CA2502254A1 - Photosensitive resin printing plate precursor, method for producing the same, and method for producing letterpress printing plate using the same - Google Patents

Photosensitive resin printing plate precursor, method for producing the same, and method for producing letterpress printing plate using the same Download PDF

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Publication number
CA2502254A1
CA2502254A1 CA002502254A CA2502254A CA2502254A1 CA 2502254 A1 CA2502254 A1 CA 2502254A1 CA 002502254 A CA002502254 A CA 002502254A CA 2502254 A CA2502254 A CA 2502254A CA 2502254 A1 CA2502254 A1 CA 2502254A1
Authority
CA
Canada
Prior art keywords
photosensitive resin
printing plate
layer
heat
plate precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002502254A
Other languages
French (fr)
Other versions
CA2502254C (en
Inventor
Michihiko Ichikawa
Tamio Adachi
Shinji Tanaka
Yoshiki Ichii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2502254A1 publication Critical patent/CA2502254A1/en
Application granted granted Critical
Publication of CA2502254C publication Critical patent/CA2502254C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202Masking pattern being obtained by thermal means, e.g. laser ablation

Abstract

An object of the present invention is to provide a photosensitive resin printing plate precursor capable of forming a protruding relief pattern without using any original pattern film.

Specifically, the present invention relates to a photosensitive resin printing plate precursor including: a photosensitive resin layer (A) containing a water-soluble or water-dispersible resin and an ultraviolet-curable monomer;
and a water-insoluble heat-sensitive mask layer (C) containing an infrared-absorbing material, deposited in that order on a support.

By introducing a crosslinked structure or a hydrophobic constituent to the heat-sensitive mask layer (C) so as to be insoluble in water, difference in polarity is produced between the layers (A) and (C) and, thus, mass transfer between the two layers can be prevented. Also, the scratch resistance of the heat-sensitive mask layer (C) can be dramatically enhanced and, thus, the printing plate precursor becomes easy to handle.

Claims (18)

1. A photosensitive resin printing plate precursor comprising, on a support in this order: a photosensitive resin layer (A) containing a water-soluble or water-dispersible resin and an ultraviolet-curable monomer; a water-insoluble heat-sensitive mask layer (C) containing an infrared-absorbing material.
2. The photosensitive resin printing plate precursor according to Claim 1, wherein the water-insoluble heat-sensitive mask layer (C) is crosslinked with a curable resin.
3. The photosensitive resin printing plate precursor according to Claim 2, wherein the curable resin is a combination of: at least one compound selected from the group consisting of multifunctional isocyanates and multifunctional epoxy compounds; and at least one compound selected from the group consisting of urea-based resins, amine-based compounds, amide-based compounds, hydroxy group-containing compounds, carboxylic compounds, and thiol-based compounds.
4. The photosensitive resin printing plate precursor according to Claim 1, wherein the water-insoluble heat-sensitive mask layer (C) is a metal thin film.
5. The photosensitive resin printing plate precursor according to Claim 1, further comprising an adhesion-adjusting layer (B) between the photosensitive resin layer (A) and the heat-sensitive mask layer (C).
6. The photosensitive resin printing plate precursor according to Claim 5, wherein the adhesion-adjusting layer (B) contains a water-soluble or a water-dispersible resin.
7. The photosensitive resin printing plate precursor according to Claim 1, wherein the photosensitive resin layer (A) contains a polyamide resin.
8. The photosensitive resin printing plate precursor according to Claim 1, wherein the photosensitive resin layer (A) contains polyvinyl alcohol, partially saponified polyvinyl alcohol, or their modified form.
9. The photosensitive resin printing plate precursor according to Claim 1, wherein the heat-sensitive mask layer (C) contains an acrylic resin and no nitrocellulose.
10. The photosensitive resin printing plate precursor according to Claim 1, further comprising: a protective layer (E); or a peel assist layer (D) and a protective layer (E), on the heat-sensitive mask layer (C).
11. The photosensitive resin printing plate precursor according to Claim 10, wherein the peel assist layer (D) contains an infrared-absorbing material and/or a pyrolyzable compound.
12. A method for producing a photosensitive resin printing plate precursor, the method comprising the steps of:
(i) forming a photosensitive resin sheet by depositing a photosensitive resin layer (A) on a substrate;
(ii) forming a heat-sensitive mask element including a water-insoluble heat-sensitive mask layer (C); and (iii) laminating the surface of the photosensitive resin layer (A) of the photosensitive resin sheet to the heat-sensitive mask element.
13. The method for producing the photosensitive resin printing plate precursor according to Claim 12, wherein the heat-sensitive mask element includes a protective layer (E) and, the heat-sensitive mask layer (C), and the lamination is performed such that the heat-sensitive mask layer (C) of the heat-sensitive mask element comes into contact with the surface of the photosensitive resin layer (A).
14. The method for producing the photosensitive resin printing plate precursor according to Claim 13, wherein a peel assist layer (D) is disposed between the protective layer (E) and the heat-sensitive mask layer (C).
15. The method for producing the photosensitive resin printing plate precursor according to Claim 12, wherein the heat-sensitive mask element includes the heat-sensitive mask layer (C) and an adhesion-adjusting layer (B), and the lamination is performed such that the adhesion-adjusting layer (B) of the heat-sensitive mask element comes into contact with the surface of the photosensitive resin layer (A).
16. The method for producing the photosensitive resin printing plate precursor according to Claim 12, wherein, in the step of forming the heat-sensitive mask element, the heat-sensitive mask layer (C) is deposited while being heated, thereby forming a crosslinked structure therein.
17. A method for producing a letterpress printing plate, the method comprising the steps of:
(1) preparing the photosensitive resin printing plate precursor as set forth in any one of Claims 1 to 11;
(2) forming an image mask (C') by imagewise irradiating the heat-sensitive mask layer (C) with infrared laser light;
(3) exposing through the image mask (C') to ultraviolet light to form a latent image on the photosensitive resin layer (A); and (4) removing the image mask (C') and portions unexposed to ultraviolet light of the photosensitive resin layer (A) by development with a water-based liquid.
18. The method for producing the letterpress printing plate according to Claim 17, wherein (1) the photosensitive resin printing plate precursor as set forth in Claim 10 is used, and (2) at least part of the protective layer (E) is peeled before the heat-sensitive mask layer (C) is imagewise irradiated with infrared laser light
CA2502254A 2002-10-24 2003-10-22 Photosensitive resin printing plate precursor, method for producing the same, and method for producing letterpress printing plate using the same Expired - Fee Related CA2502254C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-309435 2002-10-24
JP2002309435 2002-10-24
PCT/JP2003/013478 WO2004038507A1 (en) 2002-10-24 2003-10-22 Photosensitive resin printing plate original, process for producing the same and process for producing resin relief printing plate therewith

Publications (2)

Publication Number Publication Date
CA2502254A1 true CA2502254A1 (en) 2004-05-06
CA2502254C CA2502254C (en) 2010-10-19

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CA2502254A Expired - Fee Related CA2502254C (en) 2002-10-24 2003-10-22 Photosensitive resin printing plate precursor, method for producing the same, and method for producing letterpress printing plate using the same

Country Status (8)

Country Link
US (1) US7205092B2 (en)
EP (1) EP1555572B1 (en)
AT (1) ATE417301T1 (en)
AU (1) AU2003275582B2 (en)
CA (1) CA2502254C (en)
DE (1) DE60325257D1 (en)
ES (1) ES2319117T3 (en)
WO (1) WO2004038507A1 (en)

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JP4225979B2 (en) * 2005-03-11 2009-02-18 東京応化工業株式会社 Photosensitive laminated printing original for letter press printing and method for producing letter press printing using the photosensitive laminated printing original for letter press printing
US20110262675A1 (en) * 2006-08-31 2011-10-27 Bridgestone Corporation Photo-curable transfer sheet, process for the preparation of optical information recording medium using the sheet, and optical information recording medium
JP5322575B2 (en) * 2008-03-28 2013-10-23 富士フイルム株式会社 Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method for producing relief printing plate
WO2009141930A1 (en) * 2008-05-23 2009-11-26 東洋紡績株式会社 Flexographic printing original plate
JP4200510B1 (en) * 2008-06-11 2008-12-24 東洋紡績株式会社 Photosensitive flexographic printing plate
US20090311494A1 (en) * 2008-06-17 2009-12-17 Fujifilm Corporation Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate
JP4247725B1 (en) 2008-07-16 2009-04-02 東洋紡績株式会社 Photosensitive relief printing original plate
WO2010070918A1 (en) 2008-12-18 2010-06-24 旭化成イーマテリアルズ株式会社 Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
CN102472972B (en) 2009-07-30 2013-09-11 东洋纺织株式会社 Flexographic printing original plate
JP5710961B2 (en) * 2010-12-24 2015-04-30 住友理工株式会社 Flexographic printing plate precursor
AR096578A1 (en) * 2013-06-11 2016-01-20 Ulterra Drilling Tech Lp PCD ELEMENTS AND PROCESS TO ELABORATE THEM
JP2016191813A (en) * 2015-03-31 2016-11-10 東京応化工業株式会社 Photosensitive resin composition for dry etching, and production method of resist pattern for dry etching
WO2017009410A1 (en) * 2015-07-15 2017-01-19 Flint Group Germany Gmbh Laser-ablatable mask film
KR102109456B1 (en) * 2016-11-10 2020-05-13 (주)엘지하우시스 Fine patterned decoration sheet and method of producing the same
JP7242673B2 (en) * 2017-12-08 2023-03-20 フリント グループ ジャーマニー ゲーエムベーハー Method for identifying relief precursors for manufacturing relief structures
TWI717133B (en) * 2019-12-06 2021-01-21 財團法人工業技術研究院 Method for forming perovskite layer and forming structure comprising perovskite layer

Family Cites Families (7)

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Publication number Priority date Publication date Assignee Title
DE1296975B (en) * 1967-11-09 1969-06-04 Kalle Ag Photosensitive mixture
DE2027467C3 (en) * 1970-06-04 1974-08-15 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerizable copying compound
CA1049312A (en) * 1974-01-17 1979-02-27 John O.H. Peterson Presensitized printing plate with in-situ, laser imageable mask
US5262275A (en) * 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
US6238837B1 (en) * 1995-05-01 2001-05-29 E.I. Du Pont De Nemours And Company Flexographic element having an infrared ablatable layer
WO2001018605A1 (en) * 1999-09-02 2001-03-15 Toray Industries, Inc. Photosensitive resin printing plate and method for producing photosensitive printing plate having projection
US6245486B1 (en) * 2000-06-30 2001-06-12 Gary Ganghui Teng Method for imaging a printing plate having a laser ablatable mask layer

Also Published As

Publication number Publication date
AU2003275582B2 (en) 2009-01-08
US20060008729A1 (en) 2006-01-12
EP1555572A4 (en) 2007-05-09
CA2502254C (en) 2010-10-19
EP1555572B1 (en) 2008-12-10
AU2003275582A1 (en) 2004-05-13
DE60325257D1 (en) 2009-01-22
ATE417301T1 (en) 2008-12-15
ES2319117T3 (en) 2009-05-04
WO2004038507A1 (en) 2004-05-06
US7205092B2 (en) 2007-04-17
EP1555572A1 (en) 2005-07-20

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