CN100406848C - Three-dimensional measuring method and three-dimensional measuring apparatus - Google Patents
Three-dimensional measuring method and three-dimensional measuring apparatus Download PDFInfo
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- CN100406848C CN100406848C CN2006100716708A CN200610071670A CN100406848C CN 100406848 C CN100406848 C CN 100406848C CN 2006100716708 A CN2006100716708 A CN 2006100716708A CN 200610071670 A CN200610071670 A CN 200610071670A CN 100406848 C CN100406848 C CN 100406848C
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Abstract
The objective of the invention is to provide a device and a method for measuring three-dimensional shape achieving high-speed and high-precision measurement with simple device constitution. The method for measuring uneven shape of a surface to be measured having a radius of curvature includes the steps of: preparing a reference mask incorporating absolute reference height information for each uneven pattern area of the surface to be measured; providing the surface to be measured and a reference surface with light of specific wavelength; forming an interference fringe by the interference of the reflected measurement light with the reference light; acquiring at least three interference fringe images by varying the phase of the interference fringe; calculating relative height difference in each uneven pattern area of the surface to be measured on the basis of a phase shift method; making the fitting with a reference mask; counting backward the absolute height value of the surface to be measured from the absolute reference height information for each surface to be measured and the relative height difference; making the fitting to the curved surface shape of the surface to be measured; and acquiring the approximation as an analytical height value.
Description
Technical field
The present invention relates to the 3 d shape measuring apparatus and the method for measuring three-dimensional shape that utilize interference fringe image that the concave-convex surface shape (step shape) and the thickness of measuring object are measured.
Background technology
When the step shape of the such complexity of the medium opposite face (above floating) of for example thin-film head is measured, the general interference fringe analytic method that utilizes interference fringe that uses, described interference fringe make that optically the interfering with reference to light of reference plane reflection on the equivalent locations generates with this measurement face from the measuring light of the measurement face reflection of measuring object with from being arranged on.
As the interference fringe analytic method, vertical scanning white light interference (VSI:VerticalScanning Interferometry) method and phase shift (PSI:Phase Shift Interferometry) method is by well-known.As everyone knows, but vertical scanning white light interference method is to use the short white light source of interference distance measuring object to be carried out vertical scanning and detect the interference fringe modulation voltage being the method for maximum position as the height h of measurement point on short transverse.Altitude range (RANGE) can freely be set, and also can measure the uneven surface that comprises discontinuous step.Phase shift (SHIFT) method is following method: the Strength Changes of the interference fringe when having given a plurality of phase differential by measuring between reference light and measuring light, calculate phase difference with reference to light and measuring light, according to the wavelength X of this phase difference and measuring light, use machine equation: h=(λ/4 π) φ to convert and obtain the height h of each measurement point.By obtaining a plurality of interference fringe images, can realize accurately at short notice that the height of being had a few in the measurement face is measured.
[patent documentation 1] TOHKEMY 2001-99620 communique
[patent documentation 2] TOHKEMY 2001-174232 communique
[patent documentation 3] TOHKEMY 2002-13919 communique
But there is following shortcoming in above-mentioned vertical scanning white light interference method: measuring accuracy is lower than phase-shift method, and, need obtain the interference fringe image of the measuring object on the whole height and position for the height h that detects measurement point, so Measuring Time is elongated.
On the other hand, in phase-shift method, on the principle of the phase difference of utilizing measuring light, measurable altitude range is limited in half of wavelength X of measuring light, and, if comparing with the wavelength X of measuring light, measuring object not fully level and smooth face, then be difficult to accurately measure.Therefore, when measuring height has the step shape of a great difference, only use the not correct shape of energy measurement of phase-shift method, and need after measuring, re-use measurement absolute altitude such as vertical scanning white light interference method with phase-shift method.So, in implementing the two method of phase shift (SHIFT) method and vertical scanning white light interference method, Measuring Time is further elongated, and apparatus structure also becomes complicated.
In addition, in the past, all be to calculate height after plane earth is caught the measuring object face in above-mentioned arbitrary method, give no thought to the curve form of measuring object face.Therefore, when the concaveconvex shape of measuring object face with curvature is measured, the problem that exists true altitude value and measured value a great difference to be arranged with the curvature and the pattern form of this measuring object face.
Summary of the invention
The objective of the invention is to, provide a kind of and can realize 3 d shape measuring apparatus and the method for measuring three-dimensional shape measured at a high speed and accurately with simple apparatus structure.
The starting point of the present invention is, has in measurement under the situation of concaveconvex shape of measuring object face of curvature, and it is approximate that measured value is carried out curved surface, and measuring accuracy just improves; If the absolute altitude of accident measurement amount object face, and only measure little height difference (the step discrepancy in elevation) in each relief pattern zone, just can realize at a high speed and high-precision measurement by phase-shift method; And, absolute altitude for the measured value determining to obtain with this phase-shift method, preparation added the measuring object face each relief pattern zone the absolute reference elevation information with reference to use mask, make this with reference to usefulness mask and measured value match (FITTING), just can carry out easily.
That is, the present invention is a kind of 3 d shape measuring apparatus, has: the interference objective optical system, make from the measuring light of the measuring object face reflection of concaveconvex shape with curvature and from the reference plane reflection with reference to the interference of light, form interference fringe; Vertical drive mechanism drives this interference objective optical system in the normal direction of measuring object face; Phase change mechanism makes the phase change of interference fringe; Image mechanism, acquisition have been changed the interference fringe image of phase place by this phase change mechanism; And the parsing control gear, at least 3 interference fringe images obtaining according to this image mechanism are resolved the concaveconvex shape of measuring object face; This parsing control gear has: the mask set mechanism, generate and keep having added the measuring object face each relief pattern zone the absolute reference elevation information with reference to using mask; The phase shift arithmetical organ based on phase-shift method, according at least 4 interference fringe images that image mechanism is obtained, calculates the PSI measurement data of the relative height difference in each relief pattern zone of representing the measuring object face; Revise arithmetical organ, make with reference to mask and above-mentioned PSI measure data fitting, according to the absolute reference elevation information and the relative height difference in each relief pattern zone of measuring object face, against the absolute altitude value that calculates this measuring object face; Operate approximately mechanism makes the absolute altitude value of the above-mentioned measuring object face of being calculated and the curve form match of this measuring object face, obtains this approximate value as the analytic Height value.
In fact, operate approximately mechanism to utilize least square method that the absolute altitude value of measuring object face is carried out spherical approximation or cylinder approximate.
Preferably, the mask set mechanism with each relief pattern region design altitude information of measuring object face as the absolute reference elevation information, with to interfere reference data to be set up by vertical drive mechanism vertical drive interference objective optical system and the vertical scanning that utilizes vertical scanning white interferometric method to obtain related, thereby generate the reference mask.
Preferably, above-mentioned 3 d shape measuring apparatus also has the telltale mark set mechanism, a plurality of interference fringe images that this telltale mark set mechanism uses image mechanism to obtain synthesize the interference strength image of having removed interference fringe, when the image that the specified point in this interference strength image is set at the regulation image mechanism is obtained scope and the telltale mark when revising arithmetical organ and making with reference to usefulness mask and PSI measure data fitting.
In addition, preferably, above-mentioned 3 d shape measuring apparatus also has Focusing mechanism, this Focusing mechanism is on one side by half the parasang vertical drive interference objective optical system of vertical drive mechanism by the measuring light wavelength, the contrast that detects interference fringe image on one side becomes maximum position, become maximum position in this contrast, move the interference objective optical system by vertical drive mechanism; The phase shift arithmetical organ uses at least 4 interference fringe images in the big interference fringe image of contrast to carry out computing.
Preferably, the measuring object face is the medium opposite face of thin-film head, at least be formed with on this medium opposite face: at the most outstanding air-bearing surface area of the pattern of side medium, at second secondly outstanding area of the pattern of side medium, than this air-bearing surface area of the pattern with second area of the pattern is low and as the recess area of the pattern of the altitude datum face of this medium opposite face; Form with reference to the zero information of the height of absolute reference elevation information that comprises the air-bearing surface area of the pattern and second area of the pattern with mask and recess area of the pattern; Resolve control gear and also comprise step discrepancy in elevation arithmetical organ, step discrepancy in elevation arithmetical organ calculates the step discrepancy in elevation of the air-bearing surface area of the pattern and second area of the pattern and the step discrepancy in elevation of air-bearing surface area of the pattern and recess area of the pattern respectively.
In addition, preferably, at the measuring object face is to have under at least one the situation of reproducing in head and the record-header of medium opposite face of thin-film head, and the existence of the reproduction head in the corresponding interference strength image of telltale mark and at least one in the record-header is regional and setting.
In addition, mode according to manufacture method, the present invention is a method of measuring the concaveconvex shape of the measuring object face with curvature, and it has: prepare with reference to the operation with mask, this is with reference to the absolute reference elevation information with each the relief pattern zone that has added the measuring object face in the mask; Form the operation of interference fringe, special wavelength light is offered above-mentioned measuring object face and reference plane, make, form interference fringe from the measuring light of measuring object face reflection with from interfering that reference plane is reflected with reference to light; Calculate the operation of PSI measurement data, make the phase change of interference fringe and obtain at least 4 interference fringe images, and, calculate the PSI measurement data of the relative height difference in each relief pattern zone of representing the measuring object face at least according to these 4 interference fringe images based on phase-shift method; Make with reference to mask and above-mentioned PSI measure data fitting, according to the absolute reference elevation information and the relative height difference in each relief pattern zone of measuring object face, against the operation that calculates the absolute altitude value of this measuring object face; Make the absolute altitude value of the measuring object face that calculates and the curve form match of this measuring object face, obtain the operation of this approximate value as the analytic Height value.
In fact, make the absolute altitude value of measuring object face and the curve form match of this measuring object face by least square method.
With reference to forming by following operation: white light is offered measuring object face and reference plane, make, form the operation of interference fringe from the measuring light of this measuring object face reflection with from interfering that reference plane is reflected with reference to light with mask; Based on vertical scanning white interferometric method the interference fringe image of measuring object face is carried out vertical scanning, obtain the operation that vertical scanning is interfered reference data; As the absolute reference elevation information, interfere reference data to set up the related operation of registering each relief pattern region design altitude information of measuring object face with obtained vertical scanning.
In fact, when the measuring object thing to a plurality of same specifications carries out continuous measurement, preparing when measuring for the first time, to form this reference with mask and registration, when for the second time later measurement, read and utilize registered reference mask with reference to in the operation of mask.
Preferably, preparing with reference to before using the operation of mask, at least carry out once following operation: special wavelength light is offered measuring object face and reference plane, make phase change by measuring light and the interference fringe that produces with reference to interference of light, obtain at least 4 interference fringe images, use these at least 4 interference fringe images obtaining to synthesize the interference strength image of having removed interference fringe, and the specified point in this interference strength image is registered as telltale mark; The scope that obtains that this telltale mark is come the regulation interference fringe image as benchmark, and, make with reference to mask and above-mentioned PSI measure data fitting.
Preferably, between the operation of operation that forms interference fringe and calculating PSI measurement data, having the contrast that half parasang with the measuring light wavelength carries out vertical scanning to interference fringe image and detect this interference fringe image is the operation of the position of maximum, uses at least 4 interference fringe images in the big interference fringe image of contrast in the calculating of PSI measurement data.
Preferably, the measuring object face is the medium opposite face of thin-film head, on this medium opposite face, be formed with at least: at the most outstanding air-bearing surface area of the pattern of side medium, at second secondly outstanding area of the pattern of side medium, than this air-bearing surface area of the pattern and second area of the pattern low, as the recess area of the pattern of the altitude datum face of this medium opposite face; Form with reference to the zero information of the height of absolute reference elevation information that comprises the air-bearing surface area of the pattern and second area of the pattern with mask and recess area of the pattern; And after calculating the analytic Height value, has the operation of the step discrepancy in elevation of the operation of calculating air-bearing surface area of the pattern and the step discrepancy in elevation of second area of the pattern and calculating air-bearing surface area of the pattern and recess area of the pattern.
In addition, the measuring object face can be to have at least one the medium opposite face of thin-film head that reproduces in head and the record-header.In this case, preferably, will be set at above-mentioned telltale mark with the zone in the regional corresponding above-mentioned interference intensity image of at least one the existence in this reproduction head and the record-header.
According to the present invention, a kind of 3 d shape measuring apparatus and method for measuring three-dimensional shape can be provided, can realize at a high speed and high-precision measurement with simple apparatus structure.
Description of drawings
Fig. 1 is expression as the stereographic map towards the state of medium opposite face (above floating) upside of the thin-film head of a measuring object of the present invention.
Fig. 2 is the simple structural drawing of an embodiment of the 3 d shape measuring apparatus that the present invention relates to of expression.
Fig. 3 is the process flow diagram of the order of the method for measuring three-dimensional shape that the present invention relates to of expression.
The mode view of Fig. 4 interference fringe that to be expression form by the measuring light of wavelength X with reference to interference of light.
Fig. 5 is the curve map at an example that forms the VSI reference data of using with reference to mask the time.
Fig. 6 is the mode view of expression with reference to an example using mask.
Fig. 7 is the curve map of explanation scan method of the interference fringe image of execution in interference fringe focusing is handled.
Fig. 8 is the curve map of explanation based on the measurement of phase-shifting method.
Embodiment
Fig. 1 is expression as the stereographic map towards the state of medium opposite face (above floating) upside of the thin-film head of a measuring object of the present invention.Thin-film head is that main body constitutes with tabular slide block 11 and element portion 12, and described tabular slide block 11 is by for example Al
2O
3The nonmagnetic stupalith of hard such as-TiC forms, and described element portion 12 stacked MR magnetic head and inductive head on rear portion end face 15 sides of this shoe surface 11a form.
The medium opposite face H of above-mentioned thin-film head forms curve form, at the shoe surface 11a that will expose when to be defined as absolute altitude be 0 recess area of the pattern, (Air Bearing Surface: area of the pattern air-bearing surface) is formed on the second secondly outstanding area of the pattern of side medium by the place ahead step surface 21b, 26b to be formed on the most outstanding ABS of side medium by the first rear air bearing surface 25a, the second rear air bearing surface 26a, the place ahead air-bearing surface 21a and side rail portion 22,23.
Below in Shuo Ming the 3-d shape measurement of the present invention, resolve the concaveconvex shape of the medium opposite face H of thin-film head by each area of the pattern, and measure the step (shallow SD value) of the ABS area of the pattern and second area of the pattern and the step of ABS area of the pattern and recess area of the pattern (dark SD value) with curvature.The step of this ABS area of the pattern and second area of the pattern is that floating the going up of thin-film head measured the parameter that has a significant impact, and needs accurate especially measurement.
Fig. 2 is the simple structural drawing of an embodiment of the 3 d shape measuring apparatus that the present invention relates to of expression.3 d shape measuring apparatus 30 has: light source 31, supply with white light; Narrow-cut filter 32 is maintained at by maintaining body not shown in the figures on the optical axis of light source 31 free to advance or retreatly; First semi-transparent semi-reflecting lens 33; Interference objective 35 is driven by vertical drive mechanism 34 at z direction of principal axis (illustrated above-below direction); Second semi-transparent semi-reflecting lens 36; With reference to mirror 38, be maintained at the position optically of equal value basically, but carry out micro-displacement by displacement mechanism 37 as required with the measuring object face; Camera head 39; Resolve control device 40; External input device 41 and monitor 42.Resolve control device 40 have the captured electronic image of the control part 40a, processing camera head 39 of the bulk treatment of taking on 3 d shape measuring apparatus 30 image processing part 40b, carry out the operational part 40c of various computings and stored the storage part 40d of control in advance with parameter and information.
The white light that penetrates from light source 31 is through narrow-cut filter 32 (only limiting to the situation that the optical axis at light source 31 enters), first semi-transparent semi-reflecting lens 33 and interference objective 35, incide second semi-transparent semi-reflecting lens 36, offered respectively with reference to mirror 38 and measuring object face from second semi-transparent semi-reflecting lens 36, its part is reflected at reference mirror 38 and measuring object face.The measuring object face of present embodiment is the medium opposite face H of thin-film head.Light (hereinafter referred to as " with reference to light ") that reference mirror 38 is reflected and at light (hereinafter referred to as " measuring light ") that the medium opposite face H of thin-film head is reflected by after second semi-transparent semi-reflecting lens 36, overlap once more and form interference light by interference objective 35.Formed interference light is by behind first semi-transparent semi-reflecting lens 33, imaging on the sensitive surface of camera head 39, and form electronic image by camera head 39.This electronic image is formed to interference fringe image (Fig. 4) at the image processing part 40b that resolves control device 40, is used to resolve the calculation process that control device 40 is carried out at operational part 40c.Interference fringe image and measurement result (calculation process result) can be seen on monitor 42.
Then, the step of the method for measuring three-dimensional shape that the present invention relates to reference to flowchart text shown in Figure 3.This method for measuring three-dimensional shape is a method of measuring the concaveconvex shape of the measuring object face with curvature, and principal character is: actual measurement only uses phase-shift method to carry out; The reference that use has added the absolute reference elevation information obtains the absolute altitude of PSI measurement data with mask; And make the analytic Height value near actual value by the curvature operate approximately.
At first, will be arranged on (S10) on the 3 d shape measuring apparatus 30 with its this medium opposite face H towards the state of upside as the thin-film head of measuring object.After being provided with,, carrying out telltale mark and set operation (S11) and set operation (S12) with reference to mask as the initial setting operation before measuring.Telltale mark is when the image range that regulation is taken by camera head 39 and makes the index that becomes benchmark with reference to mask and PSI measure data fitting (FITTING) time described later.With reference to the absolute reference elevation information of each relief pattern that has the medium opposite face H of thin-film head with mask 60, when the absolute altitude of definite PSI measurement data, carry out reference.This telltale mark is set operation and is set operation with reference to mask, is carried out and control by the control part 40a that resolves control device 40.
Telltale mark is set in the operation (S11), at first, resolves control device 40 and by not shown maintaining body narrow-cut filter 32 is entered on the optical axis of light source 31, and getting the hang of down at this, (dotting among Fig. 2) begins to supply with from the light of light source 31.The white light that penetrates from light source 31 becomes the monochromatic light of specific wavelength after by narrow-cut filter 32, become the red light of wavelength X in the present embodiment, afterwards, offered the medium opposite face H of thin-film head respectively and with reference to mirror 38 through first semi-transparent semi-reflecting lens 33, interference objective 35 and second semi-transparent semi-reflecting lens 36.Then, interfere mutually by second semi-transparent semi-reflecting lens 36 and interference objective 35 backs, form a plurality of interference fringe I as shown in Figure 4 from medium opposite face H and with reference to the reflected light of mirror 38 (measuring light, with reference to light).Then, resolve control device 40 and make with reference to mirror 38 displacements, and obtain to differ respectively four interference fringe images of 1/4 λ phase place by camera head 39 by displacement mechanism 37.Then, at image processing part 40b, by the synthetic interference strength image of four interference fringe images.The control part 40a of parsing control device 40 is set at telltale mark with the existence zone of the element portion 12 of the thin-film head in the interference strength image that is synthesized.Comprise specifically labelled interference strength image and be stored in the storage part 40d that resolves control device 40.
If enter with reference to mask and set operation (S12), then resolve control device 40 and at first narrow-cut filter 32 is withdrawed from from the optical axis of light source 31, and under this exit status (representing with solid line among Fig. 2), begin to supply with from the light of light source 31 by not shown maintaining body.Since the white light that penetrates from light source 31 through first semi-transparent semi-reflecting lens 33, interference objective 35 and second semi-transparent semi-reflecting lens 36 after quilt respectively former state offer the medium opposite face H of thin-film head and with reference to mirror 38, so, formed interference fringe is compared with the interference fringe that is formed by monochromatic light (Fig. 4), and the fringe spacing broadens.Then, resolve control device 40 and on the z direction of principal axis, drive interference objective 35, thereby the vertical scanning measuring object is obtained the VSI reference data based on vertical scanning white light interference method by vertical drive mechanism 34.With the telltale mark of setting in S11 is benchmark, sets the image pickup scope of the camera head 39 of this moment.The obtained electronic image of camera head 39 becomes VSI reference data (Fig. 5) at operational part 40c after image processing part 40b is processed into interference fringe image.Then, resolve control device 40 at operational part 40c with each relief pattern region design altitude information of the medium opposite face H of thin-film head as the absolute reference elevation information, set up with the VSI reference data that obtains related, thereby, generate with reference to mask 60.The user can set in the operation or before this operation at the reference mask, from with the absolute reference elevation information in the individual relief pattern zone of resolving the external input device 41 input quantity objects that control device 40 is connected, but also can be stored in the storage part 40d of parsing control device 40 in advance.
Fig. 6 shows with reference to an example with mask 60.In the present embodiment, as reference mask 60, generating respectively has: ABS mask 61 comprises the ABS area of the pattern of medium opposite face H and the absolute reference elevation information h of this ABS area of the pattern
A=2 μ m; Second mask 62 comprises the absolute reference elevation information h of second area of the pattern and this second area of the pattern
2=1.9 μ m; Cavity mask 63 comprises the absolute reference elevation information h of recess area of the pattern and this recess area of the pattern
C=0 μ m.The reference that is generated is stored in the storage part 40d that resolves control device 40 with mask 60 (61～63).
When measuring, read and utilize telltale mark and the above-mentioned reference mask 60 that is stored in the storage part 40d that resolves control device 40 from storage part 40d as required.
If carried out initial setting operation so far, then then begin the later actual measurement of S13.This time measurement is also carried out control by the control part 40a that resolves control device 40.
Resolving control device 40 at first makes narrow-cut filter 32 enter under the state on the optical axis of light source 31 (dotting among Fig. 2) by not shown maintaining body, begin to supply with from the light of light source 31, by the measuring light of central wavelength lambda with reference to interference of light, generate a plurality of interference fringes (S13) as shown in Figure 4.
Then, carry out interference fringe and focus on processing (S14).Focus in the processing in this interference fringe, on the z direction of principal axis, drive interference objective 35 by vertical drive mechanism 34, thereby 1/2 parasang scanning interferometer stripe pattern with the measuring light wavelength X, and the contrast that detects the interference fringe image of obtaining by camera head 39 is maximum z position, make interference objective 35 move to this contrast by vertical drive mechanism 34 again and be maximum z position, and be fixed on this lens position.In the shape measure that has utilized interference fringe, the known interference fringe that intensity is high is used for computing, then measuring accuracy uprises, but, change of interference fringes wants greatly because changing to compare with the fuzzy contrast that causes of the focusing of picture, so, only former state is utilized the contrast information of interference fringe image, is difficult to find focusing position.Therefore, if as present embodiment with the central wavelength lambda of light source 31 half apart from the partial sweep interference fringe image, the interference fringe picture that then obtains similarly is 11 image that ground moves of interference fringe, do not distribute so rely on the reflectivity of measuring object face (the medium opposite face H of thin-film head), can easily focus.Certain a bit locational brightness that Fig. 7 is illustrated in the interference fringe image changes (contrast variation), still, when whole interference fringe image has calculated the sum total of contrast, also forms same curve map.The circular mark of paying in the brightness data in Fig. 7 (contrast-data) is each analyzing spot.Resolving control device 40 becomes moment of maximum position detecting contrast, finishes the scanning of interference fringe image, and by vertical drive mechanism 34 interference objective 35 is moved.
