CN105892240A - Base for integrating extreme ultraviolet lithography light source collection lenses - Google Patents
Base for integrating extreme ultraviolet lithography light source collection lenses Download PDFInfo
- Publication number
- CN105892240A CN105892240A CN201610437955.2A CN201610437955A CN105892240A CN 105892240 A CN105892240 A CN 105892240A CN 201610437955 A CN201610437955 A CN 201610437955A CN 105892240 A CN105892240 A CN 105892240A
- Authority
- CN
- China
- Prior art keywords
- eyeglass
- extreme ultraviolet
- light source
- groove
- collection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
Abstract
The invention provides a base for integrating extreme ultraviolet lithography light source collection lenses, and relates to the technical field of integration of collection lenses. In order to meet the requirements of integrating multi-layer collection lenses into a collection lens system, a rim is a stainless steel circular ring; 6 spokes are arranged in the ring of the circular ring; N grooves are formed in each spoke; the grooves in the six spokes form N groups of circles which are concentric with the circular ring; N is a positive integer; one group of grooves are used for mounting one layer of collection lens; the collection lenses are fixed into the grooves by vacuum glue; and the outer diameter phi of the stainless steel circular ring is 600mm, the width is 40mm and the thickness is 40mm. The base provided by the invention is simple in structure; the collection lenses can be firmly fixed; and the base is suitable for integrating the collection lenses.
Description
Technical field
The present invention relates to collect the integrated technology field of eyeglass.
Background technology
Utilize the big electric current of capillary tube, Fast pulsed discharge Z constriction, in capillary tube, fill working media xenon (Xe), plasma
Produce high temperature, produce Xe high price ionization Xe10+, Xe10+The compound excitation process that disappears, radiant output extreme ultraviolet, it is thus achieved that 13.5nm
Light exports, and extreme ultraviolet is 4 π solid angle distributions.
Restriction based on capillary tube bore, at capillary outlet, emergent light is at+5 °～+30 °, the space of-5 °～-30 °
Distribution, the collection eyeglass of design multilamellar book shell structure, and an integrated optical collection mirror system, effective by spoke to greatest extent
Penetrate light to collect, and focus on, obtain stronger power at focal point, in order to be connected with post-exposure system, carry out photoetching.
In this course, the collection system of multi-layer thin shell structure is one of critical component, thus needs multilamellar is collected eyeglass
It is integrated into the device collecting mirror system.
Summary of the invention
The present invention is multilamellar be collected eyeglass be integrated into, in order to meet, the demand of mirror system of collecting, thus provides extreme ultraviolet photoetching
The pedestal that source-collector eyeglass is integrated.
Extreme ultraviolet photolithography light source of the present invention collects the pedestal that eyeglass is integrated, including wheel rim and 6 spokes；
Wheel rim is rustless steel annulus, is provided with 6 spokes in the annular of annulus；N number of groove is all had on every spoke, 6
The groove of root spoke forms the circle that N group is concentric with described annulus, and N is positive integer, and one group of groove is for installing one layer of receipts
Collection eyeglass, uses vacuum glue will collect eyeglass fixing in a groove；
The external diameter Φ of rustless steel annulus is 600mm, and width is 40mm, thickness is 40mm.
Same spoke upper groove processing dimension requires, each recess width should be different, should be by needing corresponding receipts to be assembled
The actual size collecting the wall thickness after machining eyeglass completes determines, and with every layer of actual bore collecting eyeglass inner surface as baseline,
Determining the internal diameter size of recess width, internal diameter size adds and stays error-0.25mm man-hour, and outside dimension is according to each collection eyeglass wall
Thick actual size determines its bore, and increases allowance+0.25mm, and this allowance is when the system integration, and fine setting is every
Layer is collected eyeglass and is detected the axial location determined by face type, uses vacuum adhesive curing, groove surfaces externally and internally composition and circle after determining
The circle that ring is concentric.After machining eyeglass, eyeglass face type need to be detected, after the detection of every eyeglass, need to be by multilamellar eyeglass system
System is integrated into a collection mirror system, is finally installed in the vacuum chamber of light supply apparatus by this collection mirror system, these steps,
All need to use pedestal.The present invention be directed to this demand, design, process construction extreme ultraviolet photolithography light source collect eyeglass integrated
Pedestal.This pedestal is pocket-wheel structure, and designing and build this pedestal is to machine completely at all collection eyeglasses,
And detect through opposite type, after having entirely reached design objective requirement, then determine each corresponding size on pocket-wheel, the most again
The processing carrying out pedestal is built.Assembly of the invention simple in construction, can fixedly secure collection eyeglass.The present invention is applicable to integrated
Collect eyeglass.
Accompanying drawing explanation
Fig. 1 is the stereochemical structure that the extreme ultraviolet photolithography light source described in detailed description of the invention one collects the integrated pedestal of eyeglass
Schematic diagram；
Fig. 2 is the top view that the extreme ultraviolet photolithography light source described in detailed description of the invention one collects the integrated pedestal of eyeglass；
Fig. 3 is that the A-A of Fig. 2 is to sectional view；
Fig. 4 be integrated in detailed description of the invention three after collect mirror system structural representation.
Detailed description of the invention
Detailed description of the invention one: illustrate present embodiment referring to figs. 1 through Fig. 3, the extreme ultraviolet described in present embodiment
Light photolithography light source collects the pedestal that eyeglass is integrated, including wheel rim 1 and 6 spokes 2；
Wheel rim 1 is rustless steel annulus, is provided with 6 spokes 2 in the annular of annulus；N number of groove is all had on every spoke 2
2-1, the groove of 6 spokes 2 forms the circle that N group is concentric with described annulus, and N is positive integer, and one group of groove is used for pacifying
Fill one layer and collect eyeglass, use vacuum glue will collect eyeglass fixing in a groove；
The external diameter Φ of rustless steel annulus is 600mm, and width is 40mm, thickness is 40mm.With the axial direction of annulus it is
Thickness direction, radial direction is width.The distribution of same spoke 2 upper groove is unequal-interval, the spacing of groove
It is by when 8 layers-10 layers collection eyeglass of processing are integrated into collection mirror system, collects the locus that eyeglass should be located for each layer
Spacing between every layer and the every layer collection eyeglass determined determines.
Detailed description of the invention two: present embodiment is that the extreme ultraviolet photolithography light source described in detailed description of the invention one is collected mirror
The integrated pedestal of sheet is described further, and in present embodiment, the width of spoke 2 is 10mm, and thickness is 40mm.
With the axial direction of annulus as thickness direction.
Detailed description of the invention three: illustrate present embodiment with reference to Fig. 4, present embodiment is to detailed description of the invention one
Or the pedestal that the extreme ultraviolet photolithography light source described in two collects eyeglass integrated is described further, in present embodiment, N is
8,9 or 10.Generally by descending for 8 to 10 layers of bore, by double aspheric surface faces type (ellipsoid type adds hyperboloid face type)
Combination composition, the collection eyeglass of every layer of wall thickness about 3mm, be integrated into a collection mirror system.
Detailed description of the invention four: present embodiment is to receive the extreme ultraviolet photolithography light source described in detailed description of the invention one or two
The pedestal collecting eyeglass integrated is described further, in present embodiment, and groove groove depth 10mm.The determination of groove depth is taken an examination
Consider two factors, first, collect eyeglass and to inlay firmly, second, groove can not too deeply, it can affect extreme ultraviolet
Collection efficiency, because cell wall can shelter from some glancing incidences to the extreme ultraviolet light collecting mirror edge.
Claims (4)
1. extreme ultraviolet photolithography light source collects the pedestal that eyeglass is integrated, it is characterised in that include wheel rim (1) and 6 spokes
Bar (2)；
Wheel rim (1) is rustless steel annulus, is provided with 6 spokes (2) in the annular of annulus；All have on every spoke (2)
N number of groove (2-1), the groove of 6 spokes (2) forms the circle that N group is concentric with described annulus, and N is positive integer, and one
Group groove collects eyeglass for installing one layer, uses vacuum glue will collect eyeglass fixing in a groove；
The external diameter Φ of rustless steel annulus is 600mm, and width is 40mm, thickness is 40mm.
Extreme ultraviolet photolithography light source the most according to claim 1 collects the pedestal that eyeglass is integrated, it is characterised in that spoke
The width of bar (2) is 10mm, and thickness is 40mm.
Extreme ultraviolet photolithography light source the most according to claim 1 and 2 collects the pedestal that eyeglass is integrated, it is characterised in that
N is 8,9 or 10.
Extreme ultraviolet photolithography light source the most according to claim 1 and 2 collects the pedestal that eyeglass is integrated, it is characterised in that
Groove groove depth 10mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610437955.2A CN105892240B (en) | 2016-06-17 | 2016-06-17 | Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610437955.2A CN105892240B (en) | 2016-06-17 | 2016-06-17 | Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105892240A true CN105892240A (en) | 2016-08-24 |
| CN105892240B CN105892240B (en) | 2017-09-29 |
Family
ID=56730101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610437955.2A Active CN105892240B (en) | 2016-06-17 | 2016-06-17 | Extreme ultraviolet photolithography light source collects the integrated pedestal of eyeglass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105892240B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089704A (en) * | 1990-10-18 | 1992-02-18 | C & K Systems, Inc. | Wide angle ceiling mounted passive infrared intrusion detection system |
-
2016
- 2016-06-17 CN CN201610437955.2A patent/CN105892240B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089704A (en) * | 1990-10-18 | 1992-02-18 | C & K Systems, Inc. | Wide angle ceiling mounted passive infrared intrusion detection system |
Non-Patent Citations (2)
| Title |
|---|
| 左保军等: "下一代光刻技术的EUV光源收集系统的发展", 《激光与红外》 * |
| 朱新旺等: "CO_2激光等离子体极紫外光源收集镜研究", 《激光技术》 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105892240B (en) | 2017-09-29 |
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Effective date of registration: 20210119 Address after: Building 9, accelerator, 14955 Zhongyuan Avenue, Songbei District, Harbin City, Heilongjiang Province Patentee after: INDUSTRIAL TECHNOLOGY Research Institute OF HEILONGJIANG PROVINCE Address before: 150001 No. 92 West straight street, Nangang District, Heilongjiang, Harbin Patentee before: HARBIN INSTITUTE OF TECHNOLOGY |
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Effective date of registration: 20230330 Address after: 150027 Room 412, Unit 1, No. 14955, Zhongyuan Avenue, Building 9, Innovation and Entrepreneurship Plaza, Science and Technology Innovation City, Harbin Hi tech Industrial Development Zone, Heilongjiang Province Patentee after: Heilongjiang Industrial Technology Research Institute Asset Management Co.,Ltd. Address before: Building 9, accelerator, 14955 Zhongyuan Avenue, Songbei District, Harbin City, Heilongjiang Province Patentee before: INDUSTRIAL TECHNOLOGY Research Institute OF HEILONGJIANG PROVINCE |