CA2018928A1 - Semiconductor laser device - Google Patents
Semiconductor laser deviceInfo
- Publication number
- CA2018928A1 CA2018928A1 CA2018928A CA2018928A CA2018928A1 CA 2018928 A1 CA2018928 A1 CA 2018928A1 CA 2018928 A CA2018928 A CA 2018928A CA 2018928 A CA2018928 A CA 2018928A CA 2018928 A1 CA2018928 A1 CA 2018928A1
- Authority
- CA
- Canada
- Prior art keywords
- semiconductor laser
- laser device
- wavelength
- tunable
- abstract
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06258—Controlling the frequency of the radiation with DFB-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/06213—Amplitude modulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/106—Comprising an active region having a varying composition or cross-section in a specific direction varying thickness along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3428—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers layer orientation perpendicular to the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34313—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3434—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer comprising at least both As and P as V-compounds
Abstract
ABSTRACT OF THE DISCLOSURE
A wavelength-tunable semiconductor laser device presenting a large wavelength-tunable range or a very-high-speed modulating semiconductor laser device having a distributed feedback structure including a diffraction grating as in the case of a DBR laser or a DFB laser incorporates therein a plurality of active layers differing from one another in constituent elements or composition ratio or thickness for reducing spectral line widths, while improving single-mode spectral oscillation characteristics.
A wavelength-tunable semiconductor laser device presenting a large wavelength-tunable range or a very-high-speed modulating semiconductor laser device having a distributed feedback structure including a diffraction grating as in the case of a DBR laser or a DFB laser incorporates therein a plurality of active layers differing from one another in constituent elements or composition ratio or thickness for reducing spectral line widths, while improving single-mode spectral oscillation characteristics.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP01-149603 | 1989-06-14 | ||
JP14960389 | 1989-06-14 | ||
JP01-224463 | 1989-09-01 | ||
JP22446389 | 1989-09-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2018928A1 true CA2018928A1 (en) | 1990-12-14 |
CA2018928C CA2018928C (en) | 1994-07-26 |
Family
ID=26479438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002018928A Expired - Fee Related CA2018928C (en) | 1989-06-14 | 1990-06-13 | Semiconductor laser device |
Country Status (3)
Country | Link |
---|---|
US (1) | US5119393A (en) |
EP (1) | EP0402907A3 (en) |
CA (1) | CA2018928C (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113328339A (en) * | 2021-05-27 | 2021-08-31 | 华中科技大学 | High-power distributed feedback laser |
Families Citing this family (59)
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DE69115624T2 (en) * | 1990-09-28 | 1996-05-15 | Nec Corp | Circuit and electrode arrangement for generating a broadband frequency modulation characteristic in semiconductor lasers |
US5274649A (en) * | 1990-11-21 | 1993-12-28 | Kabushiki Kaisha Toshiba | Wavelength-tunable distributed-feedback semiconductor laser device |
NL9100103A (en) * | 1991-01-23 | 1992-08-17 | Philips Nv | SEMICONDUCTOR DIODE LASER WITH MONITOR DIOD. |
EP0498736A3 (en) * | 1991-02-08 | 1993-04-14 | Fujitsu Limited | Dfb laser diode having a modified profile of linewidth enhancement factor |
US5220578A (en) * | 1991-11-01 | 1993-06-15 | At&T Bell Laboratories | Long term mode stabilization for distributed bragg reflector laser |
US5625878A (en) * | 1991-11-11 | 1997-04-29 | Nokia Telecommunications Oy | Method of allocating radio channels |
US5274225A (en) * | 1991-12-31 | 1993-12-28 | Biota Corp. | Method of and means for controlling the electromagnetic output power of electro-optic semiconductor devices |
FR2686753B1 (en) * | 1992-01-24 | 1994-04-08 | France Telecom | PHOTORECEPTOR FOR FREQUENCY MODULATED OPTICAL SIGNALS, CORRESPONDING TRANSCEIVER AND OPTICAL LINK. |
EP0753914B1 (en) * | 1993-01-08 | 2000-09-06 | Nec Corporation | Laser diode element with excellent intermodulation distortion characteristic |
JPH0794833A (en) * | 1993-09-22 | 1995-04-07 | Mitsubishi Electric Corp | Semiconductor laser and its manufacturing method |
US5418802A (en) * | 1993-11-12 | 1995-05-23 | Eastman Kodak Company | Frequency tunable waveguide extended cavity laser |
US5504772A (en) * | 1994-09-09 | 1996-04-02 | Deacon Research | Laser with electrically-controlled grating reflector |
JPH08255891A (en) * | 1995-03-17 | 1996-10-01 | Mitsubishi Electric Corp | Optical integrated circuit device and drive method thereof |
FR2736473B1 (en) * | 1995-07-06 | 1997-09-12 | Boumedienne Mersali | LASER DEVICE WITH UNDERGROUND STRUCTURE FOR INTEGRATED PHOTONIC CIRCUIT AND MANUFACTURING METHOD |
SE507376C2 (en) * | 1996-09-04 | 1998-05-18 | Ericsson Telefon Ab L M | Wavelength tunable laser device |
JPH10150244A (en) * | 1996-11-20 | 1998-06-02 | Mitsubishi Electric Corp | Method of simulating semiconductor device |
US5936994A (en) * | 1997-09-18 | 1999-08-10 | Northern Telecom Limited | Two-section complex coupled distributed feedback semiconductor laser with enhanced wavelength tuning range |
US6108362A (en) * | 1997-10-17 | 2000-08-22 | Lucent Technologies Inc. | Broadband tunable semiconductor laser source |
JP3111957B2 (en) * | 1997-12-24 | 2000-11-27 | 日本電気株式会社 | Surface emitting device |
GB2354110A (en) * | 1999-09-08 | 2001-03-14 | Univ Bristol | Ridge waveguide lasers |
US6678301B1 (en) * | 2000-07-14 | 2004-01-13 | Triquint Technology Holding Co. | Apparatus and method for minimizing wavelength chirp of laser devices |
JP2002204032A (en) * | 2000-10-31 | 2002-07-19 | Fuji Photo Film Co Ltd | Semiconductor laser element |
GB2369492A (en) * | 2000-11-28 | 2002-05-29 | Kamelian Ltd | (Ga,In)(N,As) Laser structures using distributed feedback |
US6717964B2 (en) * | 2001-07-02 | 2004-04-06 | E20 Communications, Inc. | Method and apparatus for wavelength tuning of optically pumped vertical cavity surface emitting lasers |
US7145923B2 (en) * | 2001-07-30 | 2006-12-05 | Bookham Technology Plc | Tuneable laser |
US7139299B2 (en) * | 2002-03-04 | 2006-11-21 | Quintessence Photonics Corporation | De-tuned distributed feedback laser diode |
JP2003304035A (en) * | 2002-04-09 | 2003-10-24 | Mitsubishi Electric Corp | Semiconductor optical element |
US7564889B2 (en) * | 2002-11-06 | 2009-07-21 | Finisar Corporation | Adiabatically frequency modulated source |
US8792531B2 (en) * | 2003-02-25 | 2014-07-29 | Finisar Corporation | Optical beam steering for tunable laser applications |
JP2004273993A (en) * | 2003-03-12 | 2004-09-30 | Hitachi Ltd | Wavelength variable distribution reflecting type semiconductor laser device |
US8571082B2 (en) * | 2004-08-19 | 2013-10-29 | Maxion Technologies, Inc. | Quantum cascade lasers with electrically tunable emission wavelengths |
JP5234238B2 (en) * | 2006-02-22 | 2013-07-10 | 日亜化学工業株式会社 | Optical disk device |
JP2007324474A (en) * | 2006-06-02 | 2007-12-13 | Sumitomo Electric Ind Ltd | Optical integrated element and manufacturing method therefor |
WO2008080171A1 (en) * | 2006-12-22 | 2008-07-03 | Finisar Corporation | Optical transmitter having a widely tunable directly modulated laser and periodic optical spectrum reshaping element |
US7941057B2 (en) * | 2006-12-28 | 2011-05-10 | Finisar Corporation | Integral phase rule for reducing dispersion errors in an adiabatically chirped amplitude modulated signal |
US8131157B2 (en) | 2007-01-22 | 2012-03-06 | Finisar Corporation | Method and apparatus for generating signals with increased dispersion tolerance using a directly modulated laser transmitter |
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US7991291B2 (en) * | 2007-02-08 | 2011-08-02 | Finisar Corporation | WDM PON based on DML |
US8027593B2 (en) | 2007-02-08 | 2011-09-27 | Finisar Corporation | Slow chirp compensation for enhanced signal bandwidth and transmission performances in directly modulated lasers |
US8204386B2 (en) | 2007-04-06 | 2012-06-19 | Finisar Corporation | Chirped laser with passive filter element for differential phase shift keying generation |
US7991297B2 (en) | 2007-04-06 | 2011-08-02 | Finisar Corporation | Chirped laser with passive filter element for differential phase shift keying generation |
JP4882088B2 (en) * | 2007-05-21 | 2012-02-22 | 日本オプネクスト株式会社 | Tunable laser device and wavelength control method therefor |
US8160455B2 (en) | 2008-01-22 | 2012-04-17 | Finisar Corporation | Method and apparatus for generating signals with increased dispersion tolerance using a directly modulated laser transmitter |
US8260150B2 (en) | 2008-04-25 | 2012-09-04 | Finisar Corporation | Passive wave division multiplexed transmitter having a directly modulated laser array |
GB2465754B (en) * | 2008-11-26 | 2011-02-09 | Univ Dublin City | A semiconductor optical amplifier with a reduced noise figure |
JP2010232424A (en) * | 2009-03-27 | 2010-10-14 | Fujitsu Ltd | Semiconductor optical amplifier, and optical module |
US8391330B2 (en) * | 2009-04-20 | 2013-03-05 | Corning Incorporated | Fracture resistant metallization pattern for semiconductor lasers |
US8199785B2 (en) * | 2009-06-30 | 2012-06-12 | Finisar Corporation | Thermal chirp compensation in a chirp managed laser |
US20110134957A1 (en) * | 2009-12-07 | 2011-06-09 | Emcore Corporation | Low Chirp Coherent Light Source |
US20130044773A1 (en) * | 2011-08-18 | 2013-02-21 | Venkata Adiseshaiah Bhagavatula | Optical sources having proximity coupled laser source and waveguide |
EP2738889B1 (en) * | 2011-12-20 | 2016-08-10 | Huawei Technologies Co., Ltd. | Laser, passive optical network system and apparatus, and method for controlling wavelength |
CN104412148B (en) * | 2012-05-17 | 2017-10-10 | 菲尼萨公司 | The direct modulation laser applied for EPON (PON) |
US9306672B2 (en) | 2013-03-14 | 2016-04-05 | Encore Corporation | Method of fabricating and operating an optical modulator |
US9306372B2 (en) | 2013-03-14 | 2016-04-05 | Emcore Corporation | Method of fabricating and operating an optical modulator |
US9059801B1 (en) | 2013-03-14 | 2015-06-16 | Emcore Corporation | Optical modulator |
US9564733B2 (en) | 2014-09-15 | 2017-02-07 | Emcore Corporation | Method of fabricating and operating an optical modulator |
US10074959B2 (en) | 2016-08-03 | 2018-09-11 | Emcore Corporation | Modulated laser source and methods of its fabrication and operation |
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CN112670823B (en) * | 2020-12-23 | 2022-03-11 | 中国科学院半导体研究所 | Method for manufacturing electric absorption modulation laser |
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US4397025A (en) * | 1980-10-08 | 1983-08-02 | Environmental Research & Technology, Inc. | Dual frequency laser |
JPS6179283A (en) * | 1984-09-26 | 1986-04-22 | Nec Corp | Distributed bragg reflection type semiconductor laser |
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US4680769A (en) * | 1984-11-21 | 1987-07-14 | Bell Communications Research, Inc. | Broadband laser amplifier structure |
GB8522308D0 (en) * | 1985-09-09 | 1985-10-16 | British Telecomm | Semiconductor lasers |
JPS63148692A (en) * | 1986-12-12 | 1988-06-21 | Nec Corp | Multiple wave length distribution bragg reflection type semiconductor laser array |
US4888783A (en) * | 1987-03-20 | 1989-12-19 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor laser device |
JPS63274192A (en) * | 1987-05-02 | 1988-11-11 | Fujitsu Ltd | Semiconductor light emitting device |
JPS6414988A (en) * | 1987-07-08 | 1989-01-19 | Nec Corp | Wavelength-tunable semiconductor laser |
JPH084186B2 (en) * | 1987-10-28 | 1996-01-17 | 国際電信電話株式会社 | Semiconductor laser |
US4961198A (en) * | 1988-01-14 | 1990-10-02 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device |
US4976539A (en) * | 1989-08-29 | 1990-12-11 | David Sarnoff Research Center, Inc. | Diode laser array |
-
1990
- 1990-06-13 EP EP19900111213 patent/EP0402907A3/en not_active Withdrawn
- 1990-06-13 US US07/537,901 patent/US5119393A/en not_active Expired - Lifetime
- 1990-06-13 CA CA002018928A patent/CA2018928C/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113328339A (en) * | 2021-05-27 | 2021-08-31 | 华中科技大学 | High-power distributed feedback laser |
Also Published As
Publication number | Publication date |
---|---|
EP0402907A2 (en) | 1990-12-19 |
EP0402907A3 (en) | 1991-09-25 |
US5119393A (en) | 1992-06-02 |
CA2018928C (en) | 1994-07-26 |
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