, said cathode comprising an elongated cylindrical tubular member of substantially the same diameter throughout its length and provided with a layer of the coating material to be sputtered onto substantially planar substrates as they move relative thereto.
This invention contemplates a significantly different type of rotatable magnetron cathode in which the elongated tubular member is axially contoured to effect the sputter coating of non-planar substrates that are shaped to substantially conform to the contour of the tubular member.
Another object of the invention is to provide a rotatable magnetron cathode in which the elongated tubular member is provided with a longitudinal curved sputtering surface for sputter-coating substrate surfaces having substantially the same curvature.
nether object of the invention to provide a rotatable magnetron cathode of substantially barrel-like configuration that is relatively wider at the middle portion than at its ends.
A further object of the invention is to provide a rotatable magnetron cathode having a non-clyindrical profile and which is of utility in the sputter-coating of bent or curved surfaces.
I
Summary mention Described is a sputtering cathode for sputter coating non-planar substrates, comprising a rotatable elongated tubular member having a layer of coating material to be sputtered applied to the outer surface thereof, character-iced in that said tubular member is contoured longitudin-ally to provide a non-cylindrical sputtering surface.
In addition, also described is a magnetron cathode sputtering apparatus comprising an evocable coating chamber characterized in that the cathode as described above is mounted in the sputtering apparatus wherein magnetic means is mounted in said -tubular member, further comprising means for rotating said tubular member about its longitudinal axis, and means for moving the substrates to be coated relative to said tubular member in a direction at right angles to the longitudinal axis thereof.
Brief Description of thy Fig. 1 is a vertical longitudinal section through a coating chamber in which is mounted a rotatable magnetron cathode constructed in accordance with the present invention.
Fig. 2 is a vertical transverse section taken substantially on fine 2-2 of Fig. 1.
Fig. 3 is a vertical transverse section taken substantially on line 3-3 of Fig. 1, and Fig. 4 is a vertical transverse section Tyson substantially on line I of Fig 1 Description of Preferred Embo mint Referring to the drawings, the numeral 10 designates an evocable coating chamber awn 11 the rotatable magnetron cathode provided by the invention mounted therein.
The coating chamber 10 is preferably rectangular and is composed of a bottom wall 12, top wall 13, opposite end walls 14 and 15 and side walls (not shown), all of said walls being secured together in sealing relation to provide a hermetically staled chamber The cathode 11 comprises an elongated tubular member 16 axially contoured for sputter coating non-planar substrates S. As shown in the drawings, the tubular member is of substantially barrel-like configuration formed with a relatively wide central portion 17 merging into tapering en portions 18 and 19~ A coating 20 of a selected material to by sputtered is applied to the outer surface of the tubular member.
A vacuum pump 21 is provided to evacuate the coating chamber 10 to the desired pressure. Should it be desired to inject gases inn the chamber, it may be done through conduit 22 controlled by a valve 23.
The tubular member 16 is horizontally supported at its opposite ends by -the flanges 24 and 25 formed integral with the shafts 26 and 27 respectively. The tubular member may be secured to the flanges 24 and 25 by screws 28 and 29 respectively. The shafts 26 and 27 are rotatable received in bearing blocks 30 and 31 respectively secured to the -top wall 13 of the coating chamber by screws aye. The bearing blocks 30 and 31 axe maintained spaced from the top wall 13 of the coating chamber by strips of insulating material 32 and 33 respectively.
The openings in the bearing blocks 30 and 31 are slightly larger in diameter than the related shafts 26 and 27 to provide relatively shallow annular channels 34 and 35 respectively surrounding said shafts. The annular channels 34 and 35 are closed at their opposite sides by bearing seals 36 and 37, said bearing seals also maintaining the shafts centrally in the openings in the bearing blocs.
Insulating washers 40 and 41 are provided between the flanges 24 and 25 on shafts 26 and 27 and the bearing blocks 30 and 31 respectively to prevent any cooling medium delivered to the tubular member from entering the coating chamber.
