CN103726019A - Design method for baffle capable of improving coating film uniformity of spherical optical element - Google Patents
Design method for baffle capable of improving coating film uniformity of spherical optical element Download PDFInfo
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- CN103726019A CN103726019A CN201310684126.0A CN201310684126A CN103726019A CN 103726019 A CN103726019 A CN 103726019A CN 201310684126 A CN201310684126 A CN 201310684126A CN 103726019 A CN103726019 A CN 103726019A
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Abstract
The invention discloses a design method for a baffle capable of improving coating film uniformity of a spherical optical element in a planetary rotating system coating machine. A coating film model is built and a planar modifying baffle with a parabola outline is designed. According to the invention, the experiment that the baffle is applied to coating film shows that the improvement on the uniformity of film thickness can reach 97.5% above within the ratio range (minus 1.9-1.9) of clear aperture to curvature radius, and the baffle is applicable to convex spherical optical elements and concave spherical optical elements.
Description
Technical field
The present invention relates to film preparation field, particularly in a kind of planetary rotation system coating equipment, improve the inhomogeneity baffle design method of spherical optics element plated film.
Background technology
Optical thin film is the indispensable composition device of contemporary optics system, and it has given optical element various performances, and the quality of opticinstrument is played an important role.Optical thin film element is widely used in optical field, has the ground of light conveniently to have the shadow of optical thin film.Along with the development of contemporary optics system, the performance of optical thin film is also had higher requirement.Nowadays, a lot of optical imaging systems are just towards the future development of large-numerical aperture.Among these systems, exist various optical elements, be much wherein the spherical optics element with large clear aperature and radius-of-curvature ratio.Conventionally, on these spherical optics elements, to be coated with the optical thin film of thickness homogeneous, and then control transmissivity or reflectivity homogeneity and wavefront error, otherwise can have a strong impact on image quality.
Nowadays there is several different methods to improve optical element film coated homogeneity, comprise single axle rotation system and the planetary rotation system used, use modifying mask or revise planetary rotation operation scheme.Conventionally, planetary rotation system is than the good uniformity of single axle rotation system, can not be applicable to spherical optics element, because the thickness of spherical optics element sharply changes on radial direction but do not use in the situation of baffle plate.Use modifying mask selectively to block sedimentation rate ratio position faster on optical element, can significantly improve the homogeneity of plated film.Wherein, fixed correction plate washer machine is installed simple and easy, and repeatability is high, is widely used.But, at present for the design of planetary rotation system correction plate washer, be mainly to rely on the initial baffle plate of empirical design, then by great many of experiments, repeatedly revise baffle shapes, finally reach the uniformity requirement of expection.This process not only wastes time and energy, and also requires slip-stick artist to have rich experience.Particularly, for different spherical optics elements, need different modifying masks, once in the face of there being the engineering of multiple spherical optics elements, use this empirical method obviously can not effectively finish the work.
Summary of the invention
The object of the present invention is to provide and in a kind of planetary rotation system coating equipment, improve the inhomogeneity baffle design method of spherical optics element plated film, based on computer simulation, determine fast and accurately the shape of the optical element film coated inhomogeneity baffle plate of planetary rotation system coating equipment Internal Spherical Surface and the method for position.
Technical solution of the present invention is as follows:
In a kind of planetary rotation system coating equipment, improve the inhomogeneity baffle design method of spherical optics element plated film, it is characterized in that the method comprises the following steps:
(1), according to the vacuum chamber configuring condition of planetary rotation system coating equipment, set up the optical element film coated model of planetary rotation system coating equipment Internal Spherical Surface:
On planetary rotation fixture, a clear aperture is CA, radius-of-curvature is the sphere element Sub of RoC, a point P (x on this sphere element, y, z), the thickness being evaporated in the unit time on this aspect is (F.Villa and O.Pompa, " Emission pattern of real vapor sources in high vacuum:an overview; " Appl.Opt.38,695-703 (1999)):
Wherein, A is a constant; R is from evaporation source S (x
s, y
s, z
s) point to the length of vector r of some P (x, y, z);
be the angle of evaporation source surface normal vector s and described vector r, evaporate angle; θ is that a p points to centre of sphere O (x
o, y
o, z
o) vector C and the angle of vector r, i.e. deposition angles; N is evaporation source evaporation characteristic parameter, and planetary rotation dish is parallel with evaporation source S and spherical optics element Sub is placed in to planetary plate center, and thickness expression formula is transformed in rectangular coordinate system and can be obtained:
Wherein M is used for distinguishing concavo-convex sphere, and for protruding sphere M=0, for concave spherical surface M=1, R is planetary orbit radius, L is horizontal throw and the L ∈ [0, CA/2] of a P to centre of sphere O, and K is planetary plate rotation and revolution rotating ratio, H is planetary plate height, and α is planetary plate revolution angle, and β is the point initial rotation angle of P and β ∈ [0,2 π], through above-mentioned conversion, for definite sphere component parameters (CA, RoC, M), coating equipment configuration parameter (R, K, H, x
s, y
s, z
s) and evaporation source evaporation characteristic parameter n, the thickness in formula (1) can be converted into the function t (L of independent variable(s) (L, β, α), β, α), when after revolution certain angle, the thickness of some P is t (L, β, α) integration to α, be
Wherein F is the revolution number of turns, and (L, β) determined the position of some P on sphere element, and t (L, β) has determined the film thickness distribution on whole sphere element;
(2) add from shade corrected parameter E (L, β, α):
Protruding sphere element from shade corrected parameter, be:
For concave spherical surface element, the z on the straight line of tie point P and evaporation source S
b1 B (x of=H
b, y
b, z
b) coordinate be:
This point is to clear aperture center (x
o, y
o, H) distance be
Now thickness is the film thickness of putting P while not adding modifying mask on spherical optics element, and the thickness of formula (7) becomes:
Calculate the some thickness of different positions, the film thickness distribution while obtaining spherical optics element without baffle plate;
(3) on spherical optics element, the theoretical distribution of thickness distributes and determines the evaporation characteristic n of evaporation source with experiment when relatively without modifying mask:
Perforate in the radial direction on the fixture with the radius-of-curvature identical with spherical optics element and clear aperture, in different radial positions, place blank substrate, this fixture is arranged on to planetary plate center and does substrate, according to the actual processing condition that are coated with optical thin film, in without modifying mask situation, be coated with optical thin film, each substrate of plated film is carried out to film thickness measuring, with on-chip thickness, represent the thickness of optical element corresponding position, draw out after actual thickness distribution curve, take the evaporation characteristic n value of evaporation source as variable, use method of least squares to carry out matching the theoretical film thickness distribution curve calculating by formula (11) and actual thickness distribution curve, n value when objective function is minimum value is the evaporation characteristic n value in actual evaporation source,
(4) determine shape and the position of the optical element film coated inhomogeneity modifying mask of planetary rotation system coating equipment Internal Spherical Surface:
By a plane modifying mask Mask with parabolic outlines, be fixed in vacuum chamber, the system of equations undetermined of baffle plate profile is:
Wherein, (x
mask, y
mask) be the coordinate of putting on baffle plate skeletal lines, (a
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) be the undetermined parameter of equation undetermined, y
mask=a
1(x
mask+ a
2)
2+ a
3x
mask∈ [a
4, a
5] and y
mask=a
6(x
mask+ a
7)
2+ a
8x
mask∈ [a
4,a
5] two para-curves of expression, x
mask=a
4and x
mask=a
5represent two straight lines, it is baffle area that these four lines surround an enclosed region Ar, and height of baffle plate is H
m, the straight line of tie point P and evaporation source S is being highly z
m=H
m1 D (x at place
m, y
m, z
m) coordinate be:
As a D (x
m, y
m, z
m) in above-mentioned baffle area Ar time, during the straight-line pass baffle area Ar of tie point P and evaporation source S, vapor molecule is corrected plate washer and blocks, N (L, β, α)=0; As a D (x
m, y
m, z
m) outside above-mentioned baffle area Ar time, vapor molecule is not corrected plate washer and blocks, N (L, β, α)=1; Adopt the thickness of above-mentioned plane modifying mask to be:
At L ∈ [0, CA/2], in β ∈ [0,2 π] scope, calculate the thickness at different positions place on sphere element, obtain the thickness t of thickest point
max, on sphere element, the relative thickness at different positions place is
The relative thickness Relt at the thinnest point of thickness place on sphere element
minbe the plated film homogeneity of sphere element, use Merit is target equation
Merit=100%-Relt
min (16)
Use the Optimization Toolbox of Matlab software, for baffle plate equation parameter (a simultaneously
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) and height of baffle plate H
minput initial parameter, is used computer optimization baffle plate equation parameter (a take a definite uniformity requirement Merit as target equation
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) and height of baffle plate H
m, obtain shape and the position of baffle plate;
(5) when the homogeneity when using a baffle plate to optimize does not reach necessary requirement, add a baffle plate, adopt different parametric equations from first baffle plate, provide more equation parameter to be optimized, as do not reach uniformity requirement and add again one, by that analogy, until sphere element plated film homogeneity reaches requirement.
Described testing plate measured film thickness method adopts light-intensity method or Ellipsometric.
The method of calculation of described use computer optimization baffle plate equation parameter have simulated annealing, genetic algorithm.
The present invention is major advantage compared with prior art:
The present invention is by the disposable baffle plate of designing of computer simulation, baffle plate of the present invention shows for plated film experiment, in clear aperture and radius-of-curvature ratio range (1.9~+ 1.9), improve film uniformity and reach more than 97.5%, and protruding spherical optics element and concave spherical surface optical element are all suitable for.
Accompanying drawing explanation
Fig. 1 is the optical element film coated process schematic diagram of planetary rotation system coating equipment Internal Spherical Surface.
Fig. 2 is a RoC=128mm, the protruding spherical optics component fixture schematic diagram of CA=196mm.
Fig. 3 is hot boat evaporation AlF when not using baffle plate
3film is at RoC=128mm, the theoretical film thickness distribution in the protruding spherical substrate of CA=196mm and actual experiment result.
Fig. 4 is modified R oC=128mm, the protruding spherical optics element film uniformity modifying mask schematic diagram of CA=196mm.
Fig. 5 is for not using RoC=128mm before modifying mask, the theoretical film thickness distribution figure of protruding spherical optics element of CA=196mm.
Fig. 6 is RoC=128mm after use modifying mask, the theoretical film thickness distribution figure of protruding spherical optics element of CA=196mm.
Fig. 7 is used after modifying mask, RoC=128mm, the AlF at the protruding spherical optics element different positions place of CA=196mm
3unitary film reflection spectrum test result.
Embodiment
To improve a radius of curvature R oC=128mm in planetary rotation system coating equipment Leybold Optics SYRUSpro1110, the protruding spherical optics element plated film homogeneity of clear aperture CA=196mm is that example describes, and requires homogeneity correction to reach more than 98%.
(1) Fig. 1 is the optical element film coated process schematic diagram of planetary rotation system coating equipment Internal Spherical Surface, and planetary plate is parallel to evaporation source S (x
s, y
s, z
s), it is CA that clear aperture is one by one placed at planetary plate center, the sphere element Sub that radius-of-curvature is RoC, and P (x, y, z) is a point on lens, r is from evaporation source S (x
s, y
s, z
s) point to the length of vector r of some P,
be the angle of evaporation source surface normal vector s and vector r, θ is that optical element surface bin p points to centre of sphere O (x
o, y
o, z
o) vector C and the angle of vector r, R is planetary orbit radius, L is the horizontal throw of a P to centre of sphere O, H is planetary plate height, α is planetary plate revolution angle, β is the initial rotation angle of some P, n is evaporation source evaporation characteristic parameter.The thickness being evaporated in unit time on a P is
Wherein A is a constant.Planetary rotation dish is parallel with evaporation source S and spherical optics element Sub is placed in to planetary plate center, and thickness expression formula is transformed in rectangular coordinate system and can be obtained:
Wherein M is used for distinguishing concavo-convex sphere, for protruding sphere M=0, for concave spherical surface M=1, R is planetary orbit radius, and L is horizontal throw and the L ∈ [0 of a P to centre of sphere O, CA/2], K is planetary plate rotation and revolution rotating ratio, and H is planetary plate height, and α is planetary plate revolution angle, β is an initial rotation angle of P and β ∈ [0,2 π].
Through above-mentioned conversion, for definite sphere component parameters (CA, RoC, M), coating equipment configuration parameter (R, K, H, x
s, y
s, z
s) and evaporation source evaporation characteristic parameter n, the thickness in formula (1) can be converted into the function t (L of independent variable(s) (L, β, α), β, α), when after revolution certain angle, the thickness of some P is t (L, β, α) integration to α, be
Wherein F is the revolution number of turns, and (L, β) determined the position of some P on sphere element, and t (L, β) has determined the film thickness distribution on whole sphere element.
