CN100538409C - The method for repairing and mending of electronic element pattern defect - Google Patents
The method for repairing and mending of electronic element pattern defect Download PDFInfo
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- CN100538409C CN100538409C CN 200610143590 CN200610143590A CN100538409C CN 100538409 C CN100538409 C CN 100538409C CN 200610143590 CN200610143590 CN 200610143590 CN 200610143590 A CN200610143590 A CN 200610143590A CN 100538409 C CN100538409 C CN 100538409C
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Abstract
The method for repairing and mending that the invention provides a kind of electronic element pattern defect comprises provides substrate to have pattern structure thereon, and wherein pattern structure has at least one defective, and corresponding main region of pattern structure and the corresponding defect area of this at least one defective.Impose the first surface treatment step in defect area, make the surface nature of defect area be different from main region.Impose the defect mending step and impose the second surface treatment step with ink-jet method, make the surface nature of defect area identical with the surface nature of main region in defect area.
Description
Technical field
The present invention relates to a kind of manufacture method of electronic component, particularly relate to a kind of method for repairing and mending of electronic element pattern defect.
Background technology
The required material of Thin Film Transistor-LCD (TFT-LCD) FEOL mainly comprises color filter film (Color filter is called for short CF), glass substrate, driving circuit (driver IC), backlight module and liquid crystal material etc.Especially, in the manufacturing cost of TFT-LCD, material cost accounts for 60～70% proportion, and is wherein the highest with the shared whole TFT-LCD panel material cost proportion of color filter film again, almost reaches 1/4 ratio.When the diversification of TFT-LCD application product and output enlarge gradually, also progressively soaring to the demand of color filter film.By and large, on average there are 2 one-tenth above color filter films that the demand of repairing is arranged approximately.Therefore, how to reach high-quality colorized optical filtering film production, and the relevant repairing technique of development, the TFT-LCD yield rate improved.
In order to solve the problem of making color filter film, color filter film ink-jet method system is suggested.Yet traditional ink-jet method is made color filter film needs accurately that platform goes to control pattern of pixels (pattern) position that ink-jet drop is sprayed onto prior decision, and can not overflow and be dissipated to the adjacent pixels color lump, to avoid taking place colour mixture.Moreover the pattern that color filter film can be printed must cooperate the spacing of ink gun nozzle with resolution and design, and has increased the complexity of technology.
The method for making of tradition color filter film is to produce the pixel of many red, green, blues (Dot) on glass substrate, the pixel (Pixel) on the plain corresponding LCD of each picture group.Its main technique comprises the pigment dispersing method, at first makes preventing the light-shielding pattern colour mixture on glass substrate successively with sputter, photoetching and etching three road technologies, is black matrix" (Black Matrix).Then, produce the trichromatic colored light filter membrane layer of red, green, blue (RGB) (shape of filter layer, size, configuration successively respectively with photolithographicallpatterned, different according to the LCD of different purposes), nesa coating (ITO) is as the electrode of display in the last sputter.
Yet, in the manufacture process of color filter film, usually follow defective to form.Traditional defect mending method comprises the mode with laser burn off (laser burning), removes the blend of colors zone.Perhaps the particle that will adhere to removes, but can not be for the repairing of carrying out color because of the white bore region of the inhomogeneous generation of surface treatment.
United States Patent (USP) US5 714, No. 195, discloses a kind of method for repairing and mending of color filter film.Utilize ink ejecting method for the defective place of color filter film, for example lack look (color omission) or color inequality (color irregularity), arrive fault location with ink gun spraying colorful substance, to reach the purpose of repairing.Fig. 1 repairs the process flow diagram of color filter film for showing traditional ink-jet method.The method for repairing and mending of tradition color filter film detects the color filter film that completes after being included in and making color filter film (S10) step, if chromatic colour patterning defective is then repaired step.The method of repair-deficiency comprises that method (a) to have the test and the device of mending function, promptly repairs color filter film (S30) in detecting defective, finishes flawless color filter film (S40) when test is finished.Perhaps, mainly test color filter film (S20) earlier, if well finish flawless color filter film (S40) by method (b).If detect bad defective, then repair color filter film (S30), until flawless color filter film (S40).
The ink-jet technology characteristics mainly are directly Red Green Blue to be sprayed on the pixel, so simpler than conventional dry membrane type mode on the repair technology, produce in batches running cost low, improve speed of production, reduce the production equipment cost.
United States Patent (USP) US 6,479,120 and US 6,228,464 patents disclose the method for a kind of repairing screen painting (screen printing) circuit pattern defective.See also Fig. 2, the circuit pattern 12 that has screen painting on the substrate 10, wherein circuit pattern has defective (broken string), can pass through a transparent defect repair sheet 20, have on it for the pattern of repairing 24, covering is sticked together on substrate 10 and is covered defective locations, again via hot pressing 50 or printing process with the transfer printing of defect repair band, and, make the volatilization of solvent and adhesive agent through the irradiation heat treated, finish the purpose of repairing.
Yet, existing method of repairing electronic element pattern defect, do not consider at the material and the surface nature between the repair materials of the last figure line of substrate, and do not handle at the position after repairing, thereby influence follow-up technology, when especially being applied in the high resolution display panel, the problems referred to above cause cost to rise and decrease in yield because of prior art processes is complicated.
Summary of the invention
In view of this, the object of the present invention is to provide a kind of electronic component patterning defects detection, reparation and complementing method, improve the performance of element, and then improve fabrication yield and reduce manufacturing cost.
For reaching above-mentioned purpose, the invention provides a kind of method for repairing and mending of electronic element pattern defect, comprise: provide substrate to have pattern structure thereon, wherein pattern structure has at least one defective, and corresponding main region of pattern structure and the corresponding defect area of this at least one defective; Impose the first surface treatment step in defect area, make the surface nature of defect area be different from main region; Impose the defect mending step; And impose the second surface treatment step in defect area, make the surface nature of defect area identical with the surface nature of main region.
For reaching above-mentioned purpose, the present invention also provides a kind of method for repairing and mending of electronic element pattern defect, comprise: provide substrate to have the chromatic filter layer structure thereon, wherein the chromatic filter layer structure has picture element flaw, and corresponding main region of chromatic filter layer structure and picture element flaw respective pixel defect area; Impose the step of removing residual substance on the picture element flaw zone; Impose the first surface treatment step in this picture element flaw zone, make the surface nature in picture element flaw zone be different from main region; Impose picture element flaw and repair step; It is inhomogeneous to remove surface thickness to impose the planarization step; And impose the second surface treatment step in the picture element flaw zone, make the surface nature of defect area identical with the surface nature of this main region.
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, preferred embodiment cited below particularly, and in conjunction with the accompanying drawings, be described in detail below:
Description of drawings
Fig. 1 repairs the process flow diagram of color filter film for showing traditional ink-jet method;
Fig. 2 is for showing existing method of repairing screen painting (screen printing) circuit pattern defective;
Fig. 3 is for showing the process flow diagram according to the colored light filter membrane pattern fault of construction method for repairing and mending of the embodiment of the invention;
Fig. 4 A-4D is for showing the decomposition step sectional view according to the colored light filter membrane pattern fault of construction method for repairing and mending of first embodiment of the invention;
Fig. 5 A-5E is for showing the decomposition step sectional view according to the colored light filter membrane pattern fault of construction method for repairing and mending of second embodiment of the invention; And
Fig. 6 A-6F is for showing the decomposition step sectional view according to the colored light filter membrane pattern fault of construction method for repairing and mending of third embodiment of the invention.
The simple symbol explanation
Existing part (Fig. 1 and 2)
S10-S40～traditional ink-jet method is repaired the step of color filter film;
10～substrate;
12～circuit pattern;
20～defect repair sheet;
24～for the pattern block of repairing;
50～hot-pressing processing.
This case part (Fig. 3～6F)
S110-S160～colored light filter membrane pattern fault of construction is repaired step;
201～substrate;
202～black-matrix layer;
203～colored photoresist;
205～defect area;
206～residual substance;
210～colorized optical filtering membrane structure;
The step of residual substance on this defect area of 215～removal;
220a～first surface treatment step;
220b～second surface treatment step;
300～ink discharge device;
303,305 '～repairing film;
310～colored photoresist drop;
350～planarization step.
Embodiment
The invention provides a kind of method of repairing the electronic component pattern defect, make above-mentioned element defective be repaired improvement with ink-jet method.By the normal pressure surface preparation, the defective locations local properties is changed, make its surface nature different with non-scarce limit district, according to the defect sturcture that needs to repair, for example repair again with ink-jet method.Penetrate the defective locations of filling up at substrate when repairing liquid by ink gun, repair.Then, carry out secondary substrate surface and handle, make former defect area identical with the surface nature in non-scarce limit zone,, reach the purpose that improves yield rate in order to the carrying out of subsequent technique through the surface nature after repairing.Though it is example that the embodiment of the invention is repaired with the pattern defect of color filter film, yet be not in order to limit the present invention, other electron component circuit pattern, for example indium tin oxide (ITO) electrode, screen painting circuit, plated pattern, all available method for repairing and mending of the present invention carries out the pattern defect reparation.
Fig. 3 is for showing according to the embodiment of the invention a kind of process flow diagram of colored light filter membrane pattern fault of construction method for repairing and mending of application wherein.At first, make the step of color filter film (S110).The manufacture method of color filter film can be applicable to panel of LCD and other field of flat panel displays, comprises decoration method, pigment dispersing method, print process, electrochemical plating and ink-jet method etc.Then, the color filter film of finishing is detected, find the place of all defect position.Then, remove the step of the residual substance (S120) on the picture element flaw zone, make it stay scarce look (color omission) zone.Then, carry out the first surface treatment step, make the surface nature in picture element flaw zone be different from main region (S130) in the defective locations place.
Then, carry out colour element defect mending step (S140), carry out defect repair and fill up with ink-jet method.Fill up the place in defective, carry out planarization step (S150).Then, impose the second surface treatment step, make the surface nature identical (S160) of picture element flaw zone and main region, in order to the carrying out of subsequent technique.
Process for treating surface of the present invention comprises physical property surface preparation (for example atmospheric plasma facture) and chemical surface preparation (for example coating surface dressing agent), change the surface nature of local location, for example polarity and parent, repellency, and the collocation ink-jet method, reach the purpose of element repair.
According to the preferred embodiment of the present invention, adopt the purpose of atmospheric plasma facture to be that removal remains in border or black matrix" (black matrix, BM) local defect of superstructure because of colored photoresist.In the color disappearance of removing the residual substance on the picture element flaw zone and causing, again by ink-jet method complementary color in addition.The main functional localization of atmospheric plasma facture is to remove organic residually, particularly on the border or black matrix" (BM) superstructure residual, but does not damage border or black matrix" (BM) structure.
Secondly, before ink-jet is repaired, can utilize the atmospheric plasma facture to carry out blemish surface and handle, change its repellency.Because ink-jetting style, fill up colored drop and drop on defective and fill up on the position, can cause the variation of colored droplet flow because of defective locations surface nature difference.For head it off, adopt local atmospheric plasma to handle, make the defective locations regional area form repellency, handle via ink-jet and slaking (curing) again, can obtain not having the repairing of diffusion.
Moreover, after back or planarization step are repaired in ink-jet, adjust the surface nature of defective locations, reply surface nature before original repairing the (generally comparatively water wettability), carrying out in order to subsequent technique, for example when deposition formed indium tin oxide (ITO) electrode, reason was not repaired the repellency that causes, and made the manufacturing of follow-up indium tin oxide (ITO) electrode produce defective.
United States Patent (USP) US6,342, No. 275 announcements use atmospheric plasma (atmosphere plasma) device to improve instrument as the surface treatment of organic element.Wherein, atmospheric plasma (atmosphere plasma) device and method can be cited as the reference of the embodiment of the invention.The atmospheric plasma facture generally be with radio frequency discharge (RF-discharge) as drive source, excited inert gas (as He) and mixed gas are (as O
2) produce O, OH, free radicals such as H, F, reach the surface-treated purpose.
Below with three embodiment, illustrate colored light filter membrane pattern fault of construction method for repairing and mending of the present invention.
Fig. 4 A-4D is for showing the decomposition step sectional view according to the colored light filter membrane pattern fault of construction method for repairing and mending of first embodiment of the invention.See also Fig. 4 A, Fig. 4 A is for showing the manufacturing step process flow diagram according to the nano carbon pipe field-emission display of the embodiment of the invention.At first, provide substrate 201, the colorized optical filtering membrane structure 210 that completes is arranged on it.Colorized optical filtering membrane structure 210 can be the colorized optical filtering membrane structure of knowing arbitrarily, for example causes resist 203 pixels with red, green, blue three coloured light and is constituted, and its interval is with the black-matrix layer (black matrix) 202 of paliform.In the manufacture process of colorized optical filtering membrane structure 210, can produce scarce look (color omission) or color inequality defect areas 205 such as (color irregularity), with respect to other complete main region of colorized optical filtering membrane structure 210.
Then, see also Fig. 4 B, impose first surface treatment step 220a on defect area 205, make the surface nature of defect area 205 be different from main region.First surface treatment step 220a comprises physical property surface treatment step or chemical surface treatment step, wherein the physical property surface treatment step comprises the atmospheric plasma treatment step, and the chemical surface treatment step comprises that the coating surface dressing agent is on defect area 205.
Then, see also Fig. 4 C, impose the defect mending step, repair and fill up scarce look (color omission) or color inequality defect areas 205 such as (color irregularity).According to a preferred embodiment of the invention, can repair with ink-jetting style according to the pixel color of needs repairing.The colored photoresist drop 310 that to repair by ink discharge device 300 is sprayed on the substrate 201 defect area 205 and handles through slaking (curing), can obtain not having the repairing film 303 of diffusion, is illustrated among Fig. 4 D.
See also Fig. 4 D, impose second surface treatment step 220b on the repairing film 303 of defect area, make the surface nature of repairing film 303 identical,, reach the purpose that improves yield rate in order to the carrying out of subsequent technique with the main region surface nature of colorized optical filtering membrane structure 210.220a is identical with the first surface treatment step, second surface treatment step 220b comprises physical property surface treatment step or chemical surface treatment step, wherein the physical property surface treatment step comprises the atmospheric plasma treatment step, and the chemical surface treatment step comprises that the coating surface dressing agent is in repairing on the film 303.
Fig. 5 A-5E is for showing the decomposition step sectional view according to the colored light filter membrane pattern fault of construction method for repairing and mending of second embodiment of the invention.The colored light filter membrane pattern fault of construction method for repairing and mending of second embodiment of the invention, its key step is similar to the colored light filter membrane pattern fault of construction method for repairing and mending of first embodiment of Fig. 4 A-4D, for simplicity's sake, omit its details narration at this, difference is also to comprise residual substance 206 on the defect area 205, shown in Fig. 5 A.
See also Fig. 5 B, then impose the step 215 of removing residual substance 206 on the defect area 205, for example with LASER Light Source as removing residual substance 206 instruments.According to a preferred embodiment of the invention, the step 215 of removing residual substance 206 on this defect area comprises chemical grinding, Wet-type etching, photoetch, laser burn off, plasma removes and ion beam removes step.The principle of the repairing step of Fig. 5 C-5E is identical with first embodiment basically with purpose, for simplicity's sake, omits its details narration at this.
Fig. 6 A-6F is for showing the decomposition step sectional view according to the colored light filter membrane pattern fault of construction method for repairing and mending of third embodiment of the invention.The colored light filter membrane pattern fault of construction method for repairing and mending of third embodiment of the invention, its key step is similar to the colored light filter membrane pattern fault of construction method for repairing and mending of second embodiment of Fig. 5 A-5E, wherein the principle of the repairing step of Fig. 6 A-6D is identical with second embodiment basically with purpose, for simplicity's sake, omit its details narration at this, difference is that it is inhomogeneous to remove surface thickness that other imposes the planarization step when the repairing film 305 ' surface irregularity on the defect area 205.
See also Fig. 6 E, when the repairing film 305 ' surface irregularity on the defect area 205, it is inhomogeneous to remove surface thickness that other imposes planarization step 350, to form smooth repairing film 303.According to a preferred embodiment of the invention, planarization step 350 comprises chemical grinding, Wet-type etching, photoetch, laser burn off, plasma removes and ion beam removes step.
See also Fig. 6 F, impose second surface treatment step 220b on the repairing film 303 of defect area, make the surface nature of repairing film 303 identical,, reach the purpose that improves yield rate in order to the carrying out of subsequent technique with the main region surface nature of colorized optical filtering membrane structure 210.
Though the above embodiment of the present invention is an example with the method for repairing and mending of colored filter, in order to explanation the present invention, yet be not in order to limit the present invention, the repairing application of other electron component pattern defect, for example display colorful filter structure, display membrane transistor (TFTs) matrix structure or printing circuit structure, the method for repairing and mending reparation that all can use electronic element pattern defect of the present invention.
Feature of the present invention and advantage are the method for repairing and mending by ink-jet, make the local defect zone of the pattern structure on the substructure for electrical device be improved.Pattern structure can be the micro-structure unit of colored filter, electrode, lead or other predefined pattern.Via the atmospheric plasma surface treatment, the defect property with the part changes earlier, makes the substrate different in kind with non-defect area.Again according to the pixel color of need repairing, repair and fill up with ink-jet method.Ink-jet liquid then carries out secondary substrate surface and handles after structure is filled up in formation on the substrate, makes former defect area identical through the regional surface nature of surface nature after repairing and non-scarce limit, reaches the purpose that improves yield rate.
Though the present invention discloses as above with preferred embodiment; yet it is not in order to limit scope of the present invention; any those skilled in the art; without departing from the spirit and scope of the present invention; when can making a little change and modification, thus protection scope of the present invention with claims the person of being defined be as the criterion.
Claims (13)
1. the method for repairing and mending of an electronic element pattern defect comprises:
Provide substrate to have pattern structure thereon, wherein this pattern structure has at least one defective, and corresponding main region of this pattern structure and the corresponding defect area of this at least one defective;
Impose the first surface treatment step in this defect area, make the surface nature of this defect area be different from this main region, this first surface treatment step comprises the first physical property surface treatment step or the first chemical surface treatment step;
Impose the defect mending step, this defect mending step comprises the ink-jet step; And
Impose the second surface treatment step in this defect area, make the surface nature of this defect area identical with the surface nature of this main region, this second surface treatment step comprises the second physical property surface treatment step or the second chemical surface treatment step.
2. the method for repairing and mending of electronic element pattern defect as claimed in claim 1, wherein this pattern structure is display colorful filter structure, display membrane transistor matrix structure or printing circuit structure.
3. the method for repairing and mending of electronic element pattern defect as claimed in claim 1 wherein before imposing the first surface treatment step, also comprises imposing the step of removing residual substance on this defect area.
4. the method for repairing and mending of electronic element pattern defect as claimed in claim 3, wherein the step of residual substance comprises chemical grinding, Wet-type etching, photoetch, laser burn off on this defect area of this removal, plasma removes and ion beam removes step.
5. the method for repairing and mending of electronic element pattern defect according to claim 1, wherein this first physical property surface treatment step comprises the atmospheric plasma treatment step.
6. the method for repairing and mending of electronic element pattern defect as claimed in claim 1, wherein this first chemical surface treatment step comprises the coating surface dressing agent.
7. the method for repairing and mending of electronic element pattern defect as claimed in claim 1 wherein after this defect mending step, comprises that also to impose the planarization step inhomogeneous to remove the defect area surface thickness of being repaired.
8. the method for repairing and mending of electronic element pattern defect as claimed in claim 7, wherein this planarization step comprises chemical grinding, Wet-type etching, photoetch, laser burn off, plasma removes and ion beam removes step.
9. the method for repairing and mending of an electronic element pattern defect comprises:
Provide substrate to have display colorful filter structure, display membrane transistor matrix structure or printing circuit structure thereon, wherein above-mentioned structure has picture element flaw, and the corresponding main region of this structure and this picture element flaw respective pixel defect area;
Impose the step of removing residual substance on this picture element flaw zone;
Impose the first surface treatment step in this picture element flaw zone, make the surface nature in this picture element flaw zone be different from this main region, this first surface treatment step comprises the first physical property surface treatment step or the first chemical surface treatment step;
Impose picture element flaw and repair step, this picture element flaw is repaired step and is comprised the ink-jet step;
It is inhomogeneous to remove the defect area surface thickness of being repaired to impose the planarization step; And
Impose the second surface treatment step in this picture element flaw zone, make the surface nature of this defect area identical with the surface nature of this main region, this second surface treatment step comprises the second physical property surface treatment step or the second chemical surface treatment step.
10. the method for repairing and mending of electronic element pattern defect as claimed in claim 9, wherein the step of residual substance comprises chemical grinding, Wet-type etching, photoetch, laser burn off on this defect area of this removal, plasma removes and ion beam removes step.
11. the method for repairing and mending of electronic element pattern defect as claimed in claim 9, wherein this first physical property surface treatment step comprises the atmospheric plasma treatment step.
12. the method for repairing and mending of electronic element pattern defect as claimed in claim 9, wherein this first chemical surface treatment step comprises the coating surface dressing agent.
13. the method for repairing and mending of electronic element pattern defect as claimed in claim 9, wherein this planarization step comprises chemical grinding, Wet-type etching, photoetch, laser burn off, plasma removes and ion beam removes step.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 200610143590 CN100538409C (en) | 2006-11-09 | 2006-11-09 | The method for repairing and mending of electronic element pattern defect |
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| CN 200610143590 CN100538409C (en) | 2006-11-09 | 2006-11-09 | The method for repairing and mending of electronic element pattern defect |
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| CN101178451A CN101178451A (en) | 2008-05-14 |
| CN100538409C true CN100538409C (en) | 2009-09-09 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101592753B (en) * | 2009-06-26 | 2011-02-16 | 华映光电股份有限公司 | Method for patching colored filter and pre-patching material used thereby |
| JP2013186163A (en) * | 2012-03-06 | 2013-09-19 | Ntn Corp | Pattern correction method and pattern correction device |
| CN103969945B (en) * | 2013-01-25 | 2018-08-24 | 上海微电子装备（集团）股份有限公司 | Scratch mask repair apparatus and method |
| CN106097376B (en) * | 2016-06-27 | 2020-06-23 | 昆山国显光电有限公司 | Panel repairing method and device |
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