~22~33~
The shaft 25 is provided with a pair of horizontal ducts I and 43 that lead from the annular channel 34 and communicate with the tubular member 11. Formed in the bearing block 30 is a Shari vertical duct 44 leading from -the channel 34 to an inlet pipe 45 threaded into the bearing block. A cooling medium, such as water, is introduced -through -the pipe 45 and duct 44 into the channel 34 from which it flows through ducts 42 and 43 into the tubular member The cooling medium circulates through the tubular member and exists from the opposite end Thor through horizontal ducts 46 and 47 in shaft 27 into channel 35 and thence through a vertical duct 48 in bearing block 31 to an outlet pipe 49.
The tubular member 11 it driven prom one end by a motor 50 mounted upon the top wall 13 of the of the coating chamber, said motor being connected through an insulated coupling 51 to a vertical shaft 52 having keyed thereto a worm 53 meshing with a worm gear 54 fixed to the related shaft 26.
The magnetic means 55 comprises an array of U-shaped permanent magnets 56 arranged in two straight parallel rows A and B (Fig. I that extend lengthwise within the lower portion of -the tubular member, The magnets in each row are aligned with one another, with the magnets in one few being disposed alternately with and overlapping the magnets in the other row. Also the magnets in the -two rows and are arranged at an angle relative to one another as shown in Fig. 4. The outer legs 57 of the magnets 56 in each row of magnets engage a longitudinally extending, relatively narrow strip 58 of a suitable magnetic material while the immure legs 59 of the magnets engage a similar magnetic strip 60 arranged parallel with the strips 58.
The permanent magnets are secured to the magnetic strips 58 and 60 by screws 61 and 62 respectively The magnetic strips 58 and 60 are contoured lengthwise to conform to the axial curvature of the tubular member and I
the bottom surfaces 63 thereof are shaped to conform to the transverse curvature of the inner surface of said tubular member The U-shaped magnets 56 are preferably disposed so that the north poles thereof engage the outer magnetic strip 58 and the south poles engage the magnetic strip 60, It will be appreciated, however, that other types of permanent magnets or even electromagnets may be substituted for the U-shaped magnets.
The magnets 56 are positioned closely adjacent the inner surface of the tubular member and are supported from a horizontal rod 64 by hanger straps 65, said rod being supported at its opposite ends in the bearing blocks 26 and 27, As stated above, the substrates S to be coated have their upper surfaces shaped to conform substantially to the longitudinal contour of the tubular member 11. lye substrates are supported horizontally and moved beneath the tubular member to receive the coating material sputtered therefrom by any suitable conveying means such as by roller 66 and 67 keyed to shafts 68 journal Ed in bearing supports 69 and 70 on the Boston wall of the coating chamber.
A cathode potential sufficient to cause sputtering to occur is supplied to the tubular member 16 from a DO
power source (not shown) through a power fine 71 connected to an electrical contact 72 having sliding contact with said tubular member. The apparatus may be grounded in any suitable manner.
It will be understood -that changes and modifications may be made without departing from the spirit or scope of the appended claims.
ROTATABLE SPUTTERING APPARATUS
Background of the Invention The present invention relates broadly to magnetron cathode sputtering apparatus and, in particular, to an improved rotatable cathode construction In U.S. Patent Jo. 4,356,073, issued October 26, 1982, which is assigned to the same assignee as the present application, there is disclosed a rotatable magnetron cathode operating in an evocable coating chamber, said cathode comprising an elongated cylindrical tubular member of substantially the same diameter throughout its length and provided with a layer of the coating material to be sputtered onto substantially planar substrates as they move relative thereto.
This invention contemplates a significantly different type of rotatable magnetron cathode in which the elongated tubular member is axially contoured to effect the sputter coating of non-planar substrates that are shaped to substantially conform to the contour of the tubular member.
Another object of the invention is to provide a rotatable magnetron cathode in which the elongated tubular member is provided with a longitudinal curved sputtering surface for sputter-coating substrate surfaces having substantially the same curvature.
nether object of the invention to provide a rotatable magnetron cathode of substantially barrel-like configuration that is relatively wider at the middle portion than at its ends.
A further object of the invention is to provide a rotatable magnetron cathode having a non-clyindrical profile and which is of utility in the sputter-coating of bent or curved surfaces.
I
Summary mention Described is a sputtering cathode for sputter coating non-planar substrates, comprising a rotatable elongated tubular member having a layer of coating material to be sputtered applied to the outer surface thereof, character-iced in that said tubular member is contoured longitudin-ally to provide a non-cylindrical sputtering surface.
In addition, also described is a magnetron cathode sputtering apparatus comprising an evocable coating chamber characterized in that the cathode as described above is mounted in the sputtering apparatus wherein magnetic means is mounted in said -tubular member, further comprising means for rotating said tubular member about its longitudinal axis, and means for moving the substrates to be coated relative to said tubular member in a direction at right angles to the longitudinal axis thereof.
Brief Description of thy Fig. 1 is a vertical longitudinal section through a coating chamber in which is mounted a rotatable magnetron cathode constructed in accordance with the present invention.
Fig. 2 is a vertical transverse section taken substantially on fine 2-2 of Fig. 1.
Fig. 3 is a vertical transverse section taken substantially on line 3-3 of Fig. 1, and Fig. 4 is a vertical transverse section Tyson substantially on line I of Fig 1 Description of Preferred Embo mint Referring to the drawings, the numeral 10 designates an evocable coating chamber awn 11 the rotatable magnetron cathode provided by the invention mounted therein.
The coating chamber 10 is preferably rectangular and is composed of a bottom wall 12, top wall 13, opposite end walls 14 and 15 and side walls (not shown), all of said walls being secured together in sealing relation to provide a hermetically staled chamber The cathode 11 comprises an elongated tubular member 16 axially contoured for sputter coating non-planar substrates S. As shown in the drawings, the tubular member is of substantially barrel-like configuration formed with a relatively wide central portion 17 merging into tapering en portions 18 and 19~ A coating 20 of a selected material to by sputtered is applied to the outer surface of the tubular member.
A vacuum pump 21 is provided to evacuate the coating chamber 10 to the desired pressure. Should it be desired to inject gases inn the chamber, it may be done through conduit 22 controlled by a valve 23.
The tubular member 16 is horizontally supported at its opposite ends by -the flanges 24 and 25 formed integral with the shafts 26 and 27 respectively. The tubular member may be secured to the flanges 24 and 25 by screws 28 and 29 respectively. The shafts 26 and 27 are rotatable received in bearing blocks 30 and 31 respectively secured to the -top wall 13 of the coating chamber by screws aye. The bearing blocks 30 and 31 axe maintained spaced from the top wall 13 of the coating chamber by strips of insulating material 32 and 33 respectively.
The openings in the bearing blocks 30 and 31 are slightly larger in diameter than the related shafts 26 and 27 to provide relatively shallow annular channels 34 and 35 respectively surrounding said shafts. The annular channels 34 and 35 are closed at their opposite sides by bearing seals 36 and 37, said bearing seals also maintaining the shafts centrally in the openings in the bearing blocs.
Insulating washers 40 and 41 are provided between the flanges 24 and 25 on shafts 26 and 27 and the bearing blocks 30 and 31 respectively to prevent any cooling medium delivered to the tubular member from entering the coating chamber.
~22~33~
The shaft 25 is provided with a pair of horizontal ducts I and 43 that lead from the annular channel 34 and communicate with the tubular member 11. Formed in the bearing block 30 is a Shari vertical duct 44 leading from -the channel 34 to an inlet pipe 45 threaded into the bearing block. A cooling medium, such as water, is introduced -through -the pipe 45 and duct 44 into the channel 34 from which it flows through ducts 42 and 43 into the tubular member The cooling medium circulates through the tubular member and exists from the opposite end Thor through horizontal ducts 46 and 47 in shaft 27 into channel 35 and thence through a vertical duct 48 in bearing block 31 to an outlet pipe 49.
The tubular member 11 it driven prom one end by a motor 50 mounted upon the top wall 13 of the of the coating chamber, said motor being connected through an insulated coupling 51 to a vertical shaft 52 having keyed thereto a worm 53 meshing with a worm gear 54 fixed to the related shaft 26.
The magnetic means 55 comprises an array of U-shaped permanent magnets 56 arranged in two straight parallel rows A and B (Fig. I that extend lengthwise within the lower portion of -the tubular member, The magnets in each row are aligned with one another, with the magnets in one few being disposed alternately with and overlapping the magnets in the other row. Also the magnets in the -two rows and are arranged at an angle relative to one another as shown in Fig. 4. The outer legs 57 of the magnets 56 in each row of magnets engage a longitudinally extending, relatively narrow strip 58 of a suitable magnetic material while the immure legs 59 of the magnets engage a similar magnetic strip 60 arranged parallel with the strips 58.
The permanent magnets are secured to the magnetic strips 58 and 60 by screws 61 and 62 respectively The magnetic strips 58 and 60 are contoured lengthwise to conform to the axial curvature of the tubular member and I
the bottom surfaces 63 thereof are shaped to conform to the transverse curvature of the inner surface of said tubular member The U-shaped magnets 56 are preferably disposed so that the north poles thereof engage the outer magnetic strip 58 and the south poles engage the magnetic strip 60, It will be appreciated, however, that other types of permanent magnets or even electromagnets may be substituted for the U-shaped magnets.
The magnets 56 are positioned closely adjacent the inner surface of the tubular member and are supported from a horizontal rod 64 by hanger straps 65, said rod being supported at its opposite ends in the bearing blocks 26 and 27, As stated above, the substrates S to be coated have their upper surfaces shaped to conform substantially to the longitudinal contour of the tubular member 11. lye substrates are supported horizontally and moved beneath the tubular member to receive the coating material sputtered therefrom by any suitable conveying means such as by roller 66 and 67 keyed to shafts 68 journal Ed in bearing supports 69 and 70 on the Boston wall of the coating chamber.
A cathode potential sufficient to cause sputtering to occur is supplied to the tubular member 16 from a DO
power source (not shown) through a power fine 71 connected to an electrical contact 72 having sliding contact with said tubular member. The apparatus may be grounded in any suitable manner.
It will be understood -that changes and modifications may be made without departing from the spirit or scope of the appended claims.
Claims (11)
1. A sputtering cathode for sputter-coating non-planar substrates, comprising a rotatable elongated tubular member having a layer of coating material to be sputtered applied to the outer surface thereof, characterized in that said tubular member is contoured longitudinally to provide a non-cylindrical sputtering surface.
2. A sputtering cathode as claimed in claim 1, in which said tubular member is of substantially barrel-like configuration.
3. A sputtering cathode as claimed in claim 1, in which said tubular member has a non-cylindrical profile.
4. A sputtering cathode as claimed in claim 1, in which said tubular member varies in diameter longitudinally thereof.
5. A sputtering cathode as claimed in claim 1, including magnetic means mounted in said tubular member.
6. A sputtering cathode as claimed in claim 5, in which said magnetic means extends lengthwise of said tubular member and is contoured to conform to the contour of said tubular member.
7. A magnetron cathode sputtering apparatus comprising an evacuable coating chamber, characterized in that the cathode of claim 1 is mounted in the sputtering apparatus wherein magnetic means is mounted in said tubular member, further comprising means for rotating said tubular member about its longitudinal axis, and means for moving the substrates to be coated relative to said tubular member in a direction at right angles to the longitudinal axis thereof.
8. A magnetron cathode sputtering apparatus as claimed in claim 7, in which said tubular member is of substantially barrel-like configuration.
9. A magnetron cathode sputtering apparatus as claimed in claim 77 in which said tubular member has a non-cylindrical profile.
10. A magnetron cathode sputtering apparatus as claimed in claim 7, in which said tubular member varies in diameter longitudinally thereof.
11. A magnetron cathode sputtering apparatus as claimed in claim 7, in which said magnetic means extends lengthwise of said tubular member and is contoured to conform to the contour of said tubular member.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/523,969 US4445997A (en) | 1983-08-17 | 1983-08-17 | Rotatable sputtering apparatus |
US523,969 | 1983-08-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1221335A true CA1221335A (en) | 1987-05-05 |
Family
ID=24087180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000460255A Expired CA1221335A (en) | 1983-08-17 | 1984-08-02 | Rotatable sputtering apparatus |
Country Status (11)
Country | Link |
---|---|
US (1) | US4445997A (en) |
EP (1) | EP0152472A1 (en) |
JP (1) | JPS61500025A (en) |
AU (1) | AU574723B2 (en) |
BR (1) | BR8407018A (en) |
CA (1) | CA1221335A (en) |
DK (1) | DK170685A (en) |
FI (1) | FI79917C (en) |
HU (1) | HU196011B (en) |
NO (1) | NO851458L (en) |
WO (1) | WO1985000925A1 (en) |
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US5200049A (en) * | 1990-08-10 | 1993-04-06 | Viratec Thin Films, Inc. | Cantilever mount for rotating cylindrical magnetrons |
US5100527A (en) * | 1990-10-18 | 1992-03-31 | Viratec Thin Films, Inc. | Rotating magnetron incorporating a removable cathode |
US5106474A (en) * | 1990-11-21 | 1992-04-21 | Viratec Thin Films, Inc. | Anode structures for magnetron sputtering apparatus |
CA2108673A1 (en) * | 1991-04-19 | 1992-10-20 | John Marshall | Method and apparatus for linear magnetron sputtering |
US5262032A (en) * | 1991-05-28 | 1993-11-16 | Leybold Aktiengesellschaft | Sputtering apparatus with rotating target and target cooling |
US5620577A (en) * | 1993-12-30 | 1997-04-15 | Viratec Thin Films, Inc. | Spring-loaded mount for a rotatable sputtering cathode |
US5567289A (en) * | 1993-12-30 | 1996-10-22 | Viratec Thin Films, Inc. | Rotating floating magnetron dark-space shield and cone end |
US5571393A (en) * | 1994-08-24 | 1996-11-05 | Viratec Thin Films, Inc. | Magnet housing for a sputtering cathode |
US5518592A (en) * | 1994-08-25 | 1996-05-21 | The Boc Group, Inc. | Seal cartridge for a rotatable magnetron |
US5445721A (en) * | 1994-08-25 | 1995-08-29 | The Boc Group, Inc. | Rotatable magnetron including a replacement target structure |
TW347369B (en) * | 1996-12-17 | 1998-12-11 | Asahi Glass Co Ltd | Organic substrate provided with a light absorptive antireflection film and process for production |
US6365010B1 (en) | 1998-11-06 | 2002-04-02 | Scivac | Sputtering apparatus and process for high rate coatings |
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US20050224343A1 (en) * | 2004-04-08 | 2005-10-13 | Richard Newcomb | Power coupling for high-power sputtering |
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ES2320366T3 (en) * | 2004-10-18 | 2009-05-21 | Bekaert Advanced Coatings | FLAT TERMINAL BLOCK FOR CARRYING A ROTATING IONIC SPRAYING MATERIAL. |
US20060096855A1 (en) * | 2004-11-05 | 2006-05-11 | Richard Newcomb | Cathode arrangement for atomizing a rotatable target pipe |
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US20060278524A1 (en) * | 2005-06-14 | 2006-12-14 | Stowell Michael W | System and method for modulating power signals to control sputtering |
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US7842355B2 (en) * | 2005-11-01 | 2010-11-30 | Applied Materials, Inc. | System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties |
US20070095281A1 (en) * | 2005-11-01 | 2007-05-03 | Stowell Michael W | System and method for power function ramping of microwave liner discharge sources |
US8273222B2 (en) * | 2006-05-16 | 2012-09-25 | Southwest Research Institute | Apparatus and method for RF plasma enhanced magnetron sputter deposition |
KR20090029213A (en) * | 2006-06-19 | 2009-03-20 | 베카에르트 어드벤스드 코팅스 | Insert piece for an end-block of a sputtering installation |
US8277617B2 (en) * | 2007-08-14 | 2012-10-02 | Southwest Research Institute | Conformal magnetron sputter deposition |
DE102008018609B4 (en) * | 2008-04-11 | 2012-01-19 | Von Ardenne Anlagentechnik Gmbh | Drive end block for a rotating magnetron |
US8182662B2 (en) * | 2009-03-27 | 2012-05-22 | Sputtering Components, Inc. | Rotary cathode for magnetron sputtering apparatus |
US9388490B2 (en) | 2009-10-26 | 2016-07-12 | General Plasma, Inc. | Rotary magnetron magnet bar and apparatus containing the same for high target utilization |
US8747631B2 (en) * | 2010-03-15 | 2014-06-10 | Southwest Research Institute | Apparatus and method utilizing a double glow discharge plasma for sputter cleaning |
US8398834B2 (en) | 2010-04-02 | 2013-03-19 | NuvoSun, Inc. | Target utilization improvement for rotatable magnetrons |
EP2788523A1 (en) * | 2011-12-09 | 2014-10-15 | Applied Materials, Inc. | Rotatable sputter target |
GB201200574D0 (en) * | 2012-01-13 | 2012-02-29 | Gencoa Ltd | In-vacuum rotational device |
CN103074587B (en) * | 2013-02-01 | 2014-10-15 | 湘潭宏大真空技术股份有限公司 | Adjusting device and adjusting method for large-area continuous magnetron sputtering coating uniformity |
DE102021129523A1 (en) | 2021-11-12 | 2023-05-17 | VON ARDENNE Asset GmbH & Co. KG | Magnet system, sputtering device and housing cover |
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DE3069702D1 (en) * | 1980-08-08 | 1985-01-10 | Battelle Development Corp | Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus |
US4290877A (en) * | 1980-09-08 | 1981-09-22 | The United States Of America As Represented By The Secretary Of The Interior | Sputtering apparatus for coating elongated tubes and strips |
US4356073A (en) * | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4376025A (en) * | 1982-06-14 | 1983-03-08 | Battelle Development Corporation | Cylindrical cathode for magnetically-enhanced sputtering |
-
1983
- 1983-08-17 US US06/523,969 patent/US4445997A/en not_active Expired - Lifetime
-
1984
- 1984-08-02 CA CA000460255A patent/CA1221335A/en not_active Expired
- 1984-08-15 HU HU843554A patent/HU196011B/en not_active IP Right Cessation
- 1984-08-15 BR BR8407018A patent/BR8407018A/en not_active IP Right Cessation
- 1984-08-15 AU AU33907/84A patent/AU574723B2/en not_active Ceased
- 1984-08-15 JP JP59503242A patent/JPS61500025A/en active Pending
- 1984-08-15 EP EP84903242A patent/EP0152472A1/en active Pending
- 1984-08-15 WO PCT/US1984/001299 patent/WO1985000925A1/en active IP Right Grant
-
1985
- 1985-04-12 NO NO851458A patent/NO851458L/en unknown
- 1985-04-16 FI FI851516A patent/FI79917C/en not_active IP Right Cessation
- 1985-04-16 DK DK170685A patent/DK170685A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DK170685D0 (en) | 1985-04-16 |
FI79917C (en) | 1990-03-12 |
FI851516L (en) | 1985-04-16 |
HU196011B (en) | 1988-08-29 |
EP0152472A1 (en) | 1985-08-28 |
BR8407018A (en) | 1985-07-30 |
NO851458L (en) | 1985-04-12 |
FI79917B (en) | 1989-11-30 |
WO1985000925A1 (en) | 1985-02-28 |
JPS61500025A (en) | 1986-01-09 |
AU3390784A (en) | 1985-03-12 |
AU574723B2 (en) | 1988-07-14 |
HUT37294A (en) | 1985-11-28 |
DK170685A (en) | 1985-04-16 |
FI851516A0 (en) | 1985-04-16 |
US4445997A (en) | 1984-05-01 |
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