DE3370897D1 - Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation - Google Patents
Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantationInfo
- Publication number
- DE3370897D1 DE3370897D1 DE8383402328T DE3370897T DE3370897D1 DE 3370897 D1 DE3370897 D1 DE 3370897D1 DE 8383402328 T DE8383402328 T DE 8383402328T DE 3370897 T DE3370897 T DE 3370897T DE 3370897 D1 DE3370897 D1 DE 3370897D1
- Authority
- DE
- Germany
- Prior art keywords
- etching
- density
- application
- ion implantation
- particle beams
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic beam generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8220564A FR2537768A1 (fr) | 1982-12-08 | 1982-12-08 | Procede et dispositif d'obtention de faisceaux de particules de densite spatialement modulee, application a la gravure et a l'implantation ioniques |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3370897D1 true DE3370897D1 (en) | 1987-05-14 |
Family
ID=9279894
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383402328T Expired DE3370897D1 (en) | 1982-12-08 | 1983-12-02 | Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation |
Country Status (5)
Country | Link |
---|---|
US (1) | US4536657A (de) |
EP (1) | EP0112230B1 (de) |
JP (1) | JPS59139539A (de) |
DE (1) | DE3370897D1 (de) |
FR (1) | FR2537768A1 (de) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4631096A (en) * | 1984-10-01 | 1986-12-23 | Deutsche Forschungs-Und Versuchsanstalt Fur Luft-Und Raumfahrt E.V. | High energy materials containing metastable helium, a process for producing same and applications thereof |
JPH07107898B2 (ja) * | 1985-04-26 | 1995-11-15 | 株式会社日立製作所 | 表面処理方法および装置 |
JPS6243136A (ja) * | 1985-08-20 | 1987-02-25 | Mitsubishi Electric Corp | 半導体製造装置 |
DE3535062A1 (de) * | 1985-10-01 | 1987-04-09 | Mitsubishi Electric Corp | Ionenstrahlerzeuger |
JP2588172B2 (ja) * | 1986-06-11 | 1997-03-05 | 株式会社日立製作所 | 表面処理装置 |
JPH0834203B2 (ja) * | 1986-07-01 | 1996-03-29 | 株式会社日立製作所 | ドライエツチング装置 |
US4914305A (en) * | 1989-01-04 | 1990-04-03 | Eaton Corporation | Uniform cross section ion beam system |
FR2681472B1 (fr) | 1991-09-18 | 1993-10-29 | Commissariat Energie Atomique | Procede de fabrication de films minces de materiau semiconducteur. |
FR2748851B1 (fr) * | 1996-05-15 | 1998-08-07 | Commissariat Energie Atomique | Procede de realisation d'une couche mince de materiau semiconducteur |
JP2830849B2 (ja) * | 1996-07-19 | 1998-12-02 | 日本電気株式会社 | 原子線ホログラフィを用いる原子線パターン形成方法 |
US6033974A (en) | 1997-05-12 | 2000-03-07 | Silicon Genesis Corporation | Method for controlled cleaving process |
US6291313B1 (en) | 1997-05-12 | 2001-09-18 | Silicon Genesis Corporation | Method and device for controlled cleaving process |
US20070122997A1 (en) | 1998-02-19 | 2007-05-31 | Silicon Genesis Corporation | Controlled process and resulting device |
US6162705A (en) | 1997-05-12 | 2000-12-19 | Silicon Genesis Corporation | Controlled cleavage process and resulting device using beta annealing |
US6027988A (en) * | 1997-05-28 | 2000-02-22 | The Regents Of The University Of California | Method of separating films from bulk substrates by plasma immersion ion implantation |
US6548382B1 (en) | 1997-07-18 | 2003-04-15 | Silicon Genesis Corporation | Gettering technique for wafers made using a controlled cleaving process |
FR2773261B1 (fr) | 1997-12-30 | 2000-01-28 | Commissariat Energie Atomique | Procede pour le transfert d'un film mince comportant une etape de creation d'inclusions |
US6291326B1 (en) | 1998-06-23 | 2001-09-18 | Silicon Genesis Corporation | Pre-semiconductor process implant and post-process film separation |
US6263941B1 (en) | 1999-08-10 | 2001-07-24 | Silicon Genesis Corporation | Nozzle for cleaving substrates |
US6221740B1 (en) | 1999-08-10 | 2001-04-24 | Silicon Genesis Corporation | Substrate cleaving tool and method |
US6500732B1 (en) | 1999-08-10 | 2002-12-31 | Silicon Genesis Corporation | Cleaving process to fabricate multilayered substrates using low implantation doses |
JP2003506883A (ja) | 1999-08-10 | 2003-02-18 | シリコン ジェネシス コーポレイション | 低打ち込みドーズ量を用いて多層基板を製造するための劈開プロセス |
CA2391317A1 (en) * | 2000-07-26 | 2002-01-31 | The Regent Of The University Of California | Manipulation of live cells and inorganic objects with optical micro beam arrays |
US6936811B2 (en) * | 2000-11-13 | 2005-08-30 | Genoptix, Inc. | Method for separating micro-particles |
US20020123112A1 (en) * | 2000-11-13 | 2002-09-05 | Genoptix | Methods for increasing detection sensitivity in optical dielectric sorting systems |
US6784420B2 (en) * | 2000-11-13 | 2004-08-31 | Genoptix, Inc. | Method of separating particles using an optical gradient |
US20030007894A1 (en) * | 2001-04-27 | 2003-01-09 | Genoptix | Methods and apparatus for use of optical forces for identification, characterization and/or sorting of particles |
US6833542B2 (en) * | 2000-11-13 | 2004-12-21 | Genoptix, Inc. | Method for sorting particles |
US6744038B2 (en) | 2000-11-13 | 2004-06-01 | Genoptix, Inc. | Methods of separating particles using an optical gradient |
US20020160470A1 (en) * | 2000-11-13 | 2002-10-31 | Genoptix | Methods and apparatus for generating and utilizing linear moving optical gradients |
US6778724B2 (en) | 2000-11-28 | 2004-08-17 | The Regents Of The University Of California | Optical switching and sorting of biological samples and microparticles transported in a micro-fluidic device, including integrated bio-chip devices |
FR2823599B1 (fr) | 2001-04-13 | 2004-12-17 | Commissariat Energie Atomique | Substrat demomtable a tenue mecanique controlee et procede de realisation |
US20040009540A1 (en) * | 2001-04-27 | 2004-01-15 | Genoptix, Inc | Detection and evaluation of cancer cells using optophoretic analysis |
US20030194755A1 (en) * | 2001-04-27 | 2003-10-16 | Genoptix, Inc. | Early detection of apoptotic events and apoptosis using optophoretic analysis |
US20040033539A1 (en) * | 2002-05-01 | 2004-02-19 | Genoptix, Inc | Method of using optical interrogation to determine a biological property of a cell or population of cells |
US20030211461A1 (en) * | 2002-05-01 | 2003-11-13 | Genoptix, Inc | Optophoretic detection of durgs exhibiting inhibitory effect on Bcr-Abl positive tumor cells |
US20040053209A1 (en) * | 2002-09-12 | 2004-03-18 | Genoptix, Inc | Detection and evaluation of topoisomerase inhibitors using optophoretic analysis |
US8187377B2 (en) | 2002-10-04 | 2012-05-29 | Silicon Genesis Corporation | Non-contact etch annealing of strained layers |
US20040067167A1 (en) * | 2002-10-08 | 2004-04-08 | Genoptix, Inc. | Methods and apparatus for optophoretic diagnosis of cells and particles |
FR2848336B1 (fr) | 2002-12-09 | 2005-10-28 | Commissariat Energie Atomique | Procede de realisation d'une structure contrainte destinee a etre dissociee |
US20040121307A1 (en) * | 2002-12-19 | 2004-06-24 | Genoptix, Inc | Early detection of cellular differentiation using optophoresis |
US20040121474A1 (en) * | 2002-12-19 | 2004-06-24 | Genoptix, Inc | Detection and evaluation of chemically-mediated and ligand-mediated t-cell activation using optophoretic analysis |
US7196337B2 (en) * | 2003-05-05 | 2007-03-27 | Cabot Microelectronics Corporation | Particle processing apparatus and methods |
FR2856844B1 (fr) | 2003-06-24 | 2006-02-17 | Commissariat Energie Atomique | Circuit integre sur puce de hautes performances |
FR2857953B1 (fr) | 2003-07-21 | 2006-01-13 | Commissariat Energie Atomique | Structure empilee, et procede pour la fabriquer |
CA2536360C (en) * | 2003-08-28 | 2013-08-06 | Celula, Inc. | Methods and apparatus for sorting cells using an optical switch in a microfluidic channel network |
FR2861497B1 (fr) | 2003-10-28 | 2006-02-10 | Soitec Silicon On Insulator | Procede de transfert catastrophique d'une couche fine apres co-implantation |
FR2889887B1 (fr) | 2005-08-16 | 2007-11-09 | Commissariat Energie Atomique | Procede de report d'une couche mince sur un support |
US9362439B2 (en) | 2008-05-07 | 2016-06-07 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled shear region |
US8993410B2 (en) | 2006-09-08 | 2015-03-31 | Silicon Genesis Corporation | Substrate cleaving under controlled stress conditions |
US8293619B2 (en) | 2008-08-28 | 2012-10-23 | Silicon Genesis Corporation | Layer transfer of films utilizing controlled propagation |
US7811900B2 (en) | 2006-09-08 | 2010-10-12 | Silicon Genesis Corporation | Method and structure for fabricating solar cells using a thick layer transfer process |
FR2910179B1 (fr) | 2006-12-19 | 2009-03-13 | Commissariat Energie Atomique | PROCEDE DE FABRICATION DE COUCHES MINCES DE GaN PAR IMPLANTATION ET RECYCLAGE D'UN SUBSTRAT DE DEPART |
FR2925221B1 (fr) | 2007-12-17 | 2010-02-19 | Commissariat Energie Atomique | Procede de transfert d'une couche mince |
US8330126B2 (en) | 2008-08-25 | 2012-12-11 | Silicon Genesis Corporation | Race track configuration and method for wafering silicon solar substrates |
US8329557B2 (en) | 2009-05-13 | 2012-12-11 | Silicon Genesis Corporation | Techniques for forming thin films by implantation with reduced channeling |
FR2947098A1 (fr) | 2009-06-18 | 2010-12-24 | Commissariat Energie Atomique | Procede de transfert d'une couche mince sur un substrat cible ayant un coefficient de dilatation thermique different de celui de la couche mince |
FR2978600B1 (fr) | 2011-07-25 | 2014-02-07 | Soitec Silicon On Insulator | Procede et dispositif de fabrication de couche de materiau semi-conducteur |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3551213A (en) * | 1968-09-04 | 1970-12-29 | Bell Telephone Labor Inc | Geometrically selective ion bombardment by means of the photoelectric effect |
US3914655A (en) * | 1973-06-28 | 1975-10-21 | Ibm | High brightness ion source |
US4074139A (en) * | 1976-12-27 | 1978-02-14 | Rca Corporation | Apparatus and method for maskless ion implantation |
-
1982
- 1982-12-08 FR FR8220564A patent/FR2537768A1/fr active Granted
-
1983
- 1983-12-02 DE DE8383402328T patent/DE3370897D1/de not_active Expired
- 1983-12-02 EP EP83402328A patent/EP0112230B1/de not_active Expired
- 1983-12-07 US US06/558,950 patent/US4536657A/en not_active Expired - Fee Related
- 1983-12-08 JP JP58230721A patent/JPS59139539A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2537768A1 (fr) | 1984-06-15 |
FR2537768B1 (de) | 1985-02-08 |
JPS59139539A (ja) | 1984-08-10 |
US4536657A (en) | 1985-08-20 |
EP0112230A1 (de) | 1984-06-27 |
EP0112230B1 (de) | 1987-04-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3370897D1 (en) | Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation | |
GB2070850B (en) | Beam scanning and method of use for ion implantation | |
GB2035358B (en) | Method for surface treatment of phosphor particles | |
IL69394A0 (en) | Method of generating energy | |
DE3274922D1 (en) | Multi-channel electron beam accessed lithography apparatus and method of operating the same | |
JPS57132653A (en) | Ion source and method of modifying property of substance | |
JPS5539694A (en) | Method of breaking ion beam | |
EP0054016A3 (en) | Apparatus for electron-beam irradiation of surfaces | |
GB2122540B (en) | Means for attenuating sound energy and method of manufacture thereof | |
DE3279331D1 (en) | Method of using an electron beam | |
PL229647A1 (en) | Fooder for animals and method of producing active substances | |
JPS5534498A (en) | Method of projecting* printing and exposing particle beam | |
DE3066694D1 (en) | Method of electron beam exposure | |
GB2098818B (en) | Method of ion implantation | |
EP0097903A3 (en) | Method of electron beam exposure | |
EP0097016A3 (en) | Electron beam exposure apparatus and method | |
GB2118949B (en) | Method of immobilizing enzymatically active materials | |
PL238644A1 (en) | Herbicide and method of manufacture of its active substance | |
EP0290620A4 (de) | Beobachtungsvorrichtung, die geladene teilchenstrahlen verwendet und eine solhe vorrichtung verwendendes oberflächenbeobachtungsverfahren. | |
JPS5787056A (en) | Method and device for strengthening neutralization of ion beam of positive charge | |
GB2143079B (en) | A method and apparatus for the corpuscular irradiation of a target | |
GB2132390B (en) | Method of and apparatus for drawing an electron beam pattern | |
JPS54162958A (en) | Method of and device for adjusting specimen for particle beam device | |
GB2125856B (en) | Improved process and apparatus for the dynamic compacting of earth | |
DE3369745D1 (en) | Mask for corpuscular lithography, method for its manufacture and of using it |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |