CN103448411A - Optical anti-fake element and production method thereof - Google Patents
Optical anti-fake element and production method thereof Download PDFInfo
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- CN103448411A CN103448411A CN2012101748186A CN201210174818A CN103448411A CN 103448411 A CN103448411 A CN 103448411A CN 2012101748186 A CN2012101748186 A CN 2012101748186A CN 201210174818 A CN201210174818 A CN 201210174818A CN 103448411 A CN103448411 A CN 103448411A
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- counterfeit element
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
- G02B5/1823—Plural gratings positioned on the same surface, e.g. array of gratings in an overlapping or superposed manner
Abstract
The invention provides an optical anti-fake element and a production method thereof, aiming to overcome defects that processes in the prior art are complicated and it's difficult to realize color matching due to difficulty in accurately controlling thickness of coating layers of two types of coating structures in the prior art. The optical anti-fake element comprises a substrate (1) consisting of a first surface (31) and a second surface (32). Part of the first surface (31) is of a sub-wavelength micro-relief structure while another part thereof is of a flat surface structure; a first medium layer, a second medium layer and a third medium layer are sequentially superposed on the sub-wavelength micro-relief structure and the flat surface structure; colors of the sub-wavelength micro-relief structure and the flat surface structure are the same when observed in specific viewing angle, and are different when observed in other angles.
Description
Technical field
The present invention relates to the optical anti-counterfeiting field, relate in particular to a kind of optical anti-counterfeit element and preparation method thereof.
Background technology
Can present different colors because light becomes coating under different viewing angles, be convenient to describe, be easy to public's identification and can't utilize the electronic equipments such as camera, scanner, printer to be imitated or copy, so light becomes coating and has very high anti-counterfeit capability and be widely used in the public of the contour false proof marketable securities of banknote false proof.
Become the anti-counterfeit capability of coating in order to improve light, mostly prior art is that two kinds of light are become to electroplated coating combination realizes that two kinds of light become effect together.For example, US5766738, US6114018 and US7729026 have proposed by selecting suitable light change thickness of coating and color to realize that light becomes the interference light variable anti-counterfeiting element of matching characteristic.Particularly, this interference light variable anti-counterfeiting element comprises that two light become zone, one of them light becomes district inclusion the first light and becomes structure, another light becomes district inclusion the second light and becomes structure, and two zones have the color of coupling under some viewing angles, and two zones all have different colors under other viewing angles.
In order to guarantee good color-match effect, need accurately to control the thickness of coating in two zones.Yet, in actual production, the thickness of coating that usually is difficult to accurately control the above-mentioned interference optically variable anti-counterfeiting element to be to reach the requirement of color-match, thereby cause, at the coupling angle hypostome look of design, notable difference is arranged, affected antifalse effect.In addition, two kinds of coating can not obtain in an evaporate process, thereby must increase accurate positioning printing protection glue, demetalization and secondary evaporation light, become the techniques such as coating, and this has increased process complexity and cost.
Summary of the invention
The present invention is directed to the above-mentioned defect existed in prior art, provide a kind of and can overcome optical anti-counterfeit element of above-mentioned defect and preparation method thereof.
The invention provides a kind of optical anti-counterfeit element, this optical anti-counterfeit element comprises base material, described base material comprises first surface and second surface, subregion on described first surface is the sub-wavelength micro relief profile, subregion is the flat surfaces structure, all stacked gradually the first medium layer on described sub-wavelength micro relief profile and described flat surfaces structure, second medium layer and the 3rd dielectric layer, under the certain observation angle, described sub-wavelength micro relief profile zone is identical with the color of described flat surfaces structural region, in other viewing angles, the color of described sub-wavelength micro relief profile zone and described flat surfaces structural region is not identical.
