DE3670398D1 - Quelle fluessiger metallionen. - Google Patents

Quelle fluessiger metallionen.

Info

Publication number
DE3670398D1
DE3670398D1 DE8787903539T DE3670398T DE3670398D1 DE 3670398 D1 DE3670398 D1 DE 3670398D1 DE 8787903539 T DE8787903539 T DE 8787903539T DE 3670398 T DE3670398 T DE 3670398T DE 3670398 D1 DE3670398 D1 DE 3670398D1
Authority
DE
Germany
Prior art keywords
metalions
source
liquid
liquid metalions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787903539T
Other languages
English (en)
Inventor
Kaoru Umemura
Tohru Ishitani
Toshiyuki Aida
Hifumi Tamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3670398D1 publication Critical patent/DE3670398D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8787903539T 1985-12-13 1986-12-05 Quelle fluessiger metallionen. Expired - Lifetime DE3670398D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP60278925A JPH0685309B2 (ja) 1985-12-13 1985-12-13 液体金属イオン源
PCT/JP1986/000618 WO1987003739A1 (en) 1985-12-13 1986-12-05 Liquid metal ion source

Publications (1)

Publication Number Publication Date
DE3670398D1 true DE3670398D1 (de) 1990-05-17

Family

ID=17603991

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787903539T Expired - Lifetime DE3670398D1 (de) 1985-12-13 1986-12-05 Quelle fluessiger metallionen.

Country Status (5)

Country Link
US (1) US4774414A (de)
EP (1) EP0248914B1 (de)
JP (1) JPH0685309B2 (de)
DE (1) DE3670398D1 (de)
WO (1) WO1987003739A1 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089746A (en) * 1989-02-14 1992-02-18 Varian Associates, Inc. Production of ion beams by chemically enhanced sputtering of solids
JPH02250238A (ja) * 1989-03-24 1990-10-08 Denki Kagaku Kogyo Kk 液体金属イオン源
US5034612A (en) * 1989-05-26 1991-07-23 Micrion Corporation Ion source method and apparatus
DE69018697T2 (de) * 1989-05-26 1996-01-04 Micrion Corp Herstellungsverfahren und Vorrichtung für Ionenquelle.
US5447763A (en) * 1990-08-17 1995-09-05 Ion Systems, Inc. Silicon ion emitter electrodes
US5504340A (en) * 1993-03-10 1996-04-02 Hitachi, Ltd. Process method and apparatus using focused ion beam generating means
DE4312028A1 (de) * 1993-04-13 1994-10-20 Rossendorf Forschzent Flüssigmetall-Ionenquelle zur Erzeugung von Kobalt-Ionenstrahlen
GB2283934B (en) * 1993-11-18 1996-04-24 Univ Middlesex Serv Ltd A silver/germanium alloy
US6168071B1 (en) 1994-11-17 2001-01-02 Peter Gamon Johns Method for joining materials together by a diffusion process using silver/germanium alloys and a silver/germanium alloy for use in the method
US7557361B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7786452B2 (en) * 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7554097B2 (en) * 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7557359B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7554096B2 (en) * 2003-10-16 2009-06-30 Alis Corporation Ion sources, systems and methods
US7557360B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) * 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7557358B2 (en) * 2003-10-16 2009-07-07 Alis Corporation Ion sources, systems and methods
US7129513B2 (en) * 2004-06-02 2006-10-31 Xintek, Inc. Field emission ion source based on nanostructure-containing material
DE602004005442T2 (de) * 2004-07-28 2007-12-06 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter für eine Ionenquelle und Verfahren zu dessen Herstellung
KR101359562B1 (ko) * 2005-07-08 2014-02-07 넥스젠 세미 홀딩 인코포레이티드 제어 입자 빔 제조를 위한 장치 및 방법
US7804068B2 (en) * 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
WO2008140585A1 (en) 2006-11-22 2008-11-20 Nexgen Semi Holding, Inc. Apparatus and method for conformal mask manufacturing
EP2301058A1 (de) * 2008-06-13 2011-03-30 Carl Zeiss NTS, LLC. Ionenquellen, systeme und verfahren
US10566169B1 (en) 2008-06-30 2020-02-18 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US10991545B2 (en) 2008-06-30 2021-04-27 Nexgen Semi Holding, Inc. Method and device for spatial charged particle bunching
US20100006447A1 (en) * 2008-07-08 2010-01-14 Ict, Integrated Circuit Testing Gesellschaft Fuer Halbleiterprueftechnik Mbh Method of preparing an ultra sharp tip, apparatus for preparing an ultra sharp tip, and use of an apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4367429A (en) * 1980-11-03 1983-01-04 Hughes Aircraft Company Alloys for liquid metal ion sources
JPS57132632A (en) * 1981-02-09 1982-08-17 Hitachi Ltd Ion source
JPS59191225A (ja) * 1983-04-15 1984-10-30 Hitachi Ltd 液体金属イオン種合金
US4556798A (en) * 1983-07-12 1985-12-03 Hughes Aircraft Company Focused ion beam column
JPH0622094B2 (ja) * 1983-11-28 1994-03-23 株式会社日立製作所 液体金属イオン源
JPS60150535A (ja) * 1984-01-17 1985-08-08 Agency Of Ind Science & Technol 電界放出型イオンビ−ム発生装置用液体金属イオン源
US4629931A (en) * 1984-11-20 1986-12-16 Hughes Aircraft Company Liquid metal ion source
US4686414A (en) * 1984-11-20 1987-08-11 Hughes Aircraft Company Enhanced wetting of liquid metal alloy ion sources
US4617203A (en) * 1985-04-08 1986-10-14 Hughes Aircraft Company Preparation of liquid metal source structures for use in ion beam evaporation of boron-containing alloys
US4670685A (en) * 1986-04-14 1987-06-02 Hughes Aircraft Company Liquid metal ion source and alloy for ion emission of multiple ionic species
JPH0656327A (ja) * 1992-08-06 1994-03-01 Ricoh Co Ltd シート状搬送物のスタック装置

Also Published As

Publication number Publication date
US4774414A (en) 1988-09-27
WO1987003739A1 (en) 1987-06-18
EP0248914A4 (de) 1988-09-28
JPS62139227A (ja) 1987-06-22
EP0248914A1 (de) 1987-12-16
JPH0685309B2 (ja) 1994-10-26
EP0248914B1 (de) 1990-04-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee