DE3369204D1 - Method and apparatus for use in developing resist film - Google Patents

Method and apparatus for use in developing resist film

Info

Publication number
DE3369204D1
DE3369204D1 DE8383306538T DE3369204T DE3369204D1 DE 3369204 D1 DE3369204 D1 DE 3369204D1 DE 8383306538 T DE8383306538 T DE 8383306538T DE 3369204 T DE3369204 T DE 3369204T DE 3369204 D1 DE3369204 D1 DE 3369204D1
Authority
DE
Germany
Prior art keywords
resist film
developing resist
developing
film
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383306538T
Other languages
English (en)
Inventor
Yuji Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19025282A external-priority patent/JPS5978343A/ja
Priority claimed from JP19025082A external-priority patent/JPS5978342A/ja
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE3369204D1 publication Critical patent/DE3369204D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
DE8383306538T 1982-10-28 1983-10-27 Method and apparatus for use in developing resist film Expired DE3369204D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19025282A JPS5978343A (ja) 1982-10-28 1982-10-28 レジスト膜の現像方法
JP19025082A JPS5978342A (ja) 1982-10-28 1982-10-28 レジスト膜の現像方法

Publications (1)

Publication Number Publication Date
DE3369204D1 true DE3369204D1 (en) 1987-02-19

Family

ID=26505966

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383306538T Expired DE3369204D1 (en) 1982-10-28 1983-10-27 Method and apparatus for use in developing resist film

Country Status (3)

Country Link
US (1) US4564280A (de)
EP (1) EP0110558B1 (de)
DE (1) DE3369204D1 (de)

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Also Published As

Publication number Publication date
US4564280A (en) 1986-01-14
EP0110558B1 (de) 1987-01-14
EP0110558A2 (de) 1984-06-13
EP0110558A3 (en) 1984-07-11

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