CN102610543B - Variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection - Google Patents
Variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection Download PDFInfo
- Publication number
- CN102610543B CN102610543B CN201210016664.8A CN201210016664A CN102610543B CN 102610543 B CN102610543 B CN 102610543B CN 201210016664 A CN201210016664 A CN 201210016664A CN 102610543 B CN102610543 B CN 102610543B
- Authority
- CN
- China
- Prior art keywords
- cavity
- liner
- vacuum chamber
- pedestal
- detection space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
A variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection belongs to the technical field of semiconductor manufacturing equipment design. The variable-structure vacuum chamber comprises an upper cover, a gas homogenizing disc, a chamber, a replaceable inner liner, an inner liner bracket, a base, an exhaust unit, a flow field detection space, and a gas pressure detection guide tube. The flow field detection space is cylindrical; and the structure and the size of the flow detection space can be changed by adjusting the diameter of the cylindrical body through replacing the replaceable inner liner and adjusting the height of the cylindrical body through ascending or descending the base. The inventive structure can be used in test of low-pressure gas-phase process such as etching, plasma enhanced/chemical vapor deposition (PE/CVD), physical vapor deposition (PVD) and oxidation diffusion process having common characteristics of chambers, and detect the pressure parameter in the internal space and on each gas path of chambers of different structures, study the influence rule of each parameter in the low-pressure gas-phase process, and remarkably improve the credibility of IC equipment chamber part optimization design.
Description
Technical field
The invention belongs to semiconductor manufacturing facility design field, particularly a kind of change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting that can change chamber height, diameter, import/exhaust mode.
Background technology
Ic manufacturing technology is the symbol of the overall national strengths such as a national economy, science and technology, military affairs, has extremely important strategic importance in various fields such as national defense safety, Aero-Space, information industries.Wherein having a class critical process to have quite similar feature, is all at high-cleanness, high, the gas phase processing technology of carrying out in hypobaric chamber.Mainly comprise: etching, plasma enhancing/chemical vapour deposition (CVD) (PE/CVD), physical vapour deposition (PVD) (PVD) and oxide-diffused technique.The common feature of these technical processs is in the chamber that approaches absolute vacuum, to carry out.
Along with IC manufacturing process more and more approaches the physics limit of material, the technical indicator of processing method is also more and more higher.In engineering reality, the mode lift technique index that often adopting process is optimized, and ignored the optimization to chamber structure.Such theory is generally followed in the research and development of traditional IC equipment: determine chamber structure by emulation and trial-production, and chamber structure design occupy back burner in equipment research and development, the lifting of processing performance mainly realizes by process parameter optimizing.Do like this that not only cost is high, the cycle is long, and the most important thing is that the design hidden danger that chamber structure exists does not just solve at the design initial stage.Such mentality of designing does not obviously meet modern designing idea, in the time of the technical need in the face of harsher, will face serious technical bottleneck.
By research and analysis, affect the chamber structure of most critical of processing performance because have: chamber height, chamber radius, intake method and structure, and air suction mode.These structural parameters are to be difficult to change on true process equipment, even if change, improvement cost also can be very high.For solving this practical problem, the present invention proposes a kind of change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting.
Summary of the invention
For the problems referred to above, the object of the invention is to propose a kind of change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting, particularly about a kind of chamber that can change chamber height, diameter, import/exhaust mode for the experiment of low-pressure vapor phase processing technology.
For achieving the above object, the present invention takes following technical scheme:
The change structure for vacuum chamber of the first structure comprises that upper cover, even gas dish, cavity, replaceable liner, liner support, pedestal, exhaust apparatus and air pressure detect skirt.
The upper end of described cavity is opened wide, and is connected with upper cover; The inner bottom surface edge perforate of cavity, and be connected with exhaust apparatus by pipeline; The inner bottom surface center perforate of cavity, and the adjustable pedestal of setting height(from bottom), pedestal is connected with cavity by lowering or hoisting gear; On the inner bottom surface of cavity, the inner side of edge's hole arranges the liner support of annular; On described liner support, arrange multiple taking cavity center as the center of circle, the liner retaining groove of different radii; Described replaceable liner is cylindrical shape, is arranged in the liner shelves groove of liner support; Between described pedestal and replaceable liner or liner support, there is annular space; The upper end of described replaceable liner arranges the even gas dish being connected with the lower surface of upper cover; On even gas dish, set out pore; On described, cover the inlet channel being communicated with the inner chamber of even gas dish is set; Between described even gas dish, replaceable liner and pedestal, form the variable flow field detection space of physical dimension; The bottom of described liner support arranges a side opening; Air pressure is set in the detection space of described flow field and detects skirt.
The bottom surface of described even gas dish covers the top entire area of flow field detection space, and several ventholes are set on described bottom surface; Or the top section area of the bottom surface of even gas dish covering flow field detection space, be that the bottom surface of even gas dish is connected with its upper surface by madial wall, and on described madial wall, several ventholes be set.
Venthole on described even gas dish bottom surface is the hole that two ends are wide, stage casing is narrow, hole wall is arc, or is the round taper hole that upper end is wide, lower end is narrow, or is epimere inverted cone, the columniform hole of hypomere; On the madial wall of described even gas dish, hole is the cylindrical hole tilting, and the center line in this hole and the angle of vertical direction are 30-60 °.
The present invention also provides the change structure for vacuum chamber of the second for inner rarefied gas flow simplation verification and pressure detecting, comprises that upper cover, cavity, replaceable liner, liner support, pedestal, exhaust apparatus and air pressure detect skirt.
The upper end of described cavity is opened wide, and is connected with upper cover; The inner bottom surface edge perforate of cavity, and be connected with exhaust apparatus by pipeline; The inner bottom surface center perforate of cavity, and the adjustable pedestal of setting height(from bottom), pedestal is connected with cavity by lowering or hoisting gear; On the inner bottom surface of cavity, the inner side of edge's hole arranges the liner support of annular; On described liner support, arrange multiple taking cavity center as the center of circle, the liner retaining groove of different radii; Described replaceable liner is cylindrical shape, is arranged in the liner shelves groove of liner support; Between described pedestal and replaceable liner or liner support, there is annular space; The upper end closed of described replaceable liner, forms the variable flow field detection space of physical dimension between replaceable liner and pedestal; The bottom of described liner support arranges a side opening; On described, cover the multiple upper surface of replaceable liner and air admission holes that are communicated with of flow field detection space of passing are set; The end of each described air admission hole, the part that stretches into flow field detection space arrange nozzle, and on this nozzle, the jet pipe of giving vent to anger being in tilted layout are set; Air pressure is set in the detection space of described flow field and detects skirt.
Sidewall one side of the described jet pipe of giving vent to anger is furnished with several columniform apertures of giving vent to anger.
Change structure for vacuum chamber for two kinds of versions recited above:
Described upper cover and described cavity connecting place, described cavity and described exhaust apparatus connecting place and described cavity and described lowering or hoisting gear connecting place are provided with sealing ring.
The lower end suit bellows of described lowering or hoisting gear, further realizes the sealing between cavity and lowering or hoisting gear.
The porch that described exhaust apparatus is positioned at cavity is provided with exhaust screen, by regulating the anglec of rotation of exhaust screen to realize the change of exhaust mode.
The bottom that the stiff end of described air pressure detection skirt stretches out cavity, and at the end of stiff end, motor is set, realize height and the angular adjustment of air pressure detection skirt, realize the covering of whole flow field detection space pneumatic parameter is detected.
At the inlet channel place of described upper cover, lateral wall and the exhaust apparatus place of cavity, measurement mechanism is all installed, is used for measuring the pneumatic parameter of these positions.
