CN105093844A - Exposure method and exposure apparatus - Google Patents
Exposure method and exposure apparatus Download PDFInfo
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- CN105093844A CN105093844A CN201510232828.4A CN201510232828A CN105093844A CN 105093844 A CN105093844 A CN 105093844A CN 201510232828 A CN201510232828 A CN 201510232828A CN 105093844 A CN105093844 A CN 105093844A
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Abstract
The invention provides an exposure method and an exposure apparatus which can suppress damage on a substrate and a mask and enables the substrate to have an expected curvature. The exposure method includes the following steps: loading the substrate (3) to a plurality of corrugated pipes (17); vaccuating the inner portion of each corrugated pipe (17) so that an upper end (17a) of each corrugated pipe (17) is attached to the lower surface (3a) of the substrate (3) and shrinks; pressing the substrate (3) to supporting surfaces (19a) of a supporting component (19) so that the substrate (3) has a curvature which correspond to the positions of a plurality of supporting surfaces (19a).
Description
Technical field
The present invention relates to exposure method and exposure device.
Background technology
In the past, as exposure device, known exposure device comprises: pedestal, and the substrate be exposed is configured in the top of this pedestal; And exposure light source, light is irradiated to substrate across mask by it.In such exposure device, mask is formed with predetermined pattern.Further, by light is irradiated to substrate across this mask, thus substrate is transferred pattern to.
Herein, substrate not necessarily is smooth, especially at the substrate that flow chart has been in progress, situation about deforming is many.In the uneven situation of such substrate, substrate can not be made suitably to be adsorbed in pedestal (such as workholder), and exposure accuracy likely worsens.
Therefore, as shown in figure 15, in the base board exposure device of patent documentation 1, first, utilize and be adhered fixed the upper ledge 200 of mask film 100M to press membranaceous substrate 100W at lower surface 202.Thus, eliminate warpage, the wrinkle of substrate 100W, the upper surface 102 of lower frame 100 makes substrate 100W smooth.Then, by vacuumizing with vacuum absorption device 120, thus substrate 100W absorption is fixed on the upper surface 102 of lower frame 100.
In addition, as shown in figure 16, the exposure device of patent documentation 2 has: substrate supporting platform 312, its supporting substrates 311; And the seal member 313 of hollow, its with by the surrounding of substrate 311 around mode extend.Seal member 313 loads photomask 306.By empty internal i.e. 2nd space 328 of pressure feed to the 1st space 327 surrounded by substrate supporting platform 312 and substrate 311 and seal member 313 and photomask 306 and seal member 313.Further, by suitably setting the value of this pressure, thus realize photomask 306 is close to equably throughout the surface integral of substrate 311.In addition, substrate supporting platform 312 is formed with multiple suction hole 325, by applying negative pressure to suction hole 325, thus adsorbs and keep substrate 311.
Prior art document
Patent documentation
Patent documentation 1: Japanese Unexamined Patent Publication 2001-209192 publication
Patent documentation 2: Japanese Unexamined Patent Publication 2004-54255 publication
Summary of the invention
The technical matters of the present invention for solving
But, in the invention of patent documentation 1 and 2, because needs make substrate contact with mask, therefore, likely damage at the surface of contact of substrate and mask.
In addition, be not substrate, also may there is the uneven situation of mask, under these circumstances, need to expose after the shape of the shape with mask that make substrate is corresponding.But patent documentation 1 and 2 only describes and makes substrate smooth, and be difficult to corresponding such state of affairs.
The present invention completes in view of the foregoing, its object is to provide can suppress to damage on substrate and mask and make substrate have exposure method and the exposure device of the curvature of expectation.In addition, saidly " curvature that substrate has expectation " is also comprised make substrate curvature be zero situation making substrate smooth.
For the technical scheme of dealing with problems
Above-mentioned purpose of the present invention is reached by following forming.
(1) exposure method,
There is the pedestal that the substrate be exposed is configured at top,
Described exposure method comprises: the light from exposure light source is irradiated to described substrate to carry out the operation exposed across mask,
The feature of described exposure method is,
The upper surface of described pedestal is provided with multiple groove,
Be configured with corrugated tube in the inside of described groove, described corrugated tube is freely flexible at above-below direction, and the upper end of described corrugated tube is given prominence to upward than the upper surface of described pedestal,
In the inside of described groove, have the support unit with carrying plane in the inside of described corrugated tube or outer setting, described carrying plane and the upper surface of described pedestal are positioned on the same face or are positioned at than this upper surface position by the top,
Described exposure method comprises following operation:
By described substrate-placing to the operation on multiple described corrugated tube; And
By the inside of described corrugated tube is vacuumized, thus make the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus described substrate is made to have the operation of the curvature corresponding with the position relationship of multiple described carrying plane.
(2) exposure method as described in (1), is characterized in that,
The carrying plane of multiple described support unit and the upper surface of described pedestal are positioned on the same face,
Described exposure method comprises following operation:
By described substrate-placing to the operation on multiple described corrugated tube; And
By being vacuumized the inside of described corrugated tube, thus the upper end of described corrugated tube is made to be adsorbed in the lower surface of described substrate and to shrink, by described substrate being pressed on the carrying plane of described support unit, thus by described substrate with plane fixing operation.
(3) exposure method as described in (2), is characterized in that,
Described pedestal is the workholder being formed with multiple vacuum tanks that can vacuumize at described upper surface,
Described exposure method comprises: by being vacuumized by multiple described vacuum tank, thus the operation of the upper surface of described workholder is fixed in the absorption of the lower surface of described substrate.
(4) exposure method as described in (3), is characterized in that,
Described in the total area ratio of multiple described vacuum tank, the area of the upper surface of workholder is large.
(5) exposure method as described in (3) or (4), is characterized in that,
Multiple projections with the height roughly the same with the degree of depth of described vacuum tank are formed in the bottom of described vacuum tank.
(6) exposure method as described in (1), is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus the carrying plane of this support unit is made to locate operation in the same plane mutually by the top at the upper surface than described pedestal;
By described substrate-placing to the operation on multiple described corrugated tube;
By being vacuumized the inside of described corrugated tube, thus making the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus making described substrate be plane operation; And
Described support unit is declined, and makes the operation that the upper surface of the lower surface of described substrate and described pedestal is close to.
(7) exposure method as described in (6), is characterized in that,
Described pedestal is the workholder being formed with multiple vacuum tanks that can vacuumize at described upper surface,
Described exposure method comprises: by being vacuumized by multiple described vacuum tank, thus the operation of the upper surface of described workholder is fixed in the absorption of the lower surface of described substrate.
(8) exposure method as described in (7), is characterized in that,
Described in the total area ratio of multiple described vacuum tank, the area of the upper surface of workholder is large.
(9) exposure method as described in (7) or (8), is characterized in that,
Multiple projections with the height roughly the same with the degree of depth of described vacuum tank are formed in the bottom of described vacuum tank.
(10) exposure method as described in (1), is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus the carrying plane of this support unit is made to locate operation in the same plane mutually by the top at the upper surface than described pedestal;
By described substrate-placing to the operation on multiple described corrugated tube; And
By being vacuumized the inside of described corrugated tube, thus making the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus making described substrate be plane operation.
(11) exposure method as described in (10), is characterized in that,
There is the sensor measured the distance from the upper surface of described pedestal to the lower surface of described substrate,
Described exposure method comprises: based on the positional information of the described substrate obtained by described sensor, makes multiple described support unit lifting, makes described substrate be plane operation.
(12) exposure method as described in (1), is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus make the carrying plane of this support unit the upper surface than described pedestal by the top place be positioned at make respective described carrying plane and the lower surface of described mask above-below direction apart from the operation of roughly the same position;
By described substrate-placing to the operation on multiple described corrugated tube; And
By the inside of described corrugated tube is vacuumized, thus make the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus make described substrate have the curvature corresponding with the position relationship of multiple described carrying plane, make the above-below direction of the lower surface of the upper surface of described substrate and described mask apart from uniform operation.
(13) exposure method as described in (1), is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus the carrying plane of this support unit is made to locate operation in the same plane mutually by the top at the upper surface than described pedestal;
Make at least one operation rising or decline among multiple described support unit;
By described substrate-placing to the operation on multiple described corrugated tube; And
By the inside of described corrugated tube is vacuumized, thus make the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus the height of described carrying plane is changed in the position corresponding with the described substrate with local deformation, make described substrate have the curvature of expectation thus, make the operation of described substrate Local warping.
(14) exposure device, it comprises:
Pedestal, the substrate be exposed is configured at top; And
Exposure light source, it light shines described substrate across mask,
The feature of described exposure device is,
The upper surface of described pedestal is provided with multiple groove,
Be configured with corrugated tube in the inside of described groove, described corrugated tube is freely flexible at above-below direction, and the upper end of described corrugated tube is given prominence to upward than the upper surface of described pedestal,
In the inside of described groove, have the support unit with carrying plane in the inside of described corrugated tube or outer setting, described carrying plane and the upper surface of described pedestal are positioned on the same face or are positioned at than this upper surface position by the top,
The inside of described corrugated tube can vacuumize.
(15) exposure device as described in (14), is characterized in that,
Described pedestal is the workholder being formed with multiple vacuum tanks that can vacuumize at described upper surface.
(16) exposure device as described in (14) or (15), is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance.
(17) exposure device as described in (15), is characterized in that,
Described in the total area ratio of multiple described vacuum tank, the area of the upper surface of workholder is large.
(18) exposure device as described in (17), is characterized in that, is formed with multiple projections with the height roughly the same with the degree of depth of described vacuum tank in the bottom of described vacuum tank.
Invention effect
According to exposure method of the present invention and exposure device, by the inside of corrugated tube is vacuumized, thus make the upper end of corrugated tube be adsorbed in the lower surface of substrate and shrink, by described substrate being pressed on the carrying plane of support unit, thus substrate can be made to have the curvature corresponding with the position relationship of multiple carrying plane.In addition, even if do not make mask contact as prior art document with substrate, substrate also can be made to have the curvature of expectation, therefore, it is possible to suppress to damage on mask and substrate.
Accompanying drawing explanation
Fig. 1 is that the I-I of Fig. 2 analyses and observe direction view.
Fig. 2 is the cut-open view of the exposure device of the 1st embodiment.
