CA2101128A1 - Single Mirror Light-Emitting Diodes with Enhanced Intensity - Google Patents

Single Mirror Light-Emitting Diodes with Enhanced Intensity

Info

Publication number
CA2101128A1
CA2101128A1 CA2101128A CA2101128A CA2101128A1 CA 2101128 A1 CA2101128 A1 CA 2101128A1 CA 2101128 A CA2101128 A CA 2101128A CA 2101128 A CA2101128 A CA 2101128A CA 2101128 A1 CA2101128 A1 CA 2101128A1
Authority
CA
Canada
Prior art keywords
emitting diodes
enhanced intensity
mirror light
single mirror
enhanced
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2101128A
Other languages
French (fr)
Other versions
CA2101128C (en
Inventor
Neil Edmund James Hunt
Erdmann Frederick Schubert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of CA2101128A1 publication Critical patent/CA2101128A1/en
Application granted granted Critical
Publication of CA2101128C publication Critical patent/CA2101128C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
    • H01L33/465—Reflective coating, e.g. dielectric Bragg reflector with a resonant cavity structure

Abstract

This invention embodies single mirror light-emitting diodes (LEDs) with enhanced intensity. The LEDs are Group III-V and/or II-IV compound semiconductor structures with a single metallic mirror. The enhanced intensity is obtained by placing an active region of the LED having from two to ten, preferably from four to eight, quantum wells at an anti-node of the optical node of the device created by a nearby metallic mirror. Such multiquantum well LED structures exhibit enhanced efficiencies approaching that of a perfect isotropic emitter.
CA002101128A 1992-12-28 1993-07-22 Single mirror light-emitting diodes with enhanced intensity Expired - Lifetime CA2101128C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/997,415 US5362977A (en) 1992-12-28 1992-12-28 Single mirror light-emitting diodes with enhanced intensity
US997,415 1992-12-28

Publications (2)

Publication Number Publication Date
CA2101128A1 true CA2101128A1 (en) 1994-06-29
CA2101128C CA2101128C (en) 1996-12-10

Family

ID=25543992

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002101128A Expired - Lifetime CA2101128C (en) 1992-12-28 1993-07-22 Single mirror light-emitting diodes with enhanced intensity

Country Status (2)

Country Link
US (1) US5362977A (en)
CA (1) CA2101128C (en)

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US5619058A (en) * 1994-02-17 1997-04-08 Lucent Technologies Inc. Light emitting diode device having four discrete regions
DE69839300T2 (en) * 1997-12-15 2009-04-16 Philips Lumileds Lighting Company, LLC, San Jose Light-emitting device
US5960024A (en) 1998-03-30 1999-09-28 Bandwidth Unlimited, Inc. Vertical optical cavities produced with selective area epitaxy
US5991326A (en) 1998-04-14 1999-11-23 Bandwidth9, Inc. Lattice-relaxed verticle optical cavities
US6535541B1 (en) 1998-04-14 2003-03-18 Bandwidth 9, Inc Vertical cavity apparatus with tunnel junction
US6493371B1 (en) 1998-04-14 2002-12-10 Bandwidth9, Inc. Vertical cavity apparatus with tunnel junction
US6487230B1 (en) 1998-04-14 2002-11-26 Bandwidth 9, Inc Vertical cavity apparatus with tunnel junction
US6493372B1 (en) 1998-04-14 2002-12-10 Bandwidth 9, Inc. Vertical cavity apparatus with tunnel junction
US6493373B1 (en) 1998-04-14 2002-12-10 Bandwidth 9, Inc. Vertical cavity apparatus with tunnel junction
US6487231B1 (en) 1998-04-14 2002-11-26 Bandwidth 9, Inc. Vertical cavity apparatus with tunnel junction
US6760357B1 (en) 1998-04-14 2004-07-06 Bandwidth9 Vertical cavity apparatus with tunnel junction
US6226425B1 (en) 1999-02-24 2001-05-01 Bandwidth9 Flexible optical multiplexer
US6275513B1 (en) 1999-06-04 2001-08-14 Bandwidth 9 Hermetically sealed semiconductor laser device
US6233263B1 (en) 1999-06-04 2001-05-15 Bandwidth9 Monitoring and control assembly for wavelength stabilized optical system
US6903376B2 (en) * 1999-12-22 2005-06-07 Lumileds Lighting U.S., Llc Selective placement of quantum wells in flipchip light emitting diodes for improved light extraction
US6573537B1 (en) 1999-12-22 2003-06-03 Lumileds Lighting, U.S., Llc Highly reflective ohmic contacts to III-nitride flip-chip LEDs
US6486499B1 (en) 1999-12-22 2002-11-26 Lumileds Lighting U.S., Llc III-nitride light-emitting device with increased light generating capability
US6992334B1 (en) * 1999-12-22 2006-01-31 Lumileds Lighting U.S., Llc Multi-layer highly reflective ohmic contacts for semiconductor devices
US6514782B1 (en) 1999-12-22 2003-02-04 Lumileds Lighting, U.S., Llc Method of making a III-nitride light-emitting device with increased light generating capability
US6885035B2 (en) 1999-12-22 2005-04-26 Lumileds Lighting U.S., Llc Multi-chip semiconductor LED assembly
US6900474B2 (en) * 2002-12-20 2005-05-31 Lumileds Lighting U.S., Llc Light emitting devices with compact active regions
US6969874B1 (en) 2003-06-12 2005-11-29 Sandia Corporation Flip-chip light emitting diode with resonant optical microcavity
US20080121917A1 (en) * 2006-11-15 2008-05-29 The Regents Of The University Of California High efficiency white, single or multi-color light emitting diodes (leds) by index matching structures
US7977694B2 (en) * 2006-11-15 2011-07-12 The Regents Of The University Of California High light extraction efficiency light emitting diode (LED) with emitters within structured materials
US7768023B2 (en) 2005-10-14 2010-08-03 The Regents Of The University Of California Photonic structures for efficient light extraction and conversion in multi-color light emitting devices
US8227820B2 (en) * 2005-02-09 2012-07-24 The Regents Of The University Of California Semiconductor light-emitting device
US7582910B2 (en) * 2005-02-28 2009-09-01 The Regents Of The University Of California High efficiency light emitting diode (LED) with optimized photonic crystal extractor
US7345298B2 (en) * 2005-02-28 2008-03-18 The Regents Of The University Of California Horizontal emitting, vertical emitting, beam shaped, distributed feedback (DFB) lasers by growth over a patterned substrate
US7223998B2 (en) * 2004-09-10 2007-05-29 The Regents Of The University Of California White, single or multi-color light emitting diodes by recycling guided modes
JP4797361B2 (en) * 2004-11-05 2011-10-19 富士電機株式会社 Organic EL device
US7291864B2 (en) * 2005-02-28 2007-11-06 The Regents Of The University Of California Single or multi-color high efficiency light emitting diode (LED) by growth over a patterned substrate
CN101523603B (en) * 2006-08-06 2013-11-06 光波光电技术公司 Iii-nitride light-emitting devices with one or more resonance reflectors and reflective engineered growth templates for such devices, and methods
US7915624B2 (en) 2006-08-06 2011-03-29 Lightwave Photonics, Inc. III-nitride light-emitting devices with one or more resonance reflectors and reflective engineered growth templates for such devices, and methods
US7483212B2 (en) * 2006-10-11 2009-01-27 Rensselaer Polytechnic Institute Optical thin film, semiconductor light emitting device having the same and methods of fabricating the same
KR20090082923A (en) * 2006-11-15 2009-07-31 더 리전츠 오브 더 유니버시티 오브 캘리포니아 High light extraction efficiency light emitting diode (led) through multiple extractors
JP5650716B2 (en) * 2009-04-03 2015-01-07 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツングＯｓｒａｍ Ｏｐｔｏ Ｓｅｍｉｃｏｎｄｕｃｔｏｒｓ ＧｍｂＨ Optoelectronic component manufacturing method, optoelectronic component, and component layout having a plurality of optoelectronic components
KR101064011B1 (en) * 2009-04-28 2011-09-08 엘지이노텍 주식회사 Light emitting device and manufacturing method
WO2013138676A1 (en) * 2012-03-14 2013-09-19 Robbie Jorgenson Materials, structures, and methods for optical and electrical iii-nitride semiconductor devices
US10263144B2 (en) 2015-10-16 2019-04-16 Robbie J. Jorgenson System and method for light-emitting devices on lattice-matched metal substrates
US10170303B2 (en) 2016-05-26 2019-01-01 Robbie J. Jorgenson Group IIIA nitride growth system and method
CN105870227B (en) * 2016-06-12 2017-07-14 天津三安光电有限公司 Infrarede emitting diode

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NL8301215A (en) * 1983-04-07 1984-11-01 Philips Nv SEMICONDUCTOR DEVICE FOR GENERATING ELECTROMAGNETIC RADIATION.
JPH0797688B2 (en) * 1987-03-10 1995-10-18 富士通株式会社 Semiconductor device
JPH01241192A (en) * 1988-03-23 1989-09-26 Fujitsu Ltd Semiconductor device
US5089860A (en) * 1990-06-25 1992-02-18 Deppe Dennis G Quantum well device with control of spontaneous photon emission, and method of manufacturing same
JP2596195B2 (en) * 1990-08-20 1997-04-02 日本電気株式会社 Vertical resonator type surface input / output photoelectric fusion device

Also Published As

Publication number Publication date
US5362977A (en) 1994-11-08
CA2101128C (en) 1996-12-10

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