CA679731A - Bonded abrasive articles - Google Patents

Bonded abrasive articles

Info

Publication number
CA679731A
CA679731A CA679731A CA679731DA CA679731A CA 679731 A CA679731 A CA 679731A CA 679731 A CA679731 A CA 679731A CA 679731D A CA679731D A CA 679731DA CA 679731 A CA679731 A CA 679731A
Authority
CA
Canada
Prior art keywords
bonded abrasive
abrasive articles
articles
bonded
abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA679731A
Inventor
H. Sandmeyer Karl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unifrax 1 LLC
Original Assignee
Carborundum Co
Publication date
Application granted granted Critical
Publication of CA679731A publication Critical patent/CA679731A/en
Expired legal-status Critical Current

Links

CA679731A Bonded abrasive articles Expired CA679731A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA679731T

Publications (1)

Publication Number Publication Date
CA679731A true CA679731A (en) 1964-02-11

Family

ID=35980815

Family Applications (1)

Application Number Title Priority Date Filing Date
CA679731A Expired CA679731A (en) Bonded abrasive articles

Country Status (1)

Country Link
CA (1) CA679731A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5297364A (en) * 1990-01-22 1994-03-29 Micron Technology, Inc. Polishing pad with controlled abrasion rate
US6203407B1 (en) 1998-09-03 2001-03-20 Micron Technology, Inc. Method and apparatus for increasing-chemical-polishing selectivity
USRE37997E1 (en) 1990-01-22 2003-02-18 Micron Technology, Inc. Polishing pad with controlled abrasion rate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5297364A (en) * 1990-01-22 1994-03-29 Micron Technology, Inc. Polishing pad with controlled abrasion rate
USRE37997E1 (en) 1990-01-22 2003-02-18 Micron Technology, Inc. Polishing pad with controlled abrasion rate
US6203407B1 (en) 1998-09-03 2001-03-20 Micron Technology, Inc. Method and apparatus for increasing-chemical-polishing selectivity
US6325702B2 (en) 1998-09-03 2001-12-04 Micron Technology, Inc. Method and apparatus for increasing chemical-mechanical-polishing selectivity
US6893325B2 (en) 1998-09-03 2005-05-17 Micron Technology, Inc. Method and apparatus for increasing chemical-mechanical-polishing selectivity

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