Fig. 3 is the cut-open view of the exposure device of the 1st embodiment.
Fig. 4 is the cut-open view of the exposure device of the 1st embodiment.
Fig. 5 is the cut-open view of the exposure device of the 2nd embodiment.
Fig. 6 is the cut-open view of the exposure device of the 2nd embodiment.
Fig. 7 is the cut-open view of the exposure device of the 2nd embodiment.
Fig. 8 is the cut-open view of the exposure device of the 2nd embodiment.
Fig. 9 is the cut-open view of the exposure device of the 3rd embodiment.
Figure 10 is the cut-open view of the exposure device of the 3rd embodiment.
Figure 11 is the cut-open view of the exposure device of the 4th embodiment.
Figure 12 is the cut-open view of the exposure device of the 5th embodiment.
Figure 13 is the vertical view of the exposure device of the 6th embodiment.
Figure 14 (a) is the vertical view of the exposure device of the 7th embodiment, and (b) is the XIV-XIV cut-open view of (a).
Figure 15 (A) ~ (D) is the figure of the step of exposure of the base board exposure device that patent documentation 1 is shown.
Figure 16 is the cut-open view of the exposure device that patent documentation 2 is shown.
Description of reference numerals
1 exposure device
3 substrates
3a lower surface
5 masks
10 workholders (pedestal)
11 upper surfaces
13 vacuum tanks
14 groove vacuum tanks
15 grooves
17 corrugated tubes
17a upper end
19 support units
19a carrying plane
20 connectivity slots
21 driving mechanisms
30 wall portion
31 the 1st wall portion
32 the 2nd wall portion
33 the 3rd wall portion
34 the 4th wall portion
35 the 5th wall portion
114 projections
Embodiment
Below, use accompanying drawing that exposure device and the exposure method of embodiments of the present invention are described.
(the 1st embodiment)
As shown in Figures 1 and 2, the exposure device 1 of present embodiment comprises: workholder 10 (pedestal), and the substrate 3 be exposed is configured in the top of this workholder 10; And exposure light source (not shown), light is irradiated to substrate 3 across mask (not shown) by it.In addition, figure 2 illustrates the substrate 3 of the mode warpage protruded downward with central part, but the exposure device 1 of present embodiment can be applied to the substrate 3 of arbitrary shape, such as, substrate 3 also can be the shape of the mode warpage protruded upward with central part.
The upper surface 11 of workholder 10 be roughly square shape from the cross section of top view.At the bight of the four direction of upper surface 11 and this five place of central part, being formed from the cross section of top view is the groove 15 of roughly square shape.In addition, the upper surface 11 of workholder 10, the cross sectional shape of groove 15 are not limited to roughly square shape as shown in Figure 1, can become arbitrary shape, such as, also can become circle, rectangle.
The corrugated tube 17 in the retractile hollow of above-below direction is configured with in the approximate centre of the inside of groove 15.When drift, the upper end 17a of corrugated tube 17 gives prominence to upward than the upper surface 11 of workholder 10.In addition, in the inside of groove 15, the inside of corrugated tube 17 is provided with support unit 19, this support unit 19 has the carrying plane 19a that substrate 3 can be bearing in top.The support unit 19 of present embodiment is the bar-like member extended upward from the bottom surface of groove 15, forms with workholder 10.The carrying plane 19a of support unit 19 and the upper surface 11 of workholder 10 are positioned on the same face.In addition, be provided with the connectivity slot 20 be communicated with not shown vacuum plant at the carrying plane 19a of support unit 19, the inside of corrugated tube 17 can be vacuumized.
Be formed at the upper surface 11 of workholder 10 and be communicated with and multiple vacuum tanks 13 that can vacuumize with not shown vacuum plant.Multiple vacuum tank 13 configures with mesh-shape each other at the circumference of upper surface 11 and groove 15.In addition, vacuum tank 13 has the groove vacuum tank 14 be communicated with groove 15 in the inside of workholder 10.In addition, non-essential groove vacuum tank 14 is set, when not arranging groove vacuum tank 14, as long as make the formation that groove 15 can independently vacuumize.
In the exposure device 1 formed like this, use following such exposure method.First, as shown in Figure 3, substrate 3 is configured on multiple corrugated tube 17.Now, corrugated tube 17 stretches according to the shape of substrate 3, and the upper end 17a of all corrugated tubes 17 is close to the lower surface 3a of substrate 3.
Next, by vacuumizing via the inside of connectivity slot 20 by corrugated tube 17, thus make the upper end 17a of corrugated tube 17 adsorb the lower surface 3a being fixed on substrate 3.After being vacuumized the inside of corrugated tube 17 further, as shown in Figure 4, corrugated tube 17 shrinks (decline), this corrugated tube 17 adsorb fixing substrate 3 and also decline.Because the substrate 3 that have dropped is pressed against the carrying plane 19a of multiple support unit 19 and the upper surface 11 of workholder 10, so, substrate 3 can be made to have curvature corresponding to the position relationship of carrying plane 19a multiple with these and upper surface 11.In the present embodiment, due to multiple carrying plane 19a and upper surface 11 in the same plane, so the curvature of substrate 3 is zero, substrate 3 can be fixed in plane.
Then, by multiple vacuum tank 13 (groove vacuum tank 14) being vacuumized, thus the lower surface 3a absorption being close to the substrate 3 of multiple carrying plane 19a and upper surface 11 is fixed on the upper surface 11 of workholder 10.Like this, be plane making substrate 3 and after reliably the upper surface 11 of workholder 10 is fixed in absorption, by the light from exposure light source is irradiated to substrate 3 across mask, thus expose.
As described above, exposure device 1 according to the present embodiment, can by the inside of corrugated tube 17 be vacuumized, thus make the upper end 17a of corrugated tube 17 be adsorbed in the lower surface 3a of substrate 3 and shrink, and by substrate 3 being pressed on the carrying plane 19a of support unit 19, thus substrate is made to have the curvature corresponding with the position relationship of multiple carrying plane 19a.In addition, substrate 3 also can be made to have the curvature of expectation even if do not make mask and substrate 3 contact as prior art document, therefore, it is possible to suppress to damage on mask and substrate 3.
Particularly, the carrying plane 19a of support unit 19 is by vacuumizing the inside of corrugated tube 17 thus making the upper end 17a of corrugated tube 17 be adsorbed in the lower surface 3a of substrate 3 and shrink, by substrate 3 being pressed the carrying plane 19a of support unit 19, thus can be fix substrate 3 planely.
And, by the multiple vacuum tanks 13 be arranged on workholder 10 are vacuumized, thus the lower surface 3a of substrate 3 reliably can be adsorbed the upper surface 11 being fixed on workholder 10, after the distance making substrate 3 and mask is evenly, precision exposes well.
In addition, the inside of the corrugated tube 17 carried out via connectivity slot 20 vacuumize and vacuumizing of vacuum tank 13 (groove vacuum tank 14) not necessarily needs to carry out with this order, also can also carry out simultaneously.In addition, position and the quantity of groove 15, corrugated tube 17 and support unit 19 etc. do not limit, as long as consider that the rigidity etc. of substrate 3 suitably sets.In addition, as long as the inside of the position groove 15 of configuration support unit 19, being also not necessarily limited to the inside of corrugated tube 17, also can be the outside of corrugated tube 17.
In addition, in the above-described embodiment, be the formation being formed with multiple vacuum tank 13 on workholder 10, but the present invention is not limited to this formation, also can not arrange vacuum tank 13.In this case, also can by being vacuumized the inside of corrugated tube 17, thus make the upper end 17a of corrugated tube 17 be adsorbed in the lower surface 3a of substrate 3 and shrink, and substrate 3 be pressed on the carrying plane 19a of support unit 19 and the upper surface 11 of workholder 10.
(the 2nd embodiment)
Next, the exposure device 1 of the 2nd embodiment of the present invention is described.In addition, because basic formation becomes identical with the 1st embodiment by the exposure device 1 of present embodiment, so describe in detail for different parts, for identical part, mark identical Reference numeral and omit the description.
As shown in Figure 5, multiple support units 19 of present embodiment are separate with workholder 10, and multiple support unit 19 can be elevated at above-below direction respectively while supporting corrugated tube 17.Be linked with driving mechanism 21 in the bottom of each support unit 19, utilize this driving mechanism 21, drive support unit 19 at above-below direction.As driving mechanism 21, illustrate such as ball-screw, line motor, cylinder etc.
In the exposure device 1 formed like this, use following such exposure method.First, as shown in Figure 5, by utilizing multiple driving mechanism 21 to make multiple support unit 19 increase, thus carrying plane 19a is made to locate by the top to be positioned at mutually roughly on same plane at the upper surface 11 than workholder 10.
Then, as shown in Figure 6, substrate 3 is configured on multiple corrugated tube 17.Now, corrugated tube 17 correspond to the shape of substrate 3 and stretches, and the upper end 17a of corrugated tube 17 is close to the lower surface 3a of substrate 3.
Next, by vacuumizing via the inside of connectivity slot 20 by corrugated tube 17, thus make the upper end 17a of corrugated tube 17 adsorb the lower surface 3a being fixed on substrate 3.After being vacuumized the inside of corrugated tube 17 further, as shown in Figure 7, corrugated tube 17 shrinks, this corrugated tube 17 adsorb fixing substrate 3 and also decline.Because the substrate 3 that have dropped is pressed against the carrying plane 19a of multiple support unit 19, so, substrate 3 can be made to have curvature corresponding to the position relationship of carrying plane 19a multiple with these.In the present embodiment, because multiple carrying plane 19a is in the same plane, so the curvature vanishing of substrate 3, can make substrate 3 for plane.
Next, as shown in Figure 8, utilize driving mechanism 21 that support unit 19 is declined, to make the upper surface 11 of carrying plane 19a and workholder 10 in the same plane, the lower surface 3a of substrate 3 and the upper surface 11 of workholder 10 are close to.
Then, by multiple vacuum tank 13 (groove vacuum tank 14) being vacuumized, thus the lower surface 3a of the substrate 3 be close on multiple carrying plane 19a and upper surface 11 absorption is fixed on the upper surface 11 of workholder 10.Like this, making substrate 3, by the light from exposure light source is irradiated to substrate 3 across mask, thus expose after reliably the upper surface 11 of workholder 10 is fixed in absorption in plane.
As described above, exposure device 1 according to the present embodiment, also can obtain effect in a same manner as in the first embodiment.
In addition, in the present embodiment, because multiple support unit 19 can be elevated at above-below direction respectively while supporting corrugated tube 17, so, correspondingly can be out of shape large substrate 3.That is, when being placed on multiple line pipe 17 by substrate 3, by advance the height of the carrying plane 19a of each support unit 19 being changed to the height corresponding with the distortion of substrate 3, thus correspondingly large substrate 3 can be out of shape.
In addition, in a same manner as in the first embodiment, also can vacuum tank 13 be not necessarily set in the present embodiment, in this case, also can by the inside of corrugated tube 17 be vacuumized, thus make the upper end 17a of corrugated tube 17 be adsorbed in the lower surface 3a of substrate 3 and shrink, substrate 3 is pressed on the carrying plane 19a of support unit 19 and the upper surface 11 of workholder 10.
(the 3rd embodiment)
Next, the exposure device 1 of the 3rd embodiment of the present invention is described.As shown in Figure 9, the exposure device 1 of present embodiment and the exposure device 1 of the 2nd embodiment are (with reference to Fig. 5.) difference be, do not form vacuum tank 13 (groove vacuum tank 14) at workholder 10.In addition, in fig .9, show with the substrate 3 of central part mode warpage convex upward.
In the exposure device 1 formed like this, use following such exposure method.First, as shown in Figure 9, by utilizing multiple driving mechanism 21 to make multiple support unit 19 increase, thus carrying plane 19a is made to locate by the top to be positioned at mutually roughly on same plane at the upper surface 11 than workholder 10.
Then, substrate 3 is configured on multiple corrugated tube 17.Now, corrugated tube 17 correspond to the shape of substrate 3 and stretches, and the upper end 17a of corrugated tube 17 is close to the lower surface 3a of substrate 3.
Next, by vacuumizing via the inside of connectivity slot 20 by corrugated tube 17, thus make the upper end 17a of corrugated tube 17 adsorb the lower surface 3a being fixed on substrate 3.After being vacuumized the inside of corrugated tube 17 further, as shown in Figure 10, corrugated tube 17 shrinks, this corrugated tube 17 adsorb fixing substrate 3 and also decline.Because the substrate 3 that have dropped is pressed against the carrying plane 19a of multiple support unit 19, so, substrate 3 can be made to have curvature corresponding to the position relationship of carrying plane 19a multiple with these.In the present embodiment, because multiple carrying plane 19a is in the same plane, so the curvature vanishing of substrate 3, can make substrate 3 for plane.
Herein, the sensor (not shown) measured the distance of the lower surface 3a from the upper surface 11 of workholder 10 to substrate 3 also can be set.In the case, also can, based on the positional information of the substrate 3 obtained by this sensor, utilize multiple driving mechanism 21 that multiple support unit 19 is elevated, make substrate 3 for plane.Owing to having the operation of the position correcting multiple support unit 19 like this, thus can reliably make substrate 3 for plane.
Like this, be plane making substrate 3 and make above-below direction distance L between the upper surface of substrate 3 and the lower surface of mask 5 evenly after, by the light from exposure light source is irradiated to substrate 3 across mask, thus expose.
As described above, exposure device 1 according to the present embodiment, even if do not form vacuum tank 13 (groove vacuum tank 14) on workholder 10, also can precision expose well, and the cost of manufacture of device can be made to reduce.In addition, even if when the precision of the flatness of the upper surface 11 of workholder 10 is bad, also can be corresponding.Other formation and effect same with above-mentioned embodiment.
(the 4th embodiment)
Next, the exposure device 1 of the 4th embodiment of the present invention is described.As shown in figure 11, the basic comprising of the exposure device 1 of present embodiment is identical with the 3rd embodiment.Below, the exposure method of the mask 5 for correspondence not being smooth warpage is described in such exposure device 1.Show at Figure 11 with the mask 5 of central part mode warpage convex downward.
First, by utilizing multiple driving mechanism 21 to make multiple support unit 19 increase, make carrying plane 19a the upper surface 11 than workholder 10 by the top place correspond to mask 5 shape, be positioned at the position making each carrying plane 19a roughly the same with the above-below direction distance M of the lower surface of mask 5.That is, compared with the carrying plane 19a being positioned at center, the carrying plane 19a being positioned at corner is made to be positioned at top.
Then, substrate 3 is configured on multiple corrugated tube 17.Now, corrugated tube 17 correspond to the shape of substrate 3 and stretches, and the upper end 17a of all corrugated tubes 17 is close to the lower surface 3a of substrate 3.
Next, by vacuumizing via the inside of connectivity slot 20 by corrugated tube 17, thus make the upper end 17a of corrugated tube 17 adsorb the lower surface being fixed on substrate 3.After being vacuumized the inside of corrugated tube 17 further, as shown in figure 11, corrugated tube 17 shrinks, this corrugated tube 17 adsorb fixing substrate 3 and also decline.Because the substrate 3 that have dropped is pressed against the carrying plane 19a of multiple support unit 19, so, substrate 3 can be made to have curvature corresponding to the position relationship of carrying plane 19a multiple with these.That is, substrate 3 can be made to be with the shape of central part mode warpage convex downward.
Like this, make the above-below direction distance L between the upper surface of substrate 3 and the lower surface of mask 5 evenly after, by the light from exposure light source is irradiated to substrate 3 across mask, thus expose.
In addition, in a same manner as in the third embodiment, the sensor (not shown) for measuring the above-below direction distance of the lower surface 3a from the upper surface 11 of workholder 10 to substrate 3 also can be set.In the case, also can, based on the positional information of the substrate 3 utilizing this sensor to obtain, multiple support unit 19 be elevated, make the above-below direction distance L between the lower surface of the upper surface of substrate 3 and mask 5 become even.
As described above, exposure device 1 according to the present embodiment, even if when use be not smooth warpage mask 5, also can precision expose well.Other formation and effect same with above-mentioned embodiment.
(the 5th embodiment)
Next, the exposure device 1 of the 5th embodiment of the present invention is described.As shown in figure 12, the basic comprising of the exposure device 1 of present embodiment is identical with the 3rd and the 4th embodiment.In such exposure device 1, the method making substrate 3 Local warping is described.The exposure device 1 of present embodiment is applicable for the substrate 3 before exposure with local deformation, can expose after the distortion correcting this substrate 3.
First, by utilizing multiple driving mechanism 21 to make multiple support unit 19 increase, carrying plane 19a is made to locate in the same plane mutually by the top at the upper surface 11 than workholder 10.And then, make at least one (in fig. 12, the support unit 19 on right side) among multiple support unit 19 increase.
Then, substrate 3 is configured on multiple corrugated tube 17.Now, corrugated tube 17 correspond to the shape of substrate 3 and stretches, and the upper end 17a of all corrugated tubes 17 is close to the lower surface 3a of substrate 3.
Next, by vacuumizing via the inside of connectivity slot 20 by corrugated tube 17, thus make the upper end 17a of corrugated tube 17 adsorb the lower surface 3a being fixed on substrate 3.After being vacuumized the inside of corrugated tube 17 further, as shown in figure 12, corrugated tube 17 shrinks, this corrugated tube 17 adsorb fixing substrate 3 and also decline.The substrate 3 that have dropped is pressed against the carrying plane 19a of multiple support unit 19.Now, by changing the height of the carrying plane 19a of support unit 19 in the position corresponding with the substrate 3 with local deformation, thus substrate 3 can be made to have the curvature of expectation.That is, make substrate 3 Local warping, make substrate 3 be the shape that the right-hand end in Figure 12 bends upward.
Like this, after making substrate 3 Local warping, by the light from exposure light source is irradiated to substrate 3 across mask, thus expose.
As described above, exposure device 1 according to the present embodiment, can the distortion of local of correction substrate 3.Other formation and effect same with above-mentioned embodiment.
In addition, in the present embodiment, at least one rising among multiple support unit 19 is made to make substrate 3 Local warping, but, self-evident, at least one support unit 19 also can be made to decline.
(the 6th embodiment)
Next, the exposure device 1 of the 6th embodiment of the present invention is described.In addition, the exposure device of present embodiment is identical with the basic comprising of above-mentioned embodiment, therefore, describes in detail for different parts, for identical part, marks identical Reference numeral and omits the description.
As shown in figure 13, the workholder 10 of the exposure device 1 of present embodiment is roughly square shape from top view.In the bight of the four direction of workholder 10, these 9 positions of mid point on center and each limit are formed from top view is the groove 15 of circular.Except the shape of groove 15 and number, following wall portion 30 and vacuum tank 13, the formation of present embodiment is same with the formation in above-mentioned embodiment.In addition, be not limited to roughly square shape as shown in Figure 13 from the shape of the workholder 10 of top view, arbitrary shape can be become.In addition, be not limited to circular as shown in Figure 13 from the shape of the groove 15 of top view, arbitrary shape can be become.
In the present embodiment, the top of workholder 10 is made up of wall portion 30, and this wall portion 30 is made up of the 1st ~ 5th wall portion 31 ~ 35.1st wall portion 31 is circular from top view, forms groove 15 therein.Therefore, the 1st wall portion 31 is all 9 with the quantity of groove 15.2nd wall portion 32, by connected to each other for the 1st adjacent wall portion 31, is provided with 12.Further, by 4 the 1st wall portion 31 and 4 the region S1 ~ S4 4 the 2nd wall portion 32 connected to each other for these 4 the 1st wall portion 31 being formed roughly square shape.
In regional S1 ~ S4, be formed with the 3rd ~ 5th wall portion 33 ~ 35.3rd wall portion 33 is the hollow shape of the inner peripheral surface along 4 the 1st and the 2nd wall portion 31,32.4th wall portion 34 is formed in the inside of the 3rd wall portion 33, is the hollow shape of the inner peripheral surface along the 3rd wall portion 33.5th wall portion 35 is formed in the inside of the 4th wall portion 34, is the hollow shape of the inner peripheral surface along the 4th wall portion 34.Like this, 4 the 1st and the 2nd wall portion 31,32 and the 3rd wall portion 33 are shape similar mutually with the 4th wall portion 34 with the 5th wall portion 35.
Further, between the 1st and the 2nd wall portion the 31,32 and the 3rd wall portion 33, between the 3rd wall portion 33 and the 4th wall portion 34, between the 4th wall portion 34 and the 5th the wall portion 35 and inside of the 5th wall portion 35, vacuum tank 13 is formed respectively.
Cede territory by like this top (upper surface 11) of workholder 10 being utilized multiple wall portion 31 ~ 35 points to form, thus the area of the upper surface 11 of workholder 10 (the total area of multiple wall portion 31 ~ 35 upper surface) is reduced, the total area (area from top view) of multiple vacuum tank 13 is increased.Thereby, it is possible to improve by the absorption affinity of multiple vacuum tanks 13 pairs of substrates 3.In order to make multiple vacuum tank 13 sorbing substrate 3 more reliably, preferably make the area of the upper surface 11 of the total area ratio workholder 10 of multiple vacuum tank 13 large.
In addition, by the 1st and the 2nd wall portion 31,32 is become mutually similar shape with the 4th wall portion 34 with the 5th wall portion 35 with the 3rd wall portion 33, thus the 1st ~ 5th wall portion 31 ~ 35 (upper surface 11 of workholder 10) can supporting substrates 3 equably.Thereby, it is possible to prevent from when vacuumizing, the substrate 3 that adsorbs being produced concavo-convex.
In addition, multiple vacuum tank 13 both can interlink in the bottom of workholder 10 and be communicated with same vacuum plant, also can be communicated with independently vacuum plant separately.In addition, wall portion 30 is not limited to forming of being made up of the 1st ~ 5th wall portion 31 ~ 35, and also can arrange other wall portion further in the inside of the 5th wall portion 35.
(the 7th embodiment)
Next, the exposure device 1 of the 7th embodiment of the present invention is described.In addition, because the exposure device of present embodiment is identical with the basic formation of the 6th embodiment, therefore, different parts is described in detail, for identical part, mark identical Reference numeral and omit the description.
Multiple projections 114 with the height roughly the same with the degree of depth of this vacuum tank 13 are formed in the bottom of vacuum tank 13.Be not limited to roughly square shape as shown in Figure 14 from the shape of top view projection 114, arbitrary shape such as such as circle, rectangle etc. can be become.In addition, the shape of the upper surface of projection 114 is not limited to flat shape as shown in Figure 14, also can be that such as barrel surface like that and substrate 3 carries out the such shape of linear contact lay, as sphere, carry out the such shape of point cantact with substrate 3.
Like this, by arranging multiple projection 114 in the bottom of vacuum tank 113, thus projection 114 supporting substrates 3 equably together with upper surface 11.Therefore, it is possible to prevent from when vacuumizing, the substrate 3 that adsorbs being produced concavo-convex.
In addition, the Japanese patent application 2014-219842 that the Japanese patent application 2014-219827 and 2014 of the Japanese patent application 2014-096930 that the application applied for based on May 8th, 2014, application on October 29th, 2014 apply for 29, on October, is incorporated herein its content as reference.
In addition, the present invention is not limited to above-mentioned embodiment, can suitably carry out changing, improvement etc.
Claims (18)
1. an exposure method,
There is the pedestal that the substrate be exposed is configured at top,
Described exposure method comprises: the light from exposure light source is irradiated to described substrate to carry out the operation exposed across mask,
The feature of described exposure method is,
The upper surface of described pedestal is provided with multiple groove,
Be configured with corrugated tube in the inside of described groove, described corrugated tube is freely flexible at above-below direction, and the upper end of described corrugated tube is given prominence to upward than the upper surface of described pedestal,
In the inside of described groove, have the support unit with carrying plane in the inside of described corrugated tube or outer setting, described carrying plane and the upper surface of described pedestal are positioned on the same face or are positioned at than this upper surface position by the top,
Described exposure method comprises following operation:
By described substrate-placing to the operation on multiple described corrugated tube; And
By the inside of described corrugated tube is vacuumized, thus make the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus described substrate is made to have the operation of the curvature corresponding with the position relationship of multiple described carrying plane.
2. exposure method as claimed in claim 1, is characterized in that,
The carrying plane of multiple described support unit and the upper surface of described pedestal are positioned on the same face,
Described exposure method comprises following operation:
By described substrate-placing to the operation on multiple described corrugated tube; And
By being vacuumized the inside of described corrugated tube, thus the upper end of described corrugated tube is made to be adsorbed in the lower surface of described substrate and to shrink, by described substrate being pressed on the carrying plane of described support unit, thus by described substrate with plane fixing operation.
3. exposure method as claimed in claim 2, is characterized in that,
Described pedestal is the workholder being formed with multiple vacuum tanks that can vacuumize at described upper surface,
Described exposure method comprises: by being vacuumized by multiple described vacuum tank, thus the operation of the upper surface of described workholder is fixed in the absorption of the lower surface of described substrate.
4. exposure method as claimed in claim 3, is characterized in that,
Described in the total area ratio of multiple described vacuum tank, the area of the upper surface of workholder is large.
