CN100555031C - Processing method for rendering transparent electrode on transparent substrate invisible - Google Patents
Processing method for rendering transparent electrode on transparent substrate invisible Download PDFInfo
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- CN100555031C CN100555031C CNB2006100809609A CN200610080960A CN100555031C CN 100555031 C CN100555031 C CN 100555031C CN B2006100809609 A CNB2006100809609 A CN B2006100809609A CN 200610080960 A CN200610080960 A CN 200610080960A CN 100555031 C CN100555031 C CN 100555031C
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Abstract
The present invention is a kind of processing method for rendering transparent electrode on transparent substrate invisible, be after laying many transparency electrodes on the transparency carrier, with the formed solution of a non-conductive nano material particle, be coated on this transparency carrier and these transparency electrodes, this nano material has the refractive index identical with this transparency electrode, subsequently this transparency carrier is carried out high-temperature heat treatment, behind one section heat treatment time, on this transparency carrier and these transparency electrodes, form a smooth and uniform shielding layer, so, by this shielding layer, can make the position of not laying these transparency electrodes on this transparency carrier light all be had identical refractive index, the problem that reduces with the picture image quality of effectively avoiding on this transparency carrier because of refractive index that difference was caused with the position of laying these transparency electrodes.
Description
Technical field
The present invention is relevant for a kind of processing method for rendering transparent electrode on transparent substrate invisible, especially refer to after laying many transparency electrodes on the transparent glass substrate, with the formed solution coat of a non-conductive nano material particle on this transparency carrier and these transparency electrodes, form a smooth and uniform shielding layer, so that the position of not laying these transparency electrodes on this transparency carrier and the position of laying these transparency electrodes have the disposal route of identical refractive index to light.
Background technology
In recent years, because advancing by leaps and bounds of each side technology, driven the flourish of every industry, wherein especially with at electronics, progress on the product such as information and communication is remarkable especially, not only more innovation on structure and function, the demand that on use and input mode, also more meets hommization, and the looks that present more diversification, the appearance of contact panel (Touch Panel), changed the input pattern of conditional electronic product, make the user no longer be confined to use traditional input media (for example: button or mouse) input data or control instruction, only need hommization input interface,, directly click function and the instruction that desire is carried out with finger or pointer etc. according to the icon on the picture by contact panel, almost completely need not any instruction and study, can finish the work that desire is carried out smoothly.Look into, contact panel at present on being widely used in personalized electronic product miscellaneous, for example: palm PC (Palm-Sized PC), PDA(Personal Digital Assistant), information household appliances (InformationAppliance) etc., also be widely used in the public information station of associated uses such as medical treatment, traffic, tourism and education, make the range of application and the market demand of contact panel, the trend of continuous expansion is arranged.
General speech, contact panel is to go up at a transparent glass substrate (Glass) to lay required transparent conductive film (ITO Film), form a transparent conducting glass (ITO Glass), arrange in pairs or groups again required winding displacement and circuit board, set control IC can press the position according to the user on the circuit board on this contact panel, start the corresponding steering order in this position, reach the purpose of directly importing data and instruction at this contact panel.Because, this kind contact panel now generally is installed on the various electronic product, as LCDs (liquid crystal display is called for short LCD), so the user can be by directly pressing this contact panel, input data and instruction, and do not need to install again other traditional input media (as: keyboard, mouse), so, can vacate the more work space, or bigger display panel is installed, make things convenient for the user to browse and input data.
By preceding taking off explanation as can be known, transparent conducting glass (ITO Glass) is the main member of contact panel, this transparent conducting glass mainly is that transparent glass substrate and transparency conducting layer constitute, it makes principle is on nonconducting this transparent glass substrate of script, plate the conductive transparent metal material of one deck, on this transparent glass substrate, to form this transparency conducting layer.General speech, the material of this transparency conducting layer is " tin indium oxide " (Indium Tin Oxide, be called for short ITO), and this transparency conducting layer is made up of many ito transparent electrodes that are laid in this transparent glass substrate, for more understanding the structure of this transparent conducting glass, special that its manufacture craft procedure declaration is as follows, see also shown in Figure 1:
Clean 101: before this transparent glass substrate is processed, need to clean the surface of this transparent glass substrate, dust that is attached to remove on it and particulate;
Plated film 102: the routine surface at this transparent glass substrate plates the indium oxide layer tin thin film;
Coating photoresistance (P/R) layer 103: utilize the roller printing, on this transparent glass substrate, be coated with side surface coating one deck photoresist of indium tin oxide films;
Pre-roasting 104: lentamente this transparent glass substrate is heated, finalized the design, so that carry out subsequent treatment with the photoresist layer that will be coated on this transparent glass substrate;
Exposure 105: shine the photoresist layer on this transparent glass substrate with quantitative ultraviolet (Ultraviolet is called for short UV), make this photoresist layer produce chemical change, cover a graph area and an exposure region and on this photoresist layer, produce one;
Develop 106: clean this exposure region with a developer solution, with the photoresist layer in this exposure region of flush away, so, this indium tin oxide films can expose;
Etching (Etching) 107: this indium tin oxide films that is exposed with this exposure region of chloroazotic acid flush away again;
Peel off (Stripping) 108: use an alkaline solution (to use KOH usually, be sodium hydroxid) this is covered graph area clean, make this this photoresist layer that covers on the graph area be dissolved in this alkaline solution, can on this transparent glass substrate, form these required I TO transparency electrodes;
Electric-examination (After Etching Inspect) 109: this transparent glass substrate is carried out the electrode inspection, if when finding between the ITO electrode short circuit phenomenon to be arranged, utilize a laser straightener that short dot is destroyed, promptly finish the making of this transparent conducting glass, can carry out subsequent treatment again to be assemblied in this contact panel.
But; when this transparent conducting glass is used as LCDs; the user is by the viewed display frame of this transparent conducting glass; tomography is often arranged; image fogization; show that situations such as granulating or resolution reduction take place; trace it to its cause; be each position of this transparent conducting glass to the ray refraction rate different due to; as shown in Figure 2; for taking off the transparent conducting glass 1 that flow process is made before complying with; this transparent conducting glass 1 by a transparent glass substrate 10 and on many ito transparent electrodes 12 laid formed; wherein this transparent glass substrate 10 is not provided with the part of these ito transparent electrodes 12; to the ray refraction rate between 1.4～1.5; 12 pairs of ray refraction rates of these ito transparent electrodes are then between 1.8～2.2; because both are different to the ray refraction rate; not only cause the viewed picture quality of user to be had a greatly reduced quality; and it is unclear that less icon and literal are thickened; and then can't successfully press correct pressing on the position for the user; to start the pairing steering order in this position, cause the user can't successfully import data or instruction.
Summary of the invention
The object of the present invention is to provide a kind of processing method for rendering transparent electrode on transparent substrate invisible, to improve the disappearance that known technology was produced.
The object of the present invention is achieved like this, a kind of processing method for rendering transparent electrode on transparent substrate invisible, this method is after laying many transparency electrodes on the transparency carrier, with the formed solution coat of a non-conductive nano material particle on this transparency carrier and these transparency electrodes, and this non-conductive nano material particle is identical with these transparency electrodes to the ray refraction rate, this transparency carrier is carried out high-temperature heat treatment, behind a heat treatment time, on this transparency carrier and these transparency electrodes, form a smooth and uniform shielding layer.
As mentioned above, the present invention is by the non-conductive nano material particle in this shielding layer, can make the position of not laying the position of these transparency electrodes and laying these transparency electrodes on this transparency carrier, light all had identical refractive index, can effectively avoid on this transparency carrier each position to ray refraction rate difference, problems such as the picture image bad that is caused.
Description of drawings
Fig. 1: the making process flow diagram of known transparent conducting glass;
Fig. 2: the synoptic diagram of known transparent conducting glass;
Fig. 3: the synoptic diagram of transparency carrier of the present invention;
Fig. 4: the making process flow diagram of transparency carrier of the present invention and shielding layer;
Fig. 5: one embodiment of the invention process flow diagram;
Fig. 6: another embodiment of the present invention process flow diagram.
Drawing reference numeral:
Transparency carrier ... 2
Transparency electrode ... 20
Shielding layer ... 21
Embodiment
The present invention is a kind of processing method for rendering transparent electrode on transparent substrate invisible, see also shown in Figure 3, this method is to lay many transparency electrodes 20 at a transparency carrier 2 earlier, again with the formed solution coat of a non-conductive nano material particle on this transparency carrier 2 and these transparency electrodes 20, this non-conductive nano material particle is identical with these transparency electrodes 20 to the ray refraction rate, subsequently, this transparency carrier 2 is carried out high-temperature heat treatment, behind a heat treatment time, promptly on this transparency carrier 2 and these transparency electrodes 20, form a smooth and uniform shielding layer 21, so, by this non-conductive nano material particle in this shielding layer 21, can make the position of not laying the position of these transparency electrodes 20 and laying these transparency electrodes 20 on this transparency carrier 2, light all had identical refractive index, each position that can effectively avoid this transparency carrier 2 is to ray refraction rate difference, problems such as the picture image bad that is caused.
Disposal route of the present invention is to be applied on the transparency carrier 2 of laying many transparency electrodes 20, sees also shown in Figure 4ly, comprises the following steps:
401: will have the formed solution of a non-conductive nano material particle of the refractive index identical, and be coated on equably on this transparency carrier 2 and these transparency electrodes 20 with these transparency electrodes 20;
402: this transparency carrier 2 is carried out high-temperature heat treatment, behind one section heat treatment time, on this transparency carrier 2 and these transparency electrodes 20, form a smooth and uniform shielding layer 21.
In one embodiment of this invention, see also shown in Figure 5ly, this method is coated on this transparency carrier 2 and these transparency electrodes 20 and goes forward should the formed solution of non-conductive nano material particle, needs carry out following processing to this non-conductive nano material particle:
501: should be added in the solvent by non-conductive nano material particle;
502: a spreading agent is added in this solvent;
503: with ultrasound wave this solvent is handled, this non-conductive nano material particle must be evenly dispersed in this solvent, to form this solution, so, this non-conductive nano material particle begins to be coated on equably on this transparency carrier 2 and the transparency electrode 20.
In this embodiment; see also shown in Figure 3 again; this non-conductive nano material particle can be a kind of non-conductive nano particle of ray refraction rate between 1.8～2.2; this non-conductive nano material particle can be antimony oxide (Sb2O3); chromium oxide (Cr2O3); indium oxide (In2O3); tantalum oxide (Ta2O3); titanium dioxide (TiO2) or zirconia material or its potpourris such as (ZrO2); and the size of this nano particle is between between 10～100nm; so; when this nano particle is coated on this transparency carrier 2 and these transparency electrodes 20 when forming a smooth and uniform shielding layer 21 equably; this nano particle will make position of not laying these transparency electrodes 20 on this transparency carrier 2 and the position of laying these transparency electrodes 20; the ray refraction rate is all maintained 1.8～2.2, the image fogization of effectively having avoided known transparent conducting glass ray refraction rate difference to be produced because of each position; show many disappearances such as granulating or resolution reduction.
In this embodiment, after this spreading agent is added into this solvent, before with ultrasound wave this solvent being handled, can add a solid again in this solvent, this solid can be a silicone compounds, and this solvent can be ethanol, so, through after the ultrasonic Treatment, can form solution with this tin-antimony oxide nano particle, when the formed solution coat of this nano particle after on this transparency carrier 2 and these transparency electrodes 20, to this transparency carrier 2 through at least 30 minutes, and the high-temperature heat treatment of temperature between between 100～200 degree Celsius can form smooth on this transparency carrier 2 and these transparency electrodes 20 and this shielding layer 21 uniformly, and the nano particle that makes this tin-antimony oxide is equably attached on this transparency carrier 2 and the transparency electrode 20.
In another embodiment of the present invention, see also shown in Figure 6ly, this method comprises the following steps: when making the formed solution of this non-conductive nano material particle
601: oxygen alkane metallic compound is added in the solvent, and this solvent is stirred;
602: again a gel reaction catalyzer is added in this solvent;
603: this solvent is carried out the Low Temperature Heat Treatment of temperature between between 50～80 degree Celsius, after the required reaction time, promptly form the solution that contains this oxygen alkane metallic compound nano particle equably through solgel reaction (sol-gel).
In this another embodiment; see also shown in Figure 3 again; the nano particle of this oxygen alkane metallic compound to the ray refraction rate between 1.8～2.2; its material can be four oxygen butane group titaniums (Ti (OCH2CH2CH2CH3) 4); so; when the nano particle of this oxygen alkane metallic compound is coated on when forming a smooth and uniform shielding layer 21 on this transparency carrier 2 and these transparency electrodes 20 equably; the nano particle of this oxygen alkane metallic compound will make position of not laying these transparency electrodes 20 on this transparency carrier 2 and the position of laying these transparency electrodes 20; the ray refraction rate is all maintained 1.8～2.2, the image fog of effectively having avoided known transparent conducting glass ray refraction rate difference to be produced because of each position; color distortion; show disappearances such as granulating or resolution reduction.
In this another embodiment, this solvent can be ethyl acetone (acetylacetone), and this gel reaction catalyzer can be nitric acid and water, after this solvent was through at least 60 minutes solgel reaction, can form solution with this oxygen alkane metallic compound nano particle, and it can be coated on this transparency carrier 2 and the transparency electrode 20, when this transparency carrier 2 through at least 60 minutes, and temperature is after the high-temperature heat treatment between 200～300 degree Celsius, promptly on this transparency carrier 2 and these transparency electrodes 20, form smooth and this shielding layer 21 uniformly, make this oxygen alkane metallic compound nano particle equably attached on this transparency carrier 2 and the transparency electrode 20.
By method of the present invention, not only can eliminate 20 harmful effects that etching line caused of this transparency carrier 2 and these transparency electrodes, and can effectively avoid this transparency carrier 2 to lay the position of these transparency electrodes 20 and the position of not laying these transparency electrodes 20, cause is to ray refraction rate difference, the problem of the picture image bad that is produced.
Though the present invention discloses with specific embodiment; but it is not in order to limit the present invention; any those skilled in the art; the displacement of the equivalent assemblies of under the prerequisite that does not break away from design of the present invention and scope, having done; or, all should still belong to the category that this patent is contained according to equivalent variations and modification that scope of patent protection of the present invention is done.
Claims (11)
1. processing method for rendering transparent electrode on transparent substrate invisible, this method is applied on the transparency carrier that is laid with many transparency electrodes, it is characterized in that comprising the following steps:
The formed solution coat of one non-conductive nano material particle that will have the refractive index identical with these transparency electrodes is on this transparency carrier and these transparency electrodes;
This transparency carrier is carried out the high-temperature heat treatment of temperature between between 100～200 degree Celsius, behind one section heat treatment time, on this transparency carrier and these transparency electrodes, form a smooth and uniform shielding layer.
2. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 1 is characterized in that: with this solution coat before this transparency carrier and these transparency electrodes, still comprise the following steps:
Should be added in the solvent by non-conductive nano material particle;
One spreading agent is added in this solvent;
With ultrasound wave this solvent is handled, should be evenly dispersed in this solvent by non-conductive nano material particle, to form this solution.
3. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 2 is characterized in that: after this spreading agent is added into this solvent, and before ultrasound wave handles this solvent, add a solid in this solvent.
4. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 3, it is characterized in that: this non-conductive nano material particle refractive index is between 1.8～2.2, and be antimony oxide, chromium oxide, indium oxide, tantalum oxide, titanium dioxide or zirconia material, or described mixtures of material.
5. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 4 is characterized in that: this solid is a silicone compounds.
6. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 5 is characterized in that: this solvent is an ethanolic solution.
7. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 6 is characterized in that: the size of this non-conductive nano material particle is between between 10～100nm.
