DE3377815D1 - Alignment and focusing system for a scanning mask aligner - Google Patents
Alignment and focusing system for a scanning mask alignerInfo
- Publication number
- DE3377815D1 DE3377815D1 DE8383109458T DE3377815T DE3377815D1 DE 3377815 D1 DE3377815 D1 DE 3377815D1 DE 8383109458 T DE8383109458 T DE 8383109458T DE 3377815 T DE3377815 T DE 3377815T DE 3377815 D1 DE3377815 D1 DE 3377815D1
- Authority
- DE
- Germany
- Prior art keywords
- alignment
- focusing system
- mask aligner
- scanning mask
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/451,900 US4549084A (en) | 1982-12-21 | 1982-12-21 | Alignment and focusing system for a scanning mask aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3377815D1 true DE3377815D1 (en) | 1988-09-29 |
Family
ID=23794161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383109458T Expired DE3377815D1 (en) | 1982-12-21 | 1983-09-22 | Alignment and focusing system for a scanning mask aligner |
Country Status (5)
Country | Link |
---|---|
US (1) | US4549084A (de) |
EP (1) | EP0111648B1 (de) |
JP (1) | JPS59132621A (de) |
CA (1) | CA1253021A (de) |
DE (1) | DE3377815D1 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4634876A (en) * | 1983-05-13 | 1987-01-06 | Canon Kabushiki Kaisha | Object position detecting apparatus using accumulation type sensor |
EP0135597B1 (de) * | 1983-09-23 | 1987-07-22 | Ibm Deutschland Gmbh | Verfahren und Einrichtung zum gegenseitigen Ausrichten von Objekten |
US4645338A (en) * | 1985-04-26 | 1987-02-24 | International Business Machines Corporation | Optical system for focus correction for a lithographic tool |
GB2186359B (en) * | 1986-01-18 | 1990-05-30 | Automatix International U K Li | Automatically and accurately positioning a workpiece |
WO1988000362A1 (en) * | 1986-06-24 | 1988-01-14 | Stephen Hugh Salter | Improved registration method in photolithography and equipment for carrying out this method |
US4965842A (en) * | 1986-07-22 | 1990-10-23 | Schlumberger Technologies, Inc. | Method and apparatus for measuring feature dimensions using controlled dark-field illumination |
US5109430A (en) * | 1986-07-22 | 1992-04-28 | Schlumberger Technologies, Inc. | Mask alignment and measurement of critical dimensions in integrated circuits |
JPS63128713A (ja) * | 1986-11-19 | 1988-06-01 | Matsushita Electric Ind Co Ltd | 走査型露光装置のデイスト−シヨン補正方法 |
US4908656A (en) * | 1988-01-21 | 1990-03-13 | Nikon Corporation | Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision |
US5047631A (en) * | 1989-12-22 | 1991-09-10 | Synergy Computer Graphics Corporation | Self-referencing start of plot system and method |
US5289262A (en) * | 1992-03-09 | 1994-02-22 | Calcomp Inc. | Photodiode transmissive media sensor for aligning media |
US5477057A (en) * | 1994-08-17 | 1995-12-19 | Svg Lithography Systems, Inc. | Off axis alignment system for scanning photolithography |
US5991004A (en) * | 1996-04-03 | 1999-11-23 | Mrs Technology, Inc. | Lens focus shift sensor |
GB9705105D0 (en) | 1997-03-12 | 1997-04-30 | Brown & Sharpe Limited | Optical surface measurement apparatus and methods |
US5767523A (en) * | 1997-04-09 | 1998-06-16 | Svg Lithography Systems, Inc. | Multiple detector alignment system for photolithography |
US7095904B2 (en) * | 2000-04-12 | 2006-08-22 | Ultratech, Inc. | Method and apparatus for determining best focus using dark-field imaging |
US6628406B1 (en) | 2000-04-20 | 2003-09-30 | Justin L. Kreuzer | Self referencing mark independent alignment sensor |
US6956659B2 (en) * | 2001-05-22 | 2005-10-18 | Nikon Precision Inc. | Measurement of critical dimensions of etched features |
US6535280B1 (en) * | 2001-08-31 | 2003-03-18 | Advanced Micro Devices, Inc. | Phase-shift-moiré focus monitor |
US6974653B2 (en) * | 2002-04-19 | 2005-12-13 | Nikon Precision Inc. | Methods for critical dimension and focus mapping using critical dimension test marks |
US7130020B2 (en) * | 2003-04-30 | 2006-10-31 | Whitney Theodore R | Roll printer with decomposed raster scan and X-Y distortion correction |
KR100712289B1 (ko) * | 2005-04-07 | 2007-04-27 | 삼성에스디아이 주식회사 | 평판표시장치 및 그의 제조방법 |
US7511826B2 (en) * | 2006-02-27 | 2009-03-31 | Asml Holding N.V. | Symmetrical illumination forming system and method |
