DE3779450T2 - Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung. - Google Patents

Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung.

Info

Publication number
DE3779450T2
DE3779450T2 DE8787103129T DE3779450T DE3779450T2 DE 3779450 T2 DE3779450 T2 DE 3779450T2 DE 8787103129 T DE8787103129 T DE 8787103129T DE 3779450 T DE3779450 T DE 3779450T DE 3779450 T2 DE3779450 T2 DE 3779450T2
Authority
DE
Germany
Prior art keywords
processing
improving adhesion
lamination
photo paint
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787103129T
Other languages
English (en)
Other versions
DE3779450D1 (de
Inventor
Robert William Ashcraft
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE3779450D1 publication Critical patent/DE3779450D1/de
Publication of DE3779450T2 publication Critical patent/DE3779450T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
DE8787103129T 1986-03-07 1987-03-05 Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung. Expired - Fee Related DE3779450T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/837,389 US4693959A (en) 1986-03-07 1986-03-07 Adhesion promotion in photoresist lamination and processing

Publications (2)

Publication Number Publication Date
DE3779450D1 DE3779450D1 (de) 1992-07-09
DE3779450T2 true DE3779450T2 (de) 1993-01-28

Family

ID=25274301

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787103129T Expired - Fee Related DE3779450T2 (de) 1986-03-07 1987-03-05 Verfahren zur adhaesionsverbesserung bei photolack-laminierung und -verarbeitung.

Country Status (9)

Country Link
US (1) US4693959A (de)
EP (1) EP0236950B1 (de)
JP (1) JPS62240950A (de)
KR (1) KR900006040B1 (de)
BR (1) BR8700993A (de)
CA (1) CA1295169C (de)
DE (1) DE3779450T2 (de)
HK (1) HK73592A (de)
SG (1) SG77192G (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4976817A (en) * 1988-12-09 1990-12-11 Morton International, Inc. Wet lamination process and apparatus
JPH02202570A (ja) * 1989-01-30 1990-08-10 Nitto Denko Corp 感光材料固定用両面接着テープ
US5047313A (en) * 1989-08-21 1991-09-10 E. I. Du Pont De Nemours And Company Photosensitive semi-aqueous developable copper conductor composition
JP2733143B2 (ja) * 1991-03-14 1998-03-30 冨士薬品工業株式会社 蛍光面形成用感光性組成物
US5268260A (en) * 1991-10-22 1993-12-07 International Business Machines Corporation Photoresist develop and strip solvent compositions and method for their use
US5989689A (en) * 1991-12-11 1999-11-23 The Chromaline Corporation Sandblast mask laminate with blastable pressure sensitive adhesive
US5358825A (en) * 1993-03-24 1994-10-25 Amp-Akzo Corporation Manufacture of printed circuit conductors by a partially additive process
US6547974B1 (en) * 1995-06-27 2003-04-15 International Business Machines Corporation Method of producing fine-line circuit boards using chemical polishing
US6001893A (en) 1996-05-17 1999-12-14 Datacard Corporation Curable topcoat composition and methods for use
US6093335A (en) * 1996-08-28 2000-07-25 International Business Machines Corporation Method of surface finishes for eliminating surface irregularities and defects
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
US6297294B1 (en) * 1999-10-07 2001-10-02 E. I. Du Pont De Nemours And Company Method for improving the adhesion of a photopolymerizable composition to copper
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
TWI257189B (en) * 2004-12-08 2006-06-21 Nan Ya Printed Circuit Board C Electrode plate of a flat panel direct methanol fuel cell and manufacturing method thereof
JP2006330193A (ja) * 2005-05-24 2006-12-07 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれらを用いたプリント配線板の製造方法
US20080156346A1 (en) * 2006-12-28 2008-07-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for cleaning a substrate
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US10243121B2 (en) 2011-06-24 2019-03-26 Cree, Inc. High voltage monolithic LED chip with improved reliability
GB201223064D0 (en) * 2012-12-20 2013-02-06 Rainbow Technology Systems Ltd Curable coatings for photoimaging
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3645722A (en) * 1969-09-04 1972-02-29 Carpenter Technology Corp Free machining stainless steel alloy
US3622234A (en) * 1969-12-29 1971-11-23 Gen Electric Hot corrosion resistant superalloys
US4056453A (en) * 1973-11-27 1977-11-01 Basf Aktiengesellschaft Uv-curing printing inks
US4312934A (en) * 1976-10-21 1982-01-26 Bard Laboratories, Inc. Photosensitive compositions
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
DE3045516A1 (de) * 1980-12-03 1982-07-08 Basf Ag, 6700 Ludwigshafen Lichtempfindliches mehrschichtenmaterial und verfahren zur herstellung von haftschichten dafuer
US4442198A (en) * 1981-01-16 1984-04-10 W. R. Grace & Co. Polymer composition having terminal alkene and terminal carboxyl groups
US4528261A (en) * 1983-03-28 1985-07-09 E. I. Du Pont De Nemours And Company Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards

Also Published As

Publication number Publication date
JPS62240950A (ja) 1987-10-21
CA1295169C (en) 1992-02-04
DE3779450D1 (de) 1992-07-09
EP0236950B1 (de) 1992-06-03
KR870009617A (ko) 1987-10-27
US4693959A (en) 1987-09-15
KR900006040B1 (en) 1990-08-20
BR8700993A (pt) 1987-12-22
JPH0415464B2 (de) 1992-03-18
EP0236950A2 (de) 1987-09-16
HK73592A (en) 1992-10-02
EP0236950A3 (en) 1989-03-22
SG77192G (en) 1992-10-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee