CA2380922C - Multilayer optics with adjustable working wavelength - Google Patents
Multilayer optics with adjustable working wavelength Download PDFInfo
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- CA2380922C CA2380922C CA002380922A CA2380922A CA2380922C CA 2380922 C CA2380922 C CA 2380922C CA 002380922 A CA002380922 A CA 002380922A CA 2380922 A CA2380922 A CA 2380922A CA 2380922 C CA2380922 C CA 2380922C
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0883—Mirrors with a refractive index gradient
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Abstract
An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
Description
MULTILAYER OPTICS WITH ADJUSTABLE WORKING WAVELENGTH
BACKGROUND OF THE INVENTION
The present invention relates to an electromagnetic optic element. More specifically the present invention relates to reflective multilayer x-ray optics having adjustable working wavelengths.
X-ray optics are used in many applications such as x-ray diffraction analysis and spectroscopy that require the directing, focusing, collimation, or monochromatizing of x-ray energy from an x-ray source. The family of x-ray optics or reflectors used in such applications presently include: total reflection mirrors having a reflective surface coated with gold, copper, nickel, platinum, and other similar elements; crystal diffraction elements such as graphite; and multilayer structures.
The reflective surfaces in the present invention are configured as multilayer or graded-d multilayer x-ray reflective surfaces. Multilayer structures only reflect x-ray radiation when Bragg's equation is satisfied:
n?,=2dsin(A) where n = the order of reflection k = wavelength of the incident radiation d = layer-set spacing of a Bragg structure or the lattice spacing of a crystal 0 = angle of incidence Multilayer or graded-d multilayer reflectors/mirrors are optics which utilize their inherent multilayer structure to reflect narrow band or monochromatic x-ray radiation.
The multilayer structure of the present invention comprises light element layers of relatively low electron density alternating with heavy element layers of relatively high electron density, both of which define the d-spacing of the multilayer. The bandwidth of the reflected x-ray radiation can be customized by manipulating the optical and multilayer parameters of the reflector. The d spacing may be changed depthwise to control the bandpass of the multilayer mirror. The d-spacing of a multilayer mirror can also be tailored through lateral grading in such a way that the Bragg condition is satisfied at every point on a curved multilayer reflector.
Curved multilayer reflectors, including parabolic, elliptical, and other aspherically shaped reflectors must satisfy Bragg's law to reflect a certain specific x-ray wavelength (also referred to as energy or frequency). Bragg's law must be satisfied at every point on a curvature for a defined contour of such a reflecting mirror. Different reflecting surfaces require different d-spacing to reflect a specific x-ray wavelength.
This means the d-spacing should be matched with the curvature of a reflector to satisfy Bragg's law such that the desired x-ray wavelength will be reflected. Since Bragg's law must be satisfied, the incident angle and d-spacing are normally fixed and thus the reflected or working wavelength is fixed.
SUMMARY OF THE INVENTION
The present invention is a multilayer x-ray reflector/mirror which may be used to reflect multiple x-ray wavelengths.
In a first embodiment, the multilayer structure has a laterally graded d-spacing.
The working (reflected) wavelength of the multilayer reflector may be changed by simply varying its curvature and thus the angle of incidence for an x-ray beam to satisfy Bragg's law.
In a second embodiment, an electromagnetic reflector has a fixed curvature and a multilayer structure that has been configured to include a plurality of distinct d-spacings. The multilayer structure has also been laterally graded such that the electromagnetic reflector may reflect multiple x-ray wavelengths according to Bragg's law. Thus, the lateral grading of the d-spacings have been configured in conjunction with the curvature of the multilayer coating to reflect a plurality of x-ray wavelengths.
In a third embodiment of the present invention an electromagnetic reflector is formed with stripe-like multilayer coating sections. Each of the coating sections has a fixed curvature and graded d-spacing tailored to reflect a specific wavelength. To change the working wavelength of the reflector, the mirror or x-ray source need to be moved relative to each other so that the appropriate coating section is aligned with the x-ray source.
In accordance with one aspect of the present invention, there is provided an electromagnetic reflector comprising: a multilayer structure (18) having a d-spacing and a first curvature to reflect a first electromagnetic frequency;
and a movement apparatus (42) that varies the first curvature of the multilayer structure to a second curvature so that the multilayer structure reflects a second electromagnetic frequency.
In accordance with another aspect of the present invention, there is provided a method of reflecting multiple electromagnetic frequencies with a multilayer reflector comprising: generating electromagnetic energy; directing the electromagnetic energy at the multilayer reflector (10, 26, 28); and during the directing, adjusting a curvature of the multilayer reflector (10) to reflect the electromagnetic energy in accordance with Bragg's law.
BRIEF DESCRIPTION OF THE DRAWINGS
The various advantages of the present invention will become apparent to those skilled in the art after reading the following specification and by reference to the drawings, in which:
Figure 1 is a cross-sectional diagrammatic view of a multilayer Bragg reflector;
Figure 2 is a cross-sectional diagrammatic view of a multilayer reflector with a plurality of distinct d-spacings to reflect multiple x-ray wavelengths;
Figure 3 is a cross-sectional view of a parabolically shaped reflector, Figure 4 is a cross-sectional view of an elliptically shaped reflector.
Figure 5 is a magnified cross-sectional view taken within circle 5 of Figure 3;
Figure 6 is a magnified cross-sectional view taken within circle 6 of Figure 3;
Figure 7 is a magnified cross-sectional view taken within circle 7 of Figure 4;
Figure 8 is a magnified cross-sectional view taken within circle 8 of Figure 4;
Figure 9 is a diagrammatic view of the first embodiment of the reflector of the present invention illustrating its variable curvature and ability to reflect different x-ray wavelengths;
Figure 10 is a diagrammatic view of a bender used in the present invention;
Figure 11 is a cross sectional view of the second embodiment of the reflector of the present invention having a fixed curvature that is configured to include a plurality of distinct d-spacings and laterally graded such that it may reflect multiple x-ray wavelengths; and - -Figure 12 is a top view of the third embodiment of the reflector of the present invention with stripe-like sections having different d-spacings such that the reflector can reflect a plurality of x-ray frequencies.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
Figure 1 is a cross-sectional diagrammatic view of a multilayer reflector 10.
The multilayer reflector 10 is deposited on a substrate 12 and comprises a plurality of layer 3a sets with a thickness d. Each layer set 14 is made up of two separate layers of different materials; one with a relatively high electron density and one with a relatively low electron density. In operation, x-ray radiation 13 is incident on the multilayer reflector and narrow band or generally monochromatic radiation 16 is reflected according to 5 Bragg's law.
Figure 2 is a cross sectional diagram of a multilayer structure 18 having a plurality of distinct d-spacings dl and d2 varying in the depth direction and defined as depth grading. The multilayer structure 18 because of the distinct d-spacings dl and d2 may reflect multiple x-ray wavelengths (i.e. different groups of d-spacing to satisfy 10 a discrete range of reflected wavelengths). In operation, polychromatic x-ray radiation is incident on the surface of the multilayer structure 18 and low energy x-rays 22 are reflected by the relatively thicker d-spacings d2 and high energy x-rays 24 are reflected by the relatively thinner d-spacings dl.
Figures 3 and 4 are cross-sectional diagrams of fixed curvature multilayer optics 15 26 and 28 which generally reflect only one x-ray wavelength. Figure 3 illustrates the parabolically shaped multilayer optic 26 which collimates x-ray beams generated by an idealized point x-ray source 30 and Figure 4 illustrates the elliptically shaped multilayer optic 28 which focuses x-ray beams generated by an x-ray source 32 to a focal point 34. The curvature and d-spacing of optics 26 and 28 have been permanently 20 configured to satisfy Bragg's law for a specific wavelength at every point on the surface of the optics 26 and 28.
Figures 5, 6, 7, and 8 are cross-sectional magnified views of the multilayer surfaces taken within circles 5, 6, 7, and 8 of Figures 3 and 4. From these figures the variation in incident angle and the lateral grading of the d-spacing in order to satisfy Bragg's law for a specific frequency can be seen. In Figures 5 and 6 the parabolic optic 26 includes incident angle 0, and d-spacing d3 at one area of its surface and incident angle 62 and d-spacing d4 at another area. While these parameters are different, the result is that these areas reflect generally the same x-ray wavelength following Bragg's law. Similariy, in Figures 7 and 8 the elliptical optic 28 includes incident angle 03 and d-spacing d5 at one area of its surface and incident angle 04 and d-spacing d6 at another area which reflect the same x-ray wavelength. The shortcomings with these type of fixed curvature reflectors is that they may only be used to reflect a single x-ray wavelength or narrow band.
As discussed previously, multilayer reflectors require different d-spacing variations to reflect different x-ray wavelengths at the same incident angle and the d-spacing should match the surface curvature (angle of incidence) to reflect x-rays according to Bragg's law. The present invention provides electromagnetic reflectors which may be used to reflect a plurality of x-ray wavelengths having substantially no overlap.
A first embodiment of the present invention shown by Figure 8 comprises a multilayer reflector with variable curvature and a laterally graded d-spacing.
If a multilayer is a flat reflector with uniform d-spacing, the flat reflector can be rotated to reflect x-rays of different wavelengths, as the incidence angle will vary. If a multilayer has a curved surface the d-spacing must be laterally graded to satisfy Bragg's law at every point. Thus, the d-spacing or incidence angle may be changed to vary the x-ray wavelength reflected from a multilayer reflector. The following discussion and equations will demonstrate that for certain x-ray wavelengths the laterally graded d-spacing of a multilayer reflector may remain constant while only the curvature is varied and the curvature of a multilayer reflector may remain constant and have multiple graded d-spacings such that multiple x-ray wavelengths may be reflected by the multilayer reflector.
For parabolic, elliptical, and other aspherically shaped multilayer optics, either the d-spacing variation of the multilayer coating or the curvature of the optics can be manipulated such that the multilayer optics reflect x-rays with different wavelengths.
Following Bragg's law the d-spacing is given by:
(1) d=
2 sin B
Where 0 is the incident angle. It can be shown that the sin 0 can be written, at a very accurate approximation, as a product of a factor "C" (an arbitrary constant) and common form which is independent from the x-ray energy. The same d-spacing can be used for different wavelengths by changing the factor C such that a/C is a constant.
Accordingly, sin 8, which is determined by the configuration of the reflection surface, can be maintained the same if d-spacing is proportionally changed with the wavelength such that :
(1 b) sinB= ~
2d is maintained constant for different wavelengths.
For a parabolic mirror the curvature of the reflecting surface can be written as:
(2) y= 2px where p is the parabolic parameter. The accurate incident angle can be given by the following formula:
B=tan-', ( 2px)-tan1 F~22X_ x-p 2 p generally is a number on the order of .1 and x is generally in the range of several tens of millimeters to more than 100 millimeters. Due to the fact that 0 is small where tan 0~:z 0, the incident angle can be written as:
(3) ep 2x Using small angle approximation, d-spacing is determined by:
(4) d= ~
-p- 2 From the equations shown above it can be shown that d-spacing can be maintained for different reflected wavelengths by altering the curvature or parabolic parameter (p) of a parabolic shaped multilayer reflector.
For an elliptical mirror, the reflection surface is described by the equation:
(5) z z aZ +b =1 Where x and y are points in a Cartesian coordinate system and a is the major radius of the ellipse and b is the minor radius of the ellipse. The incident angle is given by the equation:
b aZ -x2 -2bx B=tan-'(/ )-tan-'( x+c a aZ -xZ
where c is defined by the equation:
c = Ja2 -62 For an x-ray elliptical mirror, the minor radius is much smaller than the major radius. Using small angle approximation, the above equation can be written as:
BN q aZ -x2 - -2qx x+a 1-q'` az -x2 where q b/a. Therefore the d-spacing is given by the equation:
(6) ~2 1 d=-q 2( az -x2 + 2x x+a az _x2 From the above formula, it can be shown that the d-spacing and focal position can be maintained by just changing the minor radius b.
Furthermore, we determine how d-spacing is defined as well as the wavelength dependency on d-spacing for a multilayer reflector. The d-spacing used in this application is defined by using first order Bragg's law (n=1), since multilayers generally operate under first order reflection. The "real d-spacing", or the "geometric d-spacing is different from the "first order Bragg d-spacing" due to the effects of refraction in the multilayer structure. In most applications a multilayer optic is used as a first order Bragg reflector. This is the reason that "d-spacing" is commonly defined and measured by the first order Bragg's law. Such defined d-spacing is the same for different wavelengths as shown in the following discussion.
The "real d-spacing" dris given by the following equation:
(7) dr =d(1- ~
sin 6 where 5is the optical index decrement. Therefore, higher order measurement gives a d-spacing closer to the "real d-spacing". However, the optical index is proportional to the square of the wavelength and so is sin2A. Therefore, the above equation becomes:
BACKGROUND OF THE INVENTION
The present invention relates to an electromagnetic optic element. More specifically the present invention relates to reflective multilayer x-ray optics having adjustable working wavelengths.
X-ray optics are used in many applications such as x-ray diffraction analysis and spectroscopy that require the directing, focusing, collimation, or monochromatizing of x-ray energy from an x-ray source. The family of x-ray optics or reflectors used in such applications presently include: total reflection mirrors having a reflective surface coated with gold, copper, nickel, platinum, and other similar elements; crystal diffraction elements such as graphite; and multilayer structures.
The reflective surfaces in the present invention are configured as multilayer or graded-d multilayer x-ray reflective surfaces. Multilayer structures only reflect x-ray radiation when Bragg's equation is satisfied:
n?,=2dsin(A) where n = the order of reflection k = wavelength of the incident radiation d = layer-set spacing of a Bragg structure or the lattice spacing of a crystal 0 = angle of incidence Multilayer or graded-d multilayer reflectors/mirrors are optics which utilize their inherent multilayer structure to reflect narrow band or monochromatic x-ray radiation.
The multilayer structure of the present invention comprises light element layers of relatively low electron density alternating with heavy element layers of relatively high electron density, both of which define the d-spacing of the multilayer. The bandwidth of the reflected x-ray radiation can be customized by manipulating the optical and multilayer parameters of the reflector. The d spacing may be changed depthwise to control the bandpass of the multilayer mirror. The d-spacing of a multilayer mirror can also be tailored through lateral grading in such a way that the Bragg condition is satisfied at every point on a curved multilayer reflector.
Curved multilayer reflectors, including parabolic, elliptical, and other aspherically shaped reflectors must satisfy Bragg's law to reflect a certain specific x-ray wavelength (also referred to as energy or frequency). Bragg's law must be satisfied at every point on a curvature for a defined contour of such a reflecting mirror. Different reflecting surfaces require different d-spacing to reflect a specific x-ray wavelength.
This means the d-spacing should be matched with the curvature of a reflector to satisfy Bragg's law such that the desired x-ray wavelength will be reflected. Since Bragg's law must be satisfied, the incident angle and d-spacing are normally fixed and thus the reflected or working wavelength is fixed.
SUMMARY OF THE INVENTION
The present invention is a multilayer x-ray reflector/mirror which may be used to reflect multiple x-ray wavelengths.
In a first embodiment, the multilayer structure has a laterally graded d-spacing.
The working (reflected) wavelength of the multilayer reflector may be changed by simply varying its curvature and thus the angle of incidence for an x-ray beam to satisfy Bragg's law.
In a second embodiment, an electromagnetic reflector has a fixed curvature and a multilayer structure that has been configured to include a plurality of distinct d-spacings. The multilayer structure has also been laterally graded such that the electromagnetic reflector may reflect multiple x-ray wavelengths according to Bragg's law. Thus, the lateral grading of the d-spacings have been configured in conjunction with the curvature of the multilayer coating to reflect a plurality of x-ray wavelengths.
In a third embodiment of the present invention an electromagnetic reflector is formed with stripe-like multilayer coating sections. Each of the coating sections has a fixed curvature and graded d-spacing tailored to reflect a specific wavelength. To change the working wavelength of the reflector, the mirror or x-ray source need to be moved relative to each other so that the appropriate coating section is aligned with the x-ray source.
In accordance with one aspect of the present invention, there is provided an electromagnetic reflector comprising: a multilayer structure (18) having a d-spacing and a first curvature to reflect a first electromagnetic frequency;
and a movement apparatus (42) that varies the first curvature of the multilayer structure to a second curvature so that the multilayer structure reflects a second electromagnetic frequency.
In accordance with another aspect of the present invention, there is provided a method of reflecting multiple electromagnetic frequencies with a multilayer reflector comprising: generating electromagnetic energy; directing the electromagnetic energy at the multilayer reflector (10, 26, 28); and during the directing, adjusting a curvature of the multilayer reflector (10) to reflect the electromagnetic energy in accordance with Bragg's law.
BRIEF DESCRIPTION OF THE DRAWINGS
The various advantages of the present invention will become apparent to those skilled in the art after reading the following specification and by reference to the drawings, in which:
Figure 1 is a cross-sectional diagrammatic view of a multilayer Bragg reflector;
Figure 2 is a cross-sectional diagrammatic view of a multilayer reflector with a plurality of distinct d-spacings to reflect multiple x-ray wavelengths;
Figure 3 is a cross-sectional view of a parabolically shaped reflector, Figure 4 is a cross-sectional view of an elliptically shaped reflector.
Figure 5 is a magnified cross-sectional view taken within circle 5 of Figure 3;
Figure 6 is a magnified cross-sectional view taken within circle 6 of Figure 3;
Figure 7 is a magnified cross-sectional view taken within circle 7 of Figure 4;
Figure 8 is a magnified cross-sectional view taken within circle 8 of Figure 4;
Figure 9 is a diagrammatic view of the first embodiment of the reflector of the present invention illustrating its variable curvature and ability to reflect different x-ray wavelengths;
Figure 10 is a diagrammatic view of a bender used in the present invention;
Figure 11 is a cross sectional view of the second embodiment of the reflector of the present invention having a fixed curvature that is configured to include a plurality of distinct d-spacings and laterally graded such that it may reflect multiple x-ray wavelengths; and - -Figure 12 is a top view of the third embodiment of the reflector of the present invention with stripe-like sections having different d-spacings such that the reflector can reflect a plurality of x-ray frequencies.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT
Figure 1 is a cross-sectional diagrammatic view of a multilayer reflector 10.
The multilayer reflector 10 is deposited on a substrate 12 and comprises a plurality of layer 3a sets with a thickness d. Each layer set 14 is made up of two separate layers of different materials; one with a relatively high electron density and one with a relatively low electron density. In operation, x-ray radiation 13 is incident on the multilayer reflector and narrow band or generally monochromatic radiation 16 is reflected according to 5 Bragg's law.
Figure 2 is a cross sectional diagram of a multilayer structure 18 having a plurality of distinct d-spacings dl and d2 varying in the depth direction and defined as depth grading. The multilayer structure 18 because of the distinct d-spacings dl and d2 may reflect multiple x-ray wavelengths (i.e. different groups of d-spacing to satisfy 10 a discrete range of reflected wavelengths). In operation, polychromatic x-ray radiation is incident on the surface of the multilayer structure 18 and low energy x-rays 22 are reflected by the relatively thicker d-spacings d2 and high energy x-rays 24 are reflected by the relatively thinner d-spacings dl.
Figures 3 and 4 are cross-sectional diagrams of fixed curvature multilayer optics 15 26 and 28 which generally reflect only one x-ray wavelength. Figure 3 illustrates the parabolically shaped multilayer optic 26 which collimates x-ray beams generated by an idealized point x-ray source 30 and Figure 4 illustrates the elliptically shaped multilayer optic 28 which focuses x-ray beams generated by an x-ray source 32 to a focal point 34. The curvature and d-spacing of optics 26 and 28 have been permanently 20 configured to satisfy Bragg's law for a specific wavelength at every point on the surface of the optics 26 and 28.
Figures 5, 6, 7, and 8 are cross-sectional magnified views of the multilayer surfaces taken within circles 5, 6, 7, and 8 of Figures 3 and 4. From these figures the variation in incident angle and the lateral grading of the d-spacing in order to satisfy Bragg's law for a specific frequency can be seen. In Figures 5 and 6 the parabolic optic 26 includes incident angle 0, and d-spacing d3 at one area of its surface and incident angle 62 and d-spacing d4 at another area. While these parameters are different, the result is that these areas reflect generally the same x-ray wavelength following Bragg's law. Similariy, in Figures 7 and 8 the elliptical optic 28 includes incident angle 03 and d-spacing d5 at one area of its surface and incident angle 04 and d-spacing d6 at another area which reflect the same x-ray wavelength. The shortcomings with these type of fixed curvature reflectors is that they may only be used to reflect a single x-ray wavelength or narrow band.
As discussed previously, multilayer reflectors require different d-spacing variations to reflect different x-ray wavelengths at the same incident angle and the d-spacing should match the surface curvature (angle of incidence) to reflect x-rays according to Bragg's law. The present invention provides electromagnetic reflectors which may be used to reflect a plurality of x-ray wavelengths having substantially no overlap.
A first embodiment of the present invention shown by Figure 8 comprises a multilayer reflector with variable curvature and a laterally graded d-spacing.
If a multilayer is a flat reflector with uniform d-spacing, the flat reflector can be rotated to reflect x-rays of different wavelengths, as the incidence angle will vary. If a multilayer has a curved surface the d-spacing must be laterally graded to satisfy Bragg's law at every point. Thus, the d-spacing or incidence angle may be changed to vary the x-ray wavelength reflected from a multilayer reflector. The following discussion and equations will demonstrate that for certain x-ray wavelengths the laterally graded d-spacing of a multilayer reflector may remain constant while only the curvature is varied and the curvature of a multilayer reflector may remain constant and have multiple graded d-spacings such that multiple x-ray wavelengths may be reflected by the multilayer reflector.
For parabolic, elliptical, and other aspherically shaped multilayer optics, either the d-spacing variation of the multilayer coating or the curvature of the optics can be manipulated such that the multilayer optics reflect x-rays with different wavelengths.
Following Bragg's law the d-spacing is given by:
(1) d=
2 sin B
Where 0 is the incident angle. It can be shown that the sin 0 can be written, at a very accurate approximation, as a product of a factor "C" (an arbitrary constant) and common form which is independent from the x-ray energy. The same d-spacing can be used for different wavelengths by changing the factor C such that a/C is a constant.
Accordingly, sin 8, which is determined by the configuration of the reflection surface, can be maintained the same if d-spacing is proportionally changed with the wavelength such that :
(1 b) sinB= ~
2d is maintained constant for different wavelengths.
For a parabolic mirror the curvature of the reflecting surface can be written as:
(2) y= 2px where p is the parabolic parameter. The accurate incident angle can be given by the following formula:
B=tan-', ( 2px)-tan1 F~22X_ x-p 2 p generally is a number on the order of .1 and x is generally in the range of several tens of millimeters to more than 100 millimeters. Due to the fact that 0 is small where tan 0~:z 0, the incident angle can be written as:
(3) ep 2x Using small angle approximation, d-spacing is determined by:
(4) d= ~
-p- 2 From the equations shown above it can be shown that d-spacing can be maintained for different reflected wavelengths by altering the curvature or parabolic parameter (p) of a parabolic shaped multilayer reflector.
For an elliptical mirror, the reflection surface is described by the equation:
(5) z z aZ +b =1 Where x and y are points in a Cartesian coordinate system and a is the major radius of the ellipse and b is the minor radius of the ellipse. The incident angle is given by the equation:
b aZ -x2 -2bx B=tan-'(/ )-tan-'( x+c a aZ -xZ
where c is defined by the equation:
c = Ja2 -62 For an x-ray elliptical mirror, the minor radius is much smaller than the major radius. Using small angle approximation, the above equation can be written as:
BN q aZ -x2 - -2qx x+a 1-q'` az -x2 where q b/a. Therefore the d-spacing is given by the equation:
(6) ~2 1 d=-q 2( az -x2 + 2x x+a az _x2 From the above formula, it can be shown that the d-spacing and focal position can be maintained by just changing the minor radius b.
Furthermore, we determine how d-spacing is defined as well as the wavelength dependency on d-spacing for a multilayer reflector. The d-spacing used in this application is defined by using first order Bragg's law (n=1), since multilayers generally operate under first order reflection. The "real d-spacing", or the "geometric d-spacing is different from the "first order Bragg d-spacing" due to the effects of refraction in the multilayer structure. In most applications a multilayer optic is used as a first order Bragg reflector. This is the reason that "d-spacing" is commonly defined and measured by the first order Bragg's law. Such defined d-spacing is the same for different wavelengths as shown in the following discussion.
The "real d-spacing" dris given by the following equation:
(7) dr =d(1- ~
sin 6 where 5is the optical index decrement. Therefore, higher order measurement gives a d-spacing closer to the "real d-spacing". However, the optical index is proportional to the square of the wavelength and so is sin2A. Therefore, the above equation becomes:
(8) dr =d(1-AdZ
where A is a constant not dependent on energy. This means that the "first order d-spacing" is the same for different wavelengths and the d-spacing measured by different wavelengths is the same.
Referring to Figure 9 and the first embodiment of the present invention, a variable curvature multilayer reflector 36, is shown in two positions 38 and 40 having two different curvatures defined by the ellipses 33 and 35 and reflecting different x-ray wavelengths 39 and 41 to a focal point 31. A similar scheme may be configured for ~
parabolic collimating mirrors which conform to two different parabolas. The reflector 36 has more curvature at position 38 then at position 40. The increased curvature will allow the reflector to reflect larger x-ray wavelengths at position 38 then at position 40.
The reflector.at position 40 is modified with less curvature then at position 38 and will reflect shorter x-ray wavelengths. The curvature of the reflector 36 is exaggerated in Figure 9 to help illustrate the curvature at the alternate positions 38 and 40.
