CN1777690A - 采用钛与铝材料的混合物涂覆的衬底,制备该衬底的方法和钛与铝金属的阴极靶材 - Google Patents
采用钛与铝材料的混合物涂覆的衬底,制备该衬底的方法和钛与铝金属的阴极靶材 Download PDFInfo
- Publication number
- CN1777690A CN1777690A CN200480008611.5A CN200480008611A CN1777690A CN 1777690 A CN1777690 A CN 1777690A CN 200480008611 A CN200480008611 A CN 200480008611A CN 1777690 A CN1777690 A CN 1777690A
- Authority
- CN
- China
- Prior art keywords
- aluminium
- coating
- titanium
- layer
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010936 titanium Substances 0.000 title claims abstract description 140
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 130
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 129
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 118
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 112
- 239000000203 mixture Substances 0.000 title claims abstract description 51
- 239000000463 material Substances 0.000 title claims abstract description 43
- 239000000758 substrate Substances 0.000 title claims description 83
- 238000000034 method Methods 0.000 title claims description 53
- 238000000576 coating method Methods 0.000 claims abstract description 300
- 239000011248 coating agent Substances 0.000 claims abstract description 284
- 239000007789 gas Substances 0.000 claims abstract description 54
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 46
- 150000004767 nitrides Chemical class 0.000 claims abstract description 43
- 239000001301 oxygen Substances 0.000 claims abstract description 39
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 37
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 12
- 239000004411 aluminium Substances 0.000 claims description 112
- 230000008021 deposition Effects 0.000 claims description 99
- 239000000956 alloy Substances 0.000 claims description 63
- 229910045601 alloy Inorganic materials 0.000 claims description 63
- 229910052751 metal Inorganic materials 0.000 claims description 61
- 239000002184 metal Substances 0.000 claims description 61
- 239000011521 glass Substances 0.000 claims description 57
- 229910004349 Ti-Al Inorganic materials 0.000 claims description 51
- 229910004692 Ti—Al Inorganic materials 0.000 claims description 51
- 150000001875 compounds Chemical class 0.000 claims description 49
- 239000012298 atmosphere Substances 0.000 claims description 34
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 26
- 229910052710 silicon Inorganic materials 0.000 claims description 26
- 239000010703 silicon Substances 0.000 claims description 26
- 229910052723 transition metal Inorganic materials 0.000 claims description 26
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 19
- 229910052709 silver Inorganic materials 0.000 claims description 19
- 239000004332 silver Substances 0.000 claims description 19
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 claims description 17
- 150000003624 transition metals Chemical class 0.000 claims description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- 238000005266 casting Methods 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000007750 plasma spraying Methods 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 239000010959 steel Substances 0.000 claims 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 54
- 229910052786 argon Inorganic materials 0.000 abstract description 27
- 238000004544 sputter deposition Methods 0.000 abstract description 19
- 239000011261 inert gas Substances 0.000 abstract 2
- 239000011247 coating layer Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 177
- 239000000523 sample Substances 0.000 description 127
- 238000000151 deposition Methods 0.000 description 112
- 239000010408 film Substances 0.000 description 84
- 238000010438 heat treatment Methods 0.000 description 55
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 41
- 239000005329 float glass Substances 0.000 description 33
- 238000006124 Pilkington process Methods 0.000 description 29
- 239000013077 target material Substances 0.000 description 28
- 239000011701 zinc Substances 0.000 description 23
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 22
- 229910052725 zinc Inorganic materials 0.000 description 22
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 18
- 230000003647 oxidation Effects 0.000 description 18
- 238000007254 oxidation reaction Methods 0.000 description 18
- 238000002310 reflectometry Methods 0.000 description 16
- 238000012360 testing method Methods 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 15
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 239000000428 dust Substances 0.000 description 13
- 239000011241 protective layer Substances 0.000 description 12
- -1 titanium-aluminium-silicon Chemical compound 0.000 description 12
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 description 10
- 238000003475 lamination Methods 0.000 description 10
- 229910044991 metal oxide Inorganic materials 0.000 description 10
- 150000004706 metal oxides Chemical class 0.000 description 10
- 238000001228 spectrum Methods 0.000 description 10
- 238000005118 spray pyrolysis Methods 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 9
- 238000001513 hot isostatic pressing Methods 0.000 description 9
- 229960001296 zinc oxide Drugs 0.000 description 9
- 239000011787 zinc oxide Substances 0.000 description 9
- 238000005452 bending Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 229920006384 Airco Polymers 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 239000002243 precursor Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 238000004062 sedimentation Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- 239000005357 flat glass Substances 0.000 description 6
- 229910018575 Al—Ti Inorganic materials 0.000 description 5
- 230000008033 biological extinction Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000008246 gaseous mixture Substances 0.000 description 5
- 230000033001 locomotion Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- 239000013049 sediment Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 238000005477 sputtering target Methods 0.000 description 5
- 239000004408 titanium dioxide Substances 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 4
- 210000003625 skull Anatomy 0.000 description 4
- 239000005361 soda-lime glass Substances 0.000 description 4
- 229910018125 Al-Si Inorganic materials 0.000 description 3
- 229910017083 AlN Inorganic materials 0.000 description 3
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 3
- 229910018520 Al—Si Inorganic materials 0.000 description 3
- 235000008645 Chenopodium bonus henricus Nutrition 0.000 description 3
- 244000138502 Chenopodium bonus henricus Species 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- VQYHBXLHGKQYOY-UHFFFAOYSA-N aluminum oxygen(2-) titanium(4+) Chemical compound [O-2].[Al+3].[Ti+4] VQYHBXLHGKQYOY-UHFFFAOYSA-N 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- VXAUWWUXCIMFIM-UHFFFAOYSA-M aluminum;oxygen(2-);hydroxide Chemical compound [OH-].[O-2].[Al+3] VXAUWWUXCIMFIM-UHFFFAOYSA-M 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000013068 control sample Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- 238000009681 x-ray fluorescence measurement Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 229910005881 NiSi 2 Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 241000863032 Trieres Species 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000013034 coating degradation Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 230000009610 hypersensitivity Effects 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000002905 metal composite material Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical group [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229960001866 silicon dioxide Drugs 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical group O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910021350 transition metal silicide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3615—Coatings of the type glass/metal/other inorganic layers, at least one layer being non-metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3694—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer having a composition gradient through its thickness
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/29—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
Abstract
Description
实施例# | 电压 | 电流 | 功率(kw) | 通过次数 | 透射率 |
G1 | 395 | 2.52 | 1.0 | 3 | 20.9 |
G2 | 509 | 9.72 | 5.0 | 5 | 0.1 |
样品位置 | G1 | G2 | G1,G2的平均值 | |||||||
微克/cm2 | wt% | 微克/cm2 | wt% | 平均wt% | ||||||
Al | Ti | Al | Ti | Al | Ti | Al | Ti | Al | Ti | |
1 | 0.09 | 4.78 | 1.8 | 98.2 | 0.96 | 37.35 | 2.5 | 97.5 | 2.2 | 97.8 |
2 | 0.2 | 4.79 | 4.0 | 96.0 | 1.9 | 37.32 | 4.8 | 95.2 | 4.4 | 95.6 |
3 | 0.5 | 4.53 | 9.9 | 90.1 | 4.48 | 35.33 | 11.3 | 88.7 | 10.6 | 89.4 |
4 | 1.5 | 3.6 | 29.4 | 70.6 | 13.12 | 28.18 | 31.8 | 68.2 | 30.6 | 69.4 |
5 | 3.35 | 1.94 | 63.3 | 36.7 | 28.13 | 14.94 | 65.3 | 34.7 | 64.3 | 35.7 |
6 | 4.32 | 0.82 | 84.0 | 16.0 | 36.7 | 5.74 | 86.5 | 13.5 | 85.3 | 14.7 |
7 | 4.56 | 0.35 | 92.9 | 7.1 | 38.91 | 2.33 | 94.4 | 5.6 | 93.6 | 6.4 |
8 | 4.54 | 0.18 | 96.2 | 3.8 | 38.86 | 1.15 | 97.1 | 2.9 | 96.7 | 3.3 |
样品编号 | 靶材合金 | ILS涂覆机设置 | 气体 | 厚度(埃) | XRF(微克/cm2) | Wt% | ||||||
KW | 通过次数 | 伏特 | 安培 | ILS%T | Al | Ti | Al | Ti | ||||
E1E2E3E4CE1 | Ti-50AlTi-50AlTi-30AlTi-50AlTi | 3.04.03.03.04.0 | 1020101510 | 432494490640451 | 6.988.146.144.728.86 | 91.287.591.330.588.2 | 50%O2-Ar50%O2-Ar50%O2-Ar100%N250%O2-Ar | 1142748971392 | .58.26.00 | 1.191.191.89 | 33.918.70.0 | 66.181.3100 |
样品编号 | 靶材合金 | ILS涂覆机设置 | 气体 | 厚度(埃) | XRF(微克/cm2) | Wt% | ||||||
KW | 通过次数 | 伏特 | 安培 | ILS%T | Al | Ti | Al | Ti | ||||
E6E7E8E9E10E11 | Ti-90AlTi-90AlTi-90AlTi-10AlTi-10AlTi-10Al | 444444 | 102030102030 | 419404400534536532 | 9.59.59.957.457.47.45 | 90.188.787.18881.575.2 | 80%O2/Ar80%O2/Ar80%O2/Ar80%O2/Ar80%O2/Ar80%O2/Ar | 166365583135278407 | 1.843.735.750.150.290.41 | 0.440.871.282.344.967.28 | 80.7%81.1%81.8%6.0%5.5%5.3% | 19.3%18.9%18.2%94.0%94.5%94.7% |
Ti-Al氧化物涂层用Ti-Al靶材在80%O2/Ar气体混合物中的的溅射速率(单位:埃/千瓦-次) | ||||||||||||
样品编号 | 靶材材料 | 压力μ | 通过次数 | kw | kw*次数(kwp) | 电压(伏特) | 电流(安培) | ILS%T | 厚度(埃) | wt%Al平均值 | /kwp(最小二乘方拟合) | R2 |
CE2CE3CE4 | AlAlAl | 444 | 1208040 | 111 | 1208040 | 283289285 | 3.443.363.48 | 89.489.589.9 | 422284146 | 0.00 | 354 | 0.999 |
CE5CE6CE7 | TiTiTi | 444 | 302010 | 444 | 1208040 | 493490506 | 8.067.947.9 | 74.682.588.2 | 358239136 | 1.00 | 3.01 | 0.990 |
E11E10E9E12E13E14E15 | Ti-10AlTi-10AlTi-10AlTi-10AlTi-10AlTi-10AlTi-10Al | 4444444 | 3020103020105 | 4444444 | 1208040120804020 | 532536534514539548545 | 7.457.47.457.67.367.277.31 | 75.281.5887481.88889.5 | 407278135396274121101 | 0.06 | 3.38 | 0.985 |
E16E17E18E19E20E21 | Ti-30AlTi-30AlTi-30AlTi-30AlTi-30AlTi-30Al | 444444 | 302010302010 | 444444 | 12080401208040 | 509544553601602603 | 7.87.37.26.666.656.63 | 81.285.988.980.785.288.9 | 358210123379256141 | 0.17 | 3.04 | 0.967 |
E22E23E24E25E26E27 | Ti-50AlTi-50AlTi-50AlTi-50AlTi-50AlTi-50Al | 555444 | 302010302010 | 444444 | 12080401208040 | 423460459460479477 | 9.428.658.678.738.358.36 | 84.287.589.583.686.489.1 | 38425891409314128 | 0.33 | 3.34 | 0.948 |
E8E7E6E28E29E30 | Ti-90AlTi-90AlTi-90AlTi-90AlTi-90AlTi-90Al | 444444 | 302010302010 | 444444 | 12080401208040 | 400404419392395408 | 9.959.59.59.659.719.56 | 87.188.790.186.88688.4 | 583365166600452210 | 0.80 | 4.96 | 0.967 |
样品编号 | 靶材合金 | ILS涂覆机设置 | ILS%T | 气体 | 厚度(埃) | 微克/cm2 | Wt% | |||||
KW | 通过次数 | 电压 | 电流 | |||||||||
Al | Ti | Al | Ti | |||||||||
D1D2D3D4D5D6D7D8D9D10D11D12 | Ti30AlTi30AlTi30AlTi30AlTi50AlTi50AlTi50AlTi50AlTi-90AlTi-90AlTi-90AlTi-90Al | 3.03.03.03.03.03.03.03.03.03.03.03.0 | 125101251012510 | 529529529528610609605603827827827827 | 5.725.705.725.704.944.965.005.003.183.133.153.13 | 21.38.50.00.019.17.40.00.08.82.10.00.0 | ArArArArArArArArArArArAr | 161270704130616931275615001623117561505 | 0.881.764.318.241.813.498.6616.583.266.4415.9931.02 | 4.138.4821.3142.293.566.8317.8035.170.871.694.137.85 | 17.317.116.816.333.633.832732.078.979.279.579.8 | 82.782.983.283.766.466.267.368.021.120.820.520.2 |
Ti-Al底层 | ||||||||||
样品编号 | 靶材材料 | ILS涂覆机设置 | 厚度(埃) | 薄膜电阻(欧姆/平方) | %透射率 | |||||
功率(KW) | 通过次数 | 电压(伏特) | 电流(安培) | 加热之前 | 加热之后 | ILS加热前 | TCS加热后 | |||
B1B2B3B4B5B6B7B8CB1CB2CB3CB4 | Ti-30AlTi-30AlTi-30AlTi-30AlTi-50AlTi-50AlTi-50AlTi-50AlTiTiTiTi | 0.30.60.91.20.30.60.91.20.30.60.91.2 | 111111111111 | 354390410423380426458482317340354364 | 1.321.562.202.840.821.421.982.520.961.782.563.32 | 132740531530456013253851 | 5.967.857.517.666.978.468.28.086.357.427.857.78 | ∞9.46.68.413.66.98.913.1∞7.96.58.2 | 87.079.668.560.786.274.363.755.587.380.168.859.6 | 77.0482.8483.4974.8384.7385.1680.6572.9374.5582.2879.7273.96 |
Ti-Al靶材组成分析 | 靶材制备方法 | |
Ti-Al原子% | wt%Al(余量为Ti) | |
Ti-10Al | 5.85 | HIP |
Ti-30Al | 19.2 | HIP |
Ti-50Al | 36.48 | HIP |
Ti-90Al | 16.31 | VIM |
Ti-75Al | 63.3 | 等离子体喷涂 |
表I:低辐射涂层上的Ti-Al外覆层 | ||||||||||||||
样品编号 | 外覆层 | 低辐射涂层(包括外覆层) | ||||||||||||
靶材材料 | 处理气体 | 靶材下通过次数 | 功率读数 | 厚度 | T透射率百分数 | 薄膜电阻(欧姆/平方) | 厚度(埃) | |||||||
Kw | 电压 | 电流 | () | ILS | TCS加热后 | 加热前 | 加热后 | %变化 | ZnSn氧化物层 | Ag层 | ||||
FC1 | Ti | Ar-80O2 | 4 | 2.4 | 477 | 5.00 | 32 | 83.0 | 84.27 | 8.27 | 7.94 | -3.99 | 417 | 101 |
F1F2 | Ti-10AlTi-10Al | Ar-80O2Ar-80O2 | 44 | 2.263.77 | 491518 | 4.607.30 | 2647 | 82.782.3 | 85.0382.09 | 6.878.29 | 6.228.31 | -9.460.24 | 435439 | 110101 |
F3F4F5F6F7 | Ti-30AlTi-30AlTi-30AlTi-30AlTi-30Al | Ar-80O2Ar-80O2Ar-80O2Ar-80O2Ar-80O2 | 44446 | 2.53.83.844 | 528565561575560 | 4.746.726.786.697.15 | 2646577175 | 83.382.882.383.082.0 | 85.5984.8583.584.9283.95 | 8.248.278.777.978.75 | 6.696.527.367.248.87 | -18.81-21.16-16.08-9.161.37 | 431434449411436 | 10310497101101 |
F8F9F10F11 | Ti-50AlTi 50AlTi 50AlTi-50Al | Ar-80O2Ar-80O2Ar-80O2Ar-80O2 | 4454 | 2.22.93.53.6 | 402414433436 | 5.477.008.088.26 | 34487073 | 82.982.081.982.0 | 86.4486.3386.6183.6 | 7.667.77.828.83 | 6.176.77.367.78 | -19.45-12.99-5.88-11.89 | 418353304434 | 10611410495 |
F12F13F14 | Ti 90AlTi-90AlTi 90Al | Ar-80O2Ar-80O2Ar-80O2 | 234 | 2.63.13.5 | 381373384 | 6.818.289.06 | 215070 | 82.982.181.5 | 87.385.986.51 | 7.989.077.25 | 6.267.885.78 | -21.55-13.12-20.28 | 386427403 | 10395113 |
FC2 | Ti | Ar | 1 | 0.65 | 336 | 1.93 | 31 | 47.1 | 82.44 | 7.91 | 7.05 | -10.87 | 424 | 101 |
F15 | Ti-10Al | Ar | 1 | 0.55 | 336 | 1.60 | 25 | 53.4 | 84.79 | 8.24 | 7.17 | -12.99 | 417 | 101 |
F16F17 | Ti-30AlTi-30Al | ArAr | 11 | 0.51.1 | 396458 | 1.262.4 | 2354 | 54.737.0 | 8482.42 | 8.558.79 | 7.347.94 | -14.15-9.67 | 416401 | 9493 |
F18 | Ti 50Al | Ar | 1 | 0.4 | 0.4 | 1.06 | 25 | 49.5 | 86.72 | 7.93 | 6.05 | -23.71 | 285 | 105 |
表I:低辐射涂层上的Ti-Al外覆层(续) | ||||||||||||||
样品编号 | 外覆层 | 低辐射涂层(包括外覆层) | ||||||||||||
靶材材料 | 处理气体 | 靶材下通过次数 | 功率读数 | 厚度 | 透射率百分数 | 薄膜电阻(欧姆/平方) | 厚度(埃) | |||||||
Kw | 电压 | 电流 | (埃) | ILS | TCS加热后 | 加热前 | 加热后 | %变化 | ZnSn氧化物层 | Ag层 | ||||
F19 | Ti-50Al | Ar | 1 | 0.5 | 396 | 1.26 | 35 | 47.4 | 83.3 | 8.26 | 7.01 | -15.13 | 441 | 100 |
F20F21F22 | Ti-90AlTi-90AlTi-90Al | ArArAr | 111 | 0.430.60.6 | 4520.6486 | 1.001.221.23 | 283942 | 42.030.430.8 | 84.7244.8544.3 | 8.087.968.27 | 5.83∞∞ | -27.85-- | 406405433 | 10010399 |
FC3FC4FC5 | --- | --- | 000 | 000 | 000 | 000 | 000 | 83.783.383.1 | 84.1485.0385.17 | 7.668.647.94 | 7.568.437.66 | -1.31-2.43-3.53 | 445410431 | 107102105 |
样品编号 | 靶材合金 | ILS涂覆机设置 | 气体 | 厚度测量结果(埃) | XRF(微克/cm2) | Wt%Al | |||||
KW | 通过次数 | 伏特 | 安培 | ILS%T | Al | Ti | Al | ||||
J1 | Ti-75Al | 4.0 | 5 | 339 | 11.6 | 88.6 | 80%O2-Ar | 114 | .80 | .58 | 58.0 |
J2 | Ti-75Al | 4.0 | 30 | 372 | 10.73 | 84.6 | 80%O2-Ar | 663 | 5.26 | 3.88 | 57.5 |
J3 | Ti-75Al | 3.0 | 3 | 480 | 6.26 | 85.0 | 100%N2 | 173 | 1.66 | 1.16 | 58.9 |
J4 | Ti-75Al | 3.0 | 20 | 480 | 6.26 | 73.2 | 100%N2 | 898 | 11.60 | 8.32 | 58.2 |
J5 | Ti-75Al | 3.0 | 1 | 544 | 5.51 | 13.9 | Ar | 202 | 3.34 | 2.37 | 58.5 |
J6 | Ti-75Al | 3.0 | 5 | 549 | 5.47 | 0.0 | Ar | 1064 | 17.9 | 13.0 | 57.9 |
样品编号 | 靶材合金 | ILS涂覆机设置 | 气体 | 计算的厚度 | XRF(微克/cm2) | Wt%Al | |||||
KW | 通过次数 | 伏特 | 安培 | ||||||||
ILS%T | (埃) | Al | Ti | Al | |||||||
K1K2K3K4K5K6K7 | TiTi10AlTi-30AlTi-50AlTi-75AlTi-90AlAl | 3.002.832.612.843.003.052.74 | 6654655 | 541577646560499380351 | 5.544.904.035.066.017.907.82 | 33.837.846.459.276.783.887.3 | 100%N2100%N2100%N2100%N2100%N2100%N2100%N2 | 253245223196197238186 | 0.000.401.061.652.543.693.39 | 7.987.245.133.381.780.710.00 | 0.0%5.24%17.1%32.8%58.8%83.9%100% |
K8K9K10K11K12K13K14 | TiTi10AlTi-30AlAl 50TiTi-75AlTi 90AlAl | 2.962.962.932.953.002.882.94 | 28252820161724 | 494500454428354322305 | 5.995.896.456.908.488.899.63 | 77.681.883.587.588.188.988.9 | 80%O2-Ar80%O2-Ar80%O2-Ar80%O2-Ar80%O2-Ar80%O2-Ar80%O2-Ar | 286279318238210270288 | 0.000.220.851.071.692.573.13 | 5.715.054.892.631.260.660.00 | 0.0%4.17%14.8%28.9%57.3%79.6%100% |
Claims (34)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US45881903P | 2003-03-28 | 2003-03-28 | |
US60/458,819 | 2003-03-28 | ||
PCT/US2004/009150 WO2004087985A2 (en) | 2003-03-28 | 2004-03-25 | Substrates coated with mixtures of titanium and aluminum materials, methods for making the substrates, and cathode targets of titanium and aluminum metal |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1777690A true CN1777690A (zh) | 2006-05-24 |
CN1777690B CN1777690B (zh) | 2010-11-03 |
Family
ID=33131829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200480008611.5A Expired - Lifetime CN1777690B (zh) | 2003-03-28 | 2004-03-25 | 采用钛与铝材料的混合物涂覆的衬底,制备该衬底的方法和钛与铝金属的阴极靶材 |
Country Status (10)
Country | Link |
---|---|
US (2) | US20040241490A1 (zh) |
EP (1) | EP1611265B1 (zh) |
CN (1) | CN1777690B (zh) |
AU (1) | AU2004225545B2 (zh) |
BR (1) | BRPI0408851A (zh) |
CA (1) | CA2519651C (zh) |
ES (1) | ES2627415T3 (zh) |
MX (1) | MXPA05010170A (zh) |
RU (1) | RU2335576C2 (zh) |
WO (1) | WO2004087985A2 (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101666557B (zh) * | 2008-09-01 | 2011-12-14 | 北京有色金属研究总院 | 一种非真空太阳光谱选择性吸收膜层及其制备方法 |
CN102321833A (zh) * | 2011-09-29 | 2012-01-18 | 余鹏 | 一种铝钛硅合金靶材及其制备方法 |
CN102121757B (zh) * | 2010-01-28 | 2012-09-19 | 北京有色金属研究总院 | 一种非真空太阳光谱选择性吸收涂层及其制备方法 |
CN103625026A (zh) * | 2012-08-24 | 2014-03-12 | 冯·阿德纳设备有限公司 | 反射ir的层系统的保护层,反射ir的层系统和其制造方法 |
CN103898358A (zh) * | 2012-12-27 | 2014-07-02 | 北京有色金属研究总院 | 一种钛铝硅合金镀膜材料及其制备方法 |
CN111094206A (zh) * | 2017-08-04 | 2020-05-01 | 维特罗平板玻璃有限责任公司 | 具有内嵌膜的透明导电氧化物 |
CN111132944A (zh) * | 2017-08-04 | 2020-05-08 | 维特罗平板玻璃有限责任公司 | 降低涂覆有透明导电氧化物的制品中的方块电阻的方法 |
CN111164057A (zh) * | 2017-08-04 | 2020-05-15 | 维特罗平板玻璃有限责任公司 | 功能涂层上方的保护层 |
CN112779506A (zh) * | 2019-11-08 | 2021-05-11 | 有研工程技术研究院有限公司 | 一种钛铝镁硅合金靶材及其制备方法 |
CN113679253A (zh) * | 2020-05-18 | 2021-11-23 | 佛山市顺德区美的电热电器制造有限公司 | 容器及烹饪器具 |
CN117594359A (zh) * | 2024-01-18 | 2024-02-23 | 西安稀有金属材料研究院有限公司 | 铝电解电容器阳极烧结箔及其制备方法 |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10235154B4 (de) * | 2002-08-01 | 2005-01-05 | Saint-Gobain Glass Deutschland Gmbh | Vorspannbares Schichtsystem für Glasscheiben |
JP4158646B2 (ja) * | 2003-08-06 | 2008-10-01 | トヨタ自動車株式会社 | 自動車フロントグリル及びその製造方法 |
KR100560792B1 (ko) * | 2004-03-23 | 2006-03-13 | 삼성에스디아이 주식회사 | 전면 발광 구조를 갖는 유기 전계 발광 표시 장치 및 이의제조방법 |
US8500965B2 (en) * | 2004-05-06 | 2013-08-06 | Ppg Industries Ohio, Inc. | MSVD coating process |
US7311975B2 (en) | 2004-06-25 | 2007-12-25 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. (C.R.V.C.) | Coated article having low-E coating with ion beam treated IR reflecting layer and corresponding method |
JP2008505842A (ja) | 2004-07-12 | 2008-02-28 | 日本板硝子株式会社 | 低保守コーティング |
TWM275475U (en) * | 2005-01-21 | 2005-09-11 | Ind Tech Res Inst | Mouse pad |
CN1899992A (zh) * | 2005-07-19 | 2007-01-24 | 鸿富锦精密工业(深圳)有限公司 | 模仁及其制备方法 |
US7550222B2 (en) * | 2005-10-21 | 2009-06-23 | Gm Global Technology Operations, Inc. | Fuel cell component having a durable conductive and hydrophilic coating |
AU2006203466A1 (en) * | 2006-02-21 | 2007-09-06 | Council Of Scientific & Industrial Research | An improved solar selective coating having higher thermal stability useful for harnessing solar energy and a process for the preparation thereof |
WO2007121215A1 (en) | 2006-04-11 | 2007-10-25 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
EP1980539A1 (fr) * | 2007-03-19 | 2008-10-15 | AGC Flat Glass Europe SA | Vitrage à faible emissivite |
US7820296B2 (en) | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coating technology |
EP2217865A4 (en) * | 2007-10-18 | 2014-03-05 | Alliance Sustainable Energy | SOLAR-LENS HIGH-TEMPERATURE COATINGS |
US7901781B2 (en) * | 2007-11-23 | 2011-03-08 | Agc Flat Glass North America, Inc. | Low emissivity coating with low solar heat gain coefficient, enhanced chemical and mechanical properties and method of making the same |
ES2784186T5 (es) * | 2008-03-20 | 2023-04-24 | Agc Glass Europe | Acristalamiento revestido de capas delgadas |
CN101980984B (zh) | 2008-03-20 | 2015-11-25 | 旭硝子欧洲玻璃公司 | 覆盖有薄层的玻璃 |
US10591795B2 (en) | 2009-03-31 | 2020-03-17 | View, Inc. | Counter electrode for electrochromic devices |
US11187954B2 (en) | 2009-03-31 | 2021-11-30 | View, Inc. | Electrochromic cathode materials |
US8582193B2 (en) | 2010-04-30 | 2013-11-12 | View, Inc. | Electrochromic devices |
US10156762B2 (en) | 2009-03-31 | 2018-12-18 | View, Inc. | Counter electrode for electrochromic devices |
US8432603B2 (en) | 2009-03-31 | 2013-04-30 | View, Inc. | Electrochromic devices |
US9261751B2 (en) | 2010-04-30 | 2016-02-16 | View, Inc. | Electrochromic devices |
US10261381B2 (en) | 2009-03-31 | 2019-04-16 | View, Inc. | Fabrication of low defectivity electrochromic devices |
US10852613B2 (en) | 2009-03-31 | 2020-12-01 | View, Inc. | Counter electrode material for electrochromic devices |
DE202009015334U1 (de) * | 2009-11-11 | 2010-02-25 | Almeco-Tinox Gmbh | Optisch wirksames Mehrschichtsystem für solare Absorption |
US9759975B2 (en) | 2010-04-30 | 2017-09-12 | View, Inc. | Electrochromic devices |
TWI471430B (zh) * | 2010-08-25 | 2015-02-01 | Hon Hai Prec Ind Co Ltd | 鋁合金表面防腐處理方法及其製品 |
TWI477619B (zh) * | 2010-12-29 | 2015-03-21 | Hon Hai Prec Ind Co Ltd | 硬質薄膜、具備該硬質薄膜之產品、該產品之製作方法 |
CN102514280B (zh) * | 2011-12-12 | 2015-02-04 | 武汉理工大学 | 一种太阳能选择性吸收涂层的制备方法 |
PT2791384T (pt) | 2011-12-15 | 2016-07-15 | Council Scient Ind Res | Revestimento seletivo solar melhorado tendo elevada estabilidade térmica e um processo para a sua preparação |
KR102061922B1 (ko) | 2012-02-23 | 2020-01-02 | 트레드스톤 테크놀로지스, 인크. | 전기 전도성이고 내부식성인 금속 표면 |
EP3872563A1 (en) * | 2012-05-02 | 2021-09-01 | View, Inc. | Sputter target for fabricating an electrochromic element and apparatus comprising such a sputter target |
US9126273B2 (en) | 2012-12-17 | 2015-09-08 | Kennametal Inc | Tool for the cutting machining of workpieces and process for coating substrate bodies |
DE112014001520B4 (de) | 2013-03-21 | 2023-06-15 | Kennametal Inc. | Beschichtungen für Schneidwerkzeuge |
US9371580B2 (en) * | 2013-03-21 | 2016-06-21 | Kennametal Inc. | Coated body wherein the coating scheme includes a coating layer of TiAl2O3 and method of making the same |
WO2014153440A1 (en) | 2013-03-21 | 2014-09-25 | Kennametal Inc. | Coatings for cutting tools |
CN104342624B (zh) * | 2014-03-21 | 2017-01-11 | 宁波海燕家电玻璃技术有限公司 | 一种制备耐高温黑色硼硅玻璃的方法 |
US11891327B2 (en) | 2014-05-02 | 2024-02-06 | View, Inc. | Fabrication of low defectivity electrochromic devices |
US9476115B2 (en) * | 2014-08-06 | 2016-10-25 | Council Of Scientific & Industrial Research | Multilayer solar selective coating for high temperature solar thermal applications |
CN112327556A (zh) | 2014-09-05 | 2021-02-05 | 唯景公司 | 用于电致变色装置的反电极 |
US9719175B2 (en) | 2014-09-30 | 2017-08-01 | Kennametal Inc. | Multilayer structured coatings for cutting tools |
CN107111197A (zh) | 2014-11-26 | 2017-08-29 | 唯景公司 | 用于电致变色装置的对电极 |
US10539726B2 (en) * | 2015-09-01 | 2020-01-21 | Vitro Flat Glass Llc | Solar control coating with enhanced solar control performance |
WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
CN111778477B (zh) * | 2020-06-17 | 2022-09-20 | 富联裕展科技(深圳)有限公司 | 镀膜件、电子设备及镀膜件的制造方法 |
RU2765966C1 (ru) * | 2021-11-29 | 2022-02-07 | Дмитрий Юрьевич Старцев | Способ нанесения алюминия на стеклянные изделия |
RU2765964C1 (ru) * | 2021-11-29 | 2022-02-07 | Дмитрий Юрьевич Старцев | Способы нанесения на стеклянные изделия покрытий из оксида титана |
US20230404764A1 (en) * | 2022-06-14 | 2023-12-21 | Orchid Orthopedic Solutions, Llc | Medical Implant and Related Methods |
Family Cites Families (59)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3660361A (en) * | 1970-09-28 | 1972-05-02 | Monsanto Co | Highly ordered azo-aromatic polyamides |
US4055407A (en) * | 1976-11-01 | 1977-10-25 | Ppg Industries, Inc. | Apparatus for the manufacture of flat glass having a glass refractory delivery piece and method of installation |
US4111150A (en) * | 1977-03-28 | 1978-09-05 | Ppg Industries, Inc. | Apparatus for coating an advancing substrate |
US4320155A (en) * | 1978-01-03 | 1982-03-16 | Ppg Industries, Inc. | Method for coating an article to alternately reflect and absorb solar energy |
US4379049A (en) * | 1981-07-08 | 1983-04-05 | Bassett Leo H | Fine material screw washer |
US4466562A (en) * | 1981-12-15 | 1984-08-21 | Ppg Industries, Inc. | Method of and apparatus for severing a glass sheet |
US4719127A (en) * | 1983-02-02 | 1988-01-12 | Ppg Industries, Inc. | Aqueous chemical suspension for pyrolytic deposition of metal-containing film |
US4719126A (en) * | 1983-02-02 | 1988-01-12 | Ppg Industries, Inc. | Pyrolytic deposition of metal oxide film from aqueous suspension |
US4971843A (en) * | 1983-07-29 | 1990-11-20 | Ppg Industries, Inc. | Non-iridescent infrared-reflecting coated glass |
US4594137A (en) * | 1983-09-09 | 1986-06-10 | Ppg Industries, Inc. | Stainless steel overcoat for sputtered films |
US4512863A (en) * | 1983-09-09 | 1985-04-23 | Ppg Industries, Inc. | Stainless steel primer for sputtered films |
US4610771A (en) * | 1984-10-29 | 1986-09-09 | Ppg Industries, Inc. | Sputtered films of metal alloy oxides and method of preparation thereof |
US4716086A (en) * | 1984-12-19 | 1987-12-29 | Ppg Industries, Inc. | Protective overcoat for low emissivity coated article |
US4671155A (en) * | 1985-06-13 | 1987-06-09 | Ppg Industries, Inc. | Positioning apparatus |
US4786563A (en) * | 1985-12-23 | 1988-11-22 | Ppg Industries, Inc. | Protective coating for low emissivity coated articles |
US4746347A (en) * | 1987-01-02 | 1988-05-24 | Ppg Industries, Inc. | Patterned float glass method |
US4938857A (en) * | 1987-03-26 | 1990-07-03 | Ppg Industries, Inc. | Method for making colored metal alloy/oxynitride coatings |
US4920006A (en) * | 1987-03-26 | 1990-04-24 | Ppg Industries, Inc. | Colored metal alloy/oxynitride coatings |
US4861669A (en) * | 1987-03-26 | 1989-08-29 | Ppg Industries, Inc. | Sputtered titanium oxynitride films |
US4900633A (en) * | 1987-03-26 | 1990-02-13 | Ppg Industries, Inc. | High performance multilayer coatings |
US4792536A (en) * | 1987-06-29 | 1988-12-20 | Ppg Industries, Inc. | Transparent infrared absorbing glass and method of making |
US4853257A (en) * | 1987-09-30 | 1989-08-01 | Ppg Industries, Inc. | Chemical vapor deposition of tin oxide on float glass in the tin bath |
US4849081A (en) * | 1988-06-22 | 1989-07-18 | The Boc Group, Inc. | Formation of oxide films by reactive sputtering |
GB8900165D0 (en) * | 1989-01-05 | 1989-03-01 | Glaverbel | Glass coating |
DE3902596A1 (de) * | 1989-01-28 | 1990-08-02 | Flachglas Ag | Verfahren zum herstellen einer vorgespannten oder gebogenen glasscheibe mit rueckseitiger beschichtung, danach hergestellte glasscheibe sowie deren verwendung |
DE3906453A1 (de) * | 1989-03-01 | 1990-09-06 | Leybold Ag | Verfahren zum beschichten von substraten aus durchscheinendem werkstoff, beispielsweise aus floatglas |
US5170291A (en) * | 1989-12-19 | 1992-12-08 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating |
US5328768A (en) * | 1990-04-03 | 1994-07-12 | Ppg Industries, Inc. | Durable water repellant glass surface |
JPH0453202A (ja) * | 1990-06-20 | 1992-02-20 | Oki Electric Ind Co Ltd | 発熱抵抗体 |
US5240886A (en) * | 1990-07-30 | 1993-08-31 | Ppg Industries, Inc. | Ultraviolet absorbing, green tinted glass |
US5393593A (en) * | 1990-10-25 | 1995-02-28 | Ppg Industries, Inc. | Dark gray, infrared absorbing glass composition and coated glass for privacy glazing |
US5320729A (en) * | 1991-07-19 | 1994-06-14 | Hitachi, Ltd. | Sputtering target |
US5417827A (en) * | 1991-11-29 | 1995-05-23 | Ppg Industries, Inc. | Cathode targets of silicon and transition metal |
US5342571A (en) * | 1992-02-19 | 1994-08-30 | Tosoh Smd, Inc. | Method for producing sputtering target for deposition of titanium, aluminum and nitrogen coatings, sputtering target made thereby, and method of sputtering with said targets |
US5296302A (en) * | 1992-03-27 | 1994-03-22 | Cardinal Ig Company | Abrasion-resistant overcoat for coated substrates |
US5344718A (en) * | 1992-04-30 | 1994-09-06 | Guardian Industries Corp. | High performance, durable, low-E glass |
DE69320913T2 (de) * | 1992-11-09 | 1999-03-11 | Central Glass Co Ltd | Glasplatte mit einem ultraviolett absorbierenden mehrschichtigen Überzug |
US5599387A (en) * | 1993-02-16 | 1997-02-04 | Ppg Industries, Inc. | Compounds and compositions for coating glass with silicon oxide |
US5356718A (en) * | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
JPH06322530A (ja) * | 1993-05-10 | 1994-11-22 | Vacuum Metallurgical Co Ltd | スパッタリング用ターゲット |
US5376455A (en) * | 1993-10-05 | 1994-12-27 | Guardian Industries Corp. | Heat-treatment convertible coated glass and method of converting same |
US5616225A (en) * | 1994-03-23 | 1997-04-01 | The Boc Group, Inc. | Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
US5492750A (en) * | 1994-09-26 | 1996-02-20 | Ppg Industries, Inc. | Mask for coated glass |
CN1134032A (zh) * | 1995-03-23 | 1996-10-23 | 美国Boc氧气集团有限公司 | 为改善磁控管内等离子体均匀度的多个阳极的使用 |
US5532180A (en) * | 1995-06-02 | 1996-07-02 | Ois Optical Imaging Systems, Inc. | Method of fabricating a TFT with reduced channel length |
WO1997008357A1 (en) * | 1995-08-30 | 1997-03-06 | Nashua Corporation | Anti-reflective coating |
JP3863932B2 (ja) * | 1995-10-02 | 2006-12-27 | 三井金属鉱業株式会社 | 分割ターゲットを用いたマグネトロンスパッタリング方法 |
FR2747611B1 (fr) * | 1996-04-23 | 1998-07-10 | Conte Sa | Reservoir tampon pour article d'ecriture a encre liquide et article d'ecriture comportant un tel reservoir |
US6027766A (en) * | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
US6007901A (en) * | 1997-12-04 | 1999-12-28 | Cpfilms, Inc. | Heat reflecting fenestration products with color corrective and corrosion protective layers |
ES2243093T3 (es) * | 1998-12-18 | 2005-11-16 | Glaverbel | Panel de acristalmiento. |
JP2000214303A (ja) * | 1999-01-21 | 2000-08-04 | Olympus Optical Co Ltd | 反射防止膜等の光学薄膜及びその製造方法 |
JP3084402B1 (ja) * | 1999-04-14 | 2000-09-04 | 工業技術院長 | AlTi系合金スパッタリングターゲット及び耐摩耗性AlTi系合金硬質皮膜並びに同皮膜の形成方法 |
GB9910842D0 (en) * | 1999-05-10 | 1999-07-07 | Univ Nanyang | Composite coatings |
US6042777A (en) * | 1999-08-03 | 2000-03-28 | Sony Corporation | Manufacturing of high density intermetallic sputter targets |
US20020136905A1 (en) * | 1999-11-24 | 2002-09-26 | Medwick Paul A. | Low shading coefficient and low emissivity coatings and coated articles |
CN1370853A (zh) * | 2001-02-23 | 2002-09-25 | 光洋应用材料科技股份有限公司 | 金属溅镀靶材的制造方法 |
JP2005529239A (ja) * | 2002-06-07 | 2005-09-29 | ヘラエウス インコーポレーテッド | 処理従順な金属間化合物スパッタリングターゲットの製造方法 |
DE10235154B4 (de) * | 2002-08-01 | 2005-01-05 | Saint-Gobain Glass Deutschland Gmbh | Vorspannbares Schichtsystem für Glasscheiben |
-
2004
- 2004-03-25 CA CA2519651A patent/CA2519651C/en not_active Expired - Fee Related
- 2004-03-25 RU RU2005133184/02A patent/RU2335576C2/ru active
- 2004-03-25 EP EP04758328.1A patent/EP1611265B1/en not_active Expired - Lifetime
- 2004-03-25 ES ES04758328.1T patent/ES2627415T3/es not_active Expired - Lifetime
- 2004-03-25 BR BRPI0408851-4A patent/BRPI0408851A/pt not_active IP Right Cessation
- 2004-03-25 CN CN200480008611.5A patent/CN1777690B/zh not_active Expired - Lifetime
- 2004-03-25 WO PCT/US2004/009150 patent/WO2004087985A2/en active Application Filing
- 2004-03-25 MX MXPA05010170A patent/MXPA05010170A/es active IP Right Grant
- 2004-03-25 US US10/809,770 patent/US20040241490A1/en not_active Abandoned
- 2004-03-25 AU AU2004225545A patent/AU2004225545B2/en not_active Ceased
-
2007
- 2007-02-14 US US11/706,454 patent/US8597474B2/en active Active
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101666557B (zh) * | 2008-09-01 | 2011-12-14 | 北京有色金属研究总院 | 一种非真空太阳光谱选择性吸收膜层及其制备方法 |
CN102121757B (zh) * | 2010-01-28 | 2012-09-19 | 北京有色金属研究总院 | 一种非真空太阳光谱选择性吸收涂层及其制备方法 |
CN102321833A (zh) * | 2011-09-29 | 2012-01-18 | 余鹏 | 一种铝钛硅合金靶材及其制备方法 |
CN103625026A (zh) * | 2012-08-24 | 2014-03-12 | 冯·阿德纳设备有限公司 | 反射ir的层系统的保护层,反射ir的层系统和其制造方法 |
CN103898358A (zh) * | 2012-12-27 | 2014-07-02 | 北京有色金属研究总院 | 一种钛铝硅合金镀膜材料及其制备方法 |
CN111094206A (zh) * | 2017-08-04 | 2020-05-01 | 维特罗平板玻璃有限责任公司 | 具有内嵌膜的透明导电氧化物 |
CN111132944A (zh) * | 2017-08-04 | 2020-05-08 | 维特罗平板玻璃有限责任公司 | 降低涂覆有透明导电氧化物的制品中的方块电阻的方法 |
CN111164057A (zh) * | 2017-08-04 | 2020-05-15 | 维特罗平板玻璃有限责任公司 | 功能涂层上方的保护层 |
CN111094206B (zh) * | 2017-08-04 | 2022-08-19 | 维特罗平板玻璃有限责任公司 | 具有内嵌膜的透明导电氧化物 |
CN112779506A (zh) * | 2019-11-08 | 2021-05-11 | 有研工程技术研究院有限公司 | 一种钛铝镁硅合金靶材及其制备方法 |
CN113679253A (zh) * | 2020-05-18 | 2021-11-23 | 佛山市顺德区美的电热电器制造有限公司 | 容器及烹饪器具 |
CN117594359A (zh) * | 2024-01-18 | 2024-02-23 | 西安稀有金属材料研究院有限公司 | 铝电解电容器阳极烧结箔及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2004087985A2 (en) | 2004-10-14 |
US20070231501A1 (en) | 2007-10-04 |
ES2627415T3 (es) | 2017-07-28 |
EP1611265B1 (en) | 2017-05-03 |
EP1611265A2 (en) | 2006-01-04 |
CA2519651A1 (en) | 2004-10-14 |
RU2005133184A (ru) | 2006-02-27 |
WO2004087985A3 (en) | 2005-01-20 |
MXPA05010170A (es) | 2005-11-08 |
RU2335576C2 (ru) | 2008-10-10 |
BRPI0408851A (pt) | 2006-04-04 |
US20040241490A1 (en) | 2004-12-02 |
US8597474B2 (en) | 2013-12-03 |
CA2519651C (en) | 2013-07-02 |
AU2004225545B2 (en) | 2008-08-14 |
CN1777690B (zh) | 2010-11-03 |
AU2004225545A1 (en) | 2004-10-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1777690A (zh) | 采用钛与铝材料的混合物涂覆的衬底,制备该衬底的方法和钛与铝金属的阴极靶材 | |
CN1111140C (zh) | 带涂层的制品 | |
CN1145551C (zh) | 层叠体及其制造方法 | |
CN1256461C (zh) | Ag基合金薄膜及Ag基合金薄膜形成用溅射靶 | |
JP6639101B2 (ja) | 耐引掻性膜、耐引掻性膜を有する基材及びその製造法 | |
CN1100812A (zh) | 低热辐射系数控制阳光的耐用薄膜覆盖层 | |
CN1304626C (zh) | 硬质被膜及硬质被膜被覆工具 | |
US9051211B2 (en) | Effects of methods of manufacturing sputtering targets on characteristics of coatings | |
CN1217344C (zh) | 透明导电层叠片、及其制造方法和采用透明导电层叠片的显示器件 | |
CN1142469A (zh) | 能热处理的、耐久的、红外反射的溅射镀膜玻璃及其制造方法 | |
CN1209489C (zh) | 锌锡合金溅射靶 | |
CN1078219A (zh) | 高性能和耐久的低辐射率玻璃及其制造方法 | |
CN1195694C (zh) | 涂覆的玻璃基体及其制法、用途 | |
CN1365344A (zh) | 制造低浑浊度涂层的方法及用该方法制造的涂层和涂装制品 | |
CN1111217A (zh) | 热处理可转变的镀膜玻璃及其转变方法 | |
CN101038796A (zh) | 氧化物烧结体、其制造方法、用它制造透明导电膜的方法以及所得的透明导电膜 | |
CN1867522A (zh) | 包括抗反射涂层的透明基材 | |
JP5527415B2 (ja) | 被覆工具 | |
CN101415652A (zh) | 用于透明基材的高度耐热的具有低发射性多层体系 | |
CN101044579A (zh) | 透明导电性层压体及透明触摸屏 | |
CN1950307A (zh) | 具有光催化涂层的基材 | |
CN1474881A (zh) | 具有光催化涂层的底材 | |
CN1074424A (zh) | 改进了的可热处理溅射镀膜玻璃层系 | |
CN1121537A (zh) | 涂敷的硬质合金刀具件 | |
EA039602B1 (ru) | Стеклянная панель с покрытием |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170315 Address after: Nuevo Leon, Mexico Patentee after: VITRO, S.A.B. DE C.V. Address before: Ohio, USA Patentee before: PPG INDUSTRIES OHIO, Inc. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20191113 Address after: Pennsylvania, USA Patentee after: VITRO, S.A.B. de C.V. Address before: Nuevo Leon, Mexico Patentee before: VITRO, S.A.B. DE C.V. |
|
CX01 | Expiry of patent term |
Granted publication date: 20101103 |