CA2232409A1 - Microelectromechanical accelerometer for automotive applications - Google Patents

Microelectromechanical accelerometer for automotive applications Download PDF

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Publication number
CA2232409A1
CA2232409A1 CA002232409A CA2232409A CA2232409A1 CA 2232409 A1 CA2232409 A1 CA 2232409A1 CA 002232409 A CA002232409 A CA 002232409A CA 2232409 A CA2232409 A CA 2232409A CA 2232409 A1 CA2232409 A1 CA 2232409A1
Authority
CA
Canada
Prior art keywords
accelerometer
substrate
micromechanical
wafer
reactive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002232409A
Other languages
French (fr)
Other versions
CA2232409C (en
Inventor
Gregory J. Galvin
Timothy J. Davis
Noel C. Macdonald
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cornell Research Foundation Inc
Kionix Inc
Original Assignee
Kionix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/067,264 external-priority patent/US5563343A/en
Priority claimed from US08/246,265 external-priority patent/US5610335A/en
Priority to US08/568,845 priority Critical patent/US6199874B1/en
Application filed by Kionix Inc filed Critical Kionix Inc
Priority to CA002232409A priority patent/CA2232409C/en
Priority to US09/030,641 priority patent/US6149190A/en
Publication of CA2232409A1 publication Critical patent/CA2232409A1/en
Application granted granted Critical
Publication of CA2232409C publication Critical patent/CA2232409C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/13Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by measuring the force required to restore a proofmass subjected to inertial forces to a null position
    • G01P15/131Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by measuring the force required to restore a proofmass subjected to inertial forces to a null position with electrostatic counterbalancing means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00619Forming high aspect ratio structures having deep steep walls
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P1/00Details of instruments
    • G01P1/006Details of instruments used for thermal compensation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802Details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/125Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/02Sensors
    • B81B2201/0228Inertial sensors
    • B81B2201/0235Accelerometers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00Basic microelectromechanical structures
    • B81B2203/05Type of movement
    • B81B2203/051Translation according to an axis parallel to the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128Processes for removing material
    • B81C2201/013Etching
    • B81C2201/0132Dry etching, i.e. plasma etching, barrel etching, reactive ion etching [RIE], sputter etching or ion milling
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0808Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
    • G01P2015/0811Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
    • G01P2015/0814Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for translational movement of the mass, e.g. shuttle type
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0808Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
    • G01P2015/0811Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
    • G01P2015/0817Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for pivoting movement of the mass, e.g. in-plane pendulum

Abstract

A micromechanical capacitive accelerometer is provided from a single silicon wafer. The basic structure of the micromechanical accelerometer is etched in the wafer to form a released portion in the substrate, and the released and remaining portions of the substrate are coated with metal under conditions sufficient to form a micromechanical capacitive accelerometer. The substrate is preferably etched using reactive-ion etching for at least the first etch step in the process that forms the basic structure, although in another preferred embodiment, all etching is reactive-ion etching. The accelerometer also may comprise a signal-conditioned accelerometer wherein signal-conditioning circuitry is provided on the same wafer from which the accelerometer is formed, and VLSI electronics may be integrated on the same wafer from which the accelerometer is formed. The micromechanical capacitive accelerometer can be used for airbag deployment, active suspension control, active steering control, anti-lock braking, and other control systems requiring accelerometers having high sensitivity, extreme accuracy and resistance to out of plane forces.
CA002232409A 1993-05-26 1998-03-17 Microelectromechanical accelerometer for automotive applications Expired - Lifetime CA2232409C (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US08/568,845 US6199874B1 (en) 1993-05-26 1995-12-07 Microelectromechanical accelerometer for automotive applications
CA002232409A CA2232409C (en) 1993-05-26 1998-03-17 Microelectromechanical accelerometer for automotive applications
US09/030,641 US6149190A (en) 1993-05-26 1998-04-03 Micromechanical accelerometer for automotive applications

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US08/067,264 US5563343A (en) 1993-05-26 1993-05-26 Microelectromechanical lateral accelerometer
US08/246,265 US5610335A (en) 1993-05-26 1994-05-19 Microelectromechanical lateral accelerometer
US08/568,845 US6199874B1 (en) 1993-05-26 1995-12-07 Microelectromechanical accelerometer for automotive applications
CA002232409A CA2232409C (en) 1993-05-26 1998-03-17 Microelectromechanical accelerometer for automotive applications

Publications (2)

Publication Number Publication Date
CA2232409A1 true CA2232409A1 (en) 1999-09-17
CA2232409C CA2232409C (en) 2008-06-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CA002232409A Expired - Lifetime CA2232409C (en) 1993-05-26 1998-03-17 Microelectromechanical accelerometer for automotive applications

Country Status (2)

Country Link
US (2) US6199874B1 (en)
CA (1) CA2232409C (en)

Families Citing this family (182)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6674562B1 (en) * 1994-05-05 2004-01-06 Iridigm Display Corporation Interferometric modulation of radiation
US6786420B1 (en) 1997-07-15 2004-09-07 Silverbrook Research Pty. Ltd. Data distribution mechanism in the form of ink dots on cards
US6803989B2 (en) * 1997-07-15 2004-10-12 Silverbrook Research Pty Ltd Image printing apparatus including a microcontroller
US6618117B2 (en) 1997-07-12 2003-09-09 Silverbrook Research Pty Ltd Image sensing apparatus including a microcontroller
US7705891B2 (en) 1997-07-15 2010-04-27 Silverbrook Research Pty Ltd Correction of distortions in digital images
US7551201B2 (en) 1997-07-15 2009-06-23 Silverbrook Research Pty Ltd Image capture and processing device for a print on demand digital camera system
US7110024B1 (en) * 1997-07-15 2006-09-19 Silverbrook Research Pty Ltd Digital camera system having motion deblurring means
US7714889B2 (en) * 1997-07-15 2010-05-11 Silverbrook Research Pty Ltd Digital camera using exposure information for image processing
AUPO850597A0 (en) 1997-08-11 1997-09-04 Silverbrook Research Pty Ltd Image processing method and apparatus (art01a)
US6624848B1 (en) 1997-07-15 2003-09-23 Silverbrook Research Pty Ltd Cascading image modification using multiple digital cameras incorporating image processing
US6879341B1 (en) 1997-07-15 2005-04-12 Silverbrook Research Pty Ltd Digital camera system containing a VLIW vector processor
US6985207B2 (en) 1997-07-15 2006-01-10 Silverbrook Research Pty Ltd Photographic prints having magnetically recordable media
AUPO802797A0 (en) 1997-07-15 1997-08-07 Silverbrook Research Pty Ltd Image processing method and apparatus (ART54)
US6690419B1 (en) 1997-07-15 2004-02-10 Silverbrook Research Pty Ltd Utilising eye detection methods for image processing in a digital image camera
DE69726718T2 (en) * 1997-07-31 2004-10-07 St Microelectronics Srl Method of manufacturing highly sensitive integrated acceleration and gyroscopic sensors and sensors manufactured in this way
GB9722766D0 (en) 1997-10-28 1997-12-24 British Telecomm Portable computers
US8928967B2 (en) 1998-04-08 2015-01-06 Qualcomm Mems Technologies, Inc. Method and device for modulating light
WO1999052006A2 (en) * 1998-04-08 1999-10-14 Etalon, Inc. Interferometric modulation of radiation
US6291875B1 (en) * 1998-06-24 2001-09-18 Analog Devices Imi, Inc. Microfabricated structures with electrical isolation and interconnections
AUPP702098A0 (en) 1998-11-09 1998-12-03 Silverbrook Research Pty Ltd Image creation method and apparatus (ART73)
AUPQ056099A0 (en) 1999-05-25 1999-06-17 Silverbrook Research Pty Ltd A method and apparatus (pprint01)
US6798312B1 (en) 1999-09-21 2004-09-28 Rockwell Automation Technologies, Inc. Microelectromechanical system (MEMS) analog electrical isolator
US6803755B2 (en) 1999-09-21 2004-10-12 Rockwell Automation Technologies, Inc. Microelectromechanical system (MEMS) with improved beam suspension
WO2003007049A1 (en) * 1999-10-05 2003-01-23 Iridigm Display Corporation Photonic mems and structures
US6753638B2 (en) * 2000-02-03 2004-06-22 Calient Networks, Inc. Electrostatic actuator for micromechanical systems
JP2001227954A (en) * 2000-02-15 2001-08-24 Toyota Motor Corp Physical quantity detecting device
US6440766B1 (en) * 2000-02-16 2002-08-27 Analog Devices Imi, Inc. Microfabrication using germanium-based release masks
DE10029012C2 (en) * 2000-06-13 2002-06-06 Amtec Gmbh Microstructure and process for its manufacture
US20020118850A1 (en) * 2000-08-02 2002-08-29 Yeh Jer-Liang (Andrew) Micromachine directional microphone and associated method
US6545796B1 (en) * 2000-09-13 2003-04-08 Agere Systems Inc. Article comprising a freestanding micro-tube and method therefor
DE10047189C1 (en) * 2000-09-23 2002-02-21 Bosch Gmbh Robert Seat occupant classification method for automobile passenger seat uses evaluation of seating profile provided by pressure sensor matrix
US6520013B1 (en) * 2000-10-02 2003-02-18 Apple Computer, Inc. Method and apparatus for detecting free fall
US7688306B2 (en) 2000-10-02 2010-03-30 Apple Inc. Methods and apparatuses for operating a portable device based on an accelerometer
US7280014B2 (en) * 2001-03-13 2007-10-09 Rochester Institute Of Technology Micro-electro-mechanical switch and a method of using and making thereof
US6889128B2 (en) * 2001-04-20 2005-05-03 Trw Inc. System and method for controlling vehicle suspension components and vehicle occupant protection devices
US6815243B2 (en) 2001-04-26 2004-11-09 Rockwell Automation Technologies, Inc. Method of fabricating a microelectromechanical system (MEMS) device using a pre-patterned substrate
US6794271B2 (en) 2001-09-28 2004-09-21 Rockwell Automation Technologies, Inc. Method for fabricating a microelectromechanical system (MEMS) device using a pre-patterned bridge
US6756310B2 (en) * 2001-09-26 2004-06-29 Rockwell Automation Technologies, Inc. Method for constructing an isolate microelectromechanical system (MEMS) device using surface fabrication techniques
US6761829B2 (en) * 2001-04-26 2004-07-13 Rockwell Automation Technologies, Inc. Method for fabricating an isolated microelectromechanical system (MEMS) device using an internal void
US6768628B2 (en) 2001-04-26 2004-07-27 Rockwell Automation Technologies, Inc. Method for fabricating an isolated microelectromechanical system (MEMS) device incorporating a wafer level cap
AU2002303933A1 (en) * 2001-05-31 2002-12-09 Rochester Institute Of Technology Fluidic valves, agitators, and pumps and methods thereof
DE10196506B3 (en) * 2001-06-13 2014-09-04 Mitsubishi Denki K.K. Manufacturing method for a thin-film structural body
DE10130379A1 (en) * 2001-06-23 2003-01-02 Bosch Gmbh Robert Micromechanical mass flow sensor and method for its production
US6664786B2 (en) 2001-07-30 2003-12-16 Rockwell Automation Technologies, Inc. Magnetic field sensor using microelectromechanical system
US6817255B2 (en) * 2001-09-12 2004-11-16 The Board Of Trustees Of The University Of Illinois Apparatus and method for testing of microscale to nanoscale thin films
US6933933B2 (en) 2001-10-02 2005-08-23 Harris Corporation Pen cartridge that transmits acceleration signal for recreating handwritten signatures and communications
DE10148858A1 (en) * 2001-10-04 2003-04-10 Bosch Gmbh Robert Micro-mechanical sensor, e.g. for measurement of acceleration, has a seismic mass with measurement and self-test drive electrodes arranged perpendicularly to each other so that the effects of edge loss on self-testing are reduced
US6690178B2 (en) 2001-10-26 2004-02-10 Rockwell Automation Technologies, Inc. On-board microelectromechanical system (MEMS) sensing device for power semiconductors
WO2003038448A1 (en) 2001-10-26 2003-05-08 Potter Michael D An accelerometer and methods thereof
US7211923B2 (en) * 2001-10-26 2007-05-01 Nth Tech Corporation Rotational motion based, electrostatic power source and methods thereof
US7378775B2 (en) * 2001-10-26 2008-05-27 Nth Tech Corporation Motion based, electrostatic power source and methods thereof
US6568268B1 (en) 2001-10-31 2003-05-27 Western Digital Technologies, Inc. Multi-axis accelerometer comprising a mass suspended by springs above an optical sensor
US6794119B2 (en) * 2002-02-12 2004-09-21 Iridigm Display Corporation Method for fabricating a structure for a microelectromechanical systems (MEMS) device
JP2003240798A (en) * 2002-02-19 2003-08-27 Denso Corp Capacitive physical quantity sensor
AU2003216338A1 (en) * 2002-02-21 2003-09-09 Dana Corporation Vehicle dynamics control system
WO2003087459A1 (en) * 2002-04-10 2003-10-23 Fisher & Paykel Appliances Limited A laundry appliance
US7539568B2 (en) * 2002-06-03 2009-05-26 Continental Automotive Systems Us, Inc Crash pulse energy algorithm for an inflatable restraint system
DE10231729B4 (en) * 2002-07-13 2011-08-11 Robert Bosch GmbH, 70469 Component with a surface micromechanical structure
US7004030B2 (en) * 2002-09-27 2006-02-28 Oki Electric Industry Co., Ltd. Acceleration sensor
KR100770981B1 (en) * 2002-10-30 2007-10-30 삼성전자주식회사 Stand of Display
FR2847515B1 (en) * 2002-11-27 2006-07-14 Roulements Soc Nouvelle SUSPENSION OF INSTRUMENTED SUSPENSION IN DEFORMATION TO MEASURE EFFORTS
US6841992B2 (en) * 2003-02-18 2005-01-11 Honeywell International, Inc. MEMS enhanced capacitive pick-off and electrostatic rebalance electrode placement
US7514283B2 (en) 2003-03-20 2009-04-07 Robert Bosch Gmbh Method of fabricating electromechanical device having a controlled atmosphere
US6975193B2 (en) * 2003-03-25 2005-12-13 Rockwell Automation Technologies, Inc. Microelectromechanical isolating circuit
US8912174B2 (en) * 2003-04-16 2014-12-16 Mylan Pharmaceuticals Inc. Formulations and methods for treating rhinosinusitis
US6987432B2 (en) * 2003-04-16 2006-01-17 Robert Bosch Gmbh Temperature compensation for silicon MEMS resonator
TWI234819B (en) * 2003-05-06 2005-06-21 Walsin Lihwa Corp Selective etch method for side wall protection and structure formed using the method
US6979872B2 (en) * 2003-05-13 2005-12-27 Rockwell Scientific Licensing, Llc Modules integrating MEMS devices with pre-processed electronic circuitry, and methods for fabricating such modules
US6936491B2 (en) 2003-06-04 2005-08-30 Robert Bosch Gmbh Method of fabricating microelectromechanical systems and devices having trench isolated contacts
US7075160B2 (en) * 2003-06-04 2006-07-11 Robert Bosch Gmbh Microelectromechanical systems and devices having thin film encapsulated mechanical structures
JP2005029142A (en) * 2003-06-17 2005-02-03 Yokohama Rubber Co Ltd:The Antilock brake system and its sensor unit
US6952041B2 (en) * 2003-07-25 2005-10-04 Robert Bosch Gmbh Anchors for microelectromechanical systems having an SOI substrate, and method of fabricating same
US7148436B1 (en) 2003-08-14 2006-12-12 Sandia Corporation Microelectromechanical acceleration-sensing apparatus
US7051656B1 (en) 2003-08-14 2006-05-30 Sandia Corporation Microelectromechanical safing and arming apparatus
US7217582B2 (en) * 2003-08-29 2007-05-15 Rochester Institute Of Technology Method for non-damaging charge injection and a system thereof
US7287328B2 (en) * 2003-08-29 2007-10-30 Rochester Institute Of Technology Methods for distributed electrode injection
US7055640B2 (en) * 2003-09-10 2006-06-06 Ford Global Technologies, Llc Fuel cut-off control system for a vehicle
JP2005098740A (en) * 2003-09-22 2005-04-14 Denso Corp Capacitance-type semiconductor dynamic quantity sensor
EP1678013B1 (en) * 2003-10-09 2008-02-27 Conti Temic microelectronic GmbH Device for activating a security system in a vehicle
US20050132803A1 (en) * 2003-12-23 2005-06-23 Baldwin David J. Low cost integrated MEMS hybrid
US8581308B2 (en) * 2004-02-19 2013-11-12 Rochester Institute Of Technology High temperature embedded charge devices and methods thereof
US7068125B2 (en) * 2004-03-04 2006-06-27 Robert Bosch Gmbh Temperature controlled MEMS resonator and method for controlling resonator frequency
US7287429B2 (en) * 2004-03-25 2007-10-30 Denso Corporation Capacitive acceleration sensor system
US7102467B2 (en) * 2004-04-28 2006-09-05 Robert Bosch Gmbh Method for adjusting the frequency of a MEMS resonator
JP2008502911A (en) * 2004-06-12 2008-01-31 アクバイオ・リミテッド Analytical instrument with an array of sensors and calibration elements
US20060065622A1 (en) * 2004-09-27 2006-03-30 Floyd Philip D Method and system for xenon fluoride etching with enhanced efficiency
US20060066932A1 (en) * 2004-09-27 2006-03-30 Clarence Chui Method of selective etching using etch stop layer
US7417783B2 (en) * 2004-09-27 2008-08-26 Idc, Llc Mirror and mirror layer for optical modulator and method
US7369296B2 (en) * 2004-09-27 2008-05-06 Idc, Llc Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator
US7616013B2 (en) * 2004-11-11 2009-11-10 Brigham Young University Micromechanical positional state sensing apparatus method and system
US7204162B2 (en) * 2004-11-23 2007-04-17 Delphi Technologies, Inc. Capacitive strain gauge
DE102004058103B4 (en) * 2004-12-01 2011-03-17 Technische Universität Chemnitz Device for adjusting the gap
US7140250B2 (en) * 2005-02-18 2006-11-28 Honeywell International Inc. MEMS teeter-totter accelerometer having reduced non-linearty
JP4710700B2 (en) * 2005-05-09 2011-06-29 株式会社デンソー Semiconductor device and manufacturing method thereof
US7337671B2 (en) * 2005-06-03 2008-03-04 Georgia Tech Research Corp. Capacitive microaccelerometers and fabrication methods
CN100430740C (en) * 2005-06-09 2008-11-05 中国科学院电子学研究所 Interlacing vibration type electric-field sensor
DE102005028214A1 (en) * 2005-06-17 2006-12-21 Siemens Ag Vibration Measurement System
EP2495212A3 (en) 2005-07-22 2012-10-31 QUALCOMM MEMS Technologies, Inc. Mems devices having support structures and methods of fabricating the same
EP1910218A1 (en) 2005-07-22 2008-04-16 Qualcomm Mems Technologies, Inc. Mems devices having support structures and methods of fabricating the same
JP4633574B2 (en) * 2005-08-08 2011-02-16 三菱電機株式会社 Thin film structure and manufacturing method thereof
DE102005042085A1 (en) * 2005-09-05 2007-03-15 Siemens Ag Vibration Measurement System
US20070074731A1 (en) * 2005-10-05 2007-04-05 Nth Tech Corporation Bio-implantable energy harvester systems and methods thereof
US20070096974A1 (en) * 2005-10-14 2007-05-03 Siemens Vdo Automotive Corporation Blending of sensors to produce alternate sensor characteristics
DE102005050351A1 (en) * 2005-10-20 2007-04-26 Siemens Ag Vibration Measurement System
US7630114B2 (en) * 2005-10-28 2009-12-08 Idc, Llc Diffusion barrier layer for MEMS devices
US7916980B2 (en) 2006-01-13 2011-03-29 Qualcomm Mems Technologies, Inc. Interconnect structure for MEMS device
US7382515B2 (en) * 2006-01-18 2008-06-03 Qualcomm Mems Technologies, Inc. Silicon-rich silicon nitrides as etch stops in MEMS manufacture
US20070170528A1 (en) 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
US7617729B2 (en) * 2006-02-21 2009-11-17 Physical Logic Ag Accelerometer
US7711239B2 (en) 2006-04-19 2010-05-04 Qualcomm Mems Technologies, Inc. Microelectromechanical device and method utilizing nanoparticles
US7623287B2 (en) * 2006-04-19 2009-11-24 Qualcomm Mems Technologies, Inc. Non-planar surface structures and process for microelectromechanical systems
US7578189B1 (en) 2006-05-10 2009-08-25 Qualtre, Inc. Three-axis accelerometers
US8186232B2 (en) * 2006-05-30 2012-05-29 The Timken Company Displacement sensor
US7405863B2 (en) * 2006-06-01 2008-07-29 Qualcomm Mems Technologies, Inc. Patterning of mechanical layer in MEMS to reduce stresses at supports
US7628072B2 (en) * 2006-07-19 2009-12-08 Freescale Semiconductor, Inc. MEMS device and method of reducing stiction in a MEMS device
DE102006033636B4 (en) 2006-07-20 2022-08-11 Robert Bosch Gmbh accelerometer
US7545552B2 (en) * 2006-10-19 2009-06-09 Qualcomm Mems Technologies, Inc. Sacrificial spacer process and resultant structure for MEMS support structure
KR100899812B1 (en) * 2006-12-05 2009-05-27 한국전자통신연구원 Capacitive accelerometer
US7706042B2 (en) 2006-12-20 2010-04-27 Qualcomm Mems Technologies, Inc. MEMS device and interconnects for same
US7535621B2 (en) 2006-12-27 2009-05-19 Qualcomm Mems Technologies, Inc. Aluminum fluoride films for microelectromechanical system applications
KR20090125087A (en) * 2007-02-20 2009-12-03 퀄컴 엠이엠스 테크놀로지스, 인크. Equipment and methods for etching of mems
US7810373B2 (en) * 2007-02-22 2010-10-12 Seagate Technology Llc MEMS shock sensors
US7719752B2 (en) 2007-05-11 2010-05-18 Qualcomm Mems Technologies, Inc. MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same
US7625825B2 (en) * 2007-06-14 2009-12-01 Qualcomm Mems Technologies, Inc. Method of patterning mechanical layer for MEMS structures
US7569488B2 (en) * 2007-06-22 2009-08-04 Qualcomm Mems Technologies, Inc. Methods of making a MEMS device by monitoring a process parameter
US8068268B2 (en) * 2007-07-03 2011-11-29 Qualcomm Mems Technologies, Inc. MEMS devices having improved uniformity and methods for making them
WO2009015231A1 (en) 2007-07-25 2009-01-29 Qualcomm Mems Technologies, Inc. Mems display devices and methods of fabricating the same
US7752916B2 (en) * 2007-08-31 2010-07-13 The Board Of Trustees Of The University Of Illinois Apparatus and method for material testing of microscale and nanoscale samples
US7814794B2 (en) 2007-09-07 2010-10-19 Pixart Imaging Inc. Micromachined sensors
DE102007057044B4 (en) 2007-09-10 2021-08-05 Continental Teves Ag & Co. Ohg Micromechanical spring
US7704849B2 (en) * 2007-12-03 2010-04-27 Micron Technology, Inc. Methods of forming trench isolation in silicon of a semiconductor substrate by plasma
US7863079B2 (en) 2008-02-05 2011-01-04 Qualcomm Mems Technologies, Inc. Methods of reducing CD loss in a microelectromechanical device
US8023191B2 (en) * 2008-05-07 2011-09-20 Qualcomm Mems Technologies, Inc. Printable static interferometric images
US8076893B2 (en) * 2008-09-04 2011-12-13 The Board Of Trustees Of The University Of Illinois Displacement actuation and sensing for an electrostatic drive
WO2010029516A1 (en) * 2008-09-15 2010-03-18 Nxp B.V. A capacitive sensor device and a method of sensing accelerations
EP2790004B1 (en) * 2008-10-07 2019-04-17 Bruker Nano, Inc. Micro/nano-mechanical test system employing tensile test holder with push-to-pull transformer
US8499629B2 (en) * 2008-10-10 2013-08-06 Honeywell International Inc. Mounting system for torsional suspension of a MEMS device
US7943525B2 (en) * 2008-12-19 2011-05-17 Freescale Semiconductor, Inc. Method of producing microelectromechanical device with isolated microstructures
US8392340B2 (en) * 2009-03-13 2013-03-05 Apple Inc. Method and apparatus for detecting conditions of a peripheral device including motion, and determining/predicting temperature(S) wherein at least one temperature is weighted based on detected conditions
JP5678442B2 (en) * 2009-03-26 2015-03-04 セイコーエプソン株式会社 Physical quantity sensor and electronic equipment
JP2010249805A (en) * 2009-03-26 2010-11-04 Seiko Epson Corp Mems sensor, mems sensor manufacturing method, and electronic device
WO2010127453A1 (en) 2009-05-06 2010-11-11 Simoes Paulo G Stackable and collapsible trolley cart system
JP2011075543A (en) * 2009-09-07 2011-04-14 Seiko Epson Corp Physical quantity sensor, method for manufacturing the same, and electronic apparatus
US20110174074A1 (en) * 2010-01-15 2011-07-21 Freescale Semiconductor, Inc. Framed transducer device
US8505380B2 (en) * 2010-02-19 2013-08-13 Honeywell International Inc. Out-of plane comb-drive accelerometer
RU2457494C2 (en) * 2010-04-26 2012-07-27 Государственное образовательное учреждение высшего профессионального образования "Тульский государственный университет" (ТулГУ) Axial accelerometer
US9021880B2 (en) 2010-04-30 2015-05-05 Qualcomm Mems Technologies, Inc. Micromachined piezoelectric three-axis gyroscope and stacked lateral overlap transducer (slot) based three-axis accelerometer
JP5527019B2 (en) * 2010-05-28 2014-06-18 セイコーエプソン株式会社 Physical quantity sensor and electronic equipment
US8351053B2 (en) 2010-06-25 2013-01-08 The Board Of Trustees Of The University Of Illinois Apparatus and method for in situ testing of microscale and nanoscale samples
WO2012002514A1 (en) 2010-07-01 2012-01-05 ローム株式会社 Semiconductor device and method for manufacturing same
US20120146452A1 (en) * 2010-12-10 2012-06-14 Miradia, Inc. Microelectromechanical system device and semi-manufacture and manufacturing method thereof
US9525925B2 (en) 2011-02-25 2016-12-20 Infineon Technologies Ag Sensor with movable part and biasing
CN102156203B (en) 2011-03-15 2013-07-24 迈尔森电子(天津)有限公司 MEMS (micro-electromechanical system) inertial sensor and forming method of MEMS inertial sensor
JP5790920B2 (en) 2011-04-20 2015-10-07 セイコーエプソン株式会社 FUNCTIONAL ELEMENT, SENSOR ELEMENT, ELECTRONIC DEVICE, AND FUNCTIONAL ELEMENT MANUFACTURING METHOD
US8659816B2 (en) 2011-04-25 2014-02-25 Qualcomm Mems Technologies, Inc. Mechanical layer and methods of making the same
WO2012153335A1 (en) * 2011-05-09 2012-11-15 Ramot At Tel-Aviv University Ltd. Bistable force and/or acceleration sensor
JP5790297B2 (en) 2011-08-17 2015-10-07 セイコーエプソン株式会社 Physical quantity sensor and electronic equipment
JP5999302B2 (en) 2012-02-09 2016-09-28 セイコーエプソン株式会社 Electronic device, manufacturing method thereof, and electronic apparatus
JP5983912B2 (en) 2012-02-09 2016-09-06 セイコーエプソン株式会社 Electronic device, manufacturing method thereof, and electronic apparatus
JP6056177B2 (en) 2012-04-11 2017-01-11 セイコーエプソン株式会社 Gyro sensor, electronic equipment
JP2014021037A (en) 2012-07-23 2014-02-03 Seiko Epson Corp Mems device, electronic module, electronic apparatus, and moving body
US9711392B2 (en) * 2012-07-25 2017-07-18 Infineon Technologies Ag Field emission devices and methods of making thereof
TWI548861B (en) * 2012-08-07 2016-09-11 國立清華大學 Inertial sensing device
CN102879608B (en) * 2012-10-26 2014-12-24 中国科学院上海微系统与信息技术研究所 Capacitive acceleration transducer for bending elastic beam and manufacturing method
US9235937B1 (en) 2013-06-05 2016-01-12 Analog Devices, Inc. Mounting method for satellite crash sensors
JP6206651B2 (en) 2013-07-17 2017-10-04 セイコーエプソン株式会社 Functional element, electronic device, and moving object
US9695515B2 (en) * 2013-08-30 2017-07-04 Hewlett-Packard Development Company, L.P. Substrate etch
JP2016042074A (en) 2014-08-13 2016-03-31 セイコーエプソン株式会社 Physical quantity sensor, electronic apparatus and moving body
CA3006938C (en) 2014-12-10 2023-08-15 Paul D. Okulov Micro electro-mechanical strain displacement sensor and usage monitoring system
FR3030739B1 (en) 2014-12-18 2019-05-03 Commissariat A L'energie Atomique Et Aux Energies Alternatives DYNAMIC PRESSURE SENSOR WITH IMPROVED OPERATION
RU2597950C1 (en) * 2015-06-22 2016-09-20 федеральное государственное автономное образовательное учреждение высшего образования "Южный федеральный университет" (Южный федеральный университет) Integral micro mechanical gyroscope accelerometer
US10877063B2 (en) * 2015-12-10 2020-12-29 Invensense, Inc. MEMS sensor with compensation of residual voltage
DE102016215829A1 (en) * 2016-08-23 2018-03-01 Robert Bosch Gmbh Micromechanical component
US10826208B1 (en) * 2017-01-30 2020-11-03 Superior Sensor Technology Sensor with integrated electrical contacts
US10086809B1 (en) * 2017-05-02 2018-10-02 Delphi Technologies, Inc. Automatic braking system
RU2660412C1 (en) * 2017-08-23 2018-07-06 федеральное государственное автономное образовательное учреждение высшего образования "Южный федеральный университет" (Южный федеральный университет) Integrated micro-mechanical tunnel accelerometer
US10712360B2 (en) 2017-09-27 2020-07-14 Azoteq (Pty) Ltd Differential charge transfer based accelerometer
RU192953U1 (en) * 2018-12-20 2019-10-08 федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский национальный исследовательский университет информационных технологий, механики и оптики" (Университет ИТМО) MEMS ACCELEROMETER
US11592533B2 (en) 2020-06-18 2023-02-28 Beijing Voyager Technology Co., Ltd. MEMS mirror structure with backside skeleton
US20220041429A1 (en) * 2020-08-07 2022-02-10 Stmicroelectronics S.R.L. Microelectromechanical sensor device with improved stability to stress
US20220252636A1 (en) * 2021-02-05 2022-08-11 Kionix, Inc. Accelerometer apparatuses and systems
RU2758814C1 (en) * 2021-04-30 2021-11-02 Федеральное государственное бюджетное образовательное учреждение высшего образования «Московский авиационный институт (национальный исследовательский университет)» Micro-opto-electromechanical compensation converter of linear accelerations with circuits of coarse-precise stabilization of the sensitive element

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL136155C (en) 1966-09-09
US4342227A (en) 1980-12-24 1982-08-03 International Business Machines Corporation Planar semiconductor three direction acceleration detecting device and method of fabrication
CH642461A5 (en) 1981-07-02 1984-04-13 Centre Electron Horloger ACCELEROMETER.
US4426246A (en) * 1982-07-26 1984-01-17 Bell Telephone Laboratories, Incorporated Plasma pretreatment with BCl3 to remove passivation formed by fluorine-etch
US4553436A (en) 1982-11-09 1985-11-19 Texas Instruments Incorporated Silicon accelerometer
WO1984002886A1 (en) 1983-01-21 1984-08-02 Lotus Car Vehicle suspension system
JPS60117631A (en) * 1983-11-30 1985-06-25 Toshiba Corp Dry etching method of compound semiconductor
FR2558263B1 (en) 1984-01-12 1986-04-25 Commissariat Energie Atomique DIRECTIVE ACCELEROMETER AND METHOD FOR MANUFACTURING IT WITH MICROLITHOGRAPHY
FR2560997B1 (en) 1984-03-06 1987-06-05 Sfena ACCELEROMETRIC SENSOR WITH PLANE PENDULAR STRUCTURE
JPS61163011A (en) * 1985-01-14 1986-07-23 Nissan Motor Co Ltd Electronic control shock absorber
FR2580389B2 (en) 1985-04-16 1989-03-03 Sfena ELECTROSTATIC RECALL MICRO-FACTORY ACCELEROMETER
DE3515349A1 (en) 1985-04-27 1986-10-30 Messerschmitt-Bölkow-Blohm GmbH, 8012 Ottobrunn ELECTRICAL TRANSMITTER FOR MEASURING MECHANICAL SIZES
US4662059A (en) * 1985-09-19 1987-05-05 Rca Corporation Method of making stabilized silicon-on-insulator field-effect transistors having 100 oriented side and top surfaces
US4736629A (en) 1985-12-20 1988-04-12 Silicon Designs, Inc. Micro-miniature accelerometer
DE3783557T2 (en) * 1986-10-24 1993-05-13 Mazda Motor VEHICLE SUSPENSION SYSTEM WITH VARIABLE SUSPENSION CHARACTERISTICS.
US4882933A (en) 1988-06-03 1989-11-28 Novasensor Accelerometer with integral bidirectional shock protection and controllable viscous damping
US4945765A (en) 1988-08-31 1990-08-07 Kearfott Guidance & Navigation Corp. Silicon micromachined accelerometer
JPH0623782B2 (en) 1988-11-15 1994-03-30 株式会社日立製作所 Capacitance type acceleration sensor and semiconductor pressure sensor
GB8910392D0 (en) 1989-05-05 1989-06-21 Lotus Group Plc A vehicle suspension control system
GB8913212D0 (en) 1989-06-08 1989-07-26 Lotus Group Plc A wheeled vehicle steering system
US5253510A (en) 1989-06-22 1993-10-19 I C Sensors Self-testable micro-accelerometer
US5103667A (en) 1989-06-22 1992-04-14 Ic Sensors, Inc. Self-testable micro-accelerometer and method
US5098122A (en) 1989-12-06 1992-03-24 Breed Automotive Velocity change sensor with improved spring bias
US5126812A (en) 1990-02-14 1992-06-30 The Charles Stark Draper Laboratory, Inc. Monolithic micromechanical accelerometer
US5233213A (en) * 1990-07-14 1993-08-03 Robert Bosch Gmbh Silicon-mass angular acceleration sensor
EP0543901B1 (en) 1990-08-17 1995-10-04 Analog Devices, Inc. Monolithic accelerometer
US5314572A (en) 1990-08-17 1994-05-24 Analog Devices, Inc. Method for fabricating microstructures
US5249465A (en) 1990-12-11 1993-10-05 Motorola, Inc. Accelerometer utilizing an annular mass
US5205171A (en) 1991-01-11 1993-04-27 Northrop Corporation Miniature silicon accelerometer and method
US5260596A (en) 1991-04-08 1993-11-09 Motorola, Inc. Monolithic circuit with integrated bulk structure resonator
JP2580405B2 (en) 1991-06-04 1997-02-12 株式会社デンソー Starting device for vehicle occupant protection device
US5315518A (en) 1991-06-10 1994-05-24 General Motors Corporation Method and apparatus for initializing antilock brake control on split coefficient surface
US5121180A (en) 1991-06-21 1992-06-09 Texas Instruments Incorporated Accelerometer with central mass in support
JP3080257B2 (en) * 1991-08-06 2000-08-21 株式会社ユニシアジェックス Vehicle suspension system
US5275474A (en) 1991-10-04 1994-01-04 General Motors Corporation Vehicle wheel slip control on split coefficient surface
US5198390A (en) 1992-01-16 1993-03-30 Cornell Research Foundation, Inc. RIE process for fabricating submicron, silicon electromechanical structures
US5393375A (en) 1992-02-03 1995-02-28 Cornell Research Foundation, Inc. Process for fabricating submicron single crystal electromechanical structures
US5255191A (en) * 1992-03-26 1993-10-19 General Motors Corporation Vehicle suspension control with relative suspension position sensor and differentiator
US5349855A (en) * 1992-04-07 1994-09-27 The Charles Stark Draper Laboratory, Inc. Comb drive micromechanical tuning fork gyro
US5357803A (en) 1992-04-08 1994-10-25 Rochester Institute Of Technology Micromachined microaccelerometer for measuring acceleration along three axes
US5353641A (en) 1992-08-07 1994-10-11 Ford Motor Company Digital capacitive accelerometer
EP0590476B1 (en) 1992-09-21 1997-12-10 Nec Corporation Crash/non-crash discrimination using frequency components of acceleration uniquely generated upon crash impact
US5411289A (en) 1993-10-29 1995-05-02 Morton International, Inc. Air bag system for a motor vehicle
US5454630A (en) 1994-04-29 1995-10-03 General Motors Corporation Automotive antilock braking

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