DE502005008856D1 - Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung - Google Patents
Zinnbeschichtete Leiterplatten mit geringer Neigung zur WhiskerbildungInfo
- Publication number
- DE502005008856D1 DE502005008856D1 DE502005008856T DE502005008856T DE502005008856D1 DE 502005008856 D1 DE502005008856 D1 DE 502005008856D1 DE 502005008856 T DE502005008856 T DE 502005008856T DE 502005008856 T DE502005008856 T DE 502005008856T DE 502005008856 D1 DE502005008856 D1 DE 502005008856D1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- tin
- circuit boards
- little tendency
- whisker formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/032—Materials
- H05K2201/0329—Intrinsically conductive polymer [ICP]; Semiconductive polymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/072—Electroless plating, e.g. finish plating or initial plating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/125—Deflectable by temperature change [e.g., thermostat element]
- Y10T428/12514—One component Cu-based
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12556—Organic component
- Y10T428/12569—Synthetic resin
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12708—Sn-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12708—Sn-base component
- Y10T428/12715—Next to Group IB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004030930A DE102004030930A1 (de) | 2004-06-25 | 2004-06-25 | Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung |
Publications (1)
Publication Number | Publication Date |
---|---|
DE502005008856D1 true DE502005008856D1 (de) | 2010-03-04 |
Family
ID=35262053
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102004030930A Ceased DE102004030930A1 (de) | 2004-06-25 | 2004-06-25 | Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung |
DE502005008856T Active DE502005008856D1 (de) | 2004-06-25 | 2005-06-22 | Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102004030930A Ceased DE102004030930A1 (de) | 2004-06-25 | 2004-06-25 | Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung |
Country Status (8)
Country | Link |
---|---|
US (1) | US7547479B2 (de) |
EP (1) | EP1614771B1 (de) |
JP (1) | JP4647412B2 (de) |
KR (1) | KR101117552B1 (de) |
AT (1) | ATE455192T1 (de) |
CA (1) | CA2510123A1 (de) |
DE (2) | DE102004030930A1 (de) |
TW (1) | TWI357790B (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004003784B4 (de) | 2004-01-23 | 2011-01-13 | Ormecon Gmbh | Dispersion intrinsisch leitfähigen Polyanilins und deren Verwendung |
EP1730215B1 (de) * | 2004-03-18 | 2017-08-16 | Enthone GmbH | Zusammensetzung, die ein leitfähiges polymer in kolloidaler form und kohlenstoff enthält |
DE102004030388A1 (de) * | 2004-06-23 | 2006-01-26 | Ormecon Gmbh | Artikel mit einer Beschichtung von elektrisch leitfähigem Polymer und Verfahren zu deren Herstellung |
DE102005010162B4 (de) | 2005-03-02 | 2007-06-14 | Ormecon Gmbh | Leitfähige Polymere aus Teilchen mit anisotroper Morphologie |
WO2007002424A1 (en) * | 2005-06-24 | 2007-01-04 | Technic, Inc. | Silver barrier layer to minimize whisker growth in tin electrodeposits |
KR20080024525A (ko) * | 2005-07-11 | 2008-03-18 | 테크닉,인코포레이티드 | 주석 위스커 성장을 최소화시키는 성질 또는 특성을 갖는주석 전착물 |
DE102005039608A1 (de) | 2005-08-19 | 2007-03-01 | Ormecon Gmbh | Zusammensetzung mit intrinsisch leitfähigem Polymer |
US20070295530A1 (en) * | 2006-06-07 | 2007-12-27 | Honeywell International, Inc. | Coatings and methods for inhibiting tin whisker growth |
US7604871B2 (en) | 2006-06-07 | 2009-10-20 | Honeywell International Inc. | Electrical components including abrasive powder coatings for inhibiting tin whisker growth |
EP2062467B1 (de) * | 2006-09-13 | 2012-02-15 | Enthone, Inc. | Artikel mit beschichtung aus elektrisch leitendem polymer und edel-/halbedelmetal sowie herstellungsverfahren dafür |
JP4908194B2 (ja) * | 2006-12-28 | 2012-04-04 | 日本航空電子工業株式会社 | 導電性インクとそれを用いた印刷配線基板とその製造方法 |
JP4998704B2 (ja) | 2007-01-22 | 2012-08-15 | 上村工業株式会社 | 置換錫合金めっき皮膜の形成方法、置換錫合金めっき浴及びめっき性能の維持方法 |
US10231344B2 (en) | 2007-05-18 | 2019-03-12 | Applied Nanotech Holdings, Inc. | Metallic ink |
US8404160B2 (en) * | 2007-05-18 | 2013-03-26 | Applied Nanotech Holdings, Inc. | Metallic ink |
JP2009032844A (ja) * | 2007-07-26 | 2009-02-12 | Nitto Denko Corp | 配線回路基板およびその製造方法 |
DE102007040065A1 (de) * | 2007-08-24 | 2009-02-26 | Ormecon Gmbh | Artikel mit einer nanoskopischen Beschichtung aus Edel-/Halbedelmetall sowie Verfahren zu deren Herstellung |
US8506849B2 (en) | 2008-03-05 | 2013-08-13 | Applied Nanotech Holdings, Inc. | Additives and modifiers for solvent- and water-based metallic conductive inks |
US8344522B2 (en) | 2008-03-31 | 2013-01-01 | Sanyo Electric Co., Ltd. | Solder structure, method for forming the solder structure, and semiconductor module including the solder structure |
JP5067481B2 (ja) * | 2008-05-02 | 2012-11-07 | 富士通株式会社 | 配線基板およびその製造方法、電子装置の製造方法 |
US20090286383A1 (en) * | 2008-05-15 | 2009-11-19 | Applied Nanotech Holdings, Inc. | Treatment of whiskers |
US9730333B2 (en) * | 2008-05-15 | 2017-08-08 | Applied Nanotech Holdings, Inc. | Photo-curing process for metallic inks |
FR2933105B1 (fr) * | 2008-06-27 | 2010-09-03 | Essilor Int | Procede de depot non-electrolytique |
US20100000762A1 (en) * | 2008-07-02 | 2010-01-07 | Applied Nanotech Holdings, Inc. | Metallic pastes and inks |
KR20100034336A (ko) * | 2008-09-23 | 2010-04-01 | 삼성전기주식회사 | 무전해 도금액 |
JP5740389B2 (ja) | 2009-03-27 | 2015-06-24 | アプライド・ナノテック・ホールディングス・インコーポレーテッド | 光焼結及び/またはレーザー焼結を強化するためのバッファ層 |
US8422197B2 (en) * | 2009-07-15 | 2013-04-16 | Applied Nanotech Holdings, Inc. | Applying optical energy to nanoparticles to produce a specified nanostructure |
FR2960558B1 (fr) | 2010-05-27 | 2012-06-08 | Essilor Int | Procede de fabrication d'un article electrochrome |
FR2963936B1 (fr) | 2010-08-17 | 2012-08-31 | Essilor Int | Procede de fabrication d'un article electrochrome |
US20120090880A1 (en) | 2010-10-19 | 2012-04-19 | International Business Machines Corporation | Mitigation and elimination of tin whiskers |
TWI467718B (zh) | 2011-12-30 | 2015-01-01 | Ind Tech Res Inst | 凸塊結構以及電子封裝接點結構及其製造方法 |
DE102012208681A1 (de) | 2012-05-24 | 2013-11-28 | Robert Bosch Gmbh | Zinnbeschichtung, zugehöriges Kontaktelement und Verfahren zum Aufbringen einer Zinnbeschichtung |
US9598776B2 (en) | 2012-07-09 | 2017-03-21 | Pen Inc. | Photosintering of micron-sized copper particles |
DE102013212069A1 (de) | 2013-06-25 | 2015-01-08 | Robert Bosch Gmbh | Zinnbeschichtung, zugehöriges Kontaktelement und Verfahren zum Aufbringen einer Zinnbeschichtung |
CN117280483A (zh) * | 2022-03-25 | 2023-12-22 | 厦门三安光电有限公司 | 一种半导体发光元件及发光器件 |
Family Cites Families (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT378008B (de) * | 1982-09-07 | 1985-06-10 | Neumayer Karl Gmbh | Verfahren zur herstellung von mit einer zinnlegierung ueberzogenen draehten |
JPS6277481A (ja) * | 1985-08-05 | 1987-04-09 | オリンコ−ポレ−シヨン | スズホイスカ−の成長防止方法 |
US4657632A (en) * | 1985-08-29 | 1987-04-14 | Techno Instruments Investments 1983 Ltd. | Use of immersion tin coating as etch resist |
JP2519551B2 (ja) | 1988-10-11 | 1996-07-31 | ツィッパーリング ケスラー ウント コー (ゲーエムベーハー ウント コー) | 導電性ポリマ―薄層の製造方法 |
US5192835A (en) * | 1990-10-09 | 1993-03-09 | Eastman Kodak Company | Bonding of solid state device to terminal board |
JP3014814B2 (ja) * | 1991-07-25 | 2000-02-28 | 三井金属鉱業株式会社 | スズメッキホイスカーの抑制方法 |
US5196053A (en) * | 1991-11-27 | 1993-03-23 | Mcgean-Rohco, Inc. | Complexing agent for displacement tin plating |
DE4238765A1 (de) * | 1992-11-10 | 1994-05-11 | Stuebing Gmbh | Verfahren zur stromlosen Verzinnung von Leiterplatten und deren Verwendung |
DE4317010A1 (de) * | 1993-05-17 | 1994-11-24 | Zipperling Kessler & Co | Dispergierbares intrinsisch leitfähiges Polymer und Verfahren zu dessen Herstellung |
WO1995000678A1 (de) | 1993-06-25 | 1995-01-05 | Zipperling Kessler & Co (Gmbh & Co) | Verfahren zur herstellung korrosionsgeschützter metallischer werkstoffe und damit erhältliche werkstoffe |
US5532025A (en) | 1993-07-23 | 1996-07-02 | Kinlen; Patrick J. | Corrosion inhibiting compositions |
DE4333127A1 (de) | 1993-09-29 | 1995-03-30 | Basf Ag | Verfahren zum Schutz von lötfähigen Kupfer- und Kupferlegierungsoberflächen vor Korrosion |
US5700398A (en) | 1994-12-14 | 1997-12-23 | International Business Machines Corporation | Composition containing a polymer and conductive filler and use thereof |
US5645890A (en) | 1995-02-14 | 1997-07-08 | The Trustess Of The University Of Pennsylvania | Prevention of corrosion with polyaniline |
JPH08296050A (ja) * | 1995-04-27 | 1996-11-12 | Ishihara Chem Co Ltd | ホイスカー防止用スズメッキ浴、及びスズメッキのホイスカー防止方法 |
DE19525708C1 (de) | 1995-07-14 | 1997-01-30 | Rmh Polymers Gmbh & Co Kg | Temporärer Anlaufschutz für Kupfer und Kupferlegierungen |
US5554211A (en) * | 1995-11-15 | 1996-09-10 | Mcgean-Rohco, Inc. | Aqueous electroless plating solutions |
DE59608706D1 (de) * | 1995-11-29 | 2002-03-21 | Zipperling Kessler & Co | Verfahren zur herstellung von metallisierten werkstoffen |
JP3660777B2 (ja) * | 1997-03-06 | 2005-06-15 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 錫合金膜の形成方法およびその錫合金めっき浴 |
JPH1121673A (ja) * | 1997-07-07 | 1999-01-26 | Ishihara Chem Co Ltd | 鉛フリーの無電解スズ合金メッキ浴及びメッキ方法、並びに当該無電解メッキ浴で鉛を含まないスズ合金皮膜を形成した電子部品 |
DE59812308D1 (de) * | 1997-07-25 | 2004-12-30 | Ormecon Gmbh | Chemische verbindungen von intrinsisch leitfähigen polymeren mit metallen |
JP4157975B2 (ja) * | 1997-08-22 | 2008-10-01 | 石原薬品株式会社 | 無電解スズ及びスズ合金メッキ浴、当該無電解メッキ方法、並びに当該無電解メッキ浴でスズ又はスズ合金皮膜を形成したtabのフィルムキャリア |
DE19754221A1 (de) * | 1997-12-06 | 1999-06-17 | Federal Mogul Wiesbaden Gmbh | Schichtverbundwerkstoff für Gleitlager mit bleifreier Gleitschicht |
US6015482A (en) * | 1997-12-18 | 2000-01-18 | Circuit Research Corp. | Printed circuit manufacturing process using tin-nickel plating |
US6123995A (en) | 1998-03-06 | 2000-09-26 | Shipley Company, L.L.C. | Method of manufacture of multilayer circuit boards |
JP4465068B2 (ja) * | 1999-11-10 | 2010-05-19 | 日本リーロナール有限会社 | 銀−錫合金めっき層の形成方法 |
US6361823B1 (en) * | 1999-12-03 | 2002-03-26 | Atotech Deutschland Gmbh | Process for whisker-free aqueous electroless tin plating |
US6706418B2 (en) * | 2000-07-01 | 2004-03-16 | Shipley Company L.L.C. | Metal alloy compositions and plating methods related thereto |
CN1407141A (zh) * | 2001-03-16 | 2003-04-02 | 希普雷公司 | 镀锡 |
JP2002289653A (ja) * | 2001-03-26 | 2002-10-04 | Hitachi Cable Ltd | 半導体装置用テープキャリアおよびその製造方法 |
CN101330800B (zh) | 2001-07-19 | 2011-03-23 | 东丽株式会社 | 电路基板的制造方法 |
WO2003020000A1 (en) | 2001-08-22 | 2003-03-06 | World Properties Inc. | Method for improving bonding of circuit substrates to metal and articles formed thereby |
GB2380964B (en) * | 2001-09-04 | 2005-01-12 | Multicore Solders Ltd | Lead-free solder paste |
JP3513709B2 (ja) * | 2001-10-16 | 2004-03-31 | 石原薬品株式会社 | 前処理によるスズホイスカーの防止方法 |
JP2003213439A (ja) * | 2002-01-16 | 2003-07-30 | Hitachi Chem Co Ltd | 配線基板の無電解めっき方法 |
TW200302685A (en) * | 2002-01-23 | 2003-08-01 | Matsushita Electric Ind Co Ltd | Circuit component built-in module and method of manufacturing the same |
JP3855161B2 (ja) * | 2002-05-10 | 2006-12-06 | 石原薬品株式会社 | 電子部品のスズホイスカーの防止方法 |
DE10234363A1 (de) | 2002-07-27 | 2004-02-12 | Robert Bosch Gmbh | Korrosionsschutzlack für metallische Oberflächen |
US6962642B2 (en) | 2002-09-26 | 2005-11-08 | International Business Machines Corporation | Treating copper surfaces for electronic applications |
JP4603812B2 (ja) * | 2003-05-12 | 2010-12-22 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 改良されたスズめっき方法 |
US7087441B2 (en) * | 2004-10-21 | 2006-08-08 | Endicott Interconnect Technologies, Inc. | Method of making a circuitized substrate having a plurality of solder connection sites thereon |
-
2004
- 2004-06-25 DE DE102004030930A patent/DE102004030930A1/de not_active Ceased
-
2005
- 2005-06-17 CA CA002510123A patent/CA2510123A1/en not_active Abandoned
- 2005-06-22 EP EP05013469A patent/EP1614771B1/de active Active
- 2005-06-22 DE DE502005008856T patent/DE502005008856D1/de active Active
- 2005-06-22 AT AT05013469T patent/ATE455192T1/de not_active IP Right Cessation
- 2005-06-23 JP JP2005183261A patent/JP4647412B2/ja not_active Expired - Fee Related
- 2005-06-23 US US11/165,410 patent/US7547479B2/en active Active