For this example, improve a radius of curvature R oC=128mm in planetary rotation system coating equipment Leybold Optics SYRUSpro1110, the protruding spherical optics element plated film homogeneity of clear aperture CA=196mm, sphere component parameters (CA, RoC, M) is (196mm, 128mm, 1), coating equipment configuration parameter (R, K, H, x
s, y
s, z
s) be (300mm, 131/19,730mm ,-230mm, 165mm, 0mm), revolution number of turns F=38.
(2) add from shade corrected parameter E (L, β, α), for this protruding sphere element, when deposition angles θ is greater than 90 °, can not complete deposition E (L, β, α)=0, otherwise can deposit E (L, β, α)=1.The lens thickness not adding while revising plate washer is used instead
represent.
(3) on optical element, the theoretical distribution of thickness distributes and determines the evaporation characteristic n of evaporation source with experiment when relatively without modifying mask.Fig. 2 is a radius of curvature R oC=128mm, the protruding spherical optics component fixture schematic diagram of clear aperture CA=196mm.In the perforate in the radial direction of fixture, in different radial positions, place blank substrate (diameter 15mm, 11 substrates), this fixture is arranged on to planetary plate center and does substrate, according to actual, be coated with the processing condition that optical thin film is be coated with aluminum fluoride (AlF in without baffle plate situation
3) film, each substrate of plated film is carried out to film thickness measuring, with on-chip thickness, represent the thickness of optical element corresponding position, draw out actual thickness distribution plan, take the evaporation characteristic n value of evaporation source as variable, will pass through
the theoretical film thickness distribution curve calculating and actual thickness distribution curve are used method of least squares to carry out matching, and n value when objective function is minimum value is the evaporation characteristic n value in actual evaporation source.Fig. 3 is hot boat evaporation AlF while not using baffle plate
3theoretical thickness (curve) and the actual film thickness distribution (point) of film in this protruding spherical substrate, the evaporation characteristic that obtains evaporation source is 2 ± 0.2.
(4) add modifying mask equation N (L, β, α), determine shape and the position of the optical element film coated inhomogeneity modifying mask of planetary rotation system coating equipment Internal Spherical Surface;
While adopting a plane modifying mask, the system of equations undetermined of baffle plate profile is:
Wherein, (x
mask, y
mask) be the coordinate of putting on baffle plate skeletal lines, (a
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) be the undetermined parameter of equation undetermined, y
mask=a
1(x
mask+ a
2)
2+ a
3x
mask∈ [a
4,a
5] and y
mask=a
6(x
mask+ a
7)
2+ a
8x
mask∈ [a
4,a
5] two para-curves of expression, x
mask=a
4and x
mask=a
5represent two straight lines, it is baffle area that these four lines surround an enclosed region Ar.Height of baffle plate is H
m, the straight line of tie point P and evaporation source S is being highly z
m=H
m1 D (x at place
m, y
m, z
m) coordinate be:
As a D (x
m, y
m, z
m) in above-mentioned baffle area Ar time, during the straight-line pass baffle area Ar of tie point P and evaporation source S, vapor molecule is corrected plate washer and blocks, N (L, β, α)=0; As a D (x
m, y
m, z
m) outside above-mentioned baffle area Ar time, vapor molecule is not corrected plate washer and blocks, N (L, β, α)=1; Adopt the thickness of above-mentioned plane modifying mask to be:
At L ∈ [0, CA/2], in β ∈ [0,2 π] scope, calculate the thickness at different positions place on sphere element, obtain the thickness t of thickest point
max, on sphere element, the relative thickness at different positions place is
The relative thickness Relt at the thinnest point of thickness place on sphere element
minbe the plated film homogeneity of sphere element, use Merit is target equation
Merit=100%-Relt
min (12)
Use the Optimization Toolbox of Matlab software, for baffle plate equation parameter (a simultaneously
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) and height of baffle plate H
minput initial parameter, take uniformity requirement, reaching more than 98% is that Merit<2% is as target equation use computer optimization baffle plate equation parameter (a
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) and height of baffle plate H
m, shape and the position of calculating baffle plate, show through optimizing, and uses the optimum result of a baffle plate can not reach uniformity requirement more than 98%;
(5) because the optimum result of a baffle plate can not reach uniformity requirement more than 98%, add a baffle plate, adopt different parametric equations from first baffle plate, provide more equation parameter to be optimized, as do not reach uniformity requirement and add again one, by that analogy, until sphere element plated film homogeneity reaches requirement, this example is final adopts 4 modifying mask optimum result to reach uniformity requirement more than 98%.The system of equations undetermined of 4 baffle plates is:
A baffle plate:
No. two baffle plates:
No. three baffle plates:
No. four baffle plates:
4 height of baffle plate H
mall identical, use Matlab software to baffle plate undetermined parameter
(a
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8, a
9, a
10, a
11, a
12, a
13, a
14, a
15, H
m) input initial parameter
(1,100,100 ,-100 ,-100 ,-1 ,-100 ,-100 ,-100 ,-100,1 ,-100 ,-100,100,100,650) are optimized, and finally obtain optimized parameter, and the height of four baffle plates is all H
m=670mm, Fig. 4 is uniformity correcting baffle plate schematic diagram, baffle plate equation is respectively:
A baffle plate:
No. two baffle plates:
No. three baffle plates:
No. four baffle plates:
Fig. 5 is not used the front RoC=128mm of modifying mask, the theoretical film thickness distribution figure of protruding spherical optics element of CA=196mm, and now film uniformity can find out to be 53% by scale.Fig. 6 is theoretical film thickness distribution figure of this protruding spherical optics element after use modifying mask.After the correction of homogeneity baffle plate, the homogeneity of theoretical thickness reaches more than 98.5%.Fig. 7 is used AlF on the substrate at this protruding spherical optics element different positions place after modifying mask
3unitary film reflection spectrum test result, reflectance curve overlaps substantially, and the film uniformity that goes out different positions place by spectra inversion reaches more than 98.9%, has shown the validity of this model.
In a word, the present invention proposes a kind of uniformity correcting baffle plate by computer optimization with parabolic outlines to improve the optical element film coated inhomogeneity method of planetary rotation system coating equipment Internal Spherical Surface.In thermal evaporation, ion beam sputtering, magnetron sputtering, in the physical gas-phase depositions such as molecular layer deposition, on planetary rotation fixture, the even row modifying mask of plated film can adopt same way, all belongs to protection scope of the present invention.Compared with existing spherical optics element plated film homogeneity correction plate washer method of design, the present invention can more efficiently design baffle plate fast, in very large clear aperture and radius-of-curvature ratio range, improves film uniformity, and convex-concave spherical optics element is all suitable for.
Non-elaborated part of the present invention belongs to techniques well known.
Claims (3)
1. in planetary rotation system coating equipment, improve the inhomogeneity baffle design method of spherical optics element plated film, it is characterized in that the method comprises the following steps:
(1), according to the vacuum chamber configuring condition of planetary rotation system coating equipment, set up the optical element film coated model of planetary rotation system coating equipment Internal Spherical Surface:
On planetary rotation fixture, a clear aperture is CA, the sphere element Sub that radius-of-curvature is RoC, and the some P (x, y, z) on this sphere element, the thickness being evaporated in the unit time on this aspect is:
Wherein, A is a constant; R is from evaporation source S (x
s, y
s, z
s) point to the length of vector r of some P (x, y, z);
be the angle of evaporation source surface normal vector s and described vector r, evaporate angle; θ is that a p points to centre of sphere O (x
o, y
o, z
o) vector C and the angle of vector r, i.e. deposition angles; N is evaporation source evaporation characteristic parameter, and planetary rotation dish is parallel with evaporation source S and spherical optics element Sub is placed in to planetary plate center, in rectangular coordinate system:
Wherein M is used for distinguishing concavo-convex sphere, and for protruding sphere M=0, for concave spherical surface M=1, R is planetary orbit radius, L is horizontal throw and the L ∈ [0, CA/2] of a P to centre of sphere O, and K is planetary plate rotation and revolution rotating ratio, H is planetary plate height, and α is planetary plate revolution angle, and β is the point initial rotation angle of P and β ∈ [0,2 π], through above-mentioned conversion, for definite sphere component parameters (CA, RoC, M), coating equipment configuration parameter (R, K, H, x
s, y
s, z
s) and evaporation source evaporation characteristic parameter n, utilization transforms rectangular coordinate system by thickness expression formula (1), and the thickness of above-mentioned formula (1) can be converted into independent variable(s) (L, β, function t (L α), β, α), when after revolution certain angle, the thickness of point P is t (L, β, α) integration to α, be
Wherein F is the revolution number of turns, and (L, β) determined the position of some P on sphere element, and t (L, β) has determined the film thickness distribution on whole sphere element;
(2) add from shade corrected parameter E (L, β, α):
Protruding sphere element from shade corrected parameter, be:
For concave spherical surface element, the z on the straight line of tie point P and evaporation source S
b1 B (x of=H
b, y
b, z
b) coordinate be:
Now thickness is the film thickness of putting P while not adding modifying mask on spherical optics element, and the thickness of formula (7) becomes:
Calculate the some thickness of different positions, the film thickness distribution while obtaining spherical optics element without baffle plate;
(3) on spherical optics element, the theoretical distribution of thickness distributes and determines the evaporation characteristic n of evaporation source with experiment when relatively without modifying mask:
Perforate in the radial direction on the fixture with the radius-of-curvature identical with spherical optics element and clear aperture, in different radial positions, place blank substrate, this fixture is arranged on to planetary plate center and does substrate, according to the actual processing condition that are coated with optical thin film, in without modifying mask situation, be coated with optical thin film, each substrate of plated film is carried out to film thickness measuring, with on-chip thickness, represent the thickness of optical element corresponding position, draw out after actual thickness distribution curve, take the evaporation characteristic n value of evaporation source as variable, use method of least squares to carry out matching the theoretical film thickness distribution curve calculating by formula (11) and actual thickness distribution curve, n value when objective function is minimum value, be the evaporation characteristic n value in actual evaporation source,
(4) determine shape and the position of the optical element film coated inhomogeneity modifying mask of planetary rotation system coating equipment Internal Spherical Surface:
The plane modifying mask Mask with parabolic outlines, is fixed in vacuum chamber, and the system of equations undetermined of baffle plate profile is:
Wherein, (x
mask, y
mask) be the coordinate of putting on baffle plate skeletal lines, (a
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) be the undetermined parameter of equation undetermined, y
mask=a
1(x
mask+ a
2)
2+ a
3x
mask∈ [a
4, a
5] and y
mask=a
6(x
mask+ a
7)
2+ a
8x
mask∈ [a
4,a
5] two para-curves of expression, x
mask=a
4and x
mask=a
5represent two straight lines, it is baffle area that these four lines surround an enclosed region Ar, and height of baffle plate is H
m, the straight line of tie point P and evaporation source S is being highly z
m=H
m1 D (x at place
m, y
m, z
m) coordinate be:
As a D (x
m, y
m, z
m) in above-mentioned baffle area Ar time, during the straight-line pass baffle area Ar of tie point P and evaporation source S, vapor molecule is corrected plate washer and blocks, N (L, β, α)=0; As a D (x
m, y
m, z
m) outside above-mentioned baffle area Ar time, vapor molecule is not corrected plate washer and blocks, N (L, β, α)=1; Adopt the thickness of above-mentioned plane modifying mask to be:
At L ∈ [0, CA/2], in β ∈ [0,2 π] scope, calculate the thickness at different positions place on sphere element, obtain the thickness t of thickest point
max, on sphere element, the relative thickness at different positions place is
the relative thickness Relt at the thinnest point of thickness place on sphere element
minbe the plated film homogeneity of sphere element, use Merit is target equation
Merit=100%-Relt
min (16)
Use the Optimization Toolbox of Matlab software, for baffle plate equation parameter (a simultaneously
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) and height of baffle plate H
minput initial parameter, is used computer optimization baffle plate equation parameter (a take a definite uniformity requirement Merit as target equation
1, a
2, a
3, a
4, a
5, a
6, a
7, a
8) and height of baffle plate H
m, obtain shape and the position of baffle plate;
(5) when the homogeneity when using a baffle plate to optimize does not reach necessary requirement, add a baffle plate, adopt different equation parameters from first baffle plate, provide more equation parameter to be optimized, as do not reach uniformity requirement and add again one, by that analogy, until sphere element plated film homogeneity reaches requirement.
2. the inhomogeneity baffle design method of spherical optics element plated film of improving according to claim 1, is characterized in that: in described step (3), testing plate measured film thickness method adopts light-intensity method or Ellipsometric.
3. the inhomogeneity baffle design method of spherical optics element plated film of improving according to claim 1, is characterized in that: the method for calculation of using computer optimization baffle plate equation parameter in described step are simulated annealing or genetic algorithm.
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