CN100472274C - Double refraction sinusoidal projection grating generator - Google Patents
Double refraction sinusoidal projection grating generator Download PDFInfo
- Publication number
- CN100472274C CN100472274C CNB2004100418199A CN200410041819A CN100472274C CN 100472274 C CN100472274 C CN 100472274C CN B2004100418199 A CNB2004100418199 A CN B2004100418199A CN 200410041819 A CN200410041819 A CN 200410041819A CN 100472274 C CN100472274 C CN 100472274C
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- wave plate
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- optical glass
- wedge
- cuneal
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Abstract
The invention discloses a double refraction sinusoidal projection bar line generator, it especially relates to a phasic excursion bar line projection measuring generator. It is composed with laser diode, collimating lens, polariscope, 1/4 wave plate, cuneal double refraction crystal, cuneal optical glass and polarization analyzer, the collimating lens is under the laser diode, the polariscope is under the collimating lens, the 1/4 wave plate is under the polariscope, the cuneal double refraction crystal is under the 1/4 wave plate, the cuneal optical glass is under the cuneal double refraction crystal, the 1/4 wave plate is under the cuneal optical glass, the polarization analyzer is under the 1/4 wave plate. The invention has several excellences such as: well-proportioned and stable brightness distribution, strong antijamming capability, quakeproof is not necessary.
Description
Technical field
The present invention relates to a kind of projecting grating generator, refer in particular to a kind of sinusoidal projection grating generator that phase shift grating projectin measures that is used for.
Background technology
At present, mostly adopt the film that duplicates sinusoidal grid line or computer-controlled LCD panel etc., produce the sinusoidal projection grid line by projection arrangement.Its intensity distributions of sinusoidal grid line that is produced by film is difficult to control, and the sinusoidal grid line that is produced by LCD panel is being subjected to the very big restriction of LCD panel aspect the spatial resolution.Carrying out phase shift grating projectin when measuring, the sinusoidal projection grid line that needs high density, high brightness is usually measured by especially micro-phase shift grating projectin, and existing sinusoidal grating projectin device is difficult to satisfy these needs.
Technology contents
The invention provides a kind of sinusoidal projection grating generator that phase shift grating projectin measures, especially micro-phase shift grating projectin measures that can be used in.
A kind of sinusoidal projection grating generator that is used for grating projectin's measurement, described generator is by laser diode 1, collimation lens 2, polarizer 3, quarter wave plate 4, the birefringent wedge crystal 5, wedge shape optical glass 6, quarter wave plate 7 and analyser 8 are formed, collimation lens 2 is positioned at the below of laser diode 1, polarizer 3 is positioned at the below of collimation lens 2, quarter wave plate 4 is positioned at the below of polarizer 3, the birefringent wedge crystal 5 is positioned at the below of quarter wave plate 4, wedge shape optical glass 6 is positioned at the below of birefringent wedge crystal 5, quarter wave plate 7 is positioned at the below of wedge shape optical glass 6, and analyser 8 is positioned at the below of quarter wave plate 7.
Because the present invention adopts the monochromatic light with certain coherent length that laser diode sends as light source, has not only guaranteed the monochromaticity of light source but also suppressed to a certain extent the speckle noise on the image planes.The monochromatic light that sends from laser diode becomes the illuminating bundle with certain diameter behind collimation lens, this light beam becomes circularly polarized light behind polarizer 3 and quarter wave plate 4, circularly polarized light is reduced to linearly polarized light by the 2nd quarter wave plate 7 after by birefringent wedge crystal and the wedge shape optical glass that matches with it.9,10 be respectively ordinary light and unusual light beam irradiates district, 11 is intersecting area.Because the birefringent wedge crystal causes the optical path difference of incident light on two orthogonal directionss, therefore, causes emergent light to change original polarization state in intersecting area.The point that optical path difference is identical has identical polarization state, by also having identical brightness (gray scale) behind the analyser 8.Because birefringece crystal is designed to wedge shape, therefore, the identical point of all brightness is linked to be light and dark parallel lines, and its brightness is sinusoidal square distribution.
Compared with prior art, the present invention has following advantage:
1. because the present invention adopts laser to make light source, therefore, can obtain the projecting grating of high brightness, be particularly suitable for the measurement requirement and the measurement occasion that needs high illumination of small scope.
2. compare with film projection, Luminance Distribution is more even, more stable.
3. compare with the laser interference grating, have antijamming capability strong, need not shockproof advantage.
4. by the correct coherent length of selecting light source, can exempt speckle noise and disturb, obtaining brightness is the parallel grating of sinusoidal square distribution.
5. can regulate raster density by the angle of wedge that changes optical source wavelength or wedge shape.
6. because well-behaved phaneroplasm is long-pending little, in light weight, therefore, be particularly suitable for being used, carry out micrometering with microlens.Joining 10 power microscope heads with the generator of 10 lines/mm is example, can obtain the projecting grating of 100/mm.
Description of drawings
Fig. 1 is a structural representation of the present invention, and 1 laser diode, 2 collimation lenses, 3 polarizers, 4 quarter wave plates, 5 birefringent wedge crystal, 6 wedge shape optical glass, 7 quarter wave plates, 7,8 analysers, 9 ordinary light beam districts, 10 are light beam district, 11 intersecting areas very.
Embodiment
A kind of sinusoidal projection grating generator that is used for grating projectin's measurement, it is characterized in that described generator is by laser diode 1, collimation lens 2, polarizer 3, quarter wave plate 4, the birefringent wedge crystal 5, wedge shape optical glass 6, quarter wave plate 7 and analyser 8 are formed, collimation lens 2 is positioned at the below of laser diode 1, polarizer 3 is positioned at the below of collimation lens 2, quarter wave plate 4 is positioned at the below of polarizer 3, the birefringent wedge crystal 5 is positioned at the below of quarter wave plate 4, wedge shape optical glass 6 is positioned at the below of birefringent wedge crystal 5, quarter wave plate 7 is positioned at the below of wedge shape optical glass 6, analyser 8 is positioned at the below of quarter wave plate 7, in the present embodiment, wedge shape optical glass 6 has the identical angle of wedge with the birefringent wedge crystal 5, and wedge shape optical glass 6 is by the bonding integral body that forms of wedge shape direction symmetry with the optics resin glue with the birefringent wedge crystal 5.
The present invention is diameter and the focal length that the angle of divergence of the size of field of illumination as required and laser diode is determined collimation lens.The polarization direction of polarizer 3 is consistent with the polarization direction of laser as far as possible when laser is polarized light, and the fast axle of quarter wave plate 4 is at 45 with the polarization direction of polarizer.The angle of wedge that changes the birefringent wedge crystal can be regulated moire grids density, and the big more grid line of the angle of wedge is close more.The angle of wedge of wedge shape optical glass is consistent with the angle of wedge of birefringece crystal as far as possible, to correct the exit beam deflection angle to greatest extent.The slow axis of the 2nd quarter wave plate 7 is arranged on the direction identical with the fast axle of the 1st quarter wave plate 4, and circularly polarized light is reduced to linearly polarized light.The polarization direction of analyser 8 can be identical with the polarization direction of polarizer 3, also can quadrature.The moire grids density that forms in zone 11 also can be regulated by changing optical maser wavelength, and the short more grid line of wavelength is close more.If as light source, adopt quartzy birefringece crystal with green glow, obtain 10 lines/mm moire grids density, about about 17 ° of the angle of wedge.
Claims (3)
1. one kind is used for the sinusoidal projection grating generator that grating projectin measures, and it is characterized in that described generator is made up of the laser diode of arranging in regular turn along optical path direction (1), collimation lens (2), polarizer (3), quarter wave plate (4), birefringent wedge crystal (5), wedge shape optical glass (6), quarter wave plate (7) and analyser (8).
2. sinusoidal projection grating generator according to claim 1 is characterized in that wedge shape optical glass (6) has the identical angle of wedge with birefringent wedge crystal (5).
3. sinusoidal projection grating generator according to claim 2 is characterized in that wedge shape optical glass (6) and birefringent wedge crystal (5) are by the bonding integral body that forms of wedge shape direction symmetry with the optics resin glue.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100418199A CN100472274C (en) | 2004-08-31 | 2004-08-31 | Double refraction sinusoidal projection grating generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100418199A CN100472274C (en) | 2004-08-31 | 2004-08-31 | Double refraction sinusoidal projection grating generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1598640A CN1598640A (en) | 2005-03-23 |
| CN100472274C true CN100472274C (en) | 2009-03-25 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100418199A Expired - Fee Related CN100472274C (en) | 2004-08-31 | 2004-08-31 | Double refraction sinusoidal projection grating generator |
Country Status (1)
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| CN (1) | CN100472274C (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102322801B (en) * | 2011-08-09 | 2012-12-12 | 天津大学 | Oscillating type demodulation device with high signal-to-noise ratio and low coherent interference displacement and demodulation method for demodulation device |
| CN111596518B (en) * | 2020-06-04 | 2022-11-18 | 中影光峰激光影院技术（北京）有限公司 | Speckle-free laser projection equipment |
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2004
- 2004-08-31 CN CNB2004100418199A patent/CN100472274C/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN1598640A (en) | 2005-03-23 |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090325 Termination date: 20110831 |