DE3779450D1 - Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung. - Google Patents
Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung.Info
- Publication number
- DE3779450D1 DE3779450D1 DE8787103129T DE3779450T DE3779450D1 DE 3779450 D1 DE3779450 D1 DE 3779450D1 DE 8787103129 T DE8787103129 T DE 8787103129T DE 3779450 T DE3779450 T DE 3779450T DE 3779450 D1 DE3779450 D1 DE 3779450D1
- Authority
- DE
- Germany
- Prior art keywords
- processing
- improving adhesion
- lamination
- photo paint
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/837,389 US4693959A (en) | 1986-03-07 | 1986-03-07 | Adhesion promotion in photoresist lamination and processing |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3779450D1 true DE3779450D1 (de) | 1992-07-09 |
DE3779450T2 DE3779450T2 (de) | 1993-01-28 |
Family
ID=25274301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787103129T Expired - Fee Related DE3779450T2 (de) | 1986-03-07 | 1987-03-05 | Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung. |
Country Status (9)
Country | Link |
---|---|
US (1) | US4693959A (de) |
EP (1) | EP0236950B1 (de) |
JP (1) | JPS62240950A (de) |
KR (1) | KR900006040B1 (de) |
BR (1) | BR8700993A (de) |
CA (1) | CA1295169C (de) |
DE (1) | DE3779450T2 (de) |
HK (1) | HK73592A (de) |
SG (1) | SG77192G (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4976817A (en) * | 1988-12-09 | 1990-12-11 | Morton International, Inc. | Wet lamination process and apparatus |
JPH02202570A (ja) * | 1989-01-30 | 1990-08-10 | Nitto Denko Corp | 感光材料固定用両面接着テープ |
US5047313A (en) * | 1989-08-21 | 1991-09-10 | E. I. Du Pont De Nemours And Company | Photosensitive semi-aqueous developable copper conductor composition |
JP2733143B2 (ja) * | 1991-03-14 | 1998-03-30 | 冨士薬品工業株式会社 | 蛍光面形成用感光性組成物 |
US5268260A (en) * | 1991-10-22 | 1993-12-07 | International Business Machines Corporation | Photoresist develop and strip solvent compositions and method for their use |
US5989689A (en) * | 1991-12-11 | 1999-11-23 | The Chromaline Corporation | Sandblast mask laminate with blastable pressure sensitive adhesive |
US5358825A (en) * | 1993-03-24 | 1994-10-25 | Amp-Akzo Corporation | Manufacture of printed circuit conductors by a partially additive process |
US6547974B1 (en) * | 1995-06-27 | 2003-04-15 | International Business Machines Corporation | Method of producing fine-line circuit boards using chemical polishing |
US6001893A (en) * | 1996-05-17 | 1999-12-14 | Datacard Corporation | Curable topcoat composition and methods for use |
US6093335A (en) * | 1996-08-28 | 2000-07-25 | International Business Machines Corporation | Method of surface finishes for eliminating surface irregularities and defects |
EP1190277B1 (de) | 1999-06-10 | 2009-10-07 | AlliedSignal Inc. | Spin-on-glass antireflektionsbeschichtungen aufweisender halbleiter für photolithographie |
US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
US6297294B1 (en) * | 1999-10-07 | 2001-10-02 | E. I. Du Pont De Nemours And Company | Method for improving the adhesion of a photopolymerizable composition to copper |
KR20040075866A (ko) | 2001-11-15 | 2004-08-30 | 허니웰 인터내셔날 인코포레이티드 | 포토리소그래피용 스핀-온 무반사 코팅 |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
TWI257189B (en) * | 2004-12-08 | 2006-06-21 | Nan Ya Printed Circuit Board C | Electrode plate of a flat panel direct methanol fuel cell and manufacturing method thereof |
JP2006330193A (ja) * | 2005-05-24 | 2006-12-07 | Hitachi Chem Co Ltd | 感光性樹脂組成物、感光性エレメント及びこれらを用いたプリント配線板の製造方法 |
US20080156346A1 (en) * | 2006-12-28 | 2008-07-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for cleaning a substrate |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
US10243121B2 (en) | 2011-06-24 | 2019-03-26 | Cree, Inc. | High voltage monolithic LED chip with improved reliability |
GB201223064D0 (en) * | 2012-12-20 | 2013-02-06 | Rainbow Technology Systems Ltd | Curable coatings for photoimaging |
EP3194502A4 (de) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
US3645722A (en) * | 1969-09-04 | 1972-02-29 | Carpenter Technology Corp | Free machining stainless steel alloy |
US3622234A (en) * | 1969-12-29 | 1971-11-23 | Gen Electric | Hot corrosion resistant superalloys |
US4056453A (en) * | 1973-11-27 | 1977-11-01 | Basf Aktiengesellschaft | Uv-curing printing inks |
US4312934A (en) * | 1976-10-21 | 1982-01-26 | Bard Laboratories, Inc. | Photosensitive compositions |
US4293635A (en) * | 1980-05-27 | 1981-10-06 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition with polymeric binder |
DE3045516A1 (de) * | 1980-12-03 | 1982-07-08 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches mehrschichtenmaterial und verfahren zur herstellung von haftschichten dafuer |
US4442198A (en) * | 1981-01-16 | 1984-04-10 | W. R. Grace & Co. | Polymer composition having terminal alkene and terminal carboxyl groups |
US4528261A (en) * | 1983-03-28 | 1985-07-09 | E. I. Du Pont De Nemours And Company | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards |
-
1986
- 1986-03-07 US US06/837,389 patent/US4693959A/en not_active Expired - Fee Related
-
1987
- 1987-02-27 BR BR8700993A patent/BR8700993A/pt unknown
- 1987-03-03 CA CA000531062A patent/CA1295169C/en not_active Expired - Lifetime
- 1987-03-05 EP EP87103129A patent/EP0236950B1/de not_active Expired - Lifetime
- 1987-03-05 DE DE8787103129T patent/DE3779450T2/de not_active Expired - Fee Related
- 1987-03-06 JP JP62050420A patent/JPS62240950A/ja active Granted
- 1987-03-07 KR KR878702061A patent/KR900006040B1/ko not_active IP Right Cessation
-
1992
- 1992-07-28 SG SG771/92A patent/SG77192G/en unknown
- 1992-09-24 HK HK735/92A patent/HK73592A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
SG77192G (en) | 1992-10-02 |
KR870009617A (ko) | 1987-10-27 |
KR900006040B1 (en) | 1990-08-20 |
DE3779450T2 (de) | 1993-01-28 |
HK73592A (en) | 1992-10-02 |
EP0236950B1 (de) | 1992-06-03 |
EP0236950A2 (de) | 1987-09-16 |
US4693959A (en) | 1987-09-15 |
JPH0415464B2 (de) | 1992-03-18 |
CA1295169C (en) | 1992-02-04 |
BR8700993A (pt) | 1987-12-22 |
JPS62240950A (ja) | 1987-10-21 |
EP0236950A3 (en) | 1989-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |