CN101262942B - 含一种或更多种吸气剂材料的沉积物和输送h2o的材料层的吸气剂体系 - Google Patents
含一种或更多种吸气剂材料的沉积物和输送h2o的材料层的吸气剂体系 Download PDFInfo
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- CN101262942B CN101262942B CN2006800258727A CN200680025872A CN101262942B CN 101262942 B CN101262942 B CN 101262942B CN 2006800258727 A CN2006800258727 A CN 2006800258727A CN 200680025872 A CN200680025872 A CN 200680025872A CN 101262942 B CN101262942 B CN 101262942B
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Abstract
公开了由一种或更多种吸气剂材料的沉积物组成的吸气剂体系,其中至少一种所述沉积物与具有H2O输送性能的材料层接触。
Description
本发明涉及含一种或更多种吸气剂材料的沉积物的吸气剂体系,其中至少一种所述沉积物与具有H2O输送性能的材料层接触。
工业上,吸气剂材料和体系广泛用于其中需要通过吸收痕量非所需气体来维持真空或控制气体氛围组成的所有应用上。
在工业生产中广泛使用的吸气剂材料是一些金属,例如钛、锆、铌、钒或铪或其合金(和尤其锆-和钛-基合金),它们可用于吸收小分子,例如氢气、氧气、水、碳的氧化物,和在一些情况下吸收氮气。然而,这些材料具有要求相对高温度的限制(通常高于300℃)以活化吸气剂的功能,这使得它们不适合于在一些器件,例如包括有机材料的那些器件内使用。
其中不可能求助于热活化的应用实例是例如在专利US4444821、US5505810和US5885682中所述的用聚合物泡沫体填充的绝热面板,或者例如在专利US5882761中所述的OLED屏幕。
吸气剂材料的另一尤其感兴趣的应用是在微电子机械体系(本领域中更好地简称为MEMS)中,尤其参考由透明元件制造的含与外部环境具有界面的那些MEMS,作为实例提及DMD(获自Digital microMirror Device)。
仅仅在相对低温下要求热活化的吸气剂材料(它与使用电致发光有机材料的多层(本领域中称为OLED),形成屏幕的有源元件的电致发光的有机材料相容)当中,可提及一些多孔材料,例如通常尤其用于吸收有机物质的活性炭,或用于吸收小尺寸的气体分子的沸石、二氧化硅或氧化铝;不要求热活化的材料是具体地吸收湿气的无水化学干燥剂,例如碱土金属氧化物,或一些吸湿盐,例如氯化物(例如氯化钙CaCl2)、高氯酸盐(例如高氯酸镁Mg(ClO4)2)或硫酸盐(例如,硫酸钙 CaSO4)。
由于这一应用的重要性,为了简化本发明的吸气剂体系的使用,尤其要参考在OLED中使用,但本发明的吸气剂体系用于一般的应用,且也可用于其中通常使用以上提及的金属和金属合金的应用中。
排列在OLED屏幕内的有机多层元件对痕量气体,尤其对可导致两种不同类型降解现象的湿气的存在非常敏感:
-由于随着时间流逝,亮度衰减,导致屏幕寿命下降,这一现象与造成降解的气体杂质的含量有关,所述气体杂质存在于有机材料的多层附近。通过能触发有机材料降解不可逆现象的这种气体杂质浓度引起这类现象;
-倾向于亮度在空间上不均匀;这一现象与杂质浓度的不均匀有关,尤其强调主要经粘合剂渗透的H2O的浓度分布的不均匀度,所述粘合剂用于密封OLED空腔。这一现象当可在相对短的时间内出现时,尤其是不知不觉加剧的(insidious),和避免其开始的唯一方式是保证空腔内H2O的浓度尽可能均匀、