- 2005-06-24 TW TW094121157A patent/TWI357790B/zh active
- 2005-06-24 KR KR1020050054972A patent/KR101117552B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
TWI357790B (en) | 2012-02-01 |
US20060035105A1 (en) | 2006-02-16 |
TW200607416A (en) | 2006-02-16 |
EP1614771B1 (de) | 2010-01-13 |
US7547479B2 (en) | 2009-06-16 |
JP4647412B2 (ja) | 2011-03-09 |
KR101117552B1 (ko) | 2012-03-07 |
DE102004030930A1 (de) | 2006-02-23 |
JP2006037227A (ja) | 2006-02-09 |
ATE455192T1 (de) | 2010-01-15 |
EP1614771A1 (de) | 2006-01-11 |
CA2510123A1 (en) | 2005-12-25 |
KR20060048516A (ko) | 2006-05-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE502005008856D1 (de) | Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung | |
MY158913A (en) | Material for electric contact and method of producing the same | |
EP1744609A3 (de) | Gedruckte mehrlagige Schaltungsplatte und Verfahren zur Herstellung | |
EP1895820A3 (de) | Leiterplatte und Verfahren zu ihrer Herstellung | |
DE60118164D1 (de) | Oberflächenbehandeltes, elektrisch leitfähiges metallteil und verfahren zur herstellung desselben | |
HK1092998A1 (en) | Method of manufacturing a circuit carrier and the use of the method | |
TW200615403A (en) | Electrolytic copper foil with carrier foil and process for producing the same | |
TW200520110A (en) | Printed wiring board, its preparation and circuit device | |
MY140407A (en) | Leadframe comprising tin plating or an intermetallic layer formed therefrom | |
DE60134823D1 (de) | Oberflächenbehandelte kupferfolie und ihre herstellung und kupferkaschiertes laminat daraus | |
WO2008031492A8 (en) | Article with a coating of electrically conductive polymer and precious/semiprecious metal and process for production thereof | |
WO2008146448A1 (ja) | ピーラブル性を有する積層体およびその製造方法 | |
WO2007025521A3 (de) | Verfahren zur herstellung eines halbleiterbauelements mit einer planaren kontaktierung und halbleiterbauelement | |
EP1353539A3 (de) | Leiterplattenherstellung | |
EP1608211A3 (de) | Platte zur Herstellung einer Leiterplatte, Leiterplatte und Verfahren zur Bildung einer dünnen Metallschicht | |
TW200712254A (en) | Silver barrier layers to minimize whisker growth tin electrodeposits | |
WO2009005042A1 (ja) | 金属材料、その製造方法、及びそれを用いた電気電子部品 | |
HK1075071A1 (en) | Metal strip for epitaxial coating and method for production thereof | |
WO2008153185A1 (ja) | プリント配線板製造用の埋設銅めっき方法及びその埋設銅めっき方法を用いて得られるプリント配線板 | |
WO2007040196A1 (ja) | 表面処理銅箔及びその表面処理銅箔の製造方法並びにその表面処理銅箔を用いた銅張積層板 | |
MY120560A (en) | Making and using an ultra-thin copper foil. | |
WO2006074902A3 (de) | Verfahren zur abscheidung von palladiumschichten und palladiumbad hierfür | |
CA2751684A1 (en) | Silver-containing alloy plating bath and method for electrolytic plating using same | |
EP1619719A3 (de) | Herstellungsverfahren einer Leiterplatte, welches ein Galvanisierungsverfahren enthält | |
EP1209958A3 (de) | Schichtstruktur für elektronische Anordnungen und Verfahren zur stromlosen Goldplattierung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |