CN1196186C - 剥除时间反馈控制以减少剥除后晶体管栅极临界尺寸变化 - Google Patents
剥除时间反馈控制以减少剥除后晶体管栅极临界尺寸变化 Download PDFInfo
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- CN1196186C CN1196186C CNB018125603A CN01812560A CN1196186C CN 1196186 C CN1196186 C CN 1196186C CN B018125603 A CNB018125603 A CN B018125603A CN 01812560 A CN01812560 A CN 01812560A CN 1196186 C CN1196186 C CN 1196186C
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- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
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- 235000012239 silicon dioxide Nutrition 0.000 description 1
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- -1 silicon nitrides Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32096—Batch, recipe configuration for flexible batch control
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/45—Nc applications
- G05B2219/45031—Manufacturing semiconductor wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
Abstract
Description
Claims (10)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/614,666 US6461878B1 (en) | 2000-07-12 | 2000-07-12 | Feedback control of strip time to reduce post strip critical dimension variation in a transistor gate electrode |
US09/614,666 | 2000-07-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1441962A CN1441962A (zh) | 2003-09-10 |
CN1196186C true CN1196186C (zh) | 2005-04-06 |
Family
ID=24462231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018125603A Expired - Fee Related CN1196186C (zh) | 2000-07-12 | 2001-07-03 | 剥除时间反馈控制以减少剥除后晶体管栅极临界尺寸变化 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6461878B1 (zh) |
EP (1) | EP1303874A2 (zh) |
JP (1) | JP2004503104A (zh) |
KR (1) | KR100836945B1 (zh) |
CN (1) | CN1196186C (zh) |
AU (1) | AU2001273203A1 (zh) |
TW (1) | TWI282134B (zh) |
WO (1) | WO2002005300A2 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7261745B2 (en) * | 2003-09-30 | 2007-08-28 | Agere Systems Inc. | Real-time gate etch critical dimension control by oxygen monitoring |
US20050221513A1 (en) * | 2004-03-31 | 2005-10-06 | Tokyo Electron Limited | Method of controlling trimming of a gate electrode structure |
US6852584B1 (en) * | 2004-01-14 | 2005-02-08 | Tokyo Electron Limited | Method of trimming a gate electrode structure |
US6980873B2 (en) | 2004-04-23 | 2005-12-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for real-time fault detection, classification, and correction in a semiconductor manufacturing environment |
US20080281438A1 (en) * | 2004-04-23 | 2008-11-13 | Model Predictive Systems, Inc. | Critical dimension estimation |
US7437404B2 (en) | 2004-05-20 | 2008-10-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for improving equipment communication in semiconductor manufacturing equipment |
US7069098B2 (en) * | 2004-08-02 | 2006-06-27 | Advanced Micro Devices, Inc. | Method and system for prioritizing material to clear exception conditions |
US7296103B1 (en) | 2004-10-05 | 2007-11-13 | Advanced Micro Devices, Inc. | Method and system for dynamically selecting wafer lots for metrology processing |
US7076321B2 (en) * | 2004-10-05 | 2006-07-11 | Advanced Micro Devices, Inc. | Method and system for dynamically adjusting metrology sampling based upon available metrology capacity |
KR20160045299A (ko) * | 2014-10-17 | 2016-04-27 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치, 연계 처리 시스템 및 기판 처리 방법 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5503707A (en) * | 1993-09-22 | 1996-04-02 | Texas Instruments Incorporated | Method and apparatus for process endpoint prediction based on actual thickness measurements |
JP3633062B2 (ja) * | 1994-12-22 | 2005-03-30 | 株式会社デンソー | 研磨方法および研磨装置 |
US5646870A (en) | 1995-02-13 | 1997-07-08 | Advanced Micro Devices, Inc. | Method for setting and adjusting process parameters to maintain acceptable critical dimensions across each die of mass-produced semiconductor wafers |
US5637185A (en) * | 1995-03-30 | 1997-06-10 | Rensselaer Polytechnic Institute | Systems for performing chemical mechanical planarization and process for conducting same |
US5591299A (en) * | 1995-04-28 | 1997-01-07 | Advanced Micro Devices, Inc. | System for providing integrated monitoring, control and diagnostics functions for semiconductor spray process tools |
KR0161887B1 (ko) * | 1995-12-26 | 1999-02-18 | 문정환 | 용기를 갖는 습식에치 장치의 에치 종말점 측정방법 |
US5639342A (en) | 1996-03-15 | 1997-06-17 | Taiwan Semiconductor Manufacturing Company Ltd. | Method of monitoring and controlling a silicon nitride etch step |
TW346649B (en) * | 1996-09-24 | 1998-12-01 | Tokyo Electron Co Ltd | Method for wet etching a film |
US5913102A (en) | 1997-03-20 | 1999-06-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for forming patterned photoresist layers with enhanced critical dimension uniformity |
US5926690A (en) | 1997-05-28 | 1999-07-20 | Advanced Micro Devices, Inc. | Run-to-run control process for controlling critical dimensions |
US6191038B1 (en) * | 1997-09-02 | 2001-02-20 | Matsushita Electronics Corporation | Apparatus and method for chemical/mechanical polishing |
US6194230B1 (en) * | 1998-05-06 | 2001-02-27 | International Business Machines Corporation | Endpoint detection by chemical reaction and light scattering |
US6228769B1 (en) * | 1998-05-06 | 2001-05-08 | International Business Machines Corporation | Endpoint detection by chemical reaction and photoionization |
US6190494B1 (en) * | 1998-07-29 | 2001-02-20 | Micron Technology, Inc. | Method and apparatus for electrically endpointing a chemical-mechanical planarization process |
US6197604B1 (en) * | 1998-10-01 | 2001-03-06 | Advanced Micro Devices, Inc. | Method for providing cooperative run-to-run control for multi-product and multi-process semiconductor fabrication |
KR100649387B1 (ko) | 1999-06-22 | 2006-11-27 | 브룩스 오토메이션 인코퍼레이티드 | 초소형전자 제조에 사용하기 위한 공정수행 간 제어기 |
US6368879B1 (en) | 1999-09-22 | 2002-04-09 | Advanced Micro Devices, Inc. | Process control with control signal derived from metrology of a repetitive critical dimension feature of a test structure on the work piece |
-
2000
- 2000-07-12 US US09/614,666 patent/US6461878B1/en not_active Expired - Lifetime
-
2001
- 2001-07-03 KR KR1020037000452A patent/KR100836945B1/ko not_active IP Right Cessation
- 2001-07-03 WO PCT/US2001/021338 patent/WO2002005300A2/en active Application Filing
- 2001-07-03 CN CNB018125603A patent/CN1196186C/zh not_active Expired - Fee Related
- 2001-07-03 AU AU2001273203A patent/AU2001273203A1/en not_active Abandoned
- 2001-07-03 EP EP01952452A patent/EP1303874A2/en not_active Withdrawn
- 2001-07-03 JP JP2002508816A patent/JP2004503104A/ja not_active Withdrawn
- 2001-07-06 TW TW090116544A patent/TWI282134B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1303874A2 (en) | 2003-04-23 |
TWI282134B (en) | 2007-06-01 |
JP2004503104A (ja) | 2004-01-29 |
WO2002005300A3 (en) | 2002-04-11 |
US6461878B1 (en) | 2002-10-08 |
KR100836945B1 (ko) | 2008-06-11 |
CN1441962A (zh) | 2003-09-10 |
KR20030016397A (ko) | 2003-02-26 |
WO2002005300A2 (en) | 2002-01-17 |
AU2001273203A1 (en) | 2002-01-21 |
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