CN102886329A - Mist generator and cosmetic device - Google Patents
Mist generator and cosmetic device Download PDFInfo
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- CN102886329A CN102886329A CN2012102356223A CN201210235622A CN102886329A CN 102886329 A CN102886329 A CN 102886329A CN 2012102356223 A CN2012102356223 A CN 2012102356223A CN 201210235622 A CN201210235622 A CN 201210235622A CN 102886329 A CN102886329 A CN 102886329A
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- Prior art keywords
- mist
- liquid film
- liquid
- input power
- vibration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
- B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
- B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
- B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
- B05B17/0638—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced by discharging the liquid or other fluent material through a plate comprising a plurality of orifices
- B05B17/0646—Vibrating plates, i.e. plates being directly subjected to the vibrations, e.g. having a piezoelectric transducer attached thereto
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D34/00—Containers or accessories specially adapted for handling liquid toiletry or cosmetic substances, e.g. perfumes
- A45D34/02—Scent flasks, e.g. with evaporator
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D2200/00—Details not otherwise provided for in A45D
- A45D2200/05—Details of containers
- A45D2200/054—Means for supplying liquid to the outlet of the container
- A45D2200/057—Spray nozzles; Generating atomised liquid
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- A—HUMAN NECESSITIES
- A45—HAND OR TRAVELLING ARTICLES
- A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A45D2200/00—Details not otherwise provided for in A45D
- A45D2200/20—Additional enhancing means
- A45D2200/207—Vibration, e.g. ultrasound
Abstract
Provided is a mist generator and a cosmetic device. The mist generator (3) provided with an oscillation membrane (12) including a porous atomization portion (11). A liquid supply (29) supplies liquid (L) to the atomization portion (11). An oscillation generator (13; 31) oscillates the oscillation membrane (12) and atomizes the liquid supplied to the atomization portion (11). A liquid film eliminator eliminates a liquid film (LF) from a mist discharge surface (12a) of the oscillation membrane (12) by oscillating the oscillation membrane.
Description
Technical field
The present invention relates to mist maker and cosmetic apparatus.
Background technology
Known mist maker is so that comprise the porous oscillating membrane in a plurality of holes and vibrate, so that the atomization of liquid in the hole and generate mist.The 4-207800 Japanese Patent Publication has been described the mist maker that comprises ring piezoelectric oscillator and oscillating membrane, and described oscillating membrane and piezoelectric oscillator link together to cover the central opening of piezoelectric oscillator.Piezoelectric oscillator is efficiently so that comprise the oscillating membrane of atomizing section and vibrate, and described atomizing section is provided with a plurality of holes.Atomizing section covers the central opening of piezoelectric oscillator.
The liquid that is supplied to oscillating membrane can pass described hole, and forms the liquid film that the mist that covers oscillating membrane is discharged the surface.When oscillating membrane vibrated under this situation, mist is discharged may become unstable.
Summary of the invention
The present invention aims to provide the liquid film of eliminating mist discharge surface and makes stable mist maker and the cosmetic apparatus of mist discharging.
One aspect of the invention is a kind of mist maker that is provided with oscillating membrane, described oscillating membrane comprises porous atomizing section.The liquid supply source is with the extremely described atomizing of liquid supply section.The vibration maker it be used for making described oscillating membrane (vibration to occur and make the atomization of liquid that is supplied to described atomizing section.Liquid film is eliminated pattern and is eliminated the liquid film that the mist of described oscillating membrane is discharged the surface by making described oscillating membrane that vibration occur.
Preferably, the oscillation energy of described liquid film elimination pattern using increase vibrates described oscillating membrane (12).
Preferably, described vibration maker) comprise piezoelectric oscillator, the vibration that its generating amplitude and/or frequency are corresponding with the level of described input power, and described liquid film elimination pattern increases the input power that is supplied to described piezoelectric oscillator.
Preferably, described vibration maker) comprises piezoelectric oscillator, the vibration that its generating amplitude and/or frequency are corresponding with the level of described input power, and described liquid film elimination pattern repeats to increase sharp and reduce to be supplied to the input power of described piezoelectric oscillator.
Preferably, described liquid film elimination pattern vibrates described oscillating membrane to be different from the mode that described liquid is atomized.
Preferably, described liquid film elimination pattern vibrates described oscillating membrane to be different from the frequency that described liquid is atomized.
Preferably, described liquid film elimination pattern vibrates described oscillating membrane with lower frequency.
Preferably, the waveform of the vibration of described liquid elimination pattern generation is by making the vibration of eliminating described liquid film and the oscillating phase stack of the described atomization of liquid being obtained.
Preferably, when described mist maker starts, carry out described liquid film and eliminate pattern.
Another aspect of the invention is the cosmetic apparatus that comprises such as the described mist maker in aforementioned aspect.
Of the present invention is a kind of control circuit for control mist maker more on the one hand, and described mist maker makes oscillating membrane that vibration occur and makes the atomization of liquid of the liquid receiving surface that is supplied to described oscillating membrane and discharge described atomized liquid from the mist discharge surface of described oscillating membrane.Described control circuit comprises the memory for storage the first input power setting value and the second input power setting value, the expression of described the first input power setting value generates the first input power of the vibration that is suitable for making the described atomization of liquid, and the expression of described the second input power setting value generates and is suitable for eliminating the second input power of vibration that described mist is discharged the liquid film on surface.Normal mode vibrates described oscillating membrane according to described the first input power setting value.Liquid film is eliminated pattern vibrates described oscillating membrane according to described the second input power setting value.Described control circuit, after described mist maker starts, carry out described liquid film in immediately during controlled and eliminate pattern to eliminate described liquid film, and after carrying out described liquid film elimination pattern, by carrying out normal mode to discharge mist according to the described input power of described the first input power setting value control.
The invention provides the liquid film of eliminating mist discharge surface and make stable mist maker and the cosmetic apparatus of mist discharging.
Description of drawings
Fig. 1 is the stereogram that cosmetic apparatus is shown;
Fig. 2 is the front view that the mist maker is shown;
Fig. 3 is the cutaway view of mist maker;
Fig. 4 is the cutaway view in hole;
Fig. 5 shows the operation of mist maker;
Fig. 6 is the schematic sectional view that the mist maker that is arranged in housing is shown;
Fig. 7 illustrates to be formed on the schematic diagram that mist is discharged lip-deep liquid film;
Fig. 8 is that liquid film is eliminated pattern, switch mode, and the oscillogram of the input power of normal mode among the first embodiment;
Fig. 9 is that liquid film is eliminated pattern, switch mode, and the oscillogram of the input power of normal mode among the second embodiment;
Figure 10 is the oscillogram that liquid film is eliminated the input power of pattern among the 3rd embodiment;
Figure 11 is the schematic diagram of the mist maker of the 4th embodiment;
Figure 12 is that liquid film is eliminated pattern, switch mode, and the oscillogram of the input power of normal mode in another example; And
Figure 13 is again the oscillogram that liquid film is eliminated the input power of pattern and normal mode in the example.
The specific embodiment
The first embodiment
Mist maker according to first embodiment of the invention is now described.
With reference to figure 1, cosmetic apparatus 1 comprises mist maker 3, and mist maker 3 makes the atomization of liquid of skin lotion or toner and so on and generates mist.Mist maker 3 is by control circuit 4 controls.Mist maker 3 and control circuit 4 are contained in housing 2, and housing 2 has the sidewall 2a that comprises mist outlet 5.Discharged by mist outlet 5 by the mist that mist maker 3 generates, and be discharged to the outside of housing 2.
In the illustrated example, cosmetic apparatus 1 (mist maker 3) is portable.Housing 2 can be cylindrical shape, and for example comprises the relatively large grip part of diameter 6.Mist outlet 5 is positioned at the position away from grip part 6, for example, is positioned at the position near the upper end of housing 2.Can be attached to along the axially movable lid 7 of housing 2 the sidewall 2a of housing 2.Lid 7 can be closed and open between the position of mist outlet 5 mobile.Lid 7 can be the form that is twisted plate or cylinder.
Among one embodiment, lid 7 also is used as the starting switch of mist maker 3.For example, can be when lid 7 moves to the position that it opens mist maker 5 so that mist maker 3 start, and when lid 7 moves to its closed mist and generates mouthfuls 5 position so that the mist maker close.
When using cosmetic apparatus 1, the user maintains handle 6, and lid 7 is moved to open position, and mist outlet 5 is faced toward handling part, and is for example facial, so that mist touches handling part.Described mist has so that the cosmetic result of skin wet.
With reference to figure 2 and 3, mist maker 3 comprises oscillating membrane 12 and piezoelectric oscillator 13.Oscillating membrane 12 comprises porous atomizing section 11.Be formed with a plurality of holes 10 in the porous atomizing section 11.Piezoelectric oscillator 13 is so that the effect of vibration maker is played in oscillating membrane 12 vibrations.Oscillating membrane 12 can be described as flexible or deformable film.
In the present embodiment, piezoelectric oscillator 13 is annular, and comprises opening 14.Piezoelectric oscillator 13 links together with closing any opening 14 with oscillating membrane 12.Oscillating membrane 12 can be dish type.The diameter of oscillating membrane 12 is greater than the diameter of the opening 14 of piezoelectric oscillator 13.The diameter of oscillating membrane 12 can be less than the diameter of piezoelectric oscillator 13.
For example, oscillating membrane 12 is pasted to a side (supplying with plane 13b) of piezoelectric oscillator 13, so that the center superposition of the center of oscillating membrane 12 and piezoelectric oscillator 13.The whole circumferential edges of oscillating membrane 12 preferably entirely is pasted to supplies with plane 13b.Contact area between oscillating membrane 12 and the piezoelectric oscillator 13 is annular, and centers on the opening 14 of piezoelectric oscillator 13.The atomizing section 11 of oscillating membrane 12 forms corresponding with the opening 14 of piezoelectric oscillator 13.For example, atomizing section 11 is defined by border circular areas.In the illustrated embodiment, the center superposition of the center of atomizing section 11 and oscillating membrane 12 and piezoelectric oscillator 13.
With reference to figure 3 and 4, oscillating membrane 12 comprises that mist discharges surperficial 12a and liquid receiving surface 12b.It is the surface that is positioned at the side that combines with piezoelectric oscillator 13 that mist is discharged surperficial 12a.Mist is discharged surperficial 12a from mist and is discharged.Liquid receiving surface 12b discharges surperficial 12a opposition side at mist.In addition, mist is discharged upper supply of surperficial 12a and is useful on the liquid of producing mist.
With reference to figure 4, each hole 10 comprises that being located at respectively mist discharges perforate Dout and Din among surperficial 12a and the liquid receiving surface 12b.Mist is discharged hole Dout among the surperficial 12a less than the perforate Din among the liquid receiving surface 12b.In the example of Fig. 4, the inclination curved surface of the inner surface in each hole 10 for being represented by exponential function curve in the oscillating membrane 12.The internal diameter in hole 10 increases gradually from the perforate Din of hole Dout in liquid receiving surface 12b that opens mist and discharge the surperficial 12a.Because hole 10 has such shape, the vibration of oscillating membrane 12 is so that be supplied to the atomization of liquid of liquid receiving surface 12b, and discharges the liquid that surperficial 12a discharges atomizing from mist.
With reference to figure 2 and 3, the piezoelectric oscillator 13 of present embodiment comprises ring piezoelectric body 15 and membrane electrode 16a and 16b, and piezoelectrics 15 have relative two surperficial 15a and 15b, and membrane electrode 16a and 16b are respectively formed on two the surperficial 15a and 15b of piezoelectrics 15. Line 17a and 17b are connected to respectively membrane electrode 16a and 16b.Be formed with folding part 18 on the surperficial 15a of piezoelectrics 15.Folding part 18 is continuous with the membrane electrode 16b on another surperficial 15b.In addition, folding part 18 17b that will go between is connected to membrane electrode 16b.Piezoelectric oscillator 13 generates vibration according to the input power of supplying with from control circuit 4 (with reference to figure 1) via lead-in wire 17a and 17b.The vibration of piezoelectric oscillator 13 so that oscillating membrane 12 vibrate.
With reference to figure 5, voltage is supplied to membrane electrode 16a and 16b (with reference to figure 3) so that piezoelectrics 15 strains (strain).The strain of piezoelectrics 15 is so that piezoelectric oscillator 13 vibration, and repeatedly makes radially (as shown in Figure 5 vertical) enlargement and contraction of piezoelectric oscillator 13.The contraction of piezoelectric oscillator 13 so that liquid receiving surface 12b bulge.The expansion of piezoelectric oscillator 13 is so that mist is discharged among the surperficial 12a bulges.The flexural deformation of the continuous repetition of oscillating membrane 12 is called film vibration (so-called sonic oscillation).
When vibration occured oscillating membrane 12, the atomizing section 11 in the mist maker 13 of the embodiment of the invention was so that be supplied to the atomization of liquid in hole 10.This and is discharged surperficial 12a from mist and discharges so that mist M generates.
With reference to figure 6, the housing 2 of cosmetic apparatus 1 comprises the inside that connects housing 2 and the nozzle 20 of mist outlet 5.Nozzle 20 comprises inner opening end 21, and it defines intercommunicating pore 23.Be fixed to the inner opening end 21 of nozzle 20 as the nozzle pad 22 of seal member and holding member.The discharge plane 13a of the piezoelectric oscillator 13 in the mist maker 13 forms with nozzle pad 22 and contacts.
For example, nozzle pad 22 comprises the through hole 24 corresponding with the intercommunicating pore 23 of nozzle 20.The atomizing section 11 that the mist of oscillating membrane 12 is discharged among the surperficial 12a is located at the position corresponding with nozzle 20 (particularly, through hole 24 and intercommunicating pore 23).Nozzle pad 22 comprises collar flange 25, and its 13a place, discharge plane at piezoelectric oscillator 13 is pasted to mist maker 3.Flange 25 is around the periphery of through hole 24.So that nozzle 20 and mist maker 3, namely inner opening end 21 and piezoelectric oscillator 13 link together nozzle pad 22 in the mode that prevents Liquid Penetrant.
Liquid L is supplied to the liquid receiving surface 12b of oscillating membrane 12 from container 29.In the present embodiment, by the securing member (not shown) with piezoelectric oscillator 13, nozzle pad 22, and container pad 27 be fastened to housing 2 with the state of the inner opening end 21 that pressing nozzle 20.The liquid receiving surface 12b of the supply plane 13b of piezoelectric oscillator 13 and oscillating membrane 12 is pasted to container package 27.This just links together liquid receiving surface 12b and container 29 in the mode that prevents Liquid Penetrant.
With reference to figure 2 and 6, in the present embodiment, do not comprise that electrodeless 30 opening 14 that centers among the supply plane 13a of piezoelectric oscillator 13 of membrane electrode 16a arranges.The flange 25 of nozzle pad 22 contacts with electrodeless 30 formation.
When the liquid receiving surface 12b of liquid L Continuous Contact oscillating membrane 12, liquid L can infiltrate into mist through via hole 10 and discharge surperficial 12a.If when the liquid L of infiltration is gathered on the membrane electrode 16a that discharges on the 13a of plane, can cause short circuit, migration etc.Yet nozzle pad 22 contacts with electrodeless 30 formation of discharging plane 13a.This has prevented from being penetrated into mist and has discharged the liquid L of surperficial 12a and be gathered on the membrane electrode 16a, and improves the reliability of the cosmetic apparatus 1 of present embodiment.
Liquid film is eliminated pattern
The mist maker of present embodiment comprises liquid film elimination pattern, perhaps can work in this pattern, hereinafter will describe in detail.
With reference to figure 7, permeation liquid L can discharge surperficial 12a at mist and form liquid level or liquid film LF.For example, do not use when 3 a period of times of mist maker, infiltrate into mist by hole 10 and discharge the liquid film LF that the L shaped one-tenth covering of the liquid mist of surperficial 12a is discharged surperficial 12a.The liquid film LF that mist is discharged on the surperficial 12a can be so that mist be discharged unstable.
The mist maker of present embodiment comprises normal mode and liquid film elimination pattern, perhaps can work under these two kinds of patterns.Normal mode is so that oscillating membrane 12 vibrates to discharge mist (with reference to figure 5).Liquid film is eliminated pattern and is discharged liquid film LF on the surperficial 12a so that oscillating membrane 12 vibrates to eliminate mist.
In the present embodiment, in the liquid film oscillation mode, the oscillation energy of oscillating membrane 12 increases.Oscillation energy according to the input power control oscillating membrane 12 that is supplied to piezoelectric oscillator 13.
For example, with reference to figure 8, in the controlled time period after mist maker 3 starts, control circuit 4 (with reference to figure 1) is with the input power W value of being increased to W1 of piezoelectric oscillator 13, and it is greater than the input power value W0 of normal mode.In the present embodiment, the increase of input power W and is eliminated mist and is discharged liquid film LF on the surperficial 12a so that the oscillation energy of oscillating membrane 12 increases.
