CA1301239C - Method and arrangement for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device - Google Patents

Method and arrangement for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device

Info

Publication number
CA1301239C
CA1301239C CA000561505A CA561505A CA1301239C CA 1301239 C CA1301239 C CA 1301239C CA 000561505 A CA000561505 A CA 000561505A CA 561505 A CA561505 A CA 561505A CA 1301239 C CA1301239 C CA 1301239C
Authority
CA
Canada
Prior art keywords
magnetic field
field generating
generating device
movement
spiral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA000561505A
Other languages
French (fr)
Inventor
Hans Veltrop
Harald Wesemeyer
Boudewijn J.A.M. Buil
Simon Boelens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hauzer Holding BV
Original Assignee
Hauzer Holding BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from NL8700621A external-priority patent/NL8700621A/en
Priority claimed from NL8700619A external-priority patent/NL8700619A/en
Application filed by Hauzer Holding BV filed Critical Hauzer Holding BV
Application granted granted Critical
Publication of CA1301239C publication Critical patent/CA1301239C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A B S T R A C T
Method and device for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device. To prevent grooves to occur on the cathode surface means are provided to add a further movement to the circular base movement of the magnetic field generating device by which substantially the whole surface area to be consumed is scanned by the arc spot.

Description

13~239 Method ~nd arran~emen~ f~r mechanlcally moving of a magnetic fi~ld ~enerating devlce in a cathode arc discharae evaporatina device The present invention re.lates to a method for mechanically moving a magnetic field generating device along a path near a cathode plate, said movement comprising a base rotation. Such a device is known wo-A-85/03954 published September 12, 1985 in which a magnetic field generating device is mechanically rotated. Although the axis of the magnetic field generating device does not coincide with the axis of rotation the arc controlled by this magnetic field generating device will follow a substantially circular path. Because of this only along said circular path material of the target cathode will evaporize to the substrate. This means that the cathode might be used (eroded) along said circular path, whilst on other spots of said cathode sufficient material is left. In other words the target surface is very unevenly used.
The invention aims to obviate this drawback and to provide a method by which it is possible to more evenly use the target surface. According to the invention this is realized in that to the base rotation a further movement is added. This movement can comprise all movements known in the art, but preferably this movement is a further rotational movement having an amplitude being smaller than that of said base rotation. It is also preferred to have such further movement that the magnetic field generating device follows a spiral-like path.
Various aspects of this invention are as follows:
Method for mechanically moving a magnetic field generating device along a path near a cathode plate comprising:
rotating ~aid magnetic field generating device relative to said cathode plate according to a first rotational movement;

~., ~ `~,, la simultaneously moving said magnetic field generating device according to a second movement; and wherein said path created by said first and second mov ments creates an erosion pattern over a substantial portion of said cathode plate.
A method of the type set out hereinbefore, wherein said second movement of said magnetic field generating device is a linear movement changing the amplitude of said first rotational movement in such a way that said path is a spiral.
An arrangement for carrying out the method according to claim 3 comprising a base plate having a spiral-like groove and a support member being rotatable with respect to the base plate having pin means being slidable engageable in said groove and being connected with the magnetic field generating device.
Arrangement for mechanically moving a magnetic field generating device along a path near a cathode plate by means of first and second rotational movements, comprising a magnetic field generating device moveable with regard to a cathode plat~ of a cathode arc evaporizing device, arranged eccentrically with regard to the axis of a gear, being able to carry out said second rotation movement, said gear being engageable with a gear ring, being able to carry out the second rotation movement.
It is remarked that from GB-A-2,163,458 published February 26, 1986 it is known to have a magnetic field describing a spiral-like path. However, this spiral-like path is realized without any mechanical means. Inthe embodiment according to the British specification only coils are sued. This is a considerable drawback because by controlling said coils first of all the spiral-like movement has to be obtained and furthermore the magnetic field has also to be optimal in the sense of controlling the arc spot movement. It is of course not possible to optimalize both requirements with one magnetic field generating device only. By using the ~.~
li~

lb 13~1239 mechanically controlled magnetic field generating device according to the invention both functions have been separated and each can be optimized as such, so that it is possible to obtain maximu~ results in both controlling the movement of the ~agnetic field qenerating device and controlling the arc spot on the target surface.

1~ ~

~3Q1~3g It has been found that at describing a spiral-like movement the same lingering period is obtained if the radius vector of a point on the spiral is about proportional to the square root of the angle of the radius vector, in other words P = ~ ~ ~ b. In this expression p is the length of the radius with regard to the centre and ~ the angle.
To prevent the erosion of the target becoming more considerable in the centre of the cathode than near its edge, optimum results are obtained if ~ = ~ ~ + b, wherein 2 ~ x ~ 2,5. To prevent a more considerable erosion in the centre of the cathode than at its edge, the magnetic field has to move much faster near the centre than at its edge. To vary the speed of the movement with the distance from the centre to keep the lingering time of the arc as constant as possible p is a higher order goniometric function, e.g.~ = f(~ )t. Besides this spiral-like movement, the magnetic field can also describe a further periodical movement sub-stantially perpendicular to the target surface. This can compriserotation in a magnetic field being not rotational symmetric.
The invention also relates to an arrangement for carrying out the method as described above, more particular being able to perform a base rotation to which a further rotation, having a smaller amplitude, is added. This arrangement comprises a magnetic field generating device moveable with regard to the cathode plate of P cathode arc evaporation device excentrically arranged with regard to the centre of a gear, which can carry out said further rotational movement, said gear being in en-gagement with a gear ring, being able to perform the base rotation. By having both gears independently drivable all places on the cathode sur-face can be touched by the arc such that the cathode can be consumed evenly. A preferred means for controlling the drives of both gears com-prises a microprocessor means. An arrangement for carrying out above method wherein a spiral-like path is described by the magnetic field generating device comprises according to a prefered embodiment a base plate having a spiral-like groove and a support member having slidable arranged pin means, being engageable in said grooves, being connected with said magnetic field generating device. This base plate can also be rotatable. According to a preferred embodiment this base plate is ar-ranged rotatably in a sense opposite to the sense of movement of thesupport member. By this it is possible to have the arc spot describe several times a spiral-like path over the cathode surface. Said spiral-like path being different everytime.

~L3(~1~39 The magnetic field generating device can comprise electromagnetic coils possibly controlled by microprocessor means. These coils can perform a modulating movement of the arc trajectory.
The invention will be further elucidated with reference to embodiments described below which are given as example only and shown in the drawing, in which:
Fig~re 1 shows a detail of an cathode arc evaporating arrangement provided with magnetic field generating means, being moveable along a spiral-like path;
Figure 2 shows a detail of the magnetic field generating device from Fig. 1;
Figure 3 shows the path described by the magnetic field generating device for carrying out the method according to the invention;
Figure 4 shows a cross-section of a further embodiment of the arrangement shown in Fig. 1 and Figure 5 shows an embodiment in which another kind of movement is realized for the magnetic field generating device.
In Fig. 1 an arrangement is shown for mechanically moving a magnetic field generating device 13. This arrangement can be incorporated in the device according 25 to aforementioned WO-A-85/03954. In Fig. 1 the cathode plate is referred to with 11 and comprises material to be evaporized. For the substrate on which the material has to be deposited, or the anode reference is made to above WO-publication. However, it is of importance that the arc being drawn between the anode (not shown) and cathode plate 11 describes such a path over the cathode plate 11, that it is consumed as evenly as possible. To this end under cathode plate 11 at the site removed from the substrate to be processed, an arrangement is shown generally referred to with 12, comprising a magnetic field generating device 13 as well as means for describing a spiral-like path for the magnetic field ..

13(~1Z3$~
generating device. This means comprise a rotating slide rail 14 r in which the magnetic field generating device can be moved to and fro through a slot 15 (shown in Fig. 3~ in the direction of arrow 16. Pin 17 of the magnetic field generating member f its in a spiral-like groove 18 provided in base plate lg. This base plate can be stationary, but in the embodiment shown it i5 connected with drive means 29 through the gear 20. By relative movement of the rotating slide rail 14 and base plate 19 different paths can be ~130~Z39 obtained, of which as an example path 30 is shown in Fig. 3. It is clear that a spiral-like movement is described, wherein the surface of the cathode plate 11 is described as evenly as possible. Through the inward and outward movement of the magnetic field generating member by changing the relative movement of rotation of the slide rail ]4 and base plate 19, all of the cathode surface can be subsequently scanned with different kinds of spiral-like paths.
In Fig. 2 an example of a magnetic field generating member is shown. It comprises a soft iron part 22 and a ring pole 24 being ~0 integral and permanent magnet 23, the poles 23 and 24 having opposite polarity. Magnet 23 can comprise an assembly of different poles. It has to be understood that this is only an example and that it is possible to embody the magnetic field generating device as electromagnets or a combination of electromagnets and permanent magnets.
In Fig. 4 a further embodiment is shown in which the drawback has been removed that the magnetic field generating device 13 cannot be moved beyond the centre of the cathode plate 11. As is clear in Fig. I
shaft 25 obstructs any further movement of the magnetic field generating device 13 to the centre of the cathode plate 11. In the embodiment according to Fig. 4 the rotating slide rail is embodied as rotating cylindrical sleeve 26 being provided with a slot in the way shown in Figure 3. Now it is possible to provide the base plate 19 of a groove 18 extending through said plate 19. Also in this embodiment it is possible to use for magnetic field generating device 13 all magnets and magnets assemblies both permanent and electrical being known in the art. If electrical magnets are used all means known in the art for controlling them can be used, more particular microprocessors.
In Fig. 5 another arrangement is shown for moving a magnetic field generating device, in this figure indicated with 31. In the arrangement according to the Fig. 5 embodiment, magnetic field generating device 31 is mounted on gear wheel 32 excentrically with regard to the axis 33 of this gear wheel 32. Gear wheel 32 can rotate around shaft 34 and engages ring gear 35. ~ing gear 35 is connected through sleeve 36 pulleys 37, 38 and belt 39 with motor drive 40. Gear wheel 32 is connected through arm 41, shaft 42, pulleys 43 and 44 and belt 45 with motor 46. When motor 46 is blocked and motor 40 drives ring gear 35, magnetic field generating device 31 will perform a rotation around axis 33. When ring gear 35 is 13~239 blocked and motor 46 is driven magnetic field 8enerating device 3I will describe a movement comprising a combination of a base rotation (described by axis 33) and further rotation around axis 33. When driving both motors 46 and 40 simultaneously or intermittently in the same or opposite directions many kinds of movements are possible. Controlling of the motors is preferably realized by a microprocessor means schematical-ly referred to with 48. The magnetic field generating device 31 according to Fig. 5 com~rises an electromagnetical coil 5 surrounding a soft iron piece 3. In the centre of the soft iron piece a permanent mag-]O net 6 is provided having e.g. its north pole as shown in the figure.
By using one of the embodiments shown above the arc controlled bythe magnetic field generating device will not only describe a circular path but added to this movement a further path. By this groove-like erosion of only a limited portion of cathode plate ]] is obviated. Al-though the embodiments shown are preferred embodiments, it will be clearto a person skilled in the art that many modifications and other embodi-ments can be realired in which a further movement is added to a circular movement. It is envisaged that all these embodiments are within the scope of protection as described in the following claims.

Claims (18)

1. Method for mechanically moving a magnetic field generating device along a path near a cathode plate comprising:
rotating said magnetic field generating device relative to said cathode plate according to a first rotational movement;
simultaneously moving said magnetic field generating device according to a second movement: and wherein said path created by said first and second movements creates an erosion pattern over a substantial portion of said cathode plate.
2. Method according to claim 1, wherein said second movement of said magnetic field generating device is a rotational movement having an amplitude smaller than that of said first rotational movement.
3. Method according to claim 1, wherein said second movement of said magnetic field generating device is a linear movement changing the amplitude of said first rotational movement in such a way that said path is a spiral.
4. Method according to claim 3, wherein the radius vector on the spiral is substantially proportional with the square root of the angle of the radius vector.
5. Method according to claim 3, wherein said spiral satisfies p = a ? ? in which 2 ? X ? 2.5, p and ? being polycoordinates and ? being a function of time.
6. Method according to claim 3, wherein the rate of the movement of the magnetic field near the center of the spiral is larger than at the outer end of said spiral.
7. Method according to claim 6, characterized in that the rate of the movement is determined according to the amplitude of a goniometric function.
8. Method according to claim 1, wherein the perpendicular component of a magnetic field created by said magnetic field generating device describes a further periodic movement substantially perpendicular to a target surface, by which a cathode arc trajectory is changed.
9. Method according to claim 5, wherein the rate of said spiral is determined by a higher order function.
10. Method according to claim 1, further comprising rotating said magnetic field generating device around its axis.
11. Arrangement for carrying out the method according to claim 3 comprising a base plate having a spiral-like groove and a support member being rotatable with respect to the base plate having pin means being slidable engageable in said groove and being connected with the magnetic field generating device.
12. Device according to claim 11, wherein the base plate is rotatable in a direction opposite to the direction of movement of said support member.
13. Arrangement for carrying out the method according to claim 11, wherein the magnetic field generating device comprises electromagnetic coils and a control circuitry.
14. Arrangement according to claim 13 wherein said coils can be modulated.
15. Arrangement according to claim 13, wherein said control circuitry is embodied in a microprocessor.
16. Arrangement for mechanically moving a magnetic field generating device along a path near a cathode plate by means of first and second rotational movements, comprising a magnetic field generating device moveable with regard to a cathode plate of a cathode arc evaporizing device, arranged eccentrically with regard to the axis of a gear, being able to carry out said second rotation movement, said gear being engageable with a gear ring, being able to carry out the second rotation movement.
17. Arrangement according to claim 16, wherein said gears are independently drivable.
18. Arrangement according to claim 16 comprising microprocessor means for controlling the drive of the gears.
CA000561505A 1987-03-16 1988-03-15 Method and arrangement for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device Expired - Fee Related CA1301239C (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
NL8700621A NL8700621A (en) 1987-03-16 1987-03-16 Mechanically moving magnetic field generator relative to cathode - using spirally grooved rotating baseplate to mechanically impose spiral path on base rotation of field generator
NL8700621 1987-03-16
NL8700619 1987-03-16
NL8700619A NL8700619A (en) 1987-03-16 1987-03-16 Mechanically moving magnetic field generator relative to cathode - using spirally grooved rotating baseplate to mechanically impose spiral path on base rotation of field generator

Publications (1)

Publication Number Publication Date
CA1301239C true CA1301239C (en) 1992-05-19

Family

ID=26646220

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000561505A Expired - Fee Related CA1301239C (en) 1987-03-16 1988-03-15 Method and arrangement for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device

Country Status (4)

Country Link
US (1) US4902931A (en)
EP (1) EP0283095A1 (en)
JP (1) JPS64262A (en)
CA (1) CA1301239C (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153241A (en) * 1985-05-29 1992-10-06 Beshay Alphons D Polymer composites based cellulose-VI
JPH0393237U (en) * 1990-01-11 1991-09-24
JPH0398153U (en) * 1990-01-29 1991-10-11
JPH04236770A (en) * 1991-01-17 1992-08-25 Kobe Steel Ltd Method for controlling arc spot in vacuum arc deposition and vaporization source
DE4102102C2 (en) * 1991-01-25 1995-09-07 Leybold Ag Magnet arrangement with at least two permanent magnets and their use
DE4109213C1 (en) * 1991-03-21 1992-04-09 Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De Arc-source for vacuum coating system - comprises cathode housing with double walled shell, and thin base, target, cooling water supply, drain, etc.
DK0585229T3 (en) * 1991-05-21 1995-12-27 Materials Research Corp Soft corrosion module for cluster tool and associated ECR plasma generator
WO1992021788A1 (en) * 1991-05-31 1992-12-10 Kharkovsky Fiziko-Tekhnichesky Institut Device for electric arc application of coatings on articles under vacuum
CH689558A5 (en) 1995-07-11 1999-06-15 Erich Bergmann Vaporization and evaporator unit.
JP3935231B2 (en) * 1996-09-18 2007-06-20 キヤノンアネルバ株式会社 Sputtering equipment
US6692617B1 (en) * 1997-05-08 2004-02-17 Applied Materials, Inc. Sustained self-sputtering reactor having an increased density plasma
EP0918351A1 (en) * 1997-11-19 1999-05-26 Sinvaco N.V. Improved planar magnetron with moving magnet assembly
DE10127012A1 (en) * 2001-06-05 2002-12-12 Gabriel Herbert M Electric arc vaporizing device used in production of hard material layers on substrates comprises anode, target, voltage, and magnet arrangement formed as one unit
US7018515B2 (en) * 2004-03-24 2006-03-28 Applied Materials, Inc. Selectable dual position magnetron
US8021527B2 (en) * 2005-09-14 2011-09-20 Applied Materials, Inc. Coaxial shafts for radial positioning of rotating magnetron
DE102008057020A1 (en) 2008-11-12 2010-05-20 Oerlikon Trading Ag, Trübbach Ignition device for arc sources
RU2482217C1 (en) * 2012-02-28 2013-05-20 Открытое акционерное общество "Национальный институт авиационных технологий" Vacuum arc plasma source
CN110268502B (en) * 2017-02-14 2021-08-24 欧瑞康表面处理解决方案股份公司普费菲孔 Cathodic arc evaporation with predetermined cathodic material erosion
US11152581B2 (en) 2017-06-16 2021-10-19 Ubiquitous Energy, Inc. Visibly transparent, near-infrared-absorbing donor/acceptor photovoltaic devices

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2862315D1 (en) * 1977-12-20 1983-10-13 Nat Res Dev Electric arc apparatus and method for treating a flow of material by an electric arc
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
JPS61501328A (en) * 1984-03-02 1986-07-03 リ−ジェンツ・オブ・ザ・ユニヴァ−シティ・オブ・ミネソタ Material Deposition Method and Apparatus by Controlled Vacuum Arc
US4552639A (en) * 1984-07-20 1985-11-12 Varian Associates, Inc. Magnetron sputter etching system
US4724058A (en) * 1984-08-13 1988-02-09 Vac-Tec Systems, Inc. Method and apparatus for arc evaporating large area targets
US4631106A (en) * 1984-09-19 1986-12-23 Hitachi, Ltd. Plasma processor
JPS6260866A (en) * 1985-08-02 1987-03-17 Fujitsu Ltd Magnetron sputtering device
JPS6247478A (en) * 1985-08-26 1987-03-02 バリアン・アソシエイツ・インコ−ポレイテツド Planer magnetron sputtering apparatus wherein circular motion and radial motion of magnetic field are combined

Also Published As

Publication number Publication date
JPS64262A (en) 1989-01-05
US4902931A (en) 1990-02-20
EP0283095A1 (en) 1988-09-21

Similar Documents

Publication Publication Date Title
CA1301239C (en) Method and arrangement for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device
US4849088A (en) Cathode arc discharge evaporating device
JPH01262A (en) Method and apparatus for mechanically moving a magnetic field generator in a cathodic arc discharge evaporator
US6322679B1 (en) Planar magnetron with moving magnet assembly
US4367411A (en) Unitary electromagnet for double deflection scanning of charged particle beam
AU2304588A (en) Steered arc coating with thick targets
AU2607592A (en) Electromagnetic motor
PL305068A1 (en) Rotary magnetic apparatus
US5861088A (en) Magnetic field cathode
TW345564B (en) Component arrangement device
WO2002050865A1 (en) Apparatus for evaporation of materials for coating of objects
KR870002748A (en) Plasma Magnetron Sputtering Device
US7223322B2 (en) Moving magnetic/cathode arrangement and method
RU2135634C1 (en) Method and device for magnetron sputtering
JPH01279752A (en) Method and device for sputtering
KR20050030678A (en) Traveling device and method thereof for a plaything
RU2030076C1 (en) End-type inductor stepping motor for stationary time instruments
JPS6039006Y2 (en) magnetic acupressure device
EP1373964B1 (en) Device and a method for deflecting a laser beam
RU2056697C1 (en) Stepping motor with active rotor
JP2737124B2 (en) Power generator
SU948639A1 (en) Method of finishing articles
JPS63174550A (en) Stepper motor with ascending and descending function
JPS5749376A (en) Magnetic rotary apparatus
JP2001025233A (en) Insulator stationary magnetic force or static electric force control energy-generating device

Legal Events

Date Code Title Description
MKLA Lapsed