CN1879062A - Illumination system for a microlithography projection exposure installation - Google Patents

Abstract

An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.

Description

The illuminator that is used for microlithographic projection exposure apparatus

Technical field

The present invention relates to be used for the illuminator of micro-lithography (Microlithography) projection exposure system therefor, be used to be used to illumination field of optical illumination from original light source.

Background technology

The efficient that is used for the projection exposure system therefor that the micro-lithography of semiconductor device and other fine structure parts produces is basically by the imaging character decision of projection objective.And then picture quality and the chip yield of utilizing this system to realize are also determined by the character of the updrift side illuminator that is arranged in projection objective basically.This must generate, and (for example, lasing light emitter) light has the efficient of maximum possible, and in this process, can produce the most uniform intensity distributions in the illumination field of illuminator from original light source.And, should be able to set the various light illumination mode (setting) of illuminator, thereby for example can optimize illumination according to the structure (for example, the reticle mask on mask (reticles)) of each figure of imaging.Normally used is to have may be provided with and toroidal field illumination and dipole or quadrupole illuminating between different routine settings of various different degree of coherence.Can also use the unconventional illumination setting, particularly interference that are used to produce from the oblique illumination of axle can increase depth of focus, and can improve resolution by means of twin-beam.

EP0747771 has described a kind of illuminator, and it has a zoom-axial cone body (zoom-axicon) object lens, arranges first defraction grating device with cross grating structure in its object plane.Use this optical grating element to increase by how much leaded light valves (or extendue) of incidenting laser radiation slightly and change photodistributed form, distribute so that said result for example is near round shape distribution, annular spread or quadrapole.In order to change between these light illumination modes, first optical grating element can exchange change.Second optical grating element is positioned in the emergent pupil of object lens, by corresponding light said second optical grating element that throws light on that distributes, second optical grating element forms a rectangular light and distributes, and the form of this distribution is corresponding to the incidence surface of subsequently shaft-like smooth hybrid element.By means of the adjusting of zoom-axial cone body, can regulate the annular degree of illumination and the size in illuminated zone.

EP1109067 (corresponding to US2001001247) has described a kind of illuminator, and a modifier wherein is provided, and the change that is used for choosing wantonly is at the different diffraction optical element of illuminator light path.Change diffraction optical element by exchange, can set various light illumination mode.The management of this system does not need to use zoom-axial cone phantom piece.

For example in patent US5638211, EP500393B1 (corresponding to US5305054), US6252647 or US6211944, express other the known possibility that realizes off-axis illumination.

Operate so that set the illuminator of different light illumination modes for utilizing exchange to change optical element (for example diffraction optical element or spatial filter), the number that different illuminations are provided with is subjected to the limited in number of different changed elements.Suitable modifier structurally may be complicated.

DE19944760A1 discloses a kind of lighting device that is used for printed panel, can modulate illumination intensity in integrated digital screen imaging process (IDSI).In this case, light from light source falls to the digital photomodulator of the cell array with a bidimensional, can be through the cell array of computer-controlled system incentive or the said bidimensional of de-energisation, thereby make a specific figure deflect into photosensitive substrate, said substrate is moved with respect to photomodulator.In one embodiment, photomodulator comprises that (digital reflector apparatus, DMD), micro mirror device has a large amount of catoptrons that can individual drive to a micro mirror device.During printing, make those mirror tilts that are not used in the exposure photochromics, so that the light beam that drops on above them deflects, leave photochromics.So, just can change the number of the single catoptron that in exposure, uses by means of control system.WO00/36470 discloses similar system.

Summary of the invention

So, an object of the present invention is to provide a kind of illuminator that is used for the microlithographic projection exposure system, it utilizes simple structure just can obtain huge changeability in the middle of setting different light illumination modes.

For realizing this project, the invention provides a kind of illuminator with feature of claim 1.Stipulated useful development in the dependent claims.The wording that all authority requires has been introduced in reference in the content of instructions.

Have an optical axis and a light distributor according to illuminator of the present invention, the light distributor is used to receive from the light of original light source and is used to produce the intensity distributions of two-dimensional space, and the intensity distributions of said two-dimensional space can be provided with in the pupil profiled surface of illuminator changeably.The light distributor has at least one optic modulating device, is used for controllably changing the angular distribution of the radiation of incident on optic modulating device.But optic modulating device can comprise an array of each element of individual drive, and said these each elements can be realized the angle of radiation or the specific change of angular spectrum under their each situation of installation site location.Said optic modulating device is also specified the optic modulating device of a localized variation, because the scope that angle changes can be set at the function of position.Said array is bidimensional preferably, for example has a plurality of row and columns of discrete component.In this case, preferably drive said each element, so that in the light illumination mode of all settings, all light intensities that are incident on the optic modulating device all deflect into the Free Region of pupil profiled surface, so can make contributions for the illumination of illumination field.So by means of optic modulating device, that can realize light intensity relevant with the position redistribute and can " not abandon " incident light.Therefore, different light illumination modes, in principle do not have big loss, variable setting can realize.

Make its possible outcome that enters the presumptive area of pupil profiled surface especially as fraction, can set in fact any desired illumination intensity distribution at the pupil profiled surface according to deflection of the present invention light of incident on optic modulating device.These illumination intensity distribution for example comprise: circular distribution, as the illumination spot of the circular that concentrates near the different-diameter the optical axis under the situation is set in routine illumination, and the abaxile illumination under unconventional situation, ring illumination and polar intensity distribution, for example dipole illumination or quadrupole illuminating.Yet for according to illuminator of the present invention, different therewith intensity distributions also is possible, for example surpasses the multipole illumination of four utmost points, throws light on as sextupole.Illumination profile not necessarily leaves no choice but have the symmetry with respect to optical axis.

In the illuminator that in the microlithographic projection exposure system, comprises, exist the pupil profiled surface of the illuminator that desired intensity distributes to be positioned at position with the pupil plane optical conjugate of following projection objective, perhaps in its vicinity.In the ordinary course of things, the pupil profiled surface can be corresponding to the pupil surface of illuminator, perhaps be positioned at it near.If the operation of the optical element that inserts can be kept angle (angle holding element), just can determine the space distribution of the light in the pupil of projection objective by the space distribution (position distribution) of the light in the pupil profiled surface of illuminator.If illuminator for example comprises a fly's eye condenser as light hybrid element (light integrators), just the pupil profiled surface can be positioned at it light incident side near, perhaps overlap with its light incident side.Comprise in system under the situation of the one or more bar-shaped light integrators (bar type integrator) that utilizes the internal reflection operation, the pupil profiled surface can be the plane of the process Fourier transform relevant with the incidence surface of light integrators, perhaps can be positioned at this plane near.Said system can also be the system that does not wherein have any above-described regular light hybrid element.If suitable, can realize the homogenising of intensity distributions by the suitable stack of prism etc. here, by means of segment beam.

Should interpreted in its broadest sense, ie according to the term under the application's meaning " radiation " and " light ", particularly, be intended to cover electromagnetic radiation from ultraviolet range according to the term under the application's meaning " radiation " and " light ", for example wavelength is about the electromagnetic radiation of 365 nanometers, 248 nanometers, 193 nanometers, 157 nanometers or 126 nanometers.Also will cover the electromagnetic radiation from extreme ultraviolet scope (EUV), for example wavelength is less than the soft x ray of 20 nanometers.

In a kind of development plan, optic modulating device is formed the mirror apparatus of an array with each reflective mirror, can control each reflective mirror individually, be incident on the angular distribution of the radiation on the mirror apparatus with change.Can be used to form each reflective mirror of each element of optic modulating device according to the raster mode arrangement of array one dimension or bidimensional.According to another development plan, optic modulating device is formed the electrical-optical element, said electrical-optical element preferably includes a respective array of the one dimension of a controlled diffraction grating or field device of bidimensional (array) or sound-optical element.All introduce the special angle or the angular spectrum of radiation output in the position of said optical grating element with in the form arrangement of grating and these each elements that therefore be designated as optical grating element each, with this rule as the beam deflection of incident radiation, in other words, introduced the variation of the direction of propagation.For example the electricity by means of each element drives, and just can set the angular distribution of radiation output according to variable mode.

Space between optic modulating device and pupil profiled surface can not have optical element, as lens or other image-forming component.In this case, the useful practice is that the distance between selective light modulating device and the pupil profiled surface is so that this distance is so big, so that the pupil profiled surface is positioned at the far-field region of optic modulating device.In these cases, can in the pupil profiled surface, automatically set up the spatial intensity distribution of expectation.

In a kind of development plan, between optic modulating device and pupil profiled surface, provide an optical system, the angular distribution that is used for changing input is the space distribution (in the position spatial distributions) of pupil profiled surface.The purpose of this optical system is to realize the Fourier transform of angular distribution to the pupil profiled surface.In this case, this optical system can be single optical element, for example, has the lens that therefore fixed focal length has definite amplification coefficient.The focal length that is used for the optical system of Fourier transform preferably can be provided with changeably.Said optical system configurations can be become a varifocus objective.As a result, utilize the illumination profile of appointment, just can set the size in the zone that available this illumination profile in the pupil profiled surface illuminates, preferably carry out continuous setting.If the body of the axial cone with conical surface is provided,, just can set the level of hope of the toroidal field characteristic (annular) of (if suitable, then be to set continuously) said illumination by the regulating shaft pyramidal system between light distributor and pupil profiled surface.In one embodiment, can arrange a zoom-axial cone body object lens between optic modulating device and pupil profiled surface, the structure example of this zoom-axial cone body object lens is as can be corresponding to the structure of the zoom of describing in EP0747772-axial cone body object lens.In this case, can use optic modulating device to replace first defraction grating device of expression there.The disclosure of EP0747772 has been quoted in reference in the content of this instructions.

Optic modulating device can be operated according to the reflection mode, and can make said optic modulating device with respect to inclined light shaft, so that normal deflection reflective mirror for example can realize on average being about the deflection (the perhaps littler or bigger deflection of angle) of 90 degree.

For the function at the optics of the illuminator of pupil profiled surface back, the useful in the ordinary course of things practice is to make the angle that is incident on the radiation ray in the pupil profiled surface as far as possible little.For this purpose, in a preferred embodiment, provide measure with optical range between selective light modulating device and the pupil profiled surface, it is so big making said optical range, so that about the angle between the light beam of the described angular distribution in optical axis and the zone at the pupil profiled surface is less than 5 degree, especially less than about 3 degree.Angle Selection more little, said angular distribution just may be precipitous more, for example, is exactly this situation for the side of the bright/dark zone of transition between surround and adjacent non-surround.

The specific setting of the various multi-form fine segmentation in a zone of the pupil profiled surface that throws light on may have very big benefit, and be especially all the more so in using the system of one or more fly's eye condensers as the light hybrid element.In more such systems, well-knownly be, only at each radiation channel that forms by " honeycomb " or use fully or complete no condition under, just may be in the desired smooth intensity distributions of downstream direction realization of fly's eye condenser (honeycomb condenser).On the other hand, the radiation from a unique radiation channel that partly uses just will destroy whole homogeneity.For this reason, conventional system utilizes mask to operate, and for example is used to be blocked in the passage of the partial illumination at edge, surround.This may cause optical loss.

In embodiments of the invention with at least one fly's eye condenser, pupil profiled surface wherein is usually located in the zone of incidence surface of fly's eye condenser, perhaps with the surface of its light conjugation in, on the other hand, may control or be provided with for the spatial intensity distribution in the pupil profiled surface, so that the passage (or honeycomb) that only has illumination fully and do not throw light on fully specifically, and can avoid occurring " honeycomb " of partial illumination.Therefore, might no longer need to use the aperture diaphragm that blocks each passage.So, utilize the structure of simplifying, will make the illumination control that does not have loss to a large extent become possibility.

For this reason, in one embodiment, the light distributor has at least one diffraction optical element, said diffraction optical element optically is arranged between optic modulating device and the pupil profiled surface, be used to receive the light that optic modulating device sends, and be used for revising said light by introducing an angular distribution according to action function, said action function is to be determined by the configuration of diffraction optical element.Because this structure, the angular distribution of the light that is produced by optic modulating device optically takes place folding with the angular distribution that is produced by diffraction optical element in the light far-end field.

Action function can be such: by diffraction optical element can shaping from the light beam of a discrete component outgoing of optic modulating device, make it can be consistent with the shape and the size of a single optical channel of fly's eye condenser or one group of adjacent light passage.Specifically, the diffraction structure of diffraction optical element can be such: can produce a rectangular illumination field from the light beam of the single optical element outgoing of optic modulating device.Can determine the size of rectangular shape, it is conformed to a single optical channel of fly's eye condenser.In a further embodiment, can determine the size of field of illumination, make it cover one group of adjacent optical channel.

According to an embodiment, said diffraction optical element is the hologram (CGH) with computing machine generation of diffraction structure, and the hologram that said computing machine produces can repeat to pass the xsect of diffraction optical element periodically.

If use the mirror apparatus of optic modulating device, then just can determine minimum dimension usually basically by the irradiating surface of each reflective mirror generation of mirror apparatus by the size of each reflective mirror (for example can be the reflective mirror on plane).Might reduce the minimum dimension of the luminous point that produced by each reflective mirror, said reflective mirror is not that the reflective mirror as the plane forms but forms as the crooked reflective mirror with limited reflective mirror focal length.Can determine the size of focal length, so that the radiation of incident can be incided on the pupil profiled surface with the form that focuses on basically on each reflective mirror.As a result, the very different setting of the various spatial intensity distribution on the pupil profiled surface all may exist.

Each reflective mirror of mirror apparatus all can be of similar shape and size, and this may be useful for making.Each reflective mirror also may comprise one first reflective mirror group and at least one second reflective mirror group, each reflective mirror group has one or more single reflective mirrors, and each reflective mirror of reflective mirror group may be of different sizes and/or different shape and/or different curvature.For example, if change the size of each reflective mirror, so, this situation just can be used for cutting apart task along each reflective mirror of mirror apparatus.For example, have the luminous point that is produced that each reflective mirror of larger area can produce larger proportion, and each less reflective mirror can produce photodistributed fine structure.

Usually, under each situation, each reflective mirror can be considered as having specific photodistributed substantially generation device, then, produce the light distribution by making and be movable relative to each other each specific basic light distribution of combination so that in the pupil profiled surface, form the distribution of expectation.For example, by around at least one sloping shaft each reflective mirror that suitably tilts, just can be in variation that in the pupil profiled surface, realizes angular distribution and thereby the displacement of realization luminous point.

Can obtain bigger degree of freedom by some single reflective mirror at least in the middle of the generation of spatial light distribution, these single reflective mirrors have diffractive optical structure or have and can utilize analogous effect to form the structure that distributes from single reflective mirror radiation reflected.As a result, feasible " the basic distribution " that is produced by this single reflective mirror carried out shaping in itself.For example, design for a single reflective mirror, make it can produce basic a distribution, this distribution can be made up of a plurality of luminous points, but these luminous points need not to be continuous.

Each reflective mirror of mirror apparatus preferably directly is bonded with each other, make they can form have a plurality of facets, sealing, continuous reflecting surface basically.For the ease of each reflective mirror that relatively moves adjacent, the useful practice can be, has little distance or gap between each reflective mirror, and they cause narrow non-reflexive zone.Specifically, for more such embodiment, the useful practice is at optical devices of the place ahead of mirror apparatus arrangement, the radiation that is incident on the optical devices to be concentrated on each reflective mirror of mirror apparatus.Said optical devices can be the mounting for gratings of a bidimensional of optical element, or a diffraction optics array generator.In this way, can guide for example light into each reflective mirror with the form that focuses on, the reflection loss on the mirror apparatus can be reduced to minimum value whereby from a laser instrument incident.

The cross grating device for example can comprise a two-dimensional array with telescopic lenses system, preferably it is arranged in the beam path that obtains to a great extent collimating of updrift side of mirror apparatus.Between the optical element of mounting for grating and each reflective mirror subsequently, can there be 1: 1 relevance.

Specifically, consider each reflective mirror of difformity and/or size again, the similar useful practice can be to design the single optical element of mounting for grating by different modes.For example, if focus on zone from the different sizes of the angle pencil of ray of light source, just can realize the variation of luminous energy on each reflective mirror of mirror apparatus to form the light beam of aiming at single reflective mirror.In this way, can change single photodistributed substantially emittance content.By means of at the updrift side of cross grating device and/or a suitable transmission-type wave filter of downstream direction, also can reach comparable effect, but optical loss must be admissible.

If use the diffraction optics array generator, then can realize the conversion of a plurality of light beams of a light beam to each optical element that concentrates on the array type optical modulating device, optical element wherein has simple structure.For example, (author is N.Streibl " to utilize the optical array generator to carry out beam shaping " at document, J.Mod., optics 36 (1989), 1559-1573 page or leaf) in the optical array generator that is suitable for producing from incident flux a series of luminous fluxes that separate has been described.In one embodiment, used an optical array generator, this optical array generator is designed to so-called " red graceful (Dammann) grating ".In article " by means of the repeatedly imaging of efficient parallel of heterogeneous hologram " (H.Dammann, K.G  rtler work, optical communication (3) (1971), 312-315 page or leaf), such efficient heterogeneous hologram has been described.Use the optical array generator light to be concentrated on each element of array type optic modulating device, can obtain high efficient (low optical loss) with low cost.

For the structure and/or the type of drive of the single reflective mirror of mirror apparatus, the known concept of the prior art of may must seeking help.May carry out with reference to definite size at the change that the illuminator of correspondence is carried out.Mirror apparatus (said mirror apparatus also often is designed to digital reflective mirror array (DMD)) with each reflective mirror that can individual drive is for example from being used for mask-free photolithography (for example referring to US5523193; US5691541; US5870176; US6060224) open in the system.

Use some measure of output radiation that is used for disposing of the example explanation of each reflective mirror or in sound-optical element, to obtain identical effect at electrical-optical element with controlled diffraction optical element by the optic modulating device generation.These measures comprise: the discrete component that can tilt relative to one another, can be by means of the basic distribution of suitable each arrangements of components influence from the light of each element output, thus perhaps provide optical element so that incident radiation focused on the measure that can use controlled diffraction grating or sound-optical element on each element that the angle of the updrift side that is positioned at corresponding optic modulating device changes effectively.

Specifically, at the embodiment of the illuminator that is used for micro-lithography, the useful practice is to use a light mixing arrangement in illuminator, so that realize the uniformity consistency to a high-caliber illumination of illumination field.In according to illuminator of the present invention, can use light mixing arrangement and have one or more integrator rod or the light mixing arrangement of optical mixing rod or their both combinations with fly's eye condenser.Such two kinds of light mixing arrangements can be respectively utilize in refraction type design (the fly's eye condenser with lens element, the integrator rod of being made by transparent material) and reflective design (have the fly's eye condenser of concave mirror, have the hollow stick of internal reflection).

The invention still further relates to the method that is used to from an illumination field of optical illumination of original light source, said illumination field is exactly the object plane of a microlithography projection objective or a plane of conjugation with it specifically.Said means of illumination comprises: change the angular distribution that is incident on the light in the illumination field in the light path between light source and illumination field.Said change is to be caused by the light from original light source, said light is drawn towards an optic modulating device, said optic modulating device has at least two discrete components that irrelevant each other change can take place, and these discrete components can carry out suitable setting with being relative to each other.Said this set for example can comprise: at least one discrete component is tilted with respect to another discrete component around one or more sloping shafts, perhaps change the diffraction property of diffraction element.As a result, depend on being oppositely arranged of discrete component in the angular distribution of the light of the downstream direction of optic modulating device, and, the angular distribution of said light is converted to the angular distribution of the light that is incident on the illumination field by means of optical element subsequently.Light by optic modulating device output preferably has the light beam of Duoing significantly than two light beams that can irrespectively be provided with each other, for example as for 10 or at least 50 or at least 100 light beams that can irrespectively be provided with each other.

Above-mentioned feature and additional features come from instructions, accompanying drawing and claims; in an embodiment of the present invention and in other field; all may implement each feature voluntarily in each case; perhaps implement a plurality of features, and can represent useful and embodiment that can be protected in essence according to the sub-portfolio form.

Description of drawings

Fig. 1 represents to be used for the synoptic diagram of an embodiment of an illuminator of microlithographic projection exposure system, and said illuminator has an optic modulating device embodiment, and optic modulating device comprises a mirror apparatus with many single reflective mirrors;

Fig. 2 represents a synoptic diagram, and the function of mirror apparatus is described;

Fig. 3 represents the simple embodiment of an illuminator, and the light that wherein can produce expectation distributes, but in the field, a distant place of optic modulating device without any the optical projection element;

Fig. 4 represents to be used for the synoptic diagram of another embodiment of an illuminator of microlithographic projection exposure system, in said illuminator, optic modulating device comprises a mounting for grating of controllable diffraction grating, and the optical grating element of arranging at the pupil profiled surface is used as the light mixing arrangement;

Fig. 5 represents to be used for the synoptic diagram of another embodiment of an illuminator of microlithographic projection exposure system, said microlithographic projection exposure system has a light distributor, the light distributor has diffraction optical element, is used for the luminous point that concentrates on light on the array type optical modulating device and be used to form the optical channel that is suitable for the fly's eye condenser;

Fig. 6-9 is illustrated in according to the photodistributed synoptic diagram on the entrance side of fly's eye condenser among the embodiment of Fig. 5; With

Figure 10 represents to comprise the sectional view of another embodiment of the illuminator of a polarization beam apparatus.

Embodiment

Fig. 1 represents to be used for the example of illuminator 10 of the projection exposure system therefor of micro-lithography, projection exposure system therefor can be used in the middle of the production of semiconductor device or other fine structure parts, and low to micron-sized resolution in order to realize, projection exposure system therefor will utilize the light of deep ultraviolet scope to operate.Used light source is F ₂Excimer laser, its operation wavelength is about 157 nanometers, and its light beam is a coaxial alignment with respect to the optical axis 12 of illuminator.Can also use other ultraviolet source similarly, for example operation wavelength is the light source that the ArF excimer laser of 193 nanometers, KrF excimer laser that operation wavelength is 248 nanometers or the operation wavelength mercury vapor lamp that is 365 nanometers or 436 nanometers or wavelength are lower than 157 nanometers.

Light from light source 11 at first incides in the optical beam expander 13, optical beam expander 13 broadening laser beams, and, be the original beam profile of 20mm * 15mm from xsect, producing xsect is the profile 14 of the broadening of 80mm * 80mm.In this process, dispersion angle is reduced to about 1mrad * 0.4mrad from about 4mrad (milliradian) * 2mrad.

Downstream direction at optical beam expander, what follow is the mounting for grating 15 of a bidimensional of telescopic lenses system 16, mounting for grating 15 produces one group of light beam 17 regularly arranged, that be parallel to each other from the light beam 14 of broadening, and each light beam 17 wherein all has a lateral separation each other.