Focus on processing if carried out interference fringe, then calculate the relative height difference Δ h (S15) in each relief pattern zone of measuring object face (the medium opposite face H of thin-film head) based on so-called phase-shift method (four step rule in the present embodiment).More particularly, resolving control device 40 at first makes with reference to mirror 38 displacements by displacement mechanism 37, change 1/4 wavelength thereby the phase place that makes interference fringe is each, and obtain 4 interference fringe image IA, IB, IC, ID (Fig. 8) by camera head 39 and image processing part 40b.Then, the interference light intensity in the some pixels among the interference fringe image IA～ID that obtains is made as a, b, c, d respectively, according to formula 1:=tan
-1[(a-c)/(b-d)] calculates the phase of 1 pixel.And, the phase of 1 pixel calculating is updated to formula 2: Δ h=(λ/4 π) φ, calculate the relative height difference Δ h of 1 pixel.To whole pixels of the interference fringe image that constitutes the measuring object face, repeat the calculation process of this calculating relative height difference Δ h.Thus, obtain to represent the PSI measurement data of the relative height difference Δ h of measuring object face with pixel unit.Above-mentioned relative height difference Δ h is the small jump that is converged in each relief pattern zone in the 1/2 following scope of measuring light wavelength X, medium opposite face H.
Become maximum position owing to be maintained at the contrast of interference fringe by S14 interference objective 35, so must extract 4 interference fringe image IA, IB, IC, the ID that is used for above-mentioned phase-shift method in order from the stronger beginning of interference fringe contrast.If use the big interference fringe image of interference fringe contrast, then measuring accuracy improves as described above.
In addition, in above-mentioned phase-shift measurement, when obtaining phase place and differ 4 interference fringe images of 1/4 λ respectively, thereby since make with reference to mirror 38 displacements produce with reference to the identical measuring error of the displacement error of mirror 38, but in the present embodiment, by using narrow-cut filter 32, with the fringe spacing of interference fringe be set at compare with measurement range fully narrow and small, so error offsets (equalization) in measurement range, reduce the measuring error that the displacement with reference to mirror 38 causes.Replace narrow-cut filter 32,, can increase the bar number of interference fringe too by on light source 31, using semiconductor laser or making with reference to mirror 38 with respect to inclined light shaft.
Then, resolving control device 40 is benchmark with the telltale mark, make S12 set with reference to mask 60 and the PSI measurement data unit match according to pixels that calculates at S15, and utilize absolute reference elevation information h
A, h
2, h
CAnd relative height difference Δ h, respectively (S16) against the absolute altitude value h ' that calculates medium opposite face H.That is, to each relief pattern zone (ABS, second, recess) of medium opposite face H, with PSI measurement data Δ h on the same location of pixels and absolute reference elevation information h
A(or h
2Or h
C) addition, thereby calculate the absolute altitude value h ' of this location of pixels.
The absolute altitude value h ' that calculates in above-mentioned S16 is a value of also not considering the curvature of medium opposite face H, has different with the curvature of medium opposite face H and pattern (PATTERN) shape, thus with the true altitude value differ bigger may.In the present embodiment,, further make the curve form match (FITTING) of all absolute altitude value h ' of calculating and medium opposite face H, this approximate value is calculated (S17) as analytic Height value h (measured value) with pixel unit in order to avoid this problem.This curved surface operate approximately can be by having used least square method spherical approximation or cylinder be similar to and realize.
Then, resolve control device 40 and use the analytic Height value h that calculates, the step discrepancy in elevation of the ABS area of the pattern of calculation medium opposite face H and the step discrepancy in elevation of second area of the pattern (shallow SD value) and ABS area of the pattern and recess area of the pattern (dark SD value) (S18).In the present embodiment, calculate the height flat average of this area of the pattern according to the analytic Height value h of all pixels of each area of the pattern, and according to above-mentioned shallow SD value of height flat mean value computation and dark SD value.Owing to analytic Height value h adds the value that the curvature of medium opposite face H is calculated, thus little with the gap of true altitude value, can also calculate shallow SD value and dark SD value accurately based on this analytic Height value h.
As mentioned above, the shape measure to the medium opposite face of 1 thin-film head finishes.When the medium opposite face of the thin-film head of then measuring same specification ("No" of S19), new thin-film head is arranged on (S20) on the 3 d shape measuring apparatus 30, the multiply-connected continuous processing of S14～S19 of carrying out of laying equal stress on.When the shape measure of the medium opposite face that finishes thin-film head ("Yes" of S19), carry out and turn off end process (S21) such as measurement such as light source 31 grades, finish to measure.
According to above present embodiment, owing to be pre-formed the reference mask 60 of the absolute reference elevation information in each the relief pattern zone that has added the measuring object face, calculate the relative height difference Δ h in each relief pattern zone of this measuring object face with phase-shift method, based on this relative height difference Δ h with reference to the absolute altitude value h ' that determines the measuring object face with the absolute reference elevation information of mask 60, so, even to having the measuring object face of comparing the bigger concaveconvex shape of the step discrepancy in elevation with the measuring light wavelength X, also can only measure, can implement at a high speed and high-precision measurement with simple apparatus structure with phase-shift method.In addition, because the approximate value of the curve form match of the absolute altitude value h ' that calculates and measuring object face will be obtained as actual measured value, so further improved measuring accuracy.