JP4274214B2 (ja) * | 2006-09-08 | 2009-06-03 | セイコーエプソン株式会社 | 液体噴射ヘッドのアライメント装置及びそのアラインメント方法 |
CN112305708B (zh) * | 2019-07-29 | 2023-04-18 | 英属开曼群岛商音飞光电科技股份有限公司 | 薄膜光学镜头装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3957364A (en) * | 1974-09-26 | 1976-05-18 | The Perkin-Elmer Corporation | Coarse viewing system for an annular field projection system |
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
JPS53135654A (en) * | 1977-05-01 | 1978-11-27 | Canon Inc | Photoelectric detecting device |
CH629000A5 (de) * | 1978-05-22 | 1982-03-31 | Bbc Brown Boveri & Cie | Verfahren zum optischen justieren von bauelementen. |
JPS5534490A (en) * | 1978-09-01 | 1980-03-11 | Canon Inc | Alignment device |
FR2450468A1 (fr) * | 1979-02-27 | 1980-09-26 | Thomson Csf | Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme |
US4353087A (en) * | 1979-03-12 | 1982-10-05 | The Perkin-Elmer Corporation | Automatic mask alignment |
JPS56122128A (en) * | 1980-02-29 | 1981-09-25 | Telmec Co Ltd | Positioning system for printing device of semiconductor or the like |
JPS56130707A (en) * | 1980-03-18 | 1981-10-13 | Canon Inc | Photo-printing device |
US4326805A (en) * | 1980-04-11 | 1982-04-27 | Bell Telephone Laboratories, Incorporated | Method and apparatus for aligning mask and wafer members |
-
1982
- 1982-12-21 US US06/451,900 patent/US4549084A/en not_active Expired - Fee Related
-
1983
- 1983-09-20 CA CA000437145A patent/CA1253021A/en not_active Expired
- 1983-09-22 EP EP83109458A patent/EP0111648B1/de not_active Expired
- 1983-09-22 DE DE8383109458T patent/DE3377815D1/de not_active Expired
- 1983-12-20 JP JP58238996A patent/JPS59132621A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
US4549084A (en) | 1985-10-22 |
JPH0442815B2 (de) | 1992-07-14 |
CA1253021A (en) | 1989-04-25 |
EP0111648A1 (de) | 1984-06-27 |
JPS59132621A (ja) | 1984-07-30 |
EP0111648B1 (de) | 1988-08-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3377815D1 (en) | Alignment and focusing system for a scanning mask aligner | |
GB8321335D0 (en) | Projection aligner | |
GB2153543B (en) | A projection exposure apparatus | |
EP0154404A3 (en) | Processing system for aligning two picture images | |
DE3372236D1 (en) | A video retouching system | |
GB8723949D0 (en) | Exposure apparatus | |
GB2166879B (en) | A projection apparatus | |
EP0063289A3 (en) | Apparatus for aligning a wafer | |
DE3361393D1 (en) | Photographic registration process | |
DE3371454D1 (en) | Method for scanning a line-transfer photosensitive device, and apparatus for carrying out the method | |
DE3469111D1 (en) | Thermo-mechanical overlay signature tuning for photolithographic mask aligner | |
DE3573864D1 (en) | Alignment method for reduction projection type aligner | |
DE3572042D1 (en) | Projection lens system | |
DE3574187D1 (en) | Apparatus for optical micro-lithography with a local alignment system | |
DE3572405D1 (en) | Projection lens system | |
GB8719915D0 (en) | Apparatus for exposure | |
GB8327928D0 (en) | Aligning system | |
GB2122372B (en) | System for combining an image into a microscope | |
DE3466831D1 (en) | Alignment technique for a scanning beam | |
GB2122385B (en) | Brightness-control apparatus for a system for reflecting images into a microscope | |
DE3573326D1 (en) | A projection aligner of a lithographic system | |
DE3379487D1 (en) | Scanning electron-beam exposure system | |
DE3365534D1 (en) | Projection alignment apparatus | |
GB2160774B (en) | A device for influencing terrestrial radiation | |
DE3366489D1 (en) | Scanning method for a line-transfer photosensitive device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: SVG LITHOGRAPHY SYSTEMS, INC., WILTON, CONN., US |
|
8328 | Change in the person/name/address of the agent |
Free format text: GRUENECKER, A., DIPL.-ING. KINKELDEY, H., DIPL.-ING. DR.-ING. STOCKMAIR, W., DIPL.-ING. DR.-ING. AE.E. CAL TECH SCHUMANN, K., DIPL.-PHYS. DR.RER.NAT. JAKOB, P., DIPL.-ING. BEZOLD, G., DIPL.-CHEM. DR.RER.NAT. MEISTER, W., DIPL.-ING. HILGERS, H., DIPL.-ING. MEYER-PLATH, H., DIPL.-ING. DR.-ING. EHNOLD, A., DIPL.-ING. SCHUSTER, T., DIPL.-PHYS. GOLDBACH, K., DIPL.-ING.DR.-ING. AUFENANGER, M., DIPL.-ING. KLITZSCH, G., DIPL.-ING., PAT.-ANWAELTE, 8000 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |