CN102445861A - Photoetching machine system with position triggered scanning mode and method thereof - Google Patents

Photoetching machine system with position triggered scanning mode and method thereof Download PDF

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Publication number
CN102445861A
CN102445861A CN201110406938XA CN201110406938A CN102445861A CN 102445861 A CN102445861 A CN 102445861A CN 201110406938X A CN201110406938X A CN 201110406938XA CN 201110406938 A CN201110406938 A CN 201110406938A CN 102445861 A CN102445861 A CN 102445861A
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China
Prior art keywords
spatial light
light modulator
mobile platform
precise mobile
substrate
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CN201110406938XA
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Chinese (zh)
Inventor
朱亮
毕娟
赵美云
方林
李显杰
刘文海
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HEFEI ADVANTOOLS SEMICONDUCTOR CO Ltd
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HEFEI ADVANTOOLS SEMICONDUCTOR CO Ltd
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Priority to CN201110406938XA priority Critical patent/CN102445861A/en
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Abstract

The invention discloses a method for realizing a position triggered scanning mode in a photoetching machine system. The method comprises the steps of: after passing through an optical light collecting system, light emitted by an exposure light source is sent into a spatial light modulator, and is reflected to an optical beam splitter by the spatial light modulator, and after projection by the optical beam splitter, the light is then projected to the substrate of a precise mobile platform through a lens or lens group; after reflection by the beam splitter, the reflected light on the substrate is reflected to a CCD (charge coupled device) camera by a reflector, and the CCD camera transmits collected graphic information to a computer; the computer controls and treats the precise mobile platform, the spatial light modulator and graph collection of the CCD camera. Under the precondition of not affecting the exposure quality of the photoetching machine, the method provided in the invention can rapidly realize superposition exposure of a graph on the substrate of the precise mobile platform. And employment of a photoetching machine system with the position triggered scanning mode can ensure rapid increase of production power, lower the energy of an exposure light source and reduce cost.

Description

A kind of litho machine system and method for location triggered scan mode
Technical field
The present invention relates to the semicon industry technical field of lithography, relate to precise motion control system, imaging system and exposure system, mainly is a kind of write-through scanning photoetching machine system that realizes the location triggered scan mode.
Background technology
Photoetching technique is to be used for the composition that printing has characteristic on substrate surface.Such substrate can comprise be used for producing the semiconductor devices, the chip of multiple integrated circuit, flat-panel screens (for example LCD), circuit board, biochip, micromechanics electronic chip, photoelectron circuit chip etc.
For the printed circuit board (PCB) manufacture field, the especially manufacturing of high precision HDI plate and base plate for packaging realizes image transfer device wherein most crucial part beyond doubt.Printed circuit board (PCB) (PCB) image transfer device has two big types at present: traditional projection exposure equipment and laser direct imaging equipment (LDI).Traditional projection exposure equipment at first is printed on figure on the film egative film, through projection film egative film with figure transfer to photosensitive dry film, this equipment has increased the operation that figure is printed on film egative film, has increased to produce this; Other one type is laser direct-writing formula exposure sources, and laser beam is passed through the direct scanning imagery of spatial light modulator on photosensitive dry film with exposure figure.
Laser direct imaging equipment (LDI) is because its unique technique advantage has obtained significant progress in recent years.The index of weighing LDI equipment most critical is the quality of production capacity and figure, so how high production capacity, high-quality completion graph exposure become most important.
Summary of the invention
The litho machine system that the purpose of this invention is to provide a kind of location triggered scan mode, existing imaging device production capacity is slow to solve, the problem a little less than the exposure energy.
In order to achieve the above object, the technical scheme that the present invention adopted is:
Realize the method for location triggered scan mode in the litho machine system; Include projection module; Said projection module comprises exposure light source, spatial light modulator, is installed on the substrate on the precise mobile platform, and said precise mobile platform connects motor, and the optical light-collecting system is installed between said exposure light source, the spatial light modulator; It is characterized in that: the beam splitter and lens or the lens combination that are provided with inclination between said spatial light modulator and the substrate; The reflected light of beam splitter gets into the CCD camera in the image-forming module, and said CCD camera connects imaging processing and control module, the external computing machine of said imaging processing and control module; Said computing machine is connected with three controllers, and said controller connects exposure light source, spatial light modulator, motor respectively;
Comprise following steps:
(1) is incident on the spatial light modulator after the light process optical light-collecting system that exposure light source sends; And reflexed to optical beam-splitter by spatial light modulator, through being projected in the substrate on the precise mobile platform through lens or lens combination again after the projection of said optical beam-splitter;
(2) the driven by motor precise mobile platform moves along y direction of principal axis uniform motion with along the stepping of x direction of principal axis, is implemented in large area exposure figure in the substrate through spatial light modulator;
(3) precise mobile platform is in the uniform motion process, according to the synchronizing signal output mode of setting, along y direction of principal axis outgoing position synchronous signal impulse;
(4) the position synchronous signal pulse is input in the controller of spatial light modulator, and the figure in the photomodulator of implementation space enters a new line synchronously, and the figure that makes public in the substrate on the realization precise mobile platform and the figure of spatial light modulator are consistent;
(5) suprabasil reflected light is through behind the beam splitter reflection, to the CCD camera, and by the CCD camera graphical information that collects transferred to computing machine through mirror reflects;
(6) computer system is controlled and is handled collection of precise mobile platform, spatial light modulator and CCD camera figure etc.
Realize the method for location triggered scan mode in the described a kind of litho machine system; It is characterized in that: after said precise mobile platform uniform motion gets into and sets the trigger pip window; Triggering distance along the setting in every interval of y direction of principal axis; Export a pulse signal synchronously, said each pulse signal triggers spatial light modulator controller, pixel of figure translation in the control spatial light modulator.
Realize the method for location triggered scan mode in the described a kind of litho machine system; It is characterized in that: said precise mobile platform is at the uniform velocity mobile; The distance that figure moves in the displacement that guarantees the figure on the precise mobile platform and the spatial light modulator is consistent, thereby the stack of realization figure makes public.
Advantage of the present invention is: the present invention can realize the figure exposure that in the substrate of precise mobile platform, superposes fast under the prerequisite that does not influence the photo-etching machine exposal quality, reduce the cost of litho machine system simultaneously.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Fig. 2 is a system of the present invention control synoptic diagram.
Fig. 3 is a synchronizing signal output synoptic diagram of the present invention.
Fig. 4 is a spatial light modulation synoptic diagram of the present invention.
Fig. 5 is a figure line feed synoptic diagram of the present invention.
Fig. 6 is the scan control model process figure of a band graph exposure of the present invention.
Embodiment
As shown in Figure 1; Realize the method for location triggered scan mode in the litho machine system, include projection module, said projection module comprises exposure light source 1, spatial light modulator 3, is installed on the substrate 6 on the precise mobile platform 7; Said precise mobile platform 7 connects motor 12; Between said exposure light source 1, the spatial light modulator 3 optical light-collecting system 2 is installed, is provided with the beam splitter 4 and lens or lens combination 5 of inclination between said spatial light modulator 3 and the substrate 6, the reflected light of beam splitter 4 gets into the CCD camera 9 in the image-forming module; Said CCD camera 9 connects imaging processing and control module 10, said imaging processing and control module 10 external computing machines 13; Said computing machine 13 is connected with three controllers 11, and said controller 11 connects exposure light source 1, spatial light modulator 3, motor 12 respectively;
Comprise following steps:
(1) is incident on the spatial light modulator 3 after the light process optical light-collecting system that exposure light source 1 sends; And reflexed to optical beam-splitter 4 by spatial light modulator 3, through being projected in the substrate 6 on the precise mobile platform 7 through lens or lens combination 5 again after the projection of said optical beam-splitter 4;
(2) motor 12 drive precise mobile platforms 7 move along y direction of principal axis uniform motion with along the stepping of x direction of principal axis, are implemented in large area exposure figure in the substrate 6 through spatial light modulator 3;
(3) precise mobile platform 7 is in the uniform motion process, according to the synchronizing signal output mode of setting, along y direction of principal axis outgoing position synchronous signal impulse;
(4) the position synchronous signal pulse is input in the controller 11 of spatial light modulator 3, and the figure in the implementation space photomodulator 3 enters a new line synchronously, and the figure that makes public in 7 the substrate on the realization precise mobile platform is consistent with the figure of spatial light modulator 3;
(5) after the reflected light in the substrate 7 reflects through beam splitter 4, reflex in the CCD camera 9 through catoptron 8, and the graphical information that collects is transferred to computing machine 13 by CCD camera 9;
(6) computing machine 13 systems control and handle collection of precise mobile platform 7, spatial light modulator 3 and CCD camera 9 figures etc.
After said precise mobile platform 7 uniform motion get into and set the trigger pip window; Triggering distance along the setting in every interval of y direction of principal axis; Export a pulse signal synchronously; Said each pulse signal triggers the controller 11 of spatial light modulator 3, pixel of figure translation in the control spatial light modulator 3.
Said precise mobile platform 7 is at the uniform velocity mobile, and the distance that figure moves in the displacement that guarantees the figure on the precise mobile platform 7 and the spatial light modulator 3 is consistent, thereby the stack of realization figure makes public.
Write-through scanning photoetching machine control system is as shown in Figure 2, main controller controls component server, NI Vision Builder for Automated Inspection, platform control system, exposure light source, illuminator and autofocus system.The synchronization pulse of platform control system is controlled the upset that spatial light modulator realizes figure in real time, and temperature control system guarantees light source works under a stationary temperature environment, and the component server is realized the processing and the transmission of figure.
The sync bit trigger pip of platform output is as shown in Figure 3, and the terminal point of window starting point and window is controlled the beginning of synchronization pulse and stopped.(M * v), T is meant the cycle of pulse to T=pw/ among the figure, and M is meant the enlargement ratio of object lens; V is meant platform speed, and pw is meant the size of the single pixel of spatial light modulator, and pw is as shown in Figure 4; T is the time of the high level of pulse, and this time is pounced on the time of catching less than T greater than the spatial modulator signal.
The location triggered scan mode course of work is as shown in Figure 5, and precise mobile platform begins to move from starting point, moves to the position of exposure; The platform uniform motion gets into while outgoing position synchronization pulse in the window, and first pulse signal triggers spatial light modulator, shown in Fig. 5 a; R1 behavior active graphical; R2, R3, R4 are black figure, and platform moves a trigger interval apart from synchronization pulse of s=pw/ M output, and this moment, the line feed of spatial light modulator figure was shown in Fig. 5 b; R1, R2 behavior active graphical, R3, R4 are black figure.And the like; Platform is in y direction uniform motion process, and each mobile triggering is at interval sent a pulse signal simultaneously apart from s and triggered figure line feed in the spatial light modulator, when the position of platform grand window; Stop output sync pulse signal this moment, the graph exposure of a band is accomplished.

Claims (3)

1. realize the method for location triggered scan mode in the litho machine system; Include projection module; Said projection module comprises exposure light source, spatial light modulator, is installed on the substrate on the precise mobile platform, and said precise mobile platform connects motor, and the optical light-collecting system is installed between said exposure light source, the spatial light modulator; It is characterized in that: the beam splitter and lens or the lens combination that are provided with inclination between said spatial light modulator and the substrate; The reflected light of beam splitter gets into the CCD camera in the image-forming module, and said CCD camera connects imaging processing and control module, the external computing machine of said imaging processing and control module; Said computing machine is connected with three controllers, and said controller connects exposure light source, spatial light modulator, motor respectively;
Comprise following steps:
(1) is incident on the spatial light modulator after the light process optical light-collecting system that exposure light source sends; And reflexed to optical beam-splitter by spatial light modulator, through being projected in the substrate on the precise mobile platform through lens or lens combination again after the projection of said optical beam-splitter;
(2) the driven by motor precise mobile platform moves along y direction of principal axis uniform motion with along the stepping of x direction of principal axis, is implemented in large area exposure figure in the substrate through spatial light modulator;
(3) precise mobile platform is in the uniform motion process, according to the synchronizing signal output mode of setting, along y direction of principal axis outgoing position synchronous signal impulse;
(4) the position synchronous signal pulse is input in the controller of spatial light modulator, and the figure in the photomodulator of implementation space enters a new line synchronously, and the figure that makes public in the substrate on the realization precise mobile platform and the figure of spatial light modulator are consistent;
(5) suprabasil reflected light is through behind the beam splitter reflection, to the CCD camera, and by the CCD camera graphical information that collects transferred to computing machine through mirror reflects;
(6) computer system is controlled and is handled collection of precise mobile platform, spatial light modulator and CCD camera figure etc.
2. according to the method that realizes the location triggered scan mode in the described a kind of litho machine of claims 1 system; It is characterized in that: after said precise mobile platform uniform motion gets into and sets the trigger pip window; Triggering distance along the setting in every interval of y direction of principal axis; Export a pulse signal synchronously, said each pulse signal triggers the controller of spatial light modulator, pixel of figure translation in the control spatial light modulator.
3. according to the method that realizes the location triggered scan mode in the described a kind of litho machine of claims 1 system; It is characterized in that: said precise mobile platform is at the uniform velocity mobile; The distance that figure moves in the displacement that guarantees the figure on the precise mobile platform and the spatial light modulator is consistent, thereby the stack of realization figure makes public.
CN201110406938XA 2011-12-09 2011-12-09 Photoetching machine system with position triggered scanning mode and method thereof Pending CN102445861A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103226294A (en) * 2013-04-27 2013-07-31 苏州微影光电科技有限公司 Lithography system and method for improving exposure pattern position accuracy
CN103472685A (en) * 2013-09-13 2013-12-25 苏州微影光电科技有限公司 Synchronizer, scanning type laser imaging system and synchronizing method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment
CN108062006A (en) * 2016-11-07 2018-05-22 俞庆平 The write-through screen printing system and method for platemaking of a kind of automatic top and bottom plate
CN110174824A (en) * 2019-05-30 2019-08-27 电子科技大学 A kind of alignment alignment optical path and its method based on projection mask-free photolithography equipment
CN113960887A (en) * 2021-01-05 2022-01-21 苏州源卓光电科技有限公司 Scanning exposure method of direct-writing type photoetching machine

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US6055039A (en) * 1993-06-29 2000-04-25 Canon Kabushiki Kaisha Illumination system and exposure apparatus using the same
US20020080459A1 (en) * 2000-12-25 2002-06-27 Asahi Kogaku Kogyo Kabushiki Kaisha Laser imaging apparatus
US20060146308A1 (en) * 2005-01-06 2006-07-06 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography
CN1936711A (en) * 2006-10-18 2007-03-28 上海微电子装备有限公司 Alignment system for photoetching device and stage jointing grating system
CN101126905A (en) * 2007-09-19 2008-02-20 芯硕半导体(合肥)有限公司 Direct-writing lithography device with focusing device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6055039A (en) * 1993-06-29 2000-04-25 Canon Kabushiki Kaisha Illumination system and exposure apparatus using the same
US20020080459A1 (en) * 2000-12-25 2002-06-27 Asahi Kogaku Kogyo Kabushiki Kaisha Laser imaging apparatus
US20060146308A1 (en) * 2005-01-06 2006-07-06 Asml Holding N.V. Systems and methods for minimizing scattered light in multi-SLM maskless lithography
CN1936711A (en) * 2006-10-18 2007-03-28 上海微电子装备有限公司 Alignment system for photoetching device and stage jointing grating system
CN101126905A (en) * 2007-09-19 2008-02-20 芯硕半导体(合肥)有限公司 Direct-writing lithography device with focusing device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103226294A (en) * 2013-04-27 2013-07-31 苏州微影光电科技有限公司 Lithography system and method for improving exposure pattern position accuracy
CN103472685A (en) * 2013-09-13 2013-12-25 苏州微影光电科技有限公司 Synchronizer, scanning type laser imaging system and synchronizing method
CN104932207A (en) * 2015-05-23 2015-09-23 合肥芯硕半导体有限公司 Position synchronization method for direct-writing photoetching equipment
CN108062006A (en) * 2016-11-07 2018-05-22 俞庆平 The write-through screen printing system and method for platemaking of a kind of automatic top and bottom plate
CN110174824A (en) * 2019-05-30 2019-08-27 电子科技大学 A kind of alignment alignment optical path and its method based on projection mask-free photolithography equipment
CN113960887A (en) * 2021-01-05 2022-01-21 苏州源卓光电科技有限公司 Scanning exposure method of direct-writing type photoetching machine

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