More than illustrated the present invention relates to the medium opposite face of thin-film head embodiment as measuring object, but for example also go for measuring the situation of semiconductor wafer surface shape, particularly be best suited for the situation of the concaveconvex shape of measuring measuring object face with curvature.
Claims (15)
1. 3 d shape measuring apparatus has: the interference objective optical system, make from the measuring light of the measuring object face reflection of concaveconvex shape with curvature and from the reference plane reflection with reference to the interference of light, form interference fringe; Vertical drive mechanism drives this interference objective optical system in the normal direction of above-mentioned measuring object face; Phase change mechanism makes the phase change of above-mentioned interference striped; Image mechanism, acquisition have been changed the interference fringe image of phase place by this phase change mechanism; And the parsing control gear, at least 4 interference fringe images obtaining according to this image mechanism are resolved the concaveconvex shape of above-mentioned measuring object face; It is characterized in that,
Above-mentioned parsing control gear has:
The mask set mechanism, generate and keep having added above-mentioned measuring object face each relief pattern zone the absolute reference elevation information with reference to using mask;
The phase shift arithmetical organ based on phase-shift method, according at least 4 interference fringe images that above-mentioned image mechanism is obtained, calculates the phase shift interference measurement data of the relative height difference in each relief pattern zone of representing above-mentioned measuring object face;
Revise arithmetical organ, make above-mentioned with reference to mask and above-mentioned phase shift interference measure data fitting, according to the absolute reference elevation information and the relative height difference in each relief pattern zone of above-mentioned measuring object face, against the absolute altitude value that calculates this measuring object face;
Operate approximately mechanism makes the absolute altitude value of the above-mentioned measuring object face of being calculated and the curve form match of this measuring object face, obtains this approximate value as the analytic Height value.
2. 3 d shape measuring apparatus as claimed in claim 1 is characterized in that,
Above-mentioned operate approximately mechanism utilizes least square method that the absolute altitude value of above-mentioned measuring object face is carried out spherical approximation or cylinder is approximate.
3. 3 d shape measuring apparatus as claimed in claim 1 is characterized in that,
Above-mentioned mask set mechanism with each relief pattern region design altitude information of above-mentioned measuring object face as above-mentioned absolute reference elevation information, with to interfere reference data to be set up by above-mentioned vertical drive mechanism's vertical drive above-mentioned interference objective lens optical system and the vertical scanning that utilizes vertical scanning white interferometric method to obtain related, thereby generate above-mentioned reference mask.
4. 3 d shape measuring apparatus as claimed in claim 1 is characterized in that,
Also has the telltale mark set mechanism, a plurality of interference fringe images that described telltale mark set mechanism uses above-mentioned image mechanism to obtain synthesize the interference strength image of having removed interference fringe, and the image that the specified point in this interference strength image is set at the above-mentioned image mechanism of regulation when obtaining scope and above-mentioned correction arithmetical organ make above-mentioned telltale mark with reference to mask and above-mentioned phase shift interference measure data fitting the time.
5. 3 d shape measuring apparatus as claimed in claim 1 is characterized in that,
Also has Focusing mechanism, described Focusing mechanism is on one side by half the parasang vertical drive above-mentioned interference objective lens optical system of above-mentioned vertical drive mechanism by the measuring light wavelength, the contrast that detects interference fringe image on one side becomes maximum position, become maximum position in this contrast, move the above-mentioned interference objective lens optical system by above-mentioned vertical drive mechanism;
Above-mentioned phase shift arithmetical organ uses at least 4 interference fringe images in the big interference fringe image of contrast to carry out computing.
6. 3 d shape measuring apparatus as claimed in claim 1 is characterized in that,
The medium opposite face that above-mentioned measuring object face is a thin-film head, at least be formed with on this medium opposite face: at the most outstanding air-bearing surface area of the pattern of side medium, at second secondly outstanding area of the pattern of side medium, than this air-bearing surface area of the pattern with second area of the pattern is low and as the recess area of the pattern of the altitude datum face of this medium opposite face;
Above-mentioned reference comprises height zero information of the absolute reference elevation information of above-mentioned air-bearing surface area of the pattern and above-mentioned second area of the pattern and above-mentioned recess area of the pattern with mask and forms;
Above-mentioned parsing control gear also comprises step discrepancy in elevation arithmetical organ, and described step discrepancy in elevation arithmetical organ calculates the step discrepancy in elevation of above-mentioned air-bearing surface area of the pattern and above-mentioned second area of the pattern and the step discrepancy in elevation of above-mentioned air-bearing surface area of the pattern and above-mentioned recess area of the pattern respectively.
7. 3 d shape measuring apparatus as claimed in claim 4 is characterized in that,
Above-mentioned measuring object face is to have at least one the medium opposite face of thin-film head that reproduces in head and the record-header, and the existence zone of the reproduction head in above-mentioned telltale mark and the above-mentioned interference intensity image and at least one in the record-header is set accordingly.
8. method for measuring three-dimensional shape is measured the concaveconvex shape of the measuring object face with curvature, it is characterized in that having:
Prepare with reference to the operation with mask, this is with reference to the absolute reference elevation information with each the relief pattern zone that has added above-mentioned measuring object face in the mask;
Form the operation of interference fringe, special wavelength light is offered above-mentioned measuring object face and reference plane, make, form interference fringe from the measuring light of measuring object face reflection with from interfering that reference plane is reflected with reference to light;
Calculate the operation of phase shift interference measurement data, make the phase change of above-mentioned interference striped and obtain at least 4 interference fringe images, and, calculate the phase shift interference measurement data of the relative height difference in each relief pattern zone of representing above-mentioned measuring object face at least according to these 4 interference fringe images based on phase-shift method;
Make above-mentioned with reference to mask and above-mentioned phase shift interference measure data fitting, according to the absolute reference elevation information and the relative height difference in each relief pattern zone of above-mentioned measuring object face, against the operation that calculates the absolute altitude value of this measuring object face;
Make the absolute altitude value of the above-mentioned measuring object face that calculates and the curve form match of this measuring object face, obtain the operation of this approximate value as the analytic Height value.
9. method for measuring three-dimensional shape as claimed in claim 8 is characterized in that,
Make the absolute altitude value of above-mentioned measuring object face and the curve form match of this measuring object face by least square method.
10. method for measuring three-dimensional shape as claimed in claim 8 is characterized in that,
Above-mentioned reference forms by following operation with mask:
White light is offered above-mentioned measuring object face and above-mentioned reference plane, make, form the operation of interference fringe from the measuring light of this measuring object face reflection with from interfering that above-mentioned reference plane is reflected with reference to light;
Based on vertical scanning white interferometric method the interference fringe image of above-mentioned measuring object face is carried out vertical scanning, obtain the operation that vertical scanning is interfered reference data;
As above-mentioned absolute reference elevation information, interfere reference data to set up operation related and that register each relief pattern region design altitude information of above-mentioned measuring object face with obtained vertical scanning.
11. method for measuring three-dimensional shape as claimed in claim 10 is characterized in that,
When the measuring object thing to same specification carries out the measurement of continuous several times, preparing above-mentioned reference with in the operation of mask, when measuring for the first time, form this reference with mask and registration, when for the second time later measurement, read and utilize above-mentioned registered reference mask.
12. method for measuring three-dimensional shape as claimed in claim 8 is characterized in that,
Preparing above-mentioned reference with before the operation of mask, at least carry out once following operation: special wavelength light is offered above-mentioned measuring object face and above-mentioned reference plane, make phase change by above-mentioned measuring light and the above-mentioned interference fringe that produces with reference to interference of light, obtain at least 4 interference fringe images, use these at least 4 interference fringe images obtaining to synthesize the interference strength image of having removed interference fringe, and the specified point in this interference strength image is registered as telltale mark;
The scope that obtains that this telltale mark is come regulation above-mentioned interference stripe pattern as benchmark, and, make above-mentioned with reference to mask and above-mentioned phase shift interference measure data fitting.
13. method for measuring three-dimensional shape as claimed in claim 8 is characterized in that,
In the operation that forms the above-mentioned interference striped with calculate between the operation of above-mentioned phase shift interference measurement data, have the operation of position that half parasang with the measuring light wavelength carries out vertical scanning to interference fringe image and detects the contrast maximum of this interference fringe image, in the calculating of above-mentioned phase shift interference measurement data, use at least 4 interference fringe images in the big interference fringe image of contrast.
14. method for measuring three-dimensional shape as claimed in claim 8 is characterized in that,
The medium opposite face that above-mentioned measuring object face is a thin-film head, on this medium opposite face, be formed with at least: at the most outstanding air-bearing surface area of the pattern of side medium, at second secondly outstanding area of the pattern of side medium, than this air-bearing surface area of the pattern and second area of the pattern low, as the recess area of the pattern of the altitude datum face of this medium opposite face;
Above-mentioned reference comprises height zero information of the absolute reference elevation information of above-mentioned air-bearing surface area of the pattern and above-mentioned second area of the pattern and above-mentioned recess area of the pattern with mask and forms;
And after calculating above-mentioned analytic Height value, have the operation of the step discrepancy in elevation of calculating above-mentioned air-bearing surface area of the pattern and above-mentioned second area of the pattern and calculate the operation of the step discrepancy in elevation of above-mentioned air-bearing surface area of the pattern and above-mentioned recess area of the pattern.
15. method for measuring three-dimensional shape as claimed in claim 13 is characterized in that,
Above-mentioned measuring object face is to have at least one a medium opposite face of thin-film head that reproduces in head and the record-header, will be set at above-mentioned telltale mark with the zone in the regional corresponding above-mentioned interference intensity image of at least one the existence in this reproductions and the record-header.
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| JP2005100588A JP2006284193A (en) | 2005-03-31 | 2005-03-31 | Device and method for measuring three-dimensional shape |
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