CN103692331B - The workbench of curved surface polishing machine - Google Patents
The workbench of curved surface polishing machine Download PDFInfo
- Publication number
- CN103692331B CN103692331B CN201310734829.XA CN201310734829A CN103692331B CN 103692331 B CN103692331 B CN 103692331B CN 201310734829 A CN201310734829 A CN 201310734829A CN 103692331 B CN103692331 B CN 103692331B
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- China
- Prior art keywords
- work platforms
- frame
- guide rail
- workpiece
- workbench
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- 238000005498 polishing Methods 0.000 title claims abstract description 78
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- WYTGDNHDOZPMIW-RCBQFDQVSA-N alstonine Natural products C1=CC2=C3C=CC=CC3=NC2=C2N1C[C@H]1[C@H](C)OC=C(C(=O)OC)[C@H]1C2 WYTGDNHDOZPMIW-RCBQFDQVSA-N 0.000 claims description 9
- 238000001816 cooling Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000012423 maintenance Methods 0.000 abstract description 3
- 230000005540 biological transmission Effects 0.000 abstract description 2
- 230000007547 defect Effects 0.000 abstract description 2
- 238000006073 displacement reaction Methods 0.000 description 6
- 239000012530 fluid Substances 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000001174 ascending effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000033001 locomotion Effects 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 208000031481 Pathologic Constriction Diseases 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 210000001215 vagina Anatomy 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
Abstract
The invention discloses the workbench of a kind of horizontally movable curved surface polishing machine, it includes frame, it is characterized in that frame is provided with guide rail, work platforms is arranged on guide rail by the slide block coordinated with guide rail, make the work platforms can at slide on rails, work platforms is provided with chain mounting seat, frame is provided with and moves horizontally drive motor, driven sprocket, by moving horizontally the drive sprocket that drive motor drives, chain is wound on drive sprocket and driven sprocket, two ends are connected with chain mounting seat respectively, present configuration is simple, Operation and Maintenance is simple and convenient, failure rate is low, service life of equipment is long, slide block embeds with track and coordinates, mobile steady, and transmission is for flexibly connecting, possesses good impact resistance；Meanwhile, overcome the defect that existing polishing exists, substantially increase production efficiency and lay the foundation for realizing production line balance.
Description
Technical field
The present invention relates to a kind of curved surface polishing machine, specifically the workbench of a kind of ultra-thin, fragile workpiece curved surface polishing machine, particularly relates to a kind of such as the workbench of the workpiece curved surface polishing machines such as glass, sapphire, piezoelectric quartz, monocrystalline silicon piece.
Background technology
In order to make the surface of the workpiece such as ultra-thin, fragile workpiece such as glass, sapphire, piezoelectric quartz, monocrystalline silicon piece become smooth, transparent, and there is gloss, generally its surface need to be polished.At present, the basic structure of existing used curved surface polishing machine is upper dish (polishing disk), lower disc, and polishing disk is rotated, and the work platforms and the lower wall that are placed with workpiece can reversely rotate by polishing disk relatively, one is increase grinding speed, and two is make workpiece polishing uniformly.Simultaneously, in whole motor process, because the contact area of polishing disk Yu work platforms remains unchanged, so when press polish works, cylinder can pass through polishing disk and apply constant pressure to the workpiece on work platforms, to ensure to keep between polishing disk and workpiece constant pressure.But, because polishing disk, work platforms are all rotated, polishing disk, work platforms outer ring and inner ring on-line velocity on there are differences, so cause that the polishing uniformity of workpiece on work platforms is poor, workpiece stays blemishes, as polished stricture of vagina etc., affects polishing effect and efficiency.
Summary of the invention
It is an object of the invention to provide the workbench of a kind of horizontally movable curved surface polishing machine, namely while polishing disk is rotated, the work platforms and the lower wall that are placed with workpiece move horizontally.
The present invention adopts the following technical scheme that and realizes its goal of the invention, a kind of workbench of curved surface polishing machine, it includes frame, frame is provided with guide rail, work platforms is arranged on guide rail by the slide block coordinated with guide rail, make the work platforms can at slide on rails, work platforms is provided with chain mounting seat, frame be provided with move horizontally drive motor, driven sprocket, by move horizontally drive motor drive drive sprocket, chain is wound on drive sprocket and driven sprocket, and two ends are connected with chain mounting seat respectively.
Work platforms of the present invention is square.
For making workpiece have moderately good polishing effect, work platforms of the present invention is provided with the cooling body that work platforms is cooled down and installs the adsorbing mechanism of workpiece.
Cooling body of the present invention includes the serpentine waterways being located in work platforms, the water supply connector that connects with serpentine waterways, water out adapter, water inlet pipe, outlet pipe are arranged on drag chain and are connected with water supply connector, water out adapter respectively, drag chain one end is fixed in frame, and the other end is fixed on work platforms；Vacuum air-channel that described adsorbing mechanism includes being located in work platforms, the vacuum cup being arranged on work platforms to connect with vacuum air-channel.
Work platforms of the present invention has tank and air drain, and is closed by shrouding, thus forming serpentine waterways and vacuum air-channel；It is provided with substrate with the corresponding position of vacuum air-channel, substrate is provided with vacuum cup.
Owing to adopting technique scheme, the present invention achieves goal of the invention preferably, its simple in construction, Operation and Maintenance is simple and convenient, failure rate is low, service life of equipment are long, and slide block embeds with track and coordinates, mobile steady, and transmission is for flexibly connecting, possesses good impact resistance；Meanwhile, overcome the defect that existing polishing exists, substantially increase production efficiency and lay the foundation for realizing production line balance.
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention；
Fig. 2 is the electric control theory schematic diagram of the present invention；
Fig. 3 is the work surface calculating schematic diagram (work platforms displacement H is less than or equal to the radius R of polishing disk) with the near contact area S of workpiece of polishing disk of the present invention；
Fig. 4 is the work surface calculating schematic diagram (work platforms displacement H is more than the radius R of polishing disk) with the near contact area S of workpiece of polishing disk of the present invention；
Fig. 5 is the tonnage curve chart of the present invention.
Detailed description of the invention
Below in conjunction with drawings and Examples, the invention will be further described.
As seen from Figure 1, Figure 2, a kind of workbench of curved surface polishing machine, it includes frame 1, frame 1 is provided with guide rail 10, work platforms 8 is arranged on guide rail 10 by the slide block 9 coordinated with guide rail 10, make work platforms 8 can slide on guide rail 10, work platforms 8 is provided with chain mounting seat 21, frame 1 be provided with move horizontally drive motor 12, driven sprocket 15, by moving horizontally the drive sprocket 13 that drive motor 12 drives, chain 14 is wound on drive sprocket 13 and driven sprocket 15, and two ends are connected with chain mounting seat 21 respectively.Simple for controlling, the movement of work platforms 8 of the present invention is horizontal linear uniform motion.
Work platforms 8 of the present invention is square.
For making workpiece 17 have moderately good polishing effect, work platforms 8 of the present invention is provided with the cooling body that work platforms 8 is cooled down and installs the adsorbing mechanism of workpiece 17.
Cooling body of the present invention includes the serpentine waterways 19 being located in work platforms 8, the water supply connector that connects with serpentine waterways 19, water out adapter, water inlet pipe, outlet pipe are arranged on drag chain and are connected with water supply connector, water out adapter respectively, drag chain one end is fixed in frame 1, and the other end is fixed on work platforms 8；Vacuum air-channel 20 that described adsorbing mechanism includes being located in work platforms 8, it is arranged on work platforms 8 vacuum cup connected with vacuum air-channel 20.
Work platforms 8 of the present invention has tank and air drain, and is closed by shrouding 11, thus forming serpentine waterways 19 and vacuum air-channel 20；It is provided with substrate 18 with the corresponding position of vacuum air-channel 20, substrate 18 is provided with vacuum cup.
For making polishing disk 16 revolve round the sun while rotation, polishing disk 16 of the present invention is arranged in mounting disc 7, and polishing disk 16 is driven by the polishing motor 3 being arranged on elevator platform 5, and described mounting disc 7 is driven by the revoluting motor 6 being arranged on elevator platform 5.Described polishing disk 16 is 2～8, and the polishing disk 16 of the present embodiment is 3, and the axle that drives of polishing disk 16 is coupled with the main shaft of polishing motor 3 by gear train.
The pressure set for keeping polishing disk 16 that workpiece 17 is applied, frame 1 is provided with the dynamic pressurized device realizing polishing disk 16 to workpiece 17 applying setting pressure, in the horizontal linear moving process of described dynamic pressurized device busy platform 8, by the polishing disk 16 being arranged on elevator platform 5, workpiece 17 is kept the pressure applying to set, thus realizing the polishing to workpiece 17.Dynamic pressurized device of the present invention includes the displacement transducer being arranged in frame 1 lift cylinder 2 controlled by PLC, detecting work platforms 8 displacement, and the cylinder block of lift cylinder 2 is arranged in frame 1, and the piston rod of lift cylinder 2 is connected with elevator platform 5；The contact area of the PLC displacement calculation polishing disk 16 according to work platforms 8 and workpiece 17, passing ratio reversal valve determines that the ascending, descending to lift cylinder 2 controls, it is achieved workpiece 17 is applied the pressure of setting by polishing disk 16.
From Fig. 3, Fig. 4, simple for calculating, workpiece 17 is applied the pressure that sets as P=(F-G by polishing disk 16 of the present invention)/S, F be the pressure that polishing disk 16 is applied to workpiece, G is the weight of elevator platform 5, and S is the work surface contact area with workpiece 17 of polishing disk 16；The work surface of described polishing disk 16 and the contact area approximate calculation of workpiece 17 be:
In formula, S represents the near contact area of polishing disk 16 and workpiece 17, and R represents the radius of polishing disk 16, and H represents the relative shift of work platforms 8, R >=H, cos α=(R-H)/R；Or
In formula, S represents the near contact area of polishing disk 16 and workpiece 17, and R represents the radius of polishing disk 16, and H represents the relative shift of work platforms 8, H > R, cos α=(H-R)/R.
The present embodiment is provided with lift cylinder 2 in frame 1, the piston rod of lift cylinder 2 is connected with elevator platform 5, the polishing disk 16 of the present embodiment is 6, it is arranged on elevator platform 5 respectively through mounting disc 7, and driven by polishing motor 3, the centre bore on polishing disk 16 is connected with polishing fluid part flow arrangement 4 respectively；Described mounting disc 7 is driven by the revoluting motor 6 being arranged on elevator platform 5.
When the present invention works, workpiece 17 is moved to vacuum cup by mechanical hand, under the control of PLC, work platforms 8 is moved by moving horizontally the drive motor 12 horizontal uniform rectilinear of drive, according to the pressure set, the contact area S of the PLC displacement approximate calculation polishing disk 16 according to work platforms 8 and workpiece 17, passing ratio reversal valve determines that the ascending, descending to lift cylinder 2 controls, polishing disk 16 is revolved round the sun by mounting disc 7 while rotation, workpiece 17 is polished, and Fig. 5 show the tonnage curve chart of the present invention.
Owing to polishing disk 16 is with the speed high speed rotating (existing polishing velocity is for about 300 revs/min) of about 1000 revs/min, produce substantial amounts of heat, therefore, the polished liquid part flow arrangement 4 of emulsus polishing fluid respectively enter polishing disk 16 centre bore and flow out workpiece 17 is cooled down, simultaneously, work platforms 8 is also cooled down by cooling water, to keep best effort environment during polishing operation to be between 25 ± 5 DEG C.
Polishing fluid part flow arrangement 4 of the present invention includes feed tube, shunting main chamber, and shunting main chamber couples with the main shaft of polishing motor 3, and shunting main chamber is coupled with the centre bore of polishing disk 16 by isocon；Feed tube and shunting main chamber, sealed by sealing member between isocon and the centre bore of polishing disk 16, with ensure polishing disk 16 rotation with revolution time emulsus polishing fluid do not spill.
The present invention, while polishing disk 16 is rotated, is placed with the work platforms 8 of workpiece 17 and carries out horizontal linear and move, and meanwhile, polishing disk 16 is revolved round the sun by mounting disc 7 while rotation.So, one is be finished to intermittent operation due to workpiece 17, and cool time is longer, it is possible to effectively prevent excess calories from concentrating the workpiece 17 caused to crush, so polishing disk 16 can rotate with a fair speed, thus realizing high speed polishing operation；Two is owing to the horizontal linear of work platforms 8 moves, it is to avoid the linear velocity difference of the long-time grinding of workpiece 17, thus improve finished product rate；Three is that work platforms 8 can be set to square owing to the shape of workpiece 17 is with square in the majority so that the space availability ratio of work platforms 8 is high, reduces the requirement to pendulum；Four is that workpiece on work platforms 8 is only partially in polishing disk 16 times all the time, and when " stir-fry machine " phenomenon occurs, only the workpiece 17 under polishing disk 16 can be damaged, thus reducing the loss that " stir-fry machine " brings to processing；Meanwhile, the present invention substantially increases production efficiency and lays the foundation for realizing production line balance, and burnishing device rational and compact, Operation and Maintenance are simple and convenient, failure rate is low, service life of equipment are long.
Claims (3)
1. one kind ultra-thin, the workbench of fragile workpiece curved surface polishing machine, it includes frame, it is characterized in that frame is provided with guide rail, work platforms is arranged on guide rail by the slide block coordinated with guide rail, making the work platforms can at slide on rails, work platforms be provided with chain mounting seat, frame be provided with move horizontally drive motor, driven sprocket, by moving horizontally the drive sprocket that drive motor drives, chain is wound on drive sprocket and driven sprocket, and two ends are connected with chain mounting seat respectively；Described work platforms is provided with the cooling body that work platforms is cooled down and installs the adsorbing mechanism of workpiece；Described cooling body includes the serpentine waterways being located in work platforms, the water supply connector that connects with serpentine waterways, water out adapter, water inlet pipe, outlet pipe are arranged on drag chain and are connected with water supply connector, water out adapter respectively, and drag chain one end is fixed in frame, and the other end is fixed on work platforms；Vacuum air-channel that described adsorbing mechanism includes being located in work platforms, the vacuum cup being arranged on work platforms to connect with vacuum air-channel.
2. the workbench of ultra-thin, fragile workpiece curved surface polishing machine according to claim 1, is characterized in that described work platforms is square.
3. the workbench of ultra-thin, fragile workpiece curved surface polishing machine according to claim 1 or claim 2, be is characterized in that having on described work platforms tank and air drain, and is closed by shrouding, thus forming serpentine waterways and vacuum air-channel；It is provided with substrate with the corresponding position of vacuum air-channel, substrate is provided with vacuum cup.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310734829.XA CN103692331B (en) | 2013-12-27 | 2013-12-27 | The workbench of curved surface polishing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310734829.XA CN103692331B (en) | 2013-12-27 | 2013-12-27 | The workbench of curved surface polishing machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103692331A CN103692331A (en) | 2014-04-02 |
| CN103692331B true CN103692331B (en) | 2016-07-13 |
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| CN201310734829.XA Active CN103692331B (en) | 2013-12-27 | 2013-12-27 | The workbench of curved surface polishing machine |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104551935A (en) * | 2014-12-26 | 2015-04-29 | 张现柱 | Automatic polisher for arc panel |
| MY186276A (en) * | 2015-05-13 | 2021-07-02 | Shinetsu Chemical Co | Method for producing substrates |
| CN106181681A (en) * | 2016-08-31 | 2016-12-07 | 天通银厦新材料有限公司 | Accurate sanding apparatus is used in a kind of sapphire processing |
| CN109524285B (en) * | 2017-09-19 | 2021-06-11 | 中国电子科技集团公司第四十八研究所 | Ion beam etching equipment |
| CN109108802B (en) * | 2018-10-10 | 2019-12-31 | 东旭集团有限公司 | Curved surface glass concave surface polishing machine |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6193588B1 (en) * | 1998-09-02 | 2001-02-27 | Micron Technology, Inc. | Method and apparatus for planarizing and cleaning microelectronic substrates |
| CN201070735Y (en) * | 2007-08-07 | 2008-06-11 | 霍秀荣 | Polishing machine |
| CN101244539A (en) * | 2007-12-29 | 2008-08-20 | 浙江工业大学 | Polisher for free curve flexibility of mold |
| CN101407040A (en) * | 2008-11-11 | 2009-04-15 | 广东工业大学 | Face lapping mill with abrasive disk cooling mechanism |
| CN201664877U (en) * | 2010-04-07 | 2010-12-08 | 吴航武 | Full-automatic iron plate polishing machine |
| CN203680007U (en) * | 2013-12-27 | 2014-07-02 | 湖南宇晶机器股份有限公司 | Working platform of cambered polishing machine |
-
2013
- 2013-12-27 CN CN201310734829.XA patent/CN103692331B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6193588B1 (en) * | 1998-09-02 | 2001-02-27 | Micron Technology, Inc. | Method and apparatus for planarizing and cleaning microelectronic substrates |
| CN201070735Y (en) * | 2007-08-07 | 2008-06-11 | 霍秀荣 | Polishing machine |
| CN101244539A (en) * | 2007-12-29 | 2008-08-20 | 浙江工业大学 | Polisher for free curve flexibility of mold |
| CN101407040A (en) * | 2008-11-11 | 2009-04-15 | 广东工业大学 | Face lapping mill with abrasive disk cooling mechanism |
| CN201664877U (en) * | 2010-04-07 | 2010-12-08 | 吴航武 | Full-automatic iron plate polishing machine |
| CN203680007U (en) * | 2013-12-27 | 2014-07-02 | 湖南宇晶机器股份有限公司 | Working platform of cambered polishing machine |
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| Publication number | Publication date |
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| CN103692331A (en) | 2014-04-02 |
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Application publication date: 20140402 Assignee: Hunan Yiyuan New Material Technology Co.,Ltd. Assignor: HUNAN YUJING MACHINE INDUSTRIAL Co.,Ltd. Contract record no.: X2023980050763 Denomination of invention: Worktable of curved surface polishing machine Granted publication date: 20160713 License type: Common License Record date: 20231213 |