CN100595251C - Water-based diamond polishing liquid and its production - Google Patents
Water-based diamond polishing liquid and its production Download PDFInfo
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- CN100595251C CN100595251C CN200510030024A CN200510030024A CN100595251C CN 100595251 C CN100595251 C CN 100595251C CN 200510030024 A CN200510030024 A CN 200510030024A CN 200510030024 A CN200510030024 A CN 200510030024A CN 100595251 C CN100595251 C CN 100595251C
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- diadust
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Abstract
A water-based diamond polishing liquid and its production are disclosed. The polishing liquid consists of diamond fine 0.001-10 proportion, dispersing agent 0.02-4 proportion, suspending agent 0.01-5proportion, suspending auxiliary 0.01-1 proportion, pH regulator 0.1-1.5 proportion, antiseptics 0.1-0.5 proportion and deionized water 60-99 proportion. The sediment value can be 0. It has good quality and excellent stability.
Description
Technical field
The present invention relates to a kind of polishing fluid that is used to grind, polish the manufacture field use, relate to a kind of water-based diamond polishing liquid and preparation method thereof in particular.
Background technology
The diadust profile of high rigidity is sphere or elliposoidal, is used for grinding and polishing and can scratch by grinding element, is widely used in different polishing manufacture fields, particularly precise polished manufacture field.Diadust can be made the polishing material of paste, aerosol, water-based or oily liquid, and wherein water-based diamond polishing liquid has characteristics such as environmental protection, non-corrosiveness, cost are lower, polishing efficiency height, has obtained increasing application in each field.But diadust is than great, and free settling and final precipitation fully in water can cause in the course of processing diadust content in the polishing fluid inconsistent, have a strong impact on quality of finish and polishing efficiency.Reported a kind of water-base nano diamond polishing liquid for addressing this problem Chinese patent publication number CN1560161A, the suspending stabilized performance of this water-based diamond polishing liquid is better, diadust free settling not in water, but it is narrower that its used diamond median size is defined in the 20-100nm scope, then do not relate to for micron-sized diadust.
Summary of the invention
Technical problem to be solved by this invention provides all water-based diamond polishing liquids and preparation method thereof of stable suspersion applicatory of a kind of nanometer and micron order diadust.
Technical scheme of the present invention: a kind of water-based diamond polishing liquid, form by the component of following parts by weight:
Special diadust 0.001-10 part
Dispersion agent 0.02-4 part
Suspension agent 0.01-5 part
Suspension aids 0.01-1 part
PH regulator agent 0.1-1.5 part
Sanitas 0.1-0.5 part
Deionized water 60-99 part
Described special diadust makes through the following step: a. is that the diadust of 20-2000nm slowly joins concentration greater than ultrasonic in 96% the vitriol oil or shear and be uniformly dispersed with median size; B. with more than the mixture heating up to 200 of the diadust and the vitriol oil ℃ and kept at least one hour, stop heating then, naturally cool to room temperature, centrifugation goes out the diadust in the mixture; C. above-mentioned diadust washing is extremely neutral with resistivity greater than the deionized water of 5M Ω .cm; D. will put into temperature smaller or equal to 105 ℃ oven for drying moisture through the diadust of washing, promptly make described special diadust.
Described dispersion agent is selected from one or more the mixture in alkyl polyoxyethylene ether, Sorbitol Powder alkylide, alkyl aryl sulfonate, alkyl, polyether sulfuric ester, sodium alkyl sulfonate, ammonium salt, polyvinyl alcohol, Sodium hexametaphosphate 99, sodium phosphate, sodium polyphosphate, the silicate.
Described suspension agent is selected from precipitated silica, gas-phase silica, lithium bentonite, the mixture of one or more in the water-soluble cellulose derivative.
Described water-soluble cellulose derivative is selected from one or more the mixture in alkylcellulose, hydroxy alkyl cellulose, the carboxymethyl cellulose.
Described suspension aids is selected from one or more the mixture in methyl alcohol, ethanol, propylene carbonate, ethylene glycol, quadrol, polyoxyethylene glycol, the glycerine.
Described sanitas is selected from one or more the mixture in isothiazolinone derivatives, aminated compounds, the substituted arene.
The method of described water-based diamond polishing liquid comprises the following steps (all substances are in parts by weight): dispersion agent 0.02-4 part, suspension agent 0.01-5 part, suspension aids 0.01-1 part, sanitas 0.1-0.5 part, deionized water 60-99 part are mixed; Add special diadust 0.001-10 part in mixture, ultrasonic or shearing is uniformly dispersed; In mixture, add pH regulator agent 0.1-1.5 part at last, adjust pH value to 3～11 of solution, can make described polishing fluid.
Beneficial effect of the present invention: the present invention handles diadust by the vitriol oil, improve the content of diadust surface polarity group greatly, use the suspension agent that can form network structures during polishing fluid is filled a prescription, make diadust energy suspension steady in a long-term in the gained polishing fluid with these polar groups.The water-based diamond polishing liquid quality product unanimity of the present invention's preparation, good stability.With reference to the measuring method of ASTMD1309 and coating sedimentation value, the sedimentation value of the water-based diamond polishing liquid of the present invention's preparation can be 0.
Embodiment
Of the present invention describing in further detail: a kind of water-based diamond polishing liquid, form by the component of following parts by weight:
Special diadust 0.001-10 part
Dispersion agent 0.02-4 part
Suspension agent 0.01-5 part
Suspension aids 0.01-1 part
PH regulator agent 0.1-1.5 part
Sanitas 0.1-0.5 part
Deionized water 60-99 part
Described special diadust makes through the following step: a. is that the diadust of 20-2000nm slowly joins concentration greater than ultrasonic in 96% the vitriol oil or shear and be uniformly dispersed with median size; B. with more than the mixture heating up to 200 of the diadust and the vitriol oil ℃ and kept at least one hour, stop heating then, naturally cool to room temperature, centrifugation goes out the diadust in the mixture; C. above-mentioned diadust washing is extremely neutral with resistivity greater than the deionized water of 5M Ω .cm; D. will put into temperature smaller or equal to 105 ℃ oven for drying moisture through the diadust of washing, promptly make described special diadust.
Described dispersion agent is selected from one or more the mixture in alkyl polyoxyethylene ether, Sorbitol Powder alkylide, alkyl aryl sulfonate, alkyl, polyether sulfuric ester, sodium alkyl sulfonate, ammonium salt, polyvinyl alcohol, Povidone, Sodium hexametaphosphate 99, sodium phosphate, sodium polyphosphate, the silicate.Described suspension agent is selected from precipitated silica, gas-phase silica, lithium bentonite, the mixture of one or more in the water-soluble cellulose derivative.Described water-soluble cellulose derivative is selected from one or more the mixture in alkylcellulose, hydroxy alkyl cellulose, the carboxymethyl cellulose.Described suspension aids is selected from one or more the mixture in methyl alcohol, ethanol, propylene carbonate, ethylene glycol, quadrol, polyoxyethylene glycol, the glycerine.Described sanitas is selected from one or more the mixture in isothiazolinone derivatives, aminated compounds, the substituted arene.Described PH conditioning agent can be an acid regulator, as one or more the mixture in the organic and mineral acid, can be alkaline conditioner as, the mixture of one or more in basic metal or alkaline earth metal oxide, basic metal or alkaline earth metal hydroxides, ammonia, the organic amine.
The method of described water-based diamond polishing liquid comprises the following steps (all substances are in parts by weight): dispersion agent 0.02-4 part, suspension agent 0.01-5 part, suspension aids 0.01-1 part, sanitas 0.1-0.5 part, deionized water 60-99 part are mixed; Add special diadust 0.001-10 part in mixture, ultrasonic or shearing is uniformly dispersed; In mixture, add pH regulator agent 0.1-1.5 part at last, adjust pH value to 3～11 of solution, can make described polishing fluid.
The suspension stability of the polishing fluid of the inventive method preparation, measuring method with reference to ASTM D1309 and coating sedimentation value, measure as follows: in the graduated cylinder of 100ml cleaning, add the polishing fluid that 100ml prepares, according to 20 ℃ 6 hours again 70 ℃ 6 hours be one-period, experience 56 cycles altogether, after just 28 days, read the milliliter number of the graduated cylinder top stillness of night, be sedimentation value.This value is big more, illustrates that suspension is poor more, and this value is more little, illustrates that suspension is good more, further specifies by the following examples.
