DE3274316D1 - Thin film resistor material and method - Google Patents

Thin film resistor material and method

Info

Publication number
DE3274316D1
DE3274316D1 DE8282902143T DE3274316T DE3274316D1 DE 3274316 D1 DE3274316 D1 DE 3274316D1 DE 8282902143 T DE8282902143 T DE 8282902143T DE 3274316 T DE3274316 T DE 3274316T DE 3274316 D1 DE3274316 D1 DE 3274316D1
Authority
DE
Germany
Prior art keywords
thin film
film resistor
resistor material
thin
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282902143T
Other languages
English (en)
Inventor
David W Hughes
Wayne M Paulson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Application granted granted Critical
Publication of DE3274316D1 publication Critical patent/DE3274316D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making
    • Y10T29/49099—Coating resistive material on a base
DE8282902143T 1981-06-30 1982-05-27 Thin film resistor material and method Expired DE3274316D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/279,130 US4392992A (en) 1981-06-30 1981-06-30 Chromium-silicon-nitrogen resistor material
PCT/US1982/000735 WO1983000256A1 (en) 1981-06-30 1982-05-27 Thin film resistor material and method

Publications (1)

Publication Number Publication Date
DE3274316D1 true DE3274316D1 (en) 1987-01-02

Family

ID=23067747

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282902143T Expired DE3274316D1 (en) 1981-06-30 1982-05-27 Thin film resistor material and method

Country Status (5)

Country Link
US (1) US4392992A (de)
EP (1) EP0082183B1 (de)
JP (1) JPS58501063A (de)
DE (1) DE3274316D1 (de)
WO (1) WO1983000256A1 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5882770A (ja) * 1981-11-13 1983-05-18 Hitachi Ltd 感熱記録ヘツド
NL8203297A (nl) * 1982-08-24 1984-03-16 Philips Nv Weerstandslichaam.
US4489104A (en) * 1983-06-03 1984-12-18 Industrial Technology Research Institute Polycrystalline silicon resistor having limited lateral diffusion
US4569742A (en) * 1983-06-20 1986-02-11 Honeywell Inc. Reactively sputtered chrome silicon nitride resistors
US4704188A (en) * 1983-12-23 1987-11-03 Honeywell Inc. Wet chemical etching of crxsiynz
US4681812A (en) * 1984-05-31 1987-07-21 Honeywell Inc. Reactively sputtered chrome silicon nitride resistors
FR2571538A1 (fr) * 1984-10-09 1986-04-11 Thomson Csf Procede de realisation de resistance en couche mince, et resistance obtenue par ce procede
US4760369A (en) * 1985-08-23 1988-07-26 Texas Instruments Incorporated Thin film resistor and method
US4682143A (en) * 1985-10-30 1987-07-21 Advanced Micro Devices, Inc. Thin film chromium-silicon-carbon resistor
US4878770A (en) * 1987-09-09 1989-11-07 Analog Devices, Inc. IC chips with self-aligned thin film resistors
DE68929216T2 (de) 1988-07-15 2001-02-08 Denso Corp Verfahren zur Herstellung einer Halbleiteranordnung mit Dünnfilm-Widerstand
US5182424A (en) * 1989-10-31 1993-01-26 Vlastimil Frank Module encapsulation by induction heating
JPH0461201A (ja) * 1990-06-29 1992-02-27 Hitachi Ltd 薄膜抵抗体
US5233327A (en) * 1991-07-01 1993-08-03 International Business Machines Corporation Active resistor trimming by differential annealing
JP3026656B2 (ja) * 1991-09-30 2000-03-27 株式会社デンソー 薄膜抵抗体の製造方法
US5285099A (en) * 1992-12-15 1994-02-08 International Business Machines Corporation SiCr microfuses
US6171922B1 (en) 1993-09-01 2001-01-09 National Semiconductor Corporation SiCr thin film resistors having improved temperature coefficients of resistance and sheet resistance
US5646814A (en) 1994-07-15 1997-07-08 Applied Materials, Inc. Multi-electrode electrostatic chuck
US5592358A (en) 1994-07-18 1997-01-07 Applied Materials, Inc. Electrostatic chuck for magnetic flux processing
DE59605278D1 (de) * 1995-03-09 2000-06-29 Philips Corp Intellectual Pty Elektrisches Widerstandsbauelement mit CrSi-Widerstandsschicht
US6336713B1 (en) * 1999-07-29 2002-01-08 Hewlett-Packard Company High efficiency printhead containing a novel nitride-based resistor system
JP2004216889A (ja) * 2002-12-27 2004-08-05 Canon Inc 発熱抵抗体薄膜、これを用いたインクジェットヘッド用基体、インクジェットヘッド及びインクジェット装置
CN1321206C (zh) * 2003-11-04 2007-06-13 住友金属矿山株式会社 金属电阻材料、溅射靶材、电阻薄膜及其制造方法
US8186796B2 (en) * 2007-05-30 2012-05-29 Canon Kabushiki Kaisha Element substrate and printhead
US8242876B2 (en) 2008-09-17 2012-08-14 Stmicroelectronics, Inc. Dual thin film precision resistance trimming
US8431739B2 (en) 2010-06-14 2013-04-30 Divi's Laboratories, Ltd. Process for the preparation of gabapentin
US8400257B2 (en) 2010-08-24 2013-03-19 Stmicroelectronics Pte Ltd Via-less thin film resistor with a dielectric cap
US8436426B2 (en) 2010-08-24 2013-05-07 Stmicroelectronics Pte Ltd. Multi-layer via-less thin film resistor
US8659085B2 (en) 2010-08-24 2014-02-25 Stmicroelectronics Pte Ltd. Lateral connection for a via-less thin film resistor
US7968732B1 (en) 2010-09-07 2011-06-28 Divi's Laboratories, Ltd. Process for the preparation of 5-benzyloxy-2-(4-benzyloxyphenyl)-3-methyl-1H-indole
US8927909B2 (en) 2010-10-11 2015-01-06 Stmicroelectronics, Inc. Closed loop temperature controlled circuit to improve device stability
US8809861B2 (en) 2010-12-29 2014-08-19 Stmicroelectronics Pte Ltd. Thin film metal-dielectric-metal transistor
US9159413B2 (en) 2010-12-29 2015-10-13 Stmicroelectronics Pte Ltd. Thermo programmable resistor based ROM
US8981527B2 (en) * 2011-08-23 2015-03-17 United Microelectronics Corp. Resistor and manufacturing method thereof
US8526214B2 (en) 2011-11-15 2013-09-03 Stmicroelectronics Pte Ltd. Resistor thin film MTP memory

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3203830A (en) * 1961-11-24 1965-08-31 Int Resistance Co Electrical resistor
USB392136I5 (de) * 1964-08-26
US3381255A (en) * 1965-04-12 1968-04-30 Signetics Corp Thin film resistor
US3394087A (en) * 1966-02-01 1968-07-23 Irc Inc Glass bonded resistor compositions containing refractory metal nitrides and refractory metal
US3477935A (en) * 1966-06-07 1969-11-11 Union Carbide Corp Method of forming thin film resistors by cathodic sputtering
FR1543297A (fr) * 1967-08-09 1968-10-25 Radiotechnique Coprim Rtc Résistances en couche mince à coefficient de température négatif et leur procédé de fabrication
US3763026A (en) * 1969-12-22 1973-10-02 Gen Electric Method of making resistor thin films by reactive sputtering from a composite source
US3847658A (en) * 1972-01-14 1974-11-12 Western Electric Co Article of manufacture having a film comprising nitrogen-doped beta tantalum
US4042479A (en) * 1973-12-27 1977-08-16 Fujitsu Ltd. Thin film resistor and a method of producing the same
US3996551A (en) * 1975-10-20 1976-12-07 The United States Of America As Represented By The Secretary Of The Navy Chromium-silicon oxide thin film resistors
FR2351478A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Procede de realisation de resistances en couches minces passivees et resistances obtenues par ce procede
JPS598558B2 (ja) * 1976-08-20 1984-02-25 松下電器産業株式会社 サ−マルプリントヘツド
US4079349A (en) * 1976-09-29 1978-03-14 Corning Glass Works Low TCR resistor
US4217570A (en) * 1978-05-30 1980-08-12 Tektronix, Inc. Thin-film microcircuits adapted for laser trimming
US4298505A (en) * 1979-11-05 1981-11-03 Corning Glass Works Resistor composition and method of manufacture thereof

Also Published As

Publication number Publication date
WO1983000256A1 (en) 1983-01-20
JPS58501063A (ja) 1983-06-30
EP0082183B1 (de) 1986-11-12
JPH0218561B2 (de) 1990-04-26
EP0082183A4 (de) 1983-11-09
US4392992A (en) 1983-07-12
EP0082183A1 (de) 1983-06-29

Similar Documents

Publication Publication Date Title
DE3274316D1 (en) Thin film resistor material and method
JPS57176047A (en) Recording material for electronic photograph and its manufacture
JPS56154051A (en) Anisotropic film and its manufacture
DE3478475D1 (en) Diamond-like thin film and method for making the same
GB2128813B (en) Thin film resistor
JPS5778530A (en) Film strip and making thereof
JPS57176046A (en) Recording material for electronic photograph and its manufacture
JPS57176048A (en) Recording material for electronic photograph and its manufacture
GB2105905B (en) Thin film transistor and method for the manufacture thereof
AU552461B2 (en) Film coating methol and apparatus
GB2129620B (en) Thin film resistor matching
JPS56152714A (en) Ultrafiltration film and its manufacture
JPS56143427A (en) Porous film composition and element
JPS57142815A (en) Method and device for automitically connecting film
JPS57165832A (en) Thin film
DE3264151D1 (en) Photographic recording material and process for its preparation
JPS56169899A (en) Sheet like material and method
DE3266466D1 (en) Thin film magneto-resistive sensors and methods for their manufacture
GB2063709B (en) Thin plastic gelatin laminate material and method for making same
JPS56140339A (en) Photographic image forming method and material using same
DE3172470D1 (en) Photographic system and photographic material for use therein
DE3272690D1 (en) Polymeric film casting and apparatus therefor
JPS5696801A (en) Film resistor and method of manufacturing same
JPS57117204A (en) Method of forming thick film resistor
GB2105704B (en) Resistance material resistor and method of making the same

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)