CN100547116C - Be used for isolating etching solution of polycrystal '' carbon head material " silicon carbon and preparation method thereof - Google Patents
Be used for isolating etching solution of polycrystal '' carbon head material " silicon carbon and preparation method thereof Download PDFInfo
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- CN100547116C CN100547116C CNB2008100175829A CN200810017582A CN100547116C CN 100547116 C CN100547116 C CN 100547116C CN B2008100175829 A CNB2008100175829 A CN B2008100175829A CN 200810017582 A CN200810017582 A CN 200810017582A CN 100547116 C CN100547116 C CN 100547116C
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- carbon
- silicon
- hydrogen peroxide
- vitriol oil
- hydrofluoric acid
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- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 32
- 239000000463 material Substances 0.000 title claims abstract description 22
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 238000002360 preparation method Methods 0.000 title claims abstract description 7
- 238000005530 etching Methods 0.000 title claims description 18
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 32
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003921 oil Substances 0.000 claims abstract description 23
- 238000003756 stirring Methods 0.000 claims abstract description 15
- 239000011259 mixed solution Substances 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 4
- 239000000243 solution Substances 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- 239000010703 silicon Substances 0.000 abstract description 8
- 239000002994 raw material Substances 0.000 abstract description 5
- 229920005591 polysilicon Polymers 0.000 abstract description 4
- 239000012530 fluid Substances 0.000 abstract 1
- 239000002210 silicon-based material Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
The invention discloses a kind of isolating corrosive fluid of polycrystal '' carbon head material " silicon carbon and preparation method thereof that is used for, mix by following component by mass percentage and form: the electronic-grade vitriol oil 85%～97%, Manganse Dioxide 1%～5%, hydrogen peroxide 1%～5%, hydrofluoric acid 1%～5%, the total amount of each component are 100%.Get Manganse Dioxide 1%～5%, hydrogen peroxide 1%～5%, hydrofluoric acid 1%～5% and the electronic-grade vitriol oil 85%～97% by mass percentage respectively, the total amount of above-mentioned each component is 100%; Manganse Dioxide, hydrogen peroxide and the hydrofluoric acid of obtaining is mixed and fully stirring, form mixed solution; The mixed solution that obtains is repeatedly added in the vitriol oil on a small quantity, fully stir, promptly.Carbon in " carbon head material " thoroughly can be separated from polysilicon, obtain the high-purity polycrystalline material, alleviate the short supply state of silicon raw material.
Description
Technical field
The invention belongs to a kind of raw material treatment technology that is applied to sun power, semiconductor silicon material industry, be specifically related to a kind of isolating etching solution of polycrystal '' carbon head material " silicon carbon that is used for, the invention still further relates to the preparation method of this etching solution.
Background technology
Along with the development of electronics and information industry, in the world wide demand of semiconductor material is presented the gesture of significantly raising.To the heavy demand of semiconductor material and to the development requirement of new forms of energy such as solar cell, mean increase in demand, and the growth of silicon single crystal is to be based upon on the basis of polycrystalline silicon material to single crystal silicon material.
High-purity polycrystalline is to be added with on the basis of U-shaped high purity silicon core of Graphite Electrodes at two ends, grows up to through for a long time vapour deposition.After the polycrystalline silicon rod growth is finished, will have under two termination saws of Graphite Electrodes, the main body polycrystalline silicon rod of middle portion is the raw material that uses during the semiconductor monocrystal silicon rod is produced.Two terminations that Graphite Electrodes is arranged by under the saw are commonly called as " carbon head material ".Because silicon-carbon face face can not directly use in conjunction with closely, is used as waste disposal.
The rapid expansion of industry requirement makes the silicon raw material become very in short supply.In this case, the waste material behind the polycrystalline silicon growth-" carbon head material " becomes the focus of concern.Manually will not strike with the part that graphite directly contacts in " carbon head material ", through being used for drawing silicon single-crystal after the clean again, but because wherein the content of carbon is higher relatively, result of use be unsatisfactory.Because silicon and carbon belong to same gang in the periodic table of elements, a lot of similar physics, chemical property are arranged, therefore, silicon-carbon is separated in the technical certain difficulty that exists.
Summary of the invention
The purpose of this invention is to provide a kind of isolating etching solution of polycrystal '' carbon head material " silicon carbon that is used for, the silicon-carbon in " carbon head material " is separated, obtain to be used for the polycrystalline silicon material of monocrystalline silicon growing.
Another object of the present invention provides the preparation method of above-mentioned etching solution.
The technical solution adopted in the present invention is, a kind of isolating etching solution of polycrystal '' carbon head material " silicon carbon that is used for is mixed by following component by mass percentage and forms:
The electronic-grade vitriol oil 85%～97%;
Manganse Dioxide 1%～5%;
Hydrogen peroxide 1%～5%;
Hydrofluoric acid 1%～5%;
The total amount of above-mentioned each component is 100%.
Another technical scheme of the present invention is, the preparation method of above-mentioned etching solution carries out according to the following steps:
Step 1: get Manganse Dioxide 1%～5%, hydrogen peroxide 1%～5%, hydrofluoric acid 1%～5% and the electronic-grade vitriol oil 85%～97% by mass percentage respectively, the total amount of above-mentioned each component is 100%;
Step 2: will go up Manganse Dioxide, hydrogen peroxide and hydrofluoric acid that the step obtains and mix and fully stir, and form mixed solution;
Step 3: the mixed solution that step 2 is obtained repeatedly adds in the vitriol oil on a small quantity, fully stirs, promptly.
The invention has the beneficial effects as follows that use range is wide, carbon removal attached to polysilicon surface also can effectively can be removed the carbon that enters in the carbon silicon bonding surface, and not with silicon generation chemical reaction, guaranteed that loss does not take place silicon materials, alleviated the short supply state of polycrystalline silicon raw material.
Embodiment
The present invention is described in detail below in conjunction with embodiment.
Silicon-carbon release etch liquid of the present invention, mixed by following component by mass percentage and form: the electronic-grade vitriol oil (concentration is more than 98%) 85%～97%, Manganse Dioxide 1%～5%, hydrogen peroxide 1%～5%, hydrofluoric acid 1%～5%, the total amount of each component is 100%.
The effect of each component in the silicon-carbon release etch liquid of the present invention
Electronic-grade (concentration is more than the 98%) vitriol oil is the main component of etching solution of the present invention, the carbon generation chemical reaction in itself and the treating material, thus carbon is peeled off from silicon face, realize that the silicon-carbon of polysilicon " carbon head material " separates.
Etching solution of the present invention uses Manganse Dioxide as catalyzer, accelerates the speed of response of the vitriol oil and carbon.
Hydrogen peroxide as buffer reagent, is used for controlling the speed of response of the vitriol oil and carbon in etching solution of the present invention.
The vitriol oil contacts the back vigorous reaction takes place with carbon, in order to alleviate the reaction severe degree of the vitriol oil and carbon, this etching solution uses hydrofluoric acid as buffer reagent.
Silicon-carbon release etch liquid of the present invention, can adopt following steps to prepare:
Step 1: get Manganse Dioxide 1%～5%, hydrogen peroxide 1%～5%, hydrofluoric acid 1%～5% and the electronic-grade vitriol oil 85%～97% by mass percentage respectively, the total amount of above-mentioned each component is 100%;
Step 2: will go up Manganse Dioxide, hydrogen peroxide and hydrofluoric acid that the step obtains and mix and fully stir, and form mixed solution;
Step 3: the mixed solution that step 2 is obtained repeatedly adds in the vitriol oil on a small quantity, fully stirs, promptly.
The using method of silicon-carbon release etch liquid of the present invention:
1. manually polysilicon " carbon head material " is crushed to the fritter that diameter is 3cm～5cm;
2. according to quality of material to be processed,, prepare required etching solution in the ratio of quality of material and etching solution quality 4: 6;
3. the material that fragmentation is good slowly joins in the etching solution in batches, fully stirs simultaneously;
4. after corroding 24 hours, in etching solution, add entry, corrosion reaction stopped,
5. the carbon dust after water will corrode is rinsed well, obtains the polycrystalline silicon material behind the de-carbon.
Embodiment 1
Get 85 kilograms of (85%) electronic-grade vitriol oils (concentration is more than 98%) and pour container into, 5 kilograms of (5%) Manganse Dioxide, 5 kilograms of (5%) hydrogen peroxide are mixed mutually with 5 kilograms of (5%) hydrofluoric acid, fully stir, form mixed solution, repeatedly join this mixed solution in the vitriol oil on a small quantity and fully stirring, promptly.
Embodiment 2
Get 97 kilograms of (97%) electronic-grade vitriol oils (concentration is more than 98%) and pour container into, 1 kilogram of (1%) Manganse Dioxide, 1 kilogram of (1%) hydrogen peroxide are mixed mutually with 1 kilogram of (1%) hydrofluoric acid, fully stir, form mixed solution, repeatedly join this mixed solution in the vitriol oil on a small quantity and fully stirring, promptly.
Embodiment 3
Get 91 kilograms of (91%) electronic-grade vitriol oils and pour container into, 3 kilograms of (3%) Manganse Dioxide, 3 kilograms of (3%) hydrogen peroxide are mixed mutually with 3 kilograms of (3%) hydrofluoric acid, fully stir, form mixed solution, repeatedly join this mixed solution in the vitriol oil on a small quantity and fully stirring, promptly.