For a variable curvature parabolic mirror from Formula 4:
7=c ~- for all the wavelengths. Therefore the parabolic parameter must change in the following way:
where A is a constant not dependent on energy. This means that the "first order d-spacing" is the same for different wavelengths and the d-spacing measured by different wavelengths is the same.
Referring to Figure 9 and the first embodiment of the present invention, a variable curvature multilayer reflector 36, is shown in two positions 38 and 40 having two different curvatures defined by the ellipses 33 and 35 and reflecting different x-ray wavelengths 39 and 41 to a focal point 31. A similar scheme may be configured for ~
parabolic collimating mirrors which conform to two different parabolas. The reflector 36 has more curvature at position 38 then at position 40. The increased curvature will allow the reflector to reflect larger x-ray wavelengths at position 38 then at position 40.
The reflector.at position 40 is modified with less curvature then at position 38 and will reflect shorter x-ray wavelengths. The curvature of the reflector 36 is exaggerated in Figure 9 to help illustrate the curvature at the alternate positions 38 and 40.
For a variable curvature parabolic mirror from Formula 4:
7=c ~- for all the wavelengths. Therefore the parabolic parameter must change in the following way:
(9) p _ CZ
For an elliptical mirror, according to formula 6, the minor radius b must change as:
b C
For an elliptical mirror, according to formula 6, the minor radius b must change as:
b C
(10) Thus, the manipulation of the parabolic parameter p of the parabolic reflector and the minor radius b of the elliptical reflector may be adjusted to vary the wavelength of the reflected x-rays.
A four point bender 42 is shown in Figure 10 having precision actuators 44a and 44b which will vary the curvature of the reflector 36. Posts 4k~are fixed while members Y;5L~-l~are actuated to alter the curvature of the reflector 36. The bender 42 will vary the parabolic parameter p of a parabolically shaped multilayer reflector and the minor radius b of an elliptically shaped multilayer reflector as detailed above.
In a second embodiment of the present invention shown in Figure 11, a multilayer reflector 46 of fixed curvature, with a plurality of distinct d-spacings d7 and d8, is configured to reflect multiple x-ray wavelengths. Each d-spacing d7 and d8 will satisfy Bragg's law for a specific x-ray wavelength. The relatively larger d-spacing d8 will reflect longer wavelengths and the relatively shorter d-spacing d7 will reflect shorter wavelengths. The reflected wavelengths will have substantially no overlap.
Since the absorption for lower energy (longer wavelength) x-rays is stronger, the reflection layer d8 for the lower energy x-rays should be the top layers on the reflector 46.
As can be seen in the drawing, the d-spacings d7 and d8 are laterally graded in cooperation with the curvature of the reflector 46 to satisfy Bragg's law for a plurality of specific x-ray wavelengths_ In alternate embodiments of the present invention additional groups of d-spacings may be used limited only by the dimensions and structure of the reflector 46.
In a third embodiment of the present invention seen in FIG. 12 (an overhead or top view) a multilayer reflector 48 having stripe like sections 50a, 50B, 50c with different d-spacings is shown. Each stripe 50a, 50B, 50c has a d-spacing configured to reflect specific x-ray wavelengths. An x-ray source 52 needs only to be translated relative to the stripe iike sections 50a, 50B, 50c of the reflector 48 to change the wavelength of the x-rays reflected from the reflector 48. The preferred method of translation is to fix the position of the x-ray source 52 while translating the reflector 48.
It is to be understood that the invention is not limited to the exact construction illustrated and described above, but that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the following claims.
A four point bender 42 is shown in Figure 10 having precision actuators 44a and 44b which will vary the curvature of the reflector 36. Posts 4k~are fixed while members Y;5L~-l~are actuated to alter the curvature of the reflector 36. The bender 42 will vary the parabolic parameter p of a parabolically shaped multilayer reflector and the minor radius b of an elliptically shaped multilayer reflector as detailed above.
In a second embodiment of the present invention shown in Figure 11, a multilayer reflector 46 of fixed curvature, with a plurality of distinct d-spacings d7 and d8, is configured to reflect multiple x-ray wavelengths. Each d-spacing d7 and d8 will satisfy Bragg's law for a specific x-ray wavelength. The relatively larger d-spacing d8 will reflect longer wavelengths and the relatively shorter d-spacing d7 will reflect shorter wavelengths. The reflected wavelengths will have substantially no overlap.
Since the absorption for lower energy (longer wavelength) x-rays is stronger, the reflection layer d8 for the lower energy x-rays should be the top layers on the reflector 46.
As can be seen in the drawing, the d-spacings d7 and d8 are laterally graded in cooperation with the curvature of the reflector 46 to satisfy Bragg's law for a plurality of specific x-ray wavelengths_ In alternate embodiments of the present invention additional groups of d-spacings may be used limited only by the dimensions and structure of the reflector 46.
In a third embodiment of the present invention seen in FIG. 12 (an overhead or top view) a multilayer reflector 48 having stripe like sections 50a, 50B, 50c with different d-spacings is shown. Each stripe 50a, 50B, 50c has a d-spacing configured to reflect specific x-ray wavelengths. An x-ray source 52 needs only to be translated relative to the stripe iike sections 50a, 50B, 50c of the reflector 48 to change the wavelength of the x-rays reflected from the reflector 48. The preferred method of translation is to fix the position of the x-ray source 52 while translating the reflector 48.
It is to be understood that the invention is not limited to the exact construction illustrated and described above, but that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the following claims.
Claims (19)
1. An electromagnetic reflector comprising:
a multilayer structure (18) having a d-spacing and a first curvature to reflect a first electromagnetic frequency; and a movement apparatus (42) that varies said first curvature of said multilayer structure to a second curvature so that said multilayer structure reflects a second electromagnetic frequency.
a multilayer structure (18) having a d-spacing and a first curvature to reflect a first electromagnetic frequency; and a movement apparatus (42) that varies said first curvature of said multilayer structure to a second curvature so that said multilayer structure reflects a second electromagnetic frequency.
2. The electromagnetic reflector of Claim 1, wherein said multilayer structure (18) is deposited on a substrate (12).
3. The electromagnetic reflector of Claim 1 or Claim 2, wherein said d-spacing is laterally graded.
4. The electromagnetic reflector of any one of Claims 1 to 3, wherein said first electromagnetic frequency and said second electromagnetic frequency are each x-ray frequencies.
5. The electromagnetic reflector of any one of Claims 1 to 4, wherein said movement apparatus (42) is a bender which alters said first curvature of said multilayer structure so that said multilayer structure has said second curvature.
6. The electromagnetic reflector of Claim 5, wherein said bender (42) is a four point bender.
7. An electromagnetic optic comprising:
a multilayer surface (18), said multilayer surface comprising a curvature that varies from a first curvature that reflects a first wavelength of electromagnetic energy to a second curvature that reflects a second wavelength, wherein said multilayer surface (18) has a laterally graded d-spacing.
a multilayer surface (18), said multilayer surface comprising a curvature that varies from a first curvature that reflects a first wavelength of electromagnetic energy to a second curvature that reflects a second wavelength, wherein said multilayer surface (18) has a laterally graded d-spacing.
8. The electromagnetic optic of Claim 7, wherein said first electromagnetic frequency and said second electromagnetic frequency are each x-ray frequencies.
9. The electromagnetic optic of Claim 7 or Claim 8 further comprising a bender (42) to alter the curvature of said multilayer surface (18).
10. A variable curvature x-ray reflector comprising:
a substrate (12);
a multilayer surface (18) coupled to said substrate (12), wherein said multilayer surface has a laterally graded d-spacing; and wherein as a curvature of said multilayer surface is varied the frequency of reflected electromagnetic radiation is also varied.
a substrate (12);
a multilayer surface (18) coupled to said substrate (12), wherein said multilayer surface has a laterally graded d-spacing; and wherein as a curvature of said multilayer surface is varied the frequency of reflected electromagnetic radiation is also varied.
11. The electromagnetic reflector of any one of Claims 1 to 10, wherein said electromagnetic reflector is shaped as a parabolic curve and said parabolic curve has a p factor that is varied to change a curvature of said electromagnetic reflector.
12. The electromagnetic reflector of any one of claims 1 to 10, wherein said electromagnetic reflector is shaped as an elliptical curve and said elliptical curve has a minor radius that is varied to change a curvature of said electromagnetic reflector.
13. A method of reflecting multiple electromagnetic frequencies with a multilayer reflector comprising:
generating electromagnetic energy;
directing said electromagnetic energy at said multilayer reflector (10, 26, 28); and during said directing, adjusting a curvature of said multilayer reflector (10) to reflect said electromagnetic energy in accordance with Bragg's law.
generating electromagnetic energy;
directing said electromagnetic energy at said multilayer reflector (10, 26, 28); and during said directing, adjusting a curvature of said multilayer reflector (10) to reflect said electromagnetic energy in accordance with Bragg's law.
14. An electromagnetic energy system comprising:
an electromagnetic energy source (13, 30, 32) that directs electromagnetic energy at an electromagnetic reflector (10, 26, 28);
said electromagnetic reflector comprising:
a multilayer structure (18) having a d-spacing and a first curvature to reflect a first electromagnetic frequency; and a movement apparatus (42) that varies said first curvature of said multilayer structure to a second curvature so that said multilayer structure reflects a second electromagnetic frequency.
an electromagnetic energy source (13, 30, 32) that directs electromagnetic energy at an electromagnetic reflector (10, 26, 28);
said electromagnetic reflector comprising:
a multilayer structure (18) having a d-spacing and a first curvature to reflect a first electromagnetic frequency; and a movement apparatus (42) that varies said first curvature of said multilayer structure to a second curvature so that said multilayer structure reflects a second electromagnetic frequency.
15. The electromagnetic energy system of Claim 14, wherein said electromagnetic energy source (13, 30, 32) directs x-rays at said electromagnetic reflector (10, 26, 28).
16. An electromagnetic energy system comprising:
an electromagnetic energy source (13, 30, 32) that directs electromagnetic energy at an electromagnetic optic (10, 26, 28);
said electromagnetic optic comprising:
a multilayer surface (18), said multilayer surface comprising a curvature that varies from a first curvature that reflects a first wavelength of electromagnetic energy to a second curvature that reflects a second wavelength.
an electromagnetic energy source (13, 30, 32) that directs electromagnetic energy at an electromagnetic optic (10, 26, 28);
said electromagnetic optic comprising:
a multilayer surface (18), said multilayer surface comprising a curvature that varies from a first curvature that reflects a first wavelength of electromagnetic energy to a second curvature that reflects a second wavelength.
17. The electromagnetic energy system of Claim 16, wherein said electromagnetic energy source (13, 30, 32) directs x-rays at said electromagnetic optic (10, 26, 28).
18. The method of Claim 13, wherein said electromagnetic energy comprises x-rays.
19. An x-ray system comprising:
an x-ray source (13, 30, 32, 52) that directs x-rays at an x-ray reflector (10, 26, 28, 48);
said x-ray reflector comprising;
a first multilayer section (18), wherein said first multilayer section has a d-spacing as measured along a first direction and configured to reflect a first x-ray frequency;
and a second multilayer section (18) arranged side by side with said first multilayer section along a second direction, wherein said second multilayer section has a d-spacing as measured along said first direction and configured to reflect a second x-ray frequency.
an x-ray source (13, 30, 32, 52) that directs x-rays at an x-ray reflector (10, 26, 28, 48);
said x-ray reflector comprising;
a first multilayer section (18), wherein said first multilayer section has a d-spacing as measured along a first direction and configured to reflect a first x-ray frequency;
and a second multilayer section (18) arranged side by side with said first multilayer section along a second direction, wherein said second multilayer section has a d-spacing as measured along said first direction and configured to reflect a second x-ray frequency.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA002642736A CA2642736A1 (en) | 1999-08-02 | 2000-08-01 | X-ray reflector system for reflecting a plutality of x-ray frequencies |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/366,028 | 1999-08-02 | ||
US09/366,028 US6421417B1 (en) | 1999-08-02 | 1999-08-02 | Multilayer optics with adjustable working wavelength |
PCT/US2000/021060 WO2001009904A2 (en) | 1999-08-02 | 2000-08-01 | Multilayer optics with adjustable working wavelength |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CA002642736A Division CA2642736A1 (en) | 1999-08-02 | 2000-08-01 | X-ray reflector system for reflecting a plutality of x-ray frequencies |
Publications (2)
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CA2380922A1 CA2380922A1 (en) | 2001-02-08 |
CA2380922C true CA2380922C (en) | 2008-12-09 |
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Application Number | Title | Priority Date | Filing Date |
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CA002380922A Expired - Lifetime CA2380922C (en) | 1999-08-02 | 2000-08-01 | Multilayer optics with adjustable working wavelength |
CA002642736A Abandoned CA2642736A1 (en) | 1999-08-02 | 2000-08-01 | X-ray reflector system for reflecting a plutality of x-ray frequencies |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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CA002642736A Abandoned CA2642736A1 (en) | 1999-08-02 | 2000-08-01 | X-ray reflector system for reflecting a plutality of x-ray frequencies |
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US (1) | US6421417B1 (en) |
EP (1) | EP1200967B1 (en) |
JP (1) | JP2003506732A (en) |
AT (1) | ATE280993T1 (en) |
AU (1) | AU6511100A (en) |
CA (2) | CA2380922C (en) |
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Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6870896B2 (en) | 2000-12-28 | 2005-03-22 | Osmic, Inc. | Dark-field phase contrast imaging |
US6804324B2 (en) * | 2001-03-01 | 2004-10-12 | Osmo, Inc. | X-ray phase contrast imaging using a fabry-perot interferometer concept |
JP4657506B2 (en) * | 2001-06-27 | 2011-03-23 | 株式会社リガク | X-ray spectroscopy method and X-ray spectrometer |
US6510200B1 (en) | 2001-06-29 | 2003-01-21 | Osmic, Inc. | Multi-layer structure with variable bandpass for monochromatization and spectroscopy |
US6643353B2 (en) | 2002-01-10 | 2003-11-04 | Osmic, Inc. | Protective layer for multilayers exposed to x-rays |
JP3629520B2 (en) * | 2002-03-05 | 2005-03-16 | 理学電機工業株式会社 | X-ray spectroscopic element and fluorescent X-ray analyzer using the same |
JP2003255089A (en) * | 2002-03-05 | 2003-09-10 | Rigaku Industrial Co | X-ray spectroscopy element and fluorescent x-ray analyzer |
EP1403882B1 (en) | 2002-09-03 | 2012-06-13 | Rigaku Corporation | Parabolic mirror and movable X-ray source for obtaining parallel x-ray beams having different wavelengths |
DE10254026C5 (en) * | 2002-11-20 | 2009-01-29 | Incoatec Gmbh | Reflector for X-radiation |
DE602004012562T2 (en) | 2003-06-13 | 2009-04-16 | Osmic, Inc., Auburn Hills | BEAM TREATMENT SYSTEM |
US7280634B2 (en) | 2003-06-13 | 2007-10-09 | Osmic, Inc. | Beam conditioning system with sequential optic |
WO2006014376A1 (en) * | 2004-07-02 | 2006-02-09 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy Naval Research Laboratory | Deformable mirror apparatus |
JP4432822B2 (en) * | 2005-04-19 | 2010-03-17 | 船井電機株式会社 | Variable shape mirror and optical pickup device having the same |
US7425193B2 (en) * | 2005-04-21 | 2008-09-16 | Michigan State University | Tomographic imaging system using a conformable mirror |
DE102006015933B3 (en) * | 2006-04-05 | 2007-10-31 | Incoatec Gmbh | Apparatus and method for adjusting an optical element |
JP4278108B2 (en) * | 2006-07-07 | 2009-06-10 | 株式会社リガク | Ultra-small angle X-ray scattering measurement device |
US7555098B2 (en) * | 2007-05-02 | 2009-06-30 | HD Technologies Inc. | Method and apparatus for X-ray fluorescence analysis and detection |
US7920676B2 (en) * | 2007-05-04 | 2011-04-05 | Xradia, Inc. | CD-GISAXS system and method |
US8130902B2 (en) * | 2007-07-31 | 2012-03-06 | Uchicago Argonne, Llc | High-resolution, active-optic X-ray fluorescence analyzer |
DE102007048743B4 (en) * | 2007-10-08 | 2010-06-24 | Ifg - Institute For Scientific Instruments Gmbh | Method and device for determining the energetic composition of electromagnetic waves |
WO2009097533A2 (en) * | 2008-01-30 | 2009-08-06 | Reflective X-Ray Optics Llc | Mirror mounting, alignment and scanning mechanism and scanning method for radiographic x-ray imaging, and x-ray imaging device having same |
US7848483B2 (en) * | 2008-03-07 | 2010-12-07 | Rigaku Innovative Technologies | Magnesium silicide-based multilayer x-ray fluorescence analyzers |
US8126117B2 (en) * | 2010-02-03 | 2012-02-28 | Rigaku Innovative Technologies, Inc. | Multi-beam X-ray system |
JP4974391B2 (en) * | 2010-02-21 | 2012-07-11 | 株式会社リガク | X-ray spectroscopy method and X-ray spectrometer |
US8406374B2 (en) | 2010-06-25 | 2013-03-26 | Rigaku Innovative Technologies, Inc. | X-ray optical systems with adjustable convergence and focal spot size |
WO2012023141A1 (en) * | 2010-08-19 | 2012-02-23 | Convergent Radiotherapy, Inc | System for x-ray irradiation of target volume |
CN102525492A (en) * | 2010-12-31 | 2012-07-04 | 上海西门子医疗器械有限公司 | Device for selecting X-ray energy spectrum |
KR101332502B1 (en) * | 2011-06-14 | 2013-11-26 | 전남대학교산학협력단 | An X-ray Needle Module for Local Radiation Therapy |
US20130182827A1 (en) * | 2011-12-02 | 2013-07-18 | Canon Kabushiki Kaisha | X-ray waveguide and x-ray waveguide system |
EP2926124B1 (en) * | 2012-11-29 | 2019-01-09 | Helmut Fischer GmbH | Method and device for performing an x-ray fluorescence analysis |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
JP6025211B2 (en) * | 2013-11-28 | 2016-11-16 | 株式会社リガク | X-ray topography equipment |
EP3322340B1 (en) * | 2015-07-14 | 2019-06-19 | Koninklijke Philips N.V. | Imaging with enhanced x-ray radiation |
DE102017202802A1 (en) * | 2017-02-21 | 2018-08-23 | Carl Zeiss Smt Gmbh | Lens and optical system with such a lens |
WO2019236384A1 (en) * | 2018-06-04 | 2019-12-12 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
US10658145B2 (en) | 2018-07-26 | 2020-05-19 | Sigray, Inc. | High brightness x-ray reflection source |
EP3603516A1 (en) * | 2018-08-02 | 2020-02-05 | Siemens Healthcare GmbH | X-ray equipment and method for operating same |
DE112019004433T5 (en) | 2018-09-04 | 2021-05-20 | Sigray, Inc. | SYSTEM AND PROCEDURE FOR X-RAY FLUORESCENCE WITH FILTERING |
CN112823280A (en) | 2018-09-07 | 2021-05-18 | 斯格瑞公司 | System and method for depth-selectable X-ray analysis |
CN109799612B (en) * | 2019-03-15 | 2020-03-31 | 重庆大学 | Curved surface reflector manufacturing method and variable curvature radius point light source line focusing imaging system |
WO2021162947A1 (en) | 2020-02-10 | 2021-08-19 | Sigray, Inc. | X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4693933A (en) | 1983-06-06 | 1987-09-15 | Ovonic Synthetic Materials Company, Inc. | X-ray dispersive and reflective structures and method of making the structures |
US4727000A (en) | 1983-06-06 | 1988-02-23 | Ovonic Synthetic Materials Co., Inc. | X-ray dispersive and reflective structures |
US4717632A (en) | 1983-08-22 | 1988-01-05 | Ovonic Synthetic-Materials Company, Inc. | Adhesion and composite wear resistant coating and method |
US4716083A (en) | 1983-09-23 | 1987-12-29 | Ovonic Synthetic Materials Company | Disordered coating |
US4525853A (en) | 1983-10-17 | 1985-06-25 | Energy Conversion Devices, Inc. | Point source X-ray focusing device |
US4785470A (en) | 1983-10-31 | 1988-11-15 | Ovonic Synthetic Materials Company, Inc. | Reflectivity and resolution X-ray dispersive and reflective structures for carbon, beryllium and boron analysis |
US4643951A (en) | 1984-07-02 | 1987-02-17 | Ovonic Synthetic Materials Company, Inc. | Multilayer protective coating and method |
US4724169A (en) | 1984-10-09 | 1988-02-09 | Ovonic Synthetic Materials Company, Inc. | Method of producing multilayer coatings on a substrate |
US4675889A (en) | 1985-07-08 | 1987-06-23 | Ovonic Synthetic Materials Company, Inc. | Multiple wavelength X-ray dispersive devices and method of making the devices |
US4958363A (en) | 1986-08-15 | 1990-09-18 | Nelson Robert S | Apparatus for narrow bandwidth and multiple energy x-ray imaging |
US4969175A (en) * | 1986-08-15 | 1990-11-06 | Nelson Robert S | Apparatus for narrow bandwidth and multiple energy x-ray imaging |
US4777090A (en) | 1986-11-03 | 1988-10-11 | Ovonic Synthetic Materials Company | Coated article and method of manufacturing the article |
US4783374A (en) | 1987-11-16 | 1988-11-08 | Ovonic Synthetic Materials Company | Coated article and method of manufacturing the article |
GB2217036B (en) | 1988-03-11 | 1992-08-12 | Rosser Roy J | Saddle toroid mirrors |
US4867785A (en) | 1988-05-09 | 1989-09-19 | Ovonic Synthetic Materials Company, Inc. | Method of forming alloy particulates having controlled submicron crystallite size distributions |
JP2569447B2 (en) * | 1988-11-28 | 1997-01-08 | 株式会社ニコン | Manufacturing method of multilayer mirror |
JPH02210299A (en) | 1989-02-10 | 1990-08-21 | Olympus Optical Co Ltd | Optical system for x ray and multi-layered film reflecting mirror used for the same |
US5027377A (en) | 1990-01-09 | 1991-06-25 | The United States Of America As Represented By The United States Department Of Energy | Chromatic X-ray magnifying method and apparatus by Bragg reflective planes on the surface of Abbe sphere |
FR2658619B1 (en) | 1990-02-19 | 1993-04-02 | Megademini Taoufik | MULTIFRACTAL INTERFERENTIAL MIRRORS WITH FRACTAL DIMENSIONS BETWEEN 0 AND 1. |
US5082621A (en) | 1990-07-31 | 1992-01-21 | Ovonic Synthetic Materials Company, Inc. | Neutron reflecting supermirror structure |
US5167912A (en) | 1990-07-31 | 1992-12-01 | Ovonic Synthetic Materials Company, Inc. | Neutron reflecting supermirror structure |
US5044736A (en) * | 1990-11-06 | 1991-09-03 | Motorola, Inc. | Configurable optical filter or display |
RU1820354C (en) * | 1990-11-11 | 1993-06-07 | Ленинградский Институт Точной Механики И Оптики | Optical element with controlled curvature |
FR2681720A1 (en) | 1991-09-25 | 1993-03-26 | Philips Electronique Lab | DEVICE INCLUDING A MIRROR OPERATING IN THE FIELD OF X-RAYS OR NEUTRONS. |
US5265143A (en) * | 1993-01-05 | 1993-11-23 | At&T Bell Laboratories | X-ray optical element including a multilayer coating |
US5384817A (en) | 1993-07-12 | 1995-01-24 | Ovonic Synthetic Materials Company | X-ray optical element and method for its manufacture |
US5646976A (en) * | 1994-08-01 | 1997-07-08 | Osmic, Inc. | Optical element of multilayered thin film for X-rays and neutrons |
JPH08179099A (en) * | 1994-12-22 | 1996-07-12 | Ishikawajima Harima Heavy Ind Co Ltd | X-ray mirror device |
JP3278317B2 (en) | 1995-03-24 | 2002-04-30 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
US5757882A (en) | 1995-12-18 | 1998-05-26 | Osmic, Inc. | Steerable x-ray optical system |
US5923720A (en) * | 1997-06-17 | 1999-07-13 | Molecular Metrology, Inc. | Angle dispersive x-ray spectrometer |
US6038285A (en) * | 1998-02-02 | 2000-03-14 | Zhong; Zhong | Method and apparatus for producing monochromatic radiography with a bent laue crystal |
US6014423A (en) | 1998-02-19 | 2000-01-11 | Osmic, Inc. | Multiple corner Kirkpatrick-Baez beam conditioning optic assembly |
US6041099A (en) | 1998-02-19 | 2000-03-21 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
US6069934A (en) | 1998-04-07 | 2000-05-30 | Osmic, Inc. | X-ray diffractometer with adjustable image distance |
-
1999
- 1999-08-02 US US09/366,028 patent/US6421417B1/en not_active Expired - Lifetime
-
2000
- 2000-08-01 CA CA002380922A patent/CA2380922C/en not_active Expired - Lifetime
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- 2000-08-01 EP EP00952405A patent/EP1200967B1/en not_active Expired - Lifetime
- 2000-08-01 AT AT00952405T patent/ATE280993T1/en not_active IP Right Cessation
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DE60015346D1 (en) | 2004-12-02 |
CZ2002791A3 (en) | 2002-11-13 |
CZ301738B6 (en) | 2010-06-09 |
AU6511100A (en) | 2001-02-19 |
JP2003506732A (en) | 2003-02-18 |
DE60015346T2 (en) | 2005-11-10 |
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EP0270700A1 (en) | Apparatus and method for producing a hologram |
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