Embodiment 1: the diadust of particle size range 1000-2000nm is joined in 98% the vitriol oil, ultra-sonic dispersion is heated to 200 ℃ and be incubated 2 hours, and cooling back centrifugation is washed till neutrality with deionized water, 105 ℃ of dry for standby.With 0.2 part of Sodium hexametaphosphate 99,0.5 part of lithium bentonite, 0.2 part of methyl alcohol, Skane M-8 sterilant (Rohm﹠amp; Haas company product) 0.1 part, 97 parts of mixings of deionized water add 2 parts of the diadusts of oven dry, ultra-sonic dispersion, and regulating pH value with yellow soda ash is 10, must diamond content is 2% polishing fluid.
The sedimentation value of measuring above-mentioned polishing fluid is 9.
Embodiment 2: Heating temperature is brought up to 300 ℃, and other is with embodiment 1.
The sedimentation value of measuring above-mentioned polishing fluid is 7.
Embodiment 3: with the diadust of particle size range 500-1000nm, its treatment process is with embodiment 1.With sodium laurylsulfonate 0.5 parts, V-15 gas-phase silica (Wacker company product) 0.5 parts, ethylene glycol 0.01 part, Skane M-8 sterilant 0.1 part, 96 parts of mixings of deionized water add 3 parts of the diadusts of oven dry, ultra-sonic dispersion, and regulating pH value with trolamine is 9, must diamond content is 3% polishing fluid.
The sedimentation value of measuring above-mentioned polishing fluid is 5.
Embodiment 4: with embodiment 3, V-15 is changed to N-20 (Wacker company product).
The sedimentation value of measuring above-mentioned polishing fluid is 4.
Embodiment 5: with embodiment 4, be the powder of 200-500nm with the bortz powder particle diameter.
The sedimentation value of measuring above-mentioned polishing fluid is 0.
Embodiment 6: with embodiment 3, be the powder of 20-200nm with the bortz powder particle diameter.
The sedimentation value of measuring above-mentioned polishing fluid is 0.
Embodiment 7: the diadust of particle size range 1000-2000nm is joined in 98% the vitriol oil, ultra-sonic dispersion is heated to 250 ℃ and be incubated 3 hours, and cooling back centrifugation is washed till neutrality with deionized water, 105 ℃ of dry for standby.With polyoxyethylene nonylphenol ether 0.5 parts, M-5 gas-phase silica (Carbot company product) 0.4 parts, Natvosol C.2 parts, ethylene glycol 0.01 part, SkaneM-8 sterilant 0.1 part, 97 parts of mixings of deionized water add 2 parts of the diadusts of oven dry, ultra-sonic dispersion, and regulating pH value with diethanolamine is 9, must diamond content is 2% polishing fluid.
The sedimentation value of measuring above-mentioned polishing fluid is 0.
Above said content only is the basic explanation of the present invention under conceiving, and according to any equivalent transformation that technical scheme of the present invention is done, all should belong to protection scope of the present invention.
Claims (4)
1. water-based diamond polishing liquid, form by the component of following parts by weight:
Special diadust 0.001-10 part
Dispersion agent 0.02-4 part
Suspension agent 0.01-5 part
Suspension aids 0.01-1 part
PH regulator agent 0.1-1.5 part
Sanitas 0.1-0.5 part
Deionized water 60-99 part
Described special diadust makes through the following step: a. is that the diadust of 500-2000nm slowly joins concentration greater than ultrasonic in 96% the vitriol oil or shear and be uniformly dispersed with median size; B. with more than the mixture heating up to 200 of the diadust and the vitriol oil ℃ and kept at least one hour, stop heating then, naturally cool to room temperature, centrifugation goes out the diadust in the mixture; C. above-mentioned diadust washing is extremely neutral with resistivity greater than the deionized water of 5M Ω .cm; D. will put into temperature smaller or equal to 105 ℃ oven for drying moisture through the diadust of washing, promptly make described special diadust.
2. according to the described water-based diamond polishing liquid of claim 1, it is characterized in that: described dispersion agent is selected from one or more the mixture in alkyl polyoxyethylene ether, Sorbitol Powder alkylide, alkyl aryl sulfonate, alkyl, polyether sulfuric ester, sodium alkyl sulfonate, ammonium salt, polyvinyl alcohol, Povidone, Sodium hexametaphosphate 99, sodium phosphate, sodium polyphosphate, the silicate.
3. according to the described water-based diamond polishing liquid of claim 1, it is characterized in that: described suspension agent is selected from precipitated silica, gas-phase silica, lithium bentonite, the mixture of one or more in the water-soluble cellulose derivative, described water-soluble cellulose derivative are selected from one or more the mixture in alkylcellulose, hydroxy alkyl cellulose, the carboxymethyl cellulose.
4. according to the described water-based diamond polishing liquid of claim 1, it is characterized in that: described suspension aids is selected from one or more the mixture in methyl alcohol, ethanol, propylene carbonate, ethylene glycol, quadrol, polyoxyethylene glycol, the glycerine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN200510030024A CN100595251C (en) | 2005-09-27 | 2005-09-27 | Water-based diamond polishing liquid and its production |
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| CN200510030024A CN100595251C (en) | 2005-09-27 | 2005-09-27 | Water-based diamond polishing liquid and its production |
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| CN1940003A CN1940003A (en) | 2007-04-04 |
| CN100595251C true CN100595251C (en) | 2010-03-24 |
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Families Citing this family (22)
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| CN101671525B (en) * | 2009-09-01 | 2013-04-10 | 湖南皓志新材料股份有限公司 | Method for improving suspension property of rare earth polishing powder |
| CN102391789B (en) * | 2011-08-19 | 2013-10-16 | 湖南皓志新材料股份有限公司 | Method for preparing nano diamond polishing solution |
| CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
| CN104293205A (en) * | 2013-07-16 | 2015-01-21 | 鸿富锦精密工业（深圳）有限公司 | Water-based diamond polishing solution and preparation method thereof |
| CN103525314B (en) * | 2013-10-30 | 2014-12-10 | 湖北三翔超硬材料有限公司 | High-efficiency diamond lubricating cooling polishing solution and preparation method and application thereof |
| CN104275651A (en) * | 2014-09-26 | 2015-01-14 | 河南省联合磨料磨具有限公司 | Diamond polishing film production method |
| CN104479555B (en) * | 2014-11-12 | 2016-10-05 | 诺轩化学科技（上海）有限公司 | Rare earth polishing and preparation method thereof |
| CN104592935B (en) * | 2015-01-04 | 2016-04-27 | 江苏中晶科技有限公司 | Mechanically resistant material grinding accelerator |
| CN106479371A (en) * | 2016-08-15 | 2017-03-08 | 惠州市米特仑科技有限公司 | A kind of high precision composite polishing liquid and preparation method thereof |
| CN108219678B (en) * | 2016-12-21 | 2020-09-04 | 蓝思科技（长沙）有限公司 | Diamond grinding fluid and preparation method thereof |
| CN107717636A (en) * | 2017-09-12 | 2018-02-23 | 潘汉祥 | A kind of novel metal high speed polishing method |
| CN109593472A (en) * | 2017-09-30 | 2019-04-09 | 优尔材料工业（深圳）有限公司 | Diamond polishing liquid and preparation method thereof |
| CN107892878A (en) * | 2017-10-30 | 2018-04-10 | 阮传华 | A kind of diamond polishing liquid and preparation method thereof |
| CN109575813A (en) * | 2018-08-10 | 2019-04-05 | 优尔材料工业（深圳）有限公司 | Micro-nano diamond polishing liquid and preparation method thereof |
| CN108864947A (en) * | 2018-08-17 | 2018-11-23 | 成都天成鑫钻纳米科技股份有限公司 | A kind of nano diamond polishing liquid and preparation method thereof |
| CN111777987B (en) * | 2020-07-29 | 2021-06-22 | 中国科学院兰州化学物理研究所 | Grinding suspending agent, preparation method and application thereof, and grinding agent |
| CN112251146B (en) * | 2020-10-20 | 2021-08-24 | 德阳展源新材料科技有限公司 | Preparation method of diamond polishing solution |
| CN114437633A (en) * | 2020-11-03 | 2022-05-06 | 天津金相检测科技有限公司 | Special polishing agent for coal rock and preparation method thereof |
| CN113621346B (en) * | 2021-07-29 | 2022-04-12 | 浙江奥首材料科技有限公司 | Suspension auxiliary agent applied to large-size silicon wafer grinding, preparation method and application thereof |
| CN113977930B (en) * | 2021-11-11 | 2023-08-22 | 贵州航越科技有限公司 | Preparation method of shell containing built-in pipeline |
| CN114231251A (en) * | 2021-12-27 | 2022-03-25 | 河南联合精密材料股份有限公司 | Diamond grinding fluid for coarse grinding of silicon carbide wafer and preparation method thereof |
| CN116083053A (en) * | 2023-02-08 | 2023-05-09 | 南京理工大学 | Preparation method of diamond grinding fluid |
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