CN103605262B - 曝光装置及其维护方法、以及元件制造方法 - Google Patents
曝光装置及其维护方法、以及元件制造方法 Download PDFInfo
- Publication number
- CN103605262B CN103605262B CN201310395481.6A CN201310395481A CN103605262B CN 103605262 B CN103605262 B CN 103605262B CN 201310395481 A CN201310395481 A CN 201310395481A CN 103605262 B CN103605262 B CN 103605262B
- Authority
- CN
- China
- Prior art keywords
- liquid
- immersion exposure
- liquid immersion
- exposure apparatus
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Abstract
Description
Claims (45)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004171115 | 2004-06-09 | ||
JP2004-171115 | 2004-06-09 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800183590A Division CN101095213B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103605262A CN103605262A (zh) | 2014-02-26 |
CN103605262B true CN103605262B (zh) | 2016-06-29 |
Family
ID=35503354
Family Applications (8)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510891261.1A Expired - Fee Related CN105467775B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201610366219.2A Expired - Fee Related CN105911821B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置 |
CN2010101278158A Expired - Fee Related CN101776850B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201810156462.0A Pending CN108490741A (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201310051383.0A Expired - Fee Related CN103439863B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置、曝光方法、元件制造方法及维护方法 |
CN2005800183590A Expired - Fee Related CN101095213B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN2010101278020A Expired - Fee Related CN101819386B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201310395481.6A Expired - Fee Related CN103605262B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及其维护方法、以及元件制造方法 |
Family Applications Before (7)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510891261.1A Expired - Fee Related CN105467775B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201610366219.2A Expired - Fee Related CN105911821B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置 |
CN2010101278158A Expired - Fee Related CN101776850B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201810156462.0A Pending CN108490741A (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN201310051383.0A Expired - Fee Related CN103439863B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置、曝光方法、元件制造方法及维护方法 |
CN2005800183590A Expired - Fee Related CN101095213B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
CN2010101278020A Expired - Fee Related CN101819386B (zh) | 2004-06-09 | 2005-06-07 | 曝光装置及元件制造方法 |
Country Status (8)
Country | Link |
---|---|
US (5) | US8520184B2 (zh) |
EP (3) | EP3203498A1 (zh) |
JP (12) | JP4760708B2 (zh) |
KR (9) | KR101561796B1 (zh) |
CN (8) | CN105467775B (zh) |
HK (5) | HK1101294A1 (zh) |
TW (7) | TW201802619A (zh) |
WO (1) | WO2005122218A1 (zh) |
Families Citing this family (111)
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JP4837556B2 (ja) | 2003-04-11 | 2011-12-14 | 株式会社ニコン | 液浸リソグラフィにおける光学素子の洗浄方法 |
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US7684008B2 (en) | 2003-06-11 | 2010-03-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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JP2006032750A (ja) * | 2004-07-20 | 2006-02-02 | Canon Inc | 液浸型投影露光装置、及びデバイス製造方法 |
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KR101466533B1 (ko) | 2005-04-25 | 2014-11-27 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치 및 액체 공급 방법 |
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