DE3370897D1 - Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation - Google Patents

Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation

Info

Publication number
DE3370897D1
DE3370897D1 DE8383402328T DE3370897T DE3370897D1 DE 3370897 D1 DE3370897 D1 DE 3370897D1 DE 8383402328 T DE8383402328 T DE 8383402328T DE 3370897 T DE3370897 T DE 3370897T DE 3370897 D1 DE3370897 D1 DE 3370897D1
Authority
DE
Germany
Prior art keywords
etching
density
application
ion implantation
particle beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383402328T
Other languages
English (en)
Inventor
Michel Bruel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of DE3370897D1 publication Critical patent/DE3370897D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic beam generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Particle Accelerators (AREA)
  • Drying Of Semiconductors (AREA)
DE8383402328T 1982-12-08 1983-12-02 Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation Expired DE3370897D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8220564A FR2537768A1 (fr) 1982-12-08 1982-12-08 Procede et dispositif d'obtention de faisceaux de particules de densite spatialement modulee, application a la gravure et a l'implantation ioniques

Publications (1)

Publication Number Publication Date
DE3370897D1 true DE3370897D1 (en) 1987-05-14

Family

ID=9279894

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383402328T Expired DE3370897D1 (en) 1982-12-08 1983-12-02 Method and apparatus for obtaining particle beams the density of which is spatially modulated, application to etching and to ion implantation

Country Status (5)

Country Link
US (1) US4536657A (de)
EP (1) EP0112230B1 (de)
JP (1) JPS59139539A (de)
DE (1) DE3370897D1 (de)
FR (1) FR2537768A1 (de)

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US4631096A (en) * 1984-10-01 1986-12-23 Deutsche Forschungs-Und Versuchsanstalt Fur Luft-Und Raumfahrt E.V. High energy materials containing metastable helium, a process for producing same and applications thereof
JPH07107898B2 (ja) * 1985-04-26 1995-11-15 株式会社日立製作所 表面処理方法および装置
JPS6243136A (ja) * 1985-08-20 1987-02-25 Mitsubishi Electric Corp 半導体製造装置
US4692627A (en) * 1985-10-01 1987-09-08 Mitsubishi Denki Kabushiki Kaisha Ion beam generator
JP2588172B2 (ja) * 1986-06-11 1997-03-05 株式会社日立製作所 表面処理装置
JPH0834203B2 (ja) * 1986-07-01 1996-03-29 株式会社日立製作所 ドライエツチング装置
US4914305A (en) * 1989-01-04 1990-04-03 Eaton Corporation Uniform cross section ion beam system
FR2681472B1 (fr) 1991-09-18 1993-10-29 Commissariat Energie Atomique Procede de fabrication de films minces de materiau semiconducteur.
FR2748851B1 (fr) * 1996-05-15 1998-08-07 Commissariat Energie Atomique Procede de realisation d'une couche mince de materiau semiconducteur
JP2830849B2 (ja) * 1996-07-19 1998-12-02 日本電気株式会社 原子線ホログラフィを用いる原子線パターン形成方法
US20070122997A1 (en) 1998-02-19 2007-05-31 Silicon Genesis Corporation Controlled process and resulting device
US6033974A (en) 1997-05-12 2000-03-07 Silicon Genesis Corporation Method for controlled cleaving process
US6291313B1 (en) 1997-05-12 2001-09-18 Silicon Genesis Corporation Method and device for controlled cleaving process
US6155909A (en) 1997-05-12 2000-12-05 Silicon Genesis Corporation Controlled cleavage system using pressurized fluid
US6027988A (en) * 1997-05-28 2000-02-22 The Regents Of The University Of California Method of separating films from bulk substrates by plasma immersion ion implantation
US6548382B1 (en) 1997-07-18 2003-04-15 Silicon Genesis Corporation Gettering technique for wafers made using a controlled cleaving process
FR2773261B1 (fr) * 1997-12-30 2000-01-28 Commissariat Energie Atomique Procede pour le transfert d'un film mince comportant une etape de creation d'inclusions
US6291326B1 (en) 1998-06-23 2001-09-18 Silicon Genesis Corporation Pre-semiconductor process implant and post-process film separation
US6263941B1 (en) 1999-08-10 2001-07-24 Silicon Genesis Corporation Nozzle for cleaving substrates
JP2003506883A (ja) 1999-08-10 2003-02-18 シリコン ジェネシス コーポレイション 低打ち込みドーズ量を用いて多層基板を製造するための劈開プロセス
US6500732B1 (en) 1999-08-10 2002-12-31 Silicon Genesis Corporation Cleaving process to fabricate multilayered substrates using low implantation doses
US6221740B1 (en) 1999-08-10 2001-04-24 Silicon Genesis Corporation Substrate cleaving tool and method
WO2002009483A1 (en) * 2000-07-26 2002-01-31 The Regents Of The University Of California Manipulation of live cells and inorganic objects with optical micro beam arrays
US6936811B2 (en) * 2000-11-13 2005-08-30 Genoptix, Inc. Method for separating micro-particles
US20020123112A1 (en) * 2000-11-13 2002-09-05 Genoptix Methods for increasing detection sensitivity in optical dielectric sorting systems
US6784420B2 (en) * 2000-11-13 2004-08-31 Genoptix, Inc. Method of separating particles using an optical gradient
US20030007894A1 (en) * 2001-04-27 2003-01-09 Genoptix Methods and apparatus for use of optical forces for identification, characterization and/or sorting of particles
US6833542B2 (en) * 2000-11-13 2004-12-21 Genoptix, Inc. Method for sorting particles
US20020160470A1 (en) * 2000-11-13 2002-10-31 Genoptix Methods and apparatus for generating and utilizing linear moving optical gradients
US6744038B2 (en) 2000-11-13 2004-06-01 Genoptix, Inc. Methods of separating particles using an optical gradient
US6778724B2 (en) 2000-11-28 2004-08-17 The Regents Of The University Of California Optical switching and sorting of biological samples and microparticles transported in a micro-fluidic device, including integrated bio-chip devices
FR2823599B1 (fr) 2001-04-13 2004-12-17 Commissariat Energie Atomique Substrat demomtable a tenue mecanique controlee et procede de realisation
US20030194755A1 (en) * 2001-04-27 2003-10-16 Genoptix, Inc. Early detection of apoptotic events and apoptosis using optophoretic analysis
US20040009540A1 (en) * 2001-04-27 2004-01-15 Genoptix, Inc Detection and evaluation of cancer cells using optophoretic analysis
US20040033539A1 (en) * 2002-05-01 2004-02-19 Genoptix, Inc Method of using optical interrogation to determine a biological property of a cell or population of cells
US20030211461A1 (en) * 2002-05-01 2003-11-13 Genoptix, Inc Optophoretic detection of durgs exhibiting inhibitory effect on Bcr-Abl positive tumor cells
US20040053209A1 (en) * 2002-09-12 2004-03-18 Genoptix, Inc Detection and evaluation of topoisomerase inhibitors using optophoretic analysis
US8187377B2 (en) 2002-10-04 2012-05-29 Silicon Genesis Corporation Non-contact etch annealing of strained layers
US20040067167A1 (en) * 2002-10-08 2004-04-08 Genoptix, Inc. Methods and apparatus for optophoretic diagnosis of cells and particles
FR2848336B1 (fr) 2002-12-09 2005-10-28 Commissariat Energie Atomique Procede de realisation d'une structure contrainte destinee a etre dissociee
US20040121474A1 (en) * 2002-12-19 2004-06-24 Genoptix, Inc Detection and evaluation of chemically-mediated and ligand-mediated t-cell activation using optophoretic analysis
US20040121307A1 (en) * 2002-12-19 2004-06-24 Genoptix, Inc Early detection of cellular differentiation using optophoresis
US7196337B2 (en) * 2003-05-05 2007-03-27 Cabot Microelectronics Corporation Particle processing apparatus and methods
FR2856844B1 (fr) 2003-06-24 2006-02-17 Commissariat Energie Atomique Circuit integre sur puce de hautes performances
FR2857953B1 (fr) 2003-07-21 2006-01-13 Commissariat Energie Atomique Structure empilee, et procede pour la fabriquer
CN1860363B (zh) * 2003-08-28 2011-12-28 赛路拉公司 用于在微流通道网络中使用光学开关将细胞分类的方法和设备
FR2861497B1 (fr) 2003-10-28 2006-02-10 Soitec Silicon On Insulator Procede de transfert catastrophique d'une couche fine apres co-implantation
FR2889887B1 (fr) 2005-08-16 2007-11-09 Commissariat Energie Atomique Procede de report d'une couche mince sur un support
US9362439B2 (en) 2008-05-07 2016-06-07 Silicon Genesis Corporation Layer transfer of films utilizing controlled shear region
US8993410B2 (en) 2006-09-08 2015-03-31 Silicon Genesis Corporation Substrate cleaving under controlled stress conditions
US7811900B2 (en) 2006-09-08 2010-10-12 Silicon Genesis Corporation Method and structure for fabricating solar cells using a thick layer transfer process
US8293619B2 (en) 2008-08-28 2012-10-23 Silicon Genesis Corporation Layer transfer of films utilizing controlled propagation
FR2910179B1 (fr) 2006-12-19 2009-03-13 Commissariat Energie Atomique PROCEDE DE FABRICATION DE COUCHES MINCES DE GaN PAR IMPLANTATION ET RECYCLAGE D'UN SUBSTRAT DE DEPART
FR2925221B1 (fr) 2007-12-17 2010-02-19 Commissariat Energie Atomique Procede de transfert d'une couche mince
US8330126B2 (en) 2008-08-25 2012-12-11 Silicon Genesis Corporation Race track configuration and method for wafering silicon solar substrates
US8329557B2 (en) 2009-05-13 2012-12-11 Silicon Genesis Corporation Techniques for forming thin films by implantation with reduced channeling
FR2947098A1 (fr) 2009-06-18 2010-12-24 Commissariat Energie Atomique Procede de transfert d'une couche mince sur un substrat cible ayant un coefficient de dilatation thermique different de celui de la couche mince
FR2978600B1 (fr) 2011-07-25 2014-02-07 Soitec Silicon On Insulator Procede et dispositif de fabrication de couche de materiau semi-conducteur

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US3551213A (en) * 1968-09-04 1970-12-29 Bell Telephone Labor Inc Geometrically selective ion bombardment by means of the photoelectric effect
US3914655A (en) * 1973-06-28 1975-10-21 Ibm High brightness ion source
US4074139A (en) * 1976-12-27 1978-02-14 Rca Corporation Apparatus and method for maskless ion implantation

Also Published As

Publication number Publication date
EP0112230A1 (de) 1984-06-27
US4536657A (en) 1985-08-20
FR2537768A1 (fr) 1984-06-15
FR2537768B1 (de) 1985-02-08
JPS59139539A (ja) 1984-08-10
EP0112230B1 (de) 1987-04-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee