CN1729393A - 产生电磁场分布的方法 - Google Patents
产生电磁场分布的方法 Download PDFInfo
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- CN1729393A CN1729393A CNA2003801071362A CN200380107136A CN1729393A CN 1729393 A CN1729393 A CN 1729393A CN A2003801071362 A CNA2003801071362 A CN A2003801071362A CN 200380107136 A CN200380107136 A CN 200380107136A CN 1729393 A CN1729393 A CN 1729393A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/774—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
- G01N21/7743—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure the reagent-coated grating coupling light in or out of the waveguide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6452—Individual samples arranged in a regular 2D-array, e.g. multiwell plates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/774—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/7746—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the waveguide coupled to a cavity resonator
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Optics & Photonics (AREA)
- Electrochemistry (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating Or Analysing Biological Materials (AREA)
- Thin Magnetic Films (AREA)
- Secondary Cells (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Particle Accelerators (AREA)
Abstract
Description
折射率 | 层厚度或晶格深度[nm] | 实例 | |
顶片 | 1 | - | 空气 |
晶格 | 1.48和1 | 387 | SiO2和空气 |
层6 | 1.48 | 10.3 | SiO2 |
层5 | 2.35 | 74.6 | TiO2 |
层4 | 1.48 | 129.6 | SiO2 |
层3 | 2.35 | 76.3 | TiO2 |
层2 | 1.48 | 127.9 | SiO2 |
层1 | 2.35 | 75.7 | TiO2 |
基片 | 1.52 | - | BK7 |
折射率 | 层厚度或晶格深度[nm] | 实例 | |
顶层 | 1 | - | 空气 |
晶格 | 1.48和1 | 300 | SiO2和空气 |
层16 | 1.48 | 68.3 | SiO2 |
层15 | 2.1 | 92.6 | Ta2O5 |
层14 | 1.48 | 181.9 | SiO2 |
层13 | 2.1 | 93.3 | Ta2O5 |
层12 | 1.48 | 204.9 | SiO2 |
层11 | 2.1 | 77.7 | Ta2O5 |
层10 | 1.48 | 286.8 | SiO2 |
层9 | 2.1 | 73.7 | Ta2O5 |
层8 | 1.48 | 126.1 | SiO2 |
层7 | 2.1 | 77.7 | Ta2O5 |
层6 | 1.48 | 124.0 | SiO2 |
层5 | 2.1 | 76.7 | Ta2O5 |
层4 | 1.48 | 292.7 | SiO2 |
层3 | 2.1 | 76.3 | Ta2O5 |
层2 | 1.48 | 119.0 | SiO2 |
层1 | 2.1 | 79.6 | Ta2O5 |
基片 | 1.52 | - | BK7 |
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43498702P | 2002-12-19 | 2002-12-19 | |
US60/434,987 | 2002-12-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1729393A true CN1729393A (zh) | 2006-02-01 |
CN100585384C CN100585384C (zh) | 2010-01-27 |
Family
ID=32682135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200380107136A Expired - Fee Related CN100585384C (zh) | 2002-12-19 | 2003-12-11 | 产生电磁场分布的方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7110181B2 (zh) |
EP (1) | EP1576356B1 (zh) |
KR (1) | KR20050084016A (zh) |
CN (1) | CN100585384C (zh) |
AT (1) | ATE447171T1 (zh) |
AU (1) | AU2003283175A1 (zh) |
DE (1) | DE50312077D1 (zh) |
TW (1) | TWI322264B (zh) |
WO (1) | WO2004057315A1 (zh) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5914613A (en) | 1996-08-08 | 1999-06-22 | Cascade Microtech, Inc. | Membrane probing system with local contact scrub |
US6256882B1 (en) | 1998-07-14 | 2001-07-10 | Cascade Microtech, Inc. | Membrane probing system |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
DE20114544U1 (de) | 2000-12-04 | 2002-02-21 | Cascade Microtech Inc | Wafersonde |
AU2002327490A1 (en) | 2001-08-21 | 2003-06-30 | Cascade Microtech, Inc. | Membrane probing system |
US7863052B2 (en) * | 2005-08-11 | 2011-01-04 | Sru Biosystems, Inc. | Grating-based sensor combining label-free binding detection and fluorescence amplification and readout system for sensor |
US7057404B2 (en) | 2003-05-23 | 2006-06-06 | Sharp Laboratories Of America, Inc. | Shielded probe for testing a device under test |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
DE202004021093U1 (de) | 2003-12-24 | 2006-09-28 | Cascade Microtech, Inc., Beaverton | Aktiver Halbleiterscheibenmessfühler |
KR20070058522A (ko) | 2004-09-13 | 2007-06-08 | 캐스케이드 마이크로테크 인코포레이티드 | 양측 프루빙 구조 |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7790406B2 (en) * | 2005-08-11 | 2010-09-07 | Sru Biosystems, Inc | Grating-based sensor combining label-free binding detection and fluorescence amplification and readout system for sensor |
US7764072B2 (en) | 2006-06-12 | 2010-07-27 | Cascade Microtech, Inc. | Differential signal probing system |
US7403028B2 (en) | 2006-06-12 | 2008-07-22 | Cascade Microtech, Inc. | Test structure and probe for differential signals |
US7723999B2 (en) | 2006-06-12 | 2010-05-25 | Cascade Microtech, Inc. | Calibration structures for differential signal probing |
US20080012578A1 (en) * | 2006-07-14 | 2008-01-17 | Cascade Microtech, Inc. | System for detecting molecular structure and events |
WO2008010182A2 (de) * | 2006-07-17 | 2008-01-24 | Max Wiki | Analytisches system mit einer anordnung zur zeitlich veränderbaren räumlichen lichtmodulation und damit ausführbares nachweisverfahren |
US7876114B2 (en) | 2007-08-08 | 2011-01-25 | Cascade Microtech, Inc. | Differential waveguide probe |
EP2060904A1 (en) * | 2007-11-13 | 2009-05-20 | Koninklijke Philips Electronics N.V. | Plasmon grating biosensor |
US7888957B2 (en) | 2008-10-06 | 2011-02-15 | Cascade Microtech, Inc. | Probing apparatus with impedance optimized interface |
WO2010059247A2 (en) | 2008-11-21 | 2010-05-27 | Cascade Microtech, Inc. | Replaceable coupon for a probing apparatus |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
EP2221605A1 (en) * | 2009-02-12 | 2010-08-25 | Koninklijke Philips Electronics N.V. | A wire grid sensor |
FR2954524B1 (fr) * | 2009-12-17 | 2012-09-28 | Ecole Polytech | Reseau de diffraction reflechissant dielectrique optimise |
TWI571648B (zh) * | 2016-01-26 | 2017-02-21 | 國立彰化師範大學 | 磁場分佈感測系統 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2256477B (en) * | 1991-06-07 | 1995-03-08 | Marconi Gec Ltd | An optical sensor |
US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
DE69722008T2 (de) * | 1996-08-21 | 2004-04-01 | Polaroid Corp., Waltham | Auf der phasensteuerung abklingender felder basierende systeme und verfahren |
GB9803704D0 (en) * | 1998-02-24 | 1998-04-15 | Univ Manchester | Waveguide structure |
EP1272829A1 (de) * | 2000-04-14 | 2003-01-08 | Zeptosens AG | Gitter-wellenleiter-struktur zur verstärkung eines anregungsfeldes und deren verwendung |
WO2002008810A2 (en) * | 2000-07-21 | 2002-01-31 | Micro Managed Photons A/S | Surface plasmon polariton band gap structures |
-
2003
- 2003-12-11 EP EP03775037A patent/EP1576356B1/de not_active Expired - Lifetime
- 2003-12-11 WO PCT/CH2003/000811 patent/WO2004057315A1/de not_active Application Discontinuation
- 2003-12-11 AT AT03775037T patent/ATE447171T1/de not_active IP Right Cessation
- 2003-12-11 DE DE50312077T patent/DE50312077D1/de not_active Expired - Lifetime
- 2003-12-11 AU AU2003283175A patent/AU2003283175A1/en not_active Abandoned
- 2003-12-11 KR KR1020057009647A patent/KR20050084016A/ko not_active Application Discontinuation
- 2003-12-11 CN CN200380107136A patent/CN100585384C/zh not_active Expired - Fee Related
- 2003-12-18 TW TW092135937A patent/TWI322264B/zh not_active IP Right Cessation
- 2003-12-18 US US10/740,057 patent/US7110181B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW200420876A (en) | 2004-10-16 |
CN100585384C (zh) | 2010-01-27 |
EP1576356A1 (de) | 2005-09-21 |
AU2003283175A1 (en) | 2004-07-14 |
WO2004057315A1 (de) | 2004-07-08 |
DE50312077D1 (de) | 2009-12-10 |
EP1576356B1 (de) | 2009-10-28 |
KR20050084016A (ko) | 2005-08-26 |
US7110181B2 (en) | 2006-09-19 |
US20040130787A1 (en) | 2004-07-08 |
ATE447171T1 (de) | 2009-11-15 |
TWI322264B (en) | 2010-03-21 |
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Owner name: ALLIKON TRADE CO., LTD. (TELVBAHE) Free format text: FORMER OWNER: OC OERLIKON BALZERS CO., LTD. Effective date: 20091225 |
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Owner name: OC OERLIKON BALZERS CO., LTD. Free format text: FORMER NAME: YUNAKSIS BALZERS CO., LTD. |
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Address after: Liechtenstein Barr Che J Patentee after: OC OERLIKON BALZERS AG Address before: Liechtenstein Barr Che J Patentee before: UNAXIS BALZERS AG |
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Effective date of registration: 20091225 Address after: Swiss Te Lui Bach Patentee after: OERLIKON TRADING AG, TRuBBACH Address before: Liechtenstein Barr Che J Patentee before: OC Oerlikon Balzers AG |
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Granted publication date: 20100127 Termination date: 20161211 |
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CF01 | Termination of patent right due to non-payment of annual fee |