CA2380922A1 - Multilayer optics with adjustable working wavelength - Google Patents

Multilayer optics with adjustable working wavelength Download PDF

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Publication number
CA2380922A1
CA2380922A1 CA002380922A CA2380922A CA2380922A1 CA 2380922 A1 CA2380922 A1 CA 2380922A1 CA 002380922 A CA002380922 A CA 002380922A CA 2380922 A CA2380922 A CA 2380922A CA 2380922 A1 CA2380922 A1 CA 2380922A1
Authority
CA
Canada
Prior art keywords
working wavelength
adjustable working
multilayer optics
multilayer
optics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002380922A
Other languages
French (fr)
Other versions
CA2380922C (en
Inventor
Licai Jiang
Boris Verman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osmic Inc
Original Assignee
Osmic, Inc.
Licai Jiang
Boris Verman
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osmic, Inc., Licai Jiang, Boris Verman filed Critical Osmic, Inc.
Priority to CA002642736A priority Critical patent/CA2642736A1/en
Publication of CA2380922A1 publication Critical patent/CA2380922A1/en
Application granted granted Critical
Publication of CA2380922C publication Critical patent/CA2380922C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0883—Mirrors with a refractive index gradient
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Abstract

An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
CA002380922A 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength Expired - Lifetime CA2380922C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA002642736A CA2642736A1 (en) 1999-08-02 2000-08-01 X-ray reflector system for reflecting a plutality of x-ray frequencies

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/366,028 US6421417B1 (en) 1999-08-02 1999-08-02 Multilayer optics with adjustable working wavelength
US09/366,028 1999-08-02
PCT/US2000/021060 WO2001009904A2 (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CA002642736A Division CA2642736A1 (en) 1999-08-02 2000-08-01 X-ray reflector system for reflecting a plutality of x-ray frequencies

Publications (2)

Publication Number Publication Date
CA2380922A1 true CA2380922A1 (en) 2001-02-08
CA2380922C CA2380922C (en) 2008-12-09

Family

ID=23441383

Family Applications (2)

Application Number Title Priority Date Filing Date
CA002642736A Abandoned CA2642736A1 (en) 1999-08-02 2000-08-01 X-ray reflector system for reflecting a plutality of x-ray frequencies
CA002380922A Expired - Lifetime CA2380922C (en) 1999-08-02 2000-08-01 Multilayer optics with adjustable working wavelength

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CA002642736A Abandoned CA2642736A1 (en) 1999-08-02 2000-08-01 X-ray reflector system for reflecting a plutality of x-ray frequencies

Country Status (9)

Country Link
US (1) US6421417B1 (en)
EP (1) EP1200967B1 (en)
JP (1) JP2003506732A (en)
AT (1) ATE280993T1 (en)
AU (1) AU6511100A (en)
CA (2) CA2642736A1 (en)
CZ (1) CZ301738B6 (en)
DE (1) DE60015346T2 (en)
WO (1) WO2001009904A2 (en)

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US6510200B1 (en) 2001-06-29 2003-01-21 Osmic, Inc. Multi-layer structure with variable bandpass for monochromatization and spectroscopy
US6643353B2 (en) 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
JP2003255089A (en) * 2002-03-05 2003-09-10 Rigaku Industrial Co X-ray spectroscopy element and fluorescent x-ray analyzer
JP3629520B2 (en) * 2002-03-05 2005-03-16 理学電機工業株式会社 X-ray spectroscopic element and fluorescent X-ray analyzer using the same
EP1403882B1 (en) 2002-09-03 2012-06-13 Rigaku Corporation Parabolic mirror and movable X-ray source for obtaining parallel x-ray beams having different wavelengths
DE10254026C5 (en) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflector for X-radiation
DE602004012562T2 (en) * 2003-06-13 2009-04-16 Osmic, Inc., Auburn Hills BEAM TREATMENT SYSTEM
US7280634B2 (en) 2003-06-13 2007-10-09 Osmic, Inc. Beam conditioning system with sequential optic
US20060104596A1 (en) * 2004-07-02 2006-05-18 Charles Askins Deformable mirror apparatus
JP4432822B2 (en) * 2005-04-19 2010-03-17 船井電機株式会社 Variable shape mirror and optical pickup device having the same
US7425193B2 (en) * 2005-04-21 2008-09-16 Michigan State University Tomographic imaging system using a conformable mirror
DE102006015933B3 (en) * 2006-04-05 2007-10-31 Incoatec Gmbh Apparatus and method for adjusting an optical element
JP4278108B2 (en) * 2006-07-07 2009-06-10 株式会社リガク Ultra-small angle X-ray scattering measurement device
US7555098B2 (en) * 2007-05-02 2009-06-30 HD Technologies Inc. Method and apparatus for X-ray fluorescence analysis and detection
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US8130902B2 (en) * 2007-07-31 2012-03-06 Uchicago Argonne, Llc High-resolution, active-optic X-ray fluorescence analyzer
DE102007048743B4 (en) * 2007-10-08 2010-06-24 Ifg - Institute For Scientific Instruments Gmbh Method and device for determining the energetic composition of electromagnetic waves
CA2709216C (en) * 2008-01-30 2013-07-02 Reflective X-Ray Optics Llc Mirror mounting, alignment, and scanning mechanism and scanning method for radiographic x-ray imaging, and x-ray imaging device having same
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
US8126117B2 (en) * 2010-02-03 2012-02-28 Rigaku Innovative Technologies, Inc. Multi-beam X-ray system
JP4974391B2 (en) * 2010-02-21 2012-07-11 株式会社リガク X-ray spectroscopy method and X-ray spectrometer
US8406374B2 (en) 2010-06-25 2013-03-26 Rigaku Innovative Technologies, Inc. X-ray optical systems with adjustable convergence and focal spot size
ES2688542T3 (en) 2010-08-19 2018-11-05 Convergent R.N.R Ltd X-ray irradiation system of a selected volume
CN102525492A (en) * 2010-12-31 2012-07-04 上海西门子医疗器械有限公司 Device for selecting X-ray energy spectrum
KR101332502B1 (en) * 2011-06-14 2013-11-26 전남대학교산학협력단 An X-ray Needle Module for Local Radiation Therapy
US20130182827A1 (en) * 2011-12-02 2013-07-18 Canon Kabushiki Kaisha X-ray waveguide and x-ray waveguide system
WO2014082795A1 (en) * 2012-11-29 2014-06-05 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Method and device for performing an x-ray fluorescence analysis
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
JP6025211B2 (en) * 2013-11-28 2016-11-16 株式会社リガク X-ray topography equipment
CN107847200B (en) * 2015-07-14 2022-04-01 皇家飞利浦有限公司 Imaging apparatus and system with enhanced X-ray radiation
DE102017202802A1 (en) * 2017-02-21 2018-08-23 Carl Zeiss Smt Gmbh Lens and optical system with such a lens
US10989822B2 (en) * 2018-06-04 2021-04-27 Sigray, Inc. Wavelength dispersive x-ray spectrometer
US10658145B2 (en) 2018-07-26 2020-05-19 Sigray, Inc. High brightness x-ray reflection source
EP3603516A1 (en) * 2018-08-02 2020-02-05 Siemens Healthcare GmbH X-ray equipment and method for operating same
CN112638261A (en) 2018-09-04 2021-04-09 斯格瑞公司 System and method for utilizing filtered x-ray fluorescence
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
CN109799612B (en) * 2019-03-15 2020-03-31 重庆大学 Curved surface reflector manufacturing method and variable curvature radius point light source line focusing imaging system
WO2021162947A1 (en) 2020-02-10 2021-08-19 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles

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Also Published As

Publication number Publication date
CA2642736A1 (en) 2001-02-08
CZ2002791A3 (en) 2002-11-13
JP2003506732A (en) 2003-02-18
WO2001009904A9 (en) 2002-09-12
WO2001009904A2 (en) 2001-02-08
DE60015346T2 (en) 2005-11-10
CZ301738B6 (en) 2010-06-09
ATE280993T1 (en) 2004-11-15
DE60015346D1 (en) 2004-12-02
WO2001009904A3 (en) 2001-09-27
US6421417B1 (en) 2002-07-16
CA2380922C (en) 2008-12-09
AU6511100A (en) 2001-02-19
EP1200967B1 (en) 2004-10-27
US20020080916A1 (en) 2002-06-27
EP1200967A2 (en) 2002-05-02

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Effective date: 20200804