CN100405167C - Color light fictering substrate and manufacturing method thereof - Google Patents
Color light fictering substrate and manufacturing method thereof Download PDFInfo
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- CN100405167C CN100405167C CNB2006100758679A CN200610075867A CN100405167C CN 100405167 C CN100405167 C CN 100405167C CN B2006100758679 A CNB2006100758679 A CN B2006100758679A CN 200610075867 A CN200610075867 A CN 200610075867A CN 100405167 C CN100405167 C CN 100405167C
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Abstract
The present invention discloses a color light-filtering substrate and a manufacturing method thereof. The color light-filtering substrate comprises a substrate, a plurality of color light-filtering patterns, a black matrix layer, a plurality of spacers, a plurality of convex structures and a sharing electrode, wherein the color light-filtering patterns are arranged on the substrate, and the black matrix layer is arranged on the substrate and positioned between the color light-filtering patterns. The spacers are arranged on the black matrix layer and connected with the black matrix layer. The convex structures are arranged on the color light-filtering patterns, and the materials of the black matrix layer, the spacers and the convex structures are the same. The sharing electrode covers the color light-filtering patterns, the black matrix layer, the convex structures and the spacers. The present invention has the advantages of low manufacturing cost via the structure.
Description
Technical field
The present invention relates to a kind of filtering apparatus and manufacture method thereof, and particularly relevant for a kind of colored optical filtering substrates and manufacture method thereof.
Background technology
Because the demand of display and day sharp increase, so industry drops into the development of related display with all strength.Wherein, (cathode ray tube CRT) because of having excellent display quality and technology maturation, therefore monopolizes the monitor market all the year round with cathode-ray tube (CRT) again.Yet, recently because the rise of environmental protection notion, the big and bigger characteristic of generation radiant quantity of energy resource consumption based on cathode-ray tube (CRT), cathode-ray tube (CRT) adds that its product flattening space is limited, so can't satisfy the market demand of market for light, thin, short, little, U.S. and low consumpting power.Therefore, have that high image quality, space utilization efficient are good, (thin filmtransistor liquid crystal display TFT-LCD) becomes the main flow in market to the Thin Film Transistor-LCD of low consumpting power, advantageous characteristic such as radiationless gradually.Wherein, colored optical filtering substrates founds one of important component of LCD for group.
Figure 1A to Fig. 1 G illustrates the making process flow diagram of a known colored optical filtering substrates.Please earlier with reference to Figure 1A, at first, the method for making of known colored optical filtering substrates is to utilize one first mask (not illustrating) to define a black matrix layer (black matrix) 12 on a substrate 11 earlier.Then, shown in Figure 1B to Fig. 1 D, utilize one second mask (not illustrating), one the 3rd mask (not illustrating) and one the 4th mask (not illustrating) to define a plurality of red filter pattern 13a, a plurality of green filter pattern 13b and a plurality of blue filter pattern 13c on substrate 10 in regular turn, these red filter pattern 13a, green filter pattern 13b and blue filter pattern 13c have promptly formed chromatic filter layer 13.After, shown in Fig. 1 E, on black matrix layer 11 and chromatic filter layer 13, form a protective seam (overcoatlayer) 14 earlier, on protective seam 14, form again altogether with electrode (common electrode) 15.Then, shown in Fig. 1 F, utilize one the 5th mask (not illustrating) to define again and form a plurality of projective structures (protrusion) 16 with the common electrode above chromatic filter layer 13 15.Then, shown in Fig. 1 G, utilize one the 6th mask (not illustrating) on the common electrode 15 above the black matrix layer 12, to define a plurality of septs (photo spacer) 17.Then, shown in Fig. 1 H, on common electrode 15, projective structure 16 and sept 17, form an orientation rete 18.After finishing above-mentioned flow process, a colored optical filtering substrates 10 just can be produced.
Manufacture method that it should be noted that known colored optical filtering substrates 10 is to adopt the technology of six road masks.If will reduce the manufacturing time and the cost of colored optical filtering substrates 10, then must change manufacture craft, adopt the still less method for making of the mask in road.That is if will will reduce the manufacturing time and the cost of known colored optical filtering substrates 10, the manufacture method of known colored optical filtering substrates 10 still has sizable space of improving.
Summary of the invention
The technical problem to be solved in the present invention is: provide a kind of manufacturing cost lower colored optical filtering substrates.
Another technical matters that the present invention will solve is: provide a kind of manufacturing step less colored optical filtering substrates.
Another technical matters that the present invention will solve is: a kind of manufacture method of colored optical filtering substrates is provided, and it can utilize lower cost to make colored optical filtering substrates.
The another technical matters that the present invention will solve is: a kind of manufacture method of colored optical filtering substrates is provided, and it can utilize less step to make colored optical filtering substrates.
Technical solution of the present invention is: a kind of colored optical filtering substrates, this colored optical filtering substrates comprise a substrate, a plurality of color filter patterns, black matrix layer, a plurality of sept, an a plurality of projective structure and use electrode altogether.Wherein color filter patterns is disposed on the substrate.Black matrix layer is disposed on the substrate, and between color filter patterns.Sept is disposed on the black matrix layer, and links together with black matrix layer.Projective structure is disposed on the color filter patterns, and the material of black matrix layer, sept and projective structure is identical.Common electrode covers color filter patterns, black matrix layer, projective structure and sept.
According to the described colored optical filtering substrates of one embodiment of the invention, wherein substrate has pixel region a plurality of times, and each color filter patterns is to be disposed at wherein in pixel.
More comprise an orientation rete according to the described colored optical filtering substrates of one embodiment of the invention, this orientation rete is disposed on the common electrode.
According to the described colored optical filtering substrates of one embodiment of the invention, wherein color filter patterns comprises at least one red filter pattern, at least one green filter pattern and at least one blue filter pattern.
The present invention proposes a kind of colored optical filtering substrates in addition, and this colored optical filtering substrates comprises a substrate, a plurality of color filter patterns, deceives matrix layer, a plurality of sept and a plurality of projective structure with electrode, altogether.Wherein, color filter patterns is disposed on the substrate.Common electrode covers color filter patterns and substrate.Black matrix layer is disposed on the common electrode, and between color filter patterns.Sept is disposed on the black matrix layer, and links together with black matrix layer.Projective structure is disposed on the common electrode of color filter patterns top, and the material of black matrix layer, sept and projective structure is identical.
According to the described colored optical filtering substrates of one embodiment of the invention, wherein have a plurality of times pixel region on the substrate, and each color filter patterns is to be disposed at wherein in pixel region.
According to one embodiment of the invention, colored optical filtering substrates more comprises an orientation rete, and this orientation rete covers common electrode, black matrix layer, projective structure and sept.
According to the described colored optical filtering substrates of one embodiment of the invention, wherein color filter patterns comprises at least one red filter pattern, at least one green filter pattern and at least one blue filter pattern.
The present invention reintroduces a kind of manufacture method of colored optical filtering substrates, and the manufacture method of this colored optical filtering substrates comprises the following steps.At first, provide a substrate.On substrate, form a plurality of color filter patterns.Then, on substrate, form a light-shielding material layers, with covered substrate and color filter patterns.Then, the patterning light-shielding material layers is to define black matrix layer, a plurality of projective structure and an a plurality of sept simultaneously.Form on substrate and use electrode altogether, to cover color filter patterns, black matrix layer, projective structure and sept, described sept is disposed on this black matrix layer, and integrally formed with this black matrix layer.
According to the manufacture method of the described colored optical filtering substrates of one embodiment of the invention, wherein the method for patterning light-shielding material layers comprises the following steps.At first, a mask is set on light-shielding material layers, this mask has a photic zone, a non-photic zone and a semi-opaque region.Then, carry out an exposure technology and a developing process,, and form black matrix layer, projective structure and sept with the patterning light-shielding material layers.
According to the manufacture method of the described colored optical filtering substrates of one embodiment of the invention, the method that wherein forms color filter patterns comprises the following steps.At first, on substrate, form a red filter layer.The red filter layer of patterning is to form at least one red filter pattern on substrate.Then, on substrate, form a green filter layer.The green filter layer of patterning is to form at least one green filter pattern on substrate.Then, on substrate, form a blue filter layer.The blue filter layer of patterning is to form at least one blue filter pattern on substrate.
The present invention proposes the manufacture method of another kind of colored optical filtering substrates again, and the manufacture method of this colored optical filtering substrates comprises the following steps.At first, provide a substrate.Form a plurality of color filter patterns on substrate.Then, on substrate, form and use electrode altogether, with covered substrate and color filter patterns.On common electrode, form a light-shielding material layers.Then, the patterning light-shielding material layers, to define black matrix layer, a plurality of projective structure and an a plurality of sept simultaneously, described a plurality of septs are disposed on this black matrix layer, and integrally formed with this black matrix layer.
According to the manufacture method of the described colored optical filtering substrates of one embodiment of the invention, wherein the method for patterning light-shielding material layers comprises the following steps.At first, a mask is set on light-shielding material layers, this mask has a photic zone, a non-photic zone and a semi-opaque region.Carry out an exposure technology and a developing process,, and form black matrix layer, projective structure and sept with the patterning light-shielding material layers.
According to the manufacture method of the described colored optical filtering substrates of one embodiment of the invention, the method that wherein forms color filter patterns comprises the following steps.At first, on substrate, form a red filter layer.The red filter layer of patterning is to form at least one red filter pattern on substrate.Then, on substrate, form a green filter layer.The green filter layer of patterning is to form at least one green filter pattern on substrate.Then, on substrate, form a blue filter layer.The blue filter layer of patterning is to form at least one blue filter pattern on substrate.
Based on above-mentioned, colored optical filtering substrates proposed by the invention and manufacture method thereof adopt the technology of less road mask, therefore can short period and less consumptive material making colored optical filtering substrates.If make colored optical filtering substrates, can significantly reduce the production cost of colored optical filtering substrates with above-mentioned manufacture method.
Description of drawings
Figure 1A to Fig. 1 H illustrates the making process flow diagram of a known colored optical filtering substrates.
Fig. 2 illustrates the structural representation of the colored optical filtering substrates of first embodiment of the invention.
Fig. 3 A to Fig. 3 L illustrates the manufacture method process flow diagram of the colored optical filtering substrates of first embodiment of the invention.
Fig. 4 illustrates the structural representation of the colored optical filtering substrates of second embodiment of the invention.
Fig. 5 A to Fig. 5 D illustrates the manufacture method process flow diagram of the colored optical filtering substrates of second embodiment of the invention.
The main element symbol description:
10: colored optical filtering substrates 11,110: substrate
12,130,230: black matrix layer 13: chromatic filter layer
13a, 120a: red filter pattern 13b, 120b: green filter pattern
13c, 120c: blue filter pattern 14: protective seam
15,160,210: common electrode 16,150: projective structure
17,140: sept 18,170: orientation rete
100: colored optical filtering substrates 110a: inferior pixel region
120: color filter patterns 120d: red filter layer
120e: green filter layer 120f: blue filter layer
130a, 230a: light-shielding material layers R1: first district
R2: the second district R3: the 3rd district
R4: the 4th district
Embodiment
For technique scheme of the present invention, feature and advantage can be become apparent, specific embodiment cited below particularly, and conjunction with figs. is described in detail as follows.
First embodiment
Fig. 2 illustrates the structural representation of the colored optical filtering substrates of first embodiment of the invention.Please refer to Fig. 2, colored optical filtering substrates 100 comprises a substrate 110, a plurality of color filter patterns 120, one black matrix layer 130, a plurality of sept 140, a plurality of projective structure 150 and uses electrode 160 altogether.Wherein, color filter patterns 120 is disposed on the substrate 110.Black matrix layer 130 is disposed on the substrate 110, and between color filter patterns 120.Sept 140 is disposed on the black matrix layer 130, and links together with black matrix layer 130.Projective structure 150 is disposed on the color filter patterns 120, and the material of black matrix layer 130, sept 140 and projective structure 150 is identical.160 of common electrodes cover color filter patterns 120, black matrix layer 130, projective structure 150 and sept 140.
In the present embodiment, substrate 110 has pixel region 110a a plurality of times, and each color filter patterns 120 is to be disposed at wherein in pixel region 110a.More specifically, color filter patterns 120 comprises at least one red filter pattern 120a, at least one green filter pattern 120b and at least one blue filter pattern 120c.In addition, colored optical filtering substrates 100 more comprises an orientation rete 170, and this orientation rete 170 is disposed on the common electrode 160.
Hold above-mentionedly, substrate 110 for example is the substrate of glass substrate, quartz base plate or other suitable materials.The material of color filter patterns 120 (red filter pattern 120a, green filter pattern 120b and blue filter pattern 120c) for example is resin (resin) or other suitable materials.The material of black matrix layer 130, sept 140 and projective structure 150 for example is black photosensitive resin or other suitable materials.The material of common electrode 160 for example be indium tin oxide (indium tin oxide, ITO), indium-zinc oxide (indium zinc oxide, IZO) or other suitable materials.The material of orientation rete 170 for example for poly-acetyl resinoid (polyimide resin, PI) or other suitable materials.Below will describe the manufacture method of colored optical filtering substrates 100 in detail.
Fig. 3 A to Fig. 3 J illustrates the manufacture method process flow diagram of the colored optical filtering substrates of first embodiment of the invention.Please earlier with reference to Fig. 3 A, the manufacture method of colored optical filtering substrates is that a substrate 110 is provided earlier.
Then, on substrate 110, form a color filter patterns 120, and form the structure shown in Fig. 3 G.Wherein, has pixel region 110a on the substrate 110 a plurality of times.Color filter patterns 120 in these times pixel region 110a comprises red filter pattern 120a, green filter pattern 120b and blue filter pattern 120c, and the detailed description of formation color filter patterns 120 is shown in Fig. 3 B to Fig. 3 G.
At first, shown in Fig. 3 B, on substrate 110, form earlier a red filter layer 120d, and the method that forms this red filter layer 120d for example is spin coating (spin coating) or other proper methods.
Then, utilize one first mask M1 with the red filter layer of patterning 120d, in substrate 110 top gradation pixel region 110a, to form red filter pattern 120a, shown in Fig. 3 C.Wherein, if red filter pattern 120a is a photosensitive material, then the method for the red filter layer of patterning 120d for example is to utilize one first mask M1 directly red filter layer 120d to be carried out exposure technology (exposure process) and developing process (developprocess).If red filter pattern 120a is not a photosensitive material, then must on red filter layer 120d, form a photoresist layer (not illustrating) earlier, and utilize one first mask M1 that this photoresist layer is exposed and developing process, to form a patterning photoresist layer (not illustrating).Then, be shade with the patterning photoresist layer, red filter layer 120d carried out etching technics, and again the patterning photoresist layer is carried out stripping technology (stripprocess), to form red filter pattern 120a.
Shown in Fig. 3 D, then, on substrate 110, form a green filter layer 120e, and utilize the green filter layer of one second mask M2 patterning 120e, on substrate 110, to form at least one green filter pattern 120b shown in Fig. 3 E.Because the formation of green filter layer 120e and the method for patterning method and red filter layer 120d are similar, so do not repeat them here.
Shown in Fig. 3 F, on substrate 110, form a blue filter layer 120f, and utilize the blue filter layer of one the 3rd mask M, 3 patternings 120f, on substrate 110, to form at least one blue filter pattern 120c shown in Fig. 3 G.Similarly, the formation of blue filter layer 120f is same as described above to patterning method or similar.
Please refer to Fig. 3 H, then, on substrate 110, form a light-shielding material layers 130a, with covered substrate 110 and color filter patterns 120.The method that forms this light-shielding material layers 130a for example is spin-coating method or other proper methods.Be noted that especially this light-shielding material layers 130a is a photosensitive material.
Please refer to Fig. 3 I to Fig. 3 J, then, patterning light-shielding material layers 130a is to define black matrix layer 130, a plurality of sept 140 and an a plurality of projective structure 150 simultaneously.Wherein, shown in Fig. 3 I, the method for patterning light-shielding material layers 130a is that a mask M4 is set on light-shielding material layers 130a, and this mask M4 has one first district R1, one second district R2, one the 3rd district R3 and one the 4th district R4.Wherein, the 3rd district R3 is non-photic zone, and the second district R2 and the 4th district R4 are semi-opaque region, and the first district R1 is the zone of photic zone and semi-opaque region be combined into.Then, shown in Fig. 3 J, carry out an exposure technology and a developing process,, and form black matrix layer 130, sept 140 and projective structure 150 with patterning light-shielding material layers 130a.
Be noted that because the light penetration intensity of the first district R1, the second district R2, the 3rd district R3 and the 4th district R4 is neither identical, cause each regional sensitization degree of depth difference of light-shielding material layers 130a.After carrying out developing process, the part light-shielding material layers that is left (not indicating) has promptly formed black matrix layer 130, sept 140 and projective structure 150.
Please refer to Fig. 3 K, afterwards, on substrate 110, form altogether with electrode 160, to cover color filter patterns 120, black matrix layer 130, sept 140 and projective structure 150.The method that forms common electrode 160 for example adopts sputter (sputter) or other proper methods.
Please refer to Fig. 3 L, then, on common electrode 160, form an orientation rete 170.The method that forms this orientation rete 170 for example is lithography (offset) or other proper methods.After finishing above-mentioned step, colored optical filtering substrates 100 just can be done.
What deserves to be mentioned is that black matrix, sept and the projective structure in the manufacture method of the colored optical filtering substrates 100 of present embodiment is to form with one mask.With need use three road masks Comparatively speaking for black matrix, sept and projective structure in the known technology, time that the manufacture method of the colored optical filtering substrates 100 that present embodiment proposed more can be short and less consumptive material making colored optical filtering substrates 100.In other words, the making step of colored optical filtering substrates 100 is less and cost of manufacture is lower.
Be noted that in the colored optical filtering substrates 100 of present embodiment, though colored optical filtering substrates 100 comprises an orientation rete 170, it does not limit will have orientation rete 170.In other embodiments, whether colored optical filtering substrates (not illustrating) comprises that orientation rete (not illustrating) is then looked closely needs whether to form the orientation rete in the manufacture method of colored optical filtering substrates.
Second embodiment
Fig. 4 illustrates the structural representation of the colored optical filtering substrates of second embodiment of the invention.Please refer to Fig. 4, the colored optical filtering substrates 100 of the colored optical filtering substrates 200 and first embodiment is similar, and its difference is: common electrode 210 covers color filter patterns 120 and substrate 110.In addition, black matrix layer 230 is disposed on the common electrode 210, and between color filter patterns 120, projective structure 150 then is disposed on the common electrode 210 of color filter patterns 120 tops.Wherein, the material of the material of black matrix layer 230 and common electrode 210 and black matrix layer 130 among first embodiment and common electrode 160 is identical.
The manufacture method of above-mentioned colored optical filtering substrates 200 is similar to the manufacture method of colored optical filtering substrates 100.Fig. 5 A to Fig. 5 D illustrates the manufacture method process flow diagram of the colored optical filtering substrates 200 of second embodiment of the invention.
Please earlier with reference to Fig. 5 A, the manufacture method of colored optical filtering substrates 200 is that a substrate 110 is provided earlier.Has a plurality of times pixel region 110a on this substrate 110.Then, utilize to form red filter pattern 120a, green filter pattern 120b and blue filter pattern 120c in these times pixel region 110a of previous described method on substrate 110, promptly constitute color filter patterns 120.Because the method that forms color filter patterns 120 in the inferior pixel region 110a on substrate 110 with identical described in first embodiment, does not therefore repeat them here.
Please refer to Fig. 5 B, afterwards, on substrate 110, form altogether with electrode 210, with covered substrate 110 and color filter patterns 120.The method that forms common electrode 210 for example adopts sputter (sputter) or other proper methods.Afterwards, on substrate 110, form a light-shielding material layers 230a, to cover common electrode 210.The method that forms this light-shielding material layers 230a for example is spin coating or other proper methods, and this light-shielding material layers 230a is a photosensitive material.
Please refer to Fig. 5 C, then, utilize mask M4 patterning light-shielding material layers 230a, to define black matrix layer 230, a plurality of sept 140 and an a plurality of projective structure 150 simultaneously.Wherein, the method for patterning light-shielding material layers 230a is described identical with first embodiment.
Please refer to Fig. 5 D, then, on common electrode 210, black matrix layer 130, sept 140 and projective structure 150, form an orientation rete 170.The method that forms this orientation rete 170 is with identical described in first embodiment.After finishing above-mentioned step, colored optical filtering substrates 200 just can be done.
Be similar to first embodiment, black matrix, sept and the projective structure in the manufacture method of the colored optical filtering substrates 200 of present embodiment is to form with one mask.The manufacture method of the colored optical filtering substrates 200 that therefore, present embodiment proposed also can be than short time and less consumptive material making colored optical filtering substrates 200.In other words, the making step of colored optical filtering substrates 200 is less and cost of manufacture is lower.
Be noted that though the colored optical filtering substrates 200 of present embodiment also comprises an orientation rete 170, it does not limit will have orientation rete 170.
In sum, the manufacture method of colored optical filtering substrates proposed by the invention adopts the technology of less road mask, therefore can short period and less consumptive material making colored optical filtering substrates.If the manufacture method with above-mentioned colored optical filtering substrates is made colored optical filtering substrates, can significantly reduce the production time and the cost of colored optical filtering substrates.
Though the present invention discloses with specific embodiment; but it is not in order to limit the present invention; any those skilled in the art; the displacement of the equivalent assemblies of under the prerequisite that does not break away from design of the present invention and scope, having done; or, all should still belong to the category that this patent is contained according to equivalent variations and modification that scope of patent protection of the present invention is done.
Claims (6)
1. the manufacture method of a colored optical filtering substrates comprises:
One substrate is provided;
On this substrate, form a plurality of color filter patterns;
On this substrate, form a light-shielding material layers, to cover this substrate and this color filter patterns;
This light-shielding material layers of patterning, to define black matrix layer, a plurality of projective structure and an a plurality of sept simultaneously, wherein, a plurality of septs are disposed on this black matrix layer, and integrally formed with this black matrix layer; And
On this substrate, form and use electrode altogether, to cover this color filter patterns, this black matrix layer, this projective structure and this sept.
2. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, the method for this light-shielding material layers of patterning comprises:
One mask is set on this light-shielding material layers, and this mask has a photic zone, a non-photic zone and a semi-opaque region; And
Carry out an exposure technology and a developing process, with this light-shielding material layers of patterning, should black matrix layer, this projective structure and this sept and form.
3. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, the method that forms this color filter patterns comprises:
On this substrate, form a red filter layer;
Patterning should redness filter layer, to form at least one red filter pattern on this substrate;
On this substrate, form a green filter layer;
Patterning should green filter layer, to form at least one green filter pattern on this substrate;
On this substrate, form a blue filter layer; And
Patterning should blueness filter layer, to form at least one blue filter pattern on this substrate.
4. the manufacture method of a colored optical filtering substrates comprises:
One substrate is provided;
On this substrate, form a plurality of color filter patterns;
On this substrate, form and use electrode altogether, to cover this substrate and this color filter patterns;
On this common electrode, form a light-shielding material layers; And
This light-shielding material layers of patterning, to define black matrix layer, a plurality of projective structure and an a plurality of sept simultaneously, wherein, a plurality of septs are disposed on this black matrix layer, and integrally formed with this black matrix layer.
5. the manufacture method of colored optical filtering substrates as claimed in claim 4 is characterized in that, the method for this light-shielding material layers of patterning comprises:
One mask is set on this light-shielding material layers, and this mask has a photic zone, a non-photic zone and a semi-opaque region; And
Carry out an exposure technology and a developing process, with this light-shielding material layers of patterning, should black matrix layer, this projective structure and this sept and form.
6. the manufacture method of colored optical filtering substrates as claimed in claim 4 is characterized in that, the method that forms this color filter patterns comprises:
On this substrate, form a red filter layer;
Patterning should redness filter layer, to form at least one red filter pattern on this substrate;
On this substrate, form a green filter layer;
Patterning should green filter layer, to form at least one green filter pattern on this substrate;
On this substrate, form a blue filter layer; And
Patterning should blueness filter layer, to form at least one blue filter pattern on this substrate.
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| CN102455542A (en) * | 2010-10-21 | 2012-05-16 | 京东方科技集团股份有限公司 | Manufacturing method of color film base plate |
| CN103323991A (en) * | 2013-06-28 | 2013-09-25 | 合肥京东方光电科技有限公司 | Colour filter, liquid crystal panel and display device |
| CN106773241A (en) * | 2016-12-20 | 2017-05-31 | 武汉华星光电技术有限公司 | Liquid crystal panel and liquid crystal display |
| CN106526953A (en) * | 2016-12-29 | 2017-03-22 | 惠科股份有限公司 | Method for manufacturing color filter layer substrate |
| CN107065286A (en) * | 2017-05-16 | 2017-08-18 | 深圳市华星光电技术有限公司 | Colored filter substrate and preparation method thereof |
| CN107390423A (en) * | 2017-09-22 | 2017-11-24 | 昆山龙腾光电有限公司 | Colored optical filtering substrates and preparation method thereof and liquid crystal display panel |
| CN110262120B (en) * | 2019-07-31 | 2022-03-04 | 京东方科技集团股份有限公司 | Substrate, preparation method thereof and display panel |
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