CN103353665A - Micro-stress fixing device used for reflector with high surface figure accuracy - Google Patents
Micro-stress fixing device used for reflector with high surface figure accuracy Download PDFInfo
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- CN103353665A CN103353665A CN2013102846301A CN201310284630A CN103353665A CN 103353665 A CN103353665 A CN 103353665A CN 2013102846301 A CN2013102846301 A CN 2013102846301A CN 201310284630 A CN201310284630 A CN 201310284630A CN 103353665 A CN103353665 A CN 103353665A
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- catoptron
- microstress
- reflector
- stationary installation
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Abstract
The invention relates to a micro-stress fixing device used for a reflector with high surface figure accuracy. The micro-stress fixing device used for the reflector with high surface figure accuracy includes the reflector and a fixing base. The reflector includes a reflecting face and a fixed end. The fixed end is in the shape of a cylindrical boss and the diameter of the fixed end is smaller than the diameter of the reflecting face. A junction of the reflecting face and the fixed end is also provided with a circumferential stress-reducing groove. The fixed base includes a bottom part and an upper part. The bottom part is slice-shaped and is used for being connected with an external instrument fixedly. The upper part is barrel-shaped and is used for being connected with the reflector. The inner diameter of the upper part is fitted closely with the outer diameter of the fixed end of the reflector. A plurality of gum-injecting holes arranged on the same ring and distributed uniformly are arranged in a waistband position of the barrel-shaped upper part.
Description
Technical field
The present invention relates to mechanics field, particularly a kind of high shape catoptron microstress stationary installation.
Background technology
Spaceborne high-resolution sun extreme ultraviolet instrument adopts Cassegrain or Ritchie-Ke Laiqin telescope configuration more, this high-resolution Image-forming instrument has very high requirement to the surface figure accuracy of mirror surface, usually all at 1/20 λ (λ=632nm, rms) more than, so require when stationary mirror, to adopt microstress or stressless fixed form, in proof strength, require mirror shape deformation to be generally less than 10%.
At present in the world the catoptron on the spaceborne sun extreme ultraviolet instrument fixedly the time in the following way: first at circumferential bonding three sheet metals with mounting hole of mirror surface ring as transition piece, and then holder and transition piece be screwed.The shortcoming of this mounting means is that transition piece need to provide a datum clamp face when bonding, in the adhesive glue solidification process, need to be continuously applied stress simultaneously.This fixation procedure is complicated, needs more aid, and simultaneously because mount pad directly is connected with catoptron, the stress of adhesive glue and screw fixed stress all possible direct effect cause that to catoptron minute surface produces larger deformation.
Summary of the invention
It is complicated to the object of the invention is to overcome catoptron fixed form process of the prior art, causes easily the defectives such as minute surface deformation, thereby a kind of easy high face shape catoptron microstress stationary installation is provided.
To achieve these goals, the invention provides a kind of high shape catoptron microstress stationary installation, comprise catoptron 1 and holder 2; Wherein,
Described catoptron 1 comprises reflecting surface 4, stiff end 3, and 3 one-tenth cylindrical boss shapes of described stiff end, its diameter also have ring in the junction of described reflecting surface 4 and stiff end 3 and circumferentially subtract stress groove 5 less than the diameter of described reflecting surface 4; Described holder 2 comprises bottom and top, described bottom slabbing, be used for being fixedly connected with the instrument of outside, described top becomes tubular, be used for connecting described catoptron 1, the external diameter of the stiff end 3 of the internal diameter of its middle and upper part and described catoptron 1 closely cooperates, and the waistband position on described tubular top has a plurality of hole for injecting glue 6 on same annulus, that evenly arrange.
In the technique scheme, described ring circumferentially subtracts stress groove 5 and is deep-slotted chip breaker or semi-circular groove.
In the technique scheme, described holder 2 adopts metal material to make, and its coefficient of thermal expansion is consistent with the coefficient of thermal expansion of described catoptron 1 material or approaching.
In the technique scheme, described hole for injecting glue 6 has 3-6.
In the technique scheme, described hole for injecting glue 6 is taper.
The invention has the advantages that:
1. the mirror surface in the high face shape catoptron microstress stationary installation of the present invention adopts installation base, and holder adopts cylindrical seat, and the stress that produces in the time of fixedly dissipates at holder, does not affect mirror shape.
2. the tubular holder in the high face shape catoptron microstress stationary installation of the present invention and cylindrical boss wringing fit are installed, and do not need stress application during the point adhesive curing, simplify assembling process.
3. the catoptron of the circle in the high face shape catoptron microstress stationary installation of the present invention is concentric with cylindrical holder, and this structural design provides reference for installation for the coaxial assembling of primary and secondary catoptron.
4. taper is adopted in the fixing glue hole in the high face shape catoptron microstress stationary installation of the present invention, has increased the bond area of catoptron and holder, has strengthened bonding firmness.
Description of drawings
Fig. 1 is the structural representation of high face shape catoptron microstress stationary installation of the present invention.
The drawing explanation
1 catoptron, 2 holders, 3 stiff ends
4 reflectings surface, 5 rings circumferentially subtract stress groove 6 hole for injecting glue
Embodiment
Now the invention will be further described by reference to the accompanying drawings.
With reference to figure 1, high face shape catoptron microstress stationary installation comprises catoptron 1 and holder 2; Wherein, described catoptron 1 comprises reflecting surface 4, stiff end 3, and 3 one-tenth cylindrical boss shapes of described stiff end, its diameter also have ring in the junction of described reflecting surface 4 and stiff end 3 and circumferentially subtract stress groove 5 less than the diameter of described reflecting surface 4; Described holder 2 comprises bottom and top, described bottom slabbing, be used for being fixedly connected with the instrument of outside, described top becomes tubular, be used for connecting described catoptron 1, the external diameter of the stiff end 3 of the internal diameter of its middle and upper part and described catoptron 1 closely cooperates, and the waistband position on described tubular top has a plurality of hole for injecting glue 6 on same annulus, that evenly arrange.
The below is described further all parts in the stationary installation of the present invention.
Described hole for injecting glue 6 has 3-6.
Described ring circumferentially subtracts stress groove 5 and is deep-slotted chip breaker or semi-circular groove.
Described holder 2 adopts metal material to make, and its coefficient of thermal expansion is consistent with the coefficient of thermal expansion of catoptron 1 material or approaching.
Hole for injecting glue 6 on the described holder 3 is taper.
Adopt high face shape catoptron microstress stationary installation of the present invention that high face shape catoptron is carried out microstress fixedly the time, correlation step is as follows: the stiff end 3 of catoptron 1 is assigned in the top of described holder 2, make between the two and closely cooperate, then place it on the plane platform, with the pin hole glue injection machine fixing glue is injected in the hole for injecting glue 6, naturally place a period of time, treat just can finish whole microstress assembling process after the fixing glue curing.
It should be noted last that above embodiment is only unrestricted in order to technical scheme of the present invention to be described.Although with reference to embodiment the present invention is had been described in detail, those of ordinary skill in the art is to be understood that, technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and scope of technical solution of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
Claims (5)
1. one kind high shape catoptron microstress stationary installation is characterized in that, comprises catoptron (1) and holder (2); Wherein,
Described catoptron (1) comprises reflecting surface (4), stiff end (3), described stiff end (3) becomes the cylindrical boss shape, its diameter also has ring in the junction of described reflecting surface (4) and stiff end (3) and circumferentially subtracts stress groove (5) less than the diameter of described reflecting surface (4); Described holder (2) comprises bottom and top, described bottom slabbing, be used for being fixedly connected with the instrument of outside, described top becomes tubular, be used for connecting described catoptron (1), the external diameter of the stiff end (3) of the internal diameter of its middle and upper part and described catoptron (1) closely cooperates, and the waistband position on described tubular top has a plurality of hole for injecting glue on same annulus, that evenly arrange (6).
