CN102692822A - Multi-wavelength based aligning system and aligning method - Google Patents

Multi-wavelength based aligning system and aligning method Download PDF

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CN102692822A
CN102692822A CN2011100744516A CN201110074451A CN102692822A CN 102692822 A CN102692822 A CN 102692822A CN 2011100744516 A CN2011100744516 A CN 2011100744516A CN 201110074451 A CN201110074451 A CN 201110074451A CN 102692822 A CN102692822 A CN 102692822A
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level
wavelength
greenm
weight
alignment
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CN102692822B (en
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韩悦
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Abstract

The invention discloses a multi-wavelength based aligning system which is compatible with various aligning marks. The aligning system comprises: an aligning radiation source providing at least two wavelengths, an optical unit, an aligning mark, a detection unit and a processing unit; the processing unit obtains all order signals of the mark under irradiation of different radiation sources; after a crude capture and an accurate capture ranges are set, all the order signals are subject to weight setting of aligning orders; and order weights participating aligning position calculation are calculated. An aligning position is calculated according to the weight setting, color selection setting, and the set crude capture and an accurate capture ranges.

Description

A kind of alignment system and alignment methods based on multi-wavelength
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, relate in particular to a kind of alignment methods and alignment system that is applicable to lithographic equipment based on two light source multi-period marks.
Background technology
Lithographic equipment is a major equipment of making integrated circuit, and its effect is to make different mask patterns be imaged onto the position of the accurate aligning in the substrate (like semi-conductor silicon chip or LCD plate) successively.Yet this aligned position but changes because of physics that row graph experienced and chemical change, therefore needs an alignment system, at every turn can both be by accurate aligning with the aligned position that guarantees the corresponding mask of silicon chip.Along with the growth of the number of electronic components on the substrate per unit surface area and the size of electronic component are synthesized more and more littler; Accuracy requirement to integrated circuit improves day by day; Therefore mask is imaged on suprabasil position and must fixes more and more accurately successively, and the requirement of alignment precision is also increasingly high during to photoetching.
United States Patent (USP) discloses a kind of alignment system for No. 5243195 and has wherein mentioned upward alignment so of a kind of axle; The advantage of this alignment so is that mask and substrate can directly be aimed at; But its shortcoming is to be difficult to be improved to higher precision and accuracy; And various processing steps can cause that alignment mark changes, thereby introduce the variation of the groove significant depth of asymmetry and substrate grating marker.This phenomenon causes technology to detect less than grating marker, or faint signal only is provided in other cases, and alignment system stability reduces.
In order to address this problem, one Chinese patent application discloses a kind of dual wavelength alignment system No. 03164858, comprises the aligning radiation source with first wavelength and second wavelength; Detection system with first wavelength channel and second wavelength channel, first wavelength channel receives the aligning radiation of alignment mark first wavelength, and second wavelength channel receives the aligning radiation of alignment mark second wavelength; And a positioning unit, in order to according in the detected aligning radiation of first wavelength with respect to the position of confirming alignment mark in the relative intensity of the detected aligning radiation of second wavelength.From said system, can find out, this system in fact be to use two independently wavelength shine and detect the position of suprabasil alignment mark, thereby can select to aim at laser dynamically, to obtain better alignment result.But, in existing dual-wavelength laser measuring system, aim at the strategy setting in case after fixing; In the strategy execution process; In case the inferior situation about not meeting the demands of certain one-level occurs, can't make amendment, thereby cause aiming at failure; And then have influence on the whole efficiency of alignment system, cause the sheet rate of refusing of etching system to improve.
Summary of the invention
For overcoming the defective that exists in the prior art, the present invention provides a kind of alignment methods and alignment system based on two light source multi-period marks, and this alignment methods and alignment system can be used in various alignment mark.
For realizing the foregoing invention purpose; The present invention provides a kind of alignment system based on multi-wavelength, comprising: the aligning radiation source of at least two wavelength is provided, optical unit; Alignment mark, probe unit and processing unit; This processing unit obtains this and is marked at the whole level time signals under the different radiation source irradiates, set slightly catch and smart capture range after to this all level time signals carry out the weight setting of alignment stage time, and calculate and participate in the level time weight that aligned position calculates; Select slightly catching and smart capture range of setting and setting according to weight setting, color, calculate aligned position.
Further, this alignment mark comprises binary cycle mark or three cycle marks.This aligning radiation source comprises red laser light source and green laser light source.
Further, this thick capture range refers to that the aligned position in a big way need use the one-level light source information of two different cycles sizes of same mark to aim at.This essence capture range refers in more among a small circle, use the arbitrary number of level secondary reflection light source information of the same one-period of same mark to aim at.
Further, this weight is set to the static weight setting.This static weight setting comprises the inferior and certain signal strength threshold scope of the level that need select for use that is provided with; And at different levels set-up and calculated weights; Check whether inferior actual signal intensity at different levels satisfy the requirement of setting threshold, pass through like affirmation up to standard, and this level time weight is effective; If number up to standard, then gets into two kinds of mechanism of fault-tolerant and non-fault-tolerant less than the number of selecting for use that sets.This gets into and further comprises after the superfluous wrong mechanism and judge whether to belong to thick capture range or smart capture range.Whether this thick capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; Check that the one-level of catching required different cycles is inferior only not available,, then stop superfluous fault reason as unavailable; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.Processing under this thick capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.Whether this essence capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.Processing under this essence capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.After this got into non-superfluous wrong mechanism, all efficiency confirmed stops this time to aim at for a level time signal intensity of aiming at like selected participation, announces to aim at failure.
The present invention discloses a kind of alignment methods based on multi-wavelength simultaneously; Comprise and obtain the whole level time signals of alignment mark under different radiation source irradiates; Set slightly catch and smart capture range after to this all level time signals carry out the weight setting of alignment stage time, and calculate and participate in the level time weight that aligned position calculates; Select slightly catching and smart capture range of setting and setting according to weight setting, color, calculate aligned position.
Further, this alignment mark comprises binary cycle mark or three cycle marks.This aligning radiation source comprises red laser light source and green laser light source.
Further, this thick capture range refers in a big way, must need use the one-level light source information of two different cycles sizes of same mark to aim at by aligned position.This essence capture range refers in more among a small circle, use the arbitrary number of level secondary reflection light source information of the same one-period of same mark to aim at.
Further, this weight is set to the static weight setting.
Further; This static weight setting comprises the level that need select for use time and certain signal strength threshold scope is set, and at different levels set-up and calculated weights, check whether inferior actual signal intensity at different levels satisfy the requirement of setting threshold; Pass through like affirmation up to standard, this level time weight is effective; If number up to standard, then gets into two kinds of mechanism of fault-tolerant and non-fault-tolerant less than the number of selecting for use that sets.
Further, this gets into and further comprises after the superfluous wrong mechanism and judge whether to belong to thick capture range or smart capture range.Whether this thick capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; Check that the one-level of catching required different cycles is inferior only not available,, then stop superfluous fault reason as unavailable; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Check time weight setting of residue level, recomputate at different levels the steps under this thick capture range of weight proportion and further comprise: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.Whether this essence capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.Step under this essence capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.After this got into non-superfluous wrong mechanism, all efficiency confirmed stops this time to aim at for a level time signal intensity of aiming at like selected participation, announces to aim at failure.
Compared with prior art; This alignment system and alignment methods thereof not only can provide multiple aligning to select type, and enhanced process adaptability obtains more accurate aligned position; And under the relatively poor situation of manufacturability; Through superfluous wrong the application, improve the aligning percent of pass of mark, and then guarantee the aligning efficient of alignment system.
Description of drawings
Can graphicly further be understood through following detailed Description Of The Invention and appended about advantage of the present invention and spirit.
Shown in Figure 1 is the synoptic diagram of the dual light sources and multilevel alignment system of known technology;
Shown in Figure 2 is the structural representation of kind alignment mark involved in the present invention;
The waveform synoptic diagram of gathering for alignment mark involved in the present invention shown in Figure 3;
Shown in Figure 4 is the process flow diagram of alignment methods involved in the present invention.
Embodiment
Specify specific embodiment of the present invention below in conjunction with accompanying drawing.
Shown in Figure 1 is the synoptic diagram of the dual light sources and multilevel alignment system of known technology.As shown in Figure 1, the dual light sources and multilevel alignment system comprises light source module 11,12, with reference to grating 2, optical fiber 13; 23, prism 14,24, polariscope 3, object lens 4, mark 5, level time wedge 15,25, catoptron 16; 26, object lens 17,27, as plane 18,28 and detector 19,29.The concrete principle of work of dual light sources and multilevel alignment system is common practise for the person of ordinary skill of the art, repeats no more at this.
Shown in Figure 2 is the structural representation of kind alignment mark involved in the present invention.Wherein a figure is three cycle alignment marks, and the cycle of this alignment mark is L>M>S.B figure is the binary cycle alignment mark, and the cycle of this alignment mark is L>M.The concrete principle of work of above-mentioned two kinds of alignment marks is common practise for the person of ordinary skill of the art, repeats no more at this.
The waveform synoptic diagram of gathering for alignment mark involved in the present invention shown in Figure 3; Wherein a figure is the waveform synoptic diagram that three cycle alignment marks are obtained after the green wavelength irradiation, and b figure is the waveform synoptic diagram that the binary cycle alignment mark is obtained after the green wavelength irradiation.
Adopt the red and green double-wavelength light illumination to select mark pattern as shown in Figure 2 in the present invention, the alignment system detecting structure through Fig. 1 can obtain waveform P as shown in Figure 3 GreenL-1, P GreenM-1, P GreenM-2, P GreenM-3, P GreenM-4, P GreenM-5, P GreenM-6, P GreenM-7, P GreenS-1P RedL-1, P RedM-1, P RedM-2, P RedM-3, P RedM-4, P RedM-5, P RedM 6, P RedM-7, P RedS-1, wherein: P representes the aligned position of at different levels light signals; Green/red representes light source colour; The grating cycle of large-size in the L expressive notation, middle-sized grating cycle in the M expressive notation, the grating cycle of reduced size in the S expressive notation; Arabic numeral are represented the level inferior information of corresponding cycle through the obtainable light signal of alignment system institute.Owing to only show the waveform synoptic diagram that after the green wavelength irradiation, is obtained among Fig. 3, so P GreenL-1Corresponding to the P among Fig. 3 L-1, and the like.
The corresponding with it at different levels inferior signal intensity that measures is S Survey greenL-1, S Survey greenM-1, S Survey greenM-2, S Survey greenM-3, S Survey greenM-4, S Survey greenM-5, S Survey greenM-6, S Survey greenM-7, S Survey greenS-1S Survey redL-1, S Survey redM-1, S Survey redM-2, S Survey redM-3, S Survey redM-4, S Survey redM-5, S Survey redM-6, S Survey redM-7, S Survey redS-1, wherein: S SurveyRepresent the waveform signal intensity at different levels times; Green/red representes light source colour; The grating cycle of large-size in the L expressive notation, middle-sized grating cycle in the M expressive notation, the grating cycle of reduced size in the S expressive notation; Arabic numeral are represented the level inferior information of corresponding cycle through the obtainable light signal of alignment system institute.
Below will introduce the present invention to the mode that combines with a plurality of embodiment:
Embodiment one:
Alignment system selects the form of slightly catching to obtain aligned position (in aligned position computation process, adopting the level of two different cycles time to aim at calculating) in aiming at strategy in the present embodiment; The superfluous fault reason of use mechanism under the inferior situation about not passing through of level is being used in permission to some extent; In the static weight setting up procedure, select L-1, M-1, M-3, M-5, M-7 to participate in the calculating of aligned position, the signal intensity of its selected level time setting is S If greenL-1, S If greenM-1, S If greenM-3, S If GreenM-5, S If greenM-7, S If redL-1, S If redM-1, S If redM-3, S If redM-5, S If redM-7It is W that the aligned position of corresponding selected level time setting calculates weight If greenL-1, W If greenM-1, W If greenM-3, W If greenM-5, W If greenM-7, W If redL-1, W If redM-1, W If redM-3, W If redM-5, W If redM-7At different levels the signals that the participation that (Weight representes that aligned position calculates weight) obtains at different levels times that participate under the light sources with different wavelengths radiation situation that is provided with aiming at signal intensities and actual test is aimed at compare can know S If greenL-1<S Survey greenL-1, S If greenM-1<S Survey greenM-1, S If greenM-3<S Survey greenM-3, S If greenM-5<S Survey greenM-5, S If greenM-7>S Survey greenM-7, S If redL-1<S Survey redL-1, S If redM-1<S Survey redM-1, S If redM-3<S Survey redM-3, S If redM-5>S Survey redM-5, S If redM-7>S Survey redM-7Can recognize under the situation of using the green light source irradiation that through contrast seven of the size cycle grades of actual signal intensities that record of light do not reach the strength range of setting in the mark; Use under the situation of red light source irradiation, the Pyatyi light in size cycle and seven grades of actual signal intensities that record of light do not reach the strength range of setting in the mark.
Set in the present embodiment and use superfluous fault reason; Because superfluous fault reason mechanism is to handle respectively at different levels signals of the light source of different wave length; So sentence green glow is example; Whether the number of at first checking the level time light of the participation alignment applications that satisfies the setting signal requirement of strength is zero, through detection, non-vanishing; Secondly because form is slightly caught in employing, the one-level light signal that needs the different size cycle participates in aiming at, and through detecting, the signal intensity of the actual acquisition of L-1 and M-1 is greater than set signal strength range, and is up to standard, meets the demands; Once more, with the M-7 level light settings through setting signal intensity not for using, with it to deserved M-7 level light weights W If greenM-7Cancel and no longer participate in final alignment calculating; At last, obtain original weights W of at different levels times If greenL-1, W If greenM-1, W If greenM-3, W If greenM-5, W If greenM-7Recomputate weight at different levels times
W If greenL-1=W If greenL-1* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
W If greenM-1=W If greenM-1* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
W If greenM-3=W If greenM-3* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
W If greenM-5=W If greenM-5* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
In like manner can obtain the weight that at different levels times are participated in aligned position calculating under the red light irradiation situation
W If redL-1=W If redL-1* (W If redL-1+ W If redM-1+ W If redM-3+ W If redM-5+ W If redM-7)/(W If redL-1+ W If redM-1+ W If redM-3);
W If redM-1=W If redM-1* (W If redL-1+ W If redM-1+ W If redM-3+ W If redM-5+ W If redM-7)/(W If redL-1+ W If redM-1+ W If redM-3);
W If redM-3=W If redM-3* (W If redL-1+ W If redM-1+ W If redM-3+ W If redM-5+ W If redM-7)/(W If redL-1+ W If redM-1+ W If redM-3);
In color Dynamic Selection link, relatively at different levels times signal intensity summations through verifying under the different wave length radiation situation finally select for use the big color of signal intensity summation to carry out final alignment position calculation (concrete comparative approach sees that CN09471.1 is said)
Calculate the final alignment position.
Embodiment two:
Alignment system selects the essence form of catching to obtain aligned position (in aligned position computation process, adopting the level of two different cycles time to aim at calculating) in aiming at strategy in the present embodiment; The superfluous fault reason of use mechanism under the inferior situation about not passing through of level is being used in permission to some extent; In the static weight setting up procedure, select L-1, M-1, M-3, M-5, M-7 to participate in the calculating of aligned position, the signal intensity of its selected level time setting is S If greenL-1, S If greenM-1, S If greenM-3, S If GreenM-5, S If greenM-7, S If redL-1, S If redM-1, S If redM-3, S If redM-5, S If redM-7It is W that the aligned position of corresponding selected level time setting calculates weight If greenL-1, W If greenM-1, W If greenM-3, W If greenM-5, W If greenM-7, W If redL-1, W If redM-1, W If redM-3, W If redM-5, W If redM-7At different levels the signals that the participation that (Weight representes that aligned position calculates weight) obtains at different levels times that participate under the light sources with different wavelengths radiation situation that is provided with aiming at signal intensities and actual test is aimed at compare can know S If greenL-1<S Survey greenL-1, S If greenM-1<S Survey greenM-1, S If greenM-3<S Survey greenM-3, S If greenM-5<S Survey greenM-5, S If greenM-7>S Survey greenM-7, S If redL-1<S Survey redL-1, S If redM-1<S Survey redM-1, S If redM-3<S Survey redM-3, S If redM-5>S Survey redM-5, S If redM-7>S Survey redM-7Can recognize under the situation of using the green light source irradiation that through contrast seven of the size cycle grades of actual signal intensities that record of light do not reach the strength range of setting in the mark; Use under the situation of red light source irradiation, the Pyatyi light in size cycle and seven grades of actual signal intensities that record of light do not reach the strength range of setting in the mark.
Set in the present embodiment and use superfluous fault reason; Because superfluous fault reason mechanism is to handle respectively at different levels signals of the light source of different wave length; So sentence green glow is example; Whether the number of at first checking the level time light of the participation alignment applications that satisfies the setting signal requirement of strength is zero, through detection, non-vanishing; Secondly, with the M-7 level light settings through setting signal intensity not for using, with it to deserved M-7 level light weights W If greenM-7Cancel and no longer participate in final alignment calculating; At last, obtain original weights W of at different levels times If greenL-1, W If greenM-1, W If greenM-3, W If greenM-5, W If greenM-7Recomputate weight at different levels times
W If greenL-1=W If greenL-1* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
W If greenM-1=W If greenM-1* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
W If greenM-3=W If greenM-3* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
W If greenM-5=W If greenM-5* (W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5+ W If greenM-7)/(W If greenL-1+ W If greenM-1+ W If greenM-3+ W If greenM-5);
In like manner can obtain the weight that at different levels times are participated in aligned position calculating under the red light irradiation situation
W If redL-1=W If redL-1* (W If redL-1+ W If redM-1+ W If redM-3+ W If redM-5+ W If redM-7)/(W If redL-1+ W If redM-1+ W If redM-3);
W If redM-1=W If redM-1* (W If redL-1+ W If redM-1+ W If redM-3+ W If redM-5+ W If redM-7)/(W If redL-1+ W If redM-1+ W If redM-3);
W If redM-3=W If redM-3* (W If redL-1+ W If redM-1+ W If redM-3+ W If redM-5+ W If redM-7)/(W If redL-1+ W If redM-1+ W If redM-3);
In color Dynamic Selection link, relatively at different levels times signal intensity summations through verifying under the different wave length radiation situation finally select for use the big color of signal intensity summation to carry out final alignment position calculation (concrete comparative approach sees that CN09471.1 is said)
Calculate the final alignment position.
Embodiment three:
Alignment system selects the form of slightly catching to obtain aligned position (in aligned position computation process, adopting the level of two different cycles time to aim at calculating) in aiming at strategy in the present embodiment; The superfluous fault reason of use mechanism under the inferior situation about not passing through of level is being used in permission to some extent; In the static weight setting up procedure, select L-1, M-1, M-3, M-5, M-7 to participate in the calculating of aligned position, the signal intensity of its selected level time setting is S If greenL-1, S If greenM-1, S If greenM-3, S If GreenM-5, S If greenM-7, S If redL-1, S If redM-1, S If redM-3, S If redM-5, S If redM-7It is W that the aligned position of corresponding selected level time setting calculates weight If greenL-1, W If greenM-1, W If greenM-3, W If greenM-5, W If greenM-7, W If redL-1, W If redM-1, W If redM-3, W If redM-5, W If redM-7At different levels the signals that the participation that (Weight representes that aligned position calculates weight) obtains at different levels times that participate under the light sources with different wavelengths radiation situation that is provided with aiming at signal intensities and actual test is aimed at compare can know S If greenL-1<S Survey greenL-1, S If greenM-1>S Survey greenM-1, S If greenM-3<S Survey greenM-3, S If greenM-5<S Survey greenM-5, S If greenM-7>S Survey greenM-7, S If redL-1<S Survey redL-1, S If redM-1<S Survey redM-1, S If redM-3<S Survey redM-3, S If redM-5>S Survey redM-5, S If redM-7>S Survey redM-7Can recognize under the situation of using the green light source irradiation that through contrast the one-level light in size cycle and seven grades of actual signal intensities that record of light do not reach the strength range of setting in the mark; Use under the situation of red light source irradiation, the Pyatyi light in size cycle and seven grades of actual signal intensities that record of light do not reach the strength range of setting in the mark.
Set in the present embodiment and use superfluous fault reason; Because superfluous fault reason mechanism is to handle respectively at different levels signals of the light source of different wave length; So sentence green glow is example; Whether the number of at first checking the level time light of the participation alignment applications that satisfies the setting signal requirement of strength is zero, through detection, non-vanishing; Secondly because form is slightly caught in employing, the one-level light signal that needs the different size cycle participates in aiming at, through detecting; In the signal of the actual acquisition of L-1 and M-1, L-1 intensity is greater than set signal strength range, and is up to standard; Meet the demands; But M-1 intensity is below standard less than set signal strength range, so stop this time aiming at.
Embodiment four:
Alignment system selects the form of slightly catching to obtain aligned position (in aligned position computation process, adopting the level of two different cycles time to aim at calculating) in aiming at strategy in the present embodiment; The non-superfluous fault reason mechanism of use under the inferior situation about not passing through of level is being used in permission to some extent; In the static weight setting up procedure, select L-1, M-1, M-3, M-5, M-7 to participate in the calculating of aligned position, the signal intensity of its selected level time setting is S If greenL-1, S If greenM-1, S If greenM-3, S If greenM-5, S If greenM-7, S If redL-1, S If redM-1, S If redM-3, S If redM-5, S If redM-7It is W that the aligned position of corresponding selected level time setting calculates weight If greenL-1, W If greenM-1, W If greenM-3, W If greenM-5, W If greenM-7, W If redL-1, W If redM-1, W If redM-3, W If redM-5, W If redM-7At different levels the signals that the participation that (Weight representes that aligned position calculates weight) obtains at different levels times that participate under the light sources with different wavelengths radiation situation that is provided with aiming at signal intensities and actual test is aimed at compare can know S If greenL-1<S Survey greenL-1, S If greenM-1>S Survey greenM-1, S If greenM-3<S Survey greenM-3, S If greenM-5<S Survey greenM-5, S If greenM-7>S Survey greenM-7, S If redL-1<S Survey redL-1, S If redM-1<S Survey redM-1, S If redM-3<S Survey redM-3, S If redM-5>S Survey redM-5, S If redM-7>S Survey redM-7
Can recognize under the situation of using the green light source irradiation that through contrast the one-level light in size cycle and seven grades of actual signal intensities that record of light do not reach the strength range of setting in the mark; Use under the situation of red light source irradiation, the Pyatyi light in size cycle and seven grades of actual signal intensities that record of light do not reach the strength range of setting in the mark.
Superfluous fault reason is used in setting in the present embodiment, thus do not satisfy the aligned position calculation requirement because level is inferior, so stop this aligning.
Accompanying drawing 4 is process flow diagrams of alignment methods involved in the present invention.This alignment methods mainly may further comprise the steps:
S101-is provided with slightly-and essence catches.Aim at thick smart capture range setting, being provided with of this scope combines aligning to need to obtain aligned position in a big way and more among a small circle.This thick capture range refers in a big way, get aligned position and need use the one-level light source information of two different cycles sizes of same mark to aim at.Smart capture range refers in more among a small circle, use the arbitrary number of level secondary reflection light source information of the same one-period of same mark to aim at.Select for use different cycles can in different range, obtain aligned position, when selecting L for use, M can obtain the aligning scope according to the method for lowest common multiple in the time of two cycles, when only selecting one-period for use, then in the one-period scope, can obtain aligned position.
Accomplishing thick essence catches to be provided with and gets into weight setting step S201 behind the S101.Usually, weight setting had both comprised that static weight is set with changeable weight to be set, in this embodiment, with wherein a kind of of introduction in detail---static weight setting means S201.
Static weight is set and is comprised, is provided with the inferior and certain signal strength threshold scope of the level that need select for use; And at different levels set-up and calculated weights; Check whether inferior actual signal intensity at different levels satisfy the requirement of setting threshold, pass through like affirmation up to standard, and this level time weight is effective;
All efficiency confirmed for a level time signal intensity of under the static weight set-up mode, aiming at like selected participation, needs the superfluous mismatch formula of branch and two kinds of situations of non-superfluous mismatch formula to handle;
All efficiency confirmed for a level time signal intensity of under the static weight set-up mode, aiming at like selected participation, and under superfluous mismatch formula, under thick capture range and the smart capture range condition, processing links there are differences
All efficiency confirmed for a level time signal intensity of under the static weight set-up mode, aiming at like selected participation, and in superfluous mismatch formula, check under the thick capture range condition whether the level time number through checking is zero (need possess), as be zero, then stops superfluous fault reason; The one-level time only not available (needing available) of required different cycles is caught in inspection, as unavailable, then stops superfluous fault reason; After satisfying above-mentioned condition, discard to fall previous selection but through the checking the level time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.Do not possess weighted value senior time like each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.
All efficiency confirmed for a level time signal intensity of under the static weight set-up mode, aiming at like selected participation, and in superfluous mismatch formula, whether grade time number of looking under the smart capture range condition through checking is zero (need possess), as is zero, then stops superfluous fault reason; After satisfying above-mentioned condition, discard to fall previous selection but through the checking the level time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.Do not possess weighted value senior time like each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.
All efficiency confirmed for a level time signal intensity of under the static weight set-up mode, aiming at like selected participation, and under non-superfluous mismatch formula, stop aligning this time, announces to aim at failure, promptly gets into S401.
The entering color selected to be provided with the S301 step to obtain aligned position S402 after the completion static weight was provided with S201.Continue to continue to use technical scheme of the prior art because color selects that S301 is set, the exposure concrete grammar of this part technological means is held within disclosed referring to CN09471.1.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to explain technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within scope of the present invention under this invention's idea through the available technical scheme of logical analysis, reasoning, or a limited experiment.

Claims (26)

1. alignment system based on multi-wavelength; Comprise: the aligning radiation source of at least two wavelength is provided, optical unit, alignment mark, probe unit and processing unit; It is characterized in that; Said processing unit obtains the said whole level time signals that are marked under the different radiation source irradiates, set slightly catch and smart capture range after said whole level time signals are carried out the weight setting of alignment stage time, and calculate and participate in the level time weight that aligned position calculates; Select slightly catching and smart capture range of setting and setting according to weight setting, color, calculate aligned position.
2. the alignment system based on multi-wavelength as claimed in claim 1 is characterized in that, said alignment mark comprises binary cycle mark or three cycle marks.
3. the alignment system based on multi-wavelength as claimed in claim 1 is characterized in that, said aligning radiation source comprises red laser light source and green laser light source.
4. the alignment system based on multi-wavelength as claimed in claim 1 is characterized in that, said thick capture range refers to that the aligned position in a big way need use the one-level light source information of two different cycles sizes of same mark to aim at.
5. the alignment system based on multi-wavelength as claimed in claim 1 is characterized in that, said smart capture range refers in more among a small circle, use the arbitrary number of level secondary reflection light source information of the same one-period of same mark to aim at.
6. the alignment system based on multi-wavelength as claimed in claim 1 is characterized in that said weight is set to the static weight setting.
7. the alignment system based on multi-wavelength as claimed in claim 6; It is characterized in that; Said static weight setting comprises the level that need select for use time and certain signal strength threshold scope is set, and at different levels set-up and calculated weights, check whether inferior actual signal intensity at different levels satisfy the requirement of setting threshold; Pass through like affirmation up to standard, this level time weight is effective; If number up to standard, then gets into superfluous mistake and non-superfluous wrong two kinds of mechanism less than the number of selecting for use that sets.
8. the alignment system based on multi-wavelength as claimed in claim 7 is characterized in that, further comprises after the superfluous wrong mechanism of said entering judging whether to belong to thick capture range or smart capture range.
9. the alignment system based on multi-wavelength as claimed in claim 8 is characterized in that, whether said thick capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; Check that the one-level of catching required different cycles is inferior only not available,, then stop superfluous fault reason as unavailable; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.
10. the alignment system based on multi-wavelength as claimed in claim 9; It is characterized in that; Processing under the said thick capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.
11. the alignment system based on multi-wavelength as claimed in claim 8 is characterized in that, whether said smart capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.
12. the alignment system based on multi-wavelength as claimed in claim 11; It is characterized in that; Processing under the said smart capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.
13. the alignment system based on multi-wavelength as claimed in claim 7 is characterized in that, after the non-superfluous wrong mechanism of said entering, all efficiency confirmed stops this time to aim at for a level time signal intensity of aiming at like selected participation, announces to aim at failure.
14. alignment methods based on multi-wavelength; It is characterized in that; Obtain the whole level time signals of alignment mark under different radiation source irradiates; Set slightly catch and smart capture range after said whole level time signals are carried out the weight setting of alignment stage time, and calculate and participate in the level time weight that aligned position calculates; Select slightly catching and smart capture range of setting and setting according to weight setting, color, calculate aligned position.
15. the alignment methods based on multi-wavelength as claimed in claim 14 is characterized in that, said alignment mark comprises binary cycle mark or three cycle marks.
16. the alignment methods based on multi-wavelength as claimed in claim 14 is characterized in that, said aligning radiation source comprises red laser light source and green laser light source.
17. the alignment methods based on multi-wavelength as claimed in claim 14 is characterized in that, said thick capture range refers to that aligned position need use the one-level light source information of two different cycles sizes of same mark to aim in a big way.
18. the alignment methods based on multi-wavelength as claimed in claim 14 is characterized in that, said smart capture range refers in more among a small circle, use the arbitrary number of level secondary reflection light source information of the same one-period of same mark to aim at.
19. the alignment methods based on multi-wavelength as claimed in claim 14 is characterized in that said weight is set to the static weight setting.
20. the alignment methods based on multi-wavelength as claimed in claim 19; It is characterized in that; Said static weight setting comprises the level that need select for use time and certain signal strength threshold scope is set, and at different levels set-up and calculated weights, check whether inferior actual signal intensity at different levels satisfy the requirement of setting threshold; Pass through like affirmation up to standard, this level time weight is effective; If number up to standard, then gets into superfluous mistake and non-superfluous wrong two kinds of mechanism less than the number of selecting for use that sets.
21. the alignment methods based on multi-wavelength as claimed in claim 20 is characterized in that, further comprises after the superfluous wrong mechanism of said entering judging whether to belong to thick capture range or smart capture range.
22. the alignment methods based on multi-wavelength as claimed in claim 21 is characterized in that, whether said thick capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; Check that the one-level of catching required different cycles is inferior only not available,, then stop superfluous fault reason as unavailable; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.
23. the alignment methods based on multi-wavelength as claimed in claim 22; It is characterized in that; Step under the said thick capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.
24. the alignment methods based on multi-wavelength as claimed in claim 21 is characterized in that, whether said smart capture range inspection down is zero, as be zero through the inferior number of the level of checking, then stops superfluous fault reason; After satisfying above-mentioned condition, abandon previous selection but the level through checking time; Weight proportion is recomputated in time weight setting of inspection residue level at different levels times.
25. the alignment methods based on multi-wavelength as claimed in claim 24; It is characterized in that; Step under the said smart capture range further comprises: do not possess weighted value like the senior inferior of each cycle acquisition, then the one-level light weight in each cycle is set to 1, calculates aligned position.
26. the alignment methods based on multi-wavelength as claimed in claim 20 is characterized in that, after the non-superfluous wrong mechanism of said entering, all efficiency confirmed stops this time to aim at for a level time signal intensity of aiming at like selected participation, announces to aim at failure.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI579662B (en) * 2015-10-05 2017-04-21 A multi-channel alignment system based on spectrum processing, an alignment signal processing method and a photolithography apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5801390A (en) * 1996-02-09 1998-09-01 Nikon Corporation Position-detection method and apparatus with a grating mark
CN101158821A (en) * 2007-08-31 2008-04-09 上海微电子装备有限公司 Aligning mark, alignment method and aligning system
CN101571679A (en) * 2009-06-09 2009-11-04 上海微电子装备有限公司 Aligning system based on dual light sources and multilevel and aligning method thereof
CN101634815A (en) * 2009-08-31 2010-01-27 上海微电子装备有限公司 Alignment method based on a plurality of different wavelengths

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5801390A (en) * 1996-02-09 1998-09-01 Nikon Corporation Position-detection method and apparatus with a grating mark
CN101158821A (en) * 2007-08-31 2008-04-09 上海微电子装备有限公司 Aligning mark, alignment method and aligning system
CN101571679A (en) * 2009-06-09 2009-11-04 上海微电子装备有限公司 Aligning system based on dual light sources and multilevel and aligning method thereof
CN101634815A (en) * 2009-08-31 2010-01-27 上海微电子装备有限公司 Alignment method based on a plurality of different wavelengths

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI579662B (en) * 2015-10-05 2017-04-21 A multi-channel alignment system based on spectrum processing, an alignment signal processing method and a photolithography apparatus

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