The light that is divided into light beam 17 or parallel beam 17 hits on the mirror apparatus 20 as (perhaps spatial variations) optic modulating device of change in location, said optic modulating device is aimed at the angle that is about 45 degree on macroscopic view with respect to optical axis 12, and, according to the mode of deflection reflective mirror, it is folding to realize that on average 90 of optical axis is spent.Other angle position and deflection angle also are possible.But an advantage of small angle deflection is the following fact: the position location of the object plane of zoom system, pancreatic system subsequently is more favourable, therefore can reduce the spending for zoom system, pancreatic system.Mirror apparatus 20 comprises each a large amount of small-sized single reflective mirrors 21, each reflective mirror 21 is planes in this example, these each reflective mirrors directly are bonded with each other with minimum inner space, and formation mirror apparatus 20 has the facet mirror surface totally.Each of each reflective mirror 21 can tilt around two orthogonal sloping shafts, and is irrelevant with other each reflective mirror.Move by the inclination that control device 22 can be controlled each reflective mirror through the electric signal that arrives corresponding each driver.Mirror apparatus 20 is chief components of light distributor 25, is used for changing the angular distribution that is incident on the radiation on the mirror apparatus according to the mode of exploded.

Mirror apparatus 20 is arranged in the scope of object plane of zoom-axial cone body object lens 30, mirror apparatus 20 is arranged in the downstream direction of the object plane of said zoom-axial cone body object lens 30 in beam path, arrange a defraction grating device 32 in the emergent pupil 31 of zoom-axial cone body object lens 30.Also specifying emergent pupil here is the pupil profiled surface of illuminator.The parts that are arranged in the updrift side of said pupil profiled surface in said light path are used for setting at this pupil profiled surface the spatial intensity distribution of a bidimensional, and the setting of said spatial intensity distribution is variable.

In detail, for example can be according to this basic structure of enforcement of the following stated.The a plurality of segmentations of laser beam by said telescope array of hitting the broadening of telescopic lenses array 15 are divided into a large amount of single light beams.The subarea of a 4mm * 4mm of the laser beam of the broadening telescope segmentation by the telescope array in this case is reduced to and has the light beam 17 that is of a size of 2mm * 2mm.In this way, produce 20 * 20=400 segment beam or light beam 17.These light beams hit the relevant single reflective mirror 21 of mirror apparatus, and single in each case reflective mirror 21 all is the plane, and it is of a size of 3mm * 3mm.Each single reflective mirror all is positioned in the square area of 4mm * 4mm.These zones each other and registration, therefore always have 20 * 20=400 single reflective mirror on foursquare grid.

In this embodiment, be about 100mm at the axially spaced-apart of looking in the distance between lens array 15 and the mirror apparatus 20.Axially spaced-apart between mirror apparatus 20 and pupil profiled surface 31 is located refract light grid element 31 therebetween greater than 1000mm.Maximum gauge for the zone of illuminating in pupil profiled surface 31 designs, and makes it be about 100mm.For such geometric condition, have only numerical value just can enter pupil profiled surface 31 less than the less comparatively speaking beam angle of about 2.9 degree.The condition that realizes this result is the distribution of the light of single reflective mirror (Fig. 2) that supposition the is positioned at optical axis top first half that only influences pupil profiled surface 31, and the single reflective mirror that is positioned at the optical axis below only influences the Lower Half of this surround.On the light path of about 1100mm, a segment beam or the usually maximum about 1.1mm of broadening of single light beam.This numerical limits the minimum dimension of the luminous point that in pupil profiled surface 31, produces by single light beam from the reflection of single reflective mirror.

The injection optics device 40 (coupling input optical devices) that is arranged in the downstream direction of pupil profiled surface 31 sends the light with intensity distributions to the rectangular input surface 44 of bar type light integrators 45, bar type light integrators 45 is made by synthetic quartz glass (or calcium fluoride), and mixes and light that homogenising is passed by means of internal reflection repeatedly.Pupil profiled surface 31 is planes of process the Fourier transform relevant with input surface 44, therefore can convert the spatial intensity distribution in pupil profiled surface 31 to and import 44 angular distribution at bar type.At rod 45 output surface 46 places, be close to said output surface 46, there is an intermediate field plane 47, in plane 47, arrange a reticle masking system (REMA) 50, said reticle masking system 50 is used as adjustable field stop.Object lens 55 subsequently are to 65 projection intermediate field planes 47, a plane, and said plane 47 has reticle masking system 50, and here the reticle mask plane also is appointed as on plane 65.In reticle mask plane 65, arrange a reticle mask 66.The plane 47 of reticle masking system and reticle mask plane 65 be illuminator the illumination place the plane.Reticle mask plane 65 overlaps with the object plane of projection objective 67, and projection objective 67 projects to its plane of delineation 68 with positioning pattern, arranges a wafer 69 that scribbles photoresist layer in the plane of delineation 68.Object lens 55 comprise first lens combination 55, wherein can introduce the middle pupil plane 57, second and third lens combination 58 and 59 and deflection reflective mirror 60 of wave filter or aperture diaphragm, deflection reflective mirror 60 is positioned between second and third lens combination, and makes along continuous straight runs add large-scale illuminator and reticle mask is installed in the horizontal direction and become possibility.

Illuminator 10 has formed an adjustable reticle mask retainer with projection objective 67, adjustable reticle mask retainer keeps reticle mask 66 in the object plane 65 of projection objective, an and adjustable wafer retainer that has formed projection exposure system therefor, be used for the micro-lithography production of electronic unit, and can be used for the micro-lithography production of the part of diffraction optical element and other microstructure.Said illuminator can also be used for wafer step device and wafer scan device.

The structure of illuminator should be such: said illuminator can be introduced complete etendue (how much photoconduction valves) in a series of level.Because the prolongation collimation of radiation and the prolongation collimation of penlight xsect, have how much extremely low photoconduction valves (etendue) by the laser instrument emitted light beams, but cut apart by beam spread and by the light beam that produces by means of telescope array 15, said how much photoconduction valves (etendue) might increase.The angular distribution that depends on the position of each reflective mirror 21 and as a result of can realize can further increase said how much photoconduction valves (etendue) by mirror apparatus 20, wherein also will change the distribution shape of radiation.Design zoom-axial cone system 30 for projection at unlimited distance.The device of arranging in the zone of the front focal plane of zoom-axial cone system 30 forms the bidimensional intensity distributions of a variable size in the zoom-emergent pupil 31 of axial cone bulk optics system 30 at zoom system, pancreatic system, be used as the pupil profiled surface.Here the refract light grid element 32 of An Paiing has rectangular emission characteristics, produce the major part of said how much photoconduction valves (etendue), and said how much photoconduction valves (etendue) are regulated the size of showing up through injection optics device 40, in other words, be adjusted to the shape of the rectangular incidence surface 44 of bar type integrator 45.

By control device 22 and through suitable electric signal the obliquity of each reflective mirror 21 is set, considers the inclination possibility with respect to two axles, any desired orientation of each reflective mirror all is possible.Yet the action of inclination is owing to the reason of mechanical aspects or electric aspect is only limited to very little angle of inclination, and therefore at each possible conditioning period of each reflective mirror, all radiation of reflecting from mirror apparatus can both enter the object lens 30.By means of the inclination of each reflective mirror 21, the light beam that derives from each reflective mirror is reflected to each different position of pupil profiled surface 31 (pupil plane of illuminator).Distribute 35 characteristic of issuable in this way bidimensional light mainly only is subjected to the restriction of size of each luminous point of light.For example by means of the suitable curvature of single reflective mirror, can realize the desired size of the luminous point that can produce.It is also conceivable that said each reflective mirror is designed to adaptive reflective mirror that the shape of mirror surface wherein can be carried out limited change through suitable topworks's (for example piezoelectric effect).

In described application of the present invention, it is essential, the distribution of the light of pupil profiled surface 31 (pupil plane of illuminator) can be set at the function of the structure of mask 66 in reticle mask plane 65.Aligning by means of suitable computer-controlled each reflective mirror is arranged, and all bidimensional illumination light of being familiar with can be set in the first pupil profiled surface 31 distribute, and for example has the routine illumination that different-diameter, annular setting, four utmost points or dipole are provided with.And different with other system, the light that any other expectation also may be set in pupil profiled surface 31 changeably distributes.For the change between being provided with, needn't carry out the replacing of any optics.Especially, do not need to cause wave filter, aperture diaphragm or other element of optical loss, the light that just can be provided with in the pupil plane 31 distributes.This also is applied to other embodiment particularly, and wherein used light hybrid element is the fly's eye condenser, and its input side preferably should be arranged in the zone of pupil profiled surface 31.Can also use to be exclusively used in the in fact any desired photodistributed ability that is provided with in the pupil profiled surface 31 and to reach the purpose that influences some pupil character, for example influence the ellipticity or the polarization balance of pupil.This may be extremely beneficial, because the intensity distributions of conventional laser beam never has the form (form of top function) of the expectation that has sharp-pointed light and shade transition.In this embodiment, light beam is about 3 degree to pupil plane 31 open angle maximums.This filling for bar type integrator 45 has positive effect.

Use Fig. 3 to describe the simplified embodiment of an illuminator below.In said illuminator 100, be incident on the mirror apparatus 120 with the incident angles that are about 25 degree from the light of LASER Light Source 111, but mirror apparatus 120 is aimed at obliquely with respect to optical axis 112 and is had a large amount of individual drive and each reflective mirror 121 that tilt respectively with respect to two sloping shafts.Here, mirror apparatus is more little with respect to the angle of attack of direction of illumination, and the loss of light in this embodiment is few more, and this is because there is not scheme radiation to be focused on the cause of each reflective mirror.Mirror apparatus 120 is as the optic modulating device of change in location, and form the light distributor 125 of this system, mirror apparatus 120 is driven by control device 122, and mirror apparatus 120 has so very big distance apart from the pupil profiled surface 131 of the illuminator of the bidimensional intensity distributions that wherein has expectation, so that pupil profiled surface 131 is positioned at the far-field region of mirror apparatus 120.In this case, in the zone of pupil profiled surface 131, will automatically set up desired intensity and distribute, and not need the angular distribution of space distribution that export and that converted to by Fourier transform by means of lens or optical devices with analogous effect from mirror apparatus 120.At the field lens 140 of the downstream direction arrangement of pupil profiled surface 131 intensity distributions is transformed into subsequently plane, a field 165, location mask that will throw light on for example wherein, and from the said mask of directional lighting of expectation.Projecting optical device 170 subsequently with the graphic projection of reticle mask to the wafer that covers by photosensitive coating of the plane of delineation 180 that is positioned at projection objective 170.

The structure of illuminator 210 derives from the structure of the illuminator shown in Fig. 1 among Fig. 4, and therefore characteristic of correspondence and parts have corresponding label mutually, have just increased by 200.At first be the structure of the optic modulating device 220 of position changeable with the difference according to the system of Fig. 1, next is the thinking that light mixes.In this connection, it should be noted that in the structure of illuminator 210 does not have specific light mixing member, does not have integrator rod or fly's eye condenser in other words.As according to shown in the embodiment of Fig. 1, from the light of LASER Light Source 211 after the mounting for grating 215 of the telescopic lenses system by optical beam expander 213 and bidimensional, a plurality of light beams 217 regularly arranged as one group, that be parallel to each other exist, and a plurality of in each case light beams 217 all have a lateral separation each other.Said light beam or segment beam 217 be each elements 221 of alignment light modulating device 220 all in each case.Each element 221 of optic modulating device 220 constitutes the electrical-optical element, and has a large amount of, controlled, reflective, diffraction grating 221, these gratings 221 form each element of optic modulating device, and physically these gratings 221 are arranged in the grating or grid of a bidimensional, and can are provided with at diffraction property with being independent of each other and change these gratings 221 by control device 222.So, by means of electric signal, might be in variable mode in the direction setting of zoom-axial cone body object lens 230 angular distribution from optic modulating device 220 radiation reflected.In a further embodiment, the discrete component of optic modulating device is formed by sound-optical element.

Optic modulating device 220 is installed in the object plane zone of zoom-axial cone body object lens 230, and the emergent pupil 231 of zoom-axial cone body object lens 230 is pupil profiled surfaces of illuminator.Near pupil profiled surface 231 or it, arrange an optical grating element 232, optical grating element 232 has a two-dimensional array of being made up of diffraction optical element or refraction optical element, and in this embodiment, said optical element has multinomial function.At first,, carry out shaping, so that incident radiation can be illuminated rectangular illumination field after by the injection optics device 240 in 250 zones, plane, field of illuminator subsequently for incident radiation by means of optical grating element 232.Optical grating element 232 with rectangular emission characteristics produces the major part of photoconduction valve action in this case, and it is adjusted to a field size and a shape of the expectation in the plane 250 on the scene, plane 250, field is optical conjugates with reticle mask plane 265, and arranges the reticle mask mask system in reticle mask plane 265.Optical grating element 232 may be embodied to a prism array, and each prism of wherein arranging in a two-dimensional array is introduced the local angle of determining so that illuminate a plane 250 according to expectation.The effect of the Fourier transform that is realized by injection optics device 240 is, in each specific angle of the outlet of optical grating element 232 all corresponding to a position in the plane, field 250, and the position of optical grating element, be the position of optical grating element, determined the light angle in the plane 250 on the scene with respect to optical axis 232.The light beam that leaves each optical grating element superposes in the plane 250 on the scene in this case.By means of the suitable design of optical grating element and its each element, might illuminate rectangular in the plane 250 on the scene basically equably.Therefore, optical grating element can also be used for the illumination of homogenising field, thereby can save independent light hybrid element, as the embodiment integrator rod 45 according to Fig. 1.Since between the exit plane 265 (reticle mask plane) of pupil profiled surface 231 and illuminator without any need for independent light hybrid element, so can design such illuminator especially compactly in this zone.

232 such shapings of optical grating element combine with uniformization element and the Fourier transform optical device that is connected at its downstream direction and at first are used to be provided with the size and the shape of field, next is used for this illumination of homogenising, such element can also be used among the embodiment according to Fig. 1 certainly, combines as optic modulating device with mirror apparatus.In this case, might save integrator rod 45.Secondly, the mirror apparatus according to Fig. 1 can also be replaced by the electrical-optical formula optic modulating device with controlled diffraction grating or light-sound component.As a alternative, can also in optic modulating device, use the transmission-type diffraction grating according to the reflective diffraction gratings of Fig. 4.

In Fig. 5, schematically the embodiment of fly's eye condenser 380 as another illuminator of light hybrid element used in expression.The radiation of the linear polarization that sends from LASER Light Source 311 is shaped to the variable selectable bidimensional intensity distributions the pupil profiled surface of arranging 331 near the light incident side of fly's eye condenser 380 by light distributor 325.Light distributor 325 comprises: optical beam expander 313; First diffraction optical element (DOE1) 315; As the mirror apparatus 320 of (perhaps spatially-variable) optic modulating device of position changeable (alignment angle with respect to optical axis 312 on macroscopic view is about 45 degree, and has a large amount of around two tiltable each reflective mirrors 321 of orthogonal sloping shaft); Be arranged in second diffraction optical element (DOE2) 390 of the downstream direction of mirror apparatus 320; With an optional optical system 330, be used to change the space distribution of the angular distribution of the radiation that enters optical system 330 for the light in pupil profiled surface 331.

Fly's eye condenser 380 is made up of with second mounting for grating 382 with second cylindrical lens 384 first mounting for grating 381 of first cylindrical lens 383.The lens 383 of first mounting for grating 381 have identical refractive index and rectangular xsect, and here, the rectangular shape of cylindrical lens 383 is corresponding to the rectangular shape of the illumination field 351 that will throw light on.Therefore, first lens 383 also are referred to as " honeycomb ".Being right after mutually in rectangular raster lands arranges cylindrical lens 383, fills up basically near zone in the pupil profiled surface 331 (it is the pupil plane of illuminator) or its.

The effect of first cylindrical lens 383 is that the light that will be incident on the plane 331 is separated into a series of light beams corresponding with the quantity of the cylindrical lens 383 that throws light on, these light beams focus on the plane 332, field of illuminator, and said illuminator is positioned at the focal plane of these cylindrical lenses 383.In this plane, perhaps plane on the scene near, second mounting for grating, 382, the second cylindrical lenses 384 that the location has second cylindrical lens 384 have rectangular xsect and have identical positive refractive index.Each cylindrical lens 383 of first mounting for grating 381 projects to light source 311 on the second relevant cylindrical lens 384 of the correspondence of second mounting for grating 382, thereby produces a large amount of secondary light sources.The cylindrical lens 384 of second mounting for grating also often is called " pupil honeycomb ".A pair of first and second cylindrical lenses 383,384 that are mutually related of first and second mounting for gratings 381,382 form an optical channel.First and second mounting for gratings 381,382 form fly's eye condenser 380, and fly's eye condenser 380 has the optical channel in a large amount of arrays that is arranged in bidimensional.

The cylindrical lens 384 of second mounting for grating 382 be arranged in corresponding secondary souce near, and rectangular first cylindrical lens 383 is projected on the intermediate field plane 347 of illuminator through the field lens 385 of the downstream direction that is arranged in the fly's eye condenser.Field lens 385 is the zoom lens that are designed to continuously change focal length.The rectangle diagram of first cylindrical lens (first honeycomb) 383 looks like to be superimposed upon on this intermediate field plane, and the effect of this stack is to make the light intensity in the zone on this intermediate field plane even or smooth, can obtain the even illumination of rectangle illumination field 351 thus.

As described in the above-described embodiment, in intermediate field plane 347, arrange a reticle masking system (REMA) 350, as adjustable field stop.Object lens 355 subsequently project to illumination surface 365 with this mid-plane 347, can locate a reticle mask (mask or photoetching prototype) here.

The feature of the uniqueness of this embodiment is that first diffraction optical element, 315, the first diffraction optical elements 315 that are arranged in the updrift side certain distance of mirror apparatus 320 are arranged between light source 311 and the mirror apparatus 320.Diffraction optical element 315 is designed to an optical array generator, be used for to be incident on each reflective mirror 321 that radiation on the diffraction optical element concentrates on mirror apparatus, can avoid the potential possible optical loss that causes by the illumination gap between the available mirror surface of each reflective mirror 321 thus.First diffraction optical element 315 is designed to a diffraction fan-out element, be used for producing a series of focused beams 317 corresponding with the number of each reflective mirror 321 from each parallel beam that hits diffraction optical element, and determine the direction of said focused beam, so that these light beams concentrate in the optics effective coverage of each reflective mirror 321 (seeing illustration 5 (a)).Use the fan-out element of red graceful raster mode for this purpose, red graceful grating produces a plurality of orders of diffraction that are positioned at each reflective mirror 321.Though for example the telescopic lenses array of describing in conjunction with Fig. 1 can be used for substituting diffraction optical element 315, diffraction optical element may be preferred, has better simply structure because it is compared with the telescopic lenses array.Perhaps can also save installing space.

Use one or more diffraction optical elements light to be concentrated on each element of optic modulating device of the array structure with each element, said discrete component can drive one by one to change the angle or the angular spectrum of the radiation of incident on discrete component, this situation can be used in combination with other optic modulating device, the electrical-optical element that for example has a large amount of controlled reflective diffraction gratings is for example in conjunction with Fig. 4 element that describe or that have sound-optical element arrays.

Light distributor 325 is particularly suitable for being used in combination with fly's eye integrator 380, and allow entrance lighting pupil profiled surface 331 at fly's eye integrator 380, so that or shine the single optical channel of fly's eye condenser basically fully, perhaps do not shine the single optical channel of fly's eye condenser basically fully, can obtaining highly uniformly thus, light mixes the loss minimum of light.This effect be as described below by controlled mirror apparatus 320 and be arranged in the downstream direction of mirror apparatus 320 and be arranged in mirror apparatus and pupil profiled surface 331 between the compound action of second diffraction optical element 390 obtain.According to the orientation of each reflective mirror 321, has special angle with respect to optical axis by each light beams 317 of each reflective mirror 321 reflections of mirror apparatus 320.These angles are referred to as " deviation angle " below.Each deviation angle is corresponding to a definite position in the optics far-end field (that is, the pupil profiled surface 331) of mirror apparatus.Second diffraction optical element 390 is designed to the hologram (CGH) by the computing machine generation, therefore a definite angular distribution around each position by the said diffraction optical element of light beam 317 illuminations will be created in light beam 317, wherein this angular distribution of determining in pupil profiled surface 331 corresponding to the size and the shape of the single lens element 383 of the input side mounting for grating 383 of fly's eye condenser.In other words, in this embodiment, the angular distribution 391 that is produced by second diffraction optical element 390 is corresponding to a rectangular field of illumination in pupil profiled surface 331.Under the compound action of the mirror apparatus 320 and second diffraction optical element, by the single reflective mirror 321 that tilts to the deviation angle of expecting, can be controlled in the pupil profiled surface 331 position with respect to the field of illumination of single light beam 317, and, can form the shape and the size of field of illumination basically by diffraction optical element 390.

Because the tilted alignment of each reflective mirror can be by control device 322 control individually one by one, thus the single optical channel of addressing fly's eye condenser 380 selectively, so that illuminate optical channel fully or do not illuminate said optical channel fully.For this function is described, Fig. 6 schematically expresses a view at the input side upper edge of fly's eye integrator 380 optical axis 312, can see the rectangle lens 383 of first mounting for grating 381 here.In Fig. 6, illuminate a specific optical channel 383i (that is, a selected field honeycomb 383i) (black region), and do not illuminate all other optical channel 383ni.Fig. 7 represents an example, here, obtains an annular by the angle of inclination of controlling each reflective mirror 321 and is provided with, so that produce a surround (black region) of annular basically on the incidence surface of fly's eye condenser.Again, rectangular cylindrical lens 381 of all of first mounting for grating 381 or illumination (black region 383i) fully, (bright rectangle 383ni) fully perhaps do not throw light on.Fig. 8 represents to be used for the example of a conventional correspondence that is provided with, and here, is circular basically in the field of illumination (in pupil profiled surface 331) of the light incident side of fly's eye condenser 380.Again, round-shapedly on the macroscopic view in zone with illumination be divided into the little rectangle corresponding with each optical channel of fly's eye condenser, here, be that a series of optical channel 383i at center illuminate fully with the optical axis, and the optical channel 383ni beyond desired region does not illuminate fully.

Make the angular distribution that produces by second diffraction optical element 390 be suitable for constituting the lenticular shape of a honeycomb 383.This shape still is the miniature shape of rectangular shape of illumination field 351.Be used for the illuminator of scanner system, this shape has very big width and the ratio of width to height highly, is used to obtain the illumination field of shape of slit.In the scope of the width of rectangular illumination field and the typical the ratio of width to height between the height for example between 2: 1 and 8: 1.On the other hand, in the middle of some illumination is set (for example Chang Gui setting or annular are set), the intensity distributions that obtains bidimensional around optical axis in the pupil profiled surface 381 of substantial symmetry may be useful.The preferred in these cases practice can be to use second diffraction optical element 390 with action function, said action function allows to carry out shaping for outgoing beam 391, so that the field of illumination on incident one side of fly's eye condenser 380 comprises " honeycomb " more than one for each single light beam 317.Fig. 9 expresses an example, here design for second diffraction optical element, so that form a light beam that derives from a single reflective mirror 321, thereby can make light cover a square or group that constitutes by 6 of the first grating 381i adjacent rectangle lens 383, obtaining one almost is the field of illumination of square shape, and said the ratio of width to height approaches 1.

Figure 10 schematically represents the part of another embodiment of illuminator, comprising the mirror apparatus 420 and second diffraction optical element 490 that is positioned at the downstream direction of mirror apparatus as optic modulating device.The updrift side of the part of describing in Figure 10 and the structure of downstream direction can be similar or identical with the illuminator shown in Fig. 5.The linearly polarized photon that for example provided by laser instrument is provided this embodiment.With the difference of embodiment contrast shown in above be, arrange, make it substantially perpendicular to optical axis 412 for the reflecting light modulator 420 that comprises each reflective mirror 421.Optical axis selects 450 places, beam splitter surface folding at polarization, and said beam splitter surface 450 is spent with respect to inclined light shaft 45 and is arranged between the mirror apparatus 420 and second diffraction optical element 490 on how much, so its orientation is parallel to mirror apparatus.Between mirror apparatus and polarizer 450 and in the front of mirror apparatus 420 and and then said mirror apparatus 420, arrange one as optical delay device that λ/4 plates 460 form.Polarizer 450 can be a thin film polarizer.The polarization beam apparatus surface can be arranged on the thin transparent panel or within a transparent material.

The laser beam of incident is a polarization, so the vibration of the field vector of electric field is perpendicular to the plane of incidence on the planar splitter surface 450 (s polarization).Structure for polarization layer designs, and makes it reflect the light of s polarization and the light of transmission p polarization (vibration of electric field intensity is parallel to plane of incidence) basically basically.The s light beam 417 that hits beam splitter 450 is to mirror apparatus 420 reflections.Linear polarization is once changing circular polarization into through 1/4 wavelength plate 460, thereby makes the said circularly polarized light of reflective mirror 421 reflections.The folded light beam that has the angle of deviation of expectation with respect to optical axis is transformed into the p polarization through 1/4 wavelength plate, 460,1/4 wavelength plates 460 with circular polarization.The light beam 417 of p polarization passes polarizer 450 then, incides subsequently on second diffraction optical element 490, and second diffraction optical element 490 is introduced the size of the optical channel that is suitable for the fly's eye integrator and an angular spectrum of shape.In this embodiment, each all laser beams 417 all has the substantially the same optical path length between the light source and second diffraction optical element 490, second diffraction optical element 490 be arranged in illuminator the field plane on or near it.Therefore, with respect to the optical imagery that takes place in illuminator, this plane all is identical for all light beams.In above-mentioned some or all other embodiment, can also use similar device with polarization beam apparatus.

In the embodiment of Fig. 5 and Figure 10, mirror apparatus 320,420 can be regarded as the first diffuser element of illuminator, because the distribution of the special angle of light is to depend on the structure of each reflective mirror of mirror apparatus and generation is set.Second diffraction optical element 390,490 can be thought the second diffuser element, is produced by this element because special angle distributes.By arranging second diffraction optical element at the downstream direction of mirror apparatus, can optically fold the angular distribution that is produced by first diffraction optical element 320,420, the feasible angular distribution that is produced by second diffraction optical element 390,490 is at (in the pupil profiled surface) in the middle of the optics far field.Illuminate the first diffuser element 320,420 with collimated laser light light beam basically, and with the first diffuser element 320,420 be positioned at can be illuminator first plane illuminator the plane, field near.The second diffuser element 390,490 is positioned between the pupil plane of this plane and illuminator, and pupil plane is Fourier's conjugation with the plane, field of location first diffuser.The first diffuser element is a dynamic element, and the action by control device here is the control action function dynamically, and this is a special feature of the present invention.

Claims (46)

1, a kind of illuminator that is used for the microlithographic projection exposure system is used for the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212,312); With

A light distributor (25,125,225,325), the light distributor is used for receiving from the light of original light source (11,111,211,311) and is used to produce the intensity distributions (35) of bidimensional, and the intensity distributions of said bidimensional can be provided with in the pupil profiled surface (31,131,231,331) of illuminator changeably;

Light distributor wherein has at least one optic modulating device (20,120,220,320,420), is used for controllably changing the angular distribution of the light of incident on optic modulating device.

2, illuminator according to claim 1, wherein: optic modulating device (20,120,220,320,420) but a array with each element (21,121,221,321,421) of individual drive is incident on the angle of the radiation on each element with change.

3, illuminator according to claim 1 and 2, wherein: constitute said optic modulating device, and can control said optic modulating device, so that all basically light intensities that are incident on the optic modulating device all deflect in the Free Region of pupil profiled surface (31,131,231,331).

4, according to described illuminator one of in the aforementioned claim, wherein: provide an optical system (30,230,330) between optic modulating device (20,120,220,320) and pupil profiled surface (31,231,331), the angular distribution that is produced by optic modulating device with conversion is the space distribution in pupil profiled surface (31,231,331).

5, illuminator according to claim 4, wherein: the focal length of optical system (30,231) can be provided with and preferably can be provided with continuously changeably.

6, according to described illuminator one of in the aforementioned claim, wherein: between optic modulating device (20,220) and pupil profiled surface (31,231), arrange an axial cone system.

7, according to described illuminator one of among the claim 1-3, wherein: the space between optic modulating device (120) and pupil profiled surface (131) is without any optics.

8, illuminator according to claim 7, wherein: the distance between optic modulating device (120) and pupil profiled surface (131) is so big, so that make pupil profiled surface (131) be positioned at the far-field region of optic modulating device (121).

9, according to described illuminator one of in the aforementioned claim, wherein: optic modulating device is reflecting light modulating device (20,120,220,320,420), and it is preferably arranged with respect to optical axis (12,112,212,312) obliquely in the mode of deflection reflective mirror.

10, according to described illuminator one of in the aforementioned claim, wherein: between optic modulating device (20,120,220) and pupil profiled surface (31,131,231), have an optical range, optical range is selected hereto, so that optical axis (12,112,212) and belong to angle between the light beam of the angular distribution in pupil profiled surface (31,131, the 231) zone less than 5 degree about, preferably less than about 3 degree.

11, according to described illuminator one of in the aforementioned claim, wherein: optic modulating device has at least one mirror apparatus (20,120,320,420), said mirror apparatus has an array of separately controllable each reflective mirror (21,121,321,421), thereby can change the angular distribution that is incident on the light on the mirror apparatus.

12, illuminator according to claim 11, wherein: whole (21) of some reflective mirror, particularly each reflective mirror at least of each reflective mirror have a plane mirror surface.

13, according to claim 11 or 12 described illuminators, wherein: some reflective mirror at least of each reflective mirror, particularly whole reflective mirrors that form the bending with limited reflective mirror focal length of each reflective mirror are preferably determined the focal length of reflective mirror so that the radiation that is incident on each reflective mirror can be hit the pupil profiled surface with the form that focuses on basically.

14, according to the described illuminator of one of claim 11-13, wherein: each reflective mirror of mirror apparatus (20,120) all is of similar shape and size.

15, according to the described illuminator of one of claim 11-13, wherein: each reflective mirror comprises one first reflective mirror group and at least one second reflective mirror group, each reflective mirror group all has one or more single reflective mirrors, and each reflective mirror of reflective mirror group has different big or small and/or different shapes and/or different curvature.

16, according to the described illuminator of one of claim 11-15, wherein: some reflective mirror at least of each reflective mirror of mirror apparatus has an optical texture, particularly diffractive optical structure, is used to form from the distribution of each reflective mirror radiation reflected.

17, according to the described illuminator of one of claim 11-16, wherein: each reflective mirror of mirror apparatus (20,120,320,420) tilts with respect to other each reflective mirror of mirror apparatus, and preferably centering on relative to one another, vertically extending two sloping shafts tilt.

18, according to the described illuminator of one of claim 1-10, wherein: optic modulating device (220) is the electrical-optical element (220) with array of each element (221), and said each element (221) is to form as controlled diffraction grating and/or as sound-optical element.

19, according to the described illuminator of one of claim 2-18, wherein: between light source and optic modulating device, arrange optical devices (15,215,315), be used for and be incident on each element (21,221,321,421) that radiation on the optical devices concentrates on optic modulating device (20,220,320,420).

20, illuminator according to claim 19, wherein: optical devices (15,215) comprise the array of a bidimensional with telescopic lenses system (16).

21, illuminator according to claim 19, wherein: optical devices comprise diffraction optics array generator (315), are used to change an incident beam and are a plurality of light beams on each optical element that concentrates on optic modulating device.

22, illuminator according to claim 21, wherein: diffraction optics array generator (315) is designed to red graceful grating.

23, according to the described illuminator of one of aforementioned claim, wherein: between a plane (65) of pupil profiled surface (31) and illumination field, arrange a light mixing arrangement (45,380), be used for the light that mixing intensity distributes.

24, illuminator according to claim 23, wherein: the light mixing arrangement comprises have incidence surface at least one integrator rod (45) of (44), pupil profiled surface (31) preferably is positioned at the zone on a plane of the updrift side that is positioned at incidence surface, and said plane is a Fourier transform plane relevant with incidence surface.

25, illuminator according to claim 23, wherein: the light mixing arrangement comprises at least one the fly's eye condenser (380) with incidence surface, the pupil profiled surface preferably be positioned at incidence surface or with the zone on a surface of incidence surface optical conjugate.

26, illuminator according to claim 25, it is characterized in that: control said optic modulating device, so that or each radiation channel of the fly's eye condenser (380) that throws light on fully basically, each radiation channel of the fly's eye condenser (380) that perhaps do not throw light on fully basically.

27, according to claim 25 or 26 described illuminators, wherein: the light distributor has at least one diffraction optical element (390,490), diffraction optical element (390,490) optically is arranged between optic modulating device and the pupil profiled surface, is used to receive the light that optic modulating device sends and is used for changing said light according to the action function of being determined by the structure of diffraction optical element by introducing angular distribution.

28, illuminator according to claim 27, wherein: design for diffraction optical element (390,490), so that, make its single optical channel that meets the fly's eye condenser or the shape and the size of one group of adjacent optical channel by the light beam of diffraction optical element shaping from a discrete component formation of optic modulating device.

29, according to claim 27 or 28 described illuminators, wherein: diffraction optical element (390,490) is the hologram (CGH) that is produced by computing machine.

30, according to the described illuminator of one of aforementioned claim 25-29, wherein: any mask that is not provided for blocking one by one radiation channel for fly's eye condenser (380).

31, according to the described illuminator of one of claim 1-22, wherein: between a plane (265) of pupil profiled surface (231) and illumination field, both do not arranged the fly's eye condenser, and also do not arranged any integrator rod.

32, according to the described illuminator of one of aforementioned claim, wherein: in pupil profiled surface (231), perhaps near pupil profiled surface (231), arrange an optical grating element (232), be used for the shaping illuminator plane, field (250) subsequently intensity distributions and make said intensity distributions homogenising.

33, according to the described illuminator of one of aforementioned claim, wherein: for each element (21,121,221,321) that drives optic modulating device, a control device (22,122,222,322) is provided, be configured for said control device, can change with the structural change of the mask that will expose (66) with the control signal that is used in each element of control.

34, a kind of method that produces semiconductor device and other fine structure parts, said method has following step:

By means of reticle mask of illuminator illumination, said reticle mask is arranged in the object plane of projection objective, said illuminator has at least one optic modulating device, optic modulating device has each a large amount of elements, these each elements can be controlled individually, so that change the angular distribution that is incident on the radiation on the optic modulating device;

On photosensitive substrate, produce the image of reticle mask;

The step of illumination reticle mask comprises: by means of at least two of each element that is relative to each other be oppositely arranged, the angular distribution that is incident on the reticle mask is set.

35, method according to claim 34, wherein: optic modulating device comprises mirror apparatus, mirror apparatus has a large amount of separately controllable each reflective mirrors, and being oppositely arranged of each element comprises with respect to each other reflective mirror around tilt at least one of each reflective mirror of one or more sloping shafts.

36, method according to claim 34, wherein: optic modulating device has a large amount of separately controllable diffraction grating, and the difference that is oppositely arranged the diffracting effect that comprises at least two diffraction grating changes.

37, according to the described method of one of aforementioned claim 34-36, wherein: illuminator comprises the fly's eye condenser with a large amount of radiation channels, and wherein: control for each element, so that fully lighting radiation passage or lighting radiation passage not fully basically basically.

38, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, the intensity distributions (35) of said bidimensional can be set in the pupil profiled surface (31,131,231) of illuminator changeably;

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, between optic modulating device (20,120,220) and pupil profiled surface (31,131), provide an optical system (30,230) so that the angular distribution that will be produced by optic modulating device converts the space distribution in pupil profiled surface (31,131) to;

Wherein, optical system (30,231) has a focal length that can be provided with changeably.

39, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, in the pupil profiled surface (31,131,231) of illuminator, can be provided with changeably said bidimensional intensity distributions (35);

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, between optic modulating device (20,220) and pupil profiled surface (31,231), arrange an axial cone system.

40, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, in the pupil profiled surface (31,131,231) of illuminator, can be provided with changeably said bidimensional intensity distributions (35);

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, the space between optic modulating device (120) and pupil profiled surface (131) is without any optics.

41, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, the intensity distributions (35) of said bidimensional can be set in the pupil profiled surface (31,131,231) of illuminator changeably;

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, optic modulating device has at least one mirror apparatus (20,120), and mirror apparatus (20,120) has the array of separately controllable each reflective mirror (21,121), thereby changes the angular distribution that is incident on the light on the mirror apparatus;

Wherein, each reflective mirror comprises one first reflective mirror group and at least one second reflective mirror group, each reflective mirror group all has one or more single reflective mirrors, and each reflective mirror of reflective mirror group has different big or small and/or different shapes and/or different curvature.

42, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, in the pupil profiled surface (31,131,231) of illuminator, said intensity distributions (35) can be set changeably;

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, optic modulating device has at least one mirror apparatus (20,120), and mirror apparatus (20,120) has the array of separately controllable each reflective mirror (21,121), thereby changes the angular distribution that is incident on the light on the mirror apparatus;

Wherein, each reflective mirror is adaptive reflective mirror, and wherein the shape of mirror surface can change.

43, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, in the pupil profiled surface (31,131,231) of illuminator, can be provided with changeably said bidimensional intensity distributions (35);

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, optic modulating device (220) is an electrical-optical element (220), has an array of each reflective mirror (221), each reflective mirror (221) be form as controlled diffraction grating and/or form as sound-optical element.

44, a kind of illuminator of microlithographic projection exposure apparatus is used to be used to the illumination field of optical illumination from original light source, and said illuminator comprises:

An optical axis (12,112,212); With

A light distributor (25,125,225), be used for receiving from the light of original light source (11,111,211) and be used to produce the intensity distributions (35) of a bidimensional, in the pupil profiled surface (31,131,231) of illuminator, said intensity distributions (35) can be set changeably;

Wherein, the light distributor has at least one optic modulating device (20,120,220), is used for controllably changing the angular distribution that is incident on the light on the optic modulating device;

Wherein, at optic modulating device (20,120,220,320,420) but have the array of each element (21,121,221,321,421) of individual drive, be incident on the angle of the radiation on each element with change;

Wherein, between light source and optic modulating device, arrange optical devices (15,215,315), be used for and be incident on each element (21,221,321) that radiation on the optical devices concentrates on optic modulating device (20,220,320).

45, according to the described illuminator of claim 44, wherein: optical devices (15,215) comprise a two-dimensional array with telescopic lenses system (16).

46, according to the described illuminator of claim 44, wherein: optical devices comprise a diffraction optics array generator (315), are used to change input beam and are a plurality of light beams on each optical element that concentrates on optic modulating device.

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