2. high face shape catoptron microstress stationary installation according to claim 1 is characterized in that, described ring circumferentially subtracts stress groove (5) and is deep-slotted chip breaker or semi-circular groove.
3. high face shape catoptron microstress stationary installation according to claim 1 is characterized in that, described holder (2) adopts metal material to make, and its coefficient of thermal expansion is consistent with the coefficient of thermal expansion of described catoptron (1) material or approaching.
4. high face shape catoptron microstress stationary installation according to claim 1 is characterized in that, described hole for injecting glue (6) has 3-6.
5. high face shape catoptron microstress stationary installation according to claim 1 is characterized in that described hole for injecting glue (6) is taper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201310284630.1A CN103353665B (en) | 2013-07-08 | 2013-07-08 | A kind of high face shape catoptron microstress stationary installation |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310284630.1A CN103353665B (en) | 2013-07-08 | 2013-07-08 | A kind of high face shape catoptron microstress stationary installation |
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| CN103353665A true CN103353665A (en) | 2013-10-16 |
| CN103353665B CN103353665B (en) | 2015-09-09 |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5940203A (en) * | 1997-12-02 | 1999-08-17 | Raytheon Company | High-energy-burst deformable mirror |
| CN101105573A (en) * | 2006-07-11 | 2008-01-16 | 中国科学院西安光学精密机械研究所 | On-board reflective lens micro-stress fixture method |
| US7502158B2 (en) * | 2005-10-13 | 2009-03-10 | Miradia Inc. | Method and structure for high fill factor spatial light modulator with integrated spacer layer |
| CN102200623A (en) * | 2011-06-20 | 2011-09-28 | 北京空间机电研究所 | Micro-stress assembly flexible supporting method of small-calibre micro-crystal glass material reflector |
| US20120140328A1 (en) * | 2009-09-08 | 2012-06-07 | Carl Zeiss Smt Gmbh | Optical element with low surface figure deformation |
| CN102981242A (en) * | 2012-12-12 | 2013-03-20 | 中国科学院长春光学精密机械与物理研究所 | Flexible supporting mechanism for reflector of spatial optical remote sensor |
-
2013
- 2013-07-08 CN CN201310284630.1A patent/CN103353665B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5940203A (en) * | 1997-12-02 | 1999-08-17 | Raytheon Company | High-energy-burst deformable mirror |
| US7502158B2 (en) * | 2005-10-13 | 2009-03-10 | Miradia Inc. | Method and structure for high fill factor spatial light modulator with integrated spacer layer |
| CN101105573A (en) * | 2006-07-11 | 2008-01-16 | 中国科学院西安光学精密机械研究所 | On-board reflective lens micro-stress fixture method |
| US20120140328A1 (en) * | 2009-09-08 | 2012-06-07 | Carl Zeiss Smt Gmbh | Optical element with low surface figure deformation |
| CN102200623A (en) * | 2011-06-20 | 2011-09-28 | 北京空间机电研究所 | Micro-stress assembly flexible supporting method of small-calibre micro-crystal glass material reflector |
| CN102981242A (en) * | 2012-12-12 | 2013-03-20 | 中国科学院长春光学精密机械与物理研究所 | Flexible supporting mechanism for reflector of spatial optical remote sensor |
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| CN103353665B (en) | 2015-09-09 |
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Address after: 100190 No. two south of Zhongguancun, Haidian District, Beijing 1 Patentee after: NATIONAL SPACE SCIENCE CENTER, CAS Address before: 100190 No. two south of Zhongguancun, Haidian District, Beijing 1 Patentee before: Space Science & Applied Research Centre, Chinese Academy of Sciences |
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