DE50312077D1 - Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN - Google Patents

Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN

Info

Publication number
DE50312077D1
DE50312077D1 DE50312077T DE50312077T DE50312077D1 DE 50312077 D1 DE50312077 D1 DE 50312077D1 DE 50312077 T DE50312077 T DE 50312077T DE 50312077 T DE50312077 T DE 50312077T DE 50312077 D1 DE50312077 D1 DE 50312077D1
Authority
DE
Germany
Prior art keywords
field distributions
magnetic field
structured layer
producing electro
platform
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50312077T
Other languages
English (en)
Inventor
Heidi Thome-Foerster
Claus Heine-Kempkens
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Trading AG Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading AG Truebbach filed Critical Oerlikon Trading AG Truebbach
Application granted granted Critical
Publication of DE50312077D1 publication Critical patent/DE50312077D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N21/7703Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
    • G01N21/774Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
    • G01N21/7743Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure the reagent-coated grating coupling light in or out of the waveguide
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4788Diffraction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N21/645Specially adapted constructive features of fluorimeters
    • G01N21/6452Individual samples arranged in a regular 2D-array, e.g. multiwell plates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N21/7703Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
    • G01N21/774Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N21/7703Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
    • G01N21/7746Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the waveguide coupled to a cavity resonator
DE50312077T 2002-12-19 2003-12-11 Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN Expired - Lifetime DE50312077D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43498702P 2002-12-19 2002-12-19
PCT/CH2003/000811 WO2004057315A1 (de) 2002-12-19 2003-12-11 Methode zur erzeugung elektromagnetischer feldverteilungen

Publications (1)

Publication Number Publication Date
DE50312077D1 true DE50312077D1 (de) 2009-12-10

Family

ID=32682135

Family Applications (1)

Application Number Title Priority Date Filing Date
DE50312077T Expired - Lifetime DE50312077D1 (de) 2002-12-19 2003-12-11 Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN

Country Status (9)

Country Link
US (1) US7110181B2 (de)
EP (1) EP1576356B1 (de)
KR (1) KR20050084016A (de)
CN (1) CN100585384C (de)
AT (1) ATE447171T1 (de)
AU (1) AU2003283175A1 (de)
DE (1) DE50312077D1 (de)
TW (1) TWI322264B (de)
WO (1) WO2004057315A1 (de)

Families Citing this family (29)

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US5914613A (en) 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
US6256882B1 (en) 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
US6914423B2 (en) 2000-09-05 2005-07-05 Cascade Microtech, Inc. Probe station
US6965226B2 (en) 2000-09-05 2005-11-15 Cascade Microtech, Inc. Chuck for holding a device under test
DE10143173A1 (de) 2000-12-04 2002-06-06 Cascade Microtech Inc Wafersonde
WO2003052435A1 (en) 2001-08-21 2003-06-26 Cascade Microtech, Inc. Membrane probing system
US7057404B2 (en) 2003-05-23 2006-06-06 Sharp Laboratories Of America, Inc. Shielded probe for testing a device under test
US7492172B2 (en) 2003-05-23 2009-02-17 Cascade Microtech, Inc. Chuck for holding a device under test
US7250626B2 (en) 2003-10-22 2007-07-31 Cascade Microtech, Inc. Probe testing structure
US7187188B2 (en) 2003-12-24 2007-03-06 Cascade Microtech, Inc. Chuck with integrated wafer support
JP2007517231A (ja) 2003-12-24 2007-06-28 カスケード マイクロテック インコーポレイテッド アクティブ・ウェハプローブ
JP2008512680A (ja) 2004-09-13 2008-04-24 カスケード マイクロテック インコーポレイテッド 両面プロービング構造体
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7790406B2 (en) * 2005-08-11 2010-09-07 Sru Biosystems, Inc Grating-based sensor combining label-free binding detection and fluorescence amplification and readout system for sensor
ATE470849T1 (de) * 2005-08-11 2010-06-15 Sru Biosystems Inc Beugungsbasierter sensor, der markierungsfreie bindungserkennung und fluoreszenz-verstärkung kombiniert
US7723999B2 (en) 2006-06-12 2010-05-25 Cascade Microtech, Inc. Calibration structures for differential signal probing
US7403028B2 (en) 2006-06-12 2008-07-22 Cascade Microtech, Inc. Test structure and probe for differential signals
US7764072B2 (en) 2006-06-12 2010-07-27 Cascade Microtech, Inc. Differential signal probing system
US20080012578A1 (en) * 2006-07-14 2008-01-17 Cascade Microtech, Inc. System for detecting molecular structure and events
EP2044420A2 (de) * 2006-07-17 2009-04-08 Max Wiki Analytisches system mit einer anordnung zur zeitlich veränderbaren räumlichen lichtmodulation und damit ausführbares nachweisverfahren
US7876114B2 (en) 2007-08-08 2011-01-25 Cascade Microtech, Inc. Differential waveguide probe
EP2060904A1 (de) * 2007-11-13 2009-05-20 Koninklijke Philips Electronics N.V. Biosensor zur Plasmonenrasterung
US7888957B2 (en) 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
WO2010059247A2 (en) 2008-11-21 2010-05-27 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
US8319503B2 (en) 2008-11-24 2012-11-27 Cascade Microtech, Inc. Test apparatus for measuring a characteristic of a device under test
EP2221605A1 (de) * 2009-02-12 2010-08-25 Koninklijke Philips Electronics N.V. Drahtgittersensor
FR2954524B1 (fr) * 2009-12-17 2012-09-28 Ecole Polytech Reseau de diffraction reflechissant dielectrique optimise
TWI571648B (zh) * 2016-01-26 2017-02-21 國立彰化師範大學 磁場分佈感測系統

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2256477B (en) * 1991-06-07 1995-03-08 Marconi Gec Ltd An optical sensor
US5907436A (en) * 1995-09-29 1999-05-25 The Regents Of The University Of California Multilayer dielectric diffraction gratings
JP2000516723A (ja) * 1996-08-21 2000-12-12 ポラロイド コーポレイション 位相制御エバネッセントフィールドシステムおよび方法
GB9803704D0 (en) * 1998-02-24 1998-04-15 Univ Manchester Waveguide structure
JP2003531372A (ja) * 2000-04-14 2003-10-21 ツェプトゼンス アクチエンゲゼルシャフト 励起フィールドを強化するための格子導波路構造及びその使用
EP1305659B1 (de) * 2000-07-21 2004-12-08 Micro Managed Photons A/S Bandlücken strukturen für oberflächenplasmonenpolariton

Also Published As

Publication number Publication date
EP1576356B1 (de) 2009-10-28
TW200420876A (en) 2004-10-16
US20040130787A1 (en) 2004-07-08
CN100585384C (zh) 2010-01-27
WO2004057315A1 (de) 2004-07-08
TWI322264B (en) 2010-03-21
AU2003283175A1 (en) 2004-07-14
US7110181B2 (en) 2006-09-19
EP1576356A1 (de) 2005-09-21
KR20050084016A (ko) 2005-08-26
ATE447171T1 (de) 2009-11-15
CN1729393A (zh) 2006-02-01

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