CN102732942A - Preparation method of self-supporting crack-free photonic crystal - Google Patents
Preparation method of self-supporting crack-free photonic crystal Download PDFInfo
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Abstract
The invention relates to a preparation method of a self-supporting crack-free photonic crystal, in particular to a preparation method of self-supporting crack-free opal structured photonic crystal and self-supporting crack-free inverse opal structured photonic crystal. By the adoption of a method for depositing monodisperse emulsion particles on a hydrophobic surface by the gravity of the emulsion particles, preparation of the self-supporting crack-free photonic crystal can be simply realized. The prepared self-supporting crack-free photonic crystal can be further used as a sacrificial template to prepare the self-supporting crack-free inverse opal structured photonic crystal. The preparation method provided by the invention requires low cost, is simple to operate, is green and environmentally friendly, and has good universality. In addition, the prepared photonic crystal has advantages of no crack, self-supporting, excellent optical performance and the like. The preparation method can be actually used in the fields of high-performance optical devices, chemistry, biochemical detection and the like.
Description
Technical field
The present invention relates to the preparation method of self-supporting flawless photonic crystal, particularly the preparation method of self-supporting flawless opal structural photonic crystal and self-supporting flawless photonic crystal with inverse opal structure.
Background technology
Photonic crystal is since 1987 come out, because its special light regulation and control performance has a wide range of applications in fields such as optics, electronics, chemistry, biological chemistries.Utilize chemical self-assembling method to prepare photonic crystal and have low, the simple operation and other advantages of cost, thereby attracted the research interest of researcher.But; Preparing with chemical self-assembling method in the process of photonic crystal; Latex particle in the end shrinks in the drying process; And the viscous force between latex particle and the base material has prevented that it from shrinking, and the tensile stress that is therefore produced can cause and have serious crackle in the prepared crystal film with photon.The generation of these inevitable crackles has limited the application of photonic crystal in reality.For head it off, scientists has been carried out certain previous work, as assisting self-assembly (C.J.Jin through the employing template; N.P.Johnson, Nano Lett.2005,5; 2646-2650), before self-assembly with emulsion particle high temperature preshrinking (D.J.Norris, Appl.Phys.Lett.2004,84; 3573-3575) and avoid dry (T.Sawada, Adv.Funct.Mater.2005,25; T.Sawada, Langmuir 2009,13315) etc. method be used for preventing that emulsion particle from shrinking, avoid the generation of crackle with this; Or through be employed in the fluid surface self-assembly (Zentel R., Chem.Mater.2002,14,4023-402) and the particular matter inductive change (B.Hatton to the low bulk density crystal face; L.Mishchenko, S.Davis, K.H.Sandhage; J.Aizenberg, PNAS, 107; 23,10355) method is shunk the emulsion particle isotropy, the problem of having avoided photonic crystal in the preparation process, to cause crackle to produce thus.But some deficiency below existing in the above-mentioned preparation process: 1. prepared product can only be avoided the generation of crackle on some low bulk density crystal face, and other high-bulk-density crystal face still has crackle; 2. preparation cost is high, and process is loaded down with trivial details; 3. preparation process is seriously polluted, and hidden danger is arranged; 4. the preparation method only is applicable to certain colloidal particle, does not have universality.In order further to promote the practical application of photonic crystal, more low-cost, easier, safe, green preparation method is the direction that researcher is made great efforts always.The present invention is through being gravitationally deposited at emulsion particle on the super-hydrophobic base material; Prepare big area, self-supporting, flawless photonic crystal; Method of the present invention is easy and simple to handle, environmental protection, universality are good, and is significant to the practical application that promotes photonic crystal.
Summary of the invention
The purpose of this invention is to provide the good self-supporting flawless opal structural photonic crystal of a kind of easy and simple to handle, with low cost, environmental protection, universality and the preparation method of photonic crystal with inverse opal structure.
The preparation method of self-supporting flawless photonic crystal of the present invention is: single dispersed latex grain is mixed forming emulsion with water; In temperature is 5～95 ℃; Humidity is under 5%～95% the condition; Resulting emulsion is placed the surface of hydrophobic substrates, leans on the gravity of single dispersed latex grain self described in the emulsion to deposit, just can be easy prepare the self-supporting flawless opal structural photonic crystal that forms by described single dispersed latex grain assembling.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; After filling functional substance in the gap between single dispersed latex grain of described conduct sacrifice template; Further remove described sacrifice template again, can also prepare self-supporting flawless photonic crystal with inverse opal structure.
Described method of in as the gap between single dispersed latex grain of sacrificing template, filling functional substance be selected from drip be coated with, dip-coating, electrochemical deposition, chemical vapour deposition and lift a kind of in the completion method.
The described removal sacrifice method that template adopted is selected from one or more in calcining, organic solvent (as: toluene or THF etc.) dissolving and the hydrofluoric acid dissolution method.Preferably 160 ℃～600 ℃ of described calcining temperatures.
Described hydrophobic substrates is the plastics with contact angle >=90 of water °; Described plastics preferably are selected from a kind of in YSR 3286, urethane, Vilaterm, SE and the PS etc., or with the base material of above-mentioned plastic covered, the glass that covers like urethane etc.; Or in perfluor silane steam the base material of that placed and contact angle water >=90 °, like ito glass of in perfluor silane steam, placing etc.; Or the base material of organic oil covering, described organic oil is whiteruss or silicone oil; Like the glass that whiteruss covers, the silicon chip that silicone oil covers etc.
Described single dispersed latex grain is the known available product, and its particle diameter is 80～1100nm; Be selected from the monodisperse polystyrene emulsion particle, single disperse the polymethylmethacrylate emulsion particle, singly disperse to gather a kind of in (vinylbenzene-TEB 3K-vinylformic acid) polyalcohol emulsion particle and the monodisperse silica emulsion particle.
The massfraction of described single dispersed latex grain in emulsion is 0.01～30wt%, and other is a water.
The photon band gap of the self-supporting flawless opal structural photonic crystal that preparation method of the present invention obtains is between 200～2600nm; The photonic crystal of described self-supporting flawless opal structural is selected from PS, polymethylmethacrylate, gather a kind of in (vinylbenzene-TEB 3K-vinylformic acid) and the silicon-dioxide opal structural photonic crystal.
Described functional substance is a kind of in presoma, polymer monomer or the polymkeric substance of colloidal sol, preparation solid simple substance of inorganic oxide.
Described inorganic oxide sol is selected from SiO
2Colloidal sol, TiO
2A kind of in colloidal sol and the ZnO colloidal sol etc.; The presoma of described preparation solid simple substance be selected from preparation Si the presoma silicoethane, a kind of in the presoma sucrose of preparation C and the presoma digermane etc. of preparation Ge; Described polymer monomer is pyrroles etc.; Described polymkeric substance is epoxy resin or resol etc.
The photon band gap of the self-supporting flawless photonic crystal with inverse opal structure that preparation method of the present invention obtains is between 150～2500nm; Described self-supporting flawless photonic crystal with inverse opal structure is an inorganic oxide, is selected from SiO
2, TiO
2A kind of with among ZnO etc.; Perhaps described self-supporting flawless photonic crystal with inverse opal structure is a solid simple substance, is selected from a kind of among Si, C and the Ge etc.; Perhaps described self-supporting flawless photonic crystal with inverse opal structure is a polymkeric substance, is selected from a kind of in polypyrrole, epoxy resin and the resol etc.
Advantage such as that preparation method of the present invention has is with low cost, easy and simple to handle, environmental protection, universality are good.In addition; The self-supporting flawless photonic crystal that obtains by the present invention; Because crystal face (111) face is the crystal face that is easy to generate crackle most; There is not crackle fully in (111) face at the high-bulk-density of the prepared self-supporting flawless photonic crystal of the present invention, can guarantee that thus there is not crackle in all crystal faces in prepared self-supporting flawless photonic crystal.Because avoided the diffuse-reflectance effect of crackle, thereby the reflection spectrum of prepared photonic crystal is narrowed, the peak improves by force, has improved the optical property of self-supporting flawless photonic crystal thus.Prepared flawless photonic crystal can self-supporting, does not have the substrate of being depended on.The advantage of above-mentioned this three aspect can promote the practical application of photonic crystal at aspects such as high efficient optical device, integrated optical circuit field and highly sensitive fluorescence detectors.
Description of drawings
Fig. 1. the embodiment of the invention 4 at the hydride modified glass surface of perfluor, single disperse to gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle deposits the self-supporting flawless opal structural photonic crystal for preparing by self gravitation digital photograph.
Fig. 2. the embodiment of the invention 4 at the hydride modified glass surface of perfluor, it is single that to disperse to gather magnification that (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle deposits the self-supporting flawless opal structural photonic crystal for preparing by self gravitation be 20000 times stereoscan photograph.
Fig. 3. the embodiment of the invention 4 at the hydride modified glass surface of perfluor, it is single that to disperse to gather magnification that (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle deposits the self-supporting flawless opal structural photonic crystal for preparing by self gravitation be 50 times stereoscan photograph.
Fig. 4. the embodiment of the invention 4 on the hydride modified glass surface of perfluor surface, singly disperse to gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle deposits the self-supporting flawless opal structural photonic crystal for preparing by self gravitation reflection spectrum.
Embodiment
Embodiment 1.
With particle diameter is that the list of 80nm disperses to gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle ultra-sonic dispersion in water; Form emulsion (concentration of emulsion is 0.01wt%); Is that 5 ℃, humidity are the surface (contact angle of sheet material and water is 91 °) that places YSR 3286 sheet material under 5% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain on the surface of YSR 3286 sheet material by described single self-supporting flawless opal structural photonic crystal that photon band gap that the assembling of (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle forms is positioned at 200nm that disperses to gather.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template, with SiO
2Colloidal sol drips to be coated in and describedly gathers in the gap between (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle as the list dispersion of sacrificing template; Under 500 ℃, calcine; Remove described single the dispersion and gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle, must arrive the self-supporting flawless SiO that the forbidden band is positioned at 150nm
2Photonic crystal with inverse opal structure.
Embodiment 2.
With particle diameter is that the list of 1100nm disperses to gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle ultra-sonic dispersion in water; Form emulsion (concentration of emulsion is 30wt%); Is that 95 ℃, humidity are the surface (contact angle of sheet material and water is 100 °) that places the hydrophobic sheet material of urethane under 95% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain on the surface of polyurethane plate by described single self-supporting flawless opal structural photonic crystal that photon band gap that the assembling of (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle forms is positioned at 2600nm that disperses to gather.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template, with TiO
2Colloidal sol disperses to gather in the gap between (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle as the list of sacrificing template to described with the method for pulling up full-filling; Under 500 ℃, calcine; Remove described single the dispersion and gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle, must arrive the self-supporting flawless TiO that the forbidden band is positioned at 2500nm
2Photonic crystal with inverse opal structure.
Embodiment 3.
With particle diameter is that the monodisperse polystyrene emulsion particle ultra-sonic dispersion of 1100nm is in water; Form emulsion (concentration of emulsion is 30wt%); Is that 60 ℃, humidity are the surface (contact angle of sheet material and water is 130 °) that places polyethylene board under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain being positioned at the self-supporting flawless opal structural photonic crystal of 2600nm on the surface of polyethylene board by the photon band gap that described monodisperse polystyrene emulsion particle assembling forms.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template, with TiO
2Colloidal sol is calcined under 500 ℃ as in the gap between the monodisperse polystyrene emulsion particle of sacrificing template to described with the method for pulling up full-filling, removes described monodisperse polystyrene emulsion particle, must arrive the self-supporting flawless TiO that the forbidden band is positioned at 2500nm
2Photonic crystal with inverse opal structure.
Embodiment 4.
With particle diameter is that the list of 250nm disperses to gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle ultra-sonic dispersion in water; Form emulsion (concentration of emulsion is 20wt%); Is that 60 ℃, humidity are the glass surface (contact angle of base material and water is 120 °) that places whiteruss to cover under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, the glass surface that covers at whiteruss obtains by described single self-supporting flawless opal structural photonic crystal that photon band gap that the assembling of (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle forms is positioned at 712nm that disperses to gather.Like Fig. 1-shown in Figure 4.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; ZnO colloidal sol dripped to be coated onto describedly gather in the gap between (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle as the list dispersion of sacrificing template; Under 450 ℃, calcine; Remove described single the dispersion and gather (vinylbenzene-TEB 3K-vinylformic acid) emulsion particle, must arrive the self-supporting flawless ZnO photonic crystal with inverse opal structure that the forbidden band is positioned at 530nm.
Embodiment 5.
With particle diameter is that single polymethylmethacrylate emulsion particle ultra-sonic dispersion that disperses of 300nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are the surface (contact angle of sheet material and water is 100 °) that places polyvinyl-chloride plate material under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain being positioned at the self-supporting flawless opal structural photonic crystal of 780nm on the surface of polyvinyl-chloride plate material by described single photon band gap that disperses the assembling of polymethylmethacrylate emulsion particle to form.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; To contain the presoma of the aqueous sucrose solution of concentrated sulfuric acid catalyst as preparation carbon; Method with dip-coating is filled into described as in single gap that disperses between the polymethylmethacrylate emulsion particle of sacrificing template; After calcining under 180 ℃; And, must arrive the self-supporting flawless carbon photonic crystal with inverse opal structure that the forbidden band is positioned at 540nm further with the single polymethylmethacrylate emulsion particle that disperses of toluene dissolving.
Embodiment 6.
With particle diameter is that the monodisperse silica emulsion particle ultra-sonic dispersion of 720nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are the surface (contact angle of sheet material and water is 100 °) that places polyvinyl-chloride plate material under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain being positioned at the self-supporting flawless opal structural photonic crystal of 1850nm on the surface of polyvinyl-chloride plate material by described single photon band gap that disperses the assembling of polymethylmethacrylate emulsion particle to form.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; The method of heat-reactive phenolic resin with dip-coating is filled in described single gap that disperses between the polymethylmethacrylate emulsion particle as the sacrifice template; After calcining curing under 160 ℃; And further fall the monodisperse silica emulsion particle with hydrofluoric acid dissolution, must arrive the self-supporting flawless phenolic resin photonic crystal with inverse opal structure that the forbidden band is positioned at 1600nm.
Embodiment 7.
With particle diameter is that single polymethylmethacrylate emulsion particle ultra-sonic dispersion that disperses of 440nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are to place the hydride modified ito glass surface (contact angle of base material and water is 150 °) of perfluor under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain being positioned at the self-supporting flawless opal structural photonic crystal of 1100nm on the hydride modified ito glass surface of perfluor by described single photon band gap that disperses the assembling of polymethylmethacrylate emulsion particle to form.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; The method of pyrrole monomer with electrochemical deposition is filled in described single gap that disperses between the polymethylmethacrylate emulsion particle as the sacrifice template; Dissolve single polymethylmethacrylate emulsion particle that disperses with THF then, must arrive the self-supporting flawless polypyrrole photonic crystal with inverse opal structure that the forbidden band is positioned at 550nm.
Embodiment 8.
With particle diameter is that single polymethylmethacrylate emulsion particle ultra-sonic dispersion that disperses of 440nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are the surface (contact angle of sheet material and water is 100 °) that places polystyrene plates under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain being positioned at the self-supporting flawless opal structural photonic crystal of 1100nm on the surface of polystyrene plates by described single photon band gap that disperses the assembling of polymethylmethacrylate emulsion particle to form.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; Method with dip-coating; Epoxy resin is filled into described as in single gap that disperses between the polymethylmethacrylate emulsion particle of sacrificing template; After 160 ℃ of calcinings, further dissolve single polymethylmethacrylate emulsion particle that disperses with THF, must arrive the self-supporting flawless epoxy resin photonic crystal with inverse opal structure that the forbidden band is positioned at 550nm.
Embodiment 9.
With particle diameter is that single polymethylmethacrylate emulsion particle ultra-sonic dispersion that disperses of 440nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are the glass surface (contact angle of base material and water is 108 °) that places urethane to cover under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, the glass surface that covers at urethane obtains being positioned at by described single photon band gap that disperses the assembling of polymethylmethacrylate emulsion particle to form the self-supporting flawless opal structural photonic crystal of 1100nm.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; Method with dip-coating; Heat-reactive phenolic resin is filled into described as in single gap that disperses between the polymethylmethacrylate emulsion particle of sacrificing template; After 160 ℃ of calcining polymerizations, further dissolve single polymethylmethacrylate emulsion particle that disperses with THF, must arrive the self-supporting flawless resol photonic crystal with inverse opal structure that the forbidden band is positioned at 550nm.
Embodiment 10.
With particle diameter is that the monodisperse silica emulsion particle ultra-sonic dispersion of 440nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are the silicon chip surface (contact angle of base material and water is 108 °) that places silicone oil to cover under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, the silicon chip surface that covers at silicone oil obtains being positioned at by the photon band gap that described monodisperse silica emulsion particle assembling forms the self-supporting flawless opal structural photonic crystal of 1100nm.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; Method with chemical vapour deposition; Deposit to the presoma silicoethane of preparation Si described as in the gap between the monodisperse silica emulsion particle of sacrificing template; After 600 ℃ of calcining polymerizations, further dissolve the monodisperse silica emulsion particle with THF, must arrive the self-supporting flawless Si photonic crystal with inverse opal structure that the forbidden band is positioned at 550nm.
Embodiment 11.
With particle diameter is that the monodisperse silica emulsion particle ultra-sonic dispersion of 440nm is in water; Form emulsion (concentration of emulsion is 5wt%); Is that 40 ℃, humidity are the surface (contact angle of sheet material and water is 100 °) that places polyvinyl-chloride plate material under 60% the condition with resulting emulsion in temperature; Lean on self gravity of said single dispersed latex grain to deposit, obtain being positioned at the self-supporting flawless opal structural photonic crystal of 1100nm on the surface of polyvinyl-chloride plate material by the photon band gap that described monodisperse silica emulsion particle assembling forms.
With the above-mentioned self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; Method with chemical vapour deposition; Deposit to the presoma digermane of preparation Ge described as in the gap between the monodisperse silica emulsion particle of sacrificing template; After 300 ℃ of calcining polymerizations, further dissolve the monodisperse silica emulsion particle with THF, must arrive the self-supporting flawless Ge photonic crystal with inverse opal structure that the forbidden band is positioned at 550nm.
Claims (10)
1. the preparation method of a self-supporting flawless photonic crystal; It is characterized in that: single dispersed latex grain is mixed forming emulsion with water; In temperature is 5～95 ℃, and humidity is under 5%～95% the condition, resulting emulsion is placed the surface of hydrophobic substrates; Lean on the gravity of single dispersed latex grain self described in the emulsion to deposit, obtain the self-supporting flawless opal structural photonic crystal that forms by described single dispersed latex grain assembling.
2. preparation method according to claim 1 is characterized in that: the photon band gap of described self-supporting flawless opal structural photonic crystal is between 200～2600nm; The photonic crystal of described self-supporting flawless opal structural is selected from PS, polymethylmethacrylate, gather a kind of in (vinylbenzene-TEB 3K-vinylformic acid) and the silicon-dioxide opal structural photonic crystal.
3. preparation method according to claim 1 and 2; It is characterized in that: with the self-supporting flawless opal structural photonic crystal for preparing as sacrificing template; After filling functional substance in the gap between single dispersed latex grain of described conduct sacrifice template; Further remove described sacrifice template again, prepare self-supporting flawless photonic crystal with inverse opal structure;
Described functional substance is a kind of in presoma, polymer monomer or the polymkeric substance of colloidal sol, preparation solid simple substance of inorganic oxide.
4. preparation method according to claim 3 is characterized in that: described method of in as the gap between single dispersed latex grain of sacrificing template, filling functional substance be selected from drip be coated with, dip-coating, electrochemical deposition, chemical vapour deposition and lift a kind of in the completion method;
The described removal sacrifice method that template adopted is selected from one or more in calcining, organic solvent dissolution and the hydrofluoric acid dissolution method.
5. preparation method according to claim 4 is characterized in that: described organic solvent is toluene or THF;
Described calcining temperature is 160 ℃～600 ℃.
6. preparation method according to claim 3 is characterized in that: described inorganic oxide sol is selected from SiO
2Colloidal sol, TiO
2A kind of in colloidal sol and the ZnO colloidal sol; The presoma of described preparation solid simple substance be selected from the preparation Si the presoma silicoethane, the preparation C presoma sucrose and the preparation Ge the presoma digermane in a kind of; Described polymer monomer is the pyrroles; Described polymkeric substance is epoxy resin or resol;
The photon band gap of described self-supporting flawless photonic crystal with inverse opal structure is between 150～2500nm; Described self-supporting flawless photonic crystal with inverse opal structure is an inorganic oxide, is selected from SiO
2, TiO
2A kind of with among the ZnO; Perhaps described self-supporting flawless photonic crystal with inverse opal structure is a solid simple substance, is selected from a kind of among Si, C and the Ge; Perhaps described self-supporting flawless photonic crystal with inverse opal structure is a polymkeric substance, is selected from a kind of in polypyrrole, epoxy resin and the resol.
7. preparation method according to claim 1 is characterized in that: described hydrophobic substrates is the plastics with contact angle >=90 of water °; Or in perfluor silane steam the base material of that placed and contact angle water >=90 °; Or the base material of organic oil covering.
8. preparation method according to claim 7 is characterized in that: the plastics of the contact angle of described hydrophobic substrates and water >=90 ° are selected from a kind of in YSR 3286, urethane, Vilaterm, SE and the PS;
Described in perfluor silane steam the base material of that placed and contact angle water >=90 ° be the ito glass of in perfluor silane steam, placing;
Described organic oil is whiteruss or silicone oil.
9. preparation method according to claim 1 is characterized in that: the massfraction of described single dispersed latex grain in emulsion is 0.01～30wt%, and other is a water.
10. according to claim 1,4 or 9 described preparing methods, it is characterized in that: the particle diameter of described single dispersed latex grain is 80～1100nm; Be selected from the monodisperse polystyrene emulsion particle, single disperse the polymethylmethacrylate emulsion particle, singly disperse to gather a kind of in (vinylbenzene-TEB 3K-vinylformic acid) polyalcohol emulsion particle and the monodisperse silica emulsion particle.
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| CN102409403A (en) * | 2011-11-14 | 2012-04-11 | 中国科学院化学研究所 | Preparation method of self-supporting monocrystal photonic crystal |
| WO2014154148A1 (en) * | 2013-03-28 | 2014-10-02 | 中国科学院化学研究所 | Preparation method and use of color saturation variable photonic crystal material |
| CN104611762A (en) * | 2014-12-19 | 2015-05-13 | 江南大学 | Crack-free colloidal crystal, crack-free inverse colloidal crystal and preparing method of the crack-free colloidal crystal and the crack-free inverse colloidal crystal |
| CN105177714A (en) * | 2015-07-16 | 2015-12-23 | 河北师范大学 | Morphology-controllable and color angle-independent photonic crystal particle and preparation method thereof |
| CN105887181A (en) * | 2016-06-02 | 2016-08-24 | 东华大学 | Preparation method of large-area crack-free photonic crystal |
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| CN110983424A (en) * | 2019-11-19 | 2020-04-10 | 上海交通大学 | Method for preparing large-area crack-free thick film photonic crystal on porous substrate |
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| CN110316715A (en) * | 2019-06-28 | 2019-10-11 | 上海交通大学 | A method of metal derived carbon photonic crystal is prepared in situ |
| CN110316715B (en) * | 2019-06-28 | 2022-08-23 | 上海交通大学 | Method for in-situ preparation of metal-derived carbon-based photonic crystal |
| CN110983424A (en) * | 2019-11-19 | 2020-04-10 | 上海交通大学 | Method for preparing large-area crack-free thick film photonic crystal on porous substrate |
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