CN103048781A - MEMS (Micro-Electro Mechanical System) adjustable etalon - Google Patents
MEMS (Micro-Electro Mechanical System) adjustable etalon Download PDFInfo
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- CN103048781A CN103048781A CN2011103062006A CN201110306200A CN103048781A CN 103048781 A CN103048781 A CN 103048781A CN 2011103062006 A CN2011103062006 A CN 2011103062006A CN 201110306200 A CN201110306200 A CN 201110306200A CN 103048781 A CN103048781 A CN 103048781A
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Abstract
The invention discloses an MEMS (Micro-Electro Mechanical System) adjustable etalon which comprises an etalon cavity plate and an MEMS, wherein the MEMS is longitudinally adjustable, a high-reflective film is plated on the upper surface of the MEMS as one cavity plate of the etalon, and a fixed cavity plate is positioned on an MEMS fixed support; a reflective film is plated on the etalon cavity plate and fixed on a cavity plate fixed support; the MEMS fixed support and the cavity plate fixed support are fixedly connected by two or more steel needles; the cavity plate fixed support is welded on the steel needle bthrough soldering; the upper surface of the MEMS is parallel to the reflective plane of the etalon cavity plate to form an etalon with adjustable empty air gap. The MEMS adjustable etalon is small in welding spots, low in stress and easy to control by adopting a steel needle welding mode; the parallelism of the etalon cavity surface and the upper surface of the MEMS can be equalized by a spanner, or adjusted easily by utilizing an adjusting screw on a side support, and the etalon has the advantages of being simple in structure, easy and convenient to adjust, and the like.
Description
Technical field
The present invention relates to the optical passive component field, relate in particular to a kind of tunable etalon with MEMS.
Background technology
In relating to the optical passive component of etalon, a lot of application needs etalon to have certain regulating power, such as the Free Spectral Range (FSR) of adjustment criteria tool, the centre wavelength of Insertion Loss curve, group delay curve etc.
No matter be substantive standard tool or air-gap etalon, in a single day the distance between the two chamber face is fixed up, and the FSR of etalon also just decides, and is difficult to realize from technique the accurate control of FSR, and is difficult to be applied in and requires in the variable situation of etalon FSR.In addition in some optical passive components, need to be in the environment of sealing blanketing gas come the central homology peak of control criterion tool, but along with the prolongation of time, the central homology summit produces drift because of gas leakage.
Application for a patent for invention " a kind of tunable etalon " (application number: 201010557239.0) disclose a kind of tunable etalon that Patent Office of the People's Republic of China announced on May 11st, 2011, as shown in Figure 1, comprise transparency carrier and MEMS, its fixed sturcture comprises two hollow circuit cylinder modules and a globe joint, transparency carrier and MEMS are individually fixed on two hollow circuit cylinder modules, two hollow circuit cylinder modules connect by globe joint, and each module surface of contact adopts adhering process to connect.This fixed sturcture utilizes adhering process to connect, and is aging easily, and its structure relative complex, and technological process is more loaded down with trivial details.
Summary of the invention
For overcoming the problems referred to above, the present invention proposes a kind of MEMS tunable etalon, and its fixed sturcture is simple, regulates simple and convenient.
For achieving the above object, technical scheme proposed by the invention is: a kind of MEMS tunable etalon comprises etalon chamber sheet and a MEMS, described MEMS is vertically adjustable, its upper surface plating high-reflecting film, a chamber sheet as etalon is fixed on the MEMS fixed support; Sheet plating reflectance coating in described etalon chamber is fixed on the sheet fixed support of chamber; Be fixedly connected with by the draw point more than two or two between described MEMS fixed support and the chamber sheet fixed support; The reflecting surface of MEMS upper surface and etalon chamber sheet is parallel to each other.
Further, described MEMS fixed support is greater than chamber sheet fixed support, its arranged outside one side stand, and this side stand is provided with two or more adjusting screw with respect to the support bracket fastened position of chamber sheet; Described adjusting screw is passed the screw of side stand, withstands on chamber sheet fixed support periphery.
Further, described draw point and MEMS fixed support are structure as a whole, and perhaps described draw point and MEMS fixed support are tight fit connection.
Further, described draw point and chamber sheet fixed support are welded and fixed by scolding tin.
Beneficial effect of the present invention: a kind of MEMS tunable etalon of the present invention, adopt the draw point welding manner, solder joint is little, stress is little, and is more easy to control; The depth of parallelism of etalon chamber face and MEMS upper surface can adopt spanner to equalize, and perhaps utilizes the adjusting screw on the side stand to regulate easily, and therefore tunable etalon of the present invention is simple in structure, regulates simple and convenient.
Description of drawings
Fig. 1 is a kind of tunable etalon structural representation of prior art;
Fig. 2 is embodiments of the invention one structural representations;
Fig. 3 is embodiments of the invention two structural representations.
Label declaration: 101.MEMS; 102. etalon chamber sheet; 103.MEMS fixed support; 104. chamber sheet fixed support; 105. draw point; 106. scolding tin; 201.MEMS; 202. etalon chamber sheet; 203.MEMS fixed support; 204. chamber sheet fixed support; 205. draw point; 206. scolding tin; 207. side stand; 208. adjusting screw.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention will be further described.
The present invention adopts reflective MEMS as a chamber face of etalon, with the one side formation air-gap etalon of another etalon chamber sheet, comes the FSR of accurate regulating and controlling etalon by the lengthwise position of control MEMS.Be illustrated in figure 2 as embodiments of the invention one, MEMS 101 is firmly fixed on MEMS fixed support 103, and etalon chamber sheet 102 is fixed on the chamber sheet fixed support 104, and chamber sheet fixed support 104 is fixedly connected with by draw point 105 with MEMS fixed support 103.MEMS 101 upper surfaces plating high-reflecting film, as a chamber face of etalon, the one side of etalon chamber sheet 102 plating reflectance coating is parallel to each other with MEMS 101 upper surfaces, consist of an air-gap tunable etalon, come the FSR of accurate control criterion tool by the lengthwise position of regulating MEMS 101.Draw point 105 can be integrative-structure with MEMS fixed support 103, also can adopt the wringing fit mode to connect; Chamber sheet fixed support 104 utilizes scolding tin 106 to be welded on the draw point 105, controls simultaneously two reflectings surface and is parallel to each other.Adopt draw point 105 welding, solder joint is little, and stress is little, easily control, in case air gap distance be fixed, if the two chamber face depth of parallelisms depart from, can with spanner in the welding position depth of parallelism of adjustment criteria tool chamber sheet 102 and MEMS 101 reflectings surface easily.
Be illustrated in figure 3 as embodiments of the invention two, the same with embodiment one, MEMS 201 upper surfaces plating high-reflecting film is as a chamber face of etalon, be firmly fixed on MEMS fixed support 203, the one side plating reflecting surface of etalon chamber sheet 202 is fixed on the chamber sheet fixed support 204, and parallel with MEMS 201 upper surfaces, consist of an air-gap tunable etalon, come the FSR of accurate control criterion tool by regulating MEMS 201 lengthwise positions.Same, chamber sheet fixed support 204 is fixedly connected with by draw point 205 with MEMS fixed support 203, and chamber sheet fixed support 204 is welded on the draw point 205 by scolding tin 206.These chamber sheet fixed support 204 sizes are slightly smaller than MEMS fixed support 203, at MEMS fixed support 203 arranged outside one side stand 207, the position that corresponds to chamber sheet fixed support 204 on this side stand 207 is provided with two or more adjusting screw 208, and this adjusting screw 208 withstands on chamber sheet fixed support 204 peripheries after passing the screw of side stand 207.When the etalon two chamber face depth of parallelisms depart from, by the just depth of parallelism of adjustment criteria tool chamber sheet 202 and MEMS 201 reflectings surface easily of adjusting screw 208.
Although specifically show and introduced the present invention in conjunction with preferred embodiment; but the those skilled in the art should be understood that; within not breaking away from the spirit and scope of the present invention that appended claims limits; the various variations of in the form and details the present invention being made are protection scope of the present invention.
Claims (5)
1. a MEMS tunable etalon comprises etalon chamber sheet and a MEMS, and it is characterized in that: described MEMS is vertically adjustable, and its upper surface plating high-reflecting film is fixed on the MEMS fixed support; Sheet plating reflectance coating in described etalon chamber is fixed on the sheet fixed support of chamber; Be fixedly connected with by the draw point more than two or two between described MEMS fixed support and the chamber sheet fixed support; The reflecting surface of MEMS upper surface and etalon chamber sheet is parallel to each other.
2. a kind of MEMS tunable etalon as claimed in claim 1, it is characterized in that: described MEMS fixed support is greater than chamber sheet fixed support, its arranged outside one side stand, this side stand is provided with two or more adjusting screw with respect to the support bracket fastened position of chamber sheet; Described adjusting screw is passed the screw of side stand, withstands on chamber sheet fixed support periphery.
