CN100448063C - 激光照射装置和使用该装置制造有机发光显示器的方法 - Google Patents
激光照射装置和使用该装置制造有机发光显示器的方法 Download PDFInfo
- Publication number
- CN100448063C CN100448063C CNB2004100820670A CN200410082067A CN100448063C CN 100448063 C CN100448063 C CN 100448063C CN B2004100820670 A CNB2004100820670 A CN B2004100820670A CN 200410082067 A CN200410082067 A CN 200410082067A CN 100448063 C CN100448063 C CN 100448063C
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- Prior art keywords
- mask
- organic layer
- laser irradiation
- pattern
- laser
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 8
- 239000012044 organic layer Substances 0.000 claims abstract description 61
- 239000000758 substrate Substances 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims abstract description 39
- 239000010410 layer Substances 0.000 claims description 35
- 239000000203 mixture Substances 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 238000003475 lamination Methods 0.000 claims description 4
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 238000001931 thermography Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 6
- 230000003760 hair shine Effects 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
Description
Claims (14)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040075657A KR100712115B1 (ko) | 2004-09-21 | 2004-09-21 | 레이저 조사 장치 및 그를 이용한 유기 전계 발광 소자의제조 방법 |
KR75657/04 | 2004-09-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1753583A CN1753583A (zh) | 2006-03-29 |
CN100448063C true CN100448063C (zh) | 2008-12-31 |
Family
ID=36074457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100820670A Active CN100448063C (zh) | 2004-09-21 | 2004-12-31 | 激光照射装置和使用该装置制造有机发光显示器的方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7542063B2 (zh) |
JP (1) | JP4303194B2 (zh) |
KR (1) | KR100712115B1 (zh) |
CN (1) | CN100448063C (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100712215B1 (ko) * | 2005-08-25 | 2007-04-27 | 삼성에스디아이 주식회사 | 레이저 열전사용 마스크 및 그를 이용한 레이저 열전사방법 |
KR100659765B1 (ko) * | 2005-09-08 | 2006-12-19 | 삼성에스디아이 주식회사 | 유기전계발광표시장치 및 그 제조방법 |
KR100793360B1 (ko) * | 2006-01-16 | 2008-01-11 | 삼성에스디아이 주식회사 | 레이저 조사 장치용 마스크 |
KR100770264B1 (ko) | 2006-01-16 | 2007-10-25 | 삼성에스디아이 주식회사 | 레이저 조사 장치 및 이를 이용한 유기전계발광소자의제조방법 |
KR100782466B1 (ko) * | 2006-05-22 | 2007-12-05 | 삼성에스디아이 주식회사 | 레이저 조사장치 및 그를 이용한 유기전계발광소자의제조방법 |
KR100782468B1 (ko) * | 2006-05-22 | 2007-12-05 | 삼성에스디아이 주식회사 | 레이저 조사장치 및 그를 이용한 유기전계발광소자의제조방법 |
KR100782467B1 (ko) * | 2006-05-22 | 2007-12-05 | 삼성에스디아이 주식회사 | 레이저 조사장치 및 그를 이용한 유기전계발광소자의제조방법 |
KR100782470B1 (ko) * | 2006-05-22 | 2007-12-05 | 삼성에스디아이 주식회사 | 레이저 조사장치 및 그를 이용한 유기전계발광소자의제조방법 |
KR100782469B1 (ko) * | 2006-05-22 | 2007-12-05 | 삼성에스디아이 주식회사 | 레이저 조사장치 및 그를 이용한 유기전계발광소자의제조방법. |
KR100989130B1 (ko) | 2008-08-19 | 2010-10-20 | 삼성모바일디스플레이주식회사 | 레이저 조사 장치 및 그를 이용한 유기전계발광표시장치의 제조 방법 |
KR101007188B1 (ko) | 2010-05-10 | 2011-01-12 | 위아코퍼레이션 주식회사 | 레이저 전사법에 의한 대면적 유기발광표시장치 제조방법 및 제조장치 |
KR20120042144A (ko) | 2010-10-22 | 2012-05-03 | 삼성모바일디스플레이주식회사 | 레이저 열전사용 마스크, 이를 포함하는 레이저 조사 장치 및 이를 이용한 유기 발광 소자 제조 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001326190A (ja) * | 2000-05-17 | 2001-11-22 | Nec Corp | 薄膜処理方法及び薄膜処理装置 |
US6577380B1 (en) * | 2000-07-21 | 2003-06-10 | Anvik Corporation | High-throughput materials processing system |
US20030194613A1 (en) * | 2002-03-27 | 2003-10-16 | Voutsas Apostolos T. | Method of suppressing energy spikes of a partially-coherent beam |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
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US5935758A (en) | 1995-04-20 | 1999-08-10 | Imation Corp. | Laser induced film transfer system |
JPH09129550A (ja) * | 1995-08-30 | 1997-05-16 | Canon Inc | 露光装置及びそれを用いたデバイスの製造方法 |
IL132432A0 (en) * | 1997-04-18 | 2001-03-19 | Nikon Corp | An exposure apparatus exposure method using the same and method of manufacture of circuit device |
AU9095798A (en) * | 1997-09-19 | 1999-04-12 | Nikon Corporation | Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
JP2000019712A (ja) | 1998-06-30 | 2000-01-21 | Canon Inc | マスク及びそれを用いた露光方法 |
JP2003077658A (ja) * | 2001-09-05 | 2003-03-14 | Sharp Corp | 有機el素子製造用ドナーフィルムおよび有機el素子用基板 |
US6582875B1 (en) * | 2002-01-23 | 2003-06-24 | Eastman Kodak Company | Using a multichannel linear laser light beam in making OLED devices by thermal transfer |
JP2003257638A (ja) | 2002-03-04 | 2003-09-12 | Sharp Corp | 有機エレクトロルミネッセンス表示パネルの製造方法およびこの製造方法により得られた有機エレクトロルミネッセンス表示パネル |
JP2003272843A (ja) | 2002-03-19 | 2003-09-26 | Fujitsu Ltd | 有機電界発光素子の形成方法および有機電界発光ディスプレイ装置の製造方法 |
JP2004230458A (ja) | 2003-01-31 | 2004-08-19 | Fujitsu Hitachi Plasma Display Ltd | レーザー加工装置 |
JP2005032576A (ja) * | 2003-07-04 | 2005-02-03 | Fuji Electric Holdings Co Ltd | 多色有機発光表示素子の修復方法および修復装置 |
KR20060017414A (ko) * | 2004-08-20 | 2006-02-23 | 삼성에스디아이 주식회사 | 유기 전계 발광 소자의 제조 방법 |
KR100731728B1 (ko) * | 2004-08-27 | 2007-06-22 | 삼성에스디아이 주식회사 | 레이저 전사용 도너 기판 및 이를 이용한 유기 전계 발광소자의 제조 방법 |
KR100860005B1 (ko) * | 2004-09-21 | 2008-09-25 | 삼성에스디아이 주식회사 | 유기 전계 발광 소자의 제조 방법 |
KR100635569B1 (ko) * | 2004-09-23 | 2006-10-17 | 삼성에스디아이 주식회사 | 레이저 조사 장치 및 그를 이용한 유기 전계 발광 소자의제조 방법 |
-
2004
- 2004-09-21 KR KR1020040075657A patent/KR100712115B1/ko active IP Right Grant
- 2004-12-27 JP JP2004377843A patent/JP4303194B2/ja active Active
- 2004-12-27 US US11/020,670 patent/US7542063B2/en active Active
- 2004-12-31 CN CNB2004100820670A patent/CN100448063C/zh active Active
-
2009
- 2009-04-20 US US12/426,821 patent/US7999839B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001326190A (ja) * | 2000-05-17 | 2001-11-22 | Nec Corp | 薄膜処理方法及び薄膜処理装置 |
US6577380B1 (en) * | 2000-07-21 | 2003-06-10 | Anvik Corporation | High-throughput materials processing system |
US20030194613A1 (en) * | 2002-03-27 | 2003-10-16 | Voutsas Apostolos T. | Method of suppressing energy spikes of a partially-coherent beam |
Also Published As
Publication number | Publication date |
---|---|
KR20060026788A (ko) | 2006-03-24 |
CN1753583A (zh) | 2006-03-29 |
US7999839B2 (en) | 2011-08-16 |
US20060063098A1 (en) | 2006-03-23 |
JP2006093076A (ja) | 2006-04-06 |
KR100712115B1 (ko) | 2007-04-27 |
US20090202950A1 (en) | 2009-08-13 |
US7542063B2 (en) | 2009-06-02 |
JP4303194B2 (ja) | 2009-07-29 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090109 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Mobile Display Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung SDI Co., Ltd. |
|
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG MOBILE DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG SDI CO., LTD. Effective date: 20090109 |
|
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG MOBILE DISPLAY CO., LTD. Effective date: 20121019 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121019 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Display Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Mobile Display Co., Ltd. |