能解决与OLED屏幕内部存在的气体杂质有关的问题的技术解决方法因此与电致发光有机材料多层相一致的是保证低含量的H2O和其浓度尽可能均匀。
尚未发现OLED屏幕满意的技术解决方法。例如,在专利US6833668B1中,公开了含吸气剂材料的树脂用于密封OLED空腔的用途。然而,这一解决方法不能保证H2O的浓度均匀。
在专利申请WO2005/050736中描述了另一方法,它公开了将吸气剂组合物粘合到电子器件内表面上的方式,其中吸气剂为在合适的粘合剂和液体介质内分散的颗粒形式。
在专利申请JP2004-186043中公开了另一不同的解决方法,其中使用沿着屏幕的活性表面的整个外周边缘使用吸气剂材料的分配沉积物,由此产生对杂质的进入起到阻挡作用的一种吸气剂材料框;在这一情况下,还不可能保证与有机多层相一致地均匀的H2O浓度。相对于边缘,这一浓度事实上不可避免地高于器件中心处。
另一已知的解决方法是在专利申请US2004/0201447A1中公开的方法,其中图1图示了大多数一般的实施方案。OLED屏幕10由底部基底11、在基底11表面上形成的电致发光活性多层12,和通过隔板 15、15`与底部基底相连的透明正面面板13;底部基底11、正面面板13和隔板15、15`确定内部空腔14。正面面板13在它的内表面上具有用H2O吸收剂16制造的涂层,以便除去成功地在内腔14内扩散的杂质。所述吸收剂16是透明的,因为它必须能将电致发光有机多层12产生的光辐射经正面面板13发射到外侧。
为了在附图中不引入无用的复杂度,用简单的长方形作为电致发光的有机多层12的举例,即使它由元件的组件组成,其中在所述元件的组件当中,第一系列的电极、有机多层和第二系列的电极按序层叠。这一技术解决方法潜在地能解决与H2O和O2渗透有关的前述问题,具有在有机多层附近处排列的杂质的吸收剂,和所述吸收材料层具有比有机多层12的沉积物大的延伸范围。前面所示的技术解决方法的主要问题是通过与待吸收的气体反应,吸气剂材料通常经历结构和形态的修正,例如溶胀,在干燥剂的情况下,所述修正尤其可能突出;此外,气体吸收的结果是,吸气剂材料或者含它的整个体系可能经历其他非所需的修正,例如透明度的损失。
因此,本发明的目的是提供能克服在现有技术中仍然存在的问题的吸气剂体系,和第一方面是含下述物质的吸气剂体系:
-一种或更多种吸气剂材料的沉积物,其中至少一种包括能吸收H2O的吸气剂,和
-输送H2O的透明材料层,所述透明材料层与至少一种所述吸气剂沉积物接触排列,所述吸气剂沉积物包括能吸收H2O的吸气剂。
在本发明的第二方面中,本发明由用于OLED的屏幕的吸气剂体系组成,所述吸气剂体系包括:
-一种或更多种吸气剂材料的沉积物,其中至少一种包括能吸收H2O的吸气剂,它相对于电致发光的有机多层的沉积物在侧面排列;和
在所述电致发光的有机多层正面排列的用于输送H2O的透明材料层,所述透明材料层的面积具有不小于所述电致发光有机多层的沉积物面积且与至少一种含能吸收H2O的吸气剂的所述吸气剂沉积物接触排列。
存在于OLED屏幕内部的具有H2O输送功能的透明材料层的排列提供吸气剂材料更宽的选择,事实上,不需要它们透明,因为前面所述的排列将切断这种材料与从屏幕中发射的辐射线的光学路径。
以下参考下述附图描述本发明,其中:
-图1示出了含现有技术的吸气剂体系的OLED的截面视图;
-图2示出了含根据本发明制造的吸气剂体系的OLED的截面视图;
-图3示出了根据本发明制造的含具有最大容量的吸气剂体系的OLED的截面视图;
-图4示出了利用H2O的表面输送机理,含根据本发明制造的吸气剂体系的OLED的截面视图;
-图5示出了含根据本发明制造的吸气剂体系的OLED的截面视图,所述吸气剂体系将最大化吸气剂材料和输送层之间的交换;
-图6示出了利用H2O的表面输送机理,含根据本发明制造的吸气剂体系的OLED的截面视图,所述吸气剂体系将最小化它的体积与厚度;
-图7示出了含根据本发明制造的吸气剂体系的MEMS的截面视图;
-图8示出了利用H2O的表面输送机理,含根据本发明制造的吸气剂体系的OLED的截面视图。
附图中所示的各种元件的尺寸和尺寸比例不是正确的,和尤其一些元件的厚度被大大地放大,以便使附图更加容易被说明。
图1示出了根据现有技术的OLED的吸气剂体系和它如前所述。
本发明的吸气剂体系不同于现有技术的那些在于在屏幕的空腔内,在对水敏感的元件(电致发光有机多层)附近,存在具有捕获H2O的特定功能并输送H2O到吸气剂材料上以供其吸收的材料。
这便于解决就现有技术的解决方法而言仍然存在的问题,关于本发明,使用两种组分:通过吸收降低气体杂质浓度的特定职责的吸气剂,和面积等于或大于所述电致发光有机多层的材料层,所述材料层 的功能是接收(take)在有机多层附近存在的气相内的水并将其输送到吸气剂材料上。这一层便于在屏幕内部获得均匀的H2O浓度。
吸气剂材料和输送材料之间的接触点,或者更精确地接触面是其中H2O从输送材料转移到吸气剂材料的区域。
适合于实施本发明的吸气剂材料可以是具有能除去所有有害气体杂质,例如H2O、H2、O2、烃、N2、CO、CO2的材料,或者它可使用材料的混合物,其中每一种材料能吸收一种或更多种有害的气体化合物。在任何情况下,至少一部分吸气剂沉积物必须含有能除去H2O并使其与该相同材料输送层接触的材料。
这类解决方法的优点是根据需求调节吸气剂材料的沉积物的组成。可采用对不同气体物种敏感的各种材料生产OLED屏幕和MEMS,其中取决于器件的类型,可选择用于沉积的最好吸气剂组成。
此外,吸气剂材料必须实现除去杂质的唯一功能且还不涉及在有机多层附近H2O的均匀分布的事实允许相对于有机多层,将该材料置于侧面,因此不干扰所发射的光的辐射。这便于较宽地选择可用的材料,因为不需要吸气剂材料当吸收杂质时具有并及时维持透明度特征。
因此,可在具体地吸收水或氧气或烃或一氧化碳或二氧化碳或氮气或氢气及其同位素或其他有害污染物的那些材料当中选择在周边位置排列的吸气剂。
在可用于吸收水的吸气剂当中,我们提及沸石、二氧化硅或氧化铝、碱金属的氧化物、碱土金属的氧化物、镍、锌和镉的氧化物,一些吸湿盐,例如氯化物(例如氯化钙CaCl2)、高氯酸盐(例如高氯酸镁Mg(ClO4)2)或硫酸盐(例如,硫酸钙CaSO4),在路易斯或布朗斯台德酸或碱性催化剂存在下的各种有机化合物,例如环氧化物、具有双键或三键的有机分子、形成碳阳离子的化合物、酸酐、醇盐和酰卤。
在可用于吸收氧气的吸气剂当中,我们提及容易氧化的金属,例如碱金属、碱土金属或其他金属,例如铁、锡和铜、低氧化态的金属氧化物,例如锰和铜的氧化物,具有亚磷酸盐或亚膦酸盐阴离子的盐,和容易氧化的有机化合物,例如酚类、仲芳胺、硫醚和醛类。
在可用于吸收烃的吸气剂当中,我们提及沸石和活性炭。
在可用于吸收一氧化碳的吸气剂当中,我们提及一些金属,例如镍和铁,在锂基有机金属化合物存在下的一些有机化合物,例如链烯烃、胺和酮。
在可用于吸收二氧化碳的吸收剂当中,我们提及碱金属或碱土金属的氢氧化物。
在可用于吸收氮气的吸气剂当中,我们提及锂、钡、BaLi4化合物和卟啉。
在可用于吸收氢气及其同位素的吸气剂当中,我们提及钯、氧化钯、钇、钛、锆,和钛或锆与钒、铁、钼、铝、铬、钨、铌、镍和锰的合金。
就必须实现输送H2O的任务的层来说,具有在输送机理上不同的两种可能的类型:
-进行H2O的表面输送的层;
-吸收H2O并进行H2O的本体输送的层。
就H2O的表面输送的层来说,它们基于在气相内存在的H2O分子键合并允许它们在层表面上朝吸气剂移动的原理而工作。这些层在表面上键合水的效率取决于构成该层的材料的粘附可能性和取决于表面的亲水行为。材料的粘附可能性s代表在存在于气相内的水分子撞击所述材料表面的情况下,它键合到相同表面上的机率,s>0.1被视为高的粘附可能性。粘附可能性通常取决于表面的化学性质,而且还取决于表面的结构,尤其取决于表面的粗糙度。高的粘附可能性对应于高的粗糙度(0.05微米的Ra被视为高的粗糙度)。粘附可能性越高,则材料的亲水性越强,H2O的吸收越高。
当在表面和水之间建立的分散力和极性力增加时,表面的亲水行为和粘附可能性通常增加。尤其当表面能与水形成氢键时,表面的亲水行为也高,而且是高出其它所有的值。因此,一般地,在表面处暴露含氧和/或氮和/或硫和/或磷,尤其-OH、-SH、-SO、-PO基的极性基团的所有材料必须视为是合适的。亲水行为通常转化成给定的表面 能。水的表面能等于72mN/m。材料的表面能越接近于水的表面能,则这一表面的亲水行为越强。表面能高于45mN/m的表面被视为具有强的亲水行为的表面。
在可用作表面输送元件的材料当中,存在所有亲水聚合物材料(以例如通过旋涂,厚度低于约10nm的薄膜形状层铺;在这一情况下,水分子的输送基本上是表面类型,这是因为这一薄膜不具有本体),亦即聚丙烯酸酯和聚甲基丙烯酸酯、聚醚酰亚胺(PEI)、聚酰胺(PA)、乙酸纤维素(CA)、三乙酸纤维素(TCA)、聚硅氧烷(也称为硅氧烷树脂)、聚乙烯醇(PVAL)、聚环氧乙烷(PEO)、聚乙二醇(PEG)、聚丙二醇(PPG)、聚乙酸乙烯酯(PVAC)、聚甲醛(POM)、聚(乙烯乙烯醇)共聚物(EVAL,EVOH)、聚(酰胺-环氧乙烷)共聚物(PA-PEO)、聚(氨酯-环氧乙烷)共聚物(PUR-PEO)、聚(乙烯-乙酸乙烯酯)共聚物(EVA,EVAC)。
可用于生产表面输送元件的其他亲水材料是通过溶胶-凝胶技术或者通过喷火热解并以薄膜(厚度≤1000nm)形式沉积,例如通过筛网印刷技术而制备的纳米尺寸的氧化物(平均粒度d=1÷200nm)。可用于这一目的的氧化物是In2O3、ZnO、SnO2、TiO2、WO3及其混合物。
也可通过UV辐照或者通过离子轰击产生表面粗糙度、悬挂键和晶格空穴,从而处理纳米尺寸颗粒的沉积物。也可在氧气或水蒸气存在下进行UV辐照和离子轰击,或者可将事先处理过的表面成功地暴露于氧气或水下。
可在除了在光发射现象中是元件活性的聚合物多层以外的OLED空腔的表面上沉积H2O的表面输送层,例如以上所述的那些;为了方便起见,优选沿着它们输送H2O到其上的吸气剂材料,沉积这些层在器件的透明窗上,其中透明层可直接面对所述多层,而吸气剂材料相对于所述输送层在侧面布置。
除了固有地具有亲水行为的以上所述的材料以外,还可使用通常不被视为亲水或者被称为疏水的许多其他聚合物材料,条件是对它们进行合适的处理,所述处理将改变其表面性能,从而使得后者亲水。疏水材料是其表面能<30mN/m的那些材料,例如PTFE(表面能 =18mN/m)。使疏水材料的表面性能变为亲水的处理例如是在火焰中、在电晕放电中或者在等离子体中,在氧气或水蒸气存在下的氧化处理;通过离子轰击进行的蚀刻处理(例如,氩气,0.5÷5keV能量,1×1012 ÷1×1018离子/cm2剂量)也是有效的。所有这些处理决定聚合物材料表面的腐蚀(且粗糙度和粘附可能性增加)、产生悬挂键(表面不饱和度)并形成-O和-OH基,这是因为在处理过程中存在氧或水。
可在这一情况下使用的聚合物例如是聚乙烯(PE)、聚丙烯(PP)、聚碳酸酯(PC)、聚甲基丙烯酸甲酯(PMMA)、聚苯乙烯(PS)、聚对苯二甲酸乙二酯(PET)、聚四氟乙烯(PTFE)和聚酰亚胺(PI)。
在这一情况下,聚合物层的总厚度可相对高,例如高于1000nm,而亲水表面的厚度通常为仅仅数个单层,因此在纳米范围内。
后一种类的H2O的表面输送材料可位于器件的透明窗上,而且还直接粘合到在光发射中具有活性的有机多层上,条件是使得亲水的输送层的表面是不与有机多层接触的表面。
在替代的实施方案中,按照这一方式制造朝吸气剂输送水的层,使得所述在构成该层的材料本体内发生所述输送。
对于给定量的形成该层的材料(通过在OLED或MEMS正面基底上沉积的平行六面体的厚度、长度和宽度来测定)来说,材料的溶解度S越高,H2O的吸收越高。
对于给定几何形状的层来说,它能输送水时的速度与它由其制造的材料的扩散系数D成正比。
由于材料的渗透率P定义为P=S×D,因此可确定生产传质元件的优选材料为渗透率高于1×10-12(m(STP) 3·m2/bar·m3·s)(m(STP) 3表示在标准温度和压力下测量的气体的立方米)的那些材料。对水强烈地可渗透的材料也是所述的强亲水材料。
生产这一层的优选材料是聚合物类型的材料。在可用的可能聚合物材料当中以及在其制造工艺当中,必须优选允许获得聚合物介质的最大自由体积、聚合物链的最大有序和规则度、最小交联度、最小堆积密度和与渗透物种最大相互作用的那些。
生产水的本体输送层的优选材料是前面生产表面输送层所列举的那些相同的亲水聚合物材料;然而,在这一情况下,该层的特征厚度高于在表面输送层的情况,典型地范围为数百或数千纳米。
图2示出了根据本发明,用于OLED20的吸气剂体系的第一实施方案。相对于当讨论图1时也已经描述的现有技术的元件(在图1、图2中相同的数字和随后的附图表示相同的元件),区别在于相对于有机多层12(它排列在底部基底11的表面上),吸气剂材料26、26`的沉积物排列在正面基底13的内表面上的侧面位置内。此外,吸气剂的沉积物与具有吸收和传输杂质性能的透明材料层27相连。
透明层与吸气剂材料之间交换杂质的表面用层27和吸气剂沉积物26、26`之间的接触面表示。这类几何形状适合于在它们内部输送H2O的透明层(本体输送)。
图3示出了尤其令人感兴趣的变通方案;在这一情况下,用于0LED30的吸气剂体系包括在上部基底13内部部分延伸且与透明层37相连的吸气剂沉积物36、36`。当希望增加体系的吸气剂容量时,这类解决方法尤其有用,所述吸气剂的容量明显地与空腔14内包括的具有吸气作用的材料用量有关。当使用本体输送层时,这一几何形状也是尤其合适的。
关于图2和3所示以及前面描述的那些,存在一些可能的变通方案,这些变通方案决不以任何方式改变体系的目的或功能;尤其可存在两种吸气剂沉积物之一,或者吸气剂沉积物可由相同材料或不同材料制成,在后一情况下,可通过能仅仅吸收H2O的材料与能吸附所有其他杂质的其他材料形成沉积物。
如图4所示的用于OLED40的吸气剂体系所示,输送层和吸气剂材料的高度也可以不同,尤其在这一情况下,输送层47的厚度相对于吸气剂材料46、46`的沉积物的厚度显著低。在根据表面输送机理起作用的层47中,优选这类解决方法。
图5示出了用于OLED50的吸气剂体系的截面,它最大化接触面并进而在H2O输送层27和吸气剂材料56、56`的沉积物之间交换。在材 料内部本体输送H2O的情况下,这类实施方案是优选的实施方案。
图6示出了另一OLED60,对于其中根据表面输送机理,通过层67输送水到吸气剂材料66、66`的沉积物的情况来说,该吸气剂体系的结构令人感兴趣;所示的结构使得最小化吸气剂体系的体积与厚度。
用于OLED屏幕所示的各种结构也可用于图7所示的MEMS70的情况。此外,在这一情况下,存在通过由元件75、75`相互密封的两个基底71、73确定的空腔74,其中包括对气体杂质的存在敏感和尤其对H2O的存在敏感的活性元件72;例如它可以是与DMD的情况一样的一系列的反射微镜。
与OLED的情况不同,上部基底73的仅仅一部分78是透明的。类似于图2所示的情况,相对于活性元件和透明窗,吸气剂材料76、76`的沉积物在上部基底侧面上,和所述沉积物通过输送H2O的材料层77相连。
图3-6所示的有关OLED的所有考虑因素和结构可应用到MEMS的情况上。
最后,图8示出了适合于在OLED80中使用的根据本发明的吸气剂体系的另一可能的布局。在这一情况下,通过与输送层87接触的吸气剂沉积物86、86`形成吸气剂体系,所述输送层由疏水材料制成,其中处理面向空腔14的所述疏水材料表面,以便使得它亲水。在这一情况下,沿着层87的表面并朝沉积物86、86`发生水的输送,而层87的本体起到阻挡作用,防止空腔14内存在的水分子渗透到有机多层12内。
Claims (22)
1.一种吸气剂体系,它包括:一种或更多种吸气剂材料的沉积物,其中至少一种包括能吸收H2O的吸气剂,和输送H2O的透明材料层,所述透明材料层与至少一种所述吸气剂沉积物接触排列,所述吸气剂沉积物包括能吸收H2O的吸气剂,其中所述透明材料选自:聚丙烯酸酯和聚甲基丙烯酸酯、聚醚酰亚胺(PEI)、聚酰胺(PA)、乙酸纤维素(CA)、三乙酸纤维素(TCA)、聚硅氧烷、聚乙烯醇(PVAL)、聚环氧乙烷(PEO)、聚乙二醇(PEG)、聚丙二醇(PPG)、聚乙酸乙烯酯(PVAC)、聚甲醛(POM)、聚(乙烯乙烯醇)共聚物(EVAL,EVOH)、聚(酰胺-环氧乙烷)共聚物(PA-PEO)、聚(氨酯-环氧乙烷)共聚物(PUR-PEO)、聚(乙烯-乙酸乙烯酯)共聚物(EVA,EVAC)、纳米尺寸的氧化物;或是已经历过表面处理的疏水聚合物,所述疏水聚合物选自聚乙烯(PE)、聚丙烯(PP)、聚碳酸酯(PC)、聚甲基丙烯酸甲酯(PMMA)、聚苯乙烯(PS)、聚对苯二甲酸乙二酯(PET)、聚四氟乙烯(PTFE)和聚酰亚胺(PI)。
2.权利要求1的吸气剂体系,其中能吸收H2O的所述吸气剂选自沸石、二氧化硅、氧化铝、碱金属的氧化物、碱土金属的氧化物、镍、锌和镉的氧化物、氯化物、高氯酸盐、硫酸盐,在路易斯酸或布朗斯台德酸或碱性催化剂存在下的环氧化物、具有双键或三键的有机分子,形成碳阳离子的化合物、酸酐、醇盐和酰卤。
3.权利要求1的吸气剂体系,其中至少一种所述吸气剂沉积物包括用于氧气的吸气剂。
4.权利要求3的吸气剂体系,其中用于氧气的吸气剂选自碱金属、碱土金属或铁、锡和铜,锰和铜的氧化物,具有亚磷酸盐或亚膦酸盐阴离子的盐,酚、仲芳胺、硫醚和醛。
5.权利要求1的吸气剂体系,其中至少一种所述吸气剂沉积物包括用于烃的吸气剂。
6.权利要求5的吸气剂体系,其中用于烃的吸气剂选自沸石或活性炭。
7.权利要求1的吸气剂体系,其中至少一种所述吸气剂沉积物包括用于CO的吸气剂。
8.权利要求7的吸气剂体系,其中用于CO的吸气剂选自镍、铁,在锂基有机金属化合物存在下的链烯烃、胺和酮。
9.权利要求1的吸气剂体系,其中至少一种所述吸气剂沉积物包括用于CO2的吸气剂。
10.权利要求9的吸气剂体系,其中用于CO2的吸气剂选自碱金属或碱土金属的氢氧化物。
11.权利要求1的吸气剂体系,其中至少一种所述吸气剂沉积物包括用于H2的吸气剂。
12.权利要求11的吸气剂体系,其中用于H2的吸气剂选自钯、氧化钯、钇、钛、锆,和钛或锆与钒、铁、钼、铝、铬、钨、铌、镍和锰的合金。
13.权利要求1的吸气剂体系,其中至少一种所述吸气剂沉积物包括用于N2的吸气剂。
14.权利要求13的吸气剂体系,其中用于N2的吸气剂选自锂、钡、BaLi4化合物和卟啉。
15.权利要求1的吸气剂体系,其中所述用于输送H2O的透明材料层根据表面输送机理输送H2O。
16.权利要求15的吸气剂体系,其中所述层的厚度低于10nm。
17.权利要求15的吸气剂体系,其中所述透明材料选自经历过表面处理的疏水聚合物,所述表面处理选自火焰氧化处理、电晕放电氧化处理、在氧气或水蒸气存在下等离子体氧化处理,和通过离子轰击蚀刻处理。
18.权利要求1的吸气剂体系,其中所述纳米尺寸的氧化物选自In2O3、ZnO、SnO2、TiO2、WO3及其混合物。
19.权利要求1的吸气剂体系,其中通过UV辐射或离子轰击处理所述纳米尺寸的氧化物。
20.权利要求1的吸气剂体系,其中所述用于输送H20的透明材料层根据本体输送机理输送H2O。
21.一种OLED屏幕(20,30,40,50,60,80),它包括权利要求1的吸气剂体系,其中一种或更多种吸气剂材料的沉积物(26,26`;36,36`;46,46`;56,56`;66,66`;86,86`)相对于电致发光有机多层(12)在侧面排列,其中所述吸气剂材料的沉积物中的至少一种包括能吸收H2O的吸气剂;和输送H2O的透明材料层(27;37;47;57;67;87)在所述电致发光有机多层的正面排列,所述透明材料层的面积不小于所述电致发光有机多层的面积且与至少一种含能吸收H2O的吸气剂的所述吸气剂沉积物接触排列。
22.一种MEMS(70),包括权利要求1的吸气剂体系,其中一种或更多种吸气剂材料的沉积物(76,76`)相对于活性元件(72)在侧面排列,其中所述吸气剂材料的沉积物中的至少一种包括能吸收H2O的吸气剂;和输送H2O的透明材料层(77)在所述活性元件的正面排列,所述透明材料层的面积不小于所述活性元件的面积且与至少一种含能吸收H2O的吸气剂的所述吸气剂沉积物接触排列。
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ITMI2005A001502 | 2005-07-29 | ||
ITMI20051502 ITMI20051502A1 (it) | 2005-07-29 | 2005-07-29 | Sistemi getter comprendenti uno o piu' depositi di materiale getter ed uno strato di materiale per il trasporto di h02o |
PCT/IT2006/000546 WO2007013120A1 (en) | 2005-07-29 | 2006-07-19 | Getter systems comprising one or more deposits of getter material and a layer of material for the transport of h2o |
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US (1) | US8911862B2 (zh) |
EP (1) | EP1912732B1 (zh) |
JP (2) | JP2009503780A (zh) |
KR (1) | KR100979320B1 (zh) |
CN (1) | CN101262942B (zh) |
IT (1) | ITMI20051502A1 (zh) |
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US20080226902A1 (en) | 2008-09-18 |
RU2389545C2 (ru) | 2010-05-20 |
US8911862B2 (en) | 2014-12-16 |
JP2012061462A (ja) | 2012-03-29 |
TW200723939A (en) | 2007-06-16 |
JP2009503780A (ja) | 2009-01-29 |
ITMI20051502A1 (it) | 2007-01-30 |
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