DE3470611D1 - Pattern transfer device and method - Google Patents

Pattern transfer device and method

Info

Publication number
DE3470611D1
DE3470611D1 DE8484101498T DE3470611T DE3470611D1 DE 3470611 D1 DE3470611 D1 DE 3470611D1 DE 8484101498 T DE8484101498 T DE 8484101498T DE 3470611 T DE3470611 T DE 3470611T DE 3470611 D1 DE3470611 D1 DE 3470611D1
Authority
DE
Germany
Prior art keywords
transfer device
pattern transfer
pattern
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484101498T
Other languages
English (en)
Inventor
Kuniya Shimazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3470611D1 publication Critical patent/DE3470611D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
DE8484101498T 1983-02-14 1984-02-14 Pattern transfer device and method Expired DE3470611D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58022511A JPS59150424A (ja) 1983-02-14 1983-02-14 半導体装置の製造装置および方法

Publications (1)

Publication Number Publication Date
DE3470611D1 true DE3470611D1 (en) 1988-05-26

Family

ID=12084781

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484101498T Expired DE3470611D1 (en) 1983-02-14 1984-02-14 Pattern transfer device and method

Country Status (4)

Country Link
US (1) US4577945A (de)
EP (1) EP0116940B1 (de)
JP (1) JPS59150424A (de)
DE (1) DE3470611D1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0722101B2 (ja) * 1985-08-29 1995-03-08 株式会社ニコン 投影型露光装置用遮風装置
NL8601547A (nl) * 1986-06-16 1988-01-18 Philips Nv Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.
ATE63008T1 (de) * 1986-09-05 1991-05-15 Staude Foto Chemie Eva Vorrichtung und verfahren zur verfilmung von dokumenten.
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JP2864060B2 (ja) * 1991-09-04 1999-03-03 キヤノン株式会社 縮小投影型露光装置及び方法
JP5134767B2 (ja) * 2005-04-19 2013-01-30 株式会社オーク製作所 描画データ補正機能を有する描画装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3744902A (en) * 1968-10-23 1973-07-10 Siemens Ag Device for producing a photo-varnish mask
US4108941A (en) * 1976-04-26 1978-08-22 Dolco Packaging Corporation Shear molding of reinforced latch
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
US4190325A (en) * 1977-12-02 1980-02-26 Ford Motor Company Thermal compensator assembly
DE3070825D1 (en) * 1979-04-02 1985-08-08 Eaton Optimetrix Inc A system for positioning a utilization device
US4383757A (en) * 1979-04-02 1983-05-17 Optimetrix Corporation Optical focusing system
US4414749A (en) * 1979-07-02 1983-11-15 Optimetrix Corporation Alignment and exposure system with an indicium of an axis of motion of the system
JPS57192929A (en) * 1981-05-25 1982-11-27 Hitachi Ltd Projector provided with automatic focusing function

Also Published As

Publication number Publication date
JPS59150424A (ja) 1984-08-28
EP0116940A2 (de) 1984-08-29
US4577945A (en) 1986-03-25
EP0116940B1 (de) 1988-04-20
EP0116940A3 (en) 1985-01-30

Similar Documents

Publication Publication Date Title
DE3473431D1 (en) Fluid transfer method and device
EP0128820A3 (en) Pattern matching method and apparatus
DE3275286D1 (en) Web transfer apparatus and method
DE3473776D1 (en) Etching method and apparatus
DE3465386D1 (en) Transfer device
DE3467987D1 (en) Transfer moulding method and apparatus
PH25939A (en) Transfer apparatus and method
PT75426A (en) Method and filter-thickening apparatus
EP0163300A3 (en) Image transfer apparatus and method
GB2131001B (en) Currency-dispensing method and apparatus
EP0146898A3 (en) Yarn-threading method and device
GB8307963D0 (en) Method and apparatus
DE3473217D1 (en) Transfer apparatus
GB2129356B (en) Billet-shearing method and apparatus
EP0125670A3 (en) Printing method and device
DE3472390D1 (en) Transfer apparatus and method
DE3470611D1 (en) Pattern transfer device and method
DE3465935D1 (en) Printing method and apparatus
GB8419115D0 (en) Transfer device
DE3480533D1 (en) Method and device for electroerosion-polishing
GB2142854B (en) Draw-bending apparatus and method
GB2169813B (en) Compost-making apparatus and method
GB8410836D0 (en) Transfer device
GB2190058B (en) Workpiece transfer device and method
GB2143451B (en) Mold transfer apparatus and method

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee