CN100456488C - Display faceplate of full color organic electroluminescence, and fabricating method - Google Patents
Display faceplate of full color organic electroluminescence, and fabricating method Download PDFInfo
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- CN100456488C CN100456488C CNB2006100908553A CN200610090855A CN100456488C CN 100456488 C CN100456488 C CN 100456488C CN B2006100908553 A CNB2006100908553 A CN B2006100908553A CN 200610090855 A CN200610090855 A CN 200610090855A CN 100456488 C CN100456488 C CN 100456488C
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Abstract
The present invention relates to a pixel structure of a full color organic electro-luminescent display panel, which is provided with a plurality of sub pixels each of which comprises at least one first electrode formed on a basal plate, at least a first common layer formed on the first electrode, at least one shield wall formed around the first electrode and a plurality of luminescent layers respectively formed on a first common layer of each corresponding sub pixel, wherein each luminescent layer can not cover each other above each first electrode. At least one second common layer is formed on the luminescent layers, and at least one second electrode is formed on the second common layer. In manufacturing, a first color evaporation source, a second color evaporation source and a third color evaporation source are provided, and the independent evaporation direction of dip and the evaporation angle of the first color evaporation source, the second color evaporation source and the third color evaporation source are matched with the height and the position of the shield wall in order to individually evaporate the first color luminescent layer, the second color luminescent layer and the third color luminescent layer above the first electrode.
Description
Technical field
The present invention relates to a kind of display faceplate of full color organic electroluminescence and manufacture method thereof, and particularly relate to a kind of dot structure and manufacture method thereof that reduces manufacturing cost, improves the display faceplate of full color organic electroluminescence of panel quality.
Background technology
Organic EL display panel (organic electroluminescence panel), compared to other plane Display Technique, excellent specific property such as have self-luminous, high brightness, wide viewing angle, high contrast, low power consumption, high-speed responsive, operating temperature range is wide, luminous efficiency is high, technology is simple and easy makes its product technology development gazed at by the whole world.
Traditional organic electroluminescent device has sandwich construction, mainly is to insert organic luminous layer between anode layer and cathode layer, to produce electroluminescence (electroluminescence).Between organic luminous layer and anode, form hole injection layer and hole transmission layer, between organic luminous layer and negative electrode, then form electron transfer layer.For display faceplate of full color organic electroluminescence, generally formed by ruddiness, green glow and blue light (RGB) grade pixel element.And a pixel comprises each RGB pixel element at least.RGB pixel of present display faceplate of full color organic electroluminescence arranged the framework of continuing to use display panels, RGB time common pixel arrangement mode has strip (stripe) arrangement, mosaic (mosaic) to arrange and triangle (delta) is arranged (or being called triangle arranges), and be wherein common with stripe-arrangement again.And, cause on volume production is made, can producing many shortcomings because RGB pixel is to adopt shielding (shadow mask) evaporation on making, comprising:
1. manufacturing cost is higher: comprise shielding making, accurate alignment system, shielding cavity, shielding purging system, shield detection equipment or the like various device cost, manufacturing cost is increased.
2. the rate that manufactures a finished product is lower: shielding during contraposition usually because contraposition precisely (misalignment) or grit (particle) attach and weigh wounded etc. former so influenced the rate that manufactures a finished product of panel inadequately.
3. panel resolution is lower: the evaporation area of corresponding one pixel of the opening of each shielding, therefore, the openings of sizes of shielding will determine the display faceplate of full color organic electroluminescence panel resolution rate, cause the full-color panel resolution of prior art to be subject to the technological ability of shielding.The panel resolution of employing shielding process generally between 120 to 150ppi (pixel per inch), is no more than 180ppi usually at present.
4. production elasticity is relatively poor: shielding Production Time generally needed for 6 week, and in the common shielding for fear of the tension force inequality, only allow to form a kind of pattern of form, cause in the elasticity of making on producing not high.
Existing many at present manufacturers propose need not use shielding, and produce display faceplate of full color organic electroluminescence (as United States Patent (USP) case No.5294869, No.6517996 etc.).Yet these prior aries all have a common critical defect at least: need original component structure (device structure) of the RGB of change organic illuminating element to cooperate, and made component structure has different color layer overlaid (for example among the United States Patent (USP) case No.5294869, blue-light-emitting is layered in the top of red light emitting layer) or the single color layer in mixed other photochromic material (for example among the United States Patent (USP) case No.6517996, mixed blue emitting material in the red light emitting layer) situation, and be easy to generate the phenomenon of mixed light.
Therefore, how need not use shielding (mask free) and the original formation method that does not change RGB, under the situation of control manufacturing cost, produce do not have the mixed light shortcoming, display faceplate of full color organic electroluminescence that photochromic purity is high, real is important problem of developer.
Summary of the invention
In view of this, purpose of the present invention is exactly dot structure and the manufacture method thereof at the display faceplate of full color organic electroluminescence that a kind of low manufacturing cost, high-quality finished product are provided.
According to purpose of the present invention, a kind of dot structure is proposed, be applicable to display faceplate of full color organic electroluminescence, this dot structure has a plurality of sub-pixels, and these a plurality of sub-pixels comprise:
At least one first electrode is formed on the substrate;
At least one first common layer is formed on first electrode;
At least one barrier shield, be formed at first electrode around;
A plurality of luminescent layers are formed at respectively on first common layer of corresponding respectively this sub-pixel; Wherein, respectively this luminescent layer in respectively not covering mutually on this first electrode;
At least one second common layer is formed on these a plurality of luminescent layers; And
At least one second electrode is formed on second common layer.
According to purpose of the present invention, reintroduce a kind of manufacture method of display faceplate of full color organic electroluminescence, comprise that step is as follows:
Form first electrode on substrate;
Form a plurality of barrier shields around first electrode;
Form at least one first common layer on first electrode;
Form a plurality of first colors time pixel, a plurality of second color time pixel and a plurality of the 3rd color time pixel, on first common layer, comprising:
At least one first color vapor deposition source, at least one second color vapor deposition source and at least one the 3rd color vapor deposition source are provided, by the first color vapor deposition source, the second color vapor deposition source and the 3rd color vapor deposition source independently evaporation incline direction and deposition angles match with these a plurality of barrier shields, with at least one first color luminescent layer, at least one second color luminescent layer, at least one the 3rd color luminescent layer individually evaporation in the top of identical photochromic first electrode of correspondence;
Form at least one second common layer, cover these a plurality of first colors time pixel, these a plurality of second colors time pixel and this a plurality of the 3rd colors time pixel; And
Form second electrode on second common layer.
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, following conjunction with figs. and preferred embodiment are to illustrate in greater detail the present invention.
Description of drawings
Figure 1A～1C illustrates the manufacture method according to the display faceplate of full color organic electroluminescence of the preferred embodiment of the present invention.
Fig. 2 is the top view according to the single dot structure of Figure 1A～1C made.
Fig. 3 is the generalized section according to the single pixel of the display faceplate of full color organic electroluminescence of the preferred embodiment of the present invention.
Fig. 4 is the dot structure of the present invention's first application examples and the schematic diagram of barrier shield design.
Fig. 5 A～5C is respectively the full-color panel pixel of first, second and third kind of the present invention's first application examples and arranges the schematic diagram that designs with barrier shield.
Fig. 6 is the dot structure of application examples two A of the present invention and the schematic diagram of barrier shield design.
Fig. 7 A, 7B are respectively two kinds of full-color panel pixel of application examples two A of the present invention and arrange the schematic diagram that designs with barrier shield.
Fig. 8 is the dot structure of application examples two B of the present invention and the schematic diagram of barrier shield design.
Fig. 9 A, 9B are respectively two kinds of full-color panel pixel of application examples two B of the present invention and arrange the schematic diagram that designs with barrier shield.
Figure 10 is the dot structure of application examples two C of the present invention and the schematic diagram of barrier shield design.
Figure 11 is that the full-color panel pixel of application examples two C of the present invention is arranged the schematic diagram that designs with barrier shield.
Figure 12 is the dot structure of application examples two D of the present invention and the schematic diagram of barrier shield design.
Figure 13 is that the full-color panel pixel of application examples two D of the present invention is arranged the schematic diagram that designs with barrier shield.
The schematic diagram that Figure 14 A, 14B design for two kinds of dot structures of the present invention's the 3rd application examples and barrier shield.
Figure 15 A, 15B are respectively full-color panel pixel that Figure 14 A, 14B according to application examples three of the present invention finished and arrange schematic diagram with the barrier shield design.
Figure 16 is the dot structure of the present invention's the 4th application examples and the schematic diagram of barrier shield design.
Figure 17 arranges the schematic diagram that designs with barrier shield according to the full-color panel pixel of the present invention's the 4th application examples.
Figure 18 arranges the schematic diagram that designs with barrier shield according to the full-color panel pixel of the present invention's the 5th application examples.
The simple symbol explanation
10: substrate
12: the first electrodes
13: the first common layers
15: the second common layers
16: the second electrodes
11A, 11B, 41A, 41B, 51A, 81A, 96A: first part of barrier shield
11C, 51B, 81B, 96B: the second portion of barrier shield
51C, 96C: the third part of barrier shield
21,22,98: barrier shield
101: red time pixel region
102: green time pixel region
103: the blue sub-pixels zone
141: red light emitting layer
142: green light emitting layer
143: blue light-emitting layer
161A, 161B: the first area of adjacent subpixels
162: the second area of adjacent subpixels
171: the first evaporation directions
172: the second evaporation directions
173: the three evaporation directions
θ
1: first inclination angle
θ
2: second inclination angle
θ
3: the 3rd inclination angle
Embodiment
The present invention proposes a kind of display faceplate of full color organic electroluminescence and manufacture method thereof, mainly be in dot structure, to form barrier shield (shadow wall) pattern, and utilize three color vapor deposition source (as the RGB vapor deposition source) with independent evaporation direction and deposition angles, match with this barrier shield pattern, make three color luminescent layers (as the RGB luminescent layer) can distinguish and single ground evaporation on three color light-emitting zones, (do not comprise that the different color layer is overlapping up and down and do not have not homochromy mutual covering, or have two kinds of photochromic materials in the single luminescent layer) situation produce.
Figure 1A～1C, it illustrates the manufacture method according to the display faceplate of full color organic electroluminescence of the preferred embodiment of the present invention.The icon of Figure 1A～1C focuses on the independent evaporation of RGB three luminescent layers, to first electrode, first common layer, second common layer and second electrode, all omits clearly sign.Fig. 2 is the top view according to the single dot structure of Figure 1A～1C made.Fig. 3 is the generalized section according to the single pixel of the display faceplate of full color organic electroluminescence of the preferred embodiment of the present invention.
In this embodiment, three adjacent sub-pixels are formed a pixel, and have at least one first area (for example red time pixel region 101), at least one second area (for example green time pixel region 102) and at least one the 3rd zone (for example the blue sub-pixels zone 103).And barrier shield, be surrounded on three adjacent sub-pixels around, comprise the first second portion 11C of 11A, 11B and line style partly that is the L type.Wherein, be the L type first partly 11A, 11B are arranged at the side in red time pixel region 101 and blue sub-pixels zone 103 respectively.The second part 11C is arranged at the opposite side in red time pixel region 101 and blue sub-pixels zone 103 respectively, and corresponds respectively to the minor face of first part 11A, the 11B that are the L type.
Please be simultaneously with reference to Figure 1A～1C, Fig. 2 and Fig. 3.At first, provide substrate 10, and form first electrode 12 on substrate 10.Then, form a plurality of barrier shields, for example be the L type first partly the second portion 11C of 11A, 11B and line style on first electrode 12, and form at least one first common layer (first common layer) 13 on first electrode 12.Then, with reference to Figure 1A～1C (only indicating the formation of RGB luminescent layer on first electrode), form a plurality of first colors time pixel (as red time pixel), a plurality of second color time pixel (as green time pixel) and a plurality of the 3rd color time pixel (as blue sub-pixels), on first common layer 13.
The method that forms color time pixel comprises: at least one first color vapor deposition source (evaporationsource), at least one second color vapor deposition source and at least one the 3rd color vapor deposition source are provided, by the first color vapor deposition source, the second color vapor deposition source and the 3rd color vapor deposition source independently evaporation incline direction and deposition angles match with barrier shield, with at least one first color luminescent layer, at least one second color luminescent layer, at least one the 3rd color luminescent layer individually evaporation in the top of identical photochromic first electrode 12 of correspondence.
Shown in Figure 1A, at least one the first color vapor deposition source (not shown) with first evaporation direction 171 is provided, for example red vapor deposition source, and the surface of the first evaporation direction 171 and first common layer 13 is first tiltangle
1, and the first evaporation direction 171 can arrive pixel region 101 red time, and to form the first color luminescent layer, for example red light emitting layer 141.Wherein, first of barrier shield L type partly 11B height then with first tiltangle
1Corresponding.Blue light-emitting layer afterwards and green light emitting layer then preboarding are formed in the zone 19,20 among Figure 1A.
Then, shown in Figure 1B, provide at least one the 3rd color vapor deposition source (not shown) with the 3rd evaporation direction 173, for example blue vapor deposition source, and the surface of the 3rd evaporation direction 173 and first common layer 13 is the 3rd tiltangle
3, and the 3rd evaporation direction 173 can arrive blue sub-pixels zone 103, and to form the 3rd color luminescent layer, for example blue light-emitting layer 143.Wherein, first of barrier shield L type partly 11A height then with the 3rd tiltangle
3Corresponding.
Afterwards, shown in Fig. 1 C, provide at least one second color vapor deposition source (not shown) with second evaporation direction 172, green evaporating source for example, and the surface of the second evaporation direction 172 and first common layer 13 is second tiltangle
2, and the second evaporation direction 172 can arrive pixel region 102 green time, and to form the second color luminescent layer, for example green light emitting layer 142.For green time pixel region 102, there is barrier shield both sides, therefore can form green light emitting layer 142; And for blue sub-pixels zone 103, the first part 11B of barrier shield can prevent that the green evaporating source from again forming green light emitting layer above blue light-emitting layer 143, but just can form part green light emitting layer 142 ' at the second part 11C place near barrier shield, because this zone is a non-light-emitting area, so can not impact.
Position that it should be noted that barrier shield (comprising 11A, 11B, 11C) is corresponding with the position of the first color vapor deposition source, the second color vapor deposition source and the 3rd color vapor deposition source, the height of barrier shield and first tiltangle
1, second tiltangle
2With the 3rd tiltangle
3Corresponding, in each pixel region, to define at least one first color time pixel region (as red time pixel region 101), at least one second color time pixel region (as green time pixel region 102) and at least one the 3rd color time pixel region (as blue sub-pixels zone 103), must make the evaporation zone of RGB only cover that the residence is corresponding sends out the first photochromic electrode identical, and can not cover other first photochromic electrode.First tiltangle
1, this second tiltangle
2With the 3rd tiltangle
3Angle for example be about 20 degree to 80 degree, preferred angle is about 30 degree to 70 degree.The height of barrier shield be haply 10 microns (μ m) to 500 microns (μ m), preferably highly be about 20 microns (μ m) to 100 microns (μ m), decide on panel pixels density size.The preferred width of barrier shield is about 30% to 100% of height haply.
In addition, the first evaporation direction 171, the second evaporation direction 172 and the projection on substrate 10 between any two of the 3rd evaporation direction 173 have first angle theta respectively
12, second angle theta
23And the 3rd angle theta
31(not shown), and be about haply more than or equal to 90 degree.
After forming each color luminescent layer, then form at least one second common layer 15, to cover these a plurality of first color luminescent layers (as red light emitting layer 141), these a plurality of second color luminescent layers (as green light emitting layer 142) and this a plurality of the 3rd color luminescent layers (as blue light-emitting layer 143).At last, form second electrode 16 on second common layer 15, as shown in Figure 3.
To sum up, barrier shield of the present invention design can need not used shielding (mask free) and not change under the situation of original component structure of RGB of OELD, guarantee that each color luminescent layer can not cover mutually in each subpixel area, produce do not have the mixed light shortcoming, display faceplate of full color organic electroluminescence that photochromic purity is high.Moreover, because the particular design of barrier shield can make the first color luminescent layer (as red light emitting layer 141), the second color luminescent layer (as green light emitting layer 142) and the 3rd color luminescent layer (as blue light-emitting layer 143) form successively on first common layer 13.
When practical application, what barrier shield can be with the dot structure of display faceplate of full color organic electroluminescence (being called for short full-color panel) and arrangement is different, and is provided with in position.Below first～the 5th application examples, arrange and the barrier shield design according to the various pixel of full-color panel, propose to describe in detail.Yet, the scope of these application examples desire protection can't limit of the present invention.The pattern that technology of the present invention is not limited in the application examples to be narrated.In addition, when draw icons, omit unnecessary element, with clear demonstration application examples of the present invention.
First application examples
Fig. 4 is the dot structure of the present invention's first application examples and the schematic diagram of barrier shield design.In this application examples, three adjacent sub-pixels are formed a pixel, and have at least one first area (for example red time pixel region 101), at least one second area (for example green time pixel region 102) and at least one the 3rd zone (for example the blue sub-pixels zone 103).And barrier shield comprises L type partly 41A and 41B, is separately positioned on a side in red time pixel region 101 and blue sub-pixels zone 103.Then, provide the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) successively.
The first evaporation direction 171, the second evaporation direction 172 and the 3rd evaporation direction 173 of the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) are first tiltangle with substrate surface respectively
1, second tiltangle
2With the 3rd tiltangle
3(please refer to Figure 1A～1C and Fig. 3 and related description among the embodiment).
The position of barrier shield 41A and 41B is corresponding with the position of the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source), and the height of barrier shield 41A and 41B and this first tiltangle
1, this second tiltangle
2With the 3rd tiltangle
3Correspondence is respectively to define at least one first color time pixel region (as red time pixel region 101), at least one second color time pixel region (as green time pixel region 102) and at least one the 3rd color time pixel region (as blue sub-pixels zone 103) in this pixel region.And the first evaporation direction 171, the second evaporation direction 172 and the 3rd evaporation direction 173 arrive respectively in first color time pixel region (as red time pixel region 101), second color time pixel region (as green time pixel region 102) and the inferior pixel region (as blue sub-pixels zone 103) of the 3rd color in this pixel region respectively, to form the first color luminescent layer (as red light emitting layer 141), the second color luminescent layer (as green light emitting layer 142) and the 3rd color luminescent layer (as blue light-emitting layer 143) respectively.
Fig. 5 A～5C is respectively the full-color panel pixel of first, second and third kind of the present invention's first application examples and arranges the schematic diagram that designs with barrier shield.Fig. 5 A～5C also is respectively RGB pixel arrangement mode of strip (stripe), mosaic (mosaic) and triangle (delta) (or being called triangle).
It should be noted that when the dot structure of Fig. 4 and barrier shield repeatedly form the strip pixel and arrange (shown in Fig. 5 A) the L type of the barrier shield minor face of 41A, 41B partly among original Fig. 4 also is equal to the second portion 11C of line style among Fig. 2.
Use the dot structure and the barrier shield design of first application examples, can need not use under shielding (mask free) and the situation of original formation method that does not change RGB, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
Second application examples
In second application examples, mainly be that barrier shield design and two adjacent sub-pixels are matched.Following application examples two A～two D disclose four applicable barrier shield designs respectively.
Application examples two A
Fig. 6 is the dot structure of application examples two A of the present invention and the schematic diagram of barrier shield design.Each pixel has at least two first areas (first portion) 161A, 161B and at least one second area 162.Barrier shield has partly (linearly shape) 51B of at least one first part (being the U font) 51A and at least two second, the first corresponding respectively side that is arranged at first area 161A, 161B of 51A partly wherein, and second corresponding respectively two sides that are arranged at second area 162 of 51B partly.Then, provide the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) successively.
Similarly, the first evaporation direction 171, the second evaporation direction 172 and the 3rd evaporation direction 173 of the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) also are the appropriate tilt angle with substrate surface respectively, in the 161A of first area, to form the first color luminescent layer (as red light emitting layer 141), in second area 162, form the second color luminescent layer (as green light emitting layer 142), in the 161B of first area, form the 3rd color luminescent layer (as blue light-emitting layer 143).
Fig. 7 A, 7B then are respectively two kinds of full-color panel pixel of application examples two A of the present invention and arrange the schematic diagram that designs with barrier shield.Dot structure and barrier shield design according to application examples two A, can need not use under the situation of original component structure of shielding (mask free) and the RGB that does not change OELD, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
Application examples two B
Fig. 8 is the dot structure of application examples two B of the present invention and the schematic diagram of barrier shield design.Each pixel also has at least two first areas (first portion) 161A, 161B and at least one second area 162.Different with application examples two A is: barrier shield has the first partly 81A and linearly two second part 81B of shape that is the U font among application examples two B.The first corresponding respectively side that is arranged at first area 161A, 161B of 81A partly wherein, and second corresponding respectively two sides that are arranged at second area 162 of 81B partly.Then, provide the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) successively or simultaneously.
Similarly, the first evaporation direction 171, the second evaporation direction 172 and the 3rd evaporation direction 173 of the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) also are the appropriate tilt angle with substrate surface respectively, in the 161A of first area, to form the first color luminescent layer (as red light emitting layer 141), in second area 162, form the second color luminescent layer (as green light emitting layer 142), in the 161B of first area, form the 3rd color luminescent layer (as blue light-emitting layer 143).In addition, because of cooperating the position of barrier shield, the second evaporation direction 172 of application examples two A and application examples two B is also inequality.
Fig. 9 A, 9B then are respectively two kinds of full-color panel pixel of application examples two B of the present invention and arrange the schematic diagram that designs with barrier shield.Dot structure and barrier shield design according to application examples two B, similarly can need not use under the situation of original component structure of shielding (mask free) and the RGB that does not change OELD, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
Application examples two C
Figure 10 is the dot structure of application examples two C of the present invention and the schematic diagram of barrier shield design.In application examples two C, adopt the dot structure of application examples two A and two B and barrier shield to design, therefore, the upper left pattern among Figure 10 is Fig. 6, and upper right pattern then is the figure of Fig. 8 after turning upside down.
Figure 11 then is that the full-color panel pixel of application examples two C of the present invention is arranged the schematic diagram that designs with barrier shield.With about two figures among Figure 10 side by side after, form a unit, after repeated arrangement, be the figure of Figure 11.
Dot structure and barrier shield design according to application examples two C, similarly can need not use under the situation of original component structure of shielding and the RGB that does not change OELD, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
Application examples two D
Figure 12 is the dot structure of application examples two D of the present invention and the schematic diagram of barrier shield design.Comprise the RGB light-emitting zone among Figure 12 and be close to laterally zygomorphic two pixels.In application examples two D, the design of the dot structure of change application example two A and barrier shield, therefore, the top pattern among Figure 12 is the variation (not connecting between the barrier shield) of Fig. 6, and the below pattern then is the figure of Fig. 6 after turning upside down.Therefore, the barrier shield of Figure 12 comprises: first partly 51A, 2 second 51B and the 3rd 51C partly partly of shape linearly that are the U font.Wherein, the corresponding respectively side that is arranged at first area 161A, 161B of the first part 51A; Corresponding respectively two sides that are arranged at second area 162 of the second part 51B; The 3rd partly 51C then be arranged at the opposite side of first area 161A, 161B, and after repeated arrangement, be connected (as shown in figure 13) with the 51A of first.
Figure 13 is that the full-color panel pixel of application examples two D of the present invention is arranged the schematic diagram that designs with barrier shield.Wherein, the figure of Figure 13 will be after Figure 12 repeated arrangement.Dot structure and barrier shield design according to application examples two D, similarly can need not use under the situation of original component structure of shielding and the RGB that does not change OELD, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
The 3rd application examples
The schematic diagram that Figure 14 A, 14B design for two kinds of dot structures of the present invention's the 3rd application examples and barrier shield.In this application examples, three adjacent sub-pixels are formed a pixel, comprise first area (for example red time pixel region 101), second area (for example green time pixel region 102) and the 3rd zone (for example the blue sub-pixels zone 103).
In Figure 14 A, barrier shield 21 be surrounded on three adjacent sub-pixels around.In Figure 14 B, barrier shield 22 is arranged at three adjacent sub-pixels between any two.Afterwards, provide the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) successively.
Similarly, the first color vapor deposition source (as red vapor deposition source), the first evaporation direction 171 of second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source), the second evaporation direction 172 and the 3rd evaporation direction 173 also are the appropriate tilt angle with substrate surface respectively, in first area (for example red time pixel region 101), to form the first color luminescent layer (as red light emitting layer 141), in second area (for example green time pixel region 102), form the second color luminescent layer (as green light emitting layer 142), in the 3rd zone (for example the blue sub-pixels zone 103), form the 3rd color luminescent layer (as blue light-emitting layer 143).
Figure 15 A, 15B then are respectively full-color panel pixel that Figure 14 A, 14B according to application examples three of the present invention finished and arrange schematic diagram with the barrier shield design.Dot structure and barrier shield design according to application examples three, similarly can need not use under the situation of original component structure of shielding (mask free) and the RGB that does not change OELD, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
The 4th application examples
Figure 16 is the dot structure of the present invention's the 4th application examples and the schematic diagram of barrier shield design.Dotted portion is represented a pixel, send the inferior pixel region that identical four photochromic luminescent layers then form same color, comprise first area (for example red time pixel region 101), second area (for example green time pixel region 102) and the 3rd zone (for example the blue sub-pixels zone 103).The barrier shield of the 4th application examples comprises first part (being the U font) 96A, second partly (linearly shape) 96B and third part 96C.Wherein, the corresponding respectively side that is arranged at red time pixel region 101 and green time pixel region 102 of the first part 96A; The second part 96B correspondence is arranged at the both sides in blue sub-pixels zone 103; Third part 96C then is arranged on the opposite side of redness time pixel region 101 and green time pixel region 102, and connects partly 96B of the first part 96A and second.Then, provide the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) successively.
Similarly, the first color vapor deposition source (as red vapor deposition source), the first evaporation direction 171 of second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source), the second evaporation direction 172 and the 3rd evaporation direction 173 also are the appropriate tilt angle with substrate surface respectively, in first area (for example red time pixel region 101), to form the first color luminescent layer (as red light emitting layer 141), in second area (for example green time pixel region 102), form the second color luminescent layer (as green light emitting layer 142), in the 3rd zone (for example the blue sub-pixels zone 103), form the 3rd color luminescent layer (as blue light-emitting layer 143).
Figure 17 arranges the schematic diagram that designs with barrier shield according to the full-color panel pixel of the present invention's the 4th application examples.Dot structure and barrier shield design according to the 4th application examples, can need not use under the situation of original component structure of shielding (mask free) and the RGB that does not change OELD equally, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
The 5th application examples
Figure 18 arranges the schematic diagram that designs with barrier shield according to the full-color panel pixel of the present invention's the 5th application examples.In this application examples, three adjacent sub-pixels are formed a pixel, comprise first area (for example red time pixel region 101), second area (for example green time pixel region 102) and the 3rd zone (for example the blue sub-pixels zone 103).And barrier shield 98 be surrounded on three adjacent sub-pixels wherein two sub-pixels around; As shown in figure 18, barrier shield 98 is around red time pixel region 101 and green time pixel region 102.Then, provide the first color vapor deposition source (as red vapor deposition source), the second color vapor deposition source (as the green evaporating source) and the 3rd color vapor deposition source (as blue vapor deposition source) successively, to form the first color luminescent layer (as red light emitting layer 141), the second color luminescent layer (as green light emitting layer 142) and the 3rd color luminescent layer (as blue light-emitting layer 143) respectively.
Dot structure and barrier shield design according to the 5th application examples, can need not use under the situation of original component structure of shielding and the RGB that does not change OELD equally, each color luminescent layer can be formed in each subpixel area single and independently, do not have the shortcoming of mutual covering and mixed light.
In sum; though the present invention discloses as above with preferred embodiment, yet it is not that those skilled in the art without departing from the spirit and scope of the present invention in order to qualification the present invention; can do a little change and retouching, thus protection scope of the present invention should with claim the person of being defined be as the criterion.
Claims (18)
1. a dot structure is applicable to display faceplate of full color organic electroluminescence, and this dot structure has a plurality of sub-pixels, and these a plurality of sub-pixels comprise:
At least one first electrode is formed on the substrate;
At least one first common layer is formed on this first electrode;
At least one barrier shield, be formed at this first electrode around;
A plurality of luminescent layers are formed at respectively on this first common layer of corresponding respectively this sub-pixel; Wherein, respectively this luminescent layer in respectively not covering mutually on this first electrode;
At least one second common layer is formed on these a plurality of luminescent layers; And
At least one second electrode is formed on this second common layer,
Wherein each pixel has at least two first areas and at least one second area, and this barrier shield has at least one first part and at least two second parts, this first partly corresponding respectively side that is arranged at these a plurality of first areas, these a plurality of second partly corresponding respectively two sides that are arranged at this second area.
2. dot structure as claimed in claim 1, wherein this barrier shield also comprises at least one the 3rd part, is arranged at the opposite side of these a plurality of first areas, and links to each other with this first part.
3. dot structure as claimed in claim 1, wherein this barrier shield also comprises at least one the 3rd part, is arranged at the opposite side of these a plurality of first areas, and links to each other with this first part and this a plurality of second parts.
4. dot structure as claimed in claim 1, wherein the height of this barrier shield is 10 microns to 500 microns.
5. dot structure as claimed in claim 4, wherein the width of this barrier shield is 30% to 100% of a height.
6. a dot structure is applicable to display faceplate of full color organic electroluminescence, and this dot structure has a plurality of sub-pixels, and these a plurality of sub-pixels comprise:
At least one first electrode is formed on the substrate;
At least one first common layer is formed on this first electrode;
At least one barrier shield, be formed at this first electrode around;
A plurality of luminescent layers are formed at respectively on this first common layer of corresponding respectively this sub-pixel; Wherein, respectively this luminescent layer in respectively not covering mutually on this first electrode;
At least one second common layer is formed on these a plurality of luminescent layers; And
At least one second electrode, be formed on this second common layer, wherein respectively each three the adjacent sub-pixel in these a plurality of sub-pixels are formed a pixel, and this barrier shield be surrounded on these three adjacent sub-pixels respectively around, and respectively these three adjacent sub-pixels do not have this barrier shield between any two, perhaps this barrier shield is arranged at respectively these three adjacent sub-pixels between any two, and respectively these three adjacent sub-pixels around do not have this barrier shield.
7. a dot structure is applicable to display faceplate of full color organic electroluminescence, and this dot structure has a plurality of sub-pixels, and these a plurality of sub-pixels comprise:
At least one first electrode is formed on the substrate;
At least one first common layer is formed on this first electrode;
At least one barrier shield, be formed at this first electrode around;
A plurality of luminescent layers are formed at respectively on this first common layer of corresponding respectively this sub-pixel; Wherein, respectively this luminescent layer in respectively not covering mutually on this first electrode;
At least one second common layer is formed on these a plurality of luminescent layers; And
At least one second electrode, be formed on this second common layer, wherein respectively each three the adjacent sub-pixel in these a plurality of sub-pixels are formed a pixel, these three adjacent sub-pixels have at least one first area, at least one second area and at least one the 3rd zone, and this barrier shield has first part of at least two L types, first part of these a plurality of L types, is arranged at a side in this first area and the 3rd zone respectively.
8. dot structure as claimed in claim 7, wherein this barrier shield also comprises at least two second partly, these a plurality of second parts are arranged at the opposite side in this first area and the 3rd zone respectively, and correspond respectively to the minor face of first part of these a plurality of L types.
9. a dot structure is applicable to display faceplate of full color organic electroluminescence, and this dot structure has a plurality of sub-pixels, and these a plurality of sub-pixels comprise:
At least one first electrode is formed on the substrate;
At least one first common layer is formed on this first electrode;
At least one barrier shield, be formed at this first electrode around;
A plurality of luminescent layers are formed at respectively on this first common layer of corresponding respectively this sub-pixel; Wherein, respectively this luminescent layer in respectively not covering mutually on this first electrode;
At least one second common layer is formed on these a plurality of luminescent layers; And
At least one second electrode is formed on this second common layer, and wherein each three the adjacent sub-pixel in these a plurality of sub-pixels are formed a pixel, and this barrier shield only be surrounded on these three adjacent sub-pixels respectively wherein two sub-pixels around.
10. a dot structure is applicable to display faceplate of full color organic electroluminescence, and this dot structure has a plurality of sub-pixels, and these a plurality of sub-pixels comprise:
At least one first electrode is formed on the substrate;
At least one first common layer is formed on this first electrode;
At least one barrier shield, be formed at this first electrode around;
A plurality of luminescent layers are formed at respectively on this first common layer of corresponding respectively this sub-pixel; Wherein, respectively this luminescent layer in respectively not covering mutually on this first electrode;
At least one second common layer is formed on these a plurality of luminescent layers; And
At least one second electrode, be formed on this second common layer, wherein be used as a first area, a second area and one the 3rd zone respectively at least three of these a plurality of sub-pixels, and this barrier shield has at least one first part, at least one second part and at least one the 3rd partly, this first partly correspondingly respectively is arranged at this first area and this second area, these second partly corresponding respectively two sides and the 3rd that are arranged at the 3rd zone partly are arranged at the opposite side of this first area and second area, and connects first partly and second partly.
11. the manufacture method of a display faceplate of full color organic electroluminescence, this method comprises:
Form first electrode on substrate;
Form a plurality of barrier shields on this first electrode;
Form at least one first common layer on this first electrode;
Form a plurality of first colors time pixel, a plurality of second color time pixel and a plurality of the 3rd color time pixel, on this first common layer, comprising:
At least one first color vapor deposition source is provided, at least one second color vapor deposition source and at least one the 3rd color vapor deposition source, by this first color vapor deposition source, this second color vapor deposition source and the 3rd color vapor deposition source independently evaporation incline direction and deposition angles match with these a plurality of barrier shields, with at least one first color luminescent layer, at least one second color luminescent layer, at least one the 3rd color luminescent layer individually evaporation in the top of identical photochromic this first electrode of correspondence, wherein this first color vapor deposition source, the first evaporation direction of this second color vapor deposition source and the 3rd color vapor deposition source, the second evaporation direction and the 3rd evaporation direction are first tiltangle with the surface of this substrate respectively
1, second tiltangle
2With the 3rd tiltangle
3, this first tiltangle
1, this second tiltangle
2With the 3rd tiltangle
3Angular range be 20 the degree to 80 the degree or 30 the degree to 70 the degree;
Form at least one second common layer, cover these a plurality of first colors time pixel, these a plurality of second colors time pixel and this a plurality of the 3rd colors time pixel; And
Form second electrode on this second common layer.
12. manufacture method as claimed in claim 11 wherein has a plurality of pixel regions on this substrate, and respectively this pixel region is made up of at least one first color time pixel, at least one second color time pixel and at least one the 3rd color time pixel.
13. manufacture method as claimed in claim 11, wherein the position of these a plurality of barrier shields is corresponding with the position of this first color vapor deposition source, this second color vapor deposition source and the 3rd color vapor deposition source, the height of these a plurality of barrier shields and this first tiltangle
1, this first tiltangle
2With the 3rd tiltangle
3Correspondence is respectively to define at least one first color time pixel region, at least one second color time pixel region and at least one the 3rd color time pixel region in this pixel region.
14. manufacture method as claimed in claim 13, wherein this first evaporation direction, this second evaporation direction and the 3rd evaporation direction arrive respectively in this first color time pixel region, this second color time pixel region and the 3rd color time pixel region in this pixel region respectively, to form a plurality of first color luminescent layers, a plurality of second color luminescent layer and a plurality of the 3rd color luminescent layer respectively.
15. manufacture method as claimed in claim 11, wherein this first evaporation direction, this second evaporation direction and the projection on this substrate between any two of the 3rd evaporation direction have first angle theta respectively
12, second angle theta
23And the 3rd angle theta
31
16. manufacture method as claimed in claim 15, wherein this first angle theta
12, this second angle theta
23And the 3rd angle theta
31More than or equal to 90 degree.
17. manufacture method as claimed in claim 11, the height that wherein forms this barrier shield are 10 microns to 500 microns.
18. manufacture method as claimed in claim 11, the width that wherein forms this barrier shield is 30% to 100% of height.
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| KR101615332B1 (en) | 2012-03-06 | 2016-04-26 | 삼성디스플레이 주식회사 | Pixel arrangement structure for organic light emitting display device |
| US10832616B2 (en) | 2012-03-06 | 2020-11-10 | Samsung Display Co., Ltd. | Pixel arrangement structure for organic light emitting diode display |
| CN104851901B (en) * | 2014-02-18 | 2018-03-30 | 昆山工研院新型平板显示技术中心有限公司 | A kind of high-resolution OLED display and its manufacture method |
| CN104241551B (en) * | 2014-08-22 | 2017-02-15 | 京东方科技集团股份有限公司 | Organic electroluminescence display panel, manufacturing method thereof and display device |
| CN106373982B (en) * | 2016-09-06 | 2017-11-24 | 京东方科技集团股份有限公司 | Display base plate and preparation method thereof and display device |
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