8. processing method for rendering transparent electrode on transparent substrate invisible, this method is applied on the transparency carrier that is laid with many transparency electrodes, it is characterized in that comprising the following steps:
The formed solution coat of one non-conductive nano material particle that will have the refractive index identical with these transparency electrodes is on this transparency carrier and these transparency electrodes;
This transparency carrier is carried out the high-temperature heat treatment of temperature between between 200～300 degree Celsius, behind one section heat treatment time, on this transparency carrier and these transparency electrodes, form a smooth and uniform shielding layer; This method comprises the following steps: before this solution is coated with
Oxygen alkane metallic compound is added in the solvent, and this solvent is stirred;
One gel reaction catalyzer is added in this solvent;
This solvent is carried out the Low Temperature Heat Treatment of temperature between between 50～80 degree Celsius, promptly form solution through the reaction time with this non-conductive nano material particle.
9. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 8 is characterized in that: this oxygen alkane metallic compound is four oxygen butane group titaniums.
10. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 9 is characterized in that: this solvent is the ethyl acetone solvent.
11. processing method for rendering transparent electrode on transparent substrate invisible as claimed in claim 10 is characterized in that: this gel reaction catalyzer is nitric acid and water.
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2006100809609A CN100555031C (en) | 2006-05-23 | 2006-05-23 | Processing method for rendering transparent electrode on transparent substrate invisible |
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2006100809609A CN100555031C (en) | 2006-05-23 | 2006-05-23 | Processing method for rendering transparent electrode on transparent substrate invisible |
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| CN101078820A CN101078820A (en) | 2007-11-28 |
| CN100555031C true CN100555031C (en) | 2009-10-28 |
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Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5484891B2 (en) * | 2009-03-04 | 2014-05-07 | 株式会社ジャパンディスプレイ | Display device |
| CN102236457A (en) * | 2010-04-28 | 2011-11-09 | 友发科技股份有限公司 | Touch element |
| CN102736764B (en) * | 2011-04-04 | 2015-08-12 | 宸鸿科技(厦门)有限公司 | Contact panel and manufacture method thereof |
| CN103294291B (en) * | 2012-03-05 | 2016-09-07 | 宸鸿科技(厦门)有限公司 | Trackpad |
| CN103258596B (en) * | 2013-04-27 | 2016-12-28 | 苏州诺菲纳米科技有限公司 | The image method that disappears of conductive film |
| CN103870072A (en) * | 2012-12-17 | 2014-06-18 | 比亚迪股份有限公司 | Capacitive touch screen and production method thereof |
| CN103871546B (en) * | 2012-12-18 | 2017-12-12 | 赛恩倍吉科技顾问（深圳）有限公司 | Transparent conductive substrate and its manufacture method |
| CN104076992A (en) * | 2013-03-27 | 2014-10-01 | 群创光电股份有限公司 | Touch element and electronic device |
| CN104521005B (en) * | 2013-04-05 | 2016-08-24 | 苏州诺菲纳米科技有限公司 | Transparency conductive electrode, their structure with fused metal nano wire design and manufacture method |
| US9368248B2 (en) | 2013-04-05 | 2016-06-14 | Nuovo Film, Inc. | Transparent conductive electrodes comprising metal nanowires, their structure design, and method of making such structures |
| CN104571721B (en) * | 2015-02-17 | 2018-11-23 | 合肥鑫晟光电科技有限公司 | A kind of transparent conductive oxide pattern blanking structure, touch panel and display device |
| CN104699309B (en) * | 2015-03-31 | 2017-06-13 | 合肥京东方光电科技有限公司 | A kind of touch-screen, its preparation method and display device |
| CN104699310A (en) * | 2015-03-31 | 2015-06-10 | 合肥京东方光电科技有限公司 | Touch screen and manufacturing method thereof |
| CN109814756A (en) * | 2019-01-29 | 2019-05-28 | 晟光科技股份有限公司 | A kind of middle control touch screen and its manufacture craft for vehicle |
| CN109990977B (en) * | 2019-03-29 | 2020-11-24 | 中国科学院近代物理研究所 | Refractive index matching fluid |
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