The present invention also provides a kind of method for preparing optical anti-counterfeit element, and the method comprises:
Base material is provided, and described base material comprises first surface and second surface;
Form the sub-wavelength micro relief profile on described first surface, making the subregion on described first surface is that described sub-wavelength micro relief profile, subregion are the flat surfaces structure;
Form the first medium layer on the smooth surface texture of sub-wavelength micro relief profile regional peace zone simultaneously;
Form the second medium layer on described first medium layer simultaneously;
Form the 3rd dielectric layer on described second medium layer simultaneously.
Be formed with sub-wavelength micro relief profile and smooth surface texture on first surface due to the base material according to optical anti-counterfeit element of the present invention, and all stacked gradually the first medium layer on described sub-wavelength micro relief profile and described flat surfaces structure, second medium layer and the 3rd dielectric layer, because the coating structure consisted of three layers of dielectric layer has the selection effect to the white light of incident, like this when incident angle changes, corresponding light path changes with it, interfere wave band also to change, thereby make the color in the smooth surface texture of sub-wavelength micro relief profile regional peace zone change along with the variation of viewing angle.When the parameter of the coating structure formed by first medium layer, second medium layer and the 3rd dielectric layer by suitable design, sub-wavelength micro relief profile, can realize under specific viewing angle, the smooth surface texture of sub-wavelength micro relief profile regional peace zone has identical color, under other viewing angles, there is obvious difference in the color in the smooth surface texture of sub-wavelength micro relief profile regional peace zone.Refer to that in this explanation " identical color " color that eye-observation perceives is identical or close, not both reflectance spectrums are identical.
Traditional handicraft realizes that mode that two field color are identical generally will be through the process of " printing---evaporation---demetalization---evaporation ", and, in above-mentioned technique, in the location alignment precision of printing, twice evaporation, all there is great difficulty in the accurate control of thickness of coating.The structure of the optical anti-counterfeit element related in the present invention and preparation method can be good at addressing the above problem.In the present invention, the related smooth surface texture of sub-wavelength micro relief profile regional peace zone all can the micro-processing method such as directly be carved by laser scribing or electron beam and obtained, and laser scribing or the electronics technology such as directly carve has high precision, Nano grade can be reached, thereby the accurate register lock in these two zones can be realized.After the parameter of sub-wavelength micro relief profile determines, evaporation first medium layer, second medium layer and the 3rd dielectric layer successively simultaneously on sub-wavelength micro relief profile zone and flat surfaces structural region, can realize two zones in certain observation angle hypostome form and aspect with the different optical effect of color under, other viewing angles.Therefore can in the situation that do not need accurately to control respectively two regional thickness of coating, by designing suitable thickness of coating, realize good antifalse effect.In addition, because three layers of dielectric layer in optical anti-counterfeit element according to the present invention can form in an evaporate process, so also simplified process complexity.
The accompanying drawing explanation
Fig. 1 is the profile according to the optical anti-counterfeit element of one embodiment of the present invention;
Fig. 2 is the situation of change with viewing angle according to the color coordinates of the zones of different of optical anti-counterfeit element of the present invention;
Fig. 3 is another situation of change with viewing angle according to the color coordinates of the zones of different of optical anti-counterfeit element of the present invention;
Fig. 4 is the profile according to the optical anti-counterfeit element with engraved structure of one embodiment of the present invention;
Fig. 5 is the another schematic diagram according to the optical anti-counterfeit element of one embodiment of the present invention;
Fig. 6 is the flow chart for preparing optical anti-counterfeit element according to one embodiment of the present invention.
The specific embodiment
Below in conjunction with accompanying drawing, describe in detail according to optical anti-counterfeit element of the present invention and preparation method thereof.
As shown in Figure 1, comprise base material 3 according to the optical anti-counterfeit element of one embodiment of the present invention, described base material 3 comprises first surface 31 and second surface 32, and the subregion on described first surface 31 is that sub-wavelength micro relief profile, subregion are the flat surfaces structure.All stack gradually first medium layer 101, second medium layer 102 and the 3rd dielectric layer 103 on described sub-wavelength micro relief profile and smooth surface texture zone, thereby formed respectively the interference structure 10 that is positioned at sub-wavelength micro relief profile zone and the interference structure 20 that is positioned at the flat surfaces structural region.Wherein, the coordinate z in Fig. 1 means vertical direction, and coordinate x means horizontal direction.
Three layers of dielectric layer structure that consist of first medium layer 101, second medium layer 102 and the 3rd dielectric layer 103 have the Fabry-Perot cavity filter structure, its white light to incident has the selection effect, emergent ray only comprises the light of some wave band, forms specific color; But, when incident angle changes, the light path of answering in contrast changes, interfere wave band to change, cause the color presented also to change thereupon, become effect thereby present light.
In the time will becoming structure with the combination of sub-wavelength micro relief profile according to three layers of dielectric layer light according to the present invention, the interference and diffraction acting in conjunction, can obtain its all band, and this effect is relevant to the incident angle of light, obtains equally a kind of light change effect.So just by an evaporation light, become structure and obtain two kinds of light change effects.After the eigenperiod and dielectric layer parameter of suitable selection sub-wavelength micro relief profile, can realize homochromy asynchronous phenomenon, under a viewing angle, the micro-embossment region of sub-wavelength is different from the reflection/transmission spectrum of plane domain without the micro-embossment of sub-wavelength but color is identical or close; When viewing angle changes, both light become the effect difference, experience separately different light and become process, create a difference.This will be described in detail in conjunction with design parameter hereinafter.
Can utilize the Maxwell equation to calculate intensity and the phase place variation of Electric and magnetic fields vector through each layer and each interface, and CONSIDERING BOUNDARY CONDITIONS, obtain phase difference and Strength Changes parameter that each dielectric layer and each interface produce light, thereby realize the parameter designing according to three layers of dielectric layer coating structure in optical anti-counterfeit element of the present invention.During concrete calculating, each interface of dielectric layer can be thought of as to virtual equivalent interface, the full detail, the particularly variation relation of intensity wavelength propagated by the eigenmatrix acquisition light of calculation combination admittance and rete, the i.e. reflectance spectrum of coating in coating.Finally by reflectance spectrum and tristimulus values function are carried out to the color coordinates in the CIE color space that integration obtains coating.
Sub-wavelength micro relief profile according to the present invention has multiple parameters, such as cycle, groove depth, grooved etc., by sub-wavelength micro relief profile and three layers of dielectric layer textural association the time, also need to consider the parameters such as each layer thickness in three layers of dielectric layer coating, Refractive Index of Material.During specific design, need utilize rigorous coupled wave method (RCW), Finite-Difference Time-Domain Method (FDTD) isovector diffraction theory, in conjunction with Boundary Condition for Solving Maxwell equation group.Vector Diffraction Theory is that publish in publishing house of Zhejiang University, detailed discussion is arranged in " micro-optics and system " that Yang Guoguang writes.When the structural parameters of design consideration optical anti-counterfeit element of the present invention, can be from basic theories, according to the concrete condition of problem and will realize that optical signature algorithm for design, programming calculate, final definite each side design parameter, for example the groove depth of embossment structure, grooved, dutycycle and x direction be or/and the characteristic size on the y direction, according to the number of plies of coating of the present invention and each layer thickness, metal material, dielectric material, substrate material etc.Then according to the optics vector theory, according to the boundary condition of sub-wavelength sandwich construction coating structure, program: according to the initial configuration parameter, calculated; According to the result of calculation parameter of optimizing structure; Calculated, optimized according to the parameter after optimizing again, until reach satisfied result.
According in a preferred embodiment of the present invention, the refractive index of first medium layer 101 and the 3rd dielectric layer 103 is more than or equal to 1.7, and its material is selected from for example ZnS, TiN, TiO
2, TiO, Ti
2o
3, Ti
3o
5, Ta
2o
5, Nb
2o
5, CeO
2, Bi
2o
3, Cr
2o
3, Fe
2o
3deng in any materials or combination, and the thickness of first medium layer 101 and the 3rd dielectric layer 103 can be 10nm to 300nm, is preferably 50nm to 200nm.The refractive index of second medium layer 102 is less than 1.7, and its material is selected from for example SiO
2, MgF
2, Na
3alO
6, Al
2o
3in any materials or combination, and the thickness of second medium layer 102 can be 50nm to 1000nm, is preferably 100nm to 500nm.
According in a preferred embodiment of the present invention, described sub-wavelength micro relief profile can be one-dimensional grating and direction-agile.And the cycle of described sub-wavelength micro relief profile is also variable, wherein, the cycle of described sub-wavelength micro relief profile on x direction and/or y direction can be 50nm to 500nm, is preferably 200nm to 400nm.In addition, the groove depth of described sub-wavelength micro relief profile is also variable, and wherein, described groove depth is positioned at the scope of 10nm to 500nm, is preferably placed in the scope of 50nm to 200nm.The grooved of described sub-wavelength micro relief profile is also variable, and for example, described grooved can be at least one in sinusoidal, rectangle, zigzag.
Below providing some concrete structural parameters further describes according to optical anti-counterfeit element of the present invention.
For example, the sub-wavelength micro relief profile is the one dimension sinusoidal grating, and be 340nm its eigenperiod, and gash depth is 180nm; First medium layer 101 is 50nm for TiN, thickness, and second medium layer 102 is Al
2o
3, thickness is 180nm, the 3rd dielectric layer 103 is TiO
2, thickness is 70nm.Fig. 2 has provided in this case the situation of change along with viewing angle according to the color degree coordinate of the interference structure 10 of optical anti-counterfeit element of the present invention and interference structure 20.Can see, when the first viewing angle is 0 °, the color coordinates of interference structure 10 is (3.2,67.8), presents yellow; The color coordinates of interference structure 20 is (2.4,78.1), also presents yellow, and both aberration △ E are 13.2, and for people's vision, both colors are identical.When the second viewing angle is 40 °, the color coordinates of interference structure 10 is (1.9 ,-47.9), presents blueness; The color coordinates of interference structure 20 is (24.4,63.9), presents green, and both have significant difference at color.Visible, when the first viewing angle is 0 °, when these two of smooth surface textures of right-angle view sub-wavelength micro relief profile regional peace are regional, their color is basic identical; Along with the increase of viewing angle, it is large that the color distinction in two zones becomes, and becomes significantly two kinds of different tones.Like this, by the suitable design in plate-making, the smooth surf zone of sub-wavelength micro relief profile regional peace that can make to be coated with sub-wave length grating forms word, the pattern of certain sense, realization is faced word, pattern while observing and is hidden in background, the optical anti-counterfeiting effect that during oblique view, word, pattern manifest.When the color in the smooth surface texture of sub-wavelength micro relief profile regional peace zone is estimated, adopt the CIELAB chrominance space.CIELAB (CIELab) chrominance space is the homogeneous color space of International Commission on Illumination's recommendation in 1976, and the GB792-87 of China's issue in 1987 is using the LAB space as national standard.At present Color Scheme and the industry such as copy in colour correction, calculating and DTP system, the CIELAB space is commonly used.Wherein+a means redness, and-a means green, and+b means yellow, and-b means blueness, and L means brightness.Table 1 provide interference structure in this example 10 and interference structure 20 0 ° with 40 ° of viewing angles under L, a, b parameter, provided respectively the difference △ E between both colors, wherein △ E utilizes following formula acquisition:
△E=((L-L’)
2+(a-a’)
2+(b-b’)
2)
1/2
The CIELab coordinate of interference structure 10 and interference structure 20 under the different viewing angles of table 1
The parameters such as the material of the parameters such as grooved that preferably, can be by adjusting the sub-wavelength micro relief profile, cycle, groove depth and each dielectric layer, thickness obtain different color-match situations.For example, the sub-wavelength micro relief profile is the one dimension sinusoidal grating, and be 280nm its eigenperiod, and gash depth is 150nm; First medium layer 101 is TiO
2, thickness is 55nm, second medium layer 102 is Al
2o
3, thickness is 270nm, the 3rd dielectric layer 103 is TiO
2, thickness is 85nm, when the first viewing angle is 0 °, interference structure 10 all presents green with interference structure 20; When the second viewing angle is 20 °, interference structure 10 presents purple, and interference structure 20 presents cyan, and both have significant difference at color.Perhaps the sub-wavelength micro relief profile is the one dimension sinusoidal grating, and be 250nm its eigenperiod, and gash depth is 80nm; First medium layer 101 is TiO
2, thickness is 100nm, second medium layer 102 is Al
2o
3, thickness is 210nm, the 3rd dielectric layer 103 is TiO
2, thickness is 100nm,, when the first viewing angle is 0 °, interference structure 10 all presents blueness with interference structure 20; When the second viewing angle is 20 °, interference structure 10 presents purple, and interference structure 20 presents orange, and both have significant difference at color.
Fig. 3 has provided the situation of change along with viewing angle according to the chromaticity coordinate of the interference structure 10 of optical anti-counterfeit element of the present invention and interference structure 20, wherein, the sub-wavelength micro relief profile is the one dimension sinusoidal grating, and be 340m its eigenperiod, and gash depth is 130nm; First medium layer 101 is TiO
2, thickness is 100nm, second medium layer 102 is Na
3alF
6, thickness is 250nm, the 3rd dielectric layer 103 is 40nm for ZnS, thickness.Can see, when the first viewing angle is 0 °, the color coordinates of interference structure 10 is (3.7,46.0), presents yellow; The color coordinates of interference structure 20 is (44.2 ,-19.1), presents blue-green, and both aberration △ E are 82.2, and color has obvious difference.When the second viewing angle is 20 °, the color coordinates of interference structure 10 is (32.3 ,-36.6), presents blueness; The color coordinates of interference structure 20 is (9.2 ,-38.8), also presents blueness, and both aberration △ E are 23.4, and color is close, and human eye can not be told obvious difference.When viewing angle continues to increase to 40 °, both aberration △ E are increased to again 110.2, and it is large that color distinction between the two becomes again.Visible, when the first viewing angle is 0 °, when right-angle view two is regional, the color distinction in two zones is larger, is two kinds of different tones; Along with the increase of viewing angle, two field color all change to blueness, and when reaching 20 °, both are blueness at color, form identical color; After viewing angle continues to increase, both change again at color, notable difference occurs.Table 2 provide in this case interference structure 10 from interference structure 20 L, a under different viewing angles, b parameter.Therefore, by suitable design, can realize that picture and text are hiding again to the process manifested from appearing to viewing angle.
L, a, the b parameter of interference structure 10 and interference structure 20 under the different viewing angles of table 2
Certainly, in order to form the patterns such as word, sign, according to the optical anti-counterfeit element of one embodiment of the present invention, can also there is engraved structure 5.As shown in Figure 4, on the first surface 31 of the base material 3 of this optical anti-counterfeit element, have first area 1 and second area 2, wherein first area 1 is the sub-wavelength micro relief profile, is coated with interference structure 10 on it; Second area 2 is the flat surfaces structure, is coated with interference structure 20 on it, and wherein, interference structure 10 and interference structure 20 can adopt above-mentioned various structures.On the second surface 32 of base material 3 optionally coating or printing absorbed layer 4(for example, tusche or other colored absorption-type coating), thus form hollow out zone 5, wherein can be by suitably selecting so that hollow out zone 5 forms words, sign, pattern.Like this, when observing from first surface 31, interference structure 10 and 20 on coating absorbed layer 4 only has reflectance spectrum, present bright, as to be easy to identification color, interference structure 10 and 20 on hollow out zone 5 presents pellucidity, while particularly being attached on the carriers such as paper, mainly present the color of the carriers such as paper.Especially, while being observed, by hollow out zone 5, can increase a kind of picture and text effect under the viewing angle that presents same color at interference structure 10 and interference structure 20, promote the vision capture power of this Security element, strengthen antifalse effect.Like this, when taking the reflective observing mode, absorbed layer 4 absorbs transmitted ray, strengthens the identification of human eye to reflection ray, strengthens the visual effect according to optical anti-counterfeit element of the present invention.
Fig. 5 has provided the another embodiment according to optical anti-counterfeit element of the present invention.Wherein on the first surface 31 of base material 3, at least be coated with two kinds of orthogonal sub-wave length gratings of direction, and be coated with multilayer dielectricity layer coating structure as above on described sub-wave length grating, thereby form interference structure 10, interference structure 20 and interference structure 30, wherein interference structure 10, interference structure 30 cover respectively on two kinds of orthogonal sub-wave length gratings, and interference structure 20 is positioned on flat surfaces.By the parameter of suitable adjusting sub-wave length grating and the parameter of coating structure, can obtain following effect: when right-angle view, interference structure 10, interference structure 20 are identical with the color of interference structure 30; During the certain angle oblique view, interference structure 10 hue preserving colors are constant, interference structure 20 from the color of interference structure 30, change and change after the color that obtains different; 90 ° of these optical anti-counterfeit elements of rotation now, the colors exchange occurs with interference structure 30 in interference structure 10, and the color of interference structure 20 still keeps under this angle original color constant.Hide the optical signature that when inclination and rotation, picture and text manifest while utilizing these characteristics that right-angle view can be realized.As example, for example, the sub-wavelength micro relief profile is the one dimension sinusoidal grating, be 340nm its eigenperiod, gash depth is 130nm, there are orthogonal two sub-wave length grating zones on the first surface 31 of base material 3, thereby form interference structure 10, interference structure 20 and interference structure 30, wherein interference structure 10, interference structure 30 covers respectively on two kinds of orthogonal sub-wave length gratings, interference structure 20 is positioned on flat surfaces, and be coated with multilayer dielectricity layer coating structure as above on described sub-wave length grating, wherein first medium layer 101 is TiN, thickness is 50nm, second medium layer 102 is Al
2o
3, thickness is 180nm, the 3rd dielectric layer 103 is TiO
2, thickness is 70nm., when the first viewing angle is 0 °, interference structure 10, interference structure 20 are yellow with the color of interference structure 30; When this optical anti-counterfeit element that tilts makes the second viewing angle be 40 °, interference structure 10 colors become blueness, and interference structure 20 becomes green, and interference structure 30 hue preserving yellow are constant; When 90 ° of this optical anti-counterfeit elements of rotation under this angle of inclination, interference structure 20 colors be still green, and interference structure 10 colors become blueness, and interference structure 30 colors become yellow, realize the color swap of interference structure 10 and interference structure 30.
Should be understood that, Fig. 4 and Fig. 5 are only examples, in fact, according to actual needs, can parameters, the arrangement mode of sub-wavelength micro relief profile be optimized, combine, and cover corresponding dielectric layer thereon, and combine to form high false proof optical anti-counterfeit element with hollow out.
Preferably, above-mentioned base material 3 can be transparent or nontransparent, coloured or colourless film.Such as being poly terephthalic acid diol ester, polyvinyl chloride, polyethylene, Merlon, polypropylene, metal, glass and paper etc., and its thickness can be 5 microns to 500 microns, is preferably 10 microns to 100 microns.
In one embodiment according to the present invention, when adopting the printing opacity view mode, base material 3 can be left intact or be coated with the coating of transparent/translucent, so that light sees through.
In addition, should be appreciated that, it is similar that color-match herein refers to that color acquires a certain degree, and not meaning color must be identical.
In addition, can be made into opened window safety line, joint strip, the product forms such as labeling according to optical anti-counterfeit element of the present invention.For convenient, on product, apply, one side or the two sides of this optical anti-counterfeit element scribble adhesive glue, in order to be attached on carrier by techniques such as thermoprint or stickups.And, according to optical anti-counterfeit element of the present invention, can be applied on the contour safety of banknote, card and high-grade goods or high value-added product.
As shown in Figure 6, the present invention also provides a kind of method for preparing optical anti-counterfeit element, and the method comprises:
S61, provide base material, described base material comprises first surface and second surface;
S62, form the sub-wavelength micro relief profile on described first surface, making the subregion on described first surface is that described sub-wavelength micro relief profile, subregion are the flat surfaces structure;
Wherein, the mode that described sub-wavelength micro relief profile can interfere exposure, laser scribing exposure or electron beam directly to be carved by double laser beams forms, or carries out batch duplicating by the mode of ultraviolet cast, mold pressing, nano impression.For example, the sub-wavelength micro relief profile can pass through the methods such as holographic interferometry, laser scribing technology, electron beam lithography and make mother matrix, by electroforming process, makes working version, transfers on base material by production technologies such as mold pressing, UV copy.
S63, on the smooth surface texture of sub-wavelength micro relief profile regional peace zone, form the first medium layer simultaneously;
S64, on described first medium layer, form the second medium layer simultaneously;
S65, form the 3rd dielectric layer on described second medium layer simultaneously.
Wherein, described first medium layer, described second medium layer and described the 3rd dielectric layer can form by the mode of the physical vapour deposition (PVD)s such as thermal evaporation, electron beam evaporation, magnetron sputtering or chemical vapour deposition (CVD).
In sum, according to dielectric layer structure of the present invention, can form by an evaporate process, can even control position and the characteristic size of sub-wavelength micro relief profile on Nano grade at micron and the micro-nano processing technology such as directly carve by laser scribing or electron beam, so, not only improved anti-counterfeiting performance according to optical anti-counterfeit element of the present invention, and reduced technology difficulty, saved cost.
Only with reference to preferred embodiment, described according to optical anti-counterfeit element of the present invention above should be appreciated that, still one of skill in the art will appreciate that and can make various changes and modifications to the present invention under the prerequisite that does not deviate from the spirit and scope of the present invention.
Claims (23)
1. an optical anti-counterfeit element, this optical anti-counterfeit element comprises base material (3), described base material (3) comprises first surface (31) and second surface (32), subregion on described first surface (31) is the sub-wavelength micro relief profile, subregion is the flat surfaces structure, all stacked gradually the first medium layer on described sub-wavelength micro relief profile and described flat surfaces structure, second medium layer and the 3rd dielectric layer, under the certain observation angle, described sub-wavelength micro relief profile zone is identical with the color of described flat surfaces structural region, in other viewing angles, the color of described sub-wavelength micro relief profile zone and described flat surfaces structural region is not identical.
2. optical anti-counterfeit element according to claim 1, wherein, described certain observation angle is 0 degree or other values that are greater than 0 degree.
3. optical anti-counterfeit element according to claim 1, wherein, the refractive index of described first medium layer and described the 3rd dielectric layer is more than or equal to 1.7.
4. optical anti-counterfeit element according to claim 1, wherein, the thickness of described first medium layer and described the 3rd dielectric layer is 10nm to 300nm.
5. optical anti-counterfeit element according to claim 1, wherein, the thickness of described first medium layer and described the 3rd dielectric layer is 50nm to 200nm.
6. according to the described optical anti-counterfeit element of arbitrary claim in claim 3 to 5, wherein, the material of described first medium layer and described the 3rd dielectric layer is selected from ZnS, TiN, TiO
2, TiO, Ti
2o
3, Ti
3o
5, Ta
2o
5, Nb
2o
5, CeO
2, Bi
2o
3, Cr
2o
3, Fe
2o
3in any materials or its combination.
7. optical anti-counterfeit element according to claim 1, wherein, the refractive index of described second medium layer is less than 1.7.
8. optical anti-counterfeit element according to claim 1, wherein, the thickness of described second medium layer is 50nm to 1000nm.
9. optical anti-counterfeit element according to claim 1, wherein, the thickness of described second medium layer is 100nm to 500nm.
10. according to the described optical anti-counterfeit element of arbitrary claim in claim 7 to 9, wherein, the material of described second medium layer is selected from SiO
2, MgF
2, Na
3alO
6, Al
2o
3in any materials or its combination.
11. optical anti-counterfeit element according to claim 1, wherein, described sub-wavelength micro relief profile is one-dimensional grating and direction-agile.
12. optical anti-counterfeit element according to claim 1, wherein, at least one in the cycle of described sub-wavelength micro relief profile, groove depth and grooved is variable.
13. optical anti-counterfeit element according to claim 12, wherein, the cycle of described sub-wavelength micro relief profile on x direction and/or y direction is 50nm to 500nm.
14. optical anti-counterfeit element according to claim 12, wherein, the cycle of described sub-wavelength micro relief profile on x direction and/or y direction is 200nm to 400nm.
15. optical anti-counterfeit element according to claim 12, wherein, described groove depth is positioned at the scope of 10nm to 500nm.
16. optical anti-counterfeit element according to claim 12, wherein, described groove depth is positioned at the scope of 50nm to 200nm.
17. optical anti-counterfeit element according to claim 12, wherein, described grooved is at least one in sinusoidal, rectangle, zigzag.
18. optical anti-counterfeit element according to claim 1, wherein, described base material (3) is transparent or nontransparent, coloured or colourless film.
19. optical anti-counterfeit element according to claim 1, wherein, be coated with the coating of transparent/translucent, so that light sees through on the first surface (31) of described base material (3).
20. optical anti-counterfeit element according to claim 1, wherein, be coated with absorbed layer on the part or all of second surface (32) of described base material (3).
21. a method for preparing optical anti-counterfeit element, the method comprises:
Base material (3) is provided, and described base material (3) comprises first surface (31) and second surface (32);
At the upper sub-wavelength micro relief profile that forms of described first surface (31), making the subregion on described first surface (31) is that described sub-wavelength micro relief profile, subregion are the flat surfaces structure;
Form the first medium layer on the smooth surface texture of sub-wavelength micro relief profile regional peace zone simultaneously;
Form the second medium layer on described first medium layer simultaneously;
Form the 3rd dielectric layer on described second medium layer simultaneously.
22. method according to claim 21, wherein, the mode that described sub-wavelength micro relief profile interferes exposure, laser scribing exposure or electron beam directly to be carved by double laser beams forms, or carries out batch duplicating by the mode of ultraviolet cast, mold pressing, nano impression.
23. method according to claim 21, wherein, described first medium layer, described second medium layer and described the 3rd dielectric layer form by the mode of physical vapour deposition (PVD) or chemical vapour deposition (CVD).
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| CN201210174818.6A CN103448411B (en) | 2012-05-30 | 2012-05-30 | A kind of optical anti-counterfeit element and its preparation method |
| PCT/CN2012/076801 WO2013177829A1 (en) | 2012-05-30 | 2012-06-12 | Optical anti-counterfeit element and preparation method thereof |
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| CN201210174818.6A CN103448411B (en) | 2012-05-30 | 2012-05-30 | A kind of optical anti-counterfeit element and its preparation method |
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| CN103448411B (en) | 2016-06-01 |
| WO2013177829A1 (en) | 2013-12-05 |
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