Described chamber can be used for carrying out etching, plasma enhancing/chemical vapour deposition (CVD) (PE/CVD), and physical vapour deposition (PVD) (PVD) and oxide-diffused technique etc. have the low-pressure vapor phase processing technology test of chamber class common feature.
The present invention is owing to taking above technical scheme, and it has the following advantages:
1, utilize " change structure " function of this chamber, can construct and the identical structural parameters of true processing chamber, the stream condition of studying in true processing chamber is had to extremely important practical significance.
2, by " change structure ", can study single parameter, the affect rule of multiple parameter on stream condition, and then in conjunction with test design method, can carry out factorial experiment and sensitivity analysis.
3, the present invention combines with simulation of air flow technology, and experimental data and analog result are confirmed mutually, can greatly improve the confidence level of optimal design.
Brief description of the drawings
Fig. 1 is the structural representation of the first structure of the present invention;
Fig. 2 a, Fig. 2 b, Fig. 2 c are respectively the partial views of three kinds of ventholes of even gas dish 20;
Fig. 3 is the stereogram of interior tube stent;
Fig. 4 is that the first structure is changed the chamber structure schematic diagram after even gas dish;
Fig. 5 is the partial view of even gas dish venthole in Fig. 4;
Fig. 6 is the structural representation of the second structure of the present invention;
Fig. 7 is the partial view of nozzle of air supply in Fig. 6;
Fig. 8 is the change key diagram of exhaust mode;
Fig. 9 is the detection principle key diagram of detection mode;
Number in the figure:
10-upper cover; 11-nozzle; 12-inlet channel; 13-air inlet measurement mechanism; The air inlet of 14-upper cover;
The even gas dish of 20-; The even gas dish of 21-venthole; The bottom surface of the even gas dish of 22-; The even gas dish of 23-air inlet; The madial wall of the even gas dish of 24-
30-cavity; 31-well floor; 32-cavity measurement mechanism; 33-cavity space; 34-cavity space bottom;
The replaceable liner of 40-; The bottom of the replaceable liner of 41-; The inwall of the replaceable liner of 42-; The top of the replaceable liner of 43-;
Tube stent in 50-; 51-inner core baffle ring; 52-inner core retaining groove; 53-bracing frame; 54-side opening;
60-pedestal; 61-lowering or hoisting gear; The upper surface of 62-pedestal; 63-annular space; The bottom space of 64-pedestal;
70-exhaust apparatus; 71-air pressure measuring apparatus; 72-exhaust screen; 73-axle; 74-the first motor;
80-flow field detection space;
90-bellows;
100-air pressure detects skirt; 101-regulates motor; 102-holder; 103-leading screw; 104-the second motor; 105-measuring gage;
The 111-jet pipe of giving vent to anger; The 112-aperture of giving vent to anger.
Embodiment
The invention provides a kind of change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting, below by embodiment, and by reference to the accompanying drawings, technical scheme of the present invention is described in further detail.
Embodiment 1:
As shown in Figure 1, this change structural lumen is by upper cover 10, even gas dish 20, and cavity 30, replaceable liner 40, interior tube stent 50, pedestal 60, exhaust apparatus 70, flow field detection space 80, bellows 90 and air pressure detect the compositions such as skirt 100.
The lower surface 22 of the inwall 42 of replaceable liner, the upper surface 62 of pedestal and even gas dish has formed flow field detection space 80 jointly.
Bellows 90 is connected between the lowering or hoisting gear 61 and well floor 31 of pedestal 60, and bellows 90 is conducive to lowering or hoisting gear 61 vacuum seal around, is conducive to the vertical movement of pedestal 60 simultaneously, realizes the height change of flow field detection space 80.
The interior tube stent 50 of annular is fixed in well floor 31 by the supporting seat 53 of its underpart, on liner support 50, arrange multiple taking cavity center as the center of circle, the inner core baffle ring 51 of different radii and the liner retaining groove 52 being formed by inner core baffle ring 51, the bottom of replaceable liner 41 is placed in inner core retaining groove 52, realizes the change of stream field detection space 80 internal diameters with this.
Lower surface 22 edges of even gas dish are supported on 43 places, top of replaceable liner, even gas dish 20 is connected by the even gas dish air inlet 23 of upper end and the nozzle 11 of upper cover 10, nozzle 11 and the common inlet channel 12 that forms device of even gas dish air inlet 23, at inlet channel, 12 places are provided with air inlet measurement mechanism 13, are used for measuring the parameters such as the inlet pressure at inlet channel 12 places.Even gas dish air inlet 23 is inserted in the nozzle 11 of upper cover 10, and then half-twist location is fixed on upper cover 10 places.Upper cover 10 coordinates and seals with cavity 30, to realize the sealing property of cavity space.
Well floor 31 is connected with exhaust apparatus 70, and wherein exhaust apparatus 70 is positioned at the both sides of the edge place of well floor 31, and different air displacemenies is opened or closed to realize to alternative.Exhaust apparatus 70 is tightly connected with well floor 31, ensures the sealing property of cavity space.One or several cavity measurement mechanisms 35 are installed on the sidewall of cavity 30, are used for realizing the measurement to cavity space 33 interior vacuum degrees etc.The upper end of exhaust apparatus 70 is provided with exhaust screen 72, exhaust screen 72 is connected with axle 73 respectively, the first motor 74 is with moving axis 73 to rotate, and regulates the folding degree of exhaust screen 72 and exhaust apparatus 70, realizes the adjusting (as shown in Figure 8) to exhaust mode.
The nozzle 11 of process gas from upper cover 10 enters in even gas dish 20, enter in flow field detection space 80 by even gas dish gas outlet 21, process gas enters into the bottom space 64 of pedestal after the upper surface 62 of pedestal from the annular space 63 between pedestal 60 and replaceable liner 40, enter into the cavity space bottom 34 of the cavity space 33 of replaceable liner 40 outer walls and cavity 30 inwalls formation by the side opening 54 of liner support 50 bottoms, finally discharge by the exhaust apparatus 70 being connected with cavity 30 bottoms, in the exit of exhaust apparatus 70, air pressure measuring apparatus 71 is installed, can measure the gas pressure parameter in exit.
The bottom surface 22 of even gas dish covers the top entire area of flow field detection space 80, and several even gas dish ventholes 21 are set on described lower surface; Even gas dish venthole 21 on the bottom surface 22 of even gas dish be the round taper hole that upper end is wide, lower end is narrow (as Fig. 2 a), or be epimere inverted cone, the columniform hole of hypomere (as Fig. 2 b), or for two ends are wide, stage casing is narrow, hole wall is arc hole (as Fig. 2 c).The even gas dish by replacement with different gas outlets can be realized the different distributions mode of process gas in processing chamber.
The interior air pressure that arranges of flow field detection space 80 detects skirt 100, the stiff end that air pressure detects skirt 100 stretches out well floor 31, and arrange and regulate motor 101 at the end of stiff end, control the anglec of rotation that air pressure detects skirt 100, as shown in Figure 9, adjustable pressure detects the angle of skirt 100, the head A that air pressure detects skirt 100 can pass through some B, C, the D etc. of base station 60 upper surfaces along camber line, and the data of these points can represent the data of the point on its place circle, measure by the measuring gage 105 being connected with air pressure detection skirt 100.Regulate motor 101 to be arranged on holder 102, holder 102 is connected with the second motor 104 by leading screw 103, can adjusting screw 103 motions realize the adjusting that air pressure is detected to skirt 100 height by controlling the second motor 104, in can checkout gear, with the situation of change of the measured parameter of height change, thereby realize, the covering of whole flow field detection space 80 pneumatic parameters be detected.
Embodiment 2:
In the present embodiment, except even gas dish 20, all the other structures are identical with embodiment 1.The bottom surface 22 of even gas dish is connected with its upper surface by the madial wall 24 of even gas dish, and several even gas dish ventholes 21 are set on described madial wall, the cylindrical hole of this even gas dish venthole 21 for tilting, the angle of its center line and vertical direction is 30-60 °, as shown in Figure 5.
Under the prerequisite of modifier miscellaneous part not, change different even gas dishes and can realize different intake methods.
Embodiment 3:
Even gas dish 20 is not set in the present embodiment, and changes nozzle of air supply in upper cover 10, to realize the change of intake method, all the other structures are identical with embodiment 1, as shown in Figure 6.Replaceable liner 40 upper end closeds, on upper cover 10, be evenly equipped with the air inlet 14 of four upper covers, air inlet 14 by upper cover is connected with the nozzle 11 in replaceable liner 40, the jet pipe 111 of giving vent to anger being in tilted layout is installed on nozzle 11, can realizes different jet modes by the give vent to anger angle of jet pipe 111 of change.In sidewall one side of jet pipe 111 of giving vent to anger, be distributed with the aperture 112 of giving vent to anger, can also realize different jet modes by give vent to anger diameter and the aperture pitch of aperture 112 of change.
The structural strength of this chamber is 1 times of standard atmospheric pressure according to chamber outside, and chamber interior is that absolute vacuum designs and checks, and therefore can be used for the experiment of low-pressure vapor phase processing technology.
Above execution mode is only for illustrating the present invention; and be not limitation of the present invention; the those of ordinary skill in relevant technologies field; without departing from the spirit and scope of the present invention; can also make a variety of changes and modification; therefore all technical schemes that are equal to also belong to category of the present invention, and scope of patent protection of the present invention should be defined by the claims.
Claims (10)
1. the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting, comprise that upper cover (10), even gas dish (20), cavity (30), replaceable liner (40), liner support (50), pedestal (60), exhaust apparatus (70) and air pressure detect skirt (100), is characterized in that:
The upper end of described cavity (30) is opened wide, and is connected with upper cover (10); The inner bottom surface edge perforate of cavity (30), and be connected with exhaust apparatus (70) by pipeline; The inner bottom surface center perforate of cavity (30), and the adjustable pedestal (60) of setting height(from bottom), pedestal (60) is connected with cavity (30) by lowering or hoisting gear (61); On the inner bottom surface of cavity (30), the inner side of edge's hole arranges the liner support (50) of annular;
On described liner support (50), arrange multiple taking cavity (30) center as the center of circle, the liner retaining groove of different radii; Described replaceable liner (40) is cylindrical shape, is arranged in the liner shelves groove of liner support (50);
Between described pedestal (60) and replaceable liner (40) or liner support (50), there is annular space;
The upper end of described replaceable liner (40) arranges the even gas dish (20) being connected with the lower surface of upper cover (10); On even gas dish (20), set out pore;
The upper inlet channel being communicated with the inner chamber of even gas dish (20) that arranges of described upper cover (10);
Between described even gas dish (20), replaceable liner (40) and pedestal (60), form the variable flow field detection space (80) of physical dimension;
The bottom of described liner support (50) arranges a side opening (54);
Air pressure is set in described flow field detection space (80) and detects skirt (100).
2. a kind of change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting according to claim 1, it is characterized in that: the bottom surface of described even gas dish (20) covers the top entire area of flow field detection space (80), and several ventholes are set on described bottom surface; Or the top section area of the bottom surface of even gas dish (20) covering flow field detection space (80), be that the bottom surface of even gas dish (20) is connected with its upper surface by madial wall, and on described madial wall, several ventholes be set.
3. a kind of change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting according to claim 2, it is characterized in that: the venthole on described even gas dish (20) bottom surface is the hole that two ends are wide, stage casing is narrow, hole wall is arc, or be the round taper hole that upper end is wide, lower end is narrow, or be epimere inverted cone, the columniform hole of hypomere; On the madial wall of described even gas dish (20), hole is the cylindrical hole tilting, and the center line in this hole and the angle of vertical direction are 30-60 °.
4. the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting, comprise that upper cover (10), cavity (30), replaceable liner (40), liner support (50), pedestal (60), exhaust apparatus (70) and air pressure detect skirt (100), is characterized in that:
The upper end of described cavity (30) is opened wide, and is connected with upper cover (10); The inner bottom surface edge perforate of cavity (30), and be connected with exhaust apparatus (70) by pipeline; The inner bottom surface center perforate of cavity (30), and the adjustable pedestal (60) of setting height(from bottom), pedestal (60) is connected with cavity (30) by lowering or hoisting gear (61); On the inner bottom surface of cavity (30), the inner side of edge's hole arranges the liner support (50) of annular;
On described liner support (50), arrange multiple taking cavity (30) center as the center of circle, the liner retaining groove of different radii; Described replaceable liner (40) is cylindrical shape, is arranged in the liner shelves groove of liner support (50);
Between described pedestal (60) and replaceable liner (40) or liner support (50), there is annular space;
The upper end closed of described replaceable liner (40), forms the variable flow field detection space (80) of physical dimension between replaceable liner (40) and pedestal (60);
The bottom of described liner support (50) arranges a side opening (54);
On described upper cover (10), arrange multiple through the upper surface of replaceable liner (40) and the air admission hole being communicated with of flow field detection space (80); The end of each described air admission hole, the part that stretches into flow field detection space (80) arrange nozzle (11), and at the upper jet pipe of giving vent to anger being in tilted layout that arranges of this nozzle (11);
Air pressure is set in described flow field detection space (80) and detects skirt (100).
5. according to the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting described in claim 1 or 4, it is characterized in that: described upper cover (10) is provided with sealing ring with described exhaust apparatus (70) connecting place and described cavity (30) with described lowering or hoisting gear (61) connecting place with described cavity (30) connecting place, described cavity (30).
6. the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting according to claim 5, it is characterized in that: the lower end suit bellows (90) of described lowering or hoisting gear (61), further realize the sealing between cavity (30) and lowering or hoisting gear (61).
7. according to the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting described in claim 1 or 4, it is characterized in that: the porch that described exhaust apparatus (70) is positioned at cavity (30) is provided with exhaust screen (72), by regulating the anglec of rotation of exhaust screen (72) to realize the change of exhaust mode.
8. according to the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting described in claim 1 or 4, it is characterized in that: the stiff end of described air pressure detection skirt (100) stretches out the bottom of cavity (30), and at the end of stiff end, motor is set, realize height and angular adjustment that air pressure detects skirt (100), realize the covering of whole flow field detection space (80) pneumatic parameter is detected.
9. according to the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting described in claim 1 or 4, it is characterized in that: locate to be all provided with measurement mechanism at the inlet channel place of described upper cover (10), lateral wall and the exhaust apparatus (70) of cavity (30), be used for measuring the pneumatic parameter of these positions.
10. the change structure for vacuum chamber for inner rarefied gas flow simplation verification and pressure detecting according to claim 4, is characterized in that: described in sidewall one side of giving vent to anger on jet pipe be furnished with several columniform apertures of giving vent to anger.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210016664.8A CN102610543B (en) | 2012-01-18 | 2012-01-18 | Variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210016664.8A CN102610543B (en) | 2012-01-18 | 2012-01-18 | Variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102610543A CN102610543A (en) | 2012-07-25 |
| CN102610543B true CN102610543B (en) | 2014-07-23 |
Family
ID=46527831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210016664.8A Active CN102610543B (en) | 2012-01-18 | 2012-01-18 | Variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102610543B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013106949A1 (en) * | 2012-01-18 | 2013-07-25 | 清华大学 | Variable structured vacuum chamber for internal rarefied airflow simulation checking and pressure detection |
| CN104934502B (en) * | 2015-06-02 | 2017-02-01 | 中国科学院上海技术物理研究所 | Copper-indium-gallium-selenium film selenylation device capable of controlling selenium gas pressure |
| CN108054245A (en) * | 2018-01-11 | 2018-05-18 | 常州比太黑硅科技有限公司 | A kind of dry method etching device technological reaction chamber |
| CN116086852B (en) * | 2023-04-07 | 2023-06-16 | 苏州中科科美科技有限公司 | Design method of low gravity vacuum test system |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6722642B1 (en) * | 2002-11-06 | 2004-04-20 | Tokyo Electron Limited | High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism |
| CN102252811A (en) * | 2011-07-09 | 2011-11-23 | 无锡隆盛科技有限公司 | Leakage amount detector with vacuum cavity and detection method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0913172A (en) * | 1995-06-28 | 1997-01-14 | Ulvac Japan Ltd | Lifting mechanism for vacuum device |
| JP2000216144A (en) * | 1999-01-22 | 2000-08-04 | Matsushita Electric Ind Co Ltd | Vacuum processing apparatus and method of detaching substrate processed therein |
| KR100790795B1 (en) * | 2007-02-09 | 2008-01-03 | 주식회사 아이피에스 | Vacuum processing apparatus |
-
2012
- 2012-01-18 CN CN201210016664.8A patent/CN102610543B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6722642B1 (en) * | 2002-11-06 | 2004-04-20 | Tokyo Electron Limited | High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism |
| CN102252811A (en) * | 2011-07-09 | 2011-11-23 | 无锡隆盛科技有限公司 | Leakage amount detector with vacuum cavity and detection method thereof |
Non-Patent Citations (2)
| Title |
|---|
| JP特开2000-216144A 2000.08.04 |
| JP特开平9-13172A 1997.01.14 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102610543A (en) | 2012-07-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102610543B (en) | Variable-structure vacuum chamber for interior rarefied gas flow simulation verification and pressure detection | |
| CN107850507B (en) | Sensor unit and air tightness checking device | |
| JP6297509B2 (en) | Substrate processing equipment | |
| CN101458144B (en) | Direction gage calibration device | |
| CN203680306U (en) | Non-contact porous vacuum floating suction device | |
| CN103422071A (en) | Vacuum cavity chamber capable of rapidly changing gas-homogenizing mode | |
| CN104073783A (en) | A reaction chamber and plasma processing equipment | |
| CN108872045A (en) | A kind of measurement method of the broken sample total porosity of shale | |
| CN107389279A (en) | A kind of basketball inflator with gas leakage detection function | |
| CN101631663B (en) | A ring shaped valve piston and its use in a blow moulding machine | |
| CN206770169U (en) | Cylinder air outlet structure of air compressor | |
| CN109681417A (en) | A kind of vacuum system | |
| CN104406794A (en) | Experimental device for detecting aeroengine guider | |
| CN108443881B (en) | Combustion conical flame bunsen burner and flame propagation speed measuring method | |
| WO2013106949A1 (en) | Variable structured vacuum chamber for internal rarefied airflow simulation checking and pressure detection | |
| CN107747920A (en) | A kind of servicing unit for automobile pipe fitting high-acruracy survey | |
| CN111351741B (en) | Ocean sediment gas permeability anisotropy testing device and using method | |
| CN109164003B (en) | Liquid adsorbent testing arrangement | |
| CN205826235U (en) | A kind of sealing device for cavity series products sealing propertytest | |
| CN206772385U (en) | A kind of bubble type liquid level detection device | |
| CN112432800A (en) | Device for simultaneously carrying out explosion-proof test on multiple sets of explosion-proof test tanks and gas replacement method | |
| CN111795816A (en) | Flow characteristic measuring device and method for control valve sleeve | |
| CN212031383U (en) | Multi-ported valve conversion sampling device and photocatalytic activity evaluation experimental device | |
| CN205301301U (en) | Bionical electron nose of gas -liquid separation | |
| CN218671637U (en) | Quick gas split charging device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |