CA2367732A1 - Electromagnetic wave generating source probing device, method therefor and analyzing method therefor - Google Patents
Electromagnetic wave generating source probing device, method therefor and analyzing method therefor Download PDFInfo
- Publication number
- CA2367732A1 CA2367732A1 CA002367732A CA2367732A CA2367732A1 CA 2367732 A1 CA2367732 A1 CA 2367732A1 CA 002367732 A CA002367732 A CA 002367732A CA 2367732 A CA2367732 A CA 2367732A CA 2367732 A1 CA2367732 A1 CA 2367732A1
- Authority
- CA
- Canada
- Prior art keywords
- method therefor
- electromagnetic
- electromagnetic wave
- electromagnetic field
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
- G01R29/08—Measuring electromagnetic field characteristics
- G01R29/0807—Measuring electromagnetic field characteristics characterised by the application
- G01R29/0814—Field measurements related to measuring influence on or from apparatus, components or humans, e.g. in ESD, EMI, EMC, EMP testing, measuring radiation leakage; detecting presence of micro- or radiowave emitters; dosimetry; testing shielding; measurements related to lightning
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
- G01R29/08—Measuring electromagnetic field characteristics
- G01R29/0807—Measuring electromagnetic field characteristics characterised by the application
- G01R29/0814—Field measurements related to measuring influence on or from apparatus, components or humans, e.g. in ESD, EMI, EMC, EMP testing, measuring radiation leakage; detecting presence of micro- or radiowave emitters; dosimetry; testing shielding; measurements related to lightning
- G01R29/0821—Field measurements related to measuring influence on or from apparatus, components or humans, e.g. in ESD, EMI, EMC, EMP testing, measuring radiation leakage; detecting presence of micro- or radiowave emitters; dosimetry; testing shielding; measurements related to lightning rooms and test sites therefor, e.g. anechoic chambers, open field sites or TEM cells
Abstract
Electromagnetic wave source detecting analyzing apparatus and method that can detect and/or analyze a source of (electromagnetic disturbing wave) representing a main factor in generating an electromagnetic field remotely of the apparatus in order to suppress the electromagnetic field intensity at the remote distance from the apparatus to below a regulated value. A magnetic field near an object is measured by a set of probes. A
position of an electromagnetic wave source is detected using a phase difference between the two probes. A
current distribution on the measured object is determined by solving simultaneous equations containing the position information and magnitudes of measured magnetic fields.
An electromagnetic field at a remote distance from the apparatus is determined from the current distribution to identify the source of the electromagnetic field.
position of an electromagnetic wave source is detected using a phase difference between the two probes. A
current distribution on the measured object is determined by solving simultaneous equations containing the position information and magnitudes of measured magnetic fields.
An electromagnetic field at a remote distance from the apparatus is determined from the current distribution to identify the source of the electromagnetic field.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11117028A JP2000304790A (en) | 1999-04-23 | 1999-04-23 | Device and method for investigating electromagnetic wave generating source and method for analyzing the source |
JP11/117028 | 1999-04-23 | ||
PCT/JP2000/002623 WO2000065362A1 (en) | 1999-04-23 | 2000-04-21 | Electromagnetic wave generating source probing device, method therefor and analyzing method therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2367732A1 true CA2367732A1 (en) | 2000-11-02 |
CA2367732C CA2367732C (en) | 2007-01-09 |
Family
ID=14701665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002367732A Expired - Fee Related CA2367732C (en) | 1999-04-23 | 2000-04-21 | Electromagnetic wave generating source probing device, method therefor and analyzing method therefor |
Country Status (7)
Country | Link |
---|---|
US (2) | US6411104B1 (en) |
EP (1) | EP1174722A4 (en) |
JP (1) | JP2000304790A (en) |
KR (1) | KR20020005701A (en) |
CN (1) | CN1193239C (en) |
CA (1) | CA2367732C (en) |
WO (1) | WO2000065362A1 (en) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000304790A (en) * | 1999-04-23 | 2000-11-02 | Hitachi Ltd | Device and method for investigating electromagnetic wave generating source and method for analyzing the source |
JP2001311756A (en) * | 2000-04-28 | 2001-11-09 | Advantest Corp | Field distribution measuring method and measuring device |
JP4003403B2 (en) * | 2001-03-16 | 2007-11-07 | 株式会社日立製作所 | Electromagnetic source search method |
JP2004020403A (en) * | 2002-06-18 | 2004-01-22 | Hitachi Ltd | Electronic equipment display device, electronic equipment, and its manufacturing method |
JP2004069372A (en) * | 2002-08-02 | 2004-03-04 | Taiyo Yuden Co Ltd | Method, apparatus and program for calculating intensity of distant electromagnetic field, and recording medium recording the program |
US6963301B2 (en) * | 2002-08-19 | 2005-11-08 | G-Track Corporation | System and method for near-field electromagnetic ranging |
US7298314B2 (en) * | 2002-08-19 | 2007-11-20 | Q-Track Corporation | Near field electromagnetic positioning system and method |
US7307595B2 (en) * | 2004-12-21 | 2007-12-11 | Q-Track Corporation | Near field location system and method |
US7414571B2 (en) * | 2002-08-19 | 2008-08-19 | Q-Track Corporation | Low frequency asset tag tracking system and method |
CN100338478C (en) * | 2002-08-19 | 2007-09-19 | Q-Track股份有限公司 | Near field electromagnetic positioning system and method |
AU2003296197A1 (en) * | 2002-12-16 | 2004-07-09 | Wei Wu | Emi measuring method and its system |
JP4481578B2 (en) * | 2003-02-28 | 2010-06-16 | パナソニック株式会社 | Electromagnetic wave measuring apparatus and method |
JPWO2004109560A1 (en) * | 2003-06-05 | 2006-07-20 | 富士通株式会社 | Electromagnetic field intensity calculation device and calculation method by cooperation of circuit analysis and electromagnetic wave analysis |
FR2871580B1 (en) * | 2004-06-09 | 2006-10-27 | Inrets | LOCATION OF AN ELECTROMAGNETIC RADIATION SOURCE ON AN ELECTRICAL EQUIPMENT |
JP4635544B2 (en) * | 2004-09-29 | 2011-02-23 | 株式会社日立製作所 | Electric field distribution measuring method and electric field distribution measuring apparatus |
US7242176B2 (en) * | 2004-12-20 | 2007-07-10 | Dell Products, L.P. | Systems and methods for evaluating electromagnetic interference |
US7642973B2 (en) * | 2004-12-22 | 2010-01-05 | Panasonic Corporation | Electromagnetic wave analysis apparatus and design support apparatus |
EP1837666A4 (en) * | 2005-01-11 | 2011-08-24 | Taiyo Yuden Kk | Electromagnetic field distribution measuring method and apparatus thereof, computer program and information recording medium |
JP4619799B2 (en) * | 2005-01-20 | 2011-01-26 | 太陽誘電株式会社 | Electric field vector calculation method and apparatus, electric field vector calculation program, and recording medium recording the program |
CN100392414C (en) * | 2005-04-15 | 2008-06-04 | 中兴通讯股份有限公司 | Method and device for measuring electromagnetic radiation source in electronic device |
JP5170955B2 (en) * | 2005-12-13 | 2013-03-27 | パナソニック株式会社 | Electromagnetic wave measuring method and electromagnetic wave measuring device |
DE102006029122A1 (en) * | 2006-06-22 | 2007-12-27 | Amedo Gmbh | System for determining the position of a medical instrument |
CN101191806B (en) * | 2006-11-29 | 2011-03-30 | 比亚迪股份有限公司 | Apparatus and method for testing automobile electromagnetic sensitivity |
US9063180B2 (en) * | 2007-08-29 | 2015-06-23 | Kanazawa University | Electromagnetic field space distribution visualizing device, electromagnetic field space distribution visualizing method, and program thereof |
US20090186588A1 (en) * | 2008-01-18 | 2009-07-23 | Nokia Corporation | Method and apparatus for determining context information using electromagnetic interference patterns |
JP5410827B2 (en) * | 2009-04-30 | 2014-02-05 | パナソニック株式会社 | Electromagnetic wave source determination method and apparatus |
JP5362599B2 (en) * | 2010-01-26 | 2013-12-11 | 株式会社日立製作所 | Electromagnetic source exploration method, electromagnetic source exploration program, electromagnetic source exploration device |
DE102011088171A1 (en) * | 2011-12-09 | 2013-06-13 | Rhode & Schwarz Gmbh & Co. Kg | Method for contactless measurement of electric field distribution in to-be tested electronic component, involves emitting or transmitting microwave signals from electronic component to be tested |
CN102590642A (en) * | 2012-02-29 | 2012-07-18 | 北京无线电计量测试研究所 | Calibrating method and system for field uniformity of transient electromagnetic field |
FR2998675B1 (en) * | 2012-11-27 | 2015-08-07 | Eads Europ Aeronautic Defence | NEAR FIELD MEASURING DEVICE |
US9285411B2 (en) * | 2013-07-25 | 2016-03-15 | Hitachi, Ltd | Method and system for identifying an electrical noise propagation path |
JP6469388B2 (en) * | 2014-08-27 | 2019-02-13 | 株式会社デンソーテン | Electric field strength calculation program, electric field strength calculation device, and electric field strength calculation method |
JP6375956B2 (en) * | 2015-01-15 | 2018-08-22 | Tdk株式会社 | Equivalent electric field strength estimation method and radiated disturbance measurement apparatus |
JP7183907B2 (en) * | 2019-03-27 | 2022-12-06 | Tdk株式会社 | Electromagnetic wave measurement point calculation program and radiated interference wave measurement device |
CN114441865B (en) * | 2022-02-10 | 2022-08-05 | 北京为准智能科技有限公司 | Portable electromagnetic wave intensity distributed detection system based on smart phone |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4713768A (en) | 1984-02-20 | 1987-12-15 | Hitachi, Ltd. | Method of localizing a moving body |
CA1286724C (en) * | 1986-03-27 | 1991-07-23 | Richard Ralph Goulette | Method and apparatus for monitoring electromagnetic emission levels |
US5300879A (en) * | 1990-06-18 | 1994-04-05 | Nec Corporation | Bidimensional electromagnetic emission level monitoring equipment |
US5414366A (en) * | 1991-04-29 | 1995-05-09 | Electronic Development, Inc. | Electromagnetic field susceptibility test apparatus and methods |
JPH04329376A (en) | 1991-04-30 | 1992-11-18 | Nippon Telegr & Teleph Corp <Ntt> | Electromagnetic interference source position estimating method |
US5311116A (en) * | 1992-04-02 | 1994-05-10 | Electronic Development, Inc. | Multi-channel electromagnetically transparent voltage waveform monitor link |
JPH05281274A (en) | 1992-04-03 | 1993-10-29 | Nippon Telegr & Teleph Corp <Ntt> | Three-dimensional disturbing wave source detector |
KR950012094A (en) * | 1993-10-04 | 1995-05-16 | 가나이 쯔또무 | Physical property information measuring device |
JPH07181209A (en) | 1993-12-24 | 1995-07-21 | Sharp Corp | Passive imaging method of electromagnetic radiation source |
DE69528479T2 (en) * | 1994-01-12 | 2003-05-15 | Advantest Corp | display device |
JPH10142275A (en) | 1996-11-11 | 1998-05-29 | Nec Corp | Plane magnetic field measuring system |
JP3684051B2 (en) * | 1997-10-24 | 2005-08-17 | 株式会社リコー | Electromagnetic interference measurement device |
US6249248B1 (en) * | 1998-04-17 | 2001-06-19 | Advantest Corporation | Radio wave visualizing method and apparatus |
JP3709708B2 (en) * | 1998-04-17 | 2005-10-26 | 株式会社日立製作所 | Electromagnetic wave source exploration device and exploration method thereof |
JP2000304790A (en) * | 1999-04-23 | 2000-11-02 | Hitachi Ltd | Device and method for investigating electromagnetic wave generating source and method for analyzing the source |
-
1999
- 1999-04-23 JP JP11117028A patent/JP2000304790A/en active Pending
-
2000
- 2000-04-20 US US09/553,319 patent/US6411104B1/en not_active Expired - Fee Related
- 2000-04-21 CA CA002367732A patent/CA2367732C/en not_active Expired - Fee Related
- 2000-04-21 CN CNB008065233A patent/CN1193239C/en not_active Expired - Fee Related
- 2000-04-21 EP EP00917414A patent/EP1174722A4/en not_active Withdrawn
- 2000-04-21 WO PCT/JP2000/002623 patent/WO2000065362A1/en not_active Application Discontinuation
- 2000-04-21 KR KR1020017013406A patent/KR20020005701A/en not_active Application Discontinuation
-
2002
- 2002-05-16 US US10/145,803 patent/US6617860B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1352745A (en) | 2002-06-05 |
EP1174722A4 (en) | 2008-08-20 |
JP2000304790A (en) | 2000-11-02 |
CN1193239C (en) | 2005-03-16 |
CA2367732C (en) | 2007-01-09 |
EP1174722A1 (en) | 2002-01-23 |
US20020153904A1 (en) | 2002-10-24 |
US6617860B2 (en) | 2003-09-09 |
KR20020005701A (en) | 2002-01-17 |
WO2000065362A1 (en) | 2000-11-02 |
US6411104B1 (en) | 2002-06-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed |
Effective date: 20150421 |