5. the exposure method as described in claim 3 or 4, is characterized in that,
Multiple projections with the height roughly the same with the degree of depth of described vacuum tank are formed in the bottom of described vacuum tank.
6. exposure method as claimed in claim 1, is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus the carrying plane of this support unit is made to locate operation in the same plane mutually by the top at the upper surface than described pedestal;
By described substrate-placing to the operation on multiple described corrugated tube;
By being vacuumized the inside of described corrugated tube, thus making the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus making described substrate be plane operation; And
Described support unit is declined, and makes the operation that the upper surface of the lower surface of described substrate and described pedestal is close to.
7. exposure method as claimed in claim 6, is characterized in that,
Described pedestal is the workholder being formed with multiple vacuum tanks that can vacuumize at described upper surface,
Described exposure method comprises: by being vacuumized by multiple described vacuum tank, thus the operation of the upper surface of described workholder is fixed in the absorption of the lower surface of described substrate.
8. exposure method as claimed in claim 7, is characterized in that,
Described in the total area ratio of multiple described vacuum tank, the area of the upper surface of workholder is large.
9. exposure method as claimed in claim 7 or 8, is characterized in that,
Multiple projections with the height roughly the same with the degree of depth of described vacuum tank are formed in the bottom of described vacuum tank.
10. exposure method as claimed in claim 1, is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus the carrying plane of this support unit is made to locate operation in the same plane mutually by the top at the upper surface than described pedestal;
By described substrate-placing to the operation on multiple described corrugated tube; And
By being vacuumized the inside of described corrugated tube, thus making the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus making described substrate be plane operation.
11. exposure methods as claimed in claim 10, is characterized in that,
There is the sensor measured the distance from the upper surface of described pedestal to the lower surface of described substrate,
Described exposure method comprises: based on the positional information of the described substrate obtained by described sensor, makes multiple described support unit lifting, and makes described substrate be plane operation.
12. exposure methods as claimed in claim 1, is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus make the carrying plane of this support unit the upper surface than described pedestal by the top place be positioned at make respective described carrying plane and the lower surface of described mask above-below direction apart from the operation of roughly the same position;
By described substrate-placing to the operation on multiple described corrugated tube; And
By the inside of described corrugated tube is vacuumized, thus make the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus make described substrate have the curvature corresponding with the position relationship of multiple described carrying plane, make the above-below direction of the lower surface of the upper surface of described substrate and described mask apart from uniform operation.
13. exposure methods as claimed in claim 1, is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance,
Described exposure method comprises following operation:
By making multiple described support unit rise, thus the carrying plane of this support unit is made to locate operation in the same plane mutually by the top at the upper surface than described pedestal;
Make at least one operation rising or decline among multiple described support unit;
By described substrate-placing to the operation on multiple described corrugated tube; And
By the inside of described corrugated tube is vacuumized, thus make the upper end of described corrugated tube be adsorbed in the lower surface of described substrate and shrink, by described substrate being pressed on the carrying plane of described support unit, thus the height of described carrying plane is changed in the position corresponding with the described substrate with local deformation, make described substrate have the curvature of expectation thus, make the operation of described substrate Local warping.
14. 1 kinds of exposure devices, it comprises:
Pedestal, the substrate be exposed is configured at top; And
Exposure light source, it light shines described substrate across mask,
The feature of described exposure device is,
The upper surface of described pedestal is provided with multiple groove,
Be configured with corrugated tube in the inside of described groove, described corrugated tube is freely flexible at above-below direction, and the upper end of described corrugated tube is given prominence to upward than the upper surface of described pedestal,
In the inside of described groove, have the support unit with carrying plane in the inside of described corrugated tube or outer setting, described carrying plane and the upper surface of described pedestal are positioned on the same face or are positioned at than this upper surface position by the top,
The inside of described corrugated tube can vacuumize.
15. exposure devices as claimed in claim 14, is characterized in that,
Described pedestal is the workholder being formed with multiple vacuum tanks that can vacuumize at described upper surface.
16. exposure devices as described in claims 14 or 15, is characterized in that,
Multiple described support unit can be elevated at above-below direction respectively while the described corrugated tube of maintenance.
17. exposure devices as claimed in claim 15, is characterized in that,
Described in the total area ratio of multiple described vacuum tank, the area of the upper surface of workholder is large.
18. exposure devices as claimed in claim 17, is characterized in that,
Multiple projections with the height roughly the same with the degree of depth of described vacuum tank are formed in the bottom of described vacuum tank.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-096930 | 2014-05-08 | ||
| JP2014096930 | 2014-05-08 | ||
| JP2014219842 | 2014-10-29 | ||
| JP2014219827 | 2014-10-29 | ||
| JP2014-219827 | 2014-10-29 | ||
| JP2014-219842 | 2014-10-29 |
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| CN105093844A true CN105093844A (en) | 2015-11-25 |
| CN105093844B CN105093844B (en) | 2017-09-22 |
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| CN201510232828.4A Active CN105093844B (en) | 2014-05-08 | 2015-05-08 | Exposure method and exposure device |
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| CN (1) | CN105093844B (en) |
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| JP2016085439A (en) | 2016-05-19 |
| CN105093844B (en) | 2017-09-22 |
| JP6535206B2 (en) | 2019-06-26 |
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