DE50312077D1 - Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN - Google Patents
Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGENInfo
- Publication number
- DE50312077D1 DE50312077D1 DE50312077T DE50312077T DE50312077D1 DE 50312077 D1 DE50312077 D1 DE 50312077D1 DE 50312077 T DE50312077 T DE 50312077T DE 50312077 T DE50312077 T DE 50312077T DE 50312077 D1 DE50312077 D1 DE 50312077D1
- Authority
- DE
- Germany
- Prior art keywords
- field distributions
- magnetic field
- structured layer
- producing electro
- platform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000009826 distribution Methods 0.000 title abstract 3
- 230000005672 electromagnetic field Effects 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 2
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/774—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
- G01N21/7743—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure the reagent-coated grating coupling light in or out of the waveguide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6452—Individual samples arranged in a regular 2D-array, e.g. multiwell plates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/774—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the reagent being on a grating or periodic structure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
- G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
- G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
- G01N21/7746—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides the waveguide coupled to a cavity resonator
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US43498702P | 2002-12-19 | 2002-12-19 | |
PCT/CH2003/000811 WO2004057315A1 (de) | 2002-12-19 | 2003-12-11 | Methode zur erzeugung elektromagnetischer feldverteilungen |
Publications (1)
Publication Number | Publication Date |
---|---|
DE50312077D1 true DE50312077D1 (de) | 2009-12-10 |
Family
ID=32682135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE50312077T Expired - Lifetime DE50312077D1 (de) | 2002-12-19 | 2003-12-11 | Vorrichtung und Verfahren ZUR ERZEUGUNG ELEKTROMAGNETISCHER FELDVERTEILUNGEN |
Country Status (9)
Country | Link |
---|---|
US (1) | US7110181B2 (de) |
EP (1) | EP1576356B1 (de) |
KR (1) | KR20050084016A (de) |
CN (1) | CN100585384C (de) |
AT (1) | ATE447171T1 (de) |
AU (1) | AU2003283175A1 (de) |
DE (1) | DE50312077D1 (de) |
TW (1) | TWI322264B (de) |
WO (1) | WO2004057315A1 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5914613A (en) | 1996-08-08 | 1999-06-22 | Cascade Microtech, Inc. | Membrane probing system with local contact scrub |
US6256882B1 (en) | 1998-07-14 | 2001-07-10 | Cascade Microtech, Inc. | Membrane probing system |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
DE10143173A1 (de) | 2000-12-04 | 2002-06-06 | Cascade Microtech Inc | Wafersonde |
WO2003052435A1 (en) | 2001-08-21 | 2003-06-26 | Cascade Microtech, Inc. | Membrane probing system |
US7057404B2 (en) | 2003-05-23 | 2006-06-06 | Sharp Laboratories Of America, Inc. | Shielded probe for testing a device under test |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
JP2007517231A (ja) | 2003-12-24 | 2007-06-28 | カスケード マイクロテック インコーポレイテッド | アクティブ・ウェハプローブ |
JP2008512680A (ja) | 2004-09-13 | 2008-04-24 | カスケード マイクロテック インコーポレイテッド | 両面プロービング構造体 |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US7790406B2 (en) * | 2005-08-11 | 2010-09-07 | Sru Biosystems, Inc | Grating-based sensor combining label-free binding detection and fluorescence amplification and readout system for sensor |
ATE470849T1 (de) * | 2005-08-11 | 2010-06-15 | Sru Biosystems Inc | Beugungsbasierter sensor, der markierungsfreie bindungserkennung und fluoreszenz-verstärkung kombiniert |
US7723999B2 (en) | 2006-06-12 | 2010-05-25 | Cascade Microtech, Inc. | Calibration structures for differential signal probing |
US7403028B2 (en) | 2006-06-12 | 2008-07-22 | Cascade Microtech, Inc. | Test structure and probe for differential signals |
US7764072B2 (en) | 2006-06-12 | 2010-07-27 | Cascade Microtech, Inc. | Differential signal probing system |
US20080012578A1 (en) * | 2006-07-14 | 2008-01-17 | Cascade Microtech, Inc. | System for detecting molecular structure and events |
EP2044420A2 (de) * | 2006-07-17 | 2009-04-08 | Max Wiki | Analytisches system mit einer anordnung zur zeitlich veränderbaren räumlichen lichtmodulation und damit ausführbares nachweisverfahren |
US7876114B2 (en) | 2007-08-08 | 2011-01-25 | Cascade Microtech, Inc. | Differential waveguide probe |
EP2060904A1 (de) * | 2007-11-13 | 2009-05-20 | Koninklijke Philips Electronics N.V. | Biosensor zur Plasmonenrasterung |
US7888957B2 (en) | 2008-10-06 | 2011-02-15 | Cascade Microtech, Inc. | Probing apparatus with impedance optimized interface |
WO2010059247A2 (en) | 2008-11-21 | 2010-05-27 | Cascade Microtech, Inc. | Replaceable coupon for a probing apparatus |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
EP2221605A1 (de) * | 2009-02-12 | 2010-08-25 | Koninklijke Philips Electronics N.V. | Drahtgittersensor |
FR2954524B1 (fr) * | 2009-12-17 | 2012-09-28 | Ecole Polytech | Reseau de diffraction reflechissant dielectrique optimise |
TWI571648B (zh) * | 2016-01-26 | 2017-02-21 | 國立彰化師範大學 | 磁場分佈感測系統 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2256477B (en) * | 1991-06-07 | 1995-03-08 | Marconi Gec Ltd | An optical sensor |
US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
JP2000516723A (ja) * | 1996-08-21 | 2000-12-12 | ポラロイド コーポレイション | 位相制御エバネッセントフィールドシステムおよび方法 |
GB9803704D0 (en) * | 1998-02-24 | 1998-04-15 | Univ Manchester | Waveguide structure |
JP2003531372A (ja) * | 2000-04-14 | 2003-10-21 | ツェプトゼンス アクチエンゲゼルシャフト | 励起フィールドを強化するための格子導波路構造及びその使用 |
EP1305659B1 (de) * | 2000-07-21 | 2004-12-08 | Micro Managed Photons A/S | Bandlücken strukturen für oberflächenplasmonenpolariton |
-
2003
- 2003-12-11 DE DE50312077T patent/DE50312077D1/de not_active Expired - Lifetime
- 2003-12-11 EP EP03775037A patent/EP1576356B1/de not_active Expired - Lifetime
- 2003-12-11 AT AT03775037T patent/ATE447171T1/de not_active IP Right Cessation
- 2003-12-11 AU AU2003283175A patent/AU2003283175A1/en not_active Abandoned
- 2003-12-11 KR KR1020057009647A patent/KR20050084016A/ko not_active Application Discontinuation
- 2003-12-11 WO PCT/CH2003/000811 patent/WO2004057315A1/de not_active Application Discontinuation
- 2003-12-11 CN CN200380107136A patent/CN100585384C/zh not_active Expired - Fee Related
- 2003-12-18 US US10/740,057 patent/US7110181B2/en not_active Expired - Fee Related
- 2003-12-18 TW TW092135937A patent/TWI322264B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1576356B1 (de) | 2009-10-28 |
TW200420876A (en) | 2004-10-16 |
US20040130787A1 (en) | 2004-07-08 |
CN100585384C (zh) | 2010-01-27 |
WO2004057315A1 (de) | 2004-07-08 |
TWI322264B (en) | 2010-03-21 |
AU2003283175A1 (en) | 2004-07-14 |
US7110181B2 (en) | 2006-09-19 |
EP1576356A1 (de) | 2005-09-21 |
KR20050084016A (ko) | 2005-08-26 |
ATE447171T1 (de) | 2009-11-15 |
CN1729393A (zh) | 2006-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |