CN100545754C - 用于光学元件的更换设备 - Google Patents
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- 230000003287 optical effect Effects 0.000 title claims abstract description 135
- 238000012423 maintenance Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 210000001747 pupil Anatomy 0.000 claims description 3
- 239000011343 solid material Substances 0.000 claims description 3
- 230000000717 retained effect Effects 0.000 claims description 2
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 235000008331 Pinus X rigitaeda Nutrition 0.000 description 2
- 235000011613 Pinus brutia Nutrition 0.000 description 2
- 241000018646 Pinus brutia Species 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000010437 gem Substances 0.000 description 1
- 229910001751 gemstone Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Abstract
一种用于光学元件更换设备,所述光学元件安装在光刻物镜(1)内的两个相邻光学元件(2)之间,所述更换设备具有用于要被更换的光学元件(2a)的托架(5),所述托架(5)可以通过光刻物镜(1)的壳体(1a)内的侧面开口(6)移入到光刻物镜(1)内。
Description
本发明涉及一种用于光学元件的更换设备,所述光学元件置于光刻物镜内的两个相邻光学元件之间。此外,本发明涉及一种光刻物镜。
已知光刻物镜,其中最后的光学元件(也就是说位于与需曝光的晶片最接近位置处的光学元件)是可更换的。
此外也存在投影物镜,其中透镜镜筒保持在一支承结构中,并且可以被整体更换。为此,需要破坏物镜的整体结构。
关于与本发明相关的现有技术,参考文献US 2002/0167740A1和US 6449106B1。
例如,如果光刻物镜内的光学元件(如透镜或反射镜)随时间过程发生改变,并且损害了物镜的性能以致于不能实现其预期寿命,则,应该能够移走该物镜内适当选定的光学元件,由此插入新的经适当加工的光学元件,这样补偿了其它光学元件的成像误差。然而,已知的用于更换该最后的光学元件的方法和设备不适于此目的。
因此,本发明的目的是提供一种用于光学元件的更换设备,所述光学元件安装在光刻物镜内的两个相邻光学元件之间,并允许进行这种更换。
根据本发明,为此目的提供了一种用于光学元件的更换设备,所述光学元件安装在光刻物镜内的两个相邻光学元件之间,所述更换设备具有托架,所述托架用于要被更换的光学元件,所述托架可以通过光刻物镜的壳体内的侧面开口移入到所述光刻物镜内。
该更换设备能够从光刻物镜中移走光学元件,并且能够将另一个与光刻物镜中的变化相特定匹配的光学元件再移入到光刻物镜内。通过这些措施,可以显著改善光刻物镜的成象性能,而对光刻物镜的结构没有任何妨碍。所需要的仅仅是光刻物镜的壳体中的侧面开口,其尺寸大小应使托架能够移入到壳体内。此时,托架能够在光刻物镜内非常准确地定位光学元件。
根据本发明的更换设备可以特别有利地用在包括多个光学元件的光刻物镜中。适用于该目的光刻物镜具有多个光学元件和至少一个用于安装在两个相邻光学元件之间的光学元件的更换设备,所述光学元件的更换设备具有托架,所述托架用于要被更换的光学元件,所述托架可以通过光刻物镜的壳体内的侧面开口移入到所述光刻物镜内。
以下,通过使用附图从原则上说明本发明的各种示例性实施例。
图1显示了具有多个光学元件和一更换设备的光刻物镜;
图2显示了从具有第一实施例的更换设备的图1沿I I-I I线的截面;
图3显示了具有加固元件的光学元件;
图4显示了更换设备的第二实施例;
图5显示了更换设备的第三实施例;
图6显示了光学元件的安装示意图;
图7显示了用于光刻物镜的壳体内的开口的密封件的第一实施例;
图8显示了用于光刻物镜的壳体内的开口的密封件的第二实施例;
图9显示了更换设备的第四实施例;以及
图10显示从图9按照箭头X看上去的视图。
图1显示了具有壳体1a的光刻物镜1,其中以本身已知的方式布置有多个光学元件2,如透镜、板或反射镜。在这种情况下,光学元件2在光刻物镜1中的布置应该被看作是纯示例性的。光刻物镜1可以适合任何类型的光刻,并且可以是在附图中未整体显示的曝光设备的一部分。使用所示的光刻物镜1,如下所述,能够更换光学元件2a,该光学元件2a被安装或保持在两个相邻光学元件2之间;所述两个相邻光学元件2优选地通过各自的支座3永久地安装在光刻物镜1内,并因此是不可更换的。在根据图2的剖面视图中可以观察到可更换的光学元件2a,其同样优选为透镜、板或反射镜,并且,其优选地位于光刻物镜1的光瞳区域内。因此,与其它光学元件2相比,可更换的光学元件2a可以设计成具有特别小的直径。然而,该可更换的光学元件2a可以位于安装在光刻物镜1内的两个相邻光学元件2之间的任何其它点处。
为了更换光学元件2a,提供了更换设备4,在图2中其也能被很好地观察到。更换设备4具有用于光学元件2a的托架5,其能够通过光刻物镜1的壳体1a内的侧面开口6移入光刻物镜1内。在本实施例中,非常简化地示出,开口6通过位于壳体1a的周边上的多个间隔元件7形成。如上所述,如果可更换的光学元件2a位于光刻物镜1的光瞳区域内,则,这就允许托架5具有相应较小的尺寸,并且由此也允许开口6具有相应较小的尺寸。优选是对称地布置间隔元件7,这是为了不会以不允许的方式破坏光刻物镜1的动力学行为。要被更换的光学元件2a的最大直径由三个间隔元件7确定。
为了更换或者改变光学元件2a,托架5穿过开口6移入光刻物镜1内,并且移走要被更换的光学元件2a。在托架5再次穿过开口6而离开光刻物镜1之后,可以在光刻物镜1外部将光学元件2a从托架5上取下。然后,在工具(未示出)的帮助下,在光刻物镜1外部将新的光学元件2a插入托架5内,并且托架5穿过开口6移入到光刻物镜1的壳体1a内。在各情况下,通过用“A”指示的箭头来表示托架5的移动。
新引入的光学元件2a已经提前按光刻物镜1内的要求而被准确地加工,并且能够补偿随光刻物镜1的使用时间而导致的成像误差。为了该目的而在光学元件2a上所采用的措施本身是已知的,因此不是本申请的一部分。将光学元件2a定位在光刻物镜1中后,托架5穿过开口6再次离开光刻物镜1。
图3显示了可更换的光学元件2a,其被连接至加固元件8。在图示实施例中为环状的加固元件8优选地主要由与可更换光学元件2a相同的光学材料构成,在本实施例中由SiO2构成;并且,该加固元件8用于加固该光学元件2a,尤其在传送光学元件2a的过程中对其进行加固。在柔性的光学元件2a的情况下,加固元件8是尤其有利的。当然,光学元件2a也可以由CaF2或其它适合的光学材料构成。
可以通过挤压(wringing)、粘结、焊接或以其它适合的方式进行加固元件8与可更换光学元件2a的连接。如果加固元件8不是由与光学元件2相同的光学材料构成,则其优选应具有与光学元件2a大约相同的热膨胀系数。如果不是上述两种情况之一,则可以经由固体联接装置(未示出)来提供加固元件8和光学元件2a之间的连接。此外,也可以将光学元件2a保持在其自己的支座内。
从图3中能进一步看到,托架5作用在光学元件2a和加固元件8两者上。当然,托架5也可以仅作用于加固元件8。
图4说明了更换设备4的第二实施例。同样,可更换光学元件2a布置在两个通过各自的支座3安装在光刻物镜1内的光学元件2之间。为了在光刻物镜1内保持并安装光学元件2a,利用了独立保持结构9,此时该保持结构9被放置于可更换光学元件2a下面的相邻光学元件2的支座3上。尽管没有示出,但是在该情况下光学元件2a也可以具有加固元件8。该独立保持结构9优选具有三个支架10,在图4中仅可以观察到其中的两个。就此而言,这是光学元件2a在光刻物镜1内的均衡安装(isostatic mounting)。此外,独立保持结构9具有多个致动器11,该致动器11能够调整光学元件2a,特别是在z方向上也就是在光刻物镜1的光轴方向上调整光学元件2a,也有可能使光学元件2a倾斜。在本实施例中,每一个支架10被分配给这些致动器11之一。当然,也可以仅提供一个致动器11,并且此外,也可能是在保持结构9中提供相应的操纵器来代替致动器11。
为了在更换光学元件2a之后以规定的方式将该光学元件2a保持并安装在光刻物镜1内,并且为了固定该光学元件2a,而提供了多个弹簧元件12,在本实施例中,该弹簧元件12被支承在可更换光学元件2a上方的光学元件2的支座3上。弹簧元件12可以通过设备(未示出)来控制,以便在光学元件2a安置于保持结构9上之后,将其压靠在保持结构9上,并且以该方式确保光学元件2a沿z方向(也就是说沿光刻物镜1的光轴方向)精确定位。如果适当,也可以仅提供一个弹簧元件12来作用于光学元件2a上。为了将光学元件2a安置在保持结构9上,托架5沿z方向的移动可能是必须的。因此,如同上述提及的支座一样,保持结构9用于在光刻物镜1的使用过程中将光学元件2a安装在光刻物镜内。
图4进一步揭示了壳体1a内的开口6可以被密封件13封闭。在根据图4的实施例中,该密封件13为固体材料的密封件或密封垫,稍后解释密封件13的各种实施例。在光刻物镜1的工作过程中密封件13优选保持在位,并且仅在为了让托架5可进出该开口6时而取下密封件13,以便更换光学元件2a。
在根据图5的更换设备4的实施例中,再次为可更换光学元件2a提供了加固元件8。以与图4实施例中相同的方式,此处也提供了保持结构9,并且其也被支承在位于可更换光学元件2a下面的光学元件2的支座3上。代替支架10,在该实施例中保持结构9具有支座14,该支座14安置在支座3上。当然,在该实施例中也可以有弹簧元件12或至少一个弹簧元件12作用于光学元件2a上。
在未示出的实施例中,可更换光学元件2a也可以直接安置在下面的光学元件2的支座3上。此时,利用真空吸附光学元件2a并从而进行相应的固定则是可能的。
图6显示了将光学元件2a安装在光刻物镜1的壳体1a内一种可能方式的原理。光学元件2a再次被提供有加固元件8,并且经由加固元件8、利用具有均衡安装效果的松配支承件15和固定支承件16相对于壳体1a来安装该光学元件2a。该松配支承件15和固定支承件16均可以由硬金属、硬化钢或宝石构成,例如由红宝石构成。
在图7中示出了用于密封壳体1a的开口6的密封件13的第一实施例。在该实施例中,提供了盖板17,其经由O形圈18相对于壳体1a被密封。以该方式防止了光刻物镜1的壳体1a的内部污染,同时确保了开口6的可进入性。代替固体材料密封件,也可以使用弹性密封垫或金属密封件或氟橡胶密封件。如果使用金属密封件,例如,其材料例如可以为铜。
根据图8的密封件13的实施例为气封件或气体动力限制器,其基于以下原理:利用光刻物镜1的壳体1a内的压力Pi,该压力Pi与壳体1a外的压力Pa相比是增加了,从而无气体物质或其它污染物可以穿透进入至壳体1a内。为此目的,也提供了盖板17,该盖板17固定在壳体1a的对面并带有细缝19,该细缝19的宽度约为1~10μm。为了防止污染物能够进入光刻物镜1的内部,仅仅必须注意壳体1a内部的压力Pi大于壳体1a外部压力Pa,并且,通过该方法,形成了从光刻物镜1的内部至外部的定向流。
图9和10显示了另一个用于更换光学元件2a的更换设备4的实施例。在该实施例中,更换设备4的托架5具有导向件20,该导向件20为两个侧面凹槽21的形式,光学元件2a的各个侧面突起22啮合到凹槽21内。然而,该侧面突起22并不是绝对必须的。在平板的情况下,光学元件2a可以利用其边缘在凹槽21内而被导向。在本实施例中,如图10所示,凹槽21和突起22是矩形的,但是也可以具有任何其它适合的横截面。光学元件2a进入托架5的运动受弹簧支承件23的限制,该弹簧支承件23与托架5的敞开侧上的固定支承件24一起确保了光学元件2a在托架5内的准确定位。同时,固定支承件24用作用于托架5的封盖。此时,凹槽21仅用于在更换过程中引导光学元件2a,而弹簧支承件23和固定支承件24决定了光学元件2a的位置。当然,当托架5位于光刻物镜1的内部时,为了关闭开口6,固定支承件24可以具有类似于密封件13的适当密封件。此外,提供了弹簧元件25,其类似于图4实施例中的弹簧元件12,确保了光学元件2a沿z方向的精确定位。
在该实施例中,规定托架5在运送过程中以及在光刻物镜1的工作过程中保持在光刻物镜1内,因此,除了能更换光学元件2a之外,也形成了用于光学元件2a的支座。如果适当,在其它实施例中,如果采取用于此目的适当措施,托架5也可以保留在光刻物镜1内。
以上描述的光刻物镜1可以为曝光设备的一部分,并且被用于制备如晶片的微结构部件。
Claims (18)
1、一种光刻物镜(1),其具有多个光学元件(2、2a)和至少一个更换设备(4),该更换设备用于安装在两个相邻光学元件(2)之间的光学元件(2a),所述更换设备具有用于要被更换的光学元件(2a)的托架(5),所述托架(5)可以通过光刻物镜的壳体(1a)内的侧面开口(6)移入到所述光刻物镜(1)内,其特征在于,
所述要被更换的光学元件(2a)通过均衡安装而被安装在光刻物镜(1)内;所述要被更换的光学元件(2a)被保持在光刻物镜(1)内的独立保持结构(9)上;并且所述独立保持结构(9)具有至少一个致动器(11)。
2、根据权利要求1的光刻物镜(1),其中,所述要被更换的光学元件(2a)被布置在两个不可更换的光学元件(2)之间。
3、根据权利要求1的光刻物镜(1),其中,所述要被更换的光学元件(2a)连接至加固元件(8)。
4、根据权利要求3的光刻物镜(1),其中,所述加固元件(8)基本上由与所述要被更换的光学元件(2a)相同的光学材料构成。
5、根据权利要求3的光刻物镜(1),其中,所述加固元件(8)通过挤压连接至所述要被更换的光学元件(2a)。
6、根据权利要求3的光刻物镜(1),其中,所述加固元件(8)通过粘结连接至所述要被更换的光学元件(2a)。
7、根据权利要求1的光刻物镜(1),其中,所述要被更换的光学元件(2a)被保持在支座(3)内。
8、根据权利要求1的光刻物镜(1),其中,所述要被更换的光学元件(2a)被安置在光刻物镜(1)内并位于一相邻光学元件(2)的支座(3)上。
9、根据权利要求1的光刻物镜(1),其中,所述保持结构(9)被保持在光刻物镜(1)内的支座(3)中。
10、根据权利要求1的光刻物镜(1),其中,在所述光刻物镜(1)内布置有至少一个弹簧元件(12、25),所述弹簧元件沿光轴方向作用于所述要被更换的光学元件(2a)上。
11、根据权利要求1的光刻物镜(1),其中,所述壳体(1a)内的开口(6)可被密封件(13)封闭。
12、根据权利要求11的光刻物镜(1),其中,所述密封件(13)为固体材料的密封件或密封垫。
13、根据权利要求11的光刻物镜(1),其中,所述密封件(13)为气封件。
14、根据权利要求1的光刻物镜(1),其中,所述托架(5)具有用于所述要被更换的光学元件(2a)的导向件(20)。
15、根据权利要求1的光刻物镜,其中,所述更换设备(4)布置在所述光刻物镜(1)的光瞳区域内。
16、根据权利要求1的光刻物镜,其中,在更换所述要被更换的光学元件(2a)之后,所述托架(5)保留在所述光刻物镜(1)内。
17、根据权利要求1的光刻物镜,其中,在更换所述要被更换的光学元件(2a)之后,所述托架(5)被从所述光刻物镜(1)内取出。
18、一种通过使用根据权利要求1的光刻物镜(1)制备微结构部件的方法。
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2004
- 2004-10-15 US US10/966,388 patent/US7265917B2/en active Active
- 2004-11-30 EP EP04820811A patent/EP1700167B1/en not_active Not-in-force
- 2004-11-30 AT AT04820811T patent/ATE405866T1/de not_active IP Right Cessation
- 2004-11-30 CN CN2009101618157A patent/CN101614967B/zh not_active Expired - Fee Related
- 2004-11-30 CN CNB2004800388971A patent/CN100545754C/zh not_active Expired - Fee Related
- 2004-11-30 WO PCT/EP2004/013576 patent/WO2005064404A1/en active IP Right Grant
- 2004-11-30 JP JP2006545958A patent/JP4750043B2/ja not_active Expired - Fee Related
- 2004-11-30 DE DE602004016048T patent/DE602004016048D1/de active Active
- 2004-11-30 KR KR1020067012405A patent/KR101116999B1/ko active IP Right Grant
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2007
- 2007-08-28 US US11/895,990 patent/US7515363B2/en not_active Expired - Fee Related
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2009
- 2009-03-10 US US12/400,965 patent/US7768723B2/en active Active
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2010
- 2010-07-06 US US12/830,913 patent/US7995296B2/en not_active Expired - Fee Related
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2011
- 2011-06-28 US US13/170,951 patent/US8488261B2/en active Active
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2014
- 2014-09-29 US US14/499,559 patent/US9081296B2/en not_active Expired - Fee Related
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Also Published As
Publication number | Publication date |
---|---|
US20160041475A1 (en) | 2016-02-11 |
KR20060111597A (ko) | 2006-10-27 |
US9081296B2 (en) | 2015-07-14 |
US7265917B2 (en) | 2007-09-04 |
US20100271716A1 (en) | 2010-10-28 |
DE602004016048D1 (de) | 2008-10-02 |
EP1700167A1 (en) | 2006-09-13 |
CN1898610A (zh) | 2007-01-17 |
US20150070789A1 (en) | 2015-03-12 |
JP4750043B2 (ja) | 2011-08-17 |
US20090168207A1 (en) | 2009-07-02 |
US7768723B2 (en) | 2010-08-03 |
US7995296B2 (en) | 2011-08-09 |
CN101614967A (zh) | 2009-12-30 |
US20070297074A1 (en) | 2007-12-27 |
WO2005064404A1 (en) | 2005-07-14 |
CN101614967B (zh) | 2011-11-30 |
US7515363B2 (en) | 2009-04-07 |
KR101116999B1 (ko) | 2012-03-15 |
EP1700167B1 (en) | 2008-08-20 |
US8902519B2 (en) | 2014-12-02 |
ATE405866T1 (de) | 2008-09-15 |
US20050134972A1 (en) | 2005-06-23 |
JP2007515797A (ja) | 2007-06-14 |
US20130279029A1 (en) | 2013-10-24 |
US20110255181A1 (en) | 2011-10-20 |
US8488261B2 (en) | 2013-07-16 |
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