When mist maker 3 starts, automatically perform liquid film and eliminate pattern.Carry out after the liquid film elimination pattern, control circuit 4 is eliminated pattern with input power W from being used for liquid film value W1 is decreased to the value W0 (switch mode) for normal mode gradually.In the normal mode, the input power W that control circuit 4 will be supplied to piezoelectric oscillator 13 is controlled to be steady state value (W0).
The liquid film of now describing present embodiment is eliminated the work of pattern.
More specifically, when the oscillation energy that increases with than large amplitude so that during oscillating membrane 12 vibration, liquid film LF is thrown off mist and discharges surperficial 12a.Eliminate after the liquid film LF, mist maker 3 is with normal mode work, and stably discharges mist.
The control circuit 4 that liquid film is eliminated pattern and/or execution liquid film elimination pattern is examples of liquid film remover.The value W0 system expression that is used for normal mode is applicable to generate an example of the first input power setting value of the required vibration of atomized liquid.Being used for liquid film eliminates the value W1 system expression of pattern and is applicable to eliminate the example that mist is discharged the second input power setting value of the required vibration of the liquid film LF of surperficial 12a.Value W0 and W1 are stored in control circuit 4 accessible memories or the data storage.Described memory or data storage can be included in the control circuit 4.
Present embodiment has following advantage.
(1) mist maker 3 comprises oscillating membrane 12 and piezoelectric oscillator 13, and oscillating membrane 12 is provided with porous atomizing section 11, and piezoelectric oscillator 13 plays the effect of vibration maker so that oscillating membrane 12 vibrates.The mist maker comprises liquid film elimination pattern, or can work under this pattern, and described liquid film is eliminated pattern so that oscillating membrane 12 vibrates to eliminate the liquid film LF that mist is discharged surperficial 12a.
In the said structure, can eliminate quickly and easily the liquid film LF that mist is discharged surperficial 12a.Thus, need not to wipe the liquid film LF that mist is discharged surperficial 12a with cotton swab etc.In addition, eliminate liquid film LF after, mist maker 3 is carried out and was originally wanted the control model (normal mode) that mist is discharged that is used for carried out.This can be more stable pattern discharge mist.Particularly, cosmetic apparatus 1 is discharged mist towards user's face usually.Therefore, stable mist is discharged can improve the effect of mist, and for example can prevent that dressing from coming off.
(2) liquid film elimination pattern increases the oscillation energy of oscillating membrane 12.The oscillation amplitude positive correlation of oscillation energy and oscillating membrane 12.Therefore, the increase of oscillation energy can make oscillating membrane 12 with larger amplitude vibration.This discharges surperficial 12a so that liquid film LF is thrown off mist.
(3) liquid film elimination pattern increases the input power W of piezoelectric oscillator 13.Piezoelectric oscillator 13 generates the vibration corresponding with input power W.Therefore, need not to increase new element, can easily increase the oscillation energy of oscillating membrane 12.This discharges surperficial 12a so that liquid film LF is thrown off mist.
(4) when mist maker 3 starts, carry out liquid and eliminate pattern.Oscillating membrane 12 is longer with the time of contact of liquid under the state that does not generate mist, just has more liquid to flow out to easily mist and discharges surperficial 12a.Particularly, for portable cosmetic apparatus 1, the vibration that produces when carrying cosmetic apparatus 1 promotes liquid flow to mist to discharge surperficial 12a.Said structure is eliminated liquid film LF automatically in the state of most possible formation liquid film LF.This has increased convenience, and has further improved the convenience of cosmetic apparatus 1.
(5) after liquid film elimination pattern finishes, carry out switch mode to reduce gradually input power W.This can not cause interference so that can switch to normal mode glibly.
The second embodiment
The second embodiment of the present invention is now described.The parts identical with the corresponding embodiment of the first embodiment are marked with similar or identical label.Omit the description of these parts.
With reference to figure 9, in the present embodiment, implement liquid film elimination pattern by repeatedly sharply increasing and reducing input power W.
For example, control circuit 4 starts mist makers 3, and sharp the input power W of piezoelectric oscillator 13 is increased to peak value W2 then with value of being decreased to " 0 " of input power W.In the present embodiment, peak value W2 is greater than the value W0 of normal mode.Within the time corresponding with liquid elimination pattern, repeat to increase sharp and reduce input power W.Value W2 is an example of the second input power setting value.
By repeating to increase sharp and reduce input power W, the vibration that the vibration that the repetition amplitude is larger and amplitude are less.This changes in amplitude can be discharged surperficial 12a so that liquid film LF is thrown off mist.
Therefore, the structure of present embodiment also can be eliminated the liquid film LF that mist is discharged surperficial 12a, and can more stably discharge mist.Similar with the first embodiment, need not to add any new element, can reach easily this point by control inputs power.In addition, (W2＞W0), it is more outstanding that this advantage becomes when increasing input power W.Value W0 and W2 are stored in control circuit 4 accessible memories or the data storage.Described memory or data storage can be included in the control circuit 4.
The 3rd embodiment
The third embodiment of the present invention is now described.The parts identical with the corresponding embodiment of the first embodiment are marked with similar or identical label.Omit the description of these parts.
In the liquid film elimination pattern of present embodiment, the vibration that piezoelectric oscillator 13 generates is different from the radial oscillation (Fig. 5) that makes oscillating membrane 12 that vibration and liquid generation atomizing occur.
More specifically, except as previously mentioned the vibration of radially enlargement and contraction, the difference that ring piezoelectric oscillator 13 can utilize frequency of oscillation to be generating polytype vibration, such as thickness direction vibration, curve vibration, and torsional oscillation.In addition, by when applying voltage to membrane electrode 16a and 16b, the strain that produces in the piezoelectrics 15 is so that piezoelectric oscillator 13 vibrations.Therefore, can control according to timing (for example, frequency) from input power to piezoelectric oscillator 13 that supply with the vibration of piezoelectric oscillator 13.
Thus, the mist maker 3 of present embodiment utilizes piezoelectric oscillator 13 generated frequencies to be different from so that the vibration of the radial oscillation of vibration occurs oscillating membrane 12.For example, with reference to Figure 10, liquid oscillation-damped λ 2 is (for example, 4MHz) with λ 1 (for example, 100KHz) superposes so that the atomizing that oscillating membrane occurs to vibrate is vibrated.In the present embodiment, liquid oscillation-damped λ 2 is the thickness direction vibration.Two kinds of different vibrations are passed to oscillating membrane 12 is discharged surperficial 12a to eliminate mist liquid film LF.
Structure of the present invention also can be eliminated the liquid film LF that mist is discharged surperficial 12a, and so that mist is discharged more stable.In addition, eliminate the vibration of liquid film LF and the vibration of atomized liquid by stack, even during liquid film discharge pattern, also can discharge mist.Similar with the first and second embodiment, need not to add any new element, can reach easily this point by control inputs power.
The 4th embodiment
The fourth embodiment of the present invention is now described.The parts identical with the corresponding embodiment of the first embodiment are marked with similar or identical label.Omit the description of these parts.
With reference to Figure 11, the mist maker 3 of present embodiment also comprises electromagnetic shaker 31 except oscillating membrane 12 and piezoelectric oscillator 13.Piezoelectric oscillator 13 and electromagnetic shaker 31 form the vibration maker of present embodiment.Electromagnetic shaker 31 is controlled by control circuit 4 (with reference to figure 1) in the mode identical with piezoelectric oscillator 13.Supply with the liquid film elimination pattern that present embodiment is carried out in low-frequency oscillation by utilizing electromagnetic shaker 31 to oscillating membrane 12.
Low-frequency oscillation is supplied to oscillating membrane 12 also eliminates the liquid film LF that mist is discharged surperficial 12a.Therefore, this structure also can eliminate mist discharge surperficial 12a liquid film LF and can be so that carry out stable mist and discharge.
One skilled in the art will understand that the present invention can be multiple other concrete forms realize and do not break away from the spirit and scope of the present invention.Particularly, should be understood that and to realize in the following manner the present invention.
In above-described embodiment, mist maker 3 is incorporated in the portable cosmetic apparatus.Yet mist maker according to the present invention can be used for fixed cosmetic apparatus, or other devices outside the cosmetic apparatus.
In above-described embodiment, by so that dish type oscillating membrane 12 and ring piezoelectric oscillator 13 in conjunction with forming mist maker 3 to cover opening 14.Yet the shape of the contact area between the shape of piezoelectric oscillator 13 and oscillating membrane 12 and this two elements is not limited to this.For example, can use tubular piezo-electric oscillator and quadrangle oscillating membrane.In addition, piezoelectric oscillator can comprise a plurality of holes.Yet with regard to the efficient vibration of oscillating membrane, the shape of piezoelectric oscillator and oscillating membrane is preferably as described in the previous embodiment.
In above-described embodiment, when mist maker 3 starts, carry out liquid film and eliminate pattern.Yet liquid film elimination pattern is not limited to this, and can carry out the time outside mist maker 3 starts.For example, can be provided with the beginning switch on the housing 2, eliminate pattern thereby can carry out at any time liquid film.This has promoted user's degree of convenience.
Particularly, for portable cosmetic apparatus, mist outlet 5 can tilt with a plurality of directions.In the use procedure, this can form liquid film LF at oscillating membrane.Eliminate pattern by carrying out in the case liquid, can significantly promote degree of convenience.This be so that always can stably carry out mist and process, and promotes convenience.
Among the first embodiment, increase oscillation energy by the input power W that increases piezoelectric oscillator 13.Instead, for example can add the structure of electromagnetic shaker 31 and so on of the 4th embodiment to increase oscillation energy.
Among the second embodiment, repeat sharp that input power W with piezoelectric oscillator 13 increases to peak value W2 and sharp with input power W value of being decreased to " 0 ".Instead, with reference to Figure 12, repeat sharp input power W with piezoelectric oscillator 13 and increase to peak value W3 and input power W is decreased to value W4 less than peak value W3.In this example, value W4 is higher than the value W0 of normal mode.Yet value W4 can be made as and be lower than value W0.This has reduced the load of piezoelectric oscillator 13, and has increased reliability so that increase and reduce the narrowed width of input power W.Described W3 and the setting of W4 are examples of the second input power setting value.
Among the second embodiment, except increasing sharp and reduce the input power W, input power W also increases (W2＞W0).Instead, with reference to Figure 13, increase and reduce the peak value of input power W can the value of being reduced to W0 so that input power W needn't be greater than value W0.This structure also can be utilized change in oscillation and reach the liquid film eradicating efficacy.
Among the 3rd embodiment, piezoelectric oscillator 13 generates the vibration (λ 2) of thickness direction, and it is different from so that the radial oscillation of vibration and atomized liquid occurs oscillating membrane 12.Instead, the vibration that generates in the liquid film elimination pattern can be curve vibration, torsional oscillation etc., or the vibration of other types.
Among the 3rd embodiment, the frequency of liquid film oscillation-damped λ 2 (4MHz) is higher than the atomizing vibration λ 1 (100KHz) that makes oscillating membrane 12 vibrations.Instead, the frequency of liquid film oscillation-damped λ 2 can be lower than atomizing vibration λ 1.
Among the 3rd embodiment, liquid film oscillation-damped λ 2 and atomizing vibration λ 1 stack.Instead, during liquid film elimination pattern, piezoelectric oscillator 13 can only generate liquid film oscillation-damped λ 2.In addition, carried out after the liquid film elimination pattern, can be used as normal mode and generate atomizing vibration λ 1.
In the described vibration elimination pattern, increase oscillation energy, increase input power, sharply increase and reduce input power W, and use different these modes of vibration, use capable of being combined two or more.
Should think that embodiments of the invention are illustrative and nonrestrictive, and the invention is not restricted to the given details of this paper, but can in the scope of claims and equivalent, make amendment.
Claims (11)
1. a mist maker (3) comprising:
Oscillating membrane (12), it comprises porous atomizing section (11);
Liquid supply source (29), it is used for liquid (L) is supplied to described atomizing section (11); And
Vibration maker (13; 31), it is used for making described oscillating membrane (12) that vibration occurs and makes
Be supplied to liquid (L) atomizing of described atomizing section (11); Described mist maker is characterised in that,
Have liquid film and eliminate pattern, it is used for by eliminating the liquid film (LF) that the mist of described oscillating membrane (12) is discharged surface (12a) so that vibration occurs described oscillating membrane.
2. mist maker as claimed in claim 1, wherein said liquid film are eliminated the oscillation energy that pattern using increases and are made described oscillating membrane (12) vibration.
3. mist maker as claimed in claim 1, wherein:
Described vibration maker (13; 31) comprise piezoelectric oscillator, the vibration that its generating amplitude and/or frequency are corresponding with the level of described input power, and
Described liquid film elimination pattern increases the input power that is supplied to described piezoelectric oscillator.
4. mist maker as claimed in claim 1, wherein:
Described vibration maker (13; 31) comprise piezoelectric oscillator, the vibration that its generating amplitude and/or frequency are corresponding with the level of described input power, and
Described liquid film elimination pattern repeats to increase sharp and reduce to be supplied to the input power of described piezoelectric oscillator.
5. such as each described mist maker in the claim 1～4, wherein said liquid film is eliminated pattern vibrates described oscillating membrane (12) to be different from the mode that described liquid is atomized.
6. such as each described mist maker in the claim 1～4, wherein said liquid film is eliminated pattern vibrates described oscillating membrane (12) to be different from the frequency that described liquid is atomized.
7. such as each described mist maker in the claim 1～4, wherein said liquid film is eliminated pattern vibrates described oscillating membrane (12) with lower frequency.
8. such as each described mist maker in the claim 1～4, its waveform of vibration that wherein said liquid film elimination pattern generates is by making the vibration of eliminating described liquid film (LF) and the oscillating phase stack of the described atomization of liquid being obtained.
9. such as each described mist maker in the claim 1～4, wherein when described mist maker starts, carry out described liquid film and eliminate pattern.
10. one kind comprises the as claimed in claim 1 cosmetic apparatus of mist maker.
11. control circuit that is used for control mist maker, described mist maker makes oscillating membrane (12) that vibration occur and makes the atomization of liquid of the liquid receiving surface that is supplied to described oscillating membrane (12) and discharge described atomized liquid from the mist discharge surface (12a) of described oscillating membrane (12), and described control circuit comprises:
The memory that is used for storage the first input power setting value and the second input power setting value, the expression of described the first input power setting value generates the first input power of the vibration that is suitable for making the described atomization of liquid, and the expression of described the second input power setting value generates and is suitable for eliminating the second input power of vibration that described mist is discharged the liquid film (LF) on surface (12a);
Normal mode, it is used for according to described the first input power setting value described oscillating membrane (12) being vibrated; And
Liquid film is eliminated pattern, and it vibrates described oscillating membrane (12) according to described the second input power setting value,
Wherein, described control circuit:
After described mist maker starts, carry out described liquid film elimination pattern in immediately during controlled eliminating described liquid film (LF), and
After carrying out described liquid film elimination pattern, by carrying out described normal mode to discharge mist according to the described input power of described the first input power setting value control.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-159064 | 2011-07-20 | ||
| JP2011159064A JP5405533B2 (en) | 2011-07-20 | 2011-07-20 | Mist generator and beauty device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102886329A true CN102886329A (en) | 2013-01-23 |
Family
ID=46319001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012102356223A Pending CN102886329A (en) | 2011-07-20 | 2012-06-27 | Mist generator and cosmetic device |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP2548655A1 (en) |
| JP (1) | JP5405533B2 (en) |
| CN (1) | CN102886329A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107106407A (en) * | 2015-01-15 | 2017-08-29 | 夏普株式会社 | Cosmetic apparatus |
| CN111570172A (en) * | 2020-06-06 | 2020-08-25 | 桐乡清锋科技有限公司 | Radial porous fog 3D printing leadless piezoelectric ceramic atomization sheet |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2516847A (en) | 2013-07-31 | 2015-02-11 | Ingegneria Ceramica S R L | An Improved Actuator For A Printhead |
| ITMO20130221A1 (en) * | 2013-08-01 | 2015-02-02 | Ingegneria Ceramica S R L | ACTUATOR, HEAD FOR PRINTER INCLUDING SUCH ACTUATOR, AND PRINTER INCLUDING THIS HEAD. |
| KR101501945B1 (en) * | 2013-09-03 | 2015-03-13 | (주) 텔트론 | Skin care apparatus |
| EP3043927A4 (en) | 2013-09-09 | 2017-08-30 | Omnimist Ltd. | Atomizing spray apparatus |
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- 2011-07-20 JP JP2011159064A patent/JP5405533B2/en not_active Expired - Fee Related
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| CN111570172A (en) * | 2020-06-06 | 2020-08-25 | 桐乡清锋科技有限公司 | Radial porous fog 3D printing leadless piezoelectric ceramic atomization sheet |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2548655A1 (en) | 2013-01-23 |
| JP5405533B2 (en) | 2014-02-05 |
| JP2013022197A (en) | 2013-02-04 |
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