3. a kind of MEMS tunable etalon as claimed in claim 1 or 2, it is characterized in that: described draw point and MEMS fixed support are structure as a whole.
4. a kind of MEMS tunable etalon as claimed in claim 1 or 2, it is characterized in that: described draw point and MEMS fixed support are tight fit connection.
5. a kind of MEMS tunable etalon as claimed in claim 1 or 2, it is characterized in that: described draw point and chamber sheet fixed support are welded and fixed by scolding tin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103062006A CN103048781A (en) | 2011-10-11 | 2011-10-11 | MEMS (Micro-Electro Mechanical System) adjustable etalon |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103062006A CN103048781A (en) | 2011-10-11 | 2011-10-11 | MEMS (Micro-Electro Mechanical System) adjustable etalon |
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| CN103048781A true CN103048781A (en) | 2013-04-17 |
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| CN2011103062006A Pending CN103048781A (en) | 2011-10-11 | 2011-10-11 | MEMS (Micro-Electro Mechanical System) adjustable etalon |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105022158A (en) * | 2015-08-04 | 2015-11-04 | 深圳力策科技有限公司 | Adjustable infrared filter based on MEMS |
| CN105866942A (en) * | 2016-06-08 | 2016-08-17 | 常州创微电子机械科技有限公司 | Electromagnetic driving micro-mirror of double-metal coil |
| WO2017009850A1 (en) * | 2015-07-15 | 2017-01-19 | Technology Innovation Momentum Fund (Israel) Limited Partnership | Tunable mems etalon |
| US10229476B2 (en) | 2013-06-24 | 2019-03-12 | Technology Innovation Momentum Fund (Israel) Limited Partnership | System and method for color image acquisition |
| US10605660B2 (en) | 2015-07-30 | 2020-03-31 | Technology Innovation Momentum Fund (Israel) Limited Partnership | Spectral imaging method and system |
| US11474343B2 (en) | 2016-11-20 | 2022-10-18 | Unispectral Ltd. | Tunable MEMS etalon device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1082789A (en) * | 1993-06-30 | 1994-02-23 | 清华大学 | Cascade photon filter |
| US5384877A (en) * | 1993-06-21 | 1995-01-24 | At&T Corp. | Passive temperature-insensitive fabry-perot etalons |
| CN201732052U (en) * | 2010-06-30 | 2011-02-02 | 中国科学院安徽光学精密机械研究所 | Optical-path-adjustable open-type multiple reflecting pool for gas content online monitoring |
| CN102053361A (en) * | 2010-11-24 | 2011-05-11 | 福州高意通讯有限公司 | Adjustable etalon |
-
2011
- 2011-10-11 CN CN2011103062006A patent/CN103048781A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5384877A (en) * | 1993-06-21 | 1995-01-24 | At&T Corp. | Passive temperature-insensitive fabry-perot etalons |
| CN1082789A (en) * | 1993-06-30 | 1994-02-23 | 清华大学 | Cascade photon filter |
| CN201732052U (en) * | 2010-06-30 | 2011-02-02 | 中国科学院安徽光学精密机械研究所 | Optical-path-adjustable open-type multiple reflecting pool for gas content online monitoring |
| CN102053361A (en) * | 2010-11-24 | 2011-05-11 | 福州高意通讯有限公司 | Adjustable etalon |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10229476B2 (en) | 2013-06-24 | 2019-03-12 | Technology Innovation Momentum Fund (Israel) Limited Partnership | System and method for color image acquisition |
| WO2017009850A1 (en) * | 2015-07-15 | 2017-01-19 | Technology Innovation Momentum Fund (Israel) Limited Partnership | Tunable mems etalon |
| US10827152B2 (en) | 2015-07-15 | 2020-11-03 | Technology Innovation Momentum Fund (Israel) Limited Partnership | Tunable MEMS etalon |
| US10605660B2 (en) | 2015-07-30 | 2020-03-31 | Technology Innovation Momentum Fund (Israel) Limited Partnership | Spectral imaging method and system |
| CN105022158A (en) * | 2015-08-04 | 2015-11-04 | 深圳力策科技有限公司 | Adjustable infrared filter based on MEMS |
| CN105866942A (en) * | 2016-06-08 | 2016-08-17 | 常州创微电子机械科技有限公司 | Electromagnetic driving micro-mirror of double-metal coil |
| US11474343B2 (en) | 2016-11-20 | 2022-10-18 | Unispectral Ltd. | Tunable MEMS etalon device |
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Application publication date: 20130417 |