Experiment detects:
To with a kind of polycrystalline " carbon head material ", by the physics method that knocks out remove handle after, carbon content wherein 〉=5 * 10
17Atoms/m
3, its carbon content can not satisfy the technical requirement of solar power silicon material.After the etching solution that obtains with the embodiment of the invention 3 is handled, carbon content wherein≤1 * 10
17Atoms/m
3, its carbon content can satisfy the technical requirement of solar power silicon material.
Claims (2)
1. one kind is used for the isolating etching solution of polycrystal '' carbon head material " silicon carbon, is mixed by following component by mass percentage and forms:
The electronic-grade vitriol oil 85%～97%;
Manganse Dioxide 1%～5%;
Hydrogen peroxide 1%～5%;
Hydrofluoric acid 1%～5%;
The total amount of above-mentioned each component is 100%.
2. the preparation method of the described silicon-carbon release etch of claim 1 liquid is characterized in that this method is carried out according to the following steps:
Step 1: get Manganse Dioxide 1%～5%, hydrogen peroxide 1%～5%, hydrofluoric acid 1%～5% and the electronic-grade vitriol oil 85%～97% by mass percentage respectively, the total amount of above-mentioned each component is 100%;
Step 2: will go up Manganse Dioxide, hydrogen peroxide and hydrofluoric acid that the step obtains and mix and fully stir, and form mixed solution;
Step 3: the mixed solution that step 2 is obtained repeatedly adds in the vitriol oil on a small quantity, fully stirs, promptly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2008100175829A CN100547116C (en) | 2008-03-03 | 2008-03-03 | Be used for isolating etching solution of polycrystal '' carbon head material " silicon carbon and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2008100175829A CN100547116C (en) | 2008-03-03 | 2008-03-03 | Be used for isolating etching solution of polycrystal '' carbon head material " silicon carbon and preparation method thereof |
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| Publication Number | Publication Date |
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| CN101235501A CN101235501A (en) | 2008-08-06 |
| CN100547116C true CN100547116C (en) | 2009-10-07 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102041510A (en) * | 2010-06-09 | 2011-05-04 | 特变电工新疆硅业有限公司 | Method for removing carbons in polysilicon carbon head materials |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101481824B (en) * | 2008-12-31 | 2012-12-12 | 嘉兴嘉晶电子有限公司 | Method for cleaning polycrystal carbon head material |
| CN101974784A (en) * | 2010-09-03 | 2011-02-16 | 浙江开化同力电子科技有限公司 | Method for cleaning carbon head polycrystalline material |
| CN102320609B (en) * | 2011-08-11 | 2016-01-20 | 亚洲硅业（青海）有限公司 | A kind of physical separation method of Novel polycrystalline silicon carbon head material |
| CN102962224B (en) * | 2012-11-06 | 2014-11-12 | 安徽日能中天半导体发展有限公司 | Method for cleaning parent polycrystalline carbon head material |
| CN108249444B (en) * | 2018-01-09 | 2020-09-04 | 南通大学 | Native polysilicon carbon-silicon separation process and using device thereof |
| CN108847401B (en) * | 2018-07-12 | 2020-12-08 | 安徽强钢钢化玻璃股份有限公司 | Method for cleaning primary polycrystalline silicon material |
| CN114014323B (en) * | 2022-01-06 | 2022-03-15 | 南通友拓新能源科技有限公司 | High-temperature high-pressure carbon-silicon separation process and device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102041510A (en) * | 2010-06-09 | 2011-05-04 | 特变电工新疆硅业有限公司 | Method for removing carbons in polysilicon carbon head materials |
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Assignee: Ningxia LONGi Silicon Material Co.,Ltd. Assignor: Xi'an longI silicon materials Limited by Share Ltd|Xi'an longI Silicon Technology Co., Ltd.|Xi'an Ximei monocrystalline silicon Contract record no.: 2011610000018 Denomination of invention: Etching solution for polycrystal 'carbon head material' silicon carbon separation and preparation method thereof Granted publication date: 20091007 License type: Exclusive License Open date: 20080806 Record date: 20110328 |
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Effective date of registration: 20140905 Address after: 710100 Changan District, Shaanxi Province, aerospace Road, No. 388, No. Patentee after: Xi'an Longji-Silicon Co., LTD. Address before: 101 building, No. 3, electronic West Street, Shaanxi, Xi'an, 710065 Patentee before: Xi'an Longji-Silicon Co., LTD. Patentee before: Xian Longi Silicon Materials Corp. Patentee before: Xi'an Ximei Monocrystalline Silicon Co., Ltd. |
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Address after: 710100 Changan District, Shaanxi Province, aerospace Road, No. 388, No. Patentee after: Longji green energy Polytron Technologies Inc Address before: 710100 Changan District, Shaanxi Province, aerospace Road, No. 388, No. Patentee before: Xi'an Longji-